JPH05332913A - Manufacture of fixed specimen for inspection reference of particle size distribution measuring apparatus - Google Patents
Manufacture of fixed specimen for inspection reference of particle size distribution measuring apparatusInfo
- Publication number
- JPH05332913A JPH05332913A JP4304431A JP30443192A JPH05332913A JP H05332913 A JPH05332913 A JP H05332913A JP 4304431 A JP4304431 A JP 4304431A JP 30443192 A JP30443192 A JP 30443192A JP H05332913 A JPH05332913 A JP H05332913A
- Authority
- JP
- Japan
- Prior art keywords
- particle size
- particle
- size distribution
- distribution measuring
- original
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title claims abstract description 110
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000007689 inspection Methods 0.000 title abstract description 4
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 13
- 238000012360 testing method Methods 0.000 claims description 3
- 230000036544 posture Effects 0.000 claims description 2
- 238000005259 measurement Methods 0.000 description 20
- 239000011521 glass Substances 0.000 description 19
- 238000001228 spectrum Methods 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 230000001186 cumulative effect Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000012795 verification Methods 0.000 description 6
- 238000003556 assay Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 238000001132 ultrasonic dispersion Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、光回折法または光散乱
法等に基づく粒度分布測定器の検定基準に使用される固
定標本の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a fixed sample used as a calibration standard for a particle size distribution measuring instrument based on a light diffraction method, a light scattering method or the like.
【0002】[0002]
【従来技術】一般に使用される光回折式の粒度分布測定
器は、第3図に示すような構成からなる。湿式測定の場
合、測定に供する粉体試料は、適当な分散液に投入さ
れ、超音波分散槽9内で充分に分散されてガラスセル6
に供給される。2. Description of the Related Art A commonly used optical diffraction type particle size distribution measuring device has a structure as shown in FIG. In the case of the wet measurement, the powder sample to be used for the measurement is put into an appropriate dispersion liquid and sufficiently dispersed in the ultrasonic dispersion tank 9 to be dispersed in the glass cell 6
Is supplied to.
【0003】このガラスセル6は、給入口と排出口を有
し、途中で分散液の均一な流れをつくる測定部が形成さ
れた通過型のセルであり、ポンプ10により試料の分散し
た液が超音波分散槽9、ガラスセル6、ポンプ10を循環
し、試料の均一な分散状態を維持してガラスセル6内を
通過するようにしてサンプリングエラーを少なくしてい
る。The glass cell 6 is a passage type cell having a supply port and a discharge port, and a measuring section for forming a uniform flow of the dispersion liquid is formed on the way. The ultrasonic dispersion tank 9, the glass cell 6, and the pump 10 are circulated to maintain a uniform dispersion state of the sample so that the sample passes through the glass cell 6 to reduce sampling errors.
【0004】一方このガラスセル6の測定部に照射され
る光はコヒーレントな光であり同例ではレーザー管1か
ら出射されたレーザー光が用いられる。レーザー管1か
ら出射されたレーザー光は、チョッパ2により断続的な
信号に交換されて進行し、ミラー3,4を経てビームエ
キスパンダー5で拡大平行光とされてガラスセル6の測
定部に投射される。On the other hand, the light applied to the measuring portion of the glass cell 6 is coherent light, and in this example, the laser light emitted from the laser tube 1 is used. The laser light emitted from the laser tube 1 is exchanged with an intermittent signal by the chopper 2 and travels, travels through the mirrors 3 and 4 and is converted into expanded parallel light by the beam expander 5 and projected on the measuring portion of the glass cell 6. It
【0005】ガラスセル6に投射された光は、分散媒中
に分散している粉体粒子に当たり、光回折現象を起こ
す。回折した光は、集光レンズ7で集められ、焦点面に
配置されたディテクタープレート8上にフラウンホーフ
ァの回折リングを結像する。The light projected onto the glass cell 6 hits the powder particles dispersed in the dispersion medium and causes a light diffraction phenomenon. The diffracted light is collected by the condenser lens 7 and forms an image on the diffraction ring of the Fraunhofer on the detector plate 8 arranged on the focal plane.
