JPH05205316A - Rewritable optical information recording medium - Google Patents

Rewritable optical information recording medium

Info

Publication number
JPH05205316A
JPH05205316A JP4225220A JP22522092A JPH05205316A JP H05205316 A JPH05205316 A JP H05205316A JP 4225220 A JP4225220 A JP 4225220A JP 22522092 A JP22522092 A JP 22522092A JP H05205316 A JPH05205316 A JP H05205316A
Authority
JP
Japan
Prior art keywords
film
reflectance
protective film
optical information
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4225220A
Other languages
Japanese (ja)
Inventor
Shoichi Kawai
川井  正一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP4225220A priority Critical patent/JPH05205316A/en
Publication of JPH05205316A publication Critical patent/JPH05205316A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable recording, erasing and reproduction with a high reflectance and small light energy. CONSTITUTION:A rewritable optical information recording medium 10 is formed by successively laminating a multilayer lower layer protective film 2 consisting of two transparent lower layer protective films (I)2a and (II)2b with different refractive indexes, a recording film 3, an upper layer protective film 4 and a reflective film 5 on a substrate 1. Each thickness of the multilayer lower layer protective film 2 is set so that the reflectances of both the part corresponding to a crystal part of the recording film and the amorphous part at the time of the wavelength of the light for recording and erasing between two light with different wavelengthes are low and the reflectance of either one between both parts of the recording film at the time of the wavelength of the light for reproduction is high and the reflectance of the other part is low. Thus since the subject rewritable optical information recording medium can be made high in light absorbability at the time of recording and erasing and sufficiently high in the reflectance at the time of reproduction, the light energy required at that time can be small enough.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、記録・消去及び再生を
行うことができる書き換え可能な光情報記録媒体に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rewritable optical information recording medium capable of recording / erasing and reproducing.

【0002】[0002]

【従来技術】従来、再生専用の光情報記録媒体である光
ディスクとしてコンパクトディスク(以下、CDとい
う)が広く普及し、車載用としても使用されている。こ
こで、車載用の光ディスクに要求される性能の一つとし
て耐振動性がある。この耐振動性を向上するためには、
光ディスク側では高反射率にすることが要求される。書
き換え可能な光情報記録媒体として、特開平2−165
444号公報「書換え可能型光ディスク」にて開示され
たものが知られている。このものは、光照射により結晶
状態を可逆的変化、つまり、非晶質−結晶質間で相転移
させ、それに伴って生じる反射率の変化を利用する相変
化型の光ディスクである。非晶質部分(例えば、記録状
態部分)を得るには、記録膜(光記録層)に大きな光エ
ネルギー(高レーザパワー)を短い時間照射し高温溶融
状態から急冷することにより達成される。又、結晶質部
分(例えば、消去状態部分)を得るには、記録膜(光記
録層)に中程度の光エネルギー(中程度のレーザパワ
ー)を照射し非晶質状態を加熱徐冷することにより達成
される。
2. Description of the Related Art Conventionally, a compact disc (hereinafter referred to as a CD) has been widely used as an optical disc which is a read-only optical information recording medium, and is also used as a vehicle. Here, vibration resistance is one of the performances required for an optical disk mounted on a vehicle. In order to improve this vibration resistance,
High reflectivity is required on the optical disk side. As a rewritable optical information recording medium, Japanese Patent Laid-Open No. 2-165
The one disclosed in Japanese Patent No. 444, "Rewritable optical disk" is known. This is a phase-change type optical disk which utilizes a reversible change in the crystalline state upon irradiation with light, that is, a phase transition between amorphous and crystalline, and a change in reflectance that accompanies the phase transition. To obtain an amorphous portion (for example, a recorded state portion), a recording film (optical recording layer) is irradiated with a large amount of light energy (high laser power) for a short period of time and rapidly cooled from a high temperature molten state. Further, in order to obtain a crystalline portion (for example, an erased portion), the recording film (optical recording layer) is irradiated with medium optical energy (medium laser power) to heat and gradually cool the amorphous state. Achieved by.

【0003】[0003]

【発明が解決しようとする課題】ところが、相変化型書
き換え可能な光情報記録媒体の記録膜の結晶質部分(例
えば、消去状態部分)に対応した部分の反射率は高くて
も50%程度で、CD規格の65%と比べると低い。又、高
反射率状態では、当然、光吸収率が小さいため記録・消
去のときの光エネルギーは非常に大きなものとなってし
まうという問題があった。又、結晶質部分と非晶質部分
との光吸収率の差が大きい状態では、記録又は消去に必
要な光エネルギーが結晶質部分と非晶質部分とで大きく
異なることから、上記記録状態を一旦消去状態としない
でその上から再記録する所謂オーバライトが困難になる
という問題があった。
However, the reflectance of the portion corresponding to the crystalline portion (for example, erased portion) of the recording film of the phase change type rewritable optical information recording medium is about 50% at the highest. , Lower than the CD standard of 65%. Further, in the high reflectance state, the light absorptance is naturally small, so that there is a problem that the light energy during recording / erasing becomes very large. In the state where the difference in light absorptance between the crystalline portion and the amorphous portion is large, the light energy required for recording or erasing is largely different between the crystalline portion and the amorphous portion. There is a problem that it is difficult to perform so-called overwriting in which re-recording is performed on the recording medium instead of once erasing it.

