JPH05343010A - Electron beam emitter - Google Patents

Electron beam emitter

Info

Publication number
JPH05343010A
JPH05343010A JP14241792A JP14241792A JPH05343010A JP H05343010 A JPH05343010 A JP H05343010A JP 14241792 A JP14241792 A JP 14241792A JP 14241792 A JP14241792 A JP 14241792A JP H05343010 A JPH05343010 A JP H05343010A
Authority
JP
Japan
Prior art keywords
cathode
electron beam
supporting means
substrate
linear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14241792A
Other languages
Japanese (ja)
Inventor
Ryuichi Murai
隆一 村井
Kinzo Nonomura
欽造 野々村
Junpei Hashiguchi
淳平 橋口
Satoshi Kitao
智 北尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14241792A priority Critical patent/JPH05343010A/en
Publication of JPH05343010A publication Critical patent/JPH05343010A/en
Pending legal-status Critical Current

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  • Solid Thermionic Cathode (AREA)

Abstract

PURPOSE:To provide an electron beam emitter for a high contrast large flat image display device by specifying the shape of a heat resistant insulating film provided on a cathode supporting means. CONSTITUTION:A stripe-shape control electrode 2 is formed on the surface of an insulating substrate 1 for which soda glass and the like is used, out of a conductive thin film. After a substrate 3a, for which a hole part is formed by etching and the like in a metal plate of 0.2mm, is formed, a heat resisting insulating material 3b such as Al2O3 or SiO2 is formed on the surface of the substrate 3a into a thickness of approximately 50mum, for a cathode supporting means 3. The method of formation is a flame melting film manufacturing, as generally called, and the films are formed on the substrate while the heat resisting materials are connected together in the granular form. The thermal spray film pattern to be formed on the substrate is carried out by providing masking. The pattern is formed in the vicinity of a point where a linear cathode 4 is abutted on the cathode supporting means 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、カラーテレビジョン受
像機や、計算機の端末ディスプレイ等に用いられる平板
表示装置の電子ビーム発生手段に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam generating means for a flat panel display used for a color television receiver, a terminal display of a computer and the like.

【0002】[0002]

【従来の技術】例えば特開平1−130453号公報に
開示されているような平板型CRTが多数提案されてい
るが、これら多数の提案に共通した課題である線状熱陰
極の振動の問題を解決するために特開平2−13277
39号公報に開示されている先行技術がある。
2. Description of the Related Art Many flat-plate CRTs as disclosed in, for example, Japanese Patent Application Laid-Open No. 1-130453 have been proposed. However, the problem of vibration of the linear hot cathode, which is a problem common to these many proposals, has been proposed. To solve the problem, JP-A-2-13277
There is a prior art disclosed in Japanese Patent Publication No. 39.

【0003】以下に特開平2−132739号公報を中
心として、従来の平板CRTの線状熱陰極の防振技術に
ついて説明する。
A vibration isolation technique for a conventional linear hot cathode of a flat plate CRT will be described below with reference to JP-A-2-132739.

【0004】図5は、上記表示装置の要部構成図を示す
ものである。ガラス容器33,44からなる真空容器内
に、背面電極(信号電極)26,電子ビーム源としての
線状熱陰極27イ〜27ハ,電子ビーム引出し電極2
8,陰極支持手段37,集束電極30,水平偏向電極3
1,垂直偏向電極32とを具備している。
FIG. 5 is a block diagram showing the main part of the above display device. A back electrode (signal electrode) 26, linear hot cathodes 27 a to 27 c as an electron beam source, and an electron beam extraction electrode 2 are provided in a vacuum container composed of glass containers 33 and 44.
8, cathode supporting means 37, focusing electrode 30, horizontal deflection electrode 3
1, a vertical deflection electrode 32.

