JPH05270976A - Single crystal pulling apparatus and pulling method - Google Patents

Single crystal pulling apparatus and pulling method

Info

Publication number
JPH05270976A
JPH05270976A JP9341392A JP9341392A JPH05270976A JP H05270976 A JPH05270976 A JP H05270976A JP 9341392 A JP9341392 A JP 9341392A JP 9341392 A JP9341392 A JP 9341392A JP H05270976 A JPH05270976 A JP H05270976A
Authority
JP
Japan
Prior art keywords
single crystal
pulling
silicon single
dash
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9341392A
Other languages
Japanese (ja)
Other versions
JP2946936B2 (en
Inventor
Michio Kida
道夫 喜田
Yoshiaki Arai
義明 新井
Naoki Ono
直樹 小野
Tateaki Sahira
健彰 佐平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP9341392A priority Critical patent/JP2946936B2/en
Publication of JPH05270976A publication Critical patent/JPH05270976A/en
Application granted granted Critical
Publication of JP2946936B2 publication Critical patent/JP2946936B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To provide a single crystal pulling apparatus and pulling method capable of pulling up e.g. a silicon single crystal rod of 8 in. diameter, 2m long and about 150kgf weight by reinforcing the Dash's neck part of a silicon single crystal rod to improve the mechanical strength of the material. CONSTITUTION:A quartz crucible 3 holding molten silicon liquid 4 is placed in a state freely rotatable on its axis and movable in vertical direction. A seed crystal 8 of silicon single crystal is held with a pulling mechanism and a silicon single crystal rod 9 having a diameter larger than that of the seed crystal 8 is grown from the molten silicon by pulling up the seed crystal 8 from the molten silicon 4 with the pulling mechanism. When the seed crystal 8 is pulled up from the surface of the molten silicon to a height of about 1m, a carbon fiber 11 wound on a drum 15 is wound around the Dash's neck part 10 of the silicon single crystal rod 9 in a state interlocked with the rotation of the crystal.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、CZ(Czochralski)
法による単結晶引上装置およびその引上方法に関するも
のである。
The present invention relates to CZ (Czochralski)
The present invention relates to a single crystal pulling apparatus and a pulling method thereof.

【0002】[0002]

【従来の技術】従来、大口径および長尺の円柱状シリコ
ン単結晶棒の製造に適したCZ法は、シリコン融液にシ
リコン単結晶の種子結晶を浸し、この種子結晶を回転さ
せながら徐々に引き上げ、種子結晶と同じ結晶方位の大
口径のシリコン単結晶棒を成長させるものである。この
場合、種子結晶に存在していた転位がシリコン単結晶棒
中に伝播しないように、種子結晶から成長させるとき、
シリコン単結晶棒を一旦細く絞ってから太らせる、いわ
ゆるダッシュズネック(Dash's neck)部を形成して、
シリコン単結晶棒を無転位化させることが行われてい
る。一方、シリコン単結晶棒は、より大口径化、より長
尺化の傾向にあり、その自重を増大させている。
2. Description of the Related Art Conventionally, the CZ method, which is suitable for manufacturing a large-diameter and long cylindrical silicon single crystal ingot, immerses a silicon single crystal seed crystal in a silicon melt and gradually rotates the seed crystal while rotating the seed crystal. It is pulled up to grow a large diameter silicon single crystal ingot having the same crystal orientation as the seed crystal. In this case, when growing from the seed crystal so that the dislocations existing in the seed crystal do not propagate into the silicon single crystal rod,
Form a so-called Dash's neck, which is made by narrowing the silicon single crystal ingot once and making it thick.
Dislocation-free silicon single crystal rods have been performed. On the other hand, the silicon single crystal ingot tends to have a larger diameter and a longer length, increasing its own weight.