【0006】この回折リングの光軸中心からの半径Rは
光源波長λに比例し、分散している粒子の粒径(粒子
径)に反比例する。そして回折リングの所定半径位置に
おける回折光の強度は、その半径位置に対応する粒径の
粒子の量と次のエアリーの式に示す一定の関係を有す
る。The radius R from the center of the optical axis of the diffractive ring is proportional to the light source wavelength λ and inversely proportional to the particle diameter (particle diameter) of dispersed particles. The intensity of the diffracted light at the predetermined radial position of the diffractive ring has a constant relationship with the amount of particles having a particle size corresponding to the radial position, as shown in the following Airy equation.
【0007】[0007]
【数1】 [Equation 1]
【0008】Iは回折光強度、J1 は1次のベッセル関
数、k=2π/λ、aは粒子の半径、w =R/f(fは
レンズの焦点距離)、I0 は投射する(レーザー)光の
全エネルギー、Eはセンサーに到達する全エネルギー、
Sは投射する(レーザービーム等の)光束の光軸に垂直
な断面積である。I is the diffracted light intensity, J 1 is the first-order Bessel function, k = 2π / λ, a is the radius of the particle, w = R / f (f is the focal length of the lens), and I 0 is projected ( Laser) total energy of light, E is total energy reaching the sensor,
S is a cross-sectional area perpendicular to the optical axis of the projected light beam (such as a laser beam).
【0009】したがって回折リングの所定の各半径位置
の回折光強度より各半径位置に対応する粒径の粒子の割
合を算出して粒度分布を求めることができる。Therefore, the particle size distribution can be obtained by calculating the ratio of particles having a particle size corresponding to each radial position from the diffracted light intensity at each predetermined radial position of the diffraction ring.
【0010】そこでディテクタープレート8には、粒度
分布として表示するのに必要な各粒径に対応する半径位
置にセンサーを配置してそれぞれの回折光出力を検出す
るようにしている。Therefore, the detector plate 8 is provided with a sensor at a radial position corresponding to each particle size required for displaying as a particle size distribution, and each diffracted light output is detected.
【0011】このようにして粒度分布を測定した結果の
一例を第4図に図示する。同図において曲線は累積体積
分布を示し、棒グラフはヒストグラフであり、粒径を16
区分して、各粒径範囲(チャンネル)ごとに測定してい
る。An example of the result of measuring the particle size distribution as described above is shown in FIG. In the figure, the curve shows the cumulative volume distribution, the bar graph is the histograph, and the particle size is 16
It is classified and measured for each particle size range (channel).
【0012】以上のような原理に基づき粒度分布の測定
が行われるが、この光回折式粒度分布測定器が正しい粒
度分布を示しているかどうかが問題となる。これまでの
粒度分布測定器の検査方法としては、他の粒度分布測定
原理に基づく測定器による測定結果と比較する方法と一
定の粒度分布試料を作製して同試料による測定結果と比
較する方法とがある。The particle size distribution is measured based on the above principle, but it is a problem whether this optical diffraction type particle size distribution measuring device shows a correct particle size distribution. As the inspection method of the particle size distribution measurement device so far, there are a method of comparing with the measurement result by the measurement device based on other particle size distribution measurement principle and a method of making a certain particle size distribution sample and comparing with the measurement result by the same sample. There is.
【0013】前者に用いられる他の粒度分布測定原理に
は、ふるい分け法、顕微鏡法、沈降法、電気的検知帯法
等が代表的なものである。後者の検査法は、ふるいを用
いてごく狭い範囲の粒度域に調整した粒度域の異なる2
種以上の同一物質からなる試料をある重量比で混合して
人工的に作製した粒度分布が既知の試料を用いるもので
ある。The sieving method, the microscopic method, the sedimentation method, the electrical detection zone method, etc. are typical of the other particle size distribution measuring principles used in the former. The latter inspection method uses a sieve to adjust the particle size to a very narrow range.