【0004】本発明は、上記の課題を解決するために成
されたものであり、その目的とするところは、書き換え
可能な光情報記録媒体において、高反射率が実現できる
と共に小さな光エネルギーにより記録・消去及び再生を
可能とすることである。
The present invention has been made to solve the above problems, and an object of the present invention is to achieve high reflectance in a rewritable optical information recording medium and to record with a small optical energy. -To be able to erase and reproduce.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
の発明の構成は、基板上に下層保護膜、記録膜、上層保
護膜及び反射膜を順次形成した書き換え可能な光情報記
録媒体であって、前記下層保護膜は波長の異なる2つの
光に対して透明で屈折率の異なる複数の膜から成り、屈
折率の大きい方を入射光側とし交互に配設した多層構造
とし、前記2つの光のうち記録・消去のための光の波長
のとき前記記録膜の結晶質部分及び非晶質部分に対応す
る両部分の反射率が共に低く、前記2つの光のうち再生
のための光の波長のとき前記記録膜の結晶質部分及び非
晶質部分に対応する両部分のうち何れか一方で反射率が
高く、他方で反射率が低くなるようにそれらの膜厚を設
定することを特徴とする。
The constitution of the invention for solving the above problems is a rewritable optical information recording medium in which a lower protective film, a recording film, an upper protective film and a reflective film are sequentially formed on a substrate. The lower protective film is composed of a plurality of films that are transparent to two lights having different wavelengths and have different refractive indexes, and have a multilayer structure in which the one having a larger refractive index is arranged alternately on the incident light side. At the wavelength of the light for recording / erasing of light, the reflectance of both portions corresponding to the crystalline portion and the amorphous portion of the recording film is low, and the portion of the light for reproducing of the two light rays is low. It is characterized in that the film thicknesses are set so that the reflectance is high in either one of the crystalline portion and the amorphous portion of the recording film at the wavelength and the reflectance is low in the other portion. And

【0006】[0006]

【作用及び効果】本発明の書き換え可能な光情報記録媒
体は、基板上に下層保護膜、記録膜、上層保護膜及び反
射膜が順次形成されている。上記下層保護膜は波長の異
なる2つの光に対して透明で屈折率の異なる複数の膜か
ら成り、屈折率の大きい方を入射光側とし交互に配設し
た多層構造である。多層構造から成る上記下層保護膜の
各膜厚は、上記2つの光のうち記録・消去のための光の
波長のとき上記記録膜の結晶質部分及び非晶質部分に対
応する両部分の反射率が共に低くなるように設定され
る。又、多層構造から成る上記下層保護膜の各膜厚は、
上記2つの光のうち再生のための光の波長のとき上記記
録膜の結晶質部分及び非晶質部分に対応する両部分のう
ち何れか一方で反射率が高く、他方で反射率が低くなる
ように設定される。そして、上記光情報記録媒体は、上
記2つの光を用いて記録・消去及び再生される。これに
より、本発明の書き換え可能な光情報記録媒体は、記録
・消去のときの光吸収率が大きくなりその必要な光エネ
ルギーは小さなもので済むことになる。又、このもの
は、記録膜の非晶質部分及び結晶質部分に対応する両部
分の反射率が共に低くく、光吸収率の差が小さいためオ
ーバライトが容易である。更に、このものは、再生のと
き記録膜の結晶質部分に対応する部分が対振動性に強い
高反射率状態となるため、光エネルギーが小さくても再
生可能となる。
In the rewritable optical information recording medium of the present invention, the lower protective film, the recording film, the upper protective film and the reflective film are sequentially formed on the substrate. The lower protective film is composed of a plurality of films that are transparent to two lights having different wavelengths and have different refractive indices, and has a multilayer structure in which the one having the larger refractive index is alternately arranged on the incident light side. Each film thickness of the lower protective film having a multi-layer structure is such that reflection of both portions corresponding to a crystalline portion and an amorphous portion of the recording film at the wavelength of light for recording / erasing of the two lights. Both rates are set to be low. Further, each film thickness of the lower protective film having a multilayer structure is
At the wavelength of the reproduction light of the two lights, one of the two parts corresponding to the crystalline part and the amorphous part of the recording film has a high reflectance and the other has a low reflectance. Is set as follows. The optical information recording medium is recorded / erased / reproduced by using the two lights. As a result, the rewritable optical information recording medium of the present invention has a large light absorptance at the time of recording / erasing, and requires a small amount of light energy. In addition, since the reflectance of both of the portions corresponding to the amorphous portion and the crystalline portion of the recording film is low, and the difference in the light absorptance is small, this is easy to overwrite. Further, in the case of reproducing, since the portion corresponding to the crystalline portion of the recording film is in a high reflectance state having strong anti-vibration property at the time of reproducing, it can be reproduced even if the light energy is small.

