JPH0525447U - Rack cleaning device for photolithography processor - Google Patents

Abstract

(57) [Summary] [Object] An object of the present invention is to provide a cleaning device capable of automatically removing stains from a rack for a photomechanical processor. [Structure] First to third washing tanks 1 to 3 are provided, and racks are successively immersed in these washing tanks. That is,
Put the rack in a holder (not shown), hook it on the lifting frame 21 and lift it. Then, the carrier 17 is moved to position the rack on the washing tank, and then the elevating frame 21 is lowered again to immerse the rack in each washing tank.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to an apparatus for cleaning a rack on which a plate-making film is contaminated during use.

[0002]

[Prior art and its problems]

 A lot of dirt adheres to the rack for photoengraving processor as it is used, and this dirt affects the finish of the film. Therefore, racks that have been used for some time and have become dirty must be washed. However, in the past, there was no special device for washing this rack, so we had to resort to human power. However, this rack was not only complicated in shape, but also heavy in weight, so that the cleaning work was considerably heavy work. An object of the present invention is to provide a cleaning device for a photolithography processor rack that can be automatically cleaned.

[0003]

[Means for Solving the Problems]

 This invention is directed to a frame, a plurality of washing tanks provided on the lower side of the frame, a rail extending above the washing tank, a carrier that travels on the rail, and a rail vertically above and below the carrier. It is characterized in that it is provided with a vertically movable frame provided movably, a holder for holding a rack for a photoengraving processor, and an ultrasonic wave transmission device provided on a facing wall of a predetermined washing tank.

[0004]

[Action]

 The cleaning device of the present invention operates as follows. That is, the rack for the photomechanical processor is placed on the holder and hooked on the elevating frame, and then it is raised and moved to a predetermined washing tank. From this state, while lowering the elevating frame, put the rack for the photolithography machine together with the holder in the washing tank, and soak the rack in the washing liquid for a predetermined time. Then, after a lapse of a predetermined time, the elevating frame is raised again to pull up the rack together with the holder. The elevated frame is moved together with the carrier and stopped on another washing tank. Therefore, the elevating frame is lowered again, and the rack together with the holder is immersed in the cleaning liquid in the cleaning tank. Repeat this operation to soak the rack in the cleaning solution in all the wash tanks. However, since the ultrasonic oscillation plate is provided in any one of the predetermined cleaning tanks, the cleaning liquid permeates to a considerably small portion in the cleaning tank.

[0005]

[Effect of the device]

 According to the cleaning device of the present invention, the rack can be automatically cleaned without relying on human labor, and the human labor can be saved accordingly.

[0006]

【Example】

 In the illustrated embodiment, the first to third washing tanks 1 to 3 are installed on the floor of the frame a, water is added as the washing liquid to the first washing tank 1 located at the end, and bubbles are generated at the bottom thereof. A device 4 is provided.

The second cleaning tank 2 adjacent to the first cleaning tank 1 contains a chemical as a cleaning liquid, and the opposing wall surfaces of the second cleaning tank 2 have first and second ultrasonic oscillator plates 5, 6 is set up and down freely. The first and second ultrasonic oscillator plates 5 and 6 are linked to each other by a chain 7, and the chain 7 is bridged between a pair of gears 8 and 9. The one gear 8 is linked to a drive shaft 12 that rotates integrally with the motor via a wheel 10 and a drive chain 11.

Therefore, if the motor is driven to rotate the gear 8 to the left in the drawing from the state shown in the drawing, the second ultrasonic oscillator plate 6 is pulled up and the first ultrasonic oscillator plate 5 is lowered. That is, when one of the oscillators moves up, the other oscillator moves down, so that both oscillators move up and down alternately.

The third cleaning tank 3 adjacent to the second cleaning tank 2 is filled with water. A drying chamber 13 is provided adjacent to the third cleaning tank 3. A large number of compressed air nozzles 14 are provided on the opposing wall surfaces of the drying chamber 13.

