JPH05273000A - Abnormality monitoring device - Google Patents
Abnormality monitoring deviceInfo
- Publication number
- JPH05273000A JPH05273000A JP4073672A JP7367292A JPH05273000A JP H05273000 A JPH05273000 A JP H05273000A JP 4073672 A JP4073672 A JP 4073672A JP 7367292 A JP7367292 A JP 7367292A JP H05273000 A JPH05273000 A JP H05273000A
- Authority
- JP
- Japan
- Prior art keywords
- abnormality
- physical quantity
- allowable range
- value
- state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Testing Or Calibration Of Command Recording Devices (AREA)
- Testing And Monitoring For Control Systems (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、磁気ディスク製造装
置、半導体製造装置等のプロセス装置に異常が発生して
いるか否かを監視する異常監視装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abnormality monitoring device for monitoring whether a process device such as a magnetic disk manufacturing device or a semiconductor manufacturing device is abnormal.
【0002】[0002]
【従来の技術】プロセス装置に何らかの異常が発生した
場合、速やかに対処し影響の拡大を防止できることが望
ましい。そのためには、プロセスの状態が正常であるか
異常であるかを適切に判定できる異常監視装置が必要で
ある。従来、プロセスの異常監視装置は、特開昭61−
16307号広報に記載の発明のように、プロセスの状
態に関わる物理量の値に対して許容範囲のしきい値を設
定し、物理量の値がしきい値を越える場合を異常と判定
している。2. Description of the Related Art It is desirable to be able to promptly deal with the occurrence of any abnormality in a process device and prevent the influence from expanding. For that purpose, an abnormality monitoring device capable of appropriately determining whether the process state is normal or abnormal is required. Conventionally, a process abnormality monitoring device is disclosed in JP-A-61-161.
As in the invention described in the publication No. 16307, a threshold value within an allowable range is set for the value of the physical quantity related to the process state, and it is determined that the case where the value of the physical quantity exceeds the threshold value is abnormal.
【0003】[0003]
【発明が解決しようとする課題】上記従来技術では、一
定周期でプロセスの状態の変動が繰り返され、その状態
に関わる物理量も一定周期で大きく変動する場合には対
応できない。設定した許容範囲が狭いと、正常な状態で
も、プロセスの状態に関わる物理量の周期的変動がしき
い値を越え、異常と判定してしまい、正しい判定が行な
えない。逆に、設定した許容範囲が広いと、前記のよう
な正常状態を異常と判定することは無いが、本来、異常
と判定すべき変動でもしきい値を越えず、正常と判定し
てしまい、やはり正しい判定が行なえない。本発明の目
的は、プロセスの状態が周期的に大きく変動する場合で
も、異常判定を正しく行なえる異常監視装置を提供する
ことにある。The above-mentioned conventional technique cannot cope with the case where the process state is repeatedly changed in a constant cycle and the physical quantity related to the state is also greatly changed in the constant cycle. If the set permissible range is narrow, even in a normal state, the periodic fluctuation of the physical quantity related to the process state exceeds the threshold value, and it is determined to be abnormal, and correct determination cannot be performed. On the contrary, if the set allowable range is wide, the normal state as described above is not determined to be abnormal, but the threshold value is not exceeded even if the variation should be determined to be abnormal, and it is determined to be normal. After all, the correct judgment cannot be made. An object of the present invention is to provide an anomaly monitoring device that can correctly make an anomaly judgment even when the state of a process fluctuates greatly periodically.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するた
め、各物理量の一周期分の変動に対して、正常である許
容範囲を時間関数として定める。プロセス装置が稼働す
ることによって、時間に沿って実際に変動する物理量を
先に定めてある許容範囲と比較する。実際の物理量が許
容範囲外となったら、異常が発生したと判定する。In order to achieve the above object, a normal permissible range is determined as a time function with respect to a variation of each physical quantity for one cycle. The physical quantity that actually changes over time by the operation of the process device is compared with a predetermined allowable range. If the actual physical quantity is outside the allowable range, it is determined that an abnormality has occurred.
