JPH05277948A - Particulate injection processing device - Google Patents

Particulate injection processing device

Info

Publication number
JPH05277948A
JPH05277948A JP10535492A JP10535492A JPH05277948A JP H05277948 A JPH05277948 A JP H05277948A JP 10535492 A JP10535492 A JP 10535492A JP 10535492 A JP10535492 A JP 10535492A JP H05277948 A JPH05277948 A JP H05277948A
Authority
JP
Japan
Prior art keywords
mixing chamber
ultrafine particles
compressed air
delivery pipe
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10535492A
Other languages
Japanese (ja)
Other versions
JP3104721B2 (en
Inventor
Akio Mishima
彰生 三島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP04105354A priority Critical patent/JP3104721B2/en
Publication of JPH05277948A publication Critical patent/JPH05277948A/en
Application granted granted Critical
Publication of JP3104721B2 publication Critical patent/JP3104721B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To improve uniformity of processing by a method wherein stable injection is made through a nozzle in a way to prevent the occurrence of the bumping state of submicorn particles being dispersed in compressed air. CONSTITUTION:An air feed pipe 7 through which compressed air is fed is connected to the bottom part of a mixing chamber 3. A delivery pipe 12 through which submicron particles 2 mixed in compressed air from the mixing chamber 3 are delivered to an injection chamber 5 is connected to the upper part of the mixing chamber 3, and a space 31 is formed in the connection part therebetween.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ガラス基板や半導体基
板などの被加工物に対して、エッチングやいわゆるデポ
ジションなどの加工を行なうのに好適な微粒子噴射加工
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fine particle jetting processing apparatus suitable for performing processing such as etching and so-called deposition on a workpiece such as a glass substrate or a semiconductor substrate.

【0002】[0002]

【従来の技術】半導体集積回路やプリント配線回路、さ
らには磁気ヘッドなどの各種機能素子などを製造する場
合に、様々な微細加工が必要となる。このため高度なエ
ッチング技術や薄膜形成技術が要求されている。
2. Description of the Related Art Various fine processing is required when manufacturing semiconductor integrated circuits, printed wiring circuits, and various functional elements such as magnetic heads. Therefore, advanced etching technology and thin film forming technology are required.

【0003】このようなエッチング技術としては、イオ
ンエッチング法、リアクティブイオンエッチング法、サ
ンドブラスト法などが知られている。しかしながらイオ
ンエッチング法は加工速度が遅く、サンドブラスト法は
被加工面の表面状態が劣る欠点があった。
As such an etching technique, an ion etching method, a reactive ion etching method, a sandblast method and the like are known. However, the ion etching method has a slow processing speed, and the sandblast method has a drawback that the surface state of the surface to be processed is poor.

【0004】一方、薄膜形成技術としては、スパッタ
法、熔射法、気相成長法などが知られている。しかしな
がらスパッタ法は成膜速度が遅く、熔射法は耐熱性基板
にしか膜形成が行なえず、気相成長法は成膜速度が遅い
上に耐熱性基板でなければ対応できない欠点があった。
On the other hand, as a thin film forming technique, a sputtering method, a spraying method, a vapor phase growth method and the like are known. However, the sputtering method has a slow film forming rate, and the spraying method can form a film only on a heat resistant substrate. The vapor phase growth method has a drawback that the film forming rate is slow and only a heat resistant substrate can be used.

【0005】上記の問題を解決するため、本発明者らは
特開平3−231096号公報に記載されたように、被
加工面に対して平均粒径0.01μm乃至3μmの極微
粒子を主体とする粉体を所定の入射角で吹き付ける加工
方法を提案した。この方法によると、早い成膜速度で被
加工面に対する制約も少なくデポジションの加工を行な
うことができ、また微細なパターンを精度よく高速でエ
ッチングの加工を行なうことができる。
In order to solve the above problems, the inventors of the present invention mainly use ultrafine particles having an average particle diameter of 0.01 μm to 3 μm with respect to the surface to be processed, as described in JP-A-3-231096. We proposed a processing method of spraying the powder with a certain incident angle. According to this method, deposition processing can be performed at a high film forming speed with less restriction on the surface to be processed, and etching of fine patterns can be performed with high accuracy and at high speed.