A sample having a known particle size distribution, which is artificially prepared by mixing samples of the same substance of two or more species at a certain weight ratio, is used.
【0014】しかしながら前者の場合、測定原理が異な
ると測定結果が一致しないことが多く、他の測定原理の
いずれかを検定基準として定めるのは適切でない。また
後者の場合、粉体試料を調製して混合する際の粒度調製
操作において誤差が入り、粉体そのものが統計・確率的
誤差を含む存在であり、その誤差を検定基準として使用
するに足る程に充分小さくすること困難である。さらに
両者にいえることは測定器の検定に際し煩しい作業が避
けられないことである。In the former case, however, the measurement results often do not match when the measurement principles are different, and it is not appropriate to determine one of the other measurement principles as the verification standard. In the latter case, there is an error in the particle size adjustment operation when preparing and mixing the powder sample, and the powder itself contains statistical and stochastic errors, and it is sufficient to use the error as a verification standard. It is difficult to make it small enough. Furthermore, what can be said for both is that inconvenient work is unavoidable in the verification of the measuring device.
【0015】そこで例えば透明マスクに粒子像を固定し
た固定標本を用いることが考えられる。Therefore, for example, it is possible to use a fixed sample in which a particle image is fixed on a transparent mask.
【0016】[0016]
【解決しようとする課題】しかし実際の液中分散媒状態
に近い固定標本を作成することは難しい。通常粒子像を
ある密度で固定した標本を作成する場合、正方格子状に
配列するのが簡単でかつ確実な方法であり、これを実際
の分散媒中の粒子の如くランダムの配することは、却っ
て難しい。[Problems to be Solved] However, it is difficult to prepare a fixed sample close to the actual dispersion medium state in liquid. Usually, when preparing a sample in which a particle image is fixed at a certain density, it is a simple and reliable method to arrange it in a square lattice, and to arrange it randomly like particles in an actual dispersion medium, On the contrary, it's difficult.
【0017】しかるに同じ粒径の粒子像を同じ条件下で
同じ粒度分布測定装置で測定した場合、粒子像を正方格
子の如く規則的に配列したものとランダムに配列したも
のととでは、測定結果に違いが出る。したがって固定標
本として粒子像のランダム配列は検定精度を高くする上
で要求されるところである。However, when the particle images of the same particle size are measured by the same particle size distribution measuring device under the same conditions, the result of the measurement shows that the particle images are regularly arranged like a square lattice and randomly arranged. Makes a difference. Therefore, a random array of particle images as a fixed sample is required to improve the accuracy of the test.
【0018】本発明は、かかる点に鑑みなされたもの
で、その目的とする処は、粒子像をランダム配列した検
定基準用の固定標本を製造する方法を供する点にある。The present invention has been made in view of the above points, and an object thereof is to provide a method for producing a fixed sample for assay standard in which particle images are randomly arranged.
【0019】[0019]
【課題を解決するための手段および作用】上記目的を達
成するために本発明は、正方画面上に粒子像を所定個数
ランダムに配置した元図を作成し、同元図を縮小転写し
て所定単位面積の正方形のフォトレジスト用原画を作成
し、同原画を複数上下左右の姿勢をランダムに変えなが
ら縦横に敷きつめてフォトマスクを形成し、同フォトマ
スクを透明基板に焼きつけて粒子像を成膜して固定標本
を製造する粒度分布測定器の検定基準用固定標本の製造
方法とした。In order to achieve the above object, the present invention creates an original drawing in which a predetermined number of particle images are randomly arranged on a square screen, and reduces and transfers the original drawing to a predetermined size. Create a square photoresist original image with a unit area, and lay the original images vertically and horizontally while randomly changing the vertical and horizontal positions to form a photomask, and print the photomask on a transparent substrate to form a particle image. Then, a method for producing a fixed sample for a verification standard of a particle size distribution measuring instrument for producing a fixed sample was used.
