JPH0527486Y2 - - Google Patents

Info

Publication number
JPH0527486Y2
JPH0527486Y2 JP797488U JP797488U JPH0527486Y2 JP H0527486 Y2 JPH0527486 Y2 JP H0527486Y2 JP 797488 U JP797488 U JP 797488U JP 797488 U JP797488 U JP 797488U JP H0527486 Y2 JPH0527486 Y2 JP H0527486Y2
Authority
JP
Japan
Prior art keywords
thin film
pair
chamber
connector
connectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP797488U
Other languages
Japanese (ja)
Other versions
JPH01114665U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP797488U priority Critical patent/JPH0527486Y2/ja
Publication of JPH01114665U publication Critical patent/JPH01114665U/ja
Application granted granted Critical
Publication of JPH0527486Y2 publication Critical patent/JPH0527486Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 〈産業上の利用分野〉 本考案は、例えば真空蒸着法による薄膜製造装
置に関する。
[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a thin film manufacturing apparatus using, for example, a vacuum evaporation method.

〈従来の技術〉 従来、この種の装置は、真空チヤンバ内に、例
えば蒸着材料を収容するるつぼ、およびそのるつ
ぼの側壁周辺を囲つてなる加熱用フイラメント等
の蒸着機能部品を備えており、これらの機能部品
の各配線は、真空チヤンバ壁体に設けられた複数
の接続端子にそれぞれ個別にねじ止めされてい
る。
<Prior Art> Conventionally, this type of apparatus has been equipped with vapor deposition functional parts such as a crucible containing vapor deposition material and a heating filament surrounding the side wall of the crucible in a vacuum chamber. Each wiring of the functional component is individually screwed to a plurality of connection terminals provided on the wall of the vacuum chamber.

〈考案が解決しようとする課題〉 ところで、従来の装置によれば、蒸着機能部品
の交換等のメンテナンスを行う際、蒸着機能部品
の配線をねじを緩めて接続端子から除去する必要
があり、また、再度、蒸着機能部品を真空チヤン
バ内に組み込む際、その部品の配線を接続端子に
ねじ止めする必要があつた。このようなねじを緩
める等の作業は、真空チヤンバ内の狭い場合で行
わなければならず、作業者が不自然な姿勢での作
業を強いられるため、困難で、かつ多くの時間を
要するという問題があつた。
<Problems to be solved by the invention> By the way, according to conventional devices, when performing maintenance such as replacing vapor deposition functional parts, it is necessary to remove the wiring of the vapor deposition functional parts from the connection terminal by loosening the screws. When installing the evaporation functional component into the vacuum chamber again, it was necessary to screw the wiring of the component to the connection terminal. Work such as loosening screws must be done in a narrow space inside the vacuum chamber, and the worker is forced to work in an unnatural posture, making it difficult and time-consuming. It was hot.

なお、大電流・高電圧の配線の電気的な接続ま
たは切り放しをワンタツチで行なえるコネクタ対
が市販されているが、このコネクタ対は、その使
用温度範囲が高々200℃程度と低く、数百度以上
になる真空チヤンバ内での使用には不適当であつ
た。
Note that there are connector pairs on the market that can electrically connect or disconnect large current/high voltage wiring with a single touch, but these connector pairs have a low operating temperature range of around 200 degrees Celsius or more, and can be used in temperatures exceeding several hundred degrees Celsius. It was unsuitable for use in a vacuum chamber.

本考案の目的は、薄膜製造用機能部品と接続端
子との電気的な接続または切り放しを容易に行う
ことができ、もつて薄膜製造用機能部品の交換等
における作業時間の軽減を図ることのできる、薄
膜製造装置を提供することにある。
The purpose of the present invention is to enable easy electrical connection or disconnection between functional parts for thin film production and connection terminals, thereby reducing work time when replacing functional parts for thin film production, etc. An object of the present invention is to provide a thin film manufacturing apparatus.

〈課題を解決するための手段〉 上記目的を達成するための構成を、実施例に対
応する図面を参照しつつ説明すると、本考案は、
チヤンバ1内にコネクタ対6a,6bを設け、こ
のコネクタ対6a,6bを介して薄膜製造用機能
部品(例えば加熱用フイラメント)3と接続端子
4とを電気的に接続するよう構成するとともに、
コネクタ対6a,6bの周辺にコネクタ対6a,
6bを冷却するための冷却手段(ウオータジヤケ
ツト)5を設けたことを特徴としている。
<Means for Solving the Problems> The configuration for achieving the above object will be described with reference to drawings corresponding to embodiments.
A connector pair 6a, 6b is provided in the chamber 1, and the thin film manufacturing functional component (for example, heating filament) 3 and the connecting terminal 4 are electrically connected via the connector pair 6a, 6b.
Connector pair 6a, around connector pair 6a, 6b,
It is characterized in that a cooling means (water jacket) 5 is provided for cooling the water jacket 6b.

