JPH05201734A - Production of oxynitride glass - Google Patents

Production of oxynitride glass

Info

Publication number
JPH05201734A
JPH05201734A JP3701292A JP3701292A JPH05201734A JP H05201734 A JPH05201734 A JP H05201734A JP 3701292 A JP3701292 A JP 3701292A JP 3701292 A JP3701292 A JP 3701292A JP H05201734 A JPH05201734 A JP H05201734A
Authority
JP
Japan
Prior art keywords
glass
raw material
nitrogen
oxynitride
melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3701292A
Other languages
Japanese (ja)
Inventor
Toshibumi Fukui
俊文 福井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP3701292A priority Critical patent/JPH05201734A/en
Publication of JPH05201734A publication Critical patent/JPH05201734A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/045Silicon oxycarbide, oxynitride or oxycarbonitride glasses
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

PURPOSE:To produce glass at a low temp. in short time in the production where raw material including oxide and nitrogen-contg. compounds is melted by using an oxygen compound as a nitrogen supply source. CONSTITUTION:When melting raw material including oxide and nitrogen-contg. compounds to produce oxynitride glass, oxides are used as glass raw material. As the oxide, Si2N2O is especially preferable. The oxides, such as Si2N2O, etc., have the structure similar to that where oxygen atoms of SiO2 as main raw material of silica glass, are substituted by nitrogen atoms and in which nitrogen atoms are dispersed in advance. For that, it is presumed that dispersion into glass structure is made easier compared with the case where Si3N4 or metal nitride is used.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は短時間に窒素含有量の高
いオキシナイトライドガラスを製造する方法に関する。
FIELD OF THE INVENTION The present invention relates to a method for producing oxynitride glass having a high nitrogen content in a short time.

【0002】[0002]

【従来の技術および課題】オキシナイトライドガラス
は、酸化物ガラス中の酸素の一部が結合原子価三価の窒
素により置換された構造を有する。このため、酸化物ガ
ラスより数多くの化学結合が形成されてガラスのネット
ワークが強固になり、透明性が高く高弾性率および高強
度を示すなど優れた物理的性質を有する。
2. Description of the Related Art Oxynitride glass has a structure in which a part of oxygen in the oxide glass is replaced by nitrogen having a bond valence and trivalence. Therefore, more chemical bonds are formed than the oxide glass to strengthen the glass network, and it has excellent physical properties such as high transparency and high elasticity and high strength.

【0003】このようなオキシナイトライドガラスは一
般に溶融法によって製造され、SiO2並びにSi34
よびAINなどの窒化物原料を、金属酸化物などの他の
ガラス原料と混合して不活性ガス中にて長時間溶融す
る。このような溶融法では、まず原料であるSi34
どの金属窒化物の原子間結合を解き、窒素原子をガラス
構造中に充分に拡散してガラス化反応を起こす必要があ
るため、ガラス原料は高温下で長時間溶融しなければな
らない。
Such an oxynitride glass is generally manufactured by a melting method, and a nitride raw material such as SiO 2 and Si 3 N 4 and AIN is mixed with another glass raw material such as a metal oxide to produce an inert gas. It melts for a long time inside. In such a melting method, first, it is necessary to break the interatomic bond of the metal nitride such as Si 3 N 4 which is a raw material and sufficiently diffuse nitrogen atoms into the glass structure to cause a vitrification reaction. The raw material must melt at high temperature for a long time.

【0004】本発明の目的は、オキシナイトライドガラ
スの製造にあたりガラス化時間を短縮して容易にガラス
化を行うことにある。
An object of the present invention is to shorten the vitrification time in the production of oxynitride glass and to easily perform vitrification.

【0005】[0005]

【課題を解決するための手段】本発明者らは、ガラス化
時間の短縮について種々検討を行ったところ、窒素供給
源として酸窒化物を用いることにより短時間に良好なオ
キシナイトライドガラスが得られるとの知見を得て本発
明を完成するに至った。
[Means for Solving the Problems] The inventors of the present invention have made various studies on shortening the vitrification time. As a result, by using oxynitride as a nitrogen supply source, a good oxynitride glass can be obtained in a short time. The present invention has been completed based on the finding that it can be obtained.

【0006】すなわち、本発明は、酸化物および含窒素
化合物を含む原料を溶融してオキシナイトライドガラス
を製造するにあたり、ガラス原料として酸窒化物を用い
るオキシナイトライドガラスの製造法を提供するもので
ある。このような酸窒化物としてはSi22Oが特に好
ましい。
That is, the present invention provides a method for producing an oxynitride glass using an oxynitride as a glass raw material in producing an oxynitride glass by melting a raw material containing an oxide and a nitrogen-containing compound. Is. Si 2 N 2 O is particularly preferable as such an oxynitride.