【0005】[0005]
【作用】正常状態の許容範囲を時間に沿って一定値では
なく柔軟に指定できる。そのため、プロセスの状態が周
期的に大きく変動する場合でも、時間の進行に伴って、
プロセスの状態の変動に合わせて、正常状態の許容範囲
を変えることが出来る。この許容範囲と実際の物理量を
時々刻々と比較することで、常に正しい異常判定が行な
える。[Function] The allowable range of the normal state can be flexibly designated along the time, instead of being a constant value. Therefore, even if the state of the process fluctuates greatly periodically, with the progress of time,
The allowable range of the normal state can be changed according to the fluctuation of the process state. By comparing this allowable range with the actual physical quantity moment by moment, it is possible to always make a correct abnormality determination.
【0006】[0006]
【実施例】本発明の一実施例を図面を用いて説明する。
図1は、本発明の異常監視装置及び監視の対象となるプ
ロセス装置のブロック図を示している。図2は、本発明
の異常監視装置の動作概略を示している。プロセス装置
1が稼働することによって、そのプロセスの状態は変動
する。この変動に伴って、プロセスの状態に関わる各種
物理量が変動する。本発明の異常監視装置2はサンプリ
ング3によってこの各種物理量の値をプロセスデータと
して収集し、異常判定4によって解析して異常発生の有
無の判定を行なう。図3は、プロセスの状態に関わるあ
る物理量の変動の一例を示している。横軸には、プロセ
ス開始時を0とした時刻tを採り、縦軸には、ある物理
量の値xを採っている。太線は理想の変動の波形を、細
線は実際の変動の波形の例を示している。異常監視装置
2は実際の変動の値を定められた時点にサンプリングし
プロセスデータとする。白丸はサンプリングしたプロセ
スデータである。異常監視装置2は、プロセスデータと
理想の変動との比較を行ない、その差異の程度によって
異常が発生したか否かの判定を行なう。異常判定のため
に次のように、基準となる値xr,ts,te,a,b,
c,dを設ける。An embodiment of the present invention will be described with reference to the drawings.
FIG. 1 shows a block diagram of an abnormality monitoring device of the present invention and a process device to be monitored. FIG. 2 shows the outline of the operation of the abnormality monitoring device of the present invention. As the process device 1 operates, the state of the process changes. Along with this change, various physical quantities related to the process state change. The abnormality monitoring device 2 of the present invention collects the values of various physical quantities as process data by sampling 3 and analyzes them by abnormality judgment 4 to determine whether or not an abnormality has occurred. FIG. 3 shows an example of fluctuation of a certain physical quantity related to the state of the process. The horizontal axis shows the time t when the process start time is 0, and the vertical axis shows the value x of a certain physical quantity. A thick line shows an ideal fluctuation waveform, and a thin line shows an example of an actual fluctuation waveform. The abnormality monitoring device 2 samples the actual variation value at a predetermined time point and uses it as the process data. White circles are sampled process data. The abnormality monitoring device 2 compares the process data with the ideal variation and determines whether or not an abnormality has occurred depending on the degree of the difference. For the abnormality determination, reference values x r , t s , t e , a, b, and
c and d are provided.
【0007】(1)対象とする理想値をxr、許容範囲
を±a%,許容行き過ぎ量を+b%とする。(1) The target ideal value is x r , the allowable range is ± a%, and the allowable overshoot amount is + b%.
【0008】(2)(1)の許容範囲内に入らなければ
ならない始端の時刻をts、その許容範囲を+c%とす
る。(2) Let t s be the time of the start end that must fall within the allowable range of (1), and let the allowable range be + c%.
【0009】(3)(1)の許容範囲内に入っていなけ
ればならない終端の時刻をte、その許容範囲を−d%
とする。(3) The end time that must be within the allowable range of (1) is t e , and the allowable range is -d%.
And
【0010】異常判定の手順を示す。時刻tによって判
定方法を次のように分ける。A procedure for determining an abnormality will be described. The determination method is divided as follows according to the time t.
