JPH0521288A - Aluminum alloy for cathode foil of electrolytic capacitor - Google Patents
Aluminum alloy for cathode foil of electrolytic capacitorInfo
- Publication number
- JPH0521288A JPH0521288A JP3168215A JP16821591A JPH0521288A JP H0521288 A JPH0521288 A JP H0521288A JP 3168215 A JP3168215 A JP 3168215A JP 16821591 A JP16821591 A JP 16821591A JP H0521288 A JPH0521288 A JP H0521288A
- Authority
- JP
- Japan
- Prior art keywords
- ppm
- cathode foil
- electrolytic capacitor
- aluminum alloy
- foil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Metal Rolling (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は電解コンデンサ陰極箔
用アルミニウム合金に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aluminum alloy for cathode foil of electrolytic capacitors.
【0002】[0002]
【従来の技術】アルミニウム電解コンデンサの静電容量
を増大してその性能を向上させるためには、陽極用アル
ミニウム箔のみならず陰極箔の静電容量も増大させる必
要がある。2. Description of the Related Art In order to increase the electrostatic capacity of an aluminum electrolytic capacitor and improve its performance, it is necessary to increase the electrostatic capacity of not only the aluminum foil for anode but also the cathode foil.
【0003】このため一般に、陰極箔に化学的あるいは
電気化学的エッチング処理を施して実効面積を拡大し単
位体積当りの静電容量の増大を図ることが行われてお
り、さらに、このエッチング特性を改善すべく陰極箔の
材料組成の面からの研究がなされている。そのようなエ
ッチング特性を改善した陰極箔として、従来、Cuを
0.1〜0.5wt%程度添加含有したアルミニウム合金
陰極箔が知られている(例えば特開昭56−13344
4号、特開昭62−149858号)。For this reason, generally, the cathode foil is subjected to a chemical or electrochemical etching treatment to enlarge the effective area to increase the electrostatic capacity per unit volume. Studies have been conducted from the viewpoint of the material composition of the cathode foil to improve it. As a cathode foil having improved etching characteristics, an aluminum alloy cathode foil containing Cu in an amount of 0.1 to 0.5 wt% is known (for example, JP-A-56-13344).
4, JP-A-62-149858).
【0004】[0004]
【発明が解決しようとする課題】ところが、Cuを含有
した陰極箔を電解コンデンサに用いると、箔中のCuが
析出して洩れ電流が増え、甚しくはコンデンサ本体の破
損を引起こす場合があるという問題を生ずることが判明
した。However, when a cathode foil containing Cu is used in an electrolytic capacitor, Cu in the foil is deposited to increase leakage current, which may cause damage to the capacitor body. It turned out to cause the problem.
【0005】この発明は、かかる事情に鑑みてなされた
ものであって、高静電容量を保有するものでありながら
もコンデンサに用いた場合の洩れ電流の増大や破損を生
じない陰極箔となしうる電解コンデンサ陰極箔用アルミ
ニウム合金の提供を目的とする。The present invention has been made in view of the above circumstances and provides a cathode foil which has a high electrostatic capacity but does not cause an increase in leakage current or damage when used in a capacitor. It is an object of the present invention to provide an aluminum alloy for an electrolytic capacitor cathode foil.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するため
に、この発明に係る陰極箔用アルミニウム合金は、純度
99.85%以上のアルミニウム地金をベースとし、M
g:50〜1500ppm、Ga:30〜150pp
m、B:5〜100ppm、あるいはさらにZn:50
〜1500ppmが含有されてなることを特徴とする。In order to achieve the above object, an aluminum alloy for a cathode foil according to the present invention is based on an aluminum base metal having a purity of 99.85% or more, and M
g: 50 to 1500 ppm, Ga: 30 to 150 pp
m, B: 5 to 100 ppm, or further Zn: 50
It is characterized by containing ~ 1500 ppm.
【0007】上記において、ベースとなるアルミニウム
地金がAl純度99.85%以上のものに限定されるの
は、99.85%未満では以下に説明するMg等のエッ
チング核形成要素となる元素が含有された場合にも箔の
静電容量を増大させる効果が得られないからである。In the above description, the base aluminum ingot is limited to those having an Al purity of 99.85% or more. If it is less than 99.85%, elements such as Mg, which will be described below, that act as etching nucleation elements are limited. This is because the effect of increasing the capacitance of the foil cannot be obtained even when it is contained.
