JPH05331643A - Coating method for aluminum by chemical vapor deposition - Google Patents
Coating method for aluminum by chemical vapor depositionInfo
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- JPH05331643A JPH05331643A JP4138728A JP13872892A JPH05331643A JP H05331643 A JPH05331643 A JP H05331643A JP 4138728 A JP4138728 A JP 4138728A JP 13872892 A JP13872892 A JP 13872892A JP H05331643 A JPH05331643 A JP H05331643A
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- reaction vessel
- alcl
- reaction
- hcl
- cvd
- Prior art date
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Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ガスタービン動・静翼
等に適用されるアルミニウム化学蒸着（以下ＣＶＤとい
う；Chemical Vapor Deposition)コーティング方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aluminum chemical vapor deposition (Chemical Vapor Deposition) coating method applied to gas turbine moving and stationary blades.
【０００２】[0002]
【従来の技術】コンバインドサイクルプラントに代表さ
れる高効率化された最近の産業用ガスタービンは、ター
ビン入口温度の上昇が著しく１３００℃以上となってい
る。この高温ガスに暴露される動・静翼に使用される耐
熱合金は精力的な研究開発が行なわれ、その許容使用温
度も年々上昇しているが、実用合金では８５０〜９００
℃にとどまっている。2. Description of the Related Art In a recent highly efficient industrial gas turbine represented by a combined cycle plant, the turbine inlet temperature rises significantly at 1300 ° C. or more. The heat-resistant alloys used in moving and stationary blades exposed to this high-temperature gas have undergone vigorous research and development, and their allowable operating temperatures are increasing year by year.
It stays at ℃.
【０００３】このため、実機ガスタービンでは、翼内面
に冷却孔を設けて空気を流通させ翼全体の温度を許容温
度以下に保つために、図２に示すようないわゆる空気冷
却翼が使用されている。For this reason, in an actual gas turbine, a so-called air cooling blade as shown in FIG. 2 is used in order to provide cooling holes on the inner surface of the blade to allow air to flow therethrough and keep the temperature of the entire blade at an allowable temperature or lower. There is.
【０００４】しかし、近年のガスタービン入口温度の上
昇は、この空気冷却孔の内面の温度をも上昇させ、なん
らかの高温酸化防止対策を施す必要が生じ、ガスタービ
ン動・静翼に高温耐食・耐酸化性を付与することが行な
われるようになってきている。However, the recent rise in the temperature of the gas turbine inlet also raises the temperature of the inner surface of the air cooling hole, and it becomes necessary to take some measure against high temperature oxidation, which results in high temperature corrosion resistance and acid resistance of the gas turbine dynamic and stationary blades. It is becoming more common to impart chemical properties.
【０００５】上記高温耐食・耐酸化性をガスタービン動
・静翼等に付与する従来の高温酸化・高温腐食防止対策
としては、金属表面技術便覧（金属表面技術協会編、２
５０〜２５５ページ）に記載されているように、アルミ
ナ（Ａｌ2 Ｏ3 ）、アルミニウム（Ａｌ）、塩化アンモ
ニア（ＮＨ4 Ｃｌ）の粉末中に被処理材を埋め込み、８
００〜１１００℃で還元性ガス（Ｈ2 ）を通すことによ
り、被処理材の表面にＡｌを析出させるパックセメンテ
ーションによるＡｌ拡散浸透処理（カロライジング法）
があった。As a conventional high-temperature oxidation / high-temperature corrosion prevention measure for imparting the above-mentioned high-temperature corrosion resistance / oxidation resistance to a gas turbine dynamic / static blade, etc., there is a Metal Surface Technology Handbook (edited by Metal Surface Technology Association, 2).
As described on pages 50 to 255), the material to be treated is embedded in a powder of alumina (Al 2 O 3 ), aluminum (Al), and ammonium chloride (NH 4 Cl).
Al diffusion and permeation treatment by pack cementation in which Al is deposited on the surface of the material to be treated by passing a reducing gas (H 2 ) at 00 to 1100 ° C. (calorizing method)
was there.