〈作用〉 チヤンバ1内の温度が上昇しても、冷却手段5
によつてコネクタ対6a,6bを所定の温度以下
に維持できる。従つて、コネクタ対6a,6bに
ワンタツチ式のものを用いることが可能になる。
<Function> Even if the temperature inside the chamber 1 rises, the cooling means 5
This allows the connector pair 6a, 6b to be maintained at a predetermined temperature or lower. Therefore, it becomes possible to use a one-touch type connector pair 6a, 6b.

〈実施例〉 本考案の実施例を、以下、図面に基づいて説明
する。
<Example> An example of the present invention will be described below based on the drawings.

図面は本考案の実施例の要部縦断面図であつ
て、真空蒸着法による薄膜製造装置に本考案を適
用した例を示している。
The drawing is a longitudinal sectional view of a main part of an embodiment of the present invention, and shows an example in which the present invention is applied to a thin film manufacturing apparatus using a vacuum evaporation method.

真空チヤンバ1内に被蒸着物を収容するための
るつぼ2が配設されている。るつぼ2の側壁周辺
はウオータジヤケツト5によつて囲われている。
A crucible 2 for accommodating a material to be deposited is disposed within a vacuum chamber 1 . The side wall of the crucible 2 is surrounded by a water jacket 5.

ウオータジヤケツト5の壁体には、その壁体に
沿つて二つの水路5aおよび5bが形成されてい
る。この二つの水路5aおよび5bは互いに連通
しており、さらに真空チヤンバ1外部の冷却水入
口Aおよび出口Bに連通している。また、二つの
水路5aおよび5b間におけるウオータジヤケツ
ト5の壁体には二つの貫通孔5cが穿れている。
Two water channels 5a and 5b are formed along the wall of the water jacket 5. These two water channels 5a and 5b communicate with each other, and further communicate with a cooling water inlet A and an outlet B outside the vacuum chamber 1. Furthermore, two through holes 5c are bored in the wall of the water jacket 5 between the two water channels 5a and 5b.

一方、るつぼ1の側壁周辺を囲うよう形成され
た加熱用フイラメント3の両端部には、それぞれ
電流導入シヤフト3aが固着されている。その各
シヤフト3aの端部には、それぞれ凸型コネクタ
6aがねじ止めされている。
On the other hand, current introducing shafts 3a are fixed to both ends of a heating filament 3 formed to surround the side wall of the crucible 1, respectively. A convex connector 6a is screwed to the end of each shaft 3a.

また、真空チヤンバ1の壁体には、2本の接続
端子4が絶縁・シール部材7を介して固着されて
おり、その各先端部はウオータジヤケツト5の貫
通孔5c内に延びている。また、各接続端子4の
先端部には、それぞれ凸型コネクタ6aを嵌挿し
得る凹部を備えた凹型コネクタ6bがねじ止めさ
れている。なお、各貫通孔5cには、それぞれ筒
状の絶縁がいし8が挿入されており、接続端子4
とウオータジヤケツト5の壁体との絶縁が図られ
ている。
Further, two connecting terminals 4 are fixed to the wall of the vacuum chamber 1 via an insulating/sealing member 7, and each of the terminals 4 extends into the through hole 5c of the water jacket 5. Furthermore, a concave connector 6b having a concave portion into which a convex connector 6a can be inserted is screwed to the tip of each connection terminal 4. Note that a cylindrical insulating insulator 8 is inserted into each through hole 5c, and the connecting terminal 4
The wall of the water jacket 5 is insulated from the wall of the water jacket 5.

以上の構成により、各凸型コネクタ6aを、そ
れぞれウオータジヤケツト5の貫通孔5a内に設
けられた凹型コネクタ6bの凹部に挿入すること
によつて、加熱用フイラメント3と接続端子4と
を電気的に接続することができるし、また、加熱
用フイラメント3の交換等の作業を行う際、各電
流導入シヤフト3aを上方に引き抜くだけで、加
熱用フイラメント3を各接続端子4から切り放す
ことができる。ここで、凸型および凹型コネクタ
6aおよび6bは、ウオータジヤケツト5の壁体
の貫通孔5a内で連結されるので、真空チヤンバ
1内の温度が上昇しても、各コネクタ6a,6b
を所定の温度、例えば200℃以下に保つことがで
きる。
With the above configuration, by inserting each convex connector 6a into the recess of the concave connector 6b provided in the through hole 5a of the water jacket 5, the heating filament 3 and the connecting terminal 4 can be electrically connected. Furthermore, when performing work such as replacing the heating filament 3, the heating filament 3 can be disconnected from each connection terminal 4 by simply pulling out each current introduction shaft 3a upward. can. Here, since the convex and concave connectors 6a and 6b are connected within the through hole 5a of the wall of the water jacket 5, even if the temperature inside the vacuum chamber 1 rises, each connector 6a, 6b
can be maintained at a predetermined temperature, for example, below 200°C.