【0003】[0003]

【発明が解決しようとする課題】このような従来のCZ
法の単結晶引上方法にあっては、ダッシュズネック部の
細く絞った直径は3〜4mm、その長さは数10mm、
その機械的強度は100〜200kgf/cm2であっ
た。この強度はシリコン単結晶棒の引張強度である。し
かしながら、シリコン単結晶棒のダッシュズネックは上
述のごとく絞られているので、材料力学的に弱く、シリ
コン単結晶棒の大口径化、長尺化を制限してしまうとい
う課題があった。一方、シリコン単結晶棒のダッシュズ
ネック部を限界値を超えて太くすると、種子結晶中の転
位がシリコン単結晶棒に伝播し、シリコン単結晶棒を無
転位化できないという問題点があった。
[Problems to be Solved by the Invention] Such a conventional CZ
In the single crystal pulling method of the method, the diameter of the dash's neck portion is 3 to 4 mm, and the length thereof is several tens mm.
Its mechanical strength was 100 to 200 kgf / cm 2 . This strength is the tensile strength of the silicon single crystal rod. However, since the dash's neck of the silicon single crystal rod is narrowed as described above, there is a problem in that it is weak in terms of material dynamics and limits the increase in diameter and length of the silicon single crystal rod. On the other hand, if the dash-neck portion of the silicon single crystal rod exceeds the limit value and becomes thick, dislocations in the seed crystal propagate to the silicon single crystal rod, and there is a problem that the silicon single crystal rod cannot be dislocation-free.

【0004】そこで、本発明は、シリコン単結晶棒のダ
ッシュズネック部を補強して、その材料力学的強度の向
上を図ることができる単結晶引上装置およびその引上方
法を提供することを、その目的とする。
Therefore, the present invention provides a single crystal pulling apparatus and a pulling method for the same which can strengthen the dash neck portion of a silicon single crystal rod to improve the material mechanical strength. , And its purpose.

【0005】[0005]

【課題を解決するための手段】請求項1に記載の単結晶
引上装置は、結晶融液を保持する坩堝と、種子結晶を把
持し、該種子結晶を上記結晶融液から引き上げつつ、該
種子結晶から該種子結晶より直径の大きい単結晶棒を成
長させる引上機構と、を備えた単結晶引上装置におい
て、上記種子結晶が上記結晶融液の液面から所定距離引
き上げられたとき、該単結晶棒のダッシュズネック部に
巻きつけられる可撓性材を備えるものである。
A single crystal pulling apparatus according to claim 1, wherein a crucible holding a crystal melt and a seed crystal are held, and the seed crystal is pulled from the crystal melt, In a single crystal pulling apparatus equipped with a pulling mechanism for growing a single crystal rod having a diameter larger than that of the seed crystal, when the seed crystal is pulled a predetermined distance from the liquid surface of the crystal melt, The flexible material is wound around the dash neck portion of the single crystal rod.

【0006】また、請求項2に記載の単結晶引上方法
は、単結晶棒のダッシュズネック部、肩部、直胴部を、
回転させながら連続的に形成する単結晶引上方法におい
て、上記単結晶棒の上昇によりそのダッシュズネック部
が所定高さに達したら可撓性材の一端を該ダッシュズネ
ック部に係合させる工程と、上記単結晶棒の回転により
可撓性材を上記ダッシュズネック部から上記肩部を経て
上記直胴部に巻き付ける工程と、を有するものである。
Further, in the single crystal pulling method according to the second aspect, the dash's neck portion, shoulder portion and straight body portion of the single crystal rod are
In the single crystal pulling method of continuously forming while rotating, one end of the flexible material is engaged with the dash neck portion when the dash neck portion reaches a predetermined height due to the rise of the single crystal rod. And a step of winding a flexible material from the dash neck portion through the shoulder portion to the straight body portion by rotating the single crystal ingot.

