JPH05265196A - Flexible mask - Google Patents

Flexible mask

Info

Publication number
JPH05265196A
JPH05265196A JP9229892A JP9229892A JPH05265196A JP H05265196 A JPH05265196 A JP H05265196A JP 9229892 A JP9229892 A JP 9229892A JP 9229892 A JP9229892 A JP 9229892A JP H05265196 A JPH05265196 A JP H05265196A
Authority
JP
Japan
Prior art keywords
film
flexible mask
transparent
metal
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9229892A
Other languages
Japanese (ja)
Inventor
Nagaharu Koaizawa
長治 小相沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nidec Sankyo Corp
Original Assignee
Nidec Sankyo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nidec Sankyo Corp filed Critical Nidec Sankyo Corp
Priority to JP9229892A priority Critical patent/JPH05265196A/en
Publication of JPH05265196A publication Critical patent/JPH05265196A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60Substrates

Abstract

PURPOSE:To lessen the metal fatigue of metallic patterns and the peeling from a film even if the flexible mask is repetitively used. CONSTITUTION:A protective film 13 consisting of a transparent or translucent high-polymer resin is provided on the transparent film 11 constituted by forming the metallic patterns 12 consisting of desired metallic films on the transparent film 11 having flexibility. The metallic patterns are by the protective film 13 against the metal fatigue and peeling by the vigorous bending with a substrate and further, the breakdown of the metallic patterns is prevented and a long life is obtd. even if the flexible mask 10 is repetitively used.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は例えば感熱記録用のサー
マルヘッド等の曲面を有する素子にホトリソエッチング
を行う際に用いられるフレキシブルマスクに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible mask used when photolithographically etching an element having a curved surface such as a thermal head for thermal recording.

【0002】[0002]

【従来の技術】従来、曲面を有する絶縁基板上にホトリ
ソエッチング技術によって導体パターン等を形成するに
際しては、露光用のマスクとしてフレキシブルマスクが
用いられる。図3は従来のフレキシブルマスクを示すも
ので、例えばポリエチレンテレフタレート(PET)か
らなる可撓性を有する透明フィルム1上には、金属膜か
らなる所望の金属パターン2が形成されている。かかる
従来のフレキシブルマスクを用いて、電気配線パターン
等の導体パターン等を形成するには、先ず、図示しない
絶縁基板上の少なくとも2つの面に、電極等の金属層を
蒸着或いはスパッタ法、もしくは厚膜成膜法によって形
成した後、上記金属層上にレジストを塗布する。しかる
後に、暗部と透明部よりなる所定の金属パターン2が形
成された上記フレキシブルマスクを、絶縁基板上のレジ
スト膜に密着させ、このマスクを介して露光させる。こ
のとき、フレキシブルマスクを絶縁基板の少なくとも2
つの面に密着させるため、絶縁基板の角部を屈曲させて
密着させる。その後、現像処理、エッチング処理及びレ
ジスト剥離処理を行うことによって、絶縁基板上に所定
の導体パターンが形成される。
2. Description of the Related Art Conventionally, a flexible mask is used as an exposure mask when forming a conductor pattern or the like on a curved insulating substrate by a photolithographic etching technique. FIG. 3 shows a conventional flexible mask in which a desired metal pattern 2 made of a metal film is formed on a flexible transparent film 1 made of, for example, polyethylene terephthalate (PET). In order to form a conductor pattern such as an electric wiring pattern using such a conventional flexible mask, first, a metal layer such as an electrode is vapor-deposited or sputtered on at least two surfaces of an insulating substrate (not shown), or the thickness is increased. After forming by the film forming method, a resist is applied on the metal layer. Then, the flexible mask on which a predetermined metal pattern 2 composed of a dark portion and a transparent portion is formed is brought into close contact with the resist film on the insulating substrate and exposed through the mask. At this time, attach the flexible mask to at least two of the insulating substrates.
The corners of the insulating substrate are bent and brought into close contact with each other in order to bring them into close contact with each other. After that, a predetermined conductor pattern is formed on the insulating substrate by performing a developing process, an etching process, and a resist stripping process.