【0006】図6に前記提案による加工方法で使用され
る加工装置の概略構成を示す。この加工装置は大別して
圧縮空気を供給するエアコンプレッサ1と、このエアコ
ンプレッサ1から送り出された圧縮空気に極微粒子2を
混合する混合室3と、圧縮空気とともに極微粒子2を被
加工物4に噴射する噴射室5と、噴射室5から極微粒子
2を回収吸引する排風機6とから構成されている。
FIG. 6 shows a schematic configuration of a processing apparatus used in the processing method proposed above. This processing device is roughly classified into an air compressor 1 for supplying compressed air, a mixing chamber 3 for mixing the compressed air sent from the air compressor 1 with the ultrafine particles 2, and the compressed air together with the ultrafine particles 2 for a workpiece 4. The jet chamber 5 for jetting and the exhaust fan 6 for collecting and sucking the ultrafine particles 2 from the jet chamber 5 are configured.

【0007】上記のように構成された加工装置におい
て、エアコンプレッサ1から送り出された圧縮空気は、
第1の空気供給管7と第2の空気供給管8に分流され、
第1の空気供給管7に分流された圧縮空気は混合室3の
底部に設けられたフィルタ9または空気吹き出し口10
から混合室3内へ流入される。このとき圧縮空気が極微
粒子2内を通ることにより、エアバイブレータ効果によ
って極微粒子2が攪拌され、その一部が混合室3内に設
けれた集粉器11の下面凹部11aによって送出管12
の入口12aの近傍に集められる。
In the processing apparatus constructed as described above, the compressed air sent from the air compressor 1 is
It is divided into a first air supply pipe 7 and a second air supply pipe 8,
The compressed air divided into the first air supply pipe 7 is a filter 9 or an air outlet 10 provided at the bottom of the mixing chamber 3.
Flow into the mixing chamber 3. At this time, the compressed air passes through the ultrafine particles 2 to agitate the ultrafine particles 2 due to the air vibrator effect, and a part of the agitated particles is provided by the lower surface recess 11 a of the dust collector 11 provided in the mixing chamber 3 to the delivery pipe 12.
Are collected in the vicinity of the entrance 12a.

【0008】この攪拌に際しては混合室3の内部底面に
設けられた振動部材13により、極微粒子2の機械的な
分散も行なわれ、前記エアバイブレータ効果が効果的に
持続される。また集粉器11に接続される導出管14の
中途部に設けられた電磁弁15と、混合室3の上部の極
微粒子供給部16の蓋部17に接続された排気管18の
中途部に設けられた電磁弁19とは、一定の周期で互い
に開閉状態が逆になるように制御される。この結果これ
らの開閉操作による圧力差によって、混合室3内の極微
粒子2が一層攪乱されるようになっている。
During this stirring, the vibrating member 13 provided on the inner bottom surface of the mixing chamber 3 also mechanically disperses the ultrafine particles 2, so that the air vibrator effect is effectively maintained. In addition, a solenoid valve 15 provided in the middle of the outlet pipe 14 connected to the dust collector 11 and a middle of the exhaust pipe 18 connected to the lid 17 of the ultrafine particle supply unit 16 above the mixing chamber 3. The electromagnetic valve 19 provided is controlled so that the open / closed states thereof are opposite to each other at regular intervals. As a result, the ultrafine particles 2 in the mixing chamber 3 are further disturbed by the pressure difference due to the opening / closing operation.

