JPH05326481A - Board cleaning device - Google Patents

Abstract

PURPOSE:To improve removing effect of foreign materials adhered to a board by an impact of cleanser from all directions. CONSTITUTION:The board cleaning device comprises a board support base 2 for holding a board 1 to be rotatably driven, and at least two nozzles 5 arranged above the base 2 to inject cleanser 4 pressurized while oscillating along a trace 3 passing a meeting center of the base 2. At least one of the nozzles 5 injects the cleanser 4 in parallel with the trace 3 obliquely from above toward the board 1, and at least the other injects cleaner 4 crossing the trace 3 obliquely from above toward the board 1.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus,
The present invention relates to a substrate cleaning apparatus in which at least two nozzles are provided and foreign substances adhering to the surface of a substrate are hit from all directions to improve the removal effect.

In recent years, for example, semiconductor devices such as silicon wafers for semiconductor devices, glass plates for flat displays such as LCDs, and Al plates for recording media such as magnetic disks have been formed on various substrates. The progress of process technology for making various electronic devices by applying films and patterning is remarkable.

In the surface treatment of the substrate in the manufacturing process of these various electronic devices, various physical and chemical process techniques are used for the treatments such as film formation, etching and peeling.

However, in any of the treatments, a cleaning process for removing contaminants contaminating the substrate and cleaning the surface of the substrate first raises the manufacturing yield and improves the productivity and reliability. It is indispensable from the top. In particular, how effectively the final finishing of the cleaning process is performed is important.

[0005]

2. Description of the Related Art In the cleaning process, various methods are adopted depending on what is replaced with the cleaning agent in the final process.
It is cheap and easy to handle, and it is often done from the viewpoint of environmental protection by finally rinsing with water. Deionized water that has passed through an ion exchange resin, so-called pure water, is generally used for this water washing.

FIG. 4 is an explanatory view of an example of a conventional cleaning device.
FIG. 4A is a schematic perspective view, and FIG. 4B is an enlarged perspective view of the main part. 1 is a substrate, 2 is a substrate support, 3 is a locus, 4 is a cleaning liquid, 5 is a nozzle, 6 is a contaminant, and 10 is a cleaning device.

In FIG. 4, a conventional cleaning apparatus 10 is composed of a substrate support base 2 which holds a substrate 1 and is driven to rotate, and a nozzle 5 which is arranged above the substrate support base 2 and swings. ing.

The substrate 1 is a circular silicon wafer or a rectangular glass plate used in a flat display or the like. Then, it is held by a vacuum chuck or the like on the substrate support base 2 that is rotationally driven.

The cleaning liquid 4 is a solution of various organic or inorganic cleaning agents, and pure water used for finishing the cleaning process is one of them. Then, the cleaning liquid 4 is held by the substrate support base 2 and is sprayed in a beam shape on the substrate 1 to be cleaned by being pressurized by the nozzles 5.

The nozzle 5 swings along an arcuate locus 3 through the center of rotation of the substrate support 2. The locus 3 may oscillate on a straight line that crosses the center of rotation.

If the cleaning liquid 4 is jetted perpendicularly to the substrate 1, the cleaning liquid 4 scatters and the cleaning effect is not improved. Therefore, the nozzle 5 is inclined and supported so as to eject the cleaning liquid 4 in parallel with the trajectory 3 from diagonally above the substrate 1. Therefore, the cleaning liquid 4 strikes the surface of the substrate 1 obliquely from above, synergistically with the centrifugal force acting on the surface of the rotating substrate 1, and adheres to the surface of the substrate 1 to contaminate the surface. Wash away item 6.

For cleaning, the substrate 1 is, for example, 2
While rotating at a speed of about 00 rotations, the nozzle 5 is rocked a proper number of times to hit the surface of the substrate 1 with the cleaning liquid 4. As described above, in the conventional cleaning device 10, one nozzle 5 is used, and the nozzle 5 is arranged so that the cleaning liquid 4 is jetted in a beam shape from an obliquely upper direction to clean the surface of the rotating substrate 1. Was.