【0007】[0007]

【実施例】以下、本発明を具体的な実施例に基づいて説
明する。図1は本発明に係る書き換え可能な光情報記録
媒体の断面構造を示した模式図である。書き換え可能な
光情報記録媒体10は、例えば、円盤状の透明なガラス
又はプラスチックから成る基板1上に順次、以下の膜が
積層され形成されている。ポリカーボネイト(屈折率1.
58)から成る基板1上に、下層保護膜として多層下層保
護膜2を形成した。この多層下層保護膜2は、波長(685
nm,780nm) の異なる2つの光に対して透明で屈折率の異
なる2層の膜である下層保護膜(I) 2aと下層保護膜(I
I)2bとで多層構造となるように積層した。上記下層保
護膜(I) 2aはTiO2(屈折率2.5)にて厚さ 240nm、上
記下層保護膜(II)2bはZnS-SiO2(屈折率2.0)にて
厚さ 100nmにそれぞれ成膜した。次に、上記下層保護膜
(II)2b上に GeSbTeから成る記録膜3を成膜した。
その上に、ZnS-SiO2(屈折率2.0)から成る上層保護
膜4を厚さ 140nmにて成膜した。更に、Au から成る反
射膜5を厚さ 100nmにて成膜した。尚、上述の各膜はス
パッタリングにより形成した。又、この上にオーバコー
トとして更に、無機物や有機物の膜を形成しても良い。
又、下層保護膜(I) と下層保護膜(II)とは波長の異なる
2つの光に対して透明で屈折率に差のある(屈折率の異
なる)膜であれば良い。
EXAMPLES The present invention will be described below based on specific examples. FIG. 1 is a schematic diagram showing a cross-sectional structure of a rewritable optical information recording medium according to the present invention. The rewritable optical information recording medium 10 is formed by sequentially laminating the following films on a substrate 1 made of, for example, a disc-shaped transparent glass or plastic. Polycarbonate (refractive index 1.
On the substrate 1 composed of 58), the multilayer lower layer protective film 2 was formed as the lower layer protective film. This multilayer lower protective film 2 has a wavelength (685
nm, 780 nm) is a two-layer film which is transparent to two lights having different refractive indices and has a different refractive index. The lower protective film (I) 2a and the lower protective film (I
I) and 2b were laminated so as to form a multilayer structure. The lower protective film (I) 2a was formed with TiO 2 (refractive index 2.5) to a thickness of 240 nm, and the lower protective film (II) 2b was formed with ZnS—SiO 2 (refractive index 2.0) to a thickness of 100 nm. .. Next, the lower protective film
(II) A recording film 3 made of GeSbTe was formed on 2b.
An upper protective film 4 made of ZnS—SiO 2 (refractive index 2.0) was formed thereon with a thickness of 140 nm. Further, a reflective film 5 made of Au was formed to a thickness of 100 nm. Each of the above films was formed by sputtering. Further, an inorganic or organic film may be further formed thereon as an overcoat.
Further, the lower protective film (I) and the lower protective film (II) may be films that are transparent to two lights having different wavelengths and have a different refractive index (different refractive index).

【0008】図2は、上述の構造から成る光情報記録媒
体10における結晶質部分と非晶質部分との記録膜膜厚
(nm)に対する反射率(%)の依存性のシミュレーション結
果を示した特性図である。尚、図2(a) は光の波長λが
記録・消去のための 685nmのときであり、図2(b) は光
の波長λが再生のための 780nmのときである。光の波長
685nmのとき、記録膜3の膜厚が70nmで結晶質部分の反
射率が42%となり、非晶質部分の反射率が29%となっ
た。又、光の波長 780nmのとき、記録膜3の膜厚が70nm
で結晶質部分の反射率が63%となり、非晶質部分の反射
率が25%となった。以上のような反射率変化となり、光
の波長が 685nmにおける光吸収率は結晶質部分が58%、
非晶質部分が71%である。即ち、本実施例の光情報記録
媒体10は結晶質部分及び非晶質部分の光吸収率が共に
大きいので、記録・消去が小さな光エネルギーにより容
易にできる。又、オーバライトも可能となる。光の波長
を 780nmにすると結晶質部分の反射率が大きくなり、再
生用の光エネルギーが小さくても、容易にフォーカスサ
ーボ又はトラッキングサーボなどが可能となる。尚、上
記フォーカスサーボとは、光情報記録媒体に対するピッ
クアップ光学系において、焦点が光情報記録媒体の上下
動に対し正確に位置するように対物レンズを上下させる
制御である。又、上記トラッキングサーボとは、光情報
記録媒体に対するピックアップ光学系において、光情報
記録媒体が回転する際に半径方向に生じるトラック振れ
にビームを追従させる制御である。これにより、光情報
記録媒体10は録再などをする際の振動に対して強くな
るという効果がある。
FIG. 2 shows a recording film thickness of a crystalline portion and an amorphous portion in the optical information recording medium 10 having the above structure.
It is a characteristic view showing a simulation result of the dependency of reflectance (%) on (nm). 2 (a) shows the case where the light wavelength λ is 685 nm for recording / erasing, and FIG. 2 (b) shows the case where the light wavelength λ is 780 nm for reproduction. Wavelength of light
At 685 nm, when the film thickness of the recording film 3 was 70 nm, the reflectance of the crystalline portion was 42% and the reflectance of the amorphous portion was 29%. When the wavelength of light is 780 nm, the film thickness of the recording film 3 is 70 nm.
The reflectance of the crystalline portion was 63%, and the reflectance of the amorphous portion was 25%. The reflectance changes as above, and the light absorption rate at the light wavelength of 685 nm is 58% for the crystalline part,
The amorphous portion is 71%. That is, since the optical information recording medium 10 of the present embodiment has a large light absorptance in both the crystalline portion and the amorphous portion, recording / erasing can be easily performed with a small optical energy. Also, overwriting is possible. When the wavelength of light is set to 780 nm, the reflectance of the crystalline portion becomes large, and even if the light energy for reproduction is small, focus servo or tracking servo can be easily performed. The focus servo is a control for moving the objective lens up and down so that the focus is accurately positioned with respect to the vertical movement of the optical information recording medium in the pickup optical system for the optical information recording medium. Further, the tracking servo is a control in which a beam follows a track shake generated in a radial direction when the optical information recording medium rotates in a pickup optical system for the optical information recording medium. As a result, the optical information recording medium 10 has an effect of being resistant to vibration when recording or reproducing.