【0009】一方、第2の空気供給管8に分流された圧
縮空気は、送出管12に直接送り込まれ、その空気流に
よって負圧となることにより、出口8a付近に集められ
た極微粒子2が吸い込まれ、送出管12内で圧縮空気と
混合される。そしてこの圧縮空気と極微粒子2との混合
物が送出管12を通って、噴射室5内のノズル20から
噴射され、被加工物4の被加工面に吹きつけられて加工
が行なわれる。使用済の極微粒子2は噴射室5に接続さ
れた反送管21,22を介して供給部16に戻され、再
使用に供される。
On the other hand, the compressed air divided into the second air supply pipe 8 is directly sent to the delivery pipe 12, and the negative pressure is generated by the air flow, so that the ultrafine particles 2 collected near the outlet 8a are collected. It is sucked in and mixed with compressed air in the delivery pipe 12. Then, the mixture of the compressed air and the ultrafine particles 2 passes through the delivery pipe 12 and is jetted from the nozzle 20 in the jet chamber 5 to be sprayed on the surface of the workpiece 4 to be machined. The used ultrafine particles 2 are returned to the supply unit 16 through the reaction tubes 21 and 22 connected to the injection chamber 5, and are reused.

【0010】[0010]

【発明が解決しようとする課題】しかしながら前記提案
による加工装置によると、送出管12の入り口12aか
らだんご状に凝集した極微粒子2が吸い込まれ、送出管
12内で圧縮空気と混合されてノズル20から噴射され
る。このとき噴射される極微粒子2は突沸状態となっ
て、この噴射が断続的に繰り返される。このように極微
粒子2が突沸状態でノズル20から同時に多量に噴射さ
れると、微粒子によるマスク現象が発生するため被加工
物4は加工されにくくなる。この結果、被加工物4が均
一に加工されにくくなるおそれがあった。
However, according to the processing apparatus according to the above-mentioned proposal, the ultrafine particles 2 aggregated in the shape of a dumpling are sucked from the inlet 12a of the delivery pipe 12 and mixed with the compressed air in the delivery pipe 12 so as to be mixed with the nozzle 20. Is jetted from. The ultrafine particles 2 injected at this time are in a bumping state, and this injection is repeated intermittently. When a large amount of ultrafine particles 2 are simultaneously ejected from the nozzle 20 in the bumping state in this way, the masking phenomenon occurs due to the particles, so that the work piece 4 becomes difficult to be processed. As a result, the workpiece 4 may be difficult to be processed uniformly.

【0011】本発明はこのような状況に鑑みてなされた
もので、圧縮空気中に分散された極微粒子をノズルから
安定して噴射させることができ、加工の均一性を向上す
ることができる微粒子噴射加工装置を提供することを目
的とする。
The present invention has been made in view of the above circumstances, and it is possible to stably eject ultrafine particles dispersed in compressed air from a nozzle, and improve the uniformity of processing. An object is to provide an injection processing device.

【0012】[0012]

【課題を解決するための手段】請求項1に記載の微粒子
噴射加工装置は、極微粒子2が充填された混合室3と、
混合室3に圧縮空気を供給する空気供給管7と、混合室
3に送出管12を介して接続され、極微粒子2を圧縮空
気とともに被加工物4に対して噴射する噴射室5と、混
合室3内の極微粒子2を攪拌する攪拌部材33とを備え
た微粒子噴射加工装置であって、空気供給管7を混合室
3の底部に接続し、送出管12の一端を混合室3の上部
に接続するとともに、送出管12が接続された部位の混
合室3の上部に、所定の大きさの空間31を設けたこと
を特徴とする。
A fine particle jetting apparatus according to a first aspect of the present invention comprises a mixing chamber 3 filled with ultrafine particles 2;
An air supply pipe 7 for supplying compressed air to the mixing chamber 3 and an injection chamber 5 connected to the mixing chamber 3 via a delivery pipe 12 for injecting the ultrafine particles 2 together with the compressed air to the workpiece 4. A fine particle jetting apparatus comprising a stirring member 33 for stirring the ultrafine particles 2 in the chamber 3, wherein an air supply pipe 7 is connected to the bottom of the mixing chamber 3 and one end of a delivery pipe 12 is placed above the mixing chamber 3. And a space 31 of a predetermined size is provided in the upper part of the mixing chamber 3 at the site to which the delivery pipe 12 is connected.

【0013】請求項2に記載の微粒子噴射加工装置は、
攪拌部材を複数個設けたことを特徴とする。
A fine particle jetting processing apparatus according to a second aspect is
It is characterized in that a plurality of stirring members are provided.

