JPH05235213A - Semiconductor device and method for forming heat radiating path of semiconductor device - Google Patents
Semiconductor device and method for forming heat radiating path of semiconductor deviceInfo
- Publication number
- JPH05235213A JPH05235213A JP4033335A JP3333592A JPH05235213A JP H05235213 A JPH05235213 A JP H05235213A JP 4033335 A JP4033335 A JP 4033335A JP 3333592 A JP3333592 A JP 3333592A JP H05235213 A JPH05235213 A JP H05235213A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- cap
- semiconductor element
- semiconductor device
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73253—Bump and layer connectors
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体実装基板に、高
密度多数接続端子を持つICチップ等の半導体をフェイ
スダウン実装した半導体装置及び半導体装置の放熱経路
形成方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device in which a semiconductor such as an IC chip having a large number of high density connection terminals is mounted face down on a semiconductor mounting substrate, and a method for forming a heat dissipation path of the semiconductor device.
【0002】[0002]
【従来の技術】電子機器の高速化・多機能化に伴い、電
子機器の電子回路に使用される集積回路の高速化・高密
度化が進んできている。この結果、半導体素子の高集積
化・高密度化が進み、この半導体素子の高集積化・高密
度化に基づき、外部との接続端子数の増加及び高密度実
装に対応する技術が切望されている。2. Description of the Related Art With the increase in speed and multifunction of electronic equipment, the speed and density of integrated circuits used in electronic circuits of electronic equipment have been increasing. As a result, higher integration and higher density of semiconductor elements have progressed, and based on this higher integration and higher density of semiconductor elements, there has been a strong demand for a technology that corresponds to an increase in the number of external connection terminals and high-density mounting. There is.
【0003】この要求に応える実装方式として従来、半
導体素子の電極端子上に凸形の突起電極であるバンプを
突設し、この半導体素子を半導体実装基板上にフェイス
ダウンする方法が採用されている。しかしながら、この
実装方法においては、半導体素子と半導体実装基板の接
触面積が極めて小さくなるために、半導体素子と半導体
実装基板間の熱抵抗が大きくなり、消費電力の大きい半
導体素子を使用する場合には、新たな放熱経路を考慮せ
ざるを得なかった。As a mounting method to meet this demand, conventionally, a method has been adopted in which bumps, which are convex projecting electrodes, are projected on the electrode terminals of a semiconductor element and the semiconductor element is faced down on a semiconductor mounting substrate. .. However, in this mounting method, since the contact area between the semiconductor element and the semiconductor mounting board is extremely small, the thermal resistance between the semiconductor element and the semiconductor mounting board increases, and when a semiconductor element with high power consumption is used, , I had to consider a new heat dissipation path.
【0004】そこで、この問題に対応する技術として従
来、半導体素子とキャップの間に熱伝導性の良い樹脂を
充填する方法が考えられている。Therefore, as a technique for dealing with this problem, a method of filling a resin having good thermal conductivity between the semiconductor element and the cap has been conventionally considered.
【0005】[0005]
【発明が解決しようとする課題】従来においては以上の
ように、半導体素子とキャップの間に熱伝導性の良い樹
脂を充填する方法が考えられているのであるが、充分に
熱抵抗の低い樹脂が存在しないので、半導体素子の消費
電力が増加した場合には、半導体素子とキャップの間に
熱伝導性の良い樹脂を充填する方法では、半導体素子か
ら発生する熱を充分に放熱することができなかった。As described above, a method of filling a resin having a good thermal conductivity between the semiconductor element and the cap has been considered in the past, but a resin having a sufficiently low thermal resistance is used. Therefore, if the power consumption of the semiconductor element increases, the method of filling the resin with good thermal conductivity between the semiconductor element and the cap can sufficiently dissipate the heat generated from the semiconductor element. There wasn't.