【0005】線状熱陰極27は、水平方向にほぼ一様な
電流密度分布の電子流を発生するように水平方向に架張
されており、適宜間隔を介して垂直方向に複数本設けら
れている。これらの線状熱陰極27は、例えばタングス
テン線の表面に酸化物陰極が塗布されて構成されてい
る。
The linear hot cathode 27 is horizontally stretched so as to generate an electron current having a substantially uniform current density distribution in the horizontal direction, and a plurality of linear hot cathodes 27 are provided in the vertical direction at appropriate intervals. There is. These linear hot cathodes 27 are formed, for example, by coating an oxide cathode on the surface of a tungsten wire.

【0006】背面電極26は平板状の導電材からなり線
状熱陰極に対し平行に設けられている。
The back electrode 26 is made of a flat plate-shaped conductive material and is provided parallel to the linear hot cathode.

【0007】引出し電極28は、線状熱陰極を介して背
面電極26と対抗し、水平方向に適宜間隔で設けられた
貫通孔34の列を、各線状陰極に対向する水平線上に有
する導電板36からなる。
The lead-out electrode 28 opposes the back electrode 26 via the linear hot cathode, and has a row of through holes 34 provided at appropriate intervals in the horizontal direction on a horizontal line facing each linear cathode. It consists of 36.

【0008】水平偏向電極31は、垂直方向に細長い導
電板40を複数個水平方向に並べ全体として櫛状とした
構成であり、特に集束電極30の貫通孔38の列の中間
に対向するように同一平面上に導電板40を配置してい
る。
The horizontal deflection electrode 31 has a structure in which a plurality of vertically elongated conductive plates 40 are arranged in the horizontal direction and has a comb shape as a whole, and in particular, faces the middle of the row of the through holes 38 of the focusing electrode 30. The conductive plate 40 is arranged on the same plane.

【0009】垂直偏向電極32イ,32bは端部で連結
された導電板すなわち、2枚の櫛歯状の導電板を同一平
面上で適宜間隔を介して互いに噛み合わせた構成からな
り、例えば電子ビーム48に対しては、下方の導電板4
1イと上方の導電板41bによって一対の垂直偏向電極
をなす。スクリーン43は、電子ビームの照射によって
発光する蛍光体42をガラス容器33の内面に塗布し、
その表面にメタルバック層(図示せず)が設けられてい
る。
The vertical deflection electrodes 32a and 32b are composed of conductive plates connected at their ends, that is, two comb-teeth-shaped conductive plates meshed with each other on the same plane at appropriate intervals. For the beam 48, the lower conductive plate 4
The pair of vertical deflection electrodes is formed by the pair of vertical electrodes 1b and the upper conductive plate 41b. The screen 43 applies a phosphor 42 that emits light by irradiation of an electron beam to the inner surface of the glass container 33,
A metal back layer (not shown) is provided on the surface.

【0010】以上のように構成された画像表示装置につ
いて、以下その動作を説明する。まず背面電極26に電
圧V1、引出し電極28にV1より高い電圧V2を印加
する。更に線状熱陰極を加熱し電子放出を容易にするた
めにヒータ電流を通電した状態でV1<V0<V2なる
適切な電圧V0を印加すれば線状陰極の表面の電界が正
となって電子流が放出され、引出し電極28に向かって
加速される。また、例えばV0>V2なる電圧V0を印
加すれば、熱陰極表面の電界は負となり、電子の放出を
抑止することができる。そこで電圧を個別に制御するこ
とにより、上方の線状熱陰極から順に、一定時間ずつ電
子ビームを放出するように繰り返し、線状熱陰極1本ご
とに水平方向に一様の電流密度分布を持ったシート状の
電子ビームを発生させることができる。
The operation of the image display device configured as described above will be described below. First, a voltage V1 is applied to the back electrode 26, and a voltage V2 higher than V1 is applied to the extraction electrode 28. Further, in order to heat the linear hot cathode and facilitate electron emission, if an appropriate voltage V0 such that V1 <V0 <V2 is applied with a heater current applied, the electric field on the surface of the linear cathode becomes positive and electrons The flow is emitted and accelerated towards the extraction electrode 28. Further, for example, if a voltage V0 satisfying V0> V2 is applied, the electric field on the surface of the hot cathode becomes negative, and the emission of electrons can be suppressed. Therefore, by individually controlling the voltage, the linear hot cathode is repeatedly emitted from the upper linear hot cathode so as to emit an electron beam for a fixed time, and each linear hot cathode has a uniform current density distribution in the horizontal direction. It is possible to generate a sheet-shaped electron beam.