【０００６】また、最近では、被処理材の狭隘部にもコ
ーティング層を形成させるものとして、昇華させたＡｌ
Ｃｌ3 を減圧した反応炉内にキャリアガスのＨ2 ガスに
より送り込み、被処理材の表面にコーティング層を形成
させる減圧ＣＶＤ法が検討されている（第７７回講演大
会要旨集に掲載された「減圧ＣＶＤ法によるＮｉ管内孔
面へのＡｌコーティングの検討」、金属表面技術協会
編）。Recently, sublimated Al has been used as a material for forming a coating layer on a narrow portion of a material to be treated.
A low pressure CVD method for forming a coating layer on the surface of a material to be treated by feeding Cl 3 into a reactor in which H 2 gas has been decompressed has been studied (published in the 77th Annual Conference). Examination of Al Coating on Ni Tube Inner Hole Surface by Low Pressure CVD Method ", Metal Surface Technology Association).
【０００７】[0007]
【発明が解決しようとする課題】従来の方法において、
パックセメンテーションによるＡｌ拡散浸透処理方法の
場合は、ガスタービン動・静翼はＡｌ等の粉末中へ埋込
まれるが、狭隘な冷却孔内面にコーティング層を形成し
ようとしても粉末が冷却孔内に十分挿入できず、コーテ
ィングが不十分となることがあった。また、コーティン
グ後のこの粉末の除去が不十分な場合には、冷却孔を閉
塞させ重大な事故を招くという欠点があった。DISCLOSURE OF THE INVENTION In the conventional method,
In the case of the Al diffusion infiltration treatment method by pack cementation, the gas turbine moving and stationary blades are embedded in powder of Al or the like, but even if an attempt is made to form a coating layer on the inner surface of the narrow cooling hole, the powder remains inside the cooling hole. There was a case where it could not be inserted sufficiently and coating was insufficient. Further, if the removal of the powder after coating is insufficient, there is a drawback that the cooling hole is closed and a serious accident occurs.
【０００８】前記減圧ＣＶＤ法は、前記Ａｌ拡散浸透処
理方法の欠点を解消するために検討されているものであ
り、Ａｌをガス状の化合物として供給し、冷却孔表面で
Ａｌを析出させようとするものである。Ａｌ−ＣＶＤ反
応としては、前記のようにＡｌＣｌ3 の利用が知られて
いるが、ＡｌＣｌ3 は空気中の水分を吸って加水分解し
盛んに塩化水素を発生するなど極めて不安定で有害な物
質であり、工業的な取扱いが難しいという課題がある。The low-pressure CVD method has been studied in order to solve the drawbacks of the Al diffusion and infiltration treatment method, and Al is supplied as a gaseous compound to precipitate Al on the surface of the cooling hole. To do. As mentioned above, the use of AlCl 3 is known as the Al-CVD reaction, but AlCl 3 absorbs moisture in the air and hydrolyzes to actively generate hydrogen chloride, which is an extremely unstable and harmful substance. Therefore, there is a problem that industrial handling is difficult.
【０００９】本発明は上記の課題を解決しようとするも
のである。The present invention is intended to solve the above problems.
【００１０】[0010]
【課題を解決するための手段】本発明のＡｌ−ＣＶＤコ
ーティング方法は、金属Ａｌが設置されたＡｌ反応容器
内にＨＣｌを供給し金属ＡｌへＨＣｌを反応させてＡｌ
Ｃｌ3 を生成させた後、このＡｌＣｌ3 と未反応のＨＣ
ｌを金属Ａｌが設置され被処理材が配設されたＣＶＤ反
応容器内へ導入し、ＣＶＤ反応を生じさせて被処理材の
面にＡｌコーティング層を形成させることを特徴として
いる。According to the Al-CVD coating method of the present invention, HCl is supplied into an Al reaction vessel in which metallic Al is installed, and HCl is reacted with metallic Al to form Al.
After generating Cl 3 , the unreacted HC with this AlCl 3
It is characterized in that 1 is introduced into a CVD reaction container in which metallic Al is placed and a material to be treated is arranged to cause a CVD reaction to form an Al coating layer on the surface of the material to be treated.
