JPH05296655A - Device for drying quartz jig - Google Patents

Abstract

PURPOSE:To provide a device for drying a quartz jig capable of performing a rapid drying process for a quartz jig having a complex shape within clean atmosphere. CONSTITUTION:A dry vacuum pump 12 is connected to a vacuum tank 10 and an upper part of the vacuum tank is provided with a microwave oscillator 14 for use in radiating micro-wave within the vacuum tank. As a quartz jig 16 is inserted into the vacuum tank and the tank is sealingly closed, an inside part of the vacuum tank 10 is drawn with vacuum by the dry vacuum pump to cause its pressure to be reduced and then cleaning liquid remained on the surface of the quartz jig is rapidly gasified. At this time, the gasification is rapidly promoted to cause gasification heat to be deprived through thermal insulated expansion, resulting in that its temperature is decreased, so that a micro-wave is radiated from the micro-wave oscillator into the vacuum tank to perform a heating operation there, the deprived heat is restored from outside and coagulation of the cleaning liquid is prevented.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a quartz jig drying apparatus for handling semiconductor materials such as silicon in a semiconductor manufacturing process.

[0002]

2. Description of the Related Art A jig used for performing a predetermined process on various semiconductor materials in a semiconductor manufacturing process is made of quartz in order to prevent impurities from being mixed into the semiconductor material. There is. Then, before actually using it for the processing of the semiconductor material, the quartz jig is cleaned with a predetermined cleaning liquid to remove impurities from the surface of the quartz jig. Since it remains, the quartz jig cannot be used for semiconductor processing immediately after cleaning, and a drying process for evaporating the cleaning liquid adhering to the surface of the quartz jig is required.

FIG. 3 is a schematic sectional view of an example of a conventional quartz jig drying apparatus. In this drying device, first, a blower 26 provided at the upper portion blows dry air downward into a drying tank (drafter) 24, and the inside of the drying tank 24 is filled with the dry air. Then, the quartz jig 22 is inserted into the quartz jig 22 from below, and the cleaning liquid remaining on the surface of the quartz jig 22 is evaporated by blowing dry air.
Further, the halogen lamp 28 provided at the center of the upper portion is irradiated with light to heat the halogen lamp 28 to accelerate evaporation of the cleaning liquid.

[0004]

However, some quartz jigs have a thin branch tube such as a quartz furnace core tube. Such a quartz jig has a very large surface area,
Moreover, the shape is also complicated. Even if such a quartz furnace core tube is put in a drying tank, it is difficult to spread the dry air to the complicated and complicated details, and it takes a long time to completely dry such a quartz jig. . If it takes a long time to dry the quartz jig as described above, there is a problem that the productivity of the entire semiconductor manufacturing process decreases.

Further, when ordinary air is blown onto the quartz jig by a blower, fine dust contained in the air may adhere to the quartz jig, and such quartz jig is used to process semiconductor materials. Doing so may cause impurities to be mixed into the semiconductor material and short-circuit defects after manufacturing.

The present invention has been made in view of the above circumstances, and provides a quartz jig drying apparatus capable of rapidly performing a drying treatment of a quartz jig having a complicated shape in a clean atmosphere. The purpose is that.

[0007]

In order to achieve the above object, the present invention provides a vacuum chamber in which a quartz jig is arranged, a decompression means for decompressing the inside of the vacuum chamber, and a heating inside the vacuum chamber. It is characterized by comprising a heating means for heating.

[0008]

According to the present invention, with the above-mentioned structure, the vacuum chamber is decompressed by the decompressing means while being heated by the heating means and externally providing the heat of vaporization that is deprived by adiabatic expansion, and adheres to the surface of the quartz jig. Liquids such as cleaning liquids evaporate rapidly. Further, by drying inside the vacuum chamber, the drying process can be performed in a clean atmosphere, and impurities do not adhere to the surface of the quartz jig.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic sectional view showing a quartz jig drying apparatus according to a first embodiment of the present invention, and FIG. 2 is a schematic sectional view showing a quartz jig drying apparatus according to a second embodiment of the present invention.