【0007】[0007]

【作用】本発明に係る単結晶引上方法にあっては、種子
結晶から単結晶棒のダッシュズネック部、肩部、直胴部
をそれぞれ回転させながら形成する。そして、所定長さ
だけ単結晶棒の直胴部を成長させる。単結晶棒のダッシ
ュズネック部が所定高さに達する。このとき、可撓性
材、例えばカーボンファイバ製の糸の一端をダッシュズ
ネック部に係合させる。例えば、種子結晶にピンを取り
付け、このピンにドラムに巻かれた糸の一端を係止させ
る。この係止した糸は単結晶棒の回転上昇によりダッシ
ュズネック部に係合しながら巻かれていく。そして、こ
の糸は単結晶棒の肩部を経て、その直胴部まで巻かれて
いく。この結果、単結晶棒のダッシュズネック部は補強
される。したがって、単結晶棒のダッシュズネック部
は、材料力学的に強化されるものである。
In the method for pulling a single crystal according to the present invention, the seed crystal is formed while rotating the dash neck portion, shoulder portion and straight body portion of the single crystal rod. Then, the straight body portion of the single crystal ingot is grown by a predetermined length. The dash neck portion of the single crystal rod reaches a predetermined height. At this time, one end of a flexible material, for example, a fiber made of carbon fiber is engaged with the dash neck portion. For example, a pin is attached to the seed crystal, and one end of the thread wound on the drum is locked to this pin. The locked thread is wound while engaging with the dash neck portion by the rotation rise of the single crystal rod. Then, this thread passes through the shoulder portion of the single crystal rod and is wound up to its straight body portion. As a result, the dash neck portion of the single crystal rod is reinforced. Therefore, the dash's neck portion of the single crystal ingot is reinforced by material dynamics.

【0008】[0008]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1は本発明の一実施例に係る単結晶引上装置の
断面図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a single crystal pulling apparatus according to an embodiment of the present invention.

【0009】この図に示すように、チャンバ(図示略)
内には回転自在であって、かつ、昇降自在に坩堝軸1が
直立した状態で設けられている。この坩堝軸1の上端に
は、有底円筒状の黒鉛サセプタ2が固定されている。こ
の黒鉛サセプタ2内に、石英坩堝3が着脱可能に保持さ
れている。この石英坩堝3も有底円筒状をなしている。
この石英坩堝3内には、メルト状態のシリコン融液4が
注入、保持されている。黒鉛サセプタ2の外側には、シ
リコン融液4の加熱用ヒータ5がこの黒鉛サセプタ2を
取り囲むように配設されている。さらに、石英坩堝3の
上方には、その半径が略一定の(例えば口径8インチ)
シリコン単結晶棒9を引き上げるための引上機構(図示
略)が設けられている。
As shown in this figure, a chamber (not shown)
Inside, a crucible shaft 1 is provided in an upright state so as to be rotatable and to move up and down. A cylindrical graphite susceptor 2 having a bottom is fixed to the upper end of the crucible shaft 1. A quartz crucible 3 is detachably held in the graphite susceptor 2. This quartz crucible 3 also has a bottomed cylindrical shape.
A silicon melt 4 in a melted state is injected and held in the quartz crucible 3. A heater 5 for heating the silicon melt 4 is disposed outside the graphite susceptor 2 so as to surround the graphite susceptor 2. Further, above the quartz crucible 3, its radius is substantially constant (for example, a diameter of 8 inches).
A pulling mechanism (not shown) for pulling up the silicon single crystal ingot 9 is provided.