【００１１】[0011]
【作用】上記において、金属Ａｌが設置されたＡｌ反応
容器内にＨＣｌが供給されると、次式によりガス状のＡ
ｌＣｌ3 が生成される。In the above, when HCl is supplied into the Al reaction vessel in which the metallic Al is installed, the gaseous A
lCl 3 is produced.
【００１２】２Ａｌ＋６ＨＣｌ→２ＡｌＣｌ3 ＋３Ｈ2 上記Ａｌ反応容器内で生成されたＡｌＣｌ3 は未反応の
ＨＣｌとともにＣＶＤ反応容器内に導入され、ＣＶＤ反
応容器内に設置された金属ＡｌをＨＣｌに反応させると
ともにＡｌＣｌ3 に反応させ、ＡｌＣｌ3 は次式に示す
分解反応を行い、３ＡｌＣｌ3 が生成される。2Al + 6HCl → 2AlCl 3 + 3H 2 AlCl 3 produced in the above Al reaction vessel is introduced into the CVD reaction vessel together with unreacted HCl, and metallic Al placed in the CVD reaction vessel is reacted with HCl. reacted AlCl 3, AlCl 3 performs a decomposition reaction shown in the following equation, 3AlCl 3 is generated.
【００１３】２ＡｌＣｌ3 ＋Ａｌ→３ＡｌＣｌ2 上記ＡｌＣｌ2 は、被処理材上で次式の反応を行い、Ａ
ｌを析出し、 ３ＡｌＣｌ2 →２ＡｌＣｌ3 被処理材の面にＡｌコーティング層を形成する。2AlCl 3 + Al → 3AlCl 2 The above AlCl 2 undergoes the reaction of the following formula on the material to be treated, and A
l is deposited and an Al coating layer is formed on the surface of the 3AlCl 2 → 2AlCl 3 treated material.
【００１４】上記により、ＡｌＣｌ3 の人手による直接
の取扱いを不要とし、反応容器中に金属Ａｌを設置すれ
ばよいものとしたため、作業の安全性の大幅向上を可能
とするとともに、作業コストの大幅低減を可能とする。
また、ＣＶＤ反応容器中におけるＨＣｌの残留を金属Ａ
ｌにより除去するため、被処理材や反応容器の損傷の防
止が可能となる。As described above, since it is not necessary to directly handle AlCl 3 by hand and it is only necessary to install metallic Al in the reaction vessel, it is possible to greatly improve the safety of work and greatly reduce the work cost. Enables reduction.
Further, the residue of HCl in the CVD reaction vessel is removed by the metal A.
Since it is removed by l, it is possible to prevent the material to be treated and the reaction container from being damaged.
【００１５】[0015]
【実施例】本発明の一実施例の方法に用いる装置を図１
に示す。図１に示す本実施例の方法に用いる装置は、電
気炉４内に設けられたＣＶＤ容器１、同ＣＶＤ容器１内
に設けられその内部に上下に１段動翼である被処理材２
とＡｌ７の入ったＡｌ容器３が配設された反応塔１３、
同反応塔１３の底部に一端が接続され他端にＡｒ供給ラ
インとＨ2 供給ラインがそれぞれ流量計１０とバルブ９
を介して接続され圧力計６が設けられたガス導入ライン
５、同ガス導入ライン５に接続されＡｒ供給ラインとＨ
Ｃｌ供給ラインがそれぞれ流量計１０とバルブ９を介し
て接続され内部にＡｌ７が充填されたＡｌ反応容器８、
上記ＣＶＤ容器１の底部に接続されたコールドトラップ
１１、および同コールドトラップ１１に接続されたロー
タリポンプ１２を備えている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an apparatus used in the method of one embodiment of the present invention.
Shown in. The apparatus used in the method of the present embodiment shown in FIG. 1 is a CVD container 1 provided in an electric furnace 4, and a material to be treated 2 that is a 1-stage moving blade vertically provided inside the CVD container 1.
And a reaction tower 13 provided with an Al container 3 containing Al7,
One end is connected to the bottom of the reaction tower 13, and the Ar supply line and the H 2 supply line are connected to the other end at the flow meter 10 and the valve 9, respectively.
