JPH05243254A - Semiconductor device - Google Patents

Semiconductor device

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Publication number
JPH05243254A
JPH05243254A JP4042697A JP4269792A JPH05243254A JP H05243254 A JPH05243254 A JP H05243254A JP 4042697 A JP4042697 A JP 4042697A JP 4269792 A JP4269792 A JP 4269792A JP H05243254 A JPH05243254 A JP H05243254A
Authority
JP
Japan
Prior art keywords
semiconductor chip
chip
semiconductor device
semiconductor
active region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4042697A
Other languages
Japanese (ja)
Inventor
Yukio Hayakawa
由紀夫 早川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP4042697A priority Critical patent/JPH05243254A/en
Publication of JPH05243254A publication Critical patent/JPH05243254A/en
Withdrawn legal-status Critical Current

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Abstract

PURPOSE:To prevent a crack and characteristic change of a semiconductor chip due to a thermal environmental variation in a high output semiconductor device. CONSTITUTION:Assemblies of pectinated emitter and base electrodes 2, 3 are disposed in parallel on a semiconductor chip 1, grooves 6 reaching opposed both sides of the chip are provided between the assemblies thereby to absorb a distortion of an active region due to a warpage of the chip generated due to a difference of linear expansion coefficients of the chip and a package, thereby preventing characteristic change and a crack.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置に関し、特に
高出力半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a high power semiconductor device.

【0002】[0002]

【従来の技術】従来の半導体装置は、例えばシリコンパ
ワートランジスタを例にとると、図2に示すように半導
体チップ1の活性領域7の上に短冊状のエミッタ電極2
aとベース電極3aが交互に多数並べられ、半導体チッ
プ1の表面の活性領域7以外の部位で、それぞれ1つの
電極として連結されてストライプ形引き出し電極の集合
体を形成するか、あるいは図3(a),(b)に示すよ
うに、短冊状のエミッタ電極2及びベース電極3の複数
をまとめて櫛形の集合体を形成し、それらの集合体を半
導体チップ1上に並列に並べたもの、又は、これらの集
合体の間に酸化シリコン膜または多結晶シリコン膜を形
成するか、又はこれら集合体の間にイオン注入法もしく
は熱拡散法等により集合体間の絶縁分離領域を設け、集
合体間のリーク電流を抑制した半導体チップ1を熱伝導
の良い銅系のパッケージ4の平面上にAu−Sn半田5
あるいはAu−Si共晶合金の半田を用いて搭載してい
る。
2. Description of the Related Art A conventional semiconductor device, for example, a silicon power transistor, has a strip-shaped emitter electrode 2 on an active region 7 of a semiconductor chip 1 as shown in FIG.
a and a large number of base electrodes 3a are alternately arranged and are connected as one electrode at a site other than the active region 7 on the surface of the semiconductor chip 1 to form an assembly of striped lead electrodes, or FIG. As shown in a) and (b), a plurality of strip-shaped emitter electrodes 2 and base electrodes 3 are combined to form a comb-shaped aggregate, and the aggregates are arranged in parallel on the semiconductor chip 1, Alternatively, a silicon oxide film or a polycrystalline silicon film is formed between these aggregates, or an insulating separation region between the aggregates is provided between these aggregates by an ion implantation method, a thermal diffusion method, or the like. The semiconductor chip 1 in which the leak current between them is suppressed is placed on the plane of the copper-based package 4 having good thermal conductivity by Au-Sn solder 5
Alternatively, it is mounted using solder of Au-Si eutectic alloy.

【0003】これらの高出力半導体装置は、その出力電
力を高くすればする程半導体チップの活性領域が拡大
し、半導体チップのサイズも大型化が必要となる。
In these high-power semiconductor devices, the higher the output power, the larger the active area of the semiconductor chip and the larger the size of the semiconductor chip.