【0009】図3は本発明に係る書き換え可能な光情報
記録媒体の第2実施例の断面構造を示した模式図であ
る。書き換え可能な光情報記録媒体30は、基板31と
記録膜33との間の下層保護膜を多層下層保護膜32と
した。この多層下層保護膜32は、波長(685nm,780nm)
の異なる2つの光に対して透明で屈折率の異なる2層の
膜である下層保護膜(I) 32a及び下層保護膜(II)32
bを単位とする多層構造となるように交互に4層積層し
た。上記下層保護膜(I) 32aはTiO2(屈折率 2.5)
にて厚さ87nm、上記下層保護膜(II)32bはZnS-Si
2(屈折率 2.0)にて厚さ 100nmにそれぞれ成膜し
た。尚、上記基板31、記録膜33及び上層保護膜3
4、反射膜35の材質などは上述の実施例におけるもの
と同様であり説明を省略する。
FIG. 3 is a schematic view showing the sectional structure of a second embodiment of the rewritable optical information recording medium according to the present invention. In the rewritable optical information recording medium 30, the lower protective film between the substrate 31 and the recording film 33 is the multilayer lower protective film 32. This multilayer lower protective film 32 has a wavelength (685 nm, 780 nm)
Lower layer protective film (I) 32a and lower layer protective film (II) 32, which are two-layer films that are transparent to two different light rays and have different refractive indices
Four layers were alternately laminated so as to form a multilayer structure in which b was a unit. The lower protective film (I) 32a is made of TiO 2 (refractive index 2.5).
At a thickness of 87 nm, and the lower protective film (II) 32b is made of ZnS-Si.
A film having a thickness of 100 nm was formed with O 2 (refractive index 2.0). The substrate 31, the recording film 33, and the upper protective film 3
4. The material of the reflection film 35 and the like are the same as those in the above-mentioned embodiment, and the description thereof will be omitted.

【0010】図4は、上述の構造から成る光情報記録媒
体30における結晶質部分と非晶質部分との記録膜膜厚
(nm)に対する反射率(%)の依存性のシミュレーション結
果を示した特性図である。尚、図4(a) は光の波長λが
記録・消去のための 685nmのときであり、図4(b) は光
の波長λが再生のための 780nmのときである。光の波長
685nmのとき、記録膜33の膜厚が65nmで結晶質部分の
反射率が42%となり、非晶質部分の反射率が28%となっ
た。又、光の波長 780nmのとき、記録膜33の膜厚が65
nmで結晶質部分の反射率が70%となり、非晶質部分の反
射率が33%となった。以上のような反射率変化となるた
め、光の波長が 780nmでは結晶質部分の反射率がCD規
格である反射率65%以上を満足する。従って、録再CD
用の基板上に本発明構造の膜を形成すると、市販のCD
再生機で再生可能となる。
FIG. 4 shows the recording film thickness of the crystalline portion and the amorphous portion in the optical information recording medium 30 having the above structure.
It is a characteristic view showing a simulation result of the dependency of reflectance (%) on (nm). Incidentally, FIG. 4A shows the case where the light wavelength λ is 685 nm for recording / erasing, and FIG. 4B shows the case where the light wavelength λ is 780 nm for reproduction. Wavelength of light
At 685 nm, the reflectance of the crystalline portion was 42% and the reflectance of the amorphous portion was 28% when the film thickness of the recording film 33 was 65 nm. When the wavelength of light is 780 nm, the film thickness of the recording film 33 is 65
In nm, the reflectance of the crystalline portion was 70% and the reflectance of the amorphous portion was 33%. Since the reflectance changes as described above, when the light wavelength is 780 nm, the reflectance of the crystalline portion satisfies the CD standard reflectance of 65% or more. Therefore, recording / playback CD
When a film having the structure of the present invention is formed on a substrate for commercial use, a commercially available CD
It can be played on a playback device.