【0003】[0003]

【発明が解決しようとする課題】フレキシブルマスクを
絶縁基板上のレジスト膜に密着させて露光させると、絶
縁基板の角部の曲率半径が5mm以下の場合には、フレキ
シブルマスクが激しく屈曲させられると共に、屈曲状態
で上記レジスト膜と接触する。この結果、フレキシブル
マスクに形成された金属パターン2の金属疲労が生じた
り、透明フィルム1から剥離することがある。さらに、
この状態で数回にわたり使用していると、金属パターン
2が破壊され、マスクとしての機能が失われる問題があ
った。
When the flexible mask is brought into close contact with the resist film on the insulating substrate and exposed, when the radius of curvature of the corner of the insulating substrate is 5 mm or less, the flexible mask is bent sharply. , In contact with the resist film in a bent state. As a result, metal fatigue of the metal pattern 2 formed on the flexible mask may occur, or peeling may occur from the transparent film 1. further,
If it is used several times in this state, there is a problem that the metal pattern 2 is destroyed and the function as a mask is lost.

【0004】本発明は、このような問題点を解消するた
めになされたもので、フレキシブルマスクを繰り返し使
用しても、金属パターンの金属疲労やフィルムからの剥
離を低減させることのできるフレキシブルマスクを提供
することを目的とする。
The present invention has been made in order to solve such a problem, and provides a flexible mask which can reduce metal fatigue of a metal pattern and peeling from a film even if the flexible mask is repeatedly used. The purpose is to provide.

【0005】[0005]

【課題を解決するための手段】本発明は、可撓性を有す
る透明フィルム上に、所望の金属膜からなる金属パター
ンを形成したフレキシブルマスクにおいて、上記金属パ
ターンが形成された上記透明フィルム上に透明もしくは
準透明の高分子樹脂からなる保護膜を設けたことを特徴
としている。
The present invention provides a flexible mask in which a metal pattern made of a desired metal film is formed on a transparent film having flexibility, and the transparent film on which the metal pattern is formed. It is characterized in that a protective film made of a transparent or semi-transparent polymer resin is provided.

【0006】[0006]

【作用】金属パターンが形成された透明フィルム上に透
明の高分子樹脂からなる保護膜を設けると、この保護膜
が絶縁基板との激しい屈曲による金属疲労や剥離から金
属パターンを保護する。従って、フレキシブルマスクを
数回にわたり繰り返し使用しても金属パターンの破壊が
防止され、寿命が大幅に向上する。
When a protective film made of a transparent polymer resin is provided on the transparent film on which the metal pattern is formed, this protective film protects the metal pattern from metal fatigue and peeling due to severe bending with the insulating substrate. Therefore, even if the flexible mask is repeatedly used several times, the metal pattern is prevented from being broken and the life is greatly improved.

【0007】[0007]

【実施例】以下、図面を参照しながら本発明にかかるフ
レキシブルマスクの実施例について説明する。図1にお
いて、フレキシブルマスク10は、一例としてポリエチ
レンテレフタレート(PET)からなる可撓性を有する
透明フィルム11が用いられ、このフィルム11上に
は、クロム等の金属膜からなる所望の金属パターン12
が形成されている。さらに、金属パターン12が形成さ
れた透明フィルム11上には、スチレンや塩素化ポリス
チレン等々の可撓性を有し、かつ透明もしくは準透明の
高分子樹脂からなる保護膜13が設けられている。
Embodiments of the flexible mask according to the present invention will be described below with reference to the drawings. In FIG. 1, a flexible transparent film 11 made of polyethylene terephthalate (PET) is used as an example of the flexible mask 10, and a desired metal pattern 12 made of a metal film such as chromium is formed on the film 11.
Are formed. Further, on the transparent film 11 on which the metal pattern 12 is formed, a protective film 13 made of a transparent or semitransparent polymer resin having flexibility such as styrene and chlorinated polystyrene is provided.