【0006】本発明は上記に鑑みなされたもので、半導
体素子の消費電力が増加した場合でも半導体素子から発
生する熱を充分に放熱することができる半導体装置及び
半導体装置の放熱経路形成方法を提供することを目的と
している。The present invention has been made in view of the above, and provides a semiconductor device and a method for forming a heat dissipation path for the semiconductor device, which can sufficiently dissipate the heat generated from the semiconductor device even when the power consumption of the semiconductor device increases. The purpose is to do.
【0007】[0007]
【課題を解決するための手段】本発明においては上述の
目的を達成するため、表面に電極端子が設けられた半導
体実装基板と、表面に電極端子と重合する突起電極が突
設され該半導体実装基板にフェイスダウン実装される半
導体素子と、該半導体実装基板の表面に圧着されるキャ
ップと、このキャップの内面に突設され半導体素子の直
上に位置する突部と、弾性と熱伝導性に優れ該突部の凹
み部に充填されて半導体素子とキャップの間に介在する
球状物質と、熱硬化性と熱伝導性に優れ該突部の凹み部
に充填されて半導体素子とキャップの間に介在する樹脂
とを備えたことを特徴としている。In order to achieve the above-mentioned object, the present invention has a semiconductor mounting board having electrode terminals provided on the surface thereof, and a protruding electrode which is overlapped with the electrode terminals provided on the surface of the semiconductor mounting board. A semiconductor element that is mounted face down on a substrate, a cap that is crimped onto the surface of the semiconductor mounting substrate, a protrusion that is provided on the inner surface of the cap and that is located directly above the semiconductor element, and has excellent elasticity and thermal conductivity. A spherical substance filled in the recess of the protrusion and interposed between the semiconductor element and the cap, and a spherical substance excellent in thermosetting and thermal conductivity and interposed between the semiconductor element and the cap in the recess of the protrusion. It is characterized in that it is provided with a resin.
【0008】また、本発明においては上述の目的を達成
するため、表面に電極端子が設けられた半導体実装基板
に、表面に突起電極が突設された半導体素子をフェイス
ダウン実装し、次いで、該半導体実装基板に圧着される
キャップの突部における凹み部に、弾性と熱伝導性に優
れる球状物質を充填するとともに、熱硬化性と熱伝導性
に優れる樹脂を充填し、その後、該半導体実装基板の表
面にキャップを圧着して、相互に対向する半導体素子と
キャップの突部に、該球状物質と樹脂を圧接することを
特徴としている。In order to achieve the above-mentioned object in the present invention, a semiconductor element having projecting electrodes on its surface is mounted face down on a semiconductor mounting substrate having electrode terminals on its surface, and then the semiconductor element is mounted. The concave portion of the projection of the cap that is crimped to the semiconductor mounting board is filled with a spherical substance having excellent elasticity and thermal conductivity and a resin having excellent thermosetting and thermal conductivity, and then the semiconductor mounting board It is characterized in that the cap is pressure-bonded to the surface of, and the spherical substance and the resin are pressed against the projections of the semiconductor element and the cap which face each other.
【0009】[0009]
【作用】本発明によれば、半導体素子から発生する熱
が、当該半導体素子に圧接する樹脂から球状物質を伝導
経由してキャップに伝導され、その後、外部に円滑に放
熱されるので、半導体素子の消費電力が大幅に増加した
場合でも半導体素子から発生する熱を充分に放熱するこ
とができ、しかも、球状物質及び樹脂の弾圧付勢作用で
相互に重合する電極端子と突起電極の密着性を大幅に増
大させることが可能となる。According to the present invention, the heat generated from the semiconductor element is conducted to the cap through the spherical substance from the resin that is pressed against the semiconductor element, and then is smoothly dissipated to the outside. The power generated by the semiconductor element can be sufficiently dissipated even when the power consumption of the semiconductor is significantly increased, and the adhesion between the electrode terminal and the protruding electrode that are mutually polymerized by the elastic pressing force of the spherical substance and the resin can be improved. It is possible to greatly increase.