【0011】次に、本発明に係る書き換え可能な光情報
記録媒体の第3実施例について述べる。この光情報記録
媒体50の断面構造は上述の第2実施例と同様であり、
図3において、基板51、多層下層保護膜52(下層保
護膜(I) 52a、下層保護膜(II)52b)、記録膜5
3、上層保護膜54、反射膜55とそれぞれ符号を読み
替えたものとする。尚、光情報記録媒体30,50で
は、TiO2から成る下層保護膜(I) 32a,52aの膜
厚が異なる。書き換え可能な光情報記録媒体50は、基
板51と記録膜53との間の下層保護膜を多層下層保護
膜52とした。この多層下層保護膜52は、波長(685n
m,780nm) の異なる2つの光に対して透明で屈折率の異
なる2層の膜である下層保護膜(I) 52a及び下層保護
膜(II)52bを単位とする多層構造となるように交互に
4層積層した。即ち、下層保護膜(I) 52aはTiO
2(屈折率 2.5)にて厚さ 240nm、下層保護膜(II)52
bはZnS-SiO2(屈折率 2.0)にて第2実施例と同じ
厚さ 100nmにそれぞれ成膜した。
Next, a third embodiment of the rewritable optical information recording medium according to the present invention will be described. The cross-sectional structure of this optical information recording medium 50 is similar to that of the second embodiment described above,
In FIG. 3, a substrate 51, a multilayer lower layer protective film 52 (lower layer protective film (I) 52a, lower layer protective film (II) 52b), recording film 5
3, the upper protective film 54 and the reflective film 55 are replaced with reference numerals. In the optical information recording media 30 and 50, the film thicknesses of the lower protective films (I) 32a and 52a made of TiO 2 are different. In the rewritable optical information recording medium 50, the lower protective film between the substrate 51 and the recording film 53 is the multilayer lower protective film 52. This multilayer lower protective film 52 has a wavelength (685n
(m, 780 nm) are transparent to two lights having different m and 780 nm and have different refractive indices, and are alternated to form a multi-layer structure including a lower protective film (I) 52a and a lower protective film (II) 52b as a unit. 4 layers were laminated. That is, the lower protective film (I) 52a is made of TiO 2.
2 (refractive index 2.5), thickness 240 nm, lower protective film (II) 52
b was ZnS—SiO 2 (refractive index 2.0) and was formed into a film having the same thickness as 100 nm in the second embodiment.

【0012】図5は、上述の構造から成る光情報記録媒
体50における結晶質部分と非晶質部分との記録膜膜厚
(nm)に対する反射率(%)の依存性のシミュレーション結
果を示した特性図である。尚、図5(a) は光の波長λが
記録・消去のための 685nmのときであり、図5(b) は光
の波長λが再生のための 780nmのときである。光の波長
685nmのとき、記録膜53の膜厚が65nmで結晶質部分の
反射率が31%となり、非晶質部分の反射率が10%となっ
た。又、光の波長 780nmのとき、記録膜53の膜厚が65
nmで結晶質部分の反射率が72%となり、非晶質部分の反
射率が35%となった。以上のような反射率変化となり、
光の波長が 685nmにおける光吸収率は結晶質部分が69
%、非晶質部分が90%である。このように、本発明の光
情報記録媒体50では、再生時の非晶質部分及び結晶質
部分の感度が向上し、例えば、ビデオディスクのような
高速回転(10m/sec)の記録媒体として使用できる。つま
り、上記光情報記録媒体50は、結晶質部分の反射率が
高いので市販のビデオディスク再生機で再生可能とな
る。
FIG. 5 shows the recording film thickness of the crystalline portion and the amorphous portion in the optical information recording medium 50 having the above structure.
It is a characteristic view showing a simulation result of the dependency of reflectance (%) on (nm). 5 (a) shows the case where the light wavelength λ is 685 nm for recording / erasing, and FIG. 5 (b) shows the case where the light wavelength λ is 780 nm for reproduction. Wavelength of light
At 685 nm, the reflectance of the crystalline portion was 31% and the reflectance of the amorphous portion was 10% when the film thickness of the recording film 53 was 65 nm. When the wavelength of light is 780 nm, the film thickness of the recording film 53 is 65
In nm, the reflectance of the crystalline portion was 72% and the reflectance of the amorphous portion was 35%. The reflectance changes as above,
The optical absorption at a light wavelength of 685 nm is 69 for the crystalline part.
%, And the amorphous portion is 90%. As described above, in the optical information recording medium 50 of the present invention, the sensitivity of the amorphous portion and the crystalline portion at the time of reproduction is improved, and the optical information recording medium 50 is used as a recording medium of high speed rotation (10 m / sec) such as a video disc. it can. That is, since the optical information recording medium 50 has a high reflectance in the crystalline portion, it can be reproduced by a commercially available video disk reproducing device.