【0020】ある設計に基づいて粒子像をランダムに配
置した元図を作成し、これを縮小転写した原画を配列す
るのに、上下左右の姿勢をランダムに変えながら敷きつ
めてフォトマスクを形成するので、フォトマスクは全面
に亘って粒子像がランダムに配列されている。Based on a certain design, an original drawing in which particle images are randomly arranged is created, and an original image obtained by reducing and transferring the original image is arranged. In order to form a photomask by randomly laying it up and down while vertically and horizontally. Particle images are randomly arranged over the entire surface of the photomask.
【0021】そしてこのフォトマスクを透明基板に焼き
つけて粒子像を成膜するので、製造された固定標本の粒
子像は何等規則性を持たずランダムに配列されている。Since the photomask is printed on a transparent substrate to form a particle image, the particle images of the manufactured fixed sample are randomly arranged without any regularity.
【0022】[0022]
【実 施 例】第1図および第2図は、本発明に係る一
実施例の方法により製造された固定標本および同固定標
本を粒度分布測定装置にセットした状態を示す。本実施
例の粒度分布測定の検定基準用固定標本20は、粒度分布
測定器の測定範囲に合わせて、その測定値の累積体積分
布曲線が直線となるように所定の粒子像を配列した固定
標本(ホワイトスペクトラム)である。EXAMPLE FIG. 1 and FIG. 2 show a fixed sample manufactured by the method of an example according to the present invention and a state in which the fixed sample is set in a particle size distribution measuring apparatus. The fixed sample 20 for the calibration standard of the particle size distribution measurement of the present example is a fixed sample in which predetermined particle images are arranged so that the cumulative volume distribution curve of the measured value becomes a straight line in accordance with the measurement range of the particle size distribution measuring instrument. (White spectrum).
【0023】固定標本20の基板21は、隣り合う辺の長さ
が1対2の比である長方形をした透明ガラス板であり、
材質としてはガラスのほか透明なアクリル等が考えられ
る。この基板2の半分は透明部分として残し、他の半分
の面積にクロム等の粒子像が配列され成膜されている。The substrate 21 of the fixed sample 20 is a rectangular transparent glass plate in which the length of adjacent sides is a ratio of 1: 2.
In addition to glass, transparent acrylic and the like can be considered as the material. Half of the substrate 2 is left as a transparent portion, and a particle image of chromium or the like is arranged and deposited in the other half area.
【0024】該固定標本20のホワイトスペクトラムは、
粒子像が全て円形で、同一平面上に全て配列され、その
体積換算濃度が0.1%で、累積体積分布曲線が粒径0〜
192μm で直線となるように設計されている。The white spectrum of the fixed sample 20 is
The particle images are all circular and are all arranged on the same plane, the volume conversion concentration is 0.1%, and the cumulative volume distribution curve is from 0 to
It is designed to be a straight line at 192 μm.
【0025】このホワイトスペクトラムの設計について
若干説明すると、上記条件の下で、粒度分布測定器の実
測チャンネルに対応して粒径0〜192 μm を16チャンネ
ルに区分し、各チャンネルごとに代表する粒径を定め、
同粒径の円形粒子像の2.8mm四方の面積(7.84mm2 )当
りの個数を算出する。実際の分散液の状態をホワイトス
ペクトラムの2次元分布に置き換えるのに光軸方向の奥
行1mmの偏平空間に対応させている。Explaining the design of this white spectrum a little, under the above conditions, the particle size of 0 to 192 μm is divided into 16 channels corresponding to the measured channels of the particle size distribution measuring instrument, and the representative particle of each channel is divided. Determine the diameter,
Calculate the number of circular particle images of the same size per 2.8 mm square area (7.84 mm 2 ). A flat space with a depth of 1 mm in the optical axis direction is used to replace the actual dispersion state with a two-dimensional distribution of the white spectrum.