【0011】引出し電極28を通過した電子ビームは、
次に集束電極30に到達し、貫通孔38の静電レンズ効
果によって集束され、水平偏向電極31の合隣接する導
電板40,40間および垂直偏向電極32イ,32bの
合隣接する導電板41イ,41b間に与えられる電位差
によって水平および垂直に静電偏向される。更にスクリ
ーン43のメタルバック層には高電圧が印加されてお
り、電子ビームは高エネルギーに加速されてメタルバッ
クに衝突し、蛍光体を励起発光させる。
The electron beam passing through the extraction electrode 28 is
Next, it reaches the focusing electrode 30, is focused by the electrostatic lens effect of the through hole 38, and is between the adjacent conductive plates 40, 40 of the horizontal deflection electrode 31, and the adjacent conductive plate 41 of the vertical deflection electrodes 32a, 32b. (A) Electrostatic deflection is performed horizontally and vertically by the potential difference applied between 41b. Further, a high voltage is applied to the metal back layer of the screen 43, and the electron beam is accelerated to high energy and collides with the metal back to excite the phosphor to emit light.

【0012】ところで、線状熱陰極の加熱は、図6に示
すようにパルス駆動している。すなわち線状熱陰極27
イの両端に電位差Vfを与え、加熱電流Ifを通電し、
線状熱陰極をジュール加熱する。そして該線状熱陰極か
ら電子ビームを取り出すときに、通電による電位勾配を
避けるために約1msの間、加熱用電流Ifを遮断し、
線状熱陰極の電位を下げ(エミッション電位Ee)、電
子を取り出す。前述のように線状熱陰極はパルス駆動さ
れるので、その温度も変化し熱収縮する。そして線状熱
陰極は、その収縮によって弦振動する。
The heating of the linear hot cathode is pulse-driven as shown in FIG. That is, the linear hot cathode 27
A potential difference Vf is applied to both ends of a, and a heating current If is applied,
The linear hot cathode is Joule heated. Then, when the electron beam is extracted from the linear hot cathode, the heating current If is interrupted for about 1 ms to avoid a potential gradient due to energization,
The potential of the linear hot cathode is lowered (emission potential Ee) to take out electrons. Since the linear hot cathode is pulse-driven as described above, its temperature also changes and heat shrinks. Then, the linear hot cathode causes string vibration due to the contraction.

【0013】また線状熱陰極、例えば真空容器外から小
さな機械的振動が加えられた場合にも、線状熱陰極は弦
振動する。
Also, when a small mechanical vibration is applied to the linear hot cathode, for example, from the outside of the vacuum container, the linear hot cathode causes string vibration.

【0014】線状熱陰極が弦振動すると、電子ビーム取
り出し電極28との距離が変動し線状熱陰極近傍の電界
強度が変化する。その結果取り出される電子ビーム量が
変動するために、蛍光体の発光する輝度にむらが生じ
る。
When the linear hot cathode vibrates in a string, the distance between the linear hot cathode and the electron beam extraction electrode 28 changes and the electric field strength near the linear hot cathode changes. As a result, the amount of extracted electron beams fluctuates, which causes unevenness in the luminance of the phosphor.