【0008】Mg(マグネシウム)はこれが含有される
ことにより、合金中に不可避的に含有されるSiとの間
でMg2 Si金属間化合物を形成するものである。そし
て、これにより、表面積拡大のためのエッチング処理に
おいて過度の表面溶解の原因となるSi析出を抑制し、
適度にエッチング開始点を増大させて過度の表面溶解を
抑え、それにより拡面率の向上ひいては静電容量の増大
を図り得る効果がある。しかし、50ppm未満では上
記効果に不十分であり、拡面率の向上ひいては静電容量
の増大を図れない。一方、1500ppmを超えて含有
されてもやはり表面溶解量が増大し、結果的に十分な拡
面率が得られないばかりか腐食減量の増大により機械的
強度も劣化する。従って、Mgは50〜1500ppm
の範囲で含有されなければならない。Mgの特に好まし
い含有量は60〜600ppmである。When Mg (magnesium) is contained, it forms an Mg 2 Si intermetallic compound with Si which is unavoidably contained in the alloy. And thereby, suppressing the Si precipitation that causes excessive surface dissolution in the etching treatment for increasing the surface area,
There is an effect that the starting point of etching is appropriately increased to suppress excessive surface dissolution, thereby improving the surface area ratio and eventually increasing the capacitance. However, if it is less than 50 ppm, the above-mentioned effect is insufficient, and it is not possible to improve the surface area ratio and thus the electrostatic capacity. On the other hand, even if the content exceeds 1500 ppm, the amount of surface dissolution also increases, and as a result, not only a sufficient surface expansion ratio cannot be obtained but also the mechanical strength deteriorates due to an increase in corrosion weight loss. Therefore, Mg is 50 to 1500 ppm
Must be contained within the range of. A particularly preferable content of Mg is 60 to 600 ppm.
【0009】Ga(ガリウム)、B(ホウ素)はこれら
のいずれもが含有されることにより、エッチング開始点
を増加させ静電容量を増大させる効果がある。しかし、
Gaが30ppm未満またはBが5ppm未満ではそれ
らの効果に乏しく、逆にGaが150ppmを超え、あ
るいはBが100ppmを超えるとやはり過度の表面溶
解と腐食減量の増大による機械的強度の劣化をもたら
す。従ってGaは30〜150ppm、Bは5〜100
ppmの範囲で含有されなければならない。特に好まし
い含有量は、Ga:60〜120ppm、B:10〜6
0ppmである。Since both Ga (gallium) and B (boron) are contained, they have the effect of increasing the etching start point and increasing the capacitance. But,
When Ga is less than 30 ppm or B is less than 5 ppm, these effects are poor, and conversely, when Ga exceeds 150 ppm or B exceeds 100 ppm, mechanical strength is deteriorated due to excessive surface dissolution and increase in corrosion weight loss. Therefore, Ga is 30 to 150 ppm, B is 5 to 100 ppm.
Must be contained in the ppm range. Particularly preferred contents are Ga: 60 to 120 ppm, B: 10 to 6
It is 0 ppm.
【0010】任意的に含有が許容されるZnは、50〜
1500ppmの範囲で含有されることにより、エッチ
ング開始点の増大による静電容量の増大と機械的強度の
向上に寄与するものである。しかし50ppm未満では
その効果に乏しく、逆に1500ppmを超えるとやは
り過度の腐食による静電容量及び強度の低下を招く。特
に好ましいZnの含有範囲は70〜300ppmであ
る。Zn which can be optionally contained is 50 to 50%.
When the content is in the range of 1500 ppm, it contributes to increase of electrostatic capacity and improvement of mechanical strength due to increase of etching start point. However, if it is less than 50 ppm, its effect is poor, and conversely, if it exceeds 1500 ppm, electrostatic capacity and strength are deteriorated due to excessive corrosion. A particularly preferable Zn content range is 70 to 300 ppm.