【0008】かかる構成からなるフレキシブルマスク1
0は、以下のように製造される。先ず、ポリエチレンテ
レフタレート(PET)からなる可撓性を有する透明フ
ィルム11上に、蒸着或いはスパッタ装置を用いてクロ
ム(Cr)を、例えば1500オングストロームの厚み
に着膜することにより金属膜を形成する。次に、金属膜
上にレジスト膜を塗布し、このレジスト膜面に対し、原
版となる例えばガラスホトマスクをアライメントのうえ
密着添付して露光を行った後に、さらに現像を行う。こ
れにより、金属膜上には原版と同一のレジストパターン
が形成される。その後、レジストパターンが形成された
金属膜をエッチング処理し、さらにレジスト膜を剥離す
ることにより、透明フィルム11上に金属膜パターン1
2が形成される。しかる後に、図1に示すように、金属
膜パターン12を完全に被覆するように、金属膜パター
ン12より厚く、透明の高分子樹脂からなる保護膜13
を設けることによってフレキシブルマスク10が完成す
る。
A flexible mask 1 having such a structure
0 is manufactured as follows. First, a metal film is formed by depositing chromium (Cr) on the transparent transparent film 11 made of polyethylene terephthalate (PET) to have a thickness of, for example, 1500 angstrom using a vapor deposition or sputtering device. Next, a resist film is applied on the metal film, and a mask such as a glass photomask serving as an original plate is aligned and closely attached to the resist film surface for exposure, and further development is performed. As a result, the same resist pattern as the original plate is formed on the metal film. After that, the metal film having the resist pattern formed thereon is subjected to an etching treatment, and the resist film is peeled off to form the metal film pattern 1 on the transparent film 11.
2 is formed. Thereafter, as shown in FIG. 1, a protective film 13 made of a transparent polymer resin thicker than the metal film pattern 12 so as to completely cover the metal film pattern 12.
The flexible mask 10 is completed by providing.

【0009】上記可撓性を有する透明フィルム11とし
ては、ポリエチレンテレフタレート(PET)の他に、
ポリエチレンナフタレート(PEN)、ポリカーボネー
ト(PC)、ポリエーテルケトン(PEK)、ポリエー
テルエーテルケトン(PEEK)、ポリフェニレンオキ
シド(PPO)等が使用可能である。また、上記金属膜
としては、クロム(Cr)の他に、クロム系合金、金
(Au)、銅(Cu)、アルミニウム(Al)チタン
(Ti)、モリブデン(Mo)タングステン(W)等の
金属材料が使用可能である。さらに、保護膜13として
は、上記の他にポリエチレン、ボリエステル系樹脂、ポ
リアセタール、ポリアリレート、環化イソプレンゴム系
感光性樹脂、及びフェノール樹脂等の高分子樹脂が使用
可能である。
Examples of the transparent film 11 having flexibility include polyethylene terephthalate (PET),
Polyethylene naphthalate (PEN), polycarbonate (PC), polyether ketone (PEK), polyether ether ketone (PEEK), polyphenylene oxide (PPO), etc. can be used. Further, as the metal film, in addition to chromium (Cr), a metal such as a chromium alloy, gold (Au), copper (Cu), aluminum (Al) titanium (Ti), molybdenum (Mo) tungsten (W), etc. Material is available. Further, as the protective film 13, polyethylene, polyester-based resin, polyacetal, polyarylate, cyclized isoprene rubber-based photosensitive resin, and polymer resin such as phenol resin can be used in addition to the above.

【0010】以上のように構成されたフレキシブルマス
ク10を用いることにより、サーマルヘッド20の如き
素子の板状基板21の2つの面に電気配線パターン等の
導体パターン等を形成することができる。上記板状基板
21は例えばアルミナ・セラミックからなり、板状基板
21の少なくとも2つの表面にはガラス・グレーズ層2
2が設けられている。このグレーズ層22上には、蒸着
或いはスパッタ法、もしくは、厚膜ペーストの印刷焼成
により、金(Au)等の金属膜23が被膜形成されてい
る。さらに、金属膜23上にはレジスト膜24を塗布に
よって形成し、しかる後に、暗部と透明部よりなる金属
パターン12が形成された前述したフレキシブルマスク
10をレジスト膜24に密着させ、このマスクを介して
露光させる。
By using the flexible mask 10 constructed as described above, it is possible to form a conductor pattern such as an electric wiring pattern on the two surfaces of the plate-like substrate 21 of an element such as the thermal head 20. The plate-like substrate 21 is made of, for example, alumina ceramic, and the glass glaze layer 2 is formed on at least two surfaces of the plate-like substrate 21.
Two are provided. A metal film 23 of gold (Au) or the like is formed on the glaze layer 22 by vapor deposition or sputtering, or by printing and firing a thick film paste. Further, a resist film 24 is formed on the metal film 23 by coating, and then the above-mentioned flexible mask 10 on which the metal pattern 12 composed of a dark portion and a transparent portion is formed is brought into close contact with the resist film 24, and the mask is interposed. To expose.