【0015】線状熱陰極の弦振動を防止するために、陰
極支持手段37を用いる。以下陰極支持手段37につい
て述べる。図6に陰極支持手段の斜視図を示す。陰極支
持手段37は、平板に複数個の孔部を設けることにより
形成され、線状陰極52に当接するように配置されてい
る。前記陰極支持手段は、精度,つくりやすさ,耐熱
性,絶縁性等が要求されるため、エッチング等によっ
て、孔部を設けた金属板に、CaOの多孔質膜や、アル
ミナ等耐熱製絶縁材料をコーティングしている。そして
前記陰極支持手段は、線状陰極からの熱電導を小さくす
るために表面を凹凸にしたり、多層構造にしていた。
In order to prevent the string vibration of the linear hot cathode, the cathode supporting means 37 is used. The cathode supporting means 37 will be described below. FIG. 6 shows a perspective view of the cathode supporting means. The cathode supporting means 37 is formed by providing a flat plate with a plurality of holes, and is arranged so as to abut the linear cathode 52. Since the cathode supporting means is required to have accuracy, easiness to make, heat resistance, insulation, etc., a metal plate provided with holes by etching or the like, a porous film of CaO, or a heat resistant insulating material such as alumina. Is coated. The cathode supporting means has a roughened surface or a multi-layered structure in order to reduce the heat conduction from the linear cathode.

【0016】[0016]

【発明が解決しようとする課題】しかしながら上記の従
来の構成では、陰極温度低下の原因である熱電導の問題
は解決するが、チャージアップの問題が生じる。図7に
示すように熱陰極から出射した電子ビームは、引出し電
極を通過する電子ビームは5〜10%と少なく、その多
くが電子ビーム引出し電極に衝突する。衝突した電子ビ
ームのいくらかは弾性散乱され、あるいは2次電子放出
があり再び熱陰極の方向に運動する。そして前記陰極支
持部材の表面に達し、断熱材の電気絶縁性のためにチャ
ージアップする。その結果陰極周辺の電位制御が所望の
値にすることが不可能となり、画像のコントラストを低
下させるという欠点があった。
However, the above-mentioned conventional structure solves the problem of thermoconductivity, which is the cause of the temperature drop of the cathode, but causes the problem of charge-up. As shown in FIG. 7, in the electron beam emitted from the hot cathode, the electron beam passing through the extraction electrode is as small as 5 to 10%, and most of them collide with the electron beam extraction electrode. Some of the colliding electron beams are elastically scattered, or have secondary electron emission, and move again toward the hot cathode. Then, it reaches the surface of the cathode supporting member and is charged up due to the electrical insulating property of the heat insulating material. As a result, it becomes impossible to control the potential around the cathode to a desired value, and there is a drawback that the contrast of the image is lowered.

【0017】本発明は、上記従来技術の課題を解決する
ためになされたものであり、陰極支持手段の従来の機能
をそのまま保持しながら、陰極支持手段表面のチャージ
アップの問題を解決し高コントラストな、大型平板画像
表示装置用の電子ビーム発生装置を提供することを目的
とする。
The present invention has been made in order to solve the above-mentioned problems of the prior art, and solves the problem of charge-up on the surface of the cathode supporting means while maintaining the conventional function of the cathode supporting means as it is, thus achieving high contrast. Another object of the present invention is to provide an electron beam generator for a large flat panel image display device.

【0018】[0018]

【課題を解決するための手段】この目的を達成するため
に、本発明の電子ビーム発生装置は、電子ビーム取り出
し電極と、線状熱陰極と、前記線状陰極の一部に当接
し、多数の略矩形の孔部を有した線状熱陰極支持手段と
を備え、前記支持手段が前記線状陰極懸架方向と同一方
向の前記略矩形孔部間に、耐熱性絶縁材料を備え耐熱絶
縁製材料の塗布面積を限定したことを特徴とする電子ビ
ーム発生装置である。
In order to achieve this object, the electron beam generator of the present invention comprises an electron beam extraction electrode, a linear hot cathode, and a plurality of linear cathodes which are in contact with each other. And a linear hot cathode supporting means having substantially rectangular hole portions, and the supporting means is provided with a heat resistant insulating material between the substantially rectangular hole portions in the same direction as the linear cathode suspension direction. This is an electron beam generator characterized in that the application area of the material is limited.