【0010】[0010]
【実施例】以下、図1乃至図4に示す一実施例に基づき
本発明を詳述する。本発明に係る半導体装置及び半導体
装置の放熱経路形成方法は、表面に電極端子が設けられ
た半導体実装基板1に、表面に突起電極4が突設された
半導体素子3をフェイスダウン実装し、次いで、半導体
実装基板1に圧着されるキャップ5の凹み部7に、弾性
と熱伝導性に優れる球状物質8を充填するとともに、熱
硬化性と熱伝導性に優れる樹脂9を充填し、そしてその
後、半導体実装基板1の表面にキャップ5を圧着して、
相互に対向する半導体素子3とキャップ5の突部6に、
球状物質8と樹脂9を圧接するようにしている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below based on an embodiment shown in FIGS. A semiconductor device and a method of forming a heat dissipation path for a semiconductor device according to the present invention include face-down mounting of a semiconductor element 3 having projecting electrodes 4 projecting on the surface thereof on a semiconductor mounting substrate 1 having electrode terminals provided on the surface thereof. , The concave portion 7 of the cap 5 to be pressure-bonded to the semiconductor mounting substrate 1 is filled with the spherical substance 8 having excellent elasticity and thermal conductivity and the resin 9 having excellent thermosetting property and thermal conductivity, and thereafter, By pressing the cap 5 onto the surface of the semiconductor mounting substrate 1,
The semiconductor element 3 and the protrusion 6 of the cap 5 facing each other,
The spherical substance 8 and the resin 9 are pressed against each other.
【0011】上記半導体実装基板1は図1及び図4に示
す如く、セラミックス等から構成され、その基板表面に
図示しない印刷パターンが印刷されるとともに、図示し
ない電極端子が複数配設されており、両側に複数のリー
ド線2がそれぞれ接続されている。As shown in FIGS. 1 and 4, the semiconductor mounting substrate 1 is made of ceramics or the like, and a printed pattern (not shown) is printed on the surface of the substrate and a plurality of electrode terminals (not shown) are arranged. A plurality of lead wires 2 are connected to both sides.
【0012】一方、GaAs・IC等の上記半導体素子
3は図2及び図3に示す如く、その表面(回路形成面)
に突起電極(バンプ)4が複数突設され、この突起電極
4が該複数の電極端子にそれぞれ接続重合するよう半導
体実装基板1に複数フェイスダウン実装される。On the other hand, as shown in FIGS. 2 and 3, the semiconductor element 3 such as GaAs / IC has its surface (circuit forming surface).
A plurality of projecting electrodes (bumps) 4 are provided on the surface of the semiconductor mounting substrate 1 so that the projecting electrodes 4 are connected and polymerized to the plurality of electrode terminals, respectively.
【0013】また、上記キャップ5は図1乃至図4に示
す如く、断面略凹字形に構成され、その内部の平坦面に
は、突部6が所定の間隔をおいて複数突設されるととも
に、この複数の突部6の平坦面には、収納作用を営む凹
み部7がそれぞれ凹設されており、半導体素子3を覆う
よう半導体実装基板1の両側に圧着されて複数の半導体
素子3の直上に突部6をそれぞれ位置させる。Further, as shown in FIGS. 1 to 4, the cap 5 has a substantially concave cross section, and a plurality of protrusions 6 are provided on the inner flat surface thereof at predetermined intervals. The flat surfaces of the plurality of protrusions 6 are respectively provided with recesses 7 that perform a storage function, and are pressed to both sides of the semiconductor mounting substrate 1 so as to cover the semiconductor elements 3 and the plurality of semiconductor elements 3 are formed. The protrusions 6 are located directly above.
【0014】他方、上記球状物質8は、直径が1〜1.
5mm程度のシリコンゴム球等から構成され弾性と熱伝
導性に優れた球状物質体と、熱伝導度が良くしかも柔ら
かい金等から構成され球状物質体の表面に蒸着等される
被覆物質とから構成され、開口上面を満たすよう凹み部
7の内部に多数充填される(図2参照)。On the other hand, the spherical substance 8 has a diameter of 1 to 1.