【0013】図6は本発明に係る書き換え可能な光情報
記録媒体の第4実施例の断面構造を示した模式図であ
る。書き換え可能な光情報記録媒体60は、基板61と
記録膜63との下層保護膜を4層積層し多層下層保護膜
62とした。上記多層下層保護膜62は、ポリカーボネ
イトから成る基板61上に、TiO2(屈折率2.5)から成
る下層保護膜(I) 62aを厚さ 200nm、SiO2(屈折率
1.46)から成る下層保護膜(II)62bを厚さ 150nm、T
iO2から成る下層保護膜(III) 62cを厚さ 200nmにて
それぞれ成膜した。これらの膜はスパッタリング法によ
り成膜し、材料ソースであるターゲットにはそれぞれT
iO2,SiO2を用いた。更に、ZnS-SiO2(屈折率2.
0)から成る下層保護膜(IV)62dを厚さ90nmにて成膜し
た。この膜も同じくスパッタリング法により成膜する
が、材料ソースであるターゲットにはZnS とSiO2
を混合焼結したものを用いた。次に、GeSbTe から成
る記録膜63を成膜した。この膜もスパッタリング法に
より成膜し、材料ソースであるターゲットには、Ge,S
b,Te を適当に混合焼結したもの(GeSb2Te4,Ge2
b2Te5等)を用いた。上記記録膜63上に、ZnS-Si
2から成る上層保護膜64を厚さ 135nmにて成膜し
た。この膜の成膜方法は、下層保護膜(IV)62dと同じ
とした。更に、Au から成る反射膜65を厚さ 100nmに
て成膜した。この膜は、スパッタリング法又は真空蒸着
法にて成膜した。
FIG. 6 is a schematic view showing the cross-sectional structure of a fourth embodiment of the rewritable optical information recording medium according to the present invention. The rewritable optical information recording medium 60 is a multilayer lower protective film 62 in which four lower protective films of a substrate 61 and a recording film 63 are laminated. The multilayer lower layer protective film 62 is formed by forming a lower layer protective film (I) 62a made of TiO 2 (refractive index 2.5) on a substrate 61 made of polycarbonate with a thickness of 200 nm and SiO 2 (refractive index
1.46) lower protective film (II) 62b with a thickness of 150 nm, T
It was deposited respectively at a thickness 200nm the lower protective layer (III) 62c made of iO 2. These films are formed by the sputtering method, and T is used for the target that is the material source.
io 2 and io 2 were used. Furthermore, ZnS-SiO 2 (refractive index 2.
A lower protective film (IV) 62d consisting of 0) was formed to a thickness of 90 nm. This film is also formed by the sputtering method, but a target which is a material source is a mixture of ZnS and SiO 2 and sintered. Next, a recording film 63 made of GeSbTe was formed. This film is also formed by the sputtering method, and the target that is the material source is Ge, S
Appropriate mixed sintering of b and Te (GeSb 2 Te 4, Ge 2 S
b 2 Te 5 ) was used. ZnS-Si is formed on the recording film 63.
An upper protective film 64 made of O 2 was formed to a thickness of 135 nm. The method of forming this film was the same as that of the lower protective film (IV) 62d. Further, a reflective film 65 made of Au was formed to a thickness of 100 nm. This film was formed by a sputtering method or a vacuum evaporation method.

【0014】図7は、上述の構造から成る光情報記録媒
体60における結晶質部分と非晶質部分との記録膜膜厚
(nm)に対する反射率(%)の依存性のシミュレーション結
果を示した特性図である。尚、図7(a) は光の波長λが
再生のための 780nmのときであり、図7(b) は光の波長
λが記録・消去のための 850nmのときである。光の波長
780nmのとき、記録膜63膜厚が65nmで結晶質部分の反
射率が72%となり、非晶質部分の反射率が31%となっ
た。又、光の波長 850nmのとき、記録膜63の膜厚が65
nmで結晶質部分及び非晶質部分共に反射率が30%となっ
た。以上のような反射率変化となるため、光の波長が 7
80nmでは結晶質部分の反射率がCD規格である反射率65
%以上を満足する。又、光の波長が 850nmでは光吸収が
大きいため記録・消去が容易となる。
FIG. 7 shows the recording film thickness of the crystalline portion and the amorphous portion in the optical information recording medium 60 having the above structure.
It is a characteristic view showing a simulation result of the dependency of reflectance (%) on (nm). Incidentally, FIG. 7 (a) shows the case where the light wavelength λ is 780 nm for reproduction, and FIG. 7 (b) shows the case where the light wavelength λ is 850 nm for recording / erasing. Wavelength of light
At 780 nm, the reflectance of the crystalline portion was 72% and the reflectance of the amorphous portion was 31% when the thickness of the recording film 63 was 65 nm. When the wavelength of light is 850 nm, the film thickness of the recording film 63 is 65
In nm, the reflectance was 30% for both the crystalline part and the amorphous part. Since the reflectance changes as described above, the light wavelength
At 80 nm, the reflectance of the crystalline part is the CD standard reflectance of 65.
Satisfies at least%. Also, when the wavelength of light is 850 nm, the light absorption is large, so recording / erasing becomes easy.

【0015】次に、本発明に係る書き換え可能な光情報
記録媒体の第5実施例について述べる。この光情報記録
媒体80の断面構造は上述の第4実施例と同様であり、
図6において、基板81、多層下層保護膜82(下層保
護膜(I) 82a、下層保護膜(II)82b、下層保護膜(I
II) 82c、下層保護膜(IV)82d)、記録膜83、上
層保護膜84、反射膜85とそれぞれ符号を読み替えた
ものとする。尚、下層保護膜(II)82bを上記SiO
2(屈折率1.46)より屈折率の低い MgF2(屈折率1.3
8)にて膜厚 160nmとし、その膜に上下隣接するTiO2
膜との屈折率差をより大きくする。
Next, a fifth embodiment of the rewritable optical information recording medium according to the present invention will be described. The cross-sectional structure of this optical information recording medium 80 is similar to that of the above-mentioned fourth embodiment,
In FIG. 6, a substrate 81, a multilayer lower protective film 82 (lower protective film (I) 82a, lower protective film (II) 82b, lower protective film (I)
II) 82c, the lower protective film (IV) 82d), the recording film 83, the upper protective film 84, and the reflective film 85 are replaced with the reference numerals. In addition, the lower protective film (II) 82b is the above-mentioned SiO 2
2 (refractive index 1.46) lower MgF 2 (refractive index 1.3
In 8), the film thickness is set to 160 nm, and the TiO 2 that is vertically adjacent to the film is
The refractive index difference with the film is made larger.