【0019】更に、本発明の電子ビーム発生装置は、電
子ビーム取り出し電極と、線状熱陰極と、前記線状陰極
の一部に当接し、多数の略矩形の孔部を有した線状熱陰
極支持手段とを備え、その表面に耐熱絶縁製材料を備え
その耐熱絶縁製材料の電気電導率を増加させるために2
酸化クロムを含有したことを特徴としたことを特徴とす
る電子ビーム発生装置である。
Further, the electron beam generating apparatus of the present invention has a linear heat generating electrode, a linear hot cathode, and a linear heat contacting a part of the linear cathode and having a large number of substantially rectangular holes. A cathode supporting means, and a heat-resistant insulating material provided on the surface thereof to increase the electric conductivity of the heat-resistant insulating material.
An electron beam generator characterized in that it contains chromium oxide.

【0020】更に、本発明の電子ビーム発生装置は、電
子ビーム取り出し電極と、線状熱陰極と、前記線状陰極
の一部に当接し、多数の略矩形の孔部を有した線状熱陰
極支持手段とからなる。そして前記支持手段はその1表
面のほぼ全面に耐熱性の絶縁膜を塗布する。更に前記線
状陰極懸架方向と同一方向の前記略矩形孔部間以外に、
アルミニウム等の導電性薄膜を塗布し不所望な部分にチ
ャージアップしないようにしたことを特徴とする電子ビ
ーム発生装置である。
Further, the electron beam generating apparatus of the present invention comprises a linear heat generating electrode, a linear hot cathode, and a linear heat contacting a part of the linear cathode and having a large number of substantially rectangular holes. And cathode supporting means. Then, the supporting means coats a heat resistant insulating film on substantially the entire one surface thereof. Furthermore, other than between the substantially rectangular hole portions in the same direction as the linear cathode suspension direction,
This is an electron beam generator characterized in that a conductive thin film such as aluminum is applied so as not to charge up to an undesired part.

【0021】[0021]

【作用】上記構成によって、熱隠居の加熱にともなう熱
収縮や、機械的衝撃による弦振動を抑制しかつ、陰極周
辺の不所望なチャージアップを防止できるので高コント
ラストで輝度変動のない画質が実現可能となる。
With the above structure, it is possible to suppress the thermal contraction due to the heating of the thermal retreat and the string vibration due to the mechanical shock, and prevent the unwanted charge-up around the cathode. It will be possible.

【0022】[0022]

【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

【0023】図1は、本発明の電子ビーム発生手段を示
している。すなわち1はソーダガラス等を用いた絶縁基
盤で、表面には導電性薄膜によりストライプ状制御電極
2が形成されている。陰極支持手段3は厚み0.2mmの
金属板にエッチング等で孔部を設けた基板3aを形成し
た後、前記基板3a表面に耐熱性絶縁材料3bたとえば
Al23やSiO2等を約50μmの厚みで形成する。
形成方法は一般に溶射膜と呼ばれる方法で、前記耐熱性
絶縁材料を粒子形状のものを互いに結合させた状態で基
板上に堆積する方法をとる。
FIG. 1 shows the electron beam generating means of the present invention. That is, 1 is an insulating substrate using soda glass or the like, and stripe-shaped control electrodes 2 are formed on the surface by a conductive thin film. The cathode supporting means 3 forms a substrate 3a in which holes are formed on a metal plate having a thickness of 0.2 mm by etching or the like, and then a heat resistant insulating material 3b such as Al 2 O 3 or SiO 2 is formed on the surface of the substrate 3a by about 50 μm. It is formed with the thickness of.
The forming method is generally called a sprayed film, and the heat-resistant insulating material is deposited on the substrate in a state where particles of the heat-resistant insulating material are bonded to each other.