Gas introduction line 5 connected via a pressure gauge 6 and an Ar supply line and H connected to the gas introduction line 5
An Al reaction vessel 8 in which Cl supply lines are respectively connected to the flowmeter 10 via a valve 9 and Al7 is filled therein,
A cold trap 11 connected to the bottom of the CVD container 1 and a rotary pump 12 connected to the cold trap 11 are provided.
【００１６】上記において、Ａｌ７が充填されたＡｌ反
応容器８内にはＨＣｌ供給ラインよりＨＣｌを供給し、
Ａｌ７とＨＣｌを反応させて次式によりＡｌＣｌ3 を生
成する。In the above, HCl is supplied from the HCl supply line into the Al reaction vessel 8 filled with Al7,
Al 7 is reacted with HCl to produce AlCl 3 according to the following formula.
【００１７】２Ａｌ＋６ＨＣｌ→２ＡｌＣｌ3 ＋３Ｈ2 上記Ａｌ反応容器８で生成されたガス状のＡｌＣｌ
3 は、Ｈ2 供給ラインより供給されるキャリアガスのＨ
2 ガスにより、ガス導入ライン５を介してその必要量が
反応塔１３内に導入される。2Al + 6HCl → 2AlCl 3 + 3H 2 Gaseous AlCl produced in the Al reactor 8
3 is H of carrier gas supplied from the H 2 supply line
The required amount of the two gases is introduced into the reaction tower 13 through the gas introduction line 5.
【００１８】上記ＡｌＣｌ3 が導入された反応塔１３内
には、Ａｌ７がＡｌ容器３内に配置されており、Ａｌ反
応容器８内で未反応であったＨＣｌをＡｌ７と反応させ
るとともに、次式に示すＡｌＣｌ3 の分解反応によって
ＡｌＣｌ2 を生成し、ＨＣｌの生成を防止する。Al 7 is placed in the Al container 3 in the reaction tower 13 into which AlCl 3 has been introduced. The unreacted HCl in the Al reaction container 8 is reacted with Al 7 and the following formula AlCl 2 is produced by the decomposition reaction of AlCl 3 shown in ( 3 ) and HCl is prevented from being produced.
【００１９】２ＡｌＣｌ3 ＋Ａｌ→３ＡｌＣｌ2 上記により生成されたＡｌＣｌ2 は次式に示す析出反応
を行い、被処理材２の表面にＡｌのコーティング層を生
成する。2AlCl 3 + Al → 3AlCl 2 The AlCl 2 produced as described above undergoes a precipitation reaction represented by the following equation to produce an Al coating layer on the surface of the material 2 to be treated.
【００２０】３ＡｌＣｌ2 →２ＡｌＣｌ3 ＋Ａｌ 本実施例においては、コーティング材であるＡｌ７を反
応塔１３内及びＡｌ反応容器８内に設置すればよいた
め、取扱いが極めて容易であり、人体に対しても無害で
ある。3AlCl 2 → 2AlCl 3 + Al In the present embodiment, since the coating material Al7 may be installed in the reaction tower 13 and the Al reaction vessel 8, it is extremely easy to handle and is suitable for the human body. It is harmless.
【００２１】ＣＶＤ反応に必要なＡｌＣｌ3 は、必要に
応じてＨＣｌとＡｌ７を反応させることにより必要量生
成するため、容易に分解して水分と激しく反応するＡｌ
Ｃｌ 3 を取扱う危険性と手間とが大幅に低減できる。AlCl required for CVD reaction3In need
Depending on the reaction, HCl and Al7 can be used to generate the required amount.
Al, which decomposes easily and reacts violently with water
Cl 3The risk of handling and labor can be reduced significantly.