【0010】この引上機構によって、引上ワイヤ6が石
英坩堝3の上方で、石英坩堝3と反対方向に回転しつつ
上下動するようになっている。この引上ワイヤ6の先端
には、シードチャック7を介してシリコン単結晶の種子
結晶8が取り付けられている。この種子結晶8に、C字
状でモリブデン製のピン14が突出している。種子結晶
8を、シリコン融液4に浸した後上昇させることによ
り、種子結晶8を始点として順次成長したシリコン単結
晶棒9がアルゴン雰囲気中で引き上げられるものであ
る。この引き上げの際に、種子結晶8に存在していた転
位がシリコン単結晶棒9中に伝播しないように、種子結
晶8から成長させるとき、シリコン単結晶棒9を一旦細
く絞ってから太らせるダッシュズネック部10を形成し
て、シリコン単結晶棒9を無転位化させている。
By this pulling mechanism, the pulling wire 6 is moved above the quartz crucible 3 while rotating in the direction opposite to the quartz crucible 3 while moving up and down. A seed crystal 8 of silicon single crystal is attached to the tip of the pulling wire 6 via a seed chuck 7. A C-shaped pin 14 made of molybdenum projects from the seed crystal 8. By immersing the seed crystal 8 in the silicon melt 4 and then raising it, the silicon single crystal rods 9 sequentially grown with the seed crystal 8 as a starting point are pulled in an argon atmosphere. At the time of this pulling up, when growing from the seed crystal 8 so that dislocations existing in the seed crystal 8 do not propagate into the silicon single crystal rod 9, the silicon single crystal rod 9 is once narrowed and then thickened. The silicon necks 10 are formed to make the silicon single crystal ingots 9 dislocation-free.

【0011】支持板13が、石英坩堝3の上方で、チャ
ンバの内壁に、所定高さ位置で固定されている。この支
持板13上に、糸巻機構20が設置されている。この糸
巻機構20は、支持板13上を水平移動可能な走行台車
21と、この走行台車21に軸着されたドラム15を有
している。走行台車21はバネ22の一端に係止してい
る。このバネ22の他端は、支持板13の縦板23に係
止している。このバネ22は、走行台車21をシリコン
単結晶棒9より離れる方向に付勢している。ドラム15
には、可撓性材、例えばカーボンファイバ製の糸11が
巻かれている。この糸11の直径は0.2〜0.3mmで
ある。糸11の一部にはフックが固着している。糸11
のフックが種子結晶7のピン14に係止されると、糸1
1はシリコン単結晶棒9の回転上昇により、ダッシュズ
ネック部10に係合しながら巻かれていく。そして、こ
の糸11はシリコン単結晶棒9の肩部12を経て、その
直胴部16まで巻かれていく。この結果、シリコン単結
晶棒9のダッシュズネック部10は補強されるものであ
る。
A support plate 13 is fixed to the inner wall of the chamber above the quartz crucible 3 at a predetermined height position. The bobbin winding mechanism 20 is installed on the support plate 13. The bobbin winding mechanism 20 includes a traveling carriage 21 that can move horizontally on the support plate 13 and a drum 15 that is axially mounted on the traveling carriage 21. The traveling carriage 21 is locked to one end of a spring 22. The other end of the spring 22 is locked to the vertical plate 23 of the support plate 13. The spring 22 biases the traveling carriage 21 in a direction away from the silicon single crystal rod 9. Drum 15
A flexible material, for example, a fiber 11 made of carbon fiber is wound around the. The diameter of this thread 11 is 0.2-0.3 mm. A hook is fixed to a part of the thread 11. Thread 11
When the hook of is locked to the pin 14 of the seed crystal 7, the thread 1
1 is wound while engaging with the dash neck portion 10 as the silicon single crystal rod 9 is rotated and raised. Then, the thread 11 passes through the shoulder portion 12 of the silicon single crystal rod 9 and is wound up to the straight body portion 16. As a result, the dash neck portion 10 of the silicon single crystal ingot 9 is reinforced.