【0026】したがって前記7.84mm2 の面積は最大粒径
166.4 μm の粒子像1個が占有する面積であり、粒子像
をレアウトする際の単位面積となる。以上より粒径0〜
192 μm における累積体積分布曲線が直線となる本ホワ
イトスペクトラムの設計仕様は次表のごとくである。Therefore, the area of 7.84 mm 2 is the maximum particle size.
The area occupied by one particle image of 166.4 μm is the unit area when the particle image is laid out. From the above, particle size 0
The following table shows the design specifications of this white spectrum in which the cumulative volume distribution curve at 192 μm is a straight line.
【0027】[0027]
【表1】 [Table 1]
【0028】かかる設計仕様の下で、まず2.8mm四方の
単位面積に対応する元図が作成される。元図は16種類の
粒径を有する各粒子像がその対応する個数分だけ、でき
るだけランダムに描かれる。Under such design specifications, an original drawing corresponding to a unit area of 2.8 mm square is first prepared. In the original drawing, each particle image having 16 kinds of particle diameters is drawn as randomly as possible by the corresponding number.
【0029】ランダム配列とすることは、実際の分散媒
中の粒子に準ずるためであり、正方格子は極めて例外的
な配列で、かかる規則的な配列は本明細書内でいうラン
ダム配列には含まれない。The random array is based on the particles in the actual dispersion medium, and the square lattice is a very exceptional array, and such a regular array is included in the random array in the present specification. I can't.
【0030】元図は縮小転写されて2.8mm四方のフォト
レジスト用の原画が作成される。この原画を、上下左右
姿勢をランダムに変えながら複数縦横に敷つめて39.2mm
四方のフォトマスクを形成する。The original image is reduced and transferred to form a 2.8 mm square original image for photoresist. 39.2mm by laying this original picture vertically and horizontally in multiple vertical and horizontal positions
A four-way photomask is formed.
【0031】したがってこのフォトマスクは39.2mm四方
全面に亘って粒子像が何ら規則性を持たずランダムに配
列されている。このフォトマスクに基づき透明ガラス基
板21の半分に焼きつけクロム粒子を成膜する。Therefore, in this photomask, particle images are randomly arranged over the entire surface of 39.2 mm square without any regularity. Based on this photomask, chrome particles are baked on half of the transparent glass substrate 21 to form a film.
【0032】このようにして製作された固定標本20は第
2図に図示するように光回折式粒度分布測定器のビーム
エキスパンダー5と集光レンズ7との間の測定位置すな
わち、前記ガラスセル6が配置されていた位置に装着さ
れて測定器の検定および調整に供される。As shown in FIG. 2, the fixed sample 20 manufactured in this manner is measured at a position between the beam expander 5 and the condenser lens 7 of the optical diffraction type particle size distribution measuring device, that is, the glass cell 6 described above. It is attached to the position where was placed and is used for verification and adjustment of the measuring instrument.
【0033】実際の検定に際しては、まず透明ガラス基
板21の透明部分を下にしてセットし、同透明部分にレー
ザービームが投射されるようにし、バックグラウンドと
しての光透過量を測定しておき、次いで透明ガラス基板
21を上下逆にして装着し粒子像成膜部分にレーザービー
ムが当たるようにセット(第2図に示す状態)して測定
する。In the actual test, first, the transparent portion of the transparent glass substrate 21 is set downward, the laser beam is projected onto the transparent portion, and the light transmission amount as the background is measured beforehand. Then transparent glass substrate
21 is mounted upside down, set so that the laser beam hits the particle image forming portion (the state shown in FIG. 2), and measurement is performed.
【0034】この両者の出力の差が粒子像による正味の
出力であり、前記の原理に基づいて解析して粒度分布を
求める。The difference between the two outputs is the net output by the particle image, and the particle size distribution is obtained by analysis based on the above-mentioned principle.