【0014】[0014]

【作用】請求項1に記載の微粒子噴射加工装置において
は、混合室3と送出管12との接続部に所定の大きさの
空間31を設けることにより、圧縮空気でまき上げら
れ、この圧縮空気中に分散した極微粒子2のみが空間3
1を通って送出管12に送られる。そして送出管12内
で圧縮空気と混合され、加速されてノズル20から噴射
される。この結果極微粒子2の突沸現象の発生を防止す
ることができ、加工面の均一性が著しく向上する。
In the fine particle jetting apparatus according to the first aspect, the space 31 having a predetermined size is provided at the connecting portion between the mixing chamber 3 and the delivery pipe 12 so that the space is lifted up by the compressed air. Only the ultrafine particles 2 dispersed in the space 3
1 to the delivery pipe 12. Then, it is mixed with compressed air in the delivery pipe 12, accelerated, and jetted from the nozzle 20. As a result, the bumping phenomenon of the ultrafine particles 2 can be prevented, and the uniformity of the processed surface is significantly improved.

【0015】請求項2に記載の微粒子噴射加工装置にお
いては、混合室3内の極微粒子2を攪拌する攪拌部材3
3を複数個設けることにより、攪拌部材33の回転周期
による極微粒子2の送出管12への供給量の変動を少な
くすることができる。
In the fine particle jetting apparatus according to the second aspect, the stirring member 3 for stirring the ultrafine particles 2 in the mixing chamber 3 is provided.
By providing a plurality of three, it is possible to reduce the fluctuation of the supply amount of the ultrafine particles 2 to the delivery pipe 12 due to the rotation cycle of the stirring member 33.

【0016】[0016]

【実施例】以下、本発明の微粒子噴射加工装置の一実施
例を図面を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the fine particle jetting processing apparatus of the present invention will be described below with reference to the drawings.

【0017】図1に本発明の一実施例の概略構成を示
す。図1において、図6に示す従来例の部分と対応する
部分には同一の符号を付してあり、その説明は適宜省略
する。本実施例の特徴は図6に示す従来例における集粉
器11、振動部材13、導出管14、電磁弁15を省略
し、第1の空気供給管7を混合室3の底部に接続し、混
合室3の上部に所定の大きさの空間31を介して送出管
12の一端を接続した点にある。また混合室3の上部に
はモータ32が設けられており、混合室3内にはモータ
32によって回転駆動される攪拌部材33が装着されて
いる。さらに極微粒子供給部16の蓋部17には供給部
16の下端の開口部を開閉する円錐状の供給弁34が昇
降可能に取り付けられており、供給弁34はコイルバネ
35によって供給部16の開口部を閉塞する方向に付勢
されている。
FIG. 1 shows a schematic structure of an embodiment of the present invention. In FIG. 1, parts corresponding to those of the conventional example shown in FIG. 6 are denoted by the same reference numerals, and description thereof will be omitted as appropriate. The feature of this embodiment is that the dust collector 11, the vibrating member 13, the outlet pipe 14, and the solenoid valve 15 in the conventional example shown in FIG. 6 are omitted, and the first air supply pipe 7 is connected to the bottom of the mixing chamber 3. The point is that one end of the delivery pipe 12 is connected to the upper portion of the mixing chamber 3 through a space 31 having a predetermined size. A motor 32 is provided above the mixing chamber 3, and a stirring member 33 that is driven to rotate by the motor 32 is mounted inside the mixing chamber 3. Further, a conical supply valve 34 that opens and closes an opening at the lower end of the supply unit 16 is attached to the lid portion 17 of the ultrafine particle supply unit 16 so as to be able to move up and down, and the supply valve 34 is opened by a coil spring 35. It is urged in the direction to close the part.