【0012】次に、シリコン単結晶棒の引上方法を説明
する。引き上げに先立って、黒鉛サセプタ2内にある石
英坩堝3内に高純度多結晶シリコン、および、ボロンを
高濃度にドープしたシリコン結晶の小片を入れる。これ
ら全体を坩堝軸1に取り付ける。チャンバ内を真空装置
で真空にした後アルゴンガスを供給し、チャンバ内を1
0〜20Torrのアルゴン雰囲気にする。ヒータ5に
通電して石英坩堝3を加熱し原料のシリコン等を溶融す
る。シードチャック7にシリコン単結晶の種子結晶8を
取り付け、この種子結晶8をシリコン融液4の液面の中
心に接触させる。この接触と同時に、モータで坩堝軸1
を所定の坩堝回転速度で一方向に回転させるともに、引
上機構により、15回転/分の結晶回転速度で種子結晶
8を、坩堝回転速度とは逆方向に回転させながらゆっく
り上昇させる。
Next, a method for pulling up a silicon single crystal ingot will be described. Prior to the pulling, high-purity polycrystalline silicon and a small piece of silicon crystal doped with boron at a high concentration are put in a quartz crucible 3 in the graphite susceptor 2. The whole of these is attached to the crucible shaft 1. After the inside of the chamber is evacuated with a vacuum device, argon gas is supplied to make the inside of the chamber 1
Argon atmosphere of 0 to 20 Torr. The heater 5 is energized to heat the quartz crucible 3 to melt the raw material silicon or the like. A seed crystal 8 of silicon single crystal is attached to the seed chuck 7, and this seed crystal 8 is brought into contact with the center of the liquid surface of the silicon melt 4. Simultaneously with this contact, the motor will move the crucible shaft 1
Is rotated in one direction at a predetermined crucible rotation speed, and the pulling mechanism slowly raises the seed crystal 8 at a crystal rotation speed of 15 rotations / minute while rotating the seed crystal 8 in a direction opposite to the crucible rotation speed.

【0013】この引き上げの開始後は所定速度で引き上
げ、種子結晶8の下端にシリコン単結晶棒9のダッシュ
ズネック部10を形成する。このダッシュズネック部1
0の大径部の直径は10mm、その小径部の直径は3m
m、その長さは200mmとする。この後、引上速度を
遅くし、シリコン単結晶棒9の直径を増大して肩部12
を形成する。この後、引上速度等を変化させて、シリコ
ン単結晶棒9の直胴部16(直径200mm)を形成す
る。そして、この直胴部16がシリコン融液4の液面よ
り1m程度の長さに引き上げ成長させる。直胴部16が
1mの長さになる前に、ドラム15に巻かれた糸11
を、引上ワイヤ6に接触しないように、ドラム15から
引き出し、糸巻機構20の反対側へ引っ張り出す。
After the pulling is started, the seed crystal 8 is pulled at a predetermined speed to form a dash neck portion 10 of a silicon single crystal ingot 9 at the lower end of the seed crystal 8. This dash neck 1
The diameter of the large diameter part of 0 is 10 mm, and the diameter of the small diameter part is 3 m
m, and its length is 200 mm. After this, the pulling speed is slowed down, the diameter of the silicon single crystal ingot 9 is increased, and the shoulder 12
To form. Thereafter, the pulling speed and the like are changed to form the straight body portion 16 (diameter 200 mm) of the silicon single crystal ingot 9. Then, the straight body portion 16 is pulled up from the liquid surface of the silicon melt 4 to a length of about 1 m and grown. The thread 11 wound on the drum 15 before the straight body portion 16 becomes 1 m long
Is pulled out from the drum 15 so as not to come into contact with the pulling wire 6 and pulled out to the opposite side of the bobbin winding mechanism 20.