【0004】[0004]

【発明が解決しようとする課題】この従来の半導体装置
では、半導体チップの線膨張率と比較してパッケージの
線膨張率が1桁近く大きいため、高温状態では半導体チ
ップが凹状に反り、また低温状態では凸状に反ると云う
現象が起り、実使用での温度環境変化、あるいは、熱的
信頼性試験等に於いて、半導体チップ表面活性層の歪に
よる特性劣化、あるいは、活性領域上の交互に異なる電
極にまたがる半導体チップのクラックを発生し、機能を
失うと云う不具合をまねくことがしばしばあった。
In this conventional semiconductor device, the linear expansion coefficient of the package is larger than the linear expansion coefficient of the semiconductor chip by about one digit, so that the semiconductor chip warps in a concave shape at a high temperature and also has a low temperature. In such a state, a phenomenon that it warps in a convex shape occurs, and in a temperature environment change in actual use, or in a thermal reliability test, characteristic deterioration due to strain of the semiconductor chip surface active layer, or on the active region In many cases, a crack of a semiconductor chip that alternately extends over different electrodes was generated, resulting in a loss of function.

【0005】このように不具合を防止するために、半導
体チップを小型に分割して搭載する方法もとられている
が、この方法は搭載の工数が増加し、また小さなパッケ
ージ内での作業であるため困難な場合もしばしばある。
In order to prevent such problems, a method of dividing a semiconductor chip into small parts and mounting them has been proposed. However, this method increases the number of mounting steps and is a work within a small package. Because of this, it is often difficult.

【0006】[0006]

【課題を解決するための手段】本発明の半導体装置は、
半導体基板に設けた活性領域上に短冊状の第1及び第2
の電極を交互に配置し且つそれぞれの電極の複数を前記
活性領域外で互に連結して櫛形に組合せた集合体と、前
記集合体を並列に配列して設けた半導体チップの前記集
合体の相互間に設けて前記半導体チップの対向する両辺
に達する溝を備えて構成される。
The semiconductor device of the present invention comprises:
Strip-shaped first and second strips are formed on the active region of the semiconductor substrate.
Of the assembly of the semiconductor chips provided by arranging the electrodes in an alternating manner and combining a plurality of the respective electrodes with each other outside the active region to combine them in a comb shape The semiconductor chip is provided with grooves which are provided between the semiconductor chips and reach the opposite sides of the semiconductor chip.

【0007】[0007]

【作用】この溝を設けることにより、半導体装置が熱的
環境の変化に遭遇し、半導体チップの反りを生じた際、
その応力は溝で吸収されるため、活性領域での歪は防止
され、また、クラックが起ったとしてもこの溝に沿って
起るため、半導体チップの機能には全く影響を与えな
い。なお、溝は集合体間の電気的絶縁性を目的とするも
のではないため、活性領域の深さ方向の寸法とは無関係
に、熱的変化による半導体チップの歪を吸収できる深さ
で良い。
By providing this groove, when the semiconductor device encounters a change in the thermal environment and the semiconductor chip is warped,
Since the stress is absorbed by the groove, strain in the active region is prevented, and even if a crack occurs, it occurs along the groove and has no influence on the function of the semiconductor chip. Since the groove is not intended for electrical insulation between the aggregates, it may have a depth that can absorb the strain of the semiconductor chip due to thermal change, regardless of the dimension of the active region in the depth direction.

【0008】[0008]

【実施例】次に、本発明について図面を参照して説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.

【0009】図1(a),(b)は本発明の一実施例を
示す平面図及び模式的断面図である。
1A and 1B are a plan view and a schematic sectional view showing an embodiment of the present invention.

【0010】図1(a),(b)に示すように、半導体
チップ1の上面に短冊状のエミッタ電極2及びベース電
極3を交互に配置し且つそれぞれの電極の複数を連結し
て組合せた集合体の複数を並列に並べ、各集合体の間に
活性領域7上の短冊状のエミッタ電極2と平行をなす溝
6を、半導体チップの一端から他端にかけて設け、半導
体チップ1の裏面1Au−Sn半田5を介して銅系のパ
ッケージ4の上に接合し、半導体チップ1を搭載する。
As shown in FIGS. 1A and 1B, strip-shaped emitter electrodes 2 and base electrodes 3 are alternately arranged on the upper surface of a semiconductor chip 1 and a plurality of respective electrodes are connected and combined. A plurality of aggregates are arranged in parallel, and a groove 6 parallel to the strip-shaped emitter electrode 2 on the active region 7 is provided between each aggregate from one end to the other end of the semiconductor chip, and the back surface 1Au of the semiconductor chip 1 is provided. The semiconductor chip 1 is mounted by bonding it onto the copper-based package 4 via the Sn solder 5.