【0035】粒度分布測定器が正しい粒度分布を示して
いるならば、固定標本20(ホワイトスペクトラム)をセ
ットして測定した場合は、粒径0〜192 μm で累積体積
分布曲線は直線となるはずである。したがって固定標本
20を用いることで粒度分布測定器の測定レンジ全体が正
しい分布を示すかどうかを検定することができる。If the particle size distribution measuring instrument shows the correct particle size distribution, when the fixed sample 20 (white spectrum) is set and measured, the cumulative volume distribution curve should be a straight line with a particle size of 0 to 192 μm. Is. Therefore fixed sample
By using 20, it is possible to verify whether or not the entire measurement range of the particle size distribution analyzer shows a correct distribution.
【0036】また各チャンネルごとにディテクタープレ
ート8に配置されたセンサー出力を増幅する各アンプの
増幅率を加減することで累積体積分布曲線を直線にする
ことができ、測定レンジ全体の調整を容易に行うことが
できる。Also, the cumulative volume distribution curve can be made linear by adjusting the amplification factor of each amplifier for amplifying the sensor output arranged on the detector plate 8 for each channel, which facilitates the adjustment of the entire measurement range. It can be carried out.
【0037】なお透明ガラス基板21を装着する取付金具
はガラスセル6をも装着可能なものとすることで、容易
にガラスセル6と透明ガラス基板21との着脱・交換を行
なうことができる。実際の粉体を調製してその都度作る
ものではないので、調整による誤差等が全くない。The mounting metal fitting for mounting the transparent glass substrate 21 can also mount the glass cell 6, so that the glass cell 6 and the transparent glass substrate 21 can be easily attached and detached. Since the actual powder is not prepared and made each time, there is no error due to adjustment.
【0038】以上は固定標本20を光回折式粒度分布測定
器の検定および調整に用いたが、光散乱式の粒度分布測
定器についても同様に使用することができる。Although the fixed sample 20 is used for the calibration and adjustment of the light diffraction type particle size distribution measuring device in the above, the light scattering type particle size distribution measuring device can be similarly used.
【0039】一方ホワイトスペクトラムではなくある一
つの粒径に着目し、同粒径の単一円形粒子像をある濃度
でランダムに配列した固定標本も考えられる。かかる固
定標本はある特定のチャンネルの検定および調整を精度
良く行なうのに適している。On the other hand, focusing on one particle size instead of the white spectrum, a fixed sample in which single circular particle images of the same particle size are randomly arranged at a certain density is also conceivable. Such a fixed sample is suitable for performing accurate calibration and adjustment of a specific channel.
【0040】ホワイトスペクトラムは測定レンジ全体を
適当な精度で検定するものであり、個々のチャンネルに
のみ着目すると、近傍の粒径粒子像の影響を受けて高い
精度の調整が困難である。したがってある着目したチャ
ンネルについては単一粒径の固定標本を用いることで高
精度の検定および調整ができる。The white spectrum is for calibrating the entire measurement range with appropriate accuracy, and if attention is paid only to individual channels, it is difficult to adjust with high accuracy due to the influence of particle size particle images in the vicinity. Therefore, for a certain focused channel, highly accurate verification and adjustment can be performed by using a fixed sample having a single particle size.
【0041】また極めて狭い粒度分布を有する実際の粒
体に対応するには、粒径の異なる粒子像をある割合で混
合配列した固定標本を用いることが考えられる。In order to deal with actual particles having an extremely narrow particle size distribution, it is conceivable to use a fixed sample in which particle images having different particle sizes are mixed and arranged at a certain ratio.
【0042】以上の各種固定標本は、極めて扱い易く、
検定および調整作業に特別に他の測定装置を必要とせ
ず、操作も簡単で便利である。固定標本は経時変化はほ
とんどないので、常に安定した検定ができるとともに測
定器本体のレーザー管の劣化等による経時変化を容易に
検出できる。The above various fixed specimens are extremely easy to handle,
No special measuring device is required for the calibration and adjustment work, and the operation is simple and convenient. Since the fixed sample hardly changes with time, it is possible to always perform a stable assay and easily detect the change with time due to deterioration of the laser tube of the main body of the measuring instrument.