【0014】次に、この糸11をドラム15を中心に水
平に移動させる。糸11の一部に固着したフックを種子
結晶7のピン14に係止させる。この係止後、糸巻機構
20の反対側へ引っ張り出した糸11の部分を切断す
る。この結果、糸11は、その一端に固着したフックに
よりピン14に係止し、糸11の他端は糸巻機構20の
ドラム15に巻かれている状態になる。この係止した糸
11はシリコン単結晶棒9の回転上昇により、そのダッ
シュズネック部10に係合しながら巻かれていく。この
とき、糸11は同一箇所で3重程度に巻かれるものであ
る。そして、この糸11はシリコン単結晶棒9の肩部1
2を経て、その直胴部16の所定部まで巻かれ続けるも
のである。この糸11の引張力(ダッシュズネック部1
0に傷がつかない程度にバネ22で調節可能)により、
糸11自身が荷重を受け、その剛性が向上する。次い
で、シリコン単結晶棒9の直胴部16の所定位置まで糸
11が巻かれた後、糸巻機構20内で糸11に、ポリ4
フッ化エチレン(PTFE)の液を塗布する。このPT
FE液を塗布しながら、糸11を数回直胴部16に巻続
ける。PTFE液により糸11は、直胴部16に接着し
続けるものである。この後、糸11を糸巻機構20内で
切断する。この巻き付けの結果、シリコン単結晶棒9の
ダッシュズネック部10の断面係数が大きくなり、その
曲げ剛性が補強される。したがって、シリコン単結晶棒
9のダッシュズネック部10は、材料力学的に強化され
るものである。次に、シリコン単結晶棒9の直胴部16
を長さ2mになるまで引き上げ成長させる。この後、シ
リコン単結晶棒9の結晶径を徐々に減少させ、テイル処
理を完了する。
Next, the yarn 11 is moved horizontally around the drum 15. A hook fixed to a part of the thread 11 is locked to the pin 14 of the seed crystal 7. After this locking, the portion of the thread 11 pulled out to the opposite side of the thread winding mechanism 20 is cut. As a result, the thread 11 is locked to the pin 14 by the hook fixed to one end thereof, and the other end of the thread 11 is wound around the drum 15 of the thread winding mechanism 20. The locked thread 11 is wound while being engaged with the dash's neck portion 10 by the rotation rise of the silicon single crystal rod 9. At this time, the thread 11 is wound around the same place in about three layers. The thread 11 is the shoulder 1 of the silicon single crystal rod 9.
It continues to be wound up to a predetermined portion of the straight body portion 16 after passing through 2. Tensile force of this thread 11 (dash neck 1
(Adjustable with spring 22 so that 0 is not scratched)
The yarn 11 itself receives a load, and its rigidity is improved. Next, after the thread 11 is wound up to a predetermined position on the straight body portion 16 of the silicon single crystal rod 9, the thread 11 is wound on the thread 11 in the thread winding mechanism 20.
A solution of ethylene fluoride (PTFE) is applied. This PT
While applying the FE liquid, the yarn 11 is continuously wound around the straight body portion 16 several times. The thread 11 continues to adhere to the straight body portion 16 with the PTFE liquid. Then, the thread 11 is cut in the thread winding mechanism 20. As a result of this winding, the section modulus of the dash's neck portion 10 of the silicon single crystal ingot 9 becomes large, and its bending rigidity is reinforced. Therefore, the dash's neck portion 10 of the silicon single crystal ingot 9 is reinforced by material dynamics. Next, the straight body portion 16 of the silicon single crystal ingot 9
Is pulled up to a length of 2 m and grown. After that, the crystal diameter of the silicon single crystal ingot 9 is gradually reduced, and the tail treatment is completed.