【００２２】また、ＡｌＣｌ3 はＡｌ反応容器８内で生
成されるものであり、被処理材２のＣＶＤ処理後、Ａ
ｒ、Ｈ2 又はＡ2 とＨ2 によりラインをパージすること
により、Ａｌ反応容器８からコールドトラップ１１まで
のライン内に残留するＡｌＣｌ 3 は完全に除去すること
ができる。In addition, AlCl3Raw in the Al reaction vessel 8
After the CVD processing of the material 2 to be processed,
r, H2Or A2And H2To purge the line by
From Al reaction vessel 8 to cold trap 11
AlCl remaining in the line 3Be completely removed
You can
【００２３】更に、反応塔１３内にＡｌ７を設置し、反
応ガス中の残留ＨＣｌをなくし、ＡｌＣｌ3 をＡｌＣｌ
2 としているため、Ａｌ７の析出を容易にするとともに
被処理材２や反応塔１３の損傷（塩化腐食）を防止する
ことができる。Further, Al7 is installed in the reaction tower 13 to eliminate residual HCl in the reaction gas, and AlCl 3 is replaced with AlCl 3 .
Since it is set to 2 , it is possible to facilitate the precipitation of Al 7 and prevent damage to the material to be treated 2 and the reaction tower 13 (chlorination corrosion).
【００２４】本実施例の方法においては、コーティング
処理の性能確認のため、上記装置を用いて試験処理１，
２，３を行っており、以下にその内容と結果について説
明する。In the method of this embodiment, in order to confirm the performance of the coating treatment, the test treatment 1,
A few things have been done, and the contents and results will be explained below.
【００２５】上記試験処理１，２は、コーティング基材
として代表的な動翼材ＩＮ７３８ＬＣ（Ｎｉ−８．３Ｃ
ｏ−１６Ｃｒ−２．５Ｗ−３．４Ａｌ−３．４Ｔｉ−
１．７Ｔａ−１．７Ｍｏ−０．１Ｃ；各元素に付記した
数字はｗｔ％を示す）、及び静翼材ＥＣＹ７６８（Ｃｏ
−２４Ｃｒ−１０Ｎｉ−７Ｗ−４Ｔａ−０．５Ｃ）を用
い、表１に示す条件でガスタービン翼材へのコーティン
グ処理を行ったものである。In the test treatments 1 and 2, the typical blade material IN738LC (Ni-8.3C) as a coating substrate is used.
o-16Cr-2.5W-3.4Al-3.4Ti-
1.7Ta-1.7Mo-0.1C; the number added to each element indicates wt%), and the stationary blade material ECY768 (Co
-24Cr-10Ni-7W-4Ta-0.5C) was used to coat the gas turbine blade material under the conditions shown in Table 1.
【００２６】また、試験処理３は小型高温ガスタービン
の１段動翼の空気冷却孔内面へ表１に示す条件でコーテ
ィング処理を行ったものである。Further, in the test treatment 3, the inner surface of the air cooling hole of the first-stage moving blade of the small-sized high-temperature gas turbine was coated under the conditions shown in Table 1.
【００２７】[0027]
【表１】 [Table 1]
【００２８】上記試験処理により被処理材の表面に形成
されたＡｌコーティング層の膜厚については、試験片の
断面ミクロ組織検査及び電子プロープＸ線マイクロアナ
ライザ（ＥＰＭＡ）分析の結果、試験処理１のＩＮ７３
８ＬＣでは７０〜８０μｍ、ＥＣＹ７６８では５０〜６
０μｍ、また、試験処理２のＩＮ７３８ＬＣで７０〜１
００μｍ、ＥＣＹ７６８で６０〜８０μｍのＡｌコーテ
ィング層（Ａｌ拡散浸透層）が形成されていることが確
認された。Regarding the film thickness of the Al coating layer formed on the surface of the material to be treated by the above-mentioned test treatment, as a result of the cross-sectional microstructure inspection of the test piece and the electronic probe X-ray microanalyzer (EPMA) analysis, IN73
8 to 70 μm for LC, 50 to 6 for ECY768
0 μm, 70 to 1 by IN738LC of test treatment 2
It was confirmed that an Al coating layer (Al diffusion / permeation layer) having a thickness of 00 μm and ECY768 of 60 to 80 μm was formed.
【００２９】また、試験処理３では、空気冷却孔内面各
部についてＡｌコーティング形成量を同様に調査した結
果、６０〜８０μｍの範囲で全域にコーティングされて
いた。Further, in the test treatment 3, as a result of similarly examining the amount of Al coating formed on each inner surface of the air cooling hole, it was found that the entire area was coated in the range of 60 to 80 μm.