【0011】このとき、フレキシブルマスク10の金属
パターン12側を板状基板21の少なくとも2つの面に
密着させると共に、板状基板21の角部に沿うように屈
曲させて密着させる。このように、板状基板21の2つ
の面及び角部に沿わせると、金属パターン12上の保護
膜13がレジスト膜24に密着され、金属パターン12
は保護膜13によって保護される。レジスト膜24が施
された角部の曲率半径Rが5mm程度、或いはそれ以下で
あっても、フレキシブルマスク10は角部になじむよう
に屈曲して密着する。そして、露光処理後にエッチング
処理及びレジスト剥離処理を行うことにより板状基板上
に所定の導体パターンが形成される。
At this time, the metal pattern 12 side of the flexible mask 10 is brought into close contact with at least two surfaces of the plate-like substrate 21, and is bent so as to be along the corners of the plate-like substrate 21 and brought into close contact therewith. As described above, when the two surfaces and the corners of the plate-shaped substrate 21 are aligned, the protective film 13 on the metal pattern 12 is adhered to the resist film 24, and the metal pattern 12 is formed.
Are protected by the protective film 13. Even if the radius of curvature R of the corner portion provided with the resist film 24 is about 5 mm or less, the flexible mask 10 is bent and adheres so as to fit the corner portion. Then, a predetermined conductor pattern is formed on the plate-shaped substrate by performing an etching process and a resist stripping process after the exposure process.

【0012】本発明は上記の各実施例に限定されるもの
ではなく、保護膜は透明もしくは準透明な高分子樹脂で
あれば良く、汎用の樹脂から適宜選択可能である。ま
た、透明フィルムや金属膜については本発明の要旨を逸
脱しない範囲において種々変更可能である。
The present invention is not limited to the above-mentioned embodiments, and the protective film may be any transparent or semi-transparent polymer resin, and can be appropriately selected from general-purpose resins. Further, the transparent film and the metal film can be variously modified without departing from the scope of the present invention.

【0013】[0013]

【発明の効果】以上の説明から明らかなように、本発明
のフレキシブルマスクによれば、金属パターンが形成さ
れた透明フィルム上に、透明の高分子樹脂からなる保護
膜を設けているので、この保護膜が基板との激しい屈曲
による金属疲労や剥離から金属パターンを保護すること
ができる。従って、フレキシブルマスクを数回にわたり
繰り返し使用しても金属パターンの破壊を防止すること
ができ、長寿命にすることができる利点がある。
As is apparent from the above description, according to the flexible mask of the present invention, since the protective film made of the transparent polymer resin is provided on the transparent film on which the metal pattern is formed, The protective film can protect the metal pattern from metal fatigue and peeling due to severe bending with the substrate. Therefore, even if the flexible mask is repeatedly used several times, it is possible to prevent the metal pattern from being broken, and there is an advantage that the life can be extended.

【0014】[0014]

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明にかかるフレキシブルマスクの一実施例
を示す要部断面図である。
FIG. 1 is a sectional view of an essential part showing an embodiment of a flexible mask according to the present invention.

【図2】同上フレキシブルマスクの使用状態を示す要部
断面図である。
FIG. 2 is a sectional view of an essential part showing a usage state of the above flexible mask.

【図3】従来のフレキシブルマスクを示す断面図であ
る。
FIG. 3 is a cross-sectional view showing a conventional flexible mask.