【0024】基板上に形成する溶射膜パターンは、マス
キングを施して行われる。そのパターンは陰極支持手段
3と当接する線状陰極4の当接部近傍で、詳しくは図2
のハッチングの部分になる。線状熱陰極と陰極支持手段
3の接触は点接触であることが望ましいが、本陰極の動
作は前記先行技術で述べたと同様にパルス駆動される。
このため線状熱陰極はその長手方向は無論のことその厚
み方向にも少なくとも200μm移動する。このため接
触部と線状熱陰極移動のための面積が耐熱性絶縁膜に必
要になってくる。なお線状熱陰極は、芯線が20〜30
μmのタングステン線でその周囲に芯線が7〜12μm
の巻線を施したいわゆるスパイラル線を用いる。
The sprayed film pattern formed on the substrate is masked. The pattern is in the vicinity of the abutting portion of the linear cathode 4 that abuts the cathode supporting means 3, and details are shown in FIG.
It becomes the hatched part. The contact between the linear hot cathode and the cathode supporting means 3 is preferably point contact, but the operation of the present cathode is pulse-driven as described in the above-mentioned prior art.
Therefore, the linear hot cathode moves not only in the longitudinal direction but also in the thickness direction by at least 200 μm. Therefore, the heat-resistant insulating film needs an area for moving the contact portion and the linear hot cathode. The linear hot cathode has a core wire of 20 to 30.
The core wire is 7-12 μm around the tungsten wire of μm
The so-called spiral wire with the winding of is used.

【0025】図3は本発明の他の実施例である。図3は
図1の構成と同様であるが、陰極支持手段上に設けられ
た溶射膜が全面にあることが異なっている。このとき溶
射膜の材料として従来のアルミナに加えて2酸化クロム
を加える。このことで耐熱性絶縁膜の物性値がその熱的
特性はほとんど変化することなく、電気電導度を増加さ
せることができる。このことで陰極支持手段上にチャー
ジアップすることがなくなる。
FIG. 3 shows another embodiment of the present invention. 3 is similar to the configuration of FIG. 1, except that the sprayed film provided on the cathode supporting means is on the entire surface. At this time, chromium dioxide is added to the material of the sprayed coating in addition to conventional alumina. As a result, the physical properties of the heat-resistant insulating film can be increased in electrical conductivity with almost no change in its thermal characteristics. This prevents the cathode supporting means from being charged up.

【0026】更に図4は、本発明の他の実施例である。
図3と同様に陰極支持手段のある1方の全面にアルミナ
等の耐熱性絶縁膜を形成した後に、図4のハッチングの
部分にアルミニウム等の導電性薄膜3cを蒸着等で形成
する。その結果不所望な部分へのチャージアップの問題
が解決される。
Further, FIG. 4 shows another embodiment of the present invention.
Similar to FIG. 3, a heat resistant insulating film such as alumina is formed on the entire surface of one side having the cathode supporting means, and then a conductive thin film 3c such as aluminum is formed on the hatched portion of FIG. 4 by vapor deposition or the like. As a result, the problem of charge-up to an undesired part is solved.

【0027】なお以上説明してきた実施例において前記
陰極支持手段の基板は、金属板上にエッチング等によっ
て孔部を設けたものに限らず絶縁物で形成されていても
かまわないのは当然である。
In the embodiment described above, the substrate of the cathode supporting means is not limited to the one having the holes formed on the metal plate by etching or the like, and may be formed of an insulating material. ..

【0028】[0028]

【発明の効果】以上のように本発明は、陰極支持手段上
に設けた耐熱性絶縁膜の膜形状を制限することで、ある
いは、耐熱性絶縁膜材料に2酸化クロムを添加すること
でその電気電導率を上げることで、あるいは、耐熱性絶
縁膜の一部にアルミニウムなどの導電性薄膜を形成する
ことで、陰極支持手段のチャージアップの問題を解決す
ることができた。その結果高コントラストな画像を実現
するための平板型画像表示用の電子ビーム発生手段を実
現できる。
As described above, according to the present invention, by limiting the film shape of the heat-resistant insulating film provided on the cathode supporting means or by adding chromium dioxide to the heat-resistant insulating film material, The problem of charge-up of the cathode supporting means could be solved by increasing the electric conductivity or by forming a conductive thin film such as aluminum on a part of the heat resistant insulating film. As a result, it is possible to realize an electron beam generating means for a flat panel image display for realizing a high-contrast image.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例における電子ビーム発生手段の
斜視図
FIG. 1 is a perspective view of an electron beam generating means in an embodiment of the present invention.