なお、本実施例では、るつぼ2の周辺部を冷却
するためのウオータジヤケツト5によつてコネク
タ対6a,6bを冷却するよう構成しているが、
本考案はこれに限られることなく、コネクタ対6
a,6bの周辺に沿つて他のウオータジヤケツト
を形成し、このウオータジヤケツトによつてコネ
クタ対6a,6bを冷却するよう構成してもよい
ことは言うまでもない。
In this embodiment, the connector pair 6a, 6b is configured to be cooled by the water jacket 5 for cooling the peripheral portion of the crucible 2.
The present invention is not limited to this, but the connector pair 6
It goes without saying that another water jacket may be formed along the periphery of the connectors 6a and 6b, and the connector pair 6a and 6b may be cooled by this water jacket.

また、以上の実施例では、水を冷媒とする冷却
装置によつてコネクタ対6a,6bを冷却するよ
う構成しているが、本考案はこれに限られること
なく、例えば液体窒素、フレオンガス、ヘリウム
ガス、またはアンモニアガス等、他の液体または
ガスを冷媒とする冷却装置を適用してもよい。
Further, in the above embodiment, the connector pair 6a, 6b is configured to be cooled by a cooling device that uses water as a refrigerant, but the present invention is not limited to this, and may be cooled using liquid nitrogen, freon gas, helium, etc. A cooling device using gas or other liquids or gases such as ammonia gas as a refrigerant may also be applied.

以上は、真空蒸着法による薄膜製造装置におけ
る加熱用フイラメントに本考案を適用した例につ
いて説明したが、本考案はこれに限られることな
く、例えばクラスタイオンビーム法等他の方法に
よる薄膜製造装置にも適用できる。
The above describes an example in which the present invention is applied to a heating filament in a thin film manufacturing apparatus using a vacuum evaporation method. However, the present invention is not limited to this, and can be applied to a thin film manufacturing apparatus using other methods such as a cluster ion beam method. can also be applied.

〈考案の効果〉 以上説明したように、本考案によれば、薄膜製
造用機能部品と接続端子とをチヤンバ内でワンタ
ツチ式のコネクタ対を介して電気的に接続し得る
よう構成したから、従来行われていた、ねじを緩
める等の作業を要することなく、薄膜製造用機能
部品を接続端子から切り放すことができ、薄膜製
造用機能部品の交換等のメンテナンスを、従来の
位置に比して容易に、かつ、短時間で行うことが
できる。
<Effects of the invention> As explained above, according to the invention, the functional component for thin film production and the connection terminal are configured to be electrically connected within the chamber via a pair of one-touch connectors, which is different from the conventional method. The functional parts for thin film production can be separated from the connection terminals without the need for work such as loosening screws, which was previously done, and maintenance such as replacement of the functional parts for thin film production is easier compared to the conventional location. It can be done easily and in a short time.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案の実施例の要部縦断面図である。 1……真空チヤンバ、3……加熱用フイラメン
ト、4……接続端子、5……ウオータジヤケツ
ト、6a……凸型コネクタ、6b……凹型コネク
タ。
The drawing is a longitudinal sectional view of a main part of an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 3... Heating filament, 4... Connection terminal, 5... Water jacket, 6a... Convex connector, 6b... Concave connector.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] チヤンバ内の薄膜製造用機能部品に、そのチヤ
ンバに設けられた接続端子を介して電気エネルギ
を供給することによつて、上記チヤンバ内の試料
表面に薄膜を形成する装置において、上記チヤン
バ内にコネクタ対を設け、このコネクタ対を介し
て上記薄膜製造用機能部と上記接続端子とを電気
的に接続するよう構成するとともに、上記コネク
タ対の周辺に当該コネクタ対を冷却するための冷
却手段を設けたことを特徴とする、薄膜製造装
置。
In an apparatus for forming a thin film on the surface of a sample in the chamber by supplying electrical energy to a functional component for thin film production in the chamber through a connection terminal provided in the chamber, a connector is provided in the chamber. A pair of connectors is provided, and the functional unit for thin film production and the connection terminal are electrically connected via the pair of connectors, and a cooling means is provided around the pair of connectors to cool the pair of connectors. A thin film manufacturing device characterized by:
JP797488U 1988-01-25 1988-01-25 Expired - Lifetime JPH0527486Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP797488U JPH0527486Y2 (en) 1988-01-25 1988-01-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP797488U JPH0527486Y2 (en) 1988-01-25 1988-01-25

Publications (2)

Publication Number Publication Date
JPH01114665U JPH01114665U (en) 1989-08-02
JPH0527486Y2 true JPH0527486Y2 (en) 1993-07-13

Family

ID=31213441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP797488U Expired - Lifetime JPH0527486Y2 (en) 1988-01-25 1988-01-25

Country Status (1)

Country Link
JP (1) JPH0527486Y2 (en)

Also Published As

Publication number Publication date
JPH01114665U (en) 1989-08-02

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