【0016】図8は、上述の構造から成る光情報記録媒
体80における結晶質部分と非晶質部分との記録膜膜厚
(nm)に対する反射率(%)の依存性のシミュレーション結
果を示した特性図である。尚、図8(a) は光の波長λが
再生のための 780nmのときであり、図8(b) は光の波長
λが記録・消去のための 850nmのときである。光の波長
780nmのとき、記録膜83の膜厚が65nmで結晶質部分の
反射率が75%となり、非晶質部分の反射率が36%となっ
た。又、光の波長 850nmのとき、記録膜83の膜厚が65
nmで結晶質部分及び非晶質部分共に反射率が34%となっ
た。上述の第4実施例と比べると下層保護膜の屈折率差
を大きくしたことにより反射率を4%程度向上すること
ができた。以上のような膜構造及び記録・消去の方法を
行うことにより、光情報記録媒体80は従来に比べ極め
て高速な記録・消去を行うことができる。
FIG. 8 shows the recording film thickness of the crystalline portion and the amorphous portion in the optical information recording medium 80 having the above structure.
It is a characteristic view showing a simulation result of the dependency of reflectance (%) on (nm). 8 (a) shows the case where the light wavelength λ is 780 nm for reproduction, and FIG. 8 (b) shows the case where the light wavelength λ is 850 nm for recording / erasing. Wavelength of light
At 780 nm, the reflectance of the crystalline portion was 75% and the reflectance of the amorphous portion was 36% when the thickness of the recording film 83 was 65 nm. Further, when the wavelength of light is 850 nm, the film thickness of the recording film 83 is 65
In nm, the reflectance was 34% for both the crystalline portion and the amorphous portion. Compared with the above-mentioned fourth embodiment, the reflectance could be improved by about 4% by increasing the refractive index difference of the lower protective film. By performing the film structure and the recording / erasing method as described above, the optical information recording medium 80 can perform recording / erasing at an extremely high speed as compared with the conventional one.

【0017】以上説明したように、本発明に係る書き換
え可能な光情報記録媒体においては、多層下層保護膜の
うち下層保護膜(I) と下層保護膜(III) とは透明で屈折
率の高い材料が良く、下層保護膜(II)は透明で屈折率の
低い材料が良い。更に、下層保護膜(IV)と上層保護膜と
に用いる材料の条件は以下の通りとすると良いことが分
かった。 上述の波長の光に対して透明であること。 記録膜よりも融点が高いこと。 記録膜と反応しないこと。
As described above, in the rewritable optical information recording medium according to the present invention, the lower protective film (I) and the lower protective film (III) of the multilayer lower protective film are transparent and have a high refractive index. The material is good, and the lower protective film (II) is preferably transparent and has a low refractive index. Furthermore, it was found that the conditions of the materials used for the lower protective film (IV) and the upper protective film should be as follows. Be transparent to light of the above wavelengths. It has a higher melting point than the recording film. Do not react with the recording film.

【0018】又、本発明に係る書き換え可能な光情報記
録媒体における記録膜の材質としては、上述の GeSb
Te系以外に InSbTe系やInSe系などの相変化膜で
も良い。更に、本発明に係る書き換え可能な光情報記録
媒体にオーバコートを施した上に保護板又はもう1つの
同様の光情報記録媒体を接着剤などで張り合わせても良
い。
The material of the recording film in the rewritable optical information recording medium according to the present invention is GeSb as described above.
In addition to the Te system, an InSbTe system or an InSe system phase change film may be used. Furthermore, the rewritable optical information recording medium according to the present invention may be overcoated, and then a protective plate or another similar optical information recording medium may be attached with an adhesive or the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の具体的な一実施例に係る書き換え可能
な光情報記録媒体の断面構造を示した模式図である。
FIG. 1 is a schematic view showing a cross-sectional structure of a rewritable optical information recording medium according to a specific example of the present invention.

【図2】同実施例に係る書き換え可能な光情報記録媒体
における結晶質部分と非晶質部分との記録膜膜厚に対す
る反射率の依存性のシミュレーション結果を示した特性
図である。
FIG. 2 is a characteristic diagram showing a simulation result of dependence of reflectance on a recording film thickness of a crystalline portion and an amorphous portion in the rewritable optical information recording medium according to the example.

【図3】本発明に係る書き換え可能な光情報記録媒体の
第2実施例の断面構造を示した模式図である。
FIG. 3 is a schematic diagram showing a cross-sectional structure of a second embodiment of a rewritable optical information recording medium according to the present invention.