Consists of a spherical material body composed of about 5 mm silicon rubber spheres and the like with excellent elasticity and thermal conductivity, and a coating material composed of soft gold etc. having good thermal conductivity and deposited on the surface of the spherical material body. Then, a large number of particles are filled in the recess 7 so as to fill the upper surface of the opening (see FIG. 2).
【0015】さらに上記樹脂9は、熱硬化性と熱伝導性
に優れたエポキシ系樹脂等から構成され、開口上面から
少々盛り上がるよう凹み部7の内部の球状物質8に多数
積層充填される(図3参照)。Further, the resin 9 is composed of an epoxy resin or the like having excellent thermosetting property and thermal conductivity, and a large number of spherical substances 8 inside the recess 7 are stacked and filled so as to be slightly raised from the upper surface of the opening (see FIG. 3).
【0016】次に図1乃至図4に基づき、本発明に係る
半導体装置の放熱経路形成方法を説明する。先ず、図示
しないが、半導体実装基板1に複数の半導体素子3をフ
ェイスダウン実装して、半導体実装基板1の複数の電極
端子に突起電極4をそれぞれ接続重合する。次いで、図
2に示す如く、開口上面を満たすようキャップ5の複数
の凹み部7に球状物質8をそれぞれ多数充填する。次い
で、図3に示す如く、開口上面から少々盛り上がるよう
複数の凹み部7の球状物質8に樹脂9をそれぞれ多数積
層充填する。最後に図4に示す如く、キャップ5の両側
上部に半導体実装基板1をフェイスダウン方式で配置し
て樹脂9に半導体素子3の裏面を重合した後、圧力を作
用させながらキャップ5の両側上部と半導体実装基板1
を圧着して、樹脂9及び球状物質8を介在圧縮させなが
ら半導体素子3とキャップ5を接続するとともに、該圧
着と同時に樹脂9に熱を加えて固化し、半導体装置の放
熱経路を形成する。尚、半導体素子3の裏面と凹み部7
の最短距離は500μmとなる。Next, a method of forming a heat radiation path for a semiconductor device according to the present invention will be described with reference to FIGS. First, although not shown, a plurality of semiconductor elements 3 are mounted face down on the semiconductor mounting substrate 1, and the protruding electrodes 4 are connected and polymerized to the plurality of electrode terminals of the semiconductor mounting substrate 1, respectively. Then, as shown in FIG. 2, a plurality of spherical substances 8 are filled in the plurality of recesses 7 of the cap 5 so as to fill the upper surface of the opening. Next, as shown in FIG. 3, a large number of resins 9 are stacked and filled in each of the spherical substances 8 in the plurality of recesses 7 so as to slightly rise from the upper surface of the opening. Finally, as shown in FIG. 4, the semiconductor mounting substrate 1 is arranged on both upper sides of the cap 5 in a face-down manner, the back surface of the semiconductor element 3 is superposed on the resin 9, and then the upper side of both sides of the cap 5 is applied while applying pressure. Semiconductor mounting board 1
Is pressed to connect the semiconductor element 3 and the cap 5 while interposing and compressing the resin 9 and the spherical substance 8, and at the same time as the pressing, heat is applied to the resin 9 to solidify it to form a heat dissipation path of the semiconductor device. The back surface of the semiconductor element 3 and the recess 7
The shortest distance is 500 μm.
【0017】上記構成によれば、半導体素子3から熱が
発生すると、この発生した熱は放熱経路である半導体素
子3から連接した樹脂9及び球状物質8を経由してキャ
ップ5に熱伝導され、その後、外部に円滑且つ充分に放
熱される。従って、半導体素子3の消費電力が大幅に増
加した場合でも、半導体素子3から発生する熱を充分に
放熱することができる。さらに、介在圧縮される球状物
質8及び樹脂9が発条作用を営むので、半導体素子3に
適当な圧力を作用させることが期待でき、しかも、相互
に重合する電極端子と突起電極4の密着性を大幅に増大
させることが可能となる。According to the above construction, when heat is generated from the semiconductor element 3, the generated heat is conducted to the cap 5 via the resin 9 and the spherical substance 8 connected from the semiconductor element 3 which is a heat radiation path, Then, the heat is radiated smoothly and sufficiently to the outside. Therefore, even when the power consumption of the semiconductor element 3 is significantly increased, the heat generated from the semiconductor element 3 can be sufficiently radiated. Furthermore, since the spherical material 8 and the resin 9 that are intervened and compressed exert a springing action, it can be expected that an appropriate pressure is applied to the semiconductor element 3, and the adhesion between the electrode terminal and the protruding electrode 4 that are mutually polymerized is improved. It is possible to greatly increase.