【0011】尚、他の不純物元素は99.85%アルミ
ニウム純度に含まれる範囲とする。この発明に係るアル
ミニウム合金の電解コンデンサ陰極箔への製造は常法に
従って行えば良く、例えばアルミニウム溶湯から縦型ま
たは横型の半連続鋳造法によりスラブを鋳造したのち、
このスラブを熱間圧延、冷間圧延さらに箔圧延により厚
さ15〜60μm程度の箔とすれば良い。こうして製造
した箔は、硬箔のままあるいは焼鈍処理により軟化させ
たのち電気化学的あるいは化学的エッチング処理を施し
て箔表面の実効面積を拡大し電解コンデンサ陰極箔とす
る。The other impurity elements are in the range of 99.85% aluminum purity. The production of the electrolytic capacitor cathode foil of the aluminum alloy according to the present invention may be carried out by a conventional method, for example, after casting a slab by a vertical or horizontal semi-continuous casting method from molten aluminum,
This slab may be hot-rolled, cold-rolled, and foil-rolled to form a foil having a thickness of about 15 to 60 μm. The thus-produced foil is used as an electrolytic capacitor cathode foil by expanding the effective area of the foil surface by subjecting it to a hard foil or softening it by an annealing treatment and then performing an electrochemical or chemical etching treatment.
【0012】[0012]
【発明の効果】この発明に係る電解コンデンサ陰極箔用
アルミニウム合金によれば、後述の実施例の参酌によっ
ても明らかなように、Cuを実質的に含まないものであ
りながらも大きな静電容量を有する陰極箔の提供が可能
となる。しかも、Cuを実質的に含まないことにより、
該陰極箔を電解コンデンサに使用した場合にも従来のよ
うな洩れ電流の増大、コンデンサの破損の危険を回避し
うる。According to the aluminum alloy for an electrolytic capacitor cathode foil according to the present invention, as will be apparent from the consideration of the examples described later, it does not substantially contain Cu but has a large capacitance. It is possible to provide a cathode foil having the same. Moreover, by not containing Cu substantially,
Even when the cathode foil is used in an electrolytic capacitor, it is possible to avoid the conventional increase in leakage current and the risk of capacitor damage.
【0013】[0013]
【実施例】次にこの発明の実施例を説明する。Embodiments of the present invention will be described below.
【0014】下記第1表に示される成分量に調整された
アルミニウム溶湯から半連続鋳造法によりスラブを鋳造
し、これに常法による熱間圧延、冷間圧延、更に箔圧延
を施して厚さ50μmの硬箔を製作した。次に、これを
7%塩酸、0.2%リン酸及び0.2%硝酸からなる温
度55±1℃の混合水溶液中に浸漬し、電流密度60A
/dm2 の交流電流を通じて135秒間エッチングを行
い、陰極箔とした。またエッチングによる腐食減量を求
めた。A slab is cast by a semi-continuous casting method from an aluminum melt adjusted to have the component amounts shown in Table 1 below, and the slab is subjected to hot rolling, cold rolling and foil rolling according to a conventional method to obtain a thickness. A 50 μm hard foil was produced. Next, this was immersed in a mixed aqueous solution of 7% hydrochloric acid, 0.2% phosphoric acid and 0.2% nitric acid at a temperature of 55 ± 1 ° C. to obtain a current density of 60 A.
Etching was performed for 135 seconds with an alternating current of / dm 2 to obtain a cathode foil. Also, the corrosion weight loss due to etching was determined.
【0015】上記により得た各陰極箔につき、5%ホウ
酸及び5%クエン酸の混合水溶液(温度30℃)中に浸
漬し、交流万能ブリッジにて静電容量を測定した。その
結果を同じく表1に示す。なお、腐食減量、静電容量は
試料No6のものをそれぞれ100%として相対比較に
て表した。Each of the cathode foils obtained above was immersed in a mixed aqueous solution of 5% boric acid and 5% citric acid (temperature: 30 ° C.), and the electrostatic capacity was measured by an AC universal bridge. The results are also shown in Table 1. Note that the corrosion weight loss and the electrostatic capacity are represented by relative comparison, with sample No. 6 being 100%.
【0016】[0016]
【表1】 [Table 1]
【0017】上記表1に示される結果から明らなよう
に、この発明の合金によれば、それにより製造される陰
極箔の静電容量を、Cuの含有量を極めて低く抑えつつ
も、非常に高いものにすることができることを確認しえ
た。As is clear from the results shown in Table 1 above, according to the alloy of the present invention, the capacitance of the cathode foil produced by the alloy is extremely high while the Cu content is kept extremely low. It was confirmed that it can be made very expensive.
Claims (2)
金をベースとし、 Mg:50〜1500ppm、 Ga:30〜150ppm、 B:5〜100ppm が含有されてなることを特徴とする電解コンデンサ陰極
箔用アルミニウム合金。1. A cathode foil for an electrolytic capacitor, which is based on an aluminum base metal having a purity of 99.85% or more and contains Mg: 50 to 1500 ppm, Ga: 30 to 150 ppm, and B: 5 to 100 ppm. Aluminum alloy for.