【００３０】上記試験処理を行った試験片については、
Ａｌコーティングにより耐酸化性の向上の評価試験を行
った。なお、試験処理１，２，３によるそれぞれの試験
片のＡｌコーティング厚さ（Ａｌ拡散浸透深さ）はほぼ
同等であったため、試験処理１によりコーティング処理
した試験片のみを用いた。Regarding the test piece which has been subjected to the above test treatment,
An evaluation test for improving the oxidation resistance was performed by the Al coating. Since the Al coating thickness (Al diffusion penetration depth) of each test piece by the test treatments 1, 2, and 3 was almost the same, only the test piece coated by the test treatment 1 was used.
【００３１】この試験片と無処理の試験片について、９
００℃空気中で１０００Ｈｒの高温酸化試験を行った結
果、その酸化量はＩＮ７３８ＬＣ、ＥＣＹ７６８とも
に、無処理材の１／１０〜１／５程度であり、すぐれた
耐酸化性を有することが確認された。Regarding this test piece and the untreated test piece, 9
As a result of a high temperature oxidation test of 1000 hr in air at 00 ° C., the oxidation amounts of both IN738LC and ECY768 were about 1/10 to 1/5 of those of the untreated material, and it was confirmed that they have excellent oxidation resistance. It was
【００３２】なお、本実施例の方法においては、被処理
材と接触する反応ガスの流速は、被処理材の大きさ（コ
ーティング範囲）により異なるが、およそ０．１〜１．
０ｍ／ｓの範囲が適切である。In the method of this embodiment, the flow rate of the reaction gas contacting the material to be treated varies depending on the size (coating range) of the material to be treated, but is about 0.1 to 1.
A range of 0 m / s is suitable.
【００３３】また、Ａｌ反応容器の温度は、ＡｌとＨＣ
ｌとの反応速度、ＡｌＣｌ3 の蒸気圧、ガス導入管の保
温性を考慮すると、２５０〜４５０℃が好ましい。ＣＶ
Ｄ反応における温度は、被処理物の材質により異なる
が、Ｎｉ及びＣｏ基合金のガスタービン材料ではＮｉ−
Ａｌ、Ｃｏ−Ａｌ化合物の形体とＡｌの拡散速度より８
００〜１１００℃となる。また、圧力及び反応時間はコ
ーティング層の均一性と要求膜厚より決定する（圧力は
常圧又は減圧とも可能）。The temperature of the Al reaction container is
Considering the reaction rate with 1, the vapor pressure of AlCl 3 , and the heat retaining property of the gas introduction pipe, 250 to 450 ° C. is preferable. CV
The temperature in the D reaction varies depending on the material of the object to be treated, but Ni- and Co-based alloy gas turbine materials are Ni
8 from the form of Al and Co-Al compounds and the diffusion rate of Al
It becomes 00-1100 degreeC. The pressure and reaction time are determined by the uniformity of the coating layer and the required film thickness (pressure can be atmospheric pressure or reduced pressure).
【００３４】[0034]
【発明の効果】本発明のガスタービン動・静翼用Ａｌ−
ＣＶＤコーティング方法は、金属Ａｌが設置されたＡｌ
反応容器内にＨＣｌを供給してＡｌＣｌ3 を生成し、こ
のＡｌＣｌ3 を金属Ａｌと被処理材が設置されたＣＶＤ
反応容器内に導入し、ＣＶＤ反応を生じさせて被処理材
の面にＡｌコーティング層を形成させることによって、
ＡｌＣｌ3 の人手による直接の取扱いを不要とし、反応
容器中に金属Ａｌを設置すればよいものとしたため、作
業の安全性の大幅向上を可能とするとともに、作業コス
トの大幅低減を可能とする。また、ＣＶＤ反応容器中に
おけるＨＣｌの残留を金属Ａｌにより除去するため、被
処理材や反応容器の損傷の防止が可能となる。EFFECT OF THE INVENTION Al-for gas turbine moving / stator blades of the present invention
The CVD coating method uses Al with metallic Al installed.