【0015】なお、PTFE液の接着剤に代えて、シリ
コン単結晶棒9のダッシュズネック部10、肩部12、
直胴部16に巻き付けた糸11全体を、その巻き付け後
サポータを用いて覆ってもよい。このサポータは糸11
がシリコン単結晶棒9から解れることを防止するもので
ある。また、直胴部16の所定部を覆った後、糸11を
切断せずに、糸巻機構20ごとシリコン単結晶棒9の上
昇、回転に合わせて引き上げてもよい。シリコン単結晶
棒9のテイル処理まで糸11を巻続け、シリコン単結晶
棒9全体を覆ってもよい。このときは、糸11がシリコ
ン単結晶棒9の保温に役立つ。さらに、可撓性材は、カ
ーボンファイバ製の糸に限られるものではなく、フッ素
樹脂などのファイバでもよい。また、可撓性材はテープ
状でもよい。さらに、糸11の接着用として、PTFE
液の他に、ポリフッ化エチレンプロピレン(FEP)、
PFA、ポリクロロトリフルオロエチレン(PCTF
E)、FR−EPT、ポリエチレン(PE)、ポリオレ
フィン、フッ素ゴム(FKM)、または、シリコンゴム
(Q)、ポリイミド、ポリピロール等の耐熱性のよい熱
硬化性樹脂などでもよい。
In place of the PTFE liquid adhesive, a dash neck portion 10, a shoulder portion 12, and a shoulder portion 12 of the silicon single crystal rod 9 are used.
The entire thread 11 wound around the straight body portion 16 may be covered with a supporter after the winding. This supporter is thread 11
Is to be released from the silicon single crystal ingot 9. Further, after covering a predetermined portion of the straight body portion 16, the thread 11 may be pulled up along with the lifting and rotation of the silicon single crystal rod 9 without cutting the thread 11. The thread 11 may be continuously wound until the silicon single crystal rod 9 is tail-treated to cover the entire silicon single crystal rod 9. At this time, the thread 11 serves to keep the silicon single crystal rod 9 warm. Further, the flexible material is not limited to the carbon fiber thread, and may be a fiber such as fluororesin. Further, the flexible material may be in a tape shape. In addition, PTFE is used for bonding the thread 11.
In addition to liquid, polyfluorinated ethylene propylene (FEP),
PFA, polychlorotrifluoroethylene (PCTF
E), FR-EPT, polyethylene (PE), polyolefin, fluororubber (FKM), or silicone rubber (Q), polyimide, polypyrrole, or other thermosetting resin having good heat resistance may be used.

【0016】以上の結果、シリコン単結晶棒9のダッシ
ュズネック部10を材料力学的に補強することにより、
シリコン融液4中にシリコン単結晶棒9が自重により落
下することはない。したがって、直径8インチ、長さ2
000mm、重さ150kgf程度のシリコン単結晶棒
9を安全に引き上げ成長させることができる。
As a result of the above, by reinforcing the dash's neck portion 10 of the silicon single crystal ingot 9 mechanically,
The silicon single crystal ingot 9 does not drop into the silicon melt 4 due to its own weight. Therefore, 8 inches in diameter and 2 in length
A silicon single crystal ingot 9 having a weight of about 000 mm and a weight of about 150 kgf can be safely pulled up and grown.

【0017】[0017]

【発明の効果】以上説明してきたように本発明に係る単
結晶引上装置およびその引上方法によれば、単結晶棒の
ダッシュズネック部を材料力学的に補強することによ
り、結晶融液中に単結晶棒が自重により落下することは
ない。
As described above, according to the apparatus for pulling a single crystal and the method for pulling the same according to the present invention, the dash-neck portion of the single crystal rod is mechanically reinforced to form a crystal melt. The single crystal rod does not fall inside due to its own weight.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に係る単結晶引上装置の断面
図である。
FIG. 1 is a sectional view of a single crystal pulling apparatus according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

3 石英坩堝 4 シリコン融液(結晶融液) 5 ヒータ 8 シリコン単結晶の種子結晶 9 シリコン単結晶棒 10 ダッシュズネック部 11 カーボンファイバ製の糸(可撓性材) 12 肩部 15 ドラム 16 胴体部 3 Quartz Crucible 4 Silicon Melt (Crystal Melt) 5 Heater 8 Silicon Single Crystal Seed Crystal 9 Silicon Single Crystal Rod 10 Dash's Neck Part 11 Carbon Fiber Thread (Flexible Material) 12 Shoulder 15 Drum 16 Body Department

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐平 健彰 埼玉県大宮市北袋町一丁目297番地 三菱 マテリアル株式会社中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takeaki Sahira 1-297 Kitabukurocho, Omiya City, Saitama Prefecture Central Research Laboratory, Mitsubishi Materials Corporation