【0018】[0018]
【発明の効果】以上のように本発明によれば、半導体素
子から発生した熱が、放熱経路である半導体素子から樹
脂及び球状物質を経由してキャップに熱伝導され、その
後、外部に円滑且つ充分に放熱されるので、半導体素子
の消費電力が大幅に増加した場合でも半導体素子から発
生する熱を充分且つ円滑に放熱することができるという
顕著な効果がある。また、介在圧縮される球状物質及び
樹脂が弾圧付勢作用を営むので、半導体素子に適度な圧
力を作用させることができ、しかも、相互に重合する電
極端子と突起電極の密着性・信頼性を大幅に増大させる
ことが可能になるという顕著な効果がある。さらに、電
極端子と突起電極の接続密着性を大幅に増大させること
ができるので、実装工程における生産性を著しく向上さ
せることが期待できるという顕著な効果がある。As described above, according to the present invention, the heat generated from the semiconductor element is conducted to the cap from the semiconductor element, which is the heat dissipation path, through the resin and the spherical substance, and then smoothly and externally. Since the heat is sufficiently radiated, there is a remarkable effect that the heat generated from the semiconductor element can be sufficiently and smoothly radiated even when the power consumption of the semiconductor element is significantly increased. Moreover, since the spherical material and the resin that are interposed and compressed exert an elastic force urging action, it is possible to exert an appropriate pressure on the semiconductor element, and further, the adhesion and reliability of the electrode terminal and the protruding electrode that are polymerized with each other are improved. There is a remarkable effect that it can be greatly increased. Furthermore, since the contact adhesion between the electrode terminal and the protruding electrode can be greatly increased, there is a remarkable effect that productivity in the mounting process can be expected to be significantly improved.
【図1】本発明に係る半導体装置及び半導体装置の放熱
経路形成方法の一実施例を示す垂直断面図である。FIG. 1 is a vertical sectional view showing an embodiment of a semiconductor device and a method for forming a heat dissipation path of the semiconductor device according to the present invention.
【図2】本発明に係る半導体装置及び半導体装置の放熱
経路形成方法における球状物質の充填工程を示す垂直断
面図である。FIG. 2 is a vertical cross-sectional view showing a step of filling a spherical material in the semiconductor device and the method for forming a heat dissipation path of the semiconductor device according to the present invention.
【図3】本発明に係る半導体装置及び半導体装置の放熱
経路形成方法における樹脂の充填工程を示す垂直断面図
である。FIG. 3 is a vertical cross-sectional view showing a resin filling step in the semiconductor device and the method for forming a heat dissipation path of the semiconductor device according to the present invention.
【図4】本発明に係る半導体装置及び半導体装置の放熱
経路形成方法における半導体実装基板とキャップの圧着
工程を示す垂直断面図である。FIG. 4 is a vertical cross-sectional view showing a pressure bonding step of the semiconductor mounting substrate and the cap in the semiconductor device and the heat dissipation path forming method of the semiconductor device according to the present invention.
1…半導体実装基板、3…半導体素子、4…突起電極
(バンプ)、5…キャップ、6…突部、7…凹み部、8
…球状物質、9…樹脂。DESCRIPTION OF SYMBOLS 1 ... Semiconductor mounting substrate, 3 ... Semiconductor element, 4 ... Projection electrode (bump), 5 ... Cap, 6 ... Projection part, 7 ... Recessed part, 8
… Spherical substance, 9… resin.