金をベースとし、 Mg:50〜1500ppm、 Zn:50〜1500ppm、 Ga:30〜150ppm、 B:5〜100ppm が含有されてなることを特徴とする電解コンデンサ陰極
箔用アルミニウム合金。2. A base of aluminum ingot having a purity of 99.85% or more, containing Mg: 50 to 1500 ppm, Zn: 50 to 1500 ppm, Ga: 30 to 150 ppm, and B: 5 to 100 ppm. Aluminum alloy for electrolytic capacitor cathode foil.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3168215A JP2878487B2 (en) | 1991-07-09 | 1991-07-09 | Aluminum alloy for cathode foil of electrolytic capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3168215A JP2878487B2 (en) | 1991-07-09 | 1991-07-09 | Aluminum alloy for cathode foil of electrolytic capacitor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0521288A true JPH0521288A (en) | 1993-01-29 |
JP2878487B2 JP2878487B2 (en) | 1999-04-05 |
Family
ID=15863925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3168215A Expired - Lifetime JP2878487B2 (en) | 1991-07-09 | 1991-07-09 | Aluminum alloy for cathode foil of electrolytic capacitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2878487B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07211593A (en) * | 1994-01-21 | 1995-08-11 | Showa Alum Corp | Aluminum foil for electrolytic-capacitor electrode and its etching method |
JPH07235457A (en) * | 1993-12-29 | 1995-09-05 | Showa Alum Corp | Aluminum foil for forming electrode of electrolytic capacitor and etching method therefor |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53125920A (en) * | 1977-04-11 | 1978-11-02 | Mitsubishi Keikinzoku Kogyo | Aluminum anode foil for electrolytic capacitor |
JPS581046A (en) * | 1981-06-04 | 1983-01-06 | Sumitomo Light Metal Ind Ltd | Aluminum alloy foil for electrolytic capacitor and its rroduction |
JPH0251211A (en) * | 1988-08-12 | 1990-02-21 | Nippon Foil Mfg Co Ltd | Electrolytic capacitor anode aluminum alloy foil and its production |
JPH02240245A (en) * | 1989-03-13 | 1990-09-25 | Nippon Foil Mfg Co Ltd | Production of aluminum alloy foil for electrolytic capacitor cathode |
JPH03122239A (en) * | 1989-10-05 | 1991-05-24 | Showa Alum Corp | Aluminum alloy for cathode foil of electrolytic capacitor |
JPH03165508A (en) * | 1989-11-24 | 1991-07-17 | Showa Alum Corp | Aluminum alloy for cathode foil of electrolytic capacitor |
-
1991
- 1991-07-09 JP JP3168215A patent/JP2878487B2/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53125920A (en) * | 1977-04-11 | 1978-11-02 | Mitsubishi Keikinzoku Kogyo | Aluminum anode foil for electrolytic capacitor |
JPS581046A (en) * | 1981-06-04 | 1983-01-06 | Sumitomo Light Metal Ind Ltd | Aluminum alloy foil for electrolytic capacitor and its rroduction |
JPH0251211A (en) * | 1988-08-12 | 1990-02-21 | Nippon Foil Mfg Co Ltd | Electrolytic capacitor anode aluminum alloy foil and its production |
JPH02240245A (en) * | 1989-03-13 | 1990-09-25 | Nippon Foil Mfg Co Ltd | Production of aluminum alloy foil for electrolytic capacitor cathode |
JPH03122239A (en) * | 1989-10-05 | 1991-05-24 | Showa Alum Corp | Aluminum alloy for cathode foil of electrolytic capacitor |
JPH03165508A (en) * | 1989-11-24 | 1991-07-17 | Showa Alum Corp | Aluminum alloy for cathode foil of electrolytic capacitor |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07235457A (en) * | 1993-12-29 | 1995-09-05 | Showa Alum Corp | Aluminum foil for forming electrode of electrolytic capacitor and etching method therefor |
JPH07211593A (en) * | 1994-01-21 | 1995-08-11 | Showa Alum Corp | Aluminum foil for electrolytic-capacitor electrode and its etching method |
Also Published As
Publication number | Publication date |
---|---|
JP2878487B2 (en) | 1999-04-05 |
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