【0011】[0011]
【数1】(1)0≦t<((100+c)/100)tsの時 プロセスデータの値が((100+b)/100)xrより大
きい場合、つまり図3の斜線部A5に入った場合、許容
行き過ぎ量を越えたものとし、異常が発生したと判定す
る。[Equation 1] (1) When 0 ≦ t <((100 + c) / 100) t s When the value of the process data is larger than ((100 + b) / 100) × r , that is, the shaded area A5 in FIG. 3 is entered. In this case, the allowable overshoot amount is exceeded and it is determined that an abnormality has occurred.
【0012】[0012]
【数2】(2)((100+c)/100)ts≦t≦((100
−d)/100)teの時 プロセスデータの値が((100+a)/100)xrより大
きい場合、つまり図3の斜線部B6に入った場合、許容
できない定常偏差または振動があるものとし、異常が発
生したと判定する。[Equation 2] (2) ((100 + c) / 100) t s ≤ t ≤ ((100
-D) / 100) the value is ((100 + a process data when t e) / 100) is greater than x r, that is, when it enters the hatched portion B6 of FIG. 3, it is assumed that there is a steady-state error or vibration unacceptable , It is determined that an abnormality has occurred.
【0013】プロセスデータの値が((100−a)/10
0)xrより小さい場合、つまり図3の斜線部C7に入っ
た場合、許容できない定常偏差,振動,または応答が遅
いものとし、異常が発生したと判定する。The value of the process data is ((100-a) / 10
If it is smaller than 0) x r , that is, if it enters the shaded area C7 in FIG. 3, it is determined that an unacceptable steady-state deviation, vibration, or response is slow, and an abnormality has occurred.
【0014】[0014]
【発明の効果】正常状態の許容範囲を時間に沿って一定
値ではなく柔軟に指定できる。そのため、プロセスの状
態が周期的に大きな変動を繰り返す場合でも、時間に沿
って定められた正常状態の許容範囲との比較によって、
常に正しい異常判定を行なうことができる。EFFECT OF THE INVENTION The allowable range of the normal state can be flexibly designated along the time, instead of being a constant value. Therefore, even when the state of the process repeats large fluctuations periodically, by comparison with the allowable range of the normal state set along the time,
A correct abnormality determination can always be made.
【図1】本発明の異常監視装置及び監視の対象となるプ
ロセス装置のブロック図である。FIG. 1 is a block diagram of an abnormality monitoring device of the present invention and a process device to be monitored.
【図2】本発明の異常監視装置の動作概略図である。FIG. 2 is an operation schematic diagram of the abnormality monitoring device of the present invention.
【図3】プロセスの状態に関わるある物理量の変動の一
例を示す図である。FIG. 3 is a diagram showing an example of a change in a certain physical quantity related to a process state.
1…プロセス装置、 2…異常監視装置、 3…サンプリング、 4…異常判定、 5…斜線部A、 6…斜線部B、 7…斜線部C。 DESCRIPTION OF SYMBOLS 1 ... Process apparatus, 2 ... Abnormality monitoring apparatus, 3 ... Sampling, 4 ... Abnormality judgment, 5 ... Shaded area A, 6 ... Shaded area B, 7 ... Shaded area C.
Claims (4)
置における、周期的な状態変動に関わる物理量に対し
て、異常判定の基準となる値を時間関数として一周期分
設け、物理量の実際の値をプロセス装置から時系列的に
収集し、基準となる値と実際の値を比較することで異常
発生の有無を判定することを特徴とする異常監視装置。1. A process apparatus in which a process is repeated at a constant cycle, a value serving as a criterion for abnormality is provided as a time function for one cycle with respect to a physical quantity related to a periodical state change, and an actual value of the physical quantity is set. An abnormality monitoring device, which collects time-series data from a process device and determines whether or not an abnormality has occurred by comparing a reference value with an actual value.
置における、周期的な状態変動に関わる物理量に対し
て、異常判定の基準となる値を時間関数として一周期分
設け、物理量の実際の値をプロセス装置から時系列的に
収集し、基準となる値と実際の値を比較することで異常
発生の有無を判定することを特徴とする異常監視方法。2. In a process device in which processing is repeated at a fixed cycle, a value serving as a criterion for abnormality is provided for one cycle as a function of time with respect to a physical quantity related to a periodical state change, and an actual value of the physical quantity is set. An abnormality monitoring method characterized in that the presence or absence of an abnormality is determined by collecting data from process devices in time series and comparing a reference value with an actual value.