【0007】従来、オキシナイトライドガラスの窒素源
として用いられているSi34や金属窒化物の場合は、
原子間結合を解いてガラス構造中に窒素原子を分散させ
るために高いエネルギーが必要であり、このためガラス
化に高温、長時間加熱が必要になると考えられる。これ
に対して、Si22Oなどの酸窒化物は、その構造がケ
イ酸ガラスの主原料であるSiO2の酸素原子を窒素原子
により置き換えた構造に類似している。このように窒素
原子が予め分散していてSi34や金属窒化物を用いた
場合に比べてガラス構造中への分散が容易であるものと
推定される。
In the case of Si 3 N 4 or a metal nitride which has been conventionally used as a nitrogen source of oxynitride glass,
High energy is required to break the interatomic bonds and disperse the nitrogen atoms in the glass structure, and thus it is considered that vitrification requires high temperature and long time heating. On the other hand, the structure of oxynitride such as Si 2 N 2 O is similar to the structure in which oxygen atom of SiO 2 which is the main raw material of silicate glass is replaced by nitrogen atom. Thus, it is presumed that the nitrogen atoms are dispersed in advance and are easily dispersed in the glass structure as compared with the case of using Si 3 N 4 or metal nitride.

【0008】前記の方法による代表的なオキシナイトラ
イドガラスの製造法では、まず(i)SiO2、(ii)Si
22O、または他の金属酸窒化物、(iii)少なくとも
1種の金属酸化物、(iv)CaOまたはCaO+MgOを
混合する。
In a typical method for producing an oxynitride glass by the above method, first, (i) SiO 2 and (ii) Si
2 N 2 O or another metal oxynitride, (iii) at least one metal oxide, (iv) CaO or CaO + MgO are mixed.

【0009】前記(ii)のSi22O以外の酸窒化ケイ
素としてはSi56Oなどが挙げられる。その他の酸窒
化物としては、例えば金属酸窒化物(Al2n+13n
等)、サイアロン(Si6-xAlxx8-x等)、酸窒化珪
素と金属との化合物(La4Si272等)などが挙げら
れる。これらはいずれもオキシナイトライドガラスのS
i、O、N間の結合を最初から有しガラス化に好都合で
あり、高い窒素含有量の実現が可能である。
Examples of silicon oxynitride other than ( 2 ) Si 2 N 2 O include Si 5 N 6 O. Other oxynitrides include, for example, metal oxynitrides (Al 2n + 1 O 3n N
Etc.), sialon (Si 6-x Al x O x N 8-x etc.), compounds of silicon oxynitride and metal (La 4 Si 2 O 7 N 2 etc.) and the like. All of these are S of oxynitride glass.
It has a bond between i, O, and N from the beginning, is convenient for vitrification, and can realize a high nitrogen content.

【0010】また、窒素源としては前記酸窒化物以外に
従来より用いられているSi34、AlN、BN等を併
用してもよい。
As the nitrogen source, Si 3 N 4 , AlN, BN or the like which has been conventionally used may be used in combination with the oxynitride.

【0011】(iii)の金属酸化物としてはAl23
BaO、Sb23、SrO、Na2O、K2O、La23、Ce
2、Y23、ZrO2、TiO2、B23、Cr23、Pb
O、V25、SnO2など、あるいは熱分解によりこれら
の金属酸化物となる炭酸塩、水酸化物、シュウ酸塩を配
合してもよい。また、CaOおよびMgOの代わりに熱分
解によりCaOまたはMgOとなる化合物、例えば炭酸
塩、水酸化物、シュウ酸塩などを用いてもよい。
As the metal oxide of (iii), Al 2 O 3 ,
BaO, Sb 2 O 3 , SrO, Na 2 O, K 2 O, La 2 O 3 , Ce
O 2 , Y 2 O 3 , ZrO 2 , TiO 2 , B 2 O 3 , Cr 2 O 3 , Pb
O, V 2 O 5, SnO 2 , etc., or carbonates comprising these metal oxides by thermal decomposition, hydroxides, may be blended oxalate. Further, instead of CaO and MgO, a compound which becomes CaO or MgO by thermal decomposition, such as carbonate, hydroxide or oxalate may be used.

【0012】これらの原料は、充分に混合され、加熱、
溶融してオキシナイトライドガラスを得る。該混合物の
溶融は1400〜1900℃にて3〜100時間、加熱
速度10〜800℃/分にて窒素、アルゴンなどの不活
性ガスの雰囲気下