HCl is supplied into the reaction vessel to generate AlCl 3 , and this AlCl 3 is deposited on the metal Al and the material to be processed by CVD.
By introducing into the reaction vessel and causing a CVD reaction to form an Al coating layer on the surface of the material to be treated,
Since it is not necessary to directly handle AlCl 3 by hand and metal Al may be installed in the reaction vessel, it is possible to greatly improve the safety of the work and significantly reduce the work cost. Further, since the HCl residue in the CVD reaction container is removed by the metal Al, it is possible to prevent the material to be processed and the reaction container from being damaged.
【図１】本発明の一実施例の方法に係る装置の説明図で
ある。FIG. 1 is an explanatory diagram of an apparatus according to a method of an embodiment of the present invention.
【図２】ガスタービン空気冷却翼（第一段動翼）の構造
図である。FIG. 2 is a structural diagram of a gas turbine air cooling blade (first stage moving blade).
１ ＣＶＤ容器 ２ 被処理材 ３ Ａｌ容器 ４ 電気炉 ５ ガス導入ライン ６ 圧力計 ７ Ａｌ ８ Ａｌ反応容器 ９ バルブ １０ 流量計 １１ コールドトラップ １２ ロータリポンプ １３ 反応塔 DESCRIPTION OF SYMBOLS 1 CVD container 2 Processed material 3 Al container 4 Electric furnace 5 Gas introduction line 6 Pressure gauge 7 Al 8 Al reaction vessel 9 Valve 10 Flowmeter 11 Cold trap 12 Rotary pump 13 Reaction tower
─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成４年７月２９日[Submission date] July 29, 1992
【手続補正１】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００１２[Correction target item name] 0012
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【００１２】２Ａｌ＋６ＨＣｌ→２ＡｌＣｌ3 ＋３Ｈ2 上記Ａｌ反応容器内で生成されたＡｌＣｌ3 は未反応の
ＨＣｌとともにＣＶＤ反応容器内に導入され、ＣＶＤ反
応容器内に設置された金属ＡｌをＨＣｌに反応させると
ともにＡｌＣｌ3 に反応させ、ＡｌＣｌ3 は次式に示す
分解反応を行い、３ＡｌＣｌ 2 が生成される。2Al + 6HCl → 2AlCl 3 + 3H 2 AlCl 3 produced in the above Al reaction vessel is introduced into the CVD reaction vessel together with unreacted HCl, and metallic Al placed in the CVD reaction vessel is reacted with HCl. reacted AlCl 3, AlCl 3 performs a decomposition reaction shown in the following equation, 3AlCl 2 is generated.
【手続補正２】[Procedure Amendment 2]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００１３[Correction target item name] 0013
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【００１３】２ＡｌＣｌ3 ＋Ａｌ→３ＡｌＣｌ2 上記ＡｌＣｌ2 は、被処理材上で次式の反応を行い、Ａ
ｌを析出し、 ３ＡｌＣｌ2 →２ＡｌＣｌ 3 ＋Ａｌ 被処理材の面にＡｌコーティング層を形成する。2AlCl 3 + Al → 3AlCl 2 The above AlCl 2 undergoes the reaction of the following formula on the material to be treated, and A
l is deposited and an Al coating layer is formed on the surface of the 3AlCl 2 → 2AlCl 3 + Al treated material.
【手続補正３】[Procedure 3]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００１７[Correction target item name] 0017
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【００１７】２Ａｌ＋６ＨＣｌ→２ＡｌＣｌ3 ＋３Ｈ2 上記Ａｌ反応容器８で生成されたガス状のＡｌＣｌ
3 は、Ａｒ供給ラインより供給されるキャリアガスのＡ
ｒガスにより、ガス導入ライン５を介してその必要量が
反応塔１３内に導入される。2Al + 6HCl → 2AlCl 3 + 3H 2 Gaseous AlCl produced in the Al reactor 8
3 is A of carrier gas supplied from the Ar supply line
The required amount of r gas is introduced into the reaction column 13 via the gas introduction line 5.
