JPH05217699A - Synchrotron radiation generating device - Google Patents

Abstract

PURPOSE:To provide possibility of installing a number of synchrotron radiation take-out ports by enlarging to exceed 360deg. to total of the deflection angles during one turn of a beam orbiting within a synchrotron radiation generating device. CONSTITUTION:In case four units of 270-deg. deflecting bipolar electromagnets 5a are in use, a beam track 1 as shown by the broken line can be formed. While orbiting along this track one turn, a beam is deflected 1080deg. The synchrotron orbit radiation(SOR) is emitted in tangential direction in the deflection part. Unless SOR take-out port directed toward the device body is provided, the angle which can be utilized for provision or ports per magnet 5a is 180deg., amounting to 720deg. for the whole device which is twice as large as any conventional arrangement. This SOR generating device can, therefore, be equipped with irradiation devices 10 in the number twice as large as in the conventional device.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a generator for synchrotron radiation light (hereinafter referred to as SOR light).

[0002]

2. Description of the Related Art FIG. 2 shows an example of a plan view of a conventional SOR light generator. A beam of charged particles such as electrons and positrons (hereinafter referred to as a beam) circulates on a designed orbit in a vacuum chamber 2 kept in a high vacuum. Reference numeral 3 is a septum electromagnet for introducing a beam from a pre-accelerator for injection (not shown) into the orbit, and reference numeral 4 is a bump electromagnet for changing the designed orbit so as to pass through the incident point.
These electromagnets are excited only when the beam is incident. The beam is deflected by the dipole electromagnet 5 arranged in the deflection part to form a closed orbit, and the beam shape is maintained by the quadrupole electromagnet 6 arranged in the straight part and the multipole electromagnet (not shown) to maintain the beam shape. Reference numeral 7 is a high-frequency accelerating cavity for compensating the energy lost by the beam in the form of SOR light.

SOR light is an electromagnetic wave emitted in the tangential direction of the beam orbit when charged particles are deflected by a magnetic field, and is characterized by having extremely high directivity and extremely high intensity. Since the SOR light generator uses the SOR light, an extraction port 8 for extracting the SOR light from the device is provided in the vacuum chamber of the bipolar electromagnet 5.
The extracted SOR light is guided to the irradiation device 10 by an optical system (not shown) installed in the SOR light vacuum chamber 9 and is used for the purpose of X-ray lithography for manufacturing an LSI. Although only two SOR light extraction ports are shown in FIG. 2, ports can be provided as long as space permits.

[0004]

As described above, SOR light is used in industrially important fields because of its characteristics.
The performance of the R light generation device is greatly affected by the intensity and spatial spread of the SOR light itself and the number of SOR light extraction ports.

The total intensity of SOR light is proportional to the beam current and the fourth power of the beam energy. Therefore, in order to increase the SOR light intensity, either one or both of the beam current and the beam energy may be increased. However, since the beam energy is generally set so that the spectrum of the SOR light has an optimum distribution, the intensity of the SOR light mainly depends on the beam current. But,
Due to beam instability and beam life, it is very difficult to make the beam current above a certain value peculiar to the device. Therefore, the same applies to the SOR light intensity.

The spatial spread of the SOR light depends on the diameter of the beam that circulates inside the SOR light generator due to its strong directivity. Since the diameter of the beam circulating in the SOR light generator is very small, the spatial spread of the SOR light is also small.

Since the SOR light extraction port is provided in the vacuum chamber in the portion of the dipole electromagnet 5, it is limited by the total arc length of the deflection section or the total deflection angle during one round. Particularly in the case of an industrial SOR light generator, it is considered that the size of the entire device is desired to be small, and therefore the total number of SOR light extraction ports is strongly limited by the total deflection angle during one round.

From the above, when used for X-ray lithography for manufacturing LSI, for example, SOR
The light intensity cannot exceed a certain value, and the irradiation area is small. Further, since the total number of SOR light extraction ports, that is, the number of silicon wafers that can be irradiated at one time is limited, it is difficult to increase the number of irradiations per unit time. It is an object of the present invention to provide a SOR light generator with a large number of SOR light extraction ports.

[0009]

In order to achieve the above object, in the present invention, the total deflection angle during one round of the beam circulating in the SOR light generator is made larger than 360 degrees.

[0010]

By increasing the total deflection angle to more than 360 degrees, the number of SOR light extraction ports to be mounted can be increased. For example, when used in X-ray lithography for LSI manufacturing, a silicon wafer that can be irradiated at one time is used. The number of sheets can be increased.

[0011]

FIG. 1 shows an embodiment of the present invention. This embodiment is an example in which four 270-degree deflection dipole electromagnets 5a are used. The vacuum chamber 2, the septum electromagnet 3, the bump electromagnet 4, the quadrupole electromagnet 6, the high-frequency acceleration cavity 7, the SOR light extraction port 8, and the SOR light are used. The vacuum chamber 9 for irradiation, the irradiation device 10, and other multi-pole electromagnets (not shown).

By using four 270-degree bending electromagnets in this way, the beam orbit 1 shown by the broken line in FIG. 1 can be formed. The beam is deflected by 1080 degrees during one round of this orbit.

As described above, the SOR light is emitted in the tangential direction of the beam in the deflection section. If no SOR light extraction port directed toward the device body is provided, the angle that can be used to provide a port per one bipolar electromagnet 5a is 180 degrees. The entire device has 720 degrees, and a double angle can be used. As a result, the SOR light generator of this embodiment can be provided with twice as many irradiation devices 10 as in the conventional case. For example, when the irradiation device 10 is used for X-ray lithography for manufacturing an LSI, the irradiation time per unit time of a silicon wafer is reduced. The number of irradiations can be doubled. (Other embodiments)

In the above embodiment, an example in which four 270-degree deflection electromagnets are used is shown. However, essentially, if the total sum of deflection angles during one rotation is an integral multiple of 360 degrees, the dipole electromagnet will be used. Various configurations can be considered without any limitation on the number of units or the deflection angle per unit. Further, if the exciting coil of the dipole electromagnet is made superconducting, the radius of curvature of the deflecting portion can be reduced and the device can be downsized.

[0015]

According to the present invention, it is possible to increase the total deflection angle for one round of the beam circulating in the SOR light generator to be more than 360 degrees, and to increase the number of SOR light extraction ports. This makes it possible to improve the utilization efficiency of SOR light. INDUSTRIAL APPLICABILITY As described above, the present invention can provide a small-sized industrial SOR light generator with high utilization efficiency of SOR light.

[Brief description of drawings]

FIG. 1 is a plan configuration diagram of an SOR light generator according to an embodiment of the present invention.

FIG. 2 is a plan configuration diagram of a conventional SOR light generator.

[Explanation of symbols]

 1 ... Beam trajectory 2 ... Vacuum chamber 3 ... Septum electromagnet 4 ... Bump electromagnet 5 ... 90 degree deflection dipole electromagnet 5a ... 270 degree deflection dipole electromagnet 6 ... Quadrupole electromagnet 7 ... High frequency acceleration cavity 8 ... SOR light extraction port 9 ... Vacuum chamber for SOR light 10 ... Irradiation device

Claims (1)

[Claims] 1. In a synchrotron radiation light generating device composed of a plurality of deflecting portions and a linear portion, the sum of deflection angles during one round of charged particles circulating in the apparatus is 360.
Synchrotron radiation generator characterized in that it is larger than a degree.