【0018】なお符号36,37,38はそれぞれ空気
供給管7,8に設けられた調整弁、電磁弁、調整弁であ
り、符号39は送出管12に設けられた加振器である。
さらに符号40,41はそれぞれ供給部16及び混合室
3を加熱するヒータである。
Reference numerals 36, 37 and 38 are an adjusting valve, an electromagnetic valve and an adjusting valve provided in the air supply pipes 7 and 8, respectively, and a reference numeral 39 is an exciter provided in the delivery pipe 12.
Further, reference numerals 40 and 41 are heaters for heating the supply unit 16 and the mixing chamber 3, respectively.

【0019】次に本実施例の作用を説明する。平均粒径
0.01μm乃至3μmの極微粒子2が送出管12内に
おいて圧縮空気と混合され、ノズル20から噴射され、
被加工物4の被加工面に吹き付けられて加工が行なわれ
ることは、基本的には従来例と同様である。本実施例で
は第1の空気供給管7から供給される圧縮空気が、混合
室3の底部に設けられた空気吹き出し口10から吹き出
され、フィルタ9を通して極微粒子2の中を通過してい
る。なお空気吹出し口10は例えば径2mmのものが同
心円上に8個並んで配設されたものでもよく、中心にさ
らに径2mmの孔を設けてもよい。またフィルタ9は例
えばメッシュ30μm乃至100μmのSUSサーメッ
トフィルタまたはブロンズサーメットフィルタである。
Next, the operation of this embodiment will be described. The ultrafine particles 2 having an average particle diameter of 0.01 μm to 3 μm are mixed with compressed air in the delivery pipe 12, and jetted from the nozzle 20,
It is basically the same as the conventional example that the work is performed by being sprayed onto the work surface of the work 4. In this embodiment, the compressed air supplied from the first air supply pipe 7 is blown out from the air outlet 10 provided at the bottom of the mixing chamber 3 and passes through the ultrafine particles 2 through the filter 9. The air outlets 10 may be, for example, eight concentric circles having a diameter of 2 mm, and may be provided with a hole having a diameter of 2 mm at the center. The filter 9 is, for example, a SUS cermet filter or a bronze cermet filter having a mesh of 30 μm to 100 μm.

【0020】上記の状態では極微粒子2は圧縮空気によ
り一時的に巻き上げられるだけである。この状態を持続
するために攪拌部材33を一定の周期で回転させる。そ
して巻き上げられた極微粒子2は空間31を通り、送出
管12を通って第2の空気供給管8の出口8aに至り圧
縮空気と混合される。このとき空間31がない場合は図
2に示すように混合室3と送出管12との接続部に極微
粒子2が寄せられて吸い込まれ、凝集した固まり状の極
微粒子2となり突沸状態となる。しかし本実施例に示す
ように、例えば内径30mm、高さ30mmの空間を上
記接続部に設けることにより、圧縮空気で巻き上げられ
圧縮空気中に分散した極微粒子2のみが送出管12内に
吸い込まれるので、図3に示すように突沸状態にはなら
ない。従ってノズル20からの極微粒子2の突沸的な噴
射は発生せず、加工面の均一性が著しく向上する。特に
極微粒子2が混合室3内に満杯状態で充填されていると
きに有効である。
In the above state, the ultrafine particles 2 are only temporarily wound up by the compressed air. In order to maintain this state, the stirring member 33 is rotated at a constant cycle. Then, the wound ultrafine particles 2 pass through the space 31, pass through the delivery pipe 12, reach the outlet 8a of the second air supply pipe 8, and are mixed with the compressed air. At this time, if there is no space 31, as shown in FIG. 2, the ultrafine particles 2 are attracted and sucked into the connecting portion between the mixing chamber 3 and the delivery pipe 12, and become the aggregated ultrafine particles 2 in a bumping state. However, as shown in this embodiment, for example, by providing a space having an inner diameter of 30 mm and a height of 30 mm in the connecting portion, only the ultrafine particles 2 that are wound up by the compressed air and dispersed in the compressed air are sucked into the delivery pipe 12. Therefore, the bumping state does not occur as shown in FIG. Therefore, the jetting of the ultrafine particles 2 from the nozzle 20 does not occur, and the uniformity of the processed surface is significantly improved. It is particularly effective when the ultrafine particles 2 are filled in the mixing chamber 3 in a full state.