In FIG. 1, a dry vacuum pump 12 as a pressure reducing means is connected to the vacuum chamber 10. As the dry vacuum pump 12, for example, a roots pump or a sorption pump can be used, and the inside of the vacuum chamber 10 can be brought to a vacuum state of 10 ⁻³ Torr or less by this dry vacuum pump. At the top of the vacuum chamber 10, the vacuum chamber 10
A microwave oscillator 14 for radiating a microwave is provided inside the. A mounting table 1 for mounting a quartz jig 16 to be dried is provided on the lower side inside the vacuum chamber 10.
8 are provided.

The quartz jig 16 is placed on the mounting table 18 after cleaning.
It is placed on top and inserted into the vacuum chamber from the bottom of the vacuum chamber 10. From the viewpoint of preventing contamination of the quartz jig during drying, it is desirable that the mounting table 18 also be made of quartz. When the quartz jig 16 is inserted into the vacuum chamber 10 and the vacuum chamber 10 is sealed, the inside of the vacuum chamber 10 is evacuated by the dry vacuum pump 12 to reduce the pressure. As the atmospheric pressure in the vacuum chamber 10 decreases, water and cleaning liquid having a higher vapor pressure are sequentially evaporated and vaporized. At this time, even if the quartz jig 16 has a complicated shape with a thin branch tube such as a quartz furnace core tube, the effect of this depressurization extends to every corner of the quartz jig 16 and Cleaning liquid and the like can be evaporated from all surfaces. Further, it is possible to prevent impurities from adhering to the quartz jig by drawing a vacuum.

However, at this time, when the evaporation proceeds rapidly, the heat of vaporization is removed by adiabatic expansion, and the temperature drops. For this reason, a part of water or the cleaning liquid is condensed, and the evaporation rate may be slowed down. In order to prevent such a situation, while reducing the pressure inside the vacuum chamber 10 by the dry vacuum pump 12,
A microwave is radiated from the microwave oscillator 14 to the inside of the vacuum chamber 10 to heat it to 100 ° C to 200 ° C. This makes it possible to apply heat deprived from the outside by adiabatic expansion to the cleaning liquid left on the surface of the quartz jig, and prevent the evaporation rate of the cleaning liquid from decreasing. By thus combining the vacuuming of the inside of the vacuum chamber and the heating, the quartz jig 16 can be dried quickly.

In the second embodiment shown in FIG. 2, instead of the microwave oscillator 14 of FIG. 1, a halogen lamp 20 similar to that of a conventional drying device is used. Since other configurations are similar to those of the first embodiment, the same reference numerals are given to those having the same functions as those shown in FIG.
Detailed description thereof will be omitted. In the second embodiment, heat can be supplied to the cleaning liquid remaining on the surface of the quartz jig by irradiating the interior of the vacuum chamber 10 with light by the halogen lamp 20, and the first embodiment shown in FIG. The same effect as in the case of can be obtained. As other heating means, it is also effective to use an infrared heating method, for example.

[0014]

As described above, according to the present invention, the inside of the vacuum chamber is evacuated and heated by a heating means such as a microwave oscillator, whereby the cleaning liquid, water and the like can be rapidly evaporated. Therefore, it is possible to provide a quartz jig drying device capable of performing a drying process of a quartz jig, which conventionally takes a very long time, in a short time, quickly and in a clean atmosphere. ..

[Brief description of drawings]

FIG. 1 is a schematic cross-sectional view showing a quartz jig drying apparatus according to a first embodiment of the present invention.

FIG. 2 is a schematic sectional view showing a quartz jig drying apparatus according to a second embodiment of the present invention.

FIG. 3 is a schematic cross-sectional view of a conventional quartz jig drying device.

[Explanation of symbols]

 10 Vacuum tank 12 Dry vacuum pump 14 Microwave oscillator 16,22 Quartz jig 18 Mounting table 20,28 Halogen lamp 24 Drying tank 26 Blower

Claims (2)

[Claims] 1. A quartz curing apparatus comprising: a vacuum chamber for arranging a quartz jig; a decompression unit for decompressing the interior of the vacuum chamber; and a heating unit for heating the interior of the vacuum chamber. Equipment drying equipment. 2. The apparatus for drying a quartz jig according to claim 1, wherein the heating means uses a microwave oscillator or a halogen lamp.