置における、周期的な状態変動に関わる物理量に対し
て、理想の変動の値を時間関数として一周期分設け、物
理量の実際の値をプロセス装置から時系列的に収集し、
理想の変動の値と実際の値を比較することで異常発生の
有無を判定することを特徴とする異常監視装置。3. In a process device in which processing is repeated in a fixed cycle, an ideal value of fluctuation is provided as a function of time for one cycle with respect to a physical quantity related to periodical state changes, and an actual value of the physical quantity is set in the process device. Collected in chronological order from
An abnormality monitoring device characterized by determining the presence or absence of an abnormality by comparing an ideal variation value and an actual value.
した異常に対して、適切な処理を行なう処理部を持つこ
とを特徴とする異常処理装置。4. An abnormality processing device comprising a processing unit for performing appropriate processing for an abnormality detected by using the abnormality monitoring device according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4073672A JPH05273000A (en) | 1992-03-30 | 1992-03-30 | Abnormality monitoring device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4073672A JPH05273000A (en) | 1992-03-30 | 1992-03-30 | Abnormality monitoring device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05273000A true JPH05273000A (en) | 1993-10-22 |
Family
ID=13524965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4073672A Pending JPH05273000A (en) | 1992-03-30 | 1992-03-30 | Abnormality monitoring device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05273000A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009169645A (en) * | 2008-01-16 | 2009-07-30 | Toshiba Corp | Monitoring control device |
JP2020086936A (en) * | 2018-11-26 | 2020-06-04 | 株式会社フジキン | Flow rate change evaluation device, method, and computer program |
-
1992
- 1992-03-30 JP JP4073672A patent/JPH05273000A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009169645A (en) * | 2008-01-16 | 2009-07-30 | Toshiba Corp | Monitoring control device |
JP2020086936A (en) * | 2018-11-26 | 2020-06-04 | 株式会社フジキン | Flow rate change evaluation device, method, and computer program |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11614728B2 (en) | Machine tool management system that obtains a next maintenance period from a maintenance period model and a refinement algorithm | |
CN104020724B (en) | alarm monitoring method and device | |
US20030199108A1 (en) | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor | |
CN104541216A (en) | Monitoring system and method for detecting the change of a mechanical system |and adapting the limit values associated to said mechanical system to reflect|the current conditions of the mechanical system | |
JP2004303007A (en) | Process monitoring method | |
CN110132402B (en) | Detection of spikes and faults in vibration trend data | |
KR102247116B1 (en) | Data processing method, data processing device, and data processing program | |
EP3703250A1 (en) | Servo driver and state change detecting method | |
US6502018B1 (en) | Method for diagnosis of equipment | |
CA2252868C (en) | Automatic control loop monitoring and diagnostics | |
US5719788A (en) | Automatic detection of excessively oscillatory feedback control loops. | |
JPH05273000A (en) | Abnormality monitoring device | |
JP4483111B2 (en) | Plant operation monitoring apparatus and method | |
US10088829B2 (en) | Diagnostic device and method for monitoring the operation of a control loop | |
JP3355849B2 (en) | Manufacturing process quality abnormality treatment system and quality control value updating method | |
CN114377874B (en) | Flow monitoring method and device for spraying equipment and readable storage medium | |
Lu et al. | Model-plant mismatch detection with support vector machines | |
CN115934814A (en) | Hardware parameter analysis monitoring system and method applying data analysis technology | |
JPH01245122A (en) | Abnormality detecting method | |
JPH0564905U (en) | Alarm mechanism in process control equipment | |
JPH06274784A (en) | Plant monitoring diagnostic device and its abnormal sign identification method | |
US20240019268A1 (en) | Outlier detection method of detecting outliers in measured values of a measurand | |
WO2020189210A1 (en) | Monitoring method, monitoring device, and program | |
JPH09274502A (en) | Controller | |
Yamashita | On-line extraction of qualitative movements for monitoring process plants |