【0043】透明基板に粒子像を成膜する方法を採るこ
とで、個々の粒子像の大きさを自由に調整できる。特に
大粒径の粒子は、液中分散による実測においては沈澱し
てしまうので測定しにくく、また輸送も容易ではない
が、本固定標本では静止位置での測定が確実にできる。By adopting a method of forming a particle image on a transparent substrate, the size of each particle image can be freely adjusted. In particular, large-sized particles are difficult to measure because they precipitate during actual measurement by dispersion in a liquid, and are not easily transported, but with this fixed sample, measurement at a stationary position can be reliably performed.
【0044】また個々の粒子の形状、単位面積あたりの
個数、基板上のレイアウト等が自由に設定できるので、
実際の液中分散状態に対応させることができる。形状の
異なる粒子(例えば針状、矩形、円形状等)どうしの比
較測定すなわち形状の影響なども調べることができる。Since the shape of each particle, the number of particles per unit area, the layout on the substrate, etc. can be freely set,
It can correspond to the actual dispersion state in the liquid. It is also possible to investigate the comparative measurement of particles having different shapes (for example, needle shape, rectangular shape, circular shape, etc.), that is, the influence of shape.
【0045】なおフォトレジスト用の原画を使用して焼
きつけるときに、拡大縮小が自在なので1種類の原画で
異なる粒径の固定標本が容易に作成でき、量産も可能で
製作コストを低減することができる。When printing using an original image for a photoresist, it is possible to enlarge and reduce the size freely, so that it is possible to easily prepare fixed specimens having different particle sizes with one type of original image, mass production is possible, and the manufacturing cost can be reduced. it can.
【0046】またフォトマスクにおいて透明部分と不透
明部分とを反転させた新たなフォトマスクを使用して透
明基板に焼つけを行い粒子像を成膜させると、不透明部
分に粒子状の透明部分を形成するが、粒径が同じでれば
同一の光回折現象を生ずるので、かかる固定標本も同様
に測定器の検定および調整の基準用に使用できる。Further, when a transparent substrate is baked using a new photomask in which a transparent portion and an opaque portion are reversed in the photomask to form a particle image, a transparent particle portion is formed in the opaque portion. However, since the same light diffraction phenomenon occurs when the particle size is the same, such a fixed sample can also be used as a standard for calibration and adjustment of the measuring device.
【0047】その他粒子の像を感光させたフィルムも固
定標本として使用可能であり、基板と粒子像の一方を透
明とし他方を不透明とする2種類が考えられる。A film on which an image of particles is exposed can also be used as a fixed sample, and two types can be considered in which one of the substrate and the particle image is transparent and the other is opaque.
【0048】[0048]
【発明の効果】本発明は、粒子像をランダムに配列した
元図を縮小転写した原画を姿勢を変えて配列してフォト
マスクを形成し、このフォトマスクを焼きつけて固定標
本を製造するので、粒子像が何ら規則性を持たずランダ
ムに配列された検定精度の高い固定標本を容易に製造す
ることができる。According to the present invention, the original image obtained by reducing and transferring the original image in which the particle images are randomly arranged is arranged in different postures to form a photomask, and the photomask is printed to produce a fixed sample. It is possible to easily manufacture a fixed sample with high assay accuracy in which particle images are randomly arranged without any regularity.
【0049】個々の粒子の形状、単位面積あたりの個
数、基板上のレイアウト等が自由に設定できるので、実
際の液中分散状態に対応させて、同時に検定に便利な特
殊な粒子像のランダム配列を実現できる。Since the shape of each particle, the number of particles per unit area, the layout on the substrate, etc. can be set freely, a random array of special particle images that is convenient for the assay at the same time can be made to correspond to the actual dispersion state in liquid. Can be realized.
【0050】フォトマスクを透明基板に焼きつけるとき
に、拡大縮小が自在なので1種類の原画で異なる粒径の
固定標本が容易に作成でき、量産も可能で製作コストを
低減することができる。When a photomask is printed on a transparent substrate, it can be enlarged or reduced freely, so that fixed specimens of different particle sizes can be easily produced with one type of original image, mass production is possible, and the production cost can be reduced.