【0011】なお、溝6は電極配置の各集合体を複数個
ずつまとめた各グループ間に設けても良い。
The groove 6 may be provided between each group in which a plurality of aggregates having the electrodes are arranged.

【0012】[0012]

【発明の効果】以上説明したように本発明は、半導体装
置が熱的環境の変化に遭遇した際に生ずる半導体チップ
の反りによる応力を吸収する溝を半導体チップの上面に
設けることにより、従来の高出力半導体装置で起ってい
た熱的環境の変化に於ける特性の劣化あるいは活性領域
上の交互に異なる電極にまたがるクラックの発生を防止
することが可能となり、例えば−65℃〜+175℃の
間での温度サイクルでの耐性は従来の10倍以上とな
り、信頼性の向上が得られる。
As described above, according to the present invention, the groove for absorbing the stress due to the warp of the semiconductor chip generated when the semiconductor device encounters the change of the thermal environment is provided on the upper surface of the semiconductor chip. It is possible to prevent the deterioration of the characteristics due to the change of the thermal environment which has occurred in the high power semiconductor device or the generation of cracks extending over the electrodes which are alternately different on the active region. For example, at -65 ° C to + 175 ° C. The durability in the temperature cycle between them is 10 times or more than the conventional one, and the reliability is improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す平面図及び断面図。FIG. 1 is a plan view and a sectional view showing an embodiment of the present invention.

【図2】従来の半導体装置の第1の例を示す平面図。FIG. 2 is a plan view showing a first example of a conventional semiconductor device.

【図3】従来の半導体装置の第2の例を示す平面図及び
断面図。
3A and 3B are a plan view and a cross-sectional view showing a second example of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 半導体チップ 2,2a エミッタ電極 3,3a ベース電極 4 パッケージ 5 Au−Sn半田 6 溝 7 活性領域 1 Semiconductor Chip 2,2a Emitter Electrode 3,3a Base Electrode 4 Package 5 Au-Sn Solder 6 Groove 7 Active Area

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 半導体基板に設けた活性領域上に短冊状
の第1及び第2の電極を交互に配置し且つそれぞれの電
極の複数を前記活性領域外で互に連結して櫛形に組合せ
た集合体と、前記集合体を並列に配列して設けた半導体
チップの前記集合体の相互間に設けて前記半導体チップ
の対向する両辺に達する溝を備えたことを特徴とする半
導体装置。
1. A strip-shaped first electrode and a second electrode are alternately arranged on an active region provided on a semiconductor substrate, and a plurality of respective electrodes are connected to each other outside the active region to be combined in a comb shape. A semiconductor device comprising: an assembly; and a groove that is provided between the assembly of semiconductor chips provided by arranging the assembly in parallel with each other and reaches both opposite sides of the semiconductor chip.
【請求項2】 溝を各集合体の全ての相互間に設けた請
求項1記載の半導体装置。
2. The semiconductor device according to claim 1, wherein the groove is provided between all of the aggregates.
JP4042697A 1992-02-28 1992-02-28 Semiconductor device Withdrawn JPH05243254A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4042697A JPH05243254A (en) 1992-02-28 1992-02-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4042697A JPH05243254A (en) 1992-02-28 1992-02-28 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH05243254A true JPH05243254A (en) 1993-09-21

Family

ID=12643246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4042697A Withdrawn JPH05243254A (en) 1992-02-28 1992-02-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH05243254A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012089869A (en) * 2008-12-01 2012-05-10 Kuei-Fang Chen Heat radiation base

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012089869A (en) * 2008-12-01 2012-05-10 Kuei-Fang Chen Heat radiation base

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Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19990518