Pillars 15 are provided at the four corners of the frame a as described above, and a pair of rails 16 are bridged over the pillars 15. A carrier 17 is suspended on the rail 16. The carrier 17 mainly includes a carriage 18 that moves along the rails 16 and a guide frame 19 that is provided so as to be suspended from the carriage 18. Then, the carriage 18 moves along the rail 16 by the driving force of the electric motor 20 provided on the rail 16.

An elevating frame 21 is provided on the guide frame 19 so as to be movable up and down, and a hanging piece 22 is provided on the elevating frame 21. Then, the elevating frame 21 moves up and down by the driving force of the electric motor 23.

Next, the operation of this embodiment will be described. First, a rack for a photomechanical processor is placed on a holder (not shown), and the holder is hooked on the hooking piece 22 of the elevating frame 21. While raising the elevating frame 21 in this state, the holder is raised to a position higher than each washing tank. Then, the carrier 17 is moved to move the holder onto the first cleaning tank 1, and at the same time, the elevating frame 21 is lowered to immerse the rack together with the holder in the first cleaning tank 1. Since water is used as the cleaning liquid in the first cleaning tank 1, the rack immersed in the first cleaning tank 1 is washed with water.

After soaking in the first washing tank 1 for a predetermined time, the elevating frame 21 is raised and the rack is pulled up. Then, the carrier 17 is moved again to position the rack together with the holder on the second washing tank 2. At this position, the elevating frame 21 is lowered to immerse the rack in the second washing tank 2. Since the second cleaning tank 2 contains a chemical as a cleaning liquid, the dirt attached to the rack is dissolved. Moreover, since the second cleaning tank 2 is provided with the first and second ultrasonic wave oscillation plates 5 and 6, the cleaning liquid spreads to every corner of the rack due to the action of the ultrasonic waves, and cannot be removed manually. You can also remove the dirt that is attached.

Further, since the first and second ultrasonic wave oscillating plates 5 and 6 move up and down alternately according to the rotation direction of the drive shaft 12, for example, even if the area of the oscillating plates 5 and 6 is small, By moving up and down, it is possible to apply ultrasonic waves to all the surfaces of the photolithographic processor rack. Therefore, it is possible to reliably remove dirt that is hard to remove from the back.

When the cleaning in the second cleaning tank 2 is completed, the elevating frame 21 is raised again and the rack is pulled up together with the holder. Then, the carrier 17 is moved to the third washing tank 3, the elevating frame 21 is lowered there, and the rack together with the holder is immersed in the water in the third washing tank 3. In the third cleaning tank 3, the chemicals in the second cleaning tank 2 are dropped, and then the rack is pulled up, put in the drying chamber 13, and compressed air is blown to dry it.

As described above, according to the cleaning apparatus for the photolithography and developing machine rack of this embodiment, the racks with stains are simply soaked in the first to third washing tanks 1 to 3 to sequentially remove the stains. Since it can be dropped, it is possible to automate the work that used to rely on human hands.

[Brief description of drawings]

FIG. 1 is a sectional view showing an embodiment of the present invention.

[Explanation of symbols]

 a Frame 1 First Wash Tank 2 Second Wash Tank 3 Third Wash Tank 5 First Ultrasonic Oscillator 6 Second Ultrasonic Oscillator 16 Rail 17 Carrier 21 Lifting Frame

Claims (1)

[Scope of utility model registration request] 1. A frame, a plurality of cleaning tanks provided below the frame and filled with a cleaning liquid formed by melting water or chemicals, and a rail extending above the cleaning tank.
A carrier that travels along this rail, an elevating frame that is vertically movable on the carrier, a holder that holds a rack for a photoengraving processor, and an ultrasonic oscillator plate that is provided on the opposing wall of a predetermined washing tank. A cleaning device for a photolithography developing machine rack equipped with.