【0021】また混合室3の下部に第1の空気供給管7
を介して供給する圧縮空気の供給圧力をゼロから増加し
ていくと、図4に示すように極微粒子2の供給量もほぼ
比例して増加する。従って供給圧力を調整することによ
り極微粒子2の供給量を任意に制御することができる。
A first air supply pipe 7 is provided at the bottom of the mixing chamber 3.
When the supply pressure of the compressed air supplied via the is increased from zero, the supply amount of the ultrafine particles 2 also increases substantially in proportion as shown in FIG. Therefore, the supply amount of the ultrafine particles 2 can be arbitrarily controlled by adjusting the supply pressure.

【0022】本実施例によれば、混合室3と送出管12
との接続部に空間31を設けたので、ノズル20から噴
射される極微粒子2の突沸状態の発生を防止することが
でき、圧縮空気中に分散された極微粒子2が安定してノ
ズル20から噴射される。この結果被加工物4の加工の
均一性を向上させることができる。また突沸噴射と正常
噴射との繰り返しによる送出管12やノズル20の偏摩
耗の発生を防止することができる。
According to this embodiment, the mixing chamber 3 and the delivery pipe 12 are
Since the space 31 is provided at the connecting portion with the, it is possible to prevent the occurrence of the bumping state of the ultrafine particles 2 ejected from the nozzle 20, and the ultrafine particles 2 dispersed in the compressed air are stably discharged from the nozzle 20. Is jetted. As a result, the processing uniformity of the workpiece 4 can be improved. Further, it is possible to prevent uneven wear of the delivery pipe 12 and the nozzle 20 due to repetition of bumping injection and normal injection.

【0023】上記実施例では室間31及び攪拌部材33
がそれぞれ1個の場合について説明したが、室間31を
混合室3の上部に均等に複数個設けてもよく、攪拌部材
33を同心上に複数個設けてもよい。ここで攪拌部材3
3が空間31の下にきたときに極微粒子2が最も多く送
出管12へ送られるが、攪拌部材33を複数個設けるこ
とによりこの変動を防止することができる。図5に攪拌
部材33を4個、空間31を3個設けたときの攪拌部材
33の回転周期と極微粒子2の供給量との関係を曲線A
で示す。曲線Bは攪拌部材33及び空間31がそれぞれ
1個の場合を示す。図5から明らかなように曲線Aに示
す場合は極微粒子2の供給量の変動を大幅に改善するこ
とができる。
In the above embodiment, the room 31 and the stirring member 33 are used.
However, a plurality of chambers 31 may be evenly provided above the mixing chamber 3, or a plurality of stirring members 33 may be concentrically provided. Here, the stirring member 3
The maximum amount of the ultrafine particles 2 is sent to the delivery pipe 12 when 3 comes under the space 31, but this fluctuation can be prevented by providing a plurality of stirring members 33. A curve A shows the relationship between the rotation period of the stirring member 33 and the supply amount of the ultrafine particles 2 when four stirring members 33 and three spaces 31 are provided in FIG.
Indicate. The curve B shows the case where each of the stirring member 33 and the space 31 is one. As is clear from FIG. 5, in the case of the curve A, the fluctuation of the supply amount of the ultrafine particles 2 can be greatly improved.

【0024】[0024]

【発明の効果】以上説明したように、請求項1に記載の
微粒子噴射加工装置によれば、混合室と送出管との接続
部に空間を設けたので、ノズルから噴出される極微粒子
の突沸状態の発生を防止することができ、圧縮空気中に
分散された極微粒子が安定してノズルから噴射される。
この結果被加工物の加工の均一性を向上させることがで
きる。また突沸噴射と正常噴射との繰り返しによる送出
管やノズルの偏摩耗の発生を防止することができる。
As described above, according to the fine particle jetting apparatus of the first aspect, since the space is provided in the connecting portion between the mixing chamber and the delivery pipe, the bumping of the ultrafine particles ejected from the nozzle is carried out. It is possible to prevent the occurrence of the state, and the ultrafine particles dispersed in the compressed air are stably ejected from the nozzle.
As a result, the processing uniformity of the workpiece can be improved. Further, it is possible to prevent the uneven wear of the delivery pipe and the nozzle due to the repetition of the bumping injection and the normal injection.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の微粒子噴射加工装置の一実施例の概略
構成を示す断面図である。
FIG. 1 is a sectional view showing a schematic configuration of an embodiment of a fine particle jetting processing apparatus of the present invention.