Claims (2)
基板と、表面に電極端子と重合する突起電極が突設され
該半導体実装基板にフェイスダウン実装される半導体素
子と、該半導体実装基板の表面に圧着されるキャップ
と、このキャップの内面に突設され半導体素子の直上に
位置する突部と、弾性と熱伝導性に優れ該突部の凹み部
に充填されて半導体素子とキャップの間に介在する球状
物質と、熱硬化性と熱伝導性に優れ該突部の凹み部に充
填されて半導体素子とキャップの間に介在する樹脂とを
備えたことを特徴とする半導体装置。1. A semiconductor mounting board having electrode terminals provided on its surface, a semiconductor element projectingly provided on its surface with projecting electrodes that overlap with the electrode terminals and mounted facedown on the semiconductor mounting board, and a semiconductor mounting board of the semiconductor mounting board. A cap that is crimped to the surface, a protrusion that is provided on the inner surface of the cap and that is located immediately above the semiconductor element, and a gap between the semiconductor element and the cap that is excellent in elasticity and thermal conductivity and that is filled in the concave portion of the protrusion. A semiconductor device comprising: a spherical substance interposed between the semiconductor element and a cap, which is excellent in thermosetting property and thermal conductivity and is filled in the recessed portion of the protrusion and interposed between the semiconductor element and the cap.
基板に、表面に突起電極が突設された半導体素子をフェ
イスダウン実装し、次いで、該半導体実装基板に圧着さ
れるキャップの突部における凹み部に、弾性と熱伝導性
に優れる球状物質を充填するとともに、熱硬化性と熱伝
導性に優れる樹脂を充填し、その後、該半導体実装基板
の表面にキャップを圧着して、相互に対向する半導体素
子とキャップの突部に、該球状物質と樹脂を圧接するこ
とを特徴とする半導体装置の放熱経路形成方法。2. A semiconductor mounting substrate having electrode terminals provided on the surface thereof, a semiconductor element having projecting electrodes protruding from the surface is face-down mounted, and then in a protrusion of a cap to be crimped to the semiconductor mounting substrate. The dents are filled with a spherical substance having excellent elasticity and thermal conductivity, and also filled with a resin having excellent thermosetting and thermal conductivity, and then a cap is pressure-bonded to the surface of the semiconductor mounting substrate to face each other. A method for forming a heat dissipation path of a semiconductor device, characterized in that the spherical substance and a resin are pressed against the protruding portion of the semiconductor element and the cap.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4033335A JPH05235213A (en) | 1992-02-20 | 1992-02-20 | Semiconductor device and method for forming heat radiating path of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4033335A JPH05235213A (en) | 1992-02-20 | 1992-02-20 | Semiconductor device and method for forming heat radiating path of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05235213A true JPH05235213A (en) | 1993-09-10 |
Family
ID=12383693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4033335A Pending JPH05235213A (en) | 1992-02-20 | 1992-02-20 | Semiconductor device and method for forming heat radiating path of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05235213A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001144233A (en) * | 1999-11-12 | 2001-05-25 | Fujitsu Ltd | Semiconductor unit, cooler and their manufacturing method |
JP2010129788A (en) * | 2008-11-27 | 2010-06-10 | Tdk-Lambda Corp | Power unit and method of manufacturing the same |
JP2011082530A (en) * | 2010-11-04 | 2011-04-21 | Toshiba Corp | Electronic equipment |
-
1992
- 1992-02-20 JP JP4033335A patent/JPH05235213A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001144233A (en) * | 1999-11-12 | 2001-05-25 | Fujitsu Ltd | Semiconductor unit, cooler and their manufacturing method |
JP4673949B2 (en) * | 1999-11-12 | 2011-04-20 | 富士通株式会社 | Semiconductor unit and manufacturing method thereof |
JP2010129788A (en) * | 2008-11-27 | 2010-06-10 | Tdk-Lambda Corp | Power unit and method of manufacturing the same |
JP2011082530A (en) * | 2010-11-04 | 2011-04-21 | Toshiba Corp | Electronic equipment |
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