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 結晶融液を保持する坩堝と、 種子結晶を把持し、該種子結晶を上記結晶融液から引き
上げつつ、該種子結晶から該種子結晶より直径の大きい
単結晶棒を成長させる引上機構と、を備えた単結晶引上
装置において、 上記種子結晶が上記結晶融液の液面から所定距離引き上
げられたとき、該単結晶棒のダッシュズネック部に巻き
つけられる可撓性材を備えることを特徴とする単結晶引
上装置。
1. A crucible for holding a crystal melt, and a pulling means for growing a single crystal rod having a diameter larger than that of the seed crystal while holding the seed crystal and pulling the seed crystal from the crystal melt. In a single crystal pulling apparatus including an upper mechanism, a flexible material that is wound around a dash neck portion of the single crystal rod when the seed crystal is pulled up by a predetermined distance from the liquid surface of the crystal melt. An apparatus for pulling a single crystal, comprising:
【請求項2】 単結晶棒のダッシュズネック部、肩部、
直胴部を、回転させながら連続的に形成する単結晶引上
方法において、 上記単結晶棒の上昇によりそのダッシュズネック部が所
定高さに達したら可撓性材の一端を該ダッシュズネック
部に係合させる工程と、 上記単結晶棒の回転により可撓性材を上記ダッシュズネ
ック部から上記肩部を経て上記直胴部に巻き付ける工程
と、を有することを特徴とする単結晶引上方法。
2. A dash's neck portion, a shoulder portion of a single crystal rod,
In the single crystal pulling method for continuously forming the straight body portion while rotating, when the dash neck portion reaches a predetermined height by the raising of the single crystal rod, one end of the flexible material is attached to the dash neck portion. And a step of winding the flexible material from the dash neck portion through the shoulder portion to the straight body portion by the rotation of the single crystal ingot, the single crystal pulling. Upper way.
JP9341392A 1992-03-19 1992-03-19 Single crystal pulling apparatus and pulling method thereof Expired - Fee Related JP2946936B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9341392A JP2946936B2 (en) 1992-03-19 1992-03-19 Single crystal pulling apparatus and pulling method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9341392A JP2946936B2 (en) 1992-03-19 1992-03-19 Single crystal pulling apparatus and pulling method thereof

Publications (2)

Publication Number Publication Date
JPH05270976A true JPH05270976A (en) 1993-10-19
JP2946936B2 JP2946936B2 (en) 1999-09-13

Family

ID=14081618

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2946936B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6022411A (en) * 1997-03-28 2000-02-08 Super Silicon Crystal Research Institute Corp. Single crystal pulling apparatus
US6033472A (en) * 1997-03-28 2000-03-07 Super Silicon Crystal Research Institute Corp. Semiconductor single crystal manufacturing apparatus
US6077348A (en) * 1997-03-31 2000-06-20 Super Silicon Crystal Research Institute Corp. Single crystal pulling apparatus, single crystal support mechanism, and single crystal pulling method
US6117234A (en) * 1997-03-27 2000-09-12 Super Silicon Crystal Research Institute Corp. Single crystal growing apparatus and single crystal growing method
US6130500A (en) * 1997-12-03 2000-10-10 Lg Electronics Inc. Doming effect resistant shadow mask for cathode ray tube and its fabricating method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6117234A (en) * 1997-03-27 2000-09-12 Super Silicon Crystal Research Institute Corp. Single crystal growing apparatus and single crystal growing method
US6022411A (en) * 1997-03-28 2000-02-08 Super Silicon Crystal Research Institute Corp. Single crystal pulling apparatus
US6033472A (en) * 1997-03-28 2000-03-07 Super Silicon Crystal Research Institute Corp. Semiconductor single crystal manufacturing apparatus
US6077348A (en) * 1997-03-31 2000-06-20 Super Silicon Crystal Research Institute Corp. Single crystal pulling apparatus, single crystal support mechanism, and single crystal pulling method
US6130500A (en) * 1997-12-03 2000-10-10 Lg Electronics Inc. Doming effect resistant shadow mask for cathode ray tube and its fabricating method

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