[0013]

However, in such a conventional cleaning apparatus 10, if one foreign matter 6 adhering to the surface of the substrate 1 rotating in the direction of the arrow R is noticed, this foreign matter is detected. The object 6 is sprayed by the cleaning liquid 4 in a direction parallel to the trajectory 3, that is, (O → A, B → O) and (A →
You can only hit from two directions (O, B → O). Therefore, depending on the shape of the contaminants 6, the state in which they are attached to the surface of the substrate 1, and the orientation, for example, as shown in FIG. 4B, the cleaning liquid 4 impacts in parallel to the longitudinal direction of the contaminants 6. Therefore, it often happens that the impact cross section is narrow and the removal effect is not improved.

Further, the cleaning liquid 4 covering the surface of the substrate 1
Cleaning solution 4 spouted into a beam due to the buffer effect of the film
There was a problem that the impact of hitting the surface of the substrate 1 was alleviated, and the effect of removing the contaminants 6 was diminished.

Therefore, according to the present invention, at least two nozzles are provided, and the removal effect is improved by hitting the contaminants adhering to the surface of the substrate with the cleaning liquid 4 ejected in a beam shape from all directions. The purpose is to provide a cleaning device.

[0016]

SUMMARY OF THE INVENTION The above-mentioned problems are solved by a substrate supporting base which holds a substrate and is rotationally driven, and a rotation center of the substrate supporting base which is disposed above the substrate supporting base. It has at least two nozzles for ejecting a pressurized cleaning liquid while swinging along a trajectory, at least one of the nozzles ejects the cleaning liquid parallel to the trajectory from obliquely upward toward the substrate. At least the other of the jets is solved by a substrate cleaning apparatus configured to jet the cleaning liquid obliquely from above toward the substrate so as to intersect the trajectory.

[0017]

In the conventional substrate cleaning apparatus, since the cleaning liquid is jetted by one nozzle, even if the substrate is rotated and the nozzle is rocked, the contaminants adhering to the substrate are impacted from only two directions. However, in the present invention, the impact of the cleaning liquid can be applied from all directions of the contaminants.

That is, at least two nozzles are provided, and one nozzle is in parallel with the trajectory of the nozzles and the other nozzle is intersected with the nozzle so that the cleaning liquid is ejected.

As a result, the contaminants adhering to the substrate rotate about the oscillating nozzle in association with the rotation of the substrate, so that the cleaning liquid ejected in a crossed manner causes impact from all directions. Added. As a result, it is possible to remove contaminants that were difficult to remove in the conventional case, and the efficiency of the cleaning process can be improved.

[0020]

1 is an explanatory view of a first embodiment of the present invention, and FIG. 1 (A) is a partially cutaway perspective view showing the entire structure, FIG.
3B is an enlarged perspective view of a main part, FIG. 2 is an explanatory view of a cleaning effect, FIG. 3 is an explanatory view of a second embodiment of the present invention, and FIG.
FIG. 3A is a schematic perspective view, and FIG. 3B is a perspective view of an example of a nozzle. In the figure, 1 is a substrate, 2 is a substrate support, 3 is a locus, 4 is a cleaning liquid, 5 is a nozzle, 5a is a first nozzle, 5b is a second nozzle, 5c is a third nozzle, and 5d is a fourth nozzle. No. 6, No. 6 is a contaminant, and No. 10 is a cleaning device.

Embodiment 1 In FIG. 1, a cleaning apparatus 10 according to the present invention comprises a substrate support base 2 which holds a substrate 1 and is driven to rotate, and a substrate support base 2 which is disposed above the substrate support base 2. It is composed of a locus 3 passing through a rotation center O of the table 2, that is, a nozzle 5 swinging along O → A → O → B → O. A cleaning liquid 4 such as pure water pressurized by a pump (not shown) is ejected from the nozzle 5.