【図1】本発明に係る一実施例の方法により製造した検
定基準用固定標本を示す斜視図である。FIG. 1 is a perspective view showing a fixed sample for assay standard manufactured by a method according to an embodiment of the present invention.
【図2】同固定標本を粒度分布測定器にセットした状態
を示す要部説明図である。FIG. 2 is an explanatory view of relevant parts showing a state in which the fixed sample is set in a particle size distribution measuring instrument.
【図3】光回折式粒度分布測定器の説明図である。FIG. 3 is an explanatory diagram of an optical diffraction type particle size distribution measuring device.
【図4】同測定器により測定した結果の一例を示す図で
ある。FIG. 4 is a diagram showing an example of a result measured by the measuring device.
1…レーザー管、2…チョッパ、3,4…ミラー、5…
ビームエキスパンダー、6…ガラスセル、7…集光レン
ズ、8…ディテクタープレート、9…超音波分散槽、10
…ポンプ、20…固定標本、21…透明ガラス基板。1 ... Laser tube, 2 ... Chopper, 3, 4 ... Mirror, 5 ...
Beam expander, 6 ... Glass cell, 7 ... Condensing lens, 8 ... Detector plate, 9 ... Ultrasonic dispersion tank, 10
… Pump, 20… Fixed specimen, 21… Transparent glass substrate.
Claims (1)
に配置した元図を作成し、 同元図を縮小転写して所定単位面積の正方形のフォトレ
ジスト用原画を作成し、 同原画を複数上下左右の姿勢をランダムに変えながら縦
横に敷きつめてフォトマスクを形成し、 同フォトマスクを透明基板に焼きつけて粒子像を成膜し
て固定標本を製造することを特徴とする粒度分布測定器
の検定基準用固定標本の製造方法。1. An original drawing in which a predetermined number of particle images are randomly arranged on a square screen is created, and the original drawing is reduced and transferred to create a square photoresist original image having a predetermined unit area. A particle size distribution measuring device characterized in that a fixed sample is manufactured by forming a photomask by laying it vertically and horizontally while randomly changing the up, down, left, and right postures, and baking the photomask on a transparent substrate to form a particle image. Method for manufacturing fixed specimens for test standards.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4304431A JPH0695068B2 (en) | 1992-10-19 | 1992-10-19 | Manufacturing method of fixed sample for verification standard of particle size distribution measuring instrument |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4304431A JPH0695068B2 (en) | 1992-10-19 | 1992-10-19 | Manufacturing method of fixed sample for verification standard of particle size distribution measuring instrument |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1234581A Division JPH0399246A (en) | 1989-09-12 | 1989-09-12 | Fixed sample for verification standard for grain-size-distribution measuring instrument |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05332913A true JPH05332913A (en) | 1993-12-17 |
JPH0695068B2 JPH0695068B2 (en) | 1994-11-24 |
Family
ID=17932926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4304431A Expired - Lifetime JPH0695068B2 (en) | 1992-10-19 | 1992-10-19 | Manufacturing method of fixed sample for verification standard of particle size distribution measuring instrument |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0695068B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5936726A (en) * | 1995-03-10 | 1999-08-10 | Hitachi Ltd. | Inspection method, inspection apparatus and method of production of semiconductor device using them |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103604514B (en) * | 2013-12-13 | 2015-11-25 | 上海理工大学 | The measuring method of a kind of particle temperature δ v |
-
1992
- 1992-10-19 JP JP4304431A patent/JPH0695068B2/en not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
---|
OPTICAL ENGINEERING=1984 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5936726A (en) * | 1995-03-10 | 1999-08-10 | Hitachi Ltd. | Inspection method, inspection apparatus and method of production of semiconductor device using them |
Also Published As
Publication number | Publication date |
---|---|
JPH0695068B2 (en) | 1994-11-24 |
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