【符号の説明】[Explanation of symbols]

10 フレキシブルマスク 11 透明フィルム 12 金属パターン 13 保護膜 10 flexible mask 11 transparent film 12 metal pattern 13 protective film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 可撓性を有する透明フィルム上に、所望
の金属膜からなる金属パターンを形成したフレキシブル
マスクにおいて、上記金属パターンが形成された上記透
明フィルム上に透明もしくは準透明の高分子樹脂からな
る保護膜を設けたことを特徴とするフレキシブルマス
ク。
1. A flexible mask in which a metal pattern made of a desired metal film is formed on a flexible transparent film, and a transparent or semitransparent polymer resin is formed on the transparent film on which the metal pattern is formed. A flexible mask having a protective film made of.
JP9229892A 1992-03-19 1992-03-19 Flexible mask Withdrawn JPH05265196A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9229892A JPH05265196A (en) 1992-03-19 1992-03-19 Flexible mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9229892A JPH05265196A (en) 1992-03-19 1992-03-19 Flexible mask

Publications (1)

Publication Number Publication Date
JPH05265196A true JPH05265196A (en) 1993-10-15

Family

ID=14050509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9229892A Withdrawn JPH05265196A (en) 1992-03-19 1992-03-19 Flexible mask

Country Status (1)

Country Link
JP (1) JPH05265196A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006108500A (en) * 2004-10-07 2006-04-20 Shin Etsu Polymer Co Ltd Method for forming conductive pattern
JP2006189858A (en) * 2005-01-04 2006-07-20 Samsung Sdi Co Ltd Soft photomask for photolithography, method for manufacturing same, and method for forming pattern employing same
JP2011070068A (en) * 2009-09-28 2011-04-07 Toppan Printing Co Ltd Photomask and method for manufacturing photomask
CN103302939A (en) * 2013-05-10 2013-09-18 西安建筑科技大学 Self-cleaning structure and manufacturing method thereof
KR20170089788A (en) * 2016-01-27 2017-08-04 주식회사 엘지화학 Film mask, preparing method thereof and pattern forming method using the same
CN109799676A (en) * 2019-03-04 2019-05-24 中国科学院上海微系统与信息技术研究所 Flexible light photoresist soft template and preparation method thereof
EP3330794A4 (en) * 2015-07-28 2019-06-19 LG Chem, Ltd. Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask
US20200159287A1 (en) * 2018-11-20 2020-05-21 Samsung Display Co., Ltd. Display device
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006108500A (en) * 2004-10-07 2006-04-20 Shin Etsu Polymer Co Ltd Method for forming conductive pattern
JP2006189858A (en) * 2005-01-04 2006-07-20 Samsung Sdi Co Ltd Soft photomask for photolithography, method for manufacturing same, and method for forming pattern employing same
JP2011070068A (en) * 2009-09-28 2011-04-07 Toppan Printing Co Ltd Photomask and method for manufacturing photomask
CN103302939A (en) * 2013-05-10 2013-09-18 西安建筑科技大学 Self-cleaning structure and manufacturing method thereof
EP3330794A4 (en) * 2015-07-28 2019-06-19 LG Chem, Ltd. Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask
US10732500B2 (en) 2015-07-28 2020-08-04 Lg Chem, Ltd. Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
KR20170089788A (en) * 2016-01-27 2017-08-04 주식회사 엘지화학 Film mask, preparing method thereof and pattern forming method using the same
JP2018535446A (en) * 2016-01-27 2018-11-29 エルジー・ケム・リミテッド Film mask, manufacturing method thereof, and pattern forming method using the same
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
CN111199920A (en) * 2018-11-20 2020-05-26 三星显示有限公司 Display device
US20200159287A1 (en) * 2018-11-20 2020-05-21 Samsung Display Co., Ltd. Display device
US11119537B2 (en) * 2018-11-20 2021-09-14 Samsung Display Co., Ltd. Foldable display device including protection film
CN109799676A (en) * 2019-03-04 2019-05-24 中国科学院上海微系统与信息技术研究所 Flexible light photoresist soft template and preparation method thereof

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