As shown in FIG. 1B, the tip of the nozzle 5 is branched into a first nozzle 5a and a second nozzle 5b.
The first nozzle 5a ejects the cleaning liquid 4 in parallel with the trajectory 3 of rocking, and the second nozzle 5b ejects the cleaning liquid 4 so as to intersect the trajectory 3.

By the way, when the nozzle 5 passes through O → A → O and when passes through O → B → O, the directions of the impurities 6 are reversed. Therefore, when the nozzle 5 repeats positive and negative movements while the substrate 1 rotates, the contaminants 6 adhering to the substrate 1 have an opportunity to be impacted by the cleaning liquid 4 from all directions as shown in FIG. As a result, the contaminants 6 which are difficult to be removed by the impact of the cleaning liquid 4 mainly from only two directions as in the conventional cleaning device are also removed.

Example 2 In FIG. 3 (A), the cleaning liquid 4 is jetted in parallel along the locus 3 from two opposite directions so as to intersect with the locus 3 and from two opposite directions. Each is designed to impact different positions.

Such a function can be realized by using the nozzle 5 as shown in FIG. 3 (B), for example. That is,
The tip of the nozzle 5 is provided with a third nozzle 5c facing the first nozzle 5a and a fourth nozzle 5d facing the second nozzle 5b, and is branched into four arms.

In this case, the chances of swinging the nozzle 5 and rotating the substrate 1 as described in the first embodiment to reverse the direction of the contaminants 6 are doubled. Therefore, the effect of removing the impurities 6 can be exhibited in a short time.

The shape of the nozzle 5 may be modified in various ways such that the tip portion is unitized and attached to the tip of an arm that swings the nozzle unit. Further, the locus 3 on which the nozzle 5 swings may be arcuate or linear, passing through the center of rotation of the substrate 1. Further, the cleaning liquid 4 may be an organic solvent, an aqueous solution of detergent, or the like in addition to pure water.

[0028]

According to the substrate cleaning apparatus of the present invention, when the contaminants adhering to the substrate are removed by the impact of the cleaning liquid ejected from the nozzle, the impacts can be applied from all directions of the contaminants. ..

Therefore, in the conventional cleaning apparatus, it is possible to remove the contaminants which are difficult to remove depending on the shape and the adhered state. Has a large contribution.

[Brief description of drawings]

FIG. 1 is an explanatory view of a first embodiment of the present invention, (A) is a partially cutaway perspective view showing the entire configuration, and (B) is an enlarged perspective view of a main part.

FIG. 2 is an explanatory diagram of a cleaning effect.

3A and 3B are explanatory views of a second embodiment of the present invention, FIG. 3A is a schematic perspective view, and FIG. 3B is a perspective view of an example of a nozzle.

FIG. 4 is an explanatory view of an example of a conventional cleaning apparatus, (A) is a schematic perspective view, and (B) is an enlarged perspective view of a main part.

[Explanation of symbols]

1 substrate 2 substrate support 3 trajectory 4 cleaning liquid 5 nozzle 5a first nozzle 5b
2nd nozzle 5c 3rd nozzle 5d 4th nozzle 6 Contaminants 10 Cleaning device

Claims (3)

[Claims] 1. A substrate supporting base (2) which holds a substrate (1) and is driven to rotate, and a substrate supporting base (2) disposed above the substrate supporting base (2),
The substrate support base (2) has at least two nozzles (5) for ejecting the cleaning liquid (4) pressurized while swinging along a locus (3) passing through the center of rotation of the substrate support base (2). ) Indicates that at least one of the cleaning solutions is parallel to the trajectory (3) from diagonally above toward the substrate (1).
(4) is jetted, and the cleaning liquid (4) is so arranged that at least the other crosses the locus (3) obliquely from above toward the substrate (1).
A substrate cleaning apparatus, characterized in that the substrate is ejected. 2. The substrate cleaning apparatus according to claim 1, wherein the cleaning liquid (4) is pure water. 3. The substrate cleaning apparatus according to claim 1, wherein the cleaning liquid (4) impacts different positions on the substrate (1) when ejected from the nozzle (5).