【図4】本発明に係る書き換え可能な光情報記録媒体の
第2実施例における結晶質部分と非晶質部分との記録膜
膜厚に対する反射率の依存性のシミュレーション結果を
示した特性図である。
FIG. 4 is a characteristic diagram showing a simulation result of the dependency of reflectance on the recording film thickness of the crystalline portion and the amorphous portion in the second embodiment of the rewritable optical information recording medium according to the present invention. is there.

【図5】本発明に係る書き換え可能な光情報記録媒体の
第3実施例における結晶質部分と非晶質部分との記録膜
膜厚に対する反射率の依存性のシミュレーション結果を
示した特性図である。
FIG. 5 is a characteristic diagram showing a simulation result of the dependency of reflectance on the recording film thickness of the crystalline portion and the amorphous portion in the third embodiment of the rewritable optical information recording medium according to the present invention. is there.

【図6】本発明に係る書き換え可能な光情報記録媒体の
第4実施例の断面構造を示した模式図である。
FIG. 6 is a schematic view showing a cross-sectional structure of a fourth embodiment of the rewritable optical information recording medium according to the present invention.

【図7】本発明に係る書き換え可能な光情報記録媒体の
第4実施例における結晶質部分と非晶質部分との記録膜
膜厚に対する反射率の依存性のシミュレーション結果を
示した特性図である。
FIG. 7 is a characteristic diagram showing a simulation result of dependency of reflectance on recording film thickness between a crystalline portion and an amorphous portion in a fourth embodiment of the rewritable optical information recording medium according to the present invention. is there.

【図8】本発明に係る書き換え可能な光情報記録媒体の
第5実施例における結晶質部分と非晶質部分との記録膜
膜厚に対する反射率の依存性のシミュレーション結果を
示した特性図である。
FIG. 8 is a characteristic diagram showing a simulation result of the dependence of reflectance on the recording film thickness of the crystalline portion and the amorphous portion in the fifth embodiment of the rewritable optical information recording medium according to the present invention. is there.

【符号の説明】[Explanation of symbols]

1…基板 2…多層下層保護膜 2a…下層保護膜(I) 2b…下層保護膜(II) 3…記録膜 4…上層保護膜 5…反射膜 10…書き換え可能な光情報記録媒体 DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Multilayer lower protective film 2a ... Lower protective film (I) 2b ... Lower protective film (II) 3 ... Recording film 4 ... Upper protective film 5 ... Reflective film 10 ... Rewritable optical information recording medium

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 基板上に下層保護膜、記録膜、上層保護
膜及び反射膜を順次形成した書き換え可能な光情報記録
媒体であって、 前記下層保護膜は波長の異なる2つの光に対して透明で
屈折率の異なる複数の膜から成り、屈折率の大きい方を
入射光側とし交互に配設した多層構造とし、前記2つの
光のうち記録・消去のための光の波長のとき前記記録膜
の結晶質部分及び非晶質部分に対応する両部分の反射率
が共に低く、前記2つの光のうち再生のための光の波長
のとき前記記録膜の結晶質部分及び非晶質部分に対応す
る両部分のうち何れか一方で反射率が高く、他方で反射
率が低くなるようにそれらの膜厚を設定することを特徴
とする光情報記録媒体。
1. A rewritable optical information recording medium in which a lower protective film, a recording film, an upper protective film and a reflective film are sequentially formed on a substrate, wherein the lower protective film protects against two lights having different wavelengths. It has a multi-layered structure composed of a plurality of transparent films having different refractive indexes, and the one having the larger refractive index is arranged alternately with the incident light side as the incident light side. The reflectance of both portions corresponding to the crystalline portion and the amorphous portion of the film is low, and when the wavelength of the light for reproduction of the two lights is low, the crystalline portion and the amorphous portion of the recording film are An optical information recording medium, characterized in that the film thicknesses thereof are set so that one of the corresponding portions has a high reflectance and the other has a low reflectance.
JP4225220A 1991-11-29 1992-07-31 Rewritable optical information recording medium Pending JPH05205316A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4225220A JPH05205316A (en) 1991-11-29 1992-07-31 Rewritable optical information recording medium

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP3-341874 1991-11-29
JP34187491 1991-11-29
JP4225220A JPH05205316A (en) 1991-11-29 1992-07-31 Rewritable optical information recording medium

Publications (1)

Publication Number Publication Date
JPH05205316A true JPH05205316A (en) 1993-08-13

Family

ID=26526506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4225220A Pending JPH05205316A (en) 1991-11-29 1992-07-31 Rewritable optical information recording medium

Country Status (1)

Country Link
JP (1) JPH05205316A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5812182A (en) * 1995-06-07 1998-09-22 Nippondenso Co., Ltd. Optical information recording medium for recording erasing and play back of compact disc signals
EP0883116A2 (en) * 1997-06-03 1998-12-09 Nec Corporation Optical recording media
US5962100A (en) * 1996-07-29 1999-10-05 Denso Corporation Optical information recording medium
KR100425084B1 (en) * 1997-06-18 2004-07-21 엘지전자 주식회사 Optical disk recording medium and reproducing apparatus capable of reading data without accurate focusing and recording data without efm

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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