【手続補正４】[Procedure amendment 4]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００２２[Name of item to be corrected] 0022
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【００２２】また、ＡｌＣｌ3 はＡｌ反応容器８内で生
成されるものであり、被処理材２のＣＶＤ処理後、Ａ
ｒ、Ｈ2 又はＡｒとＨ2 によりラインをパージすること
により、Ａｌ反応容器８からコールドトラップ１１まで
のライン内に残留するＡｌＣｌ 3 は完全に除去すること
ができる。In addition, AlCl3Raw in the Al reaction vessel 8
After the CVD processing of the material 2 to be processed,
r, H2Or ArAnd H2To purge the line by
From Al reaction vessel 8 to cold trap 11
AlCl remaining in the line 3Be completely removed
You can
───────────────────────────────────────────────────── フロントページの続き (72)発明者 高橋 孝二 兵庫県高砂市荒井町新浜二丁目１番１号 三菱重工業株式会社高砂製作所内 (72)発明者 谷村 武俊 兵庫県高砂市荒井町新浜二丁目８番25号 高菱エンジニアリング株式会社内 (72)発明者 鶴 聡 兵庫県高砂市荒井町新浜二丁目１番１号 中外テクノス株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Koji Takahashi 2-1-1, Niihama, Arai-cho, Takasago, Hyogo Prefecture Mitsubishi Heavy Industries, Ltd. Takasago Works (72) Inventor Taketoshi Tanimura 2--8, Niihama, Arai-cho, Takasago, Hyogo Prefecture No. 25 Takahishi Engineering Co., Ltd. (72) Inventor Satoshi Tsuru 2-1-1, Niihama, Arai Town, Takasago City, Hyogo Prefecture Chugai Technos Co., Ltd.
Claims (1)
ＨＣｌを供給し金属ＡｌへＨＣｌを反応させてＡｌＣｌ
3 を生成させた後、このＡｌＣｌ3 と未反応のＨＣｌを
金属Ａｌが設置され被処理材が配設された化学蒸着反応
容器内へ導入し、化学蒸着反応を生じさせて被処理材の
面にＡｌコーティング層を形成させることを特徴とする
アルミニウム化学蒸着コーティング方法。1. HCl is supplied into an Al reaction vessel in which metallic Al is installed, and HCl is reacted with metallic Al to produce AlCl.
After generating 3 , the AlCl 3 and unreacted HCl are introduced into the chemical vapor deposition reaction vessel in which the metal Al is installed and the material to be treated is placed, and a chemical vapor deposition reaction is caused to generate a surface of the material to be treated. An aluminum chemical vapor deposition coating method comprising: forming an Al coating layer on the aluminum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13872892A JP3165506B2 (en) | 1992-05-29 | 1992-05-29 | Aluminum chemical vapor deposition coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13872892A JP3165506B2 (en) | 1992-05-29 | 1992-05-29 | Aluminum chemical vapor deposition coating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05331643A true JPH05331643A (en) | 1993-12-14 |
| JP3165506B2 JP3165506B2 (en) | 2001-05-14 |
Family
ID=15228774
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13872892A Expired - Lifetime JP3165506B2 (en) | 1992-05-29 | 1992-05-29 | Aluminum chemical vapor deposition coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3165506B2 (en) |
Cited By (1)
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|---|---|---|---|---|
| CN115786759A (en) * | 2022-11-11 | 2023-03-14 | 广州众山精密科技有限公司 | Equipment and method for preparing near-net-shape aluminum-based silicon carbide foil by gas-phase aluminizing |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101951383B1 (en) * | 2016-12-07 | 2019-02-22 | 박은도 | Stage equipment having a support body which can transform the shape and control the length |
-
1992
- 1992-05-29 JP JP13872892A patent/JP3165506B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115786759A (en) * | 2022-11-11 | 2023-03-14 | 广州众山精密科技有限公司 | Equipment and method for preparing near-net-shape aluminum-based silicon carbide foil by gas-phase aluminizing |
| CN115786759B (en) * | 2022-11-11 | 2024-06-04 | 广州众山精密科技有限公司 | Equipment and method for preparing near-net-shaped aluminum-based silicon carbide foil by gas phase aluminizing |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3165506B2 (en) | 2001-05-14 |
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