【図2】図1の電子ビーム発生装置の陰極支持手段の詳
細図
FIG. 2 is a detailed view of cathode supporting means of the electron beam generator of FIG.

【図3】本発明の他の実施例における電子ビーム発生手
段の斜視図
FIG. 3 is a perspective view of an electron beam generating means according to another embodiment of the present invention.

【図4】本発明の他の実施例における電子ビーム発生手
段の陰極支持手段を示す図
FIG. 4 is a view showing a cathode supporting means of an electron beam generating means in another embodiment of the present invention.

【図5】従来の平板型CRTの斜視図FIG. 5 is a perspective view of a conventional flat panel CRT.

【図6】線状熱陰極の加熱波形を示す図FIG. 6 is a diagram showing a heating waveform of a linear hot cathode.

【図7】従来の平板型CRTの電子ビーム発生手段近傍
のビーム軌道を示す図
FIG. 7 is a diagram showing a beam trajectory in the vicinity of an electron beam generating means of a conventional flat panel CRT.

【符号の説明】[Explanation of symbols]

1 絶縁基盤 2 制御電極 3 陰極支持手段 3c 導電性薄膜 4 スペーサ 5 線状陰極 DESCRIPTION OF SYMBOLS 1 Insulating substrate 2 Control electrode 3 Cathode supporting means 3c Conductive thin film 4 Spacer 5 Linear cathode

───────────────────────────────────────────────────── フロントページの続き (72)発明者 北尾 智 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Satoshi Kitao 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 電子ビーム取り出し電極と、金属の芯線
を有する線状陰極と、前記線状陰極の一部に当接し、多
数の略矩形の孔部を有した支持手段とを備え、前記支持
手段が前記線状陰極懸架方向と同一方向の前記略矩形孔
部間に、耐熱性絶縁材料を備えたことを特徴とする電子
ビーム発生装置。
1. An electron beam extraction electrode, a linear cathode having a metal core wire, and a supporting means that is in contact with a part of the linear cathode and has a large number of substantially rectangular holes. An electron beam generator characterized in that the means comprises a heat-resistant insulating material between the substantially rectangular hole portions in the same direction as the suspension direction of the linear cathode.
【請求項2】 電子ビーム取り出し電極と、金属の芯線
を有する線状陰極と、前記線状陰極の一部に当接し、多
数の略矩形の孔部を有した支持手段とを備え、前記支持
手段が耐熱性絶縁材料を備え、かつ前記線状陰極以外の
ほぼ全領域の表面に導電性被膜を備えたことを特徴とす
る電子ビーム発生装置。
2. An electron beam extraction electrode, a linear cathode having a metal core wire, and a supporting means that is in contact with a part of the linear cathode and has a large number of substantially rectangular hole portions. An electron beam generator characterized in that the means comprises a heat-resistant insulating material, and a conductive coating is provided on the surface of substantially the entire region except the linear cathode.
【請求項3】 電子ビーム取り出し電極と、金属の芯線
を有する線状陰極と、前記線状陰極の一部に当接し、少
なくとも1表面のほぼ全面に耐熱性膜がある支持手段と
を備え、前記支持手段の耐熱性絶縁材料に少なくとも2
酸化クロムを有することを特徴とする電子ビーム発生装
置。
3. An electron beam extraction electrode, a linear cathode having a metal core wire, and a supporting means that is in contact with a part of the linear cathode and has a heat-resistant film on at least one surface thereof. At least two heat-resistant insulating materials for the supporting means
An electron beam generator having chromium oxide.
JP14241792A 1992-06-03 1992-06-03 Electron beam emitter Pending JPH05343010A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14241792A JPH05343010A (en) 1992-06-03 1992-06-03 Electron beam emitter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14241792A JPH05343010A (en) 1992-06-03 1992-06-03 Electron beam emitter

Publications (1)

Publication Number Publication Date
JPH05343010A true JPH05343010A (en) 1993-12-24

Family

ID=15314850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14241792A Pending JPH05343010A (en) 1992-06-03 1992-06-03 Electron beam emitter

Country Status (1)

Country Link
JP (1) JPH05343010A (en)

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