【図2】極微粒子の突沸状態の一例を示す説明図であ
る。
FIG. 2 is an explanatory diagram showing an example of a bumping state of ultrafine particles.

【図3】本実施例による突沸解消状態を示す説明図であ
る。
FIG. 3 is an explanatory diagram showing a bumping elimination state according to the present embodiment.

【図4】圧縮空気供給圧力と極微粒子供給量との関係を
示す線図である。
FIG. 4 is a diagram showing a relationship between a compressed air supply pressure and an ultrafine particle supply amount.

【図5】攪拌部材回転周期と極微粒子供給量との関係を
示す線図である。
FIG. 5 is a diagram showing a relationship between a rotation cycle of a stirring member and a supply amount of ultrafine particles.

【図6】従来の微粒子噴射加工装置の一例の概略構成を
示す断面図である。
FIG. 6 is a cross-sectional view showing a schematic configuration of an example of a conventional fine particle jetting processing apparatus.

【符号の説明】[Explanation of symbols]

2 極微粒子 3 混合室 4 被加工物 5 噴射室 7,8 空気供給管 12 送出管 31 空間 33 攪拌部材 2 Ultrafine particles 3 Mixing chamber 4 Workpiece 5 Injection chamber 7,8 Air supply pipe 12 Delivery pipe 31 Space 33 Stirring member

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 極微粒子が充填された混合室と、 前記混合室に圧縮空気を供給する空気供給管と、 前記混合室に送出管を介して接続され、前記極微粒子を
前記圧縮空気とともに被加工物に対して噴射する噴射室
と、 前記混合室内の前記極微粒子を攪拌する攪拌部材とを備
えた微粒子噴射加工装置であって、 前記空気供給管を前記混合室の底部に接続し、前記送出
管の一端を前記混合室の上部に接続するとともに、前記
送出管が接続された部位の前記混合室の上部に、所定の
大きさの空間を設けたことを特徴とする微粒子噴射加工
装置、
1. A mixing chamber filled with ultrafine particles, an air supply pipe for supplying compressed air to the mixing chamber, and a delivery pipe connected to the mixing chamber to cover the ultrafine particles together with the compressed air. A fine particle injection processing device comprising an injection chamber for injecting a workpiece, and a stirring member for stirring the ultrafine particles in the mixing chamber, wherein the air supply pipe is connected to a bottom portion of the mixing chamber, While connecting one end of the delivery pipe to the upper part of the mixing chamber, a space of a predetermined size is provided in the upper part of the mixing chamber at the site where the delivery pipe is connected,
【請求項2】 攪拌部材を複数個設けたことを特徴とす
る請求項1記載の微粒子噴射加工装置。
2. The fine particle jetting processing apparatus according to claim 1, wherein a plurality of stirring members are provided.
JP04105354A 1992-03-31 1992-03-31 Fine particle injection processing equipment Expired - Fee Related JP3104721B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04105354A JP3104721B2 (en) 1992-03-31 1992-03-31 Fine particle injection processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04105354A JP3104721B2 (en) 1992-03-31 1992-03-31 Fine particle injection processing equipment

Publications (2)

Publication Number Publication Date
JPH05277948A true JPH05277948A (en) 1993-10-26
JP3104721B2 JP3104721B2 (en) 2000-10-30

Family

ID=14405397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04105354A Expired - Fee Related JP3104721B2 (en) 1992-03-31 1992-03-31 Fine particle injection processing equipment

Country Status (1)

Country Link
JP (1) JP3104721B2 (en)

Also Published As

Publication number Publication date
JP3104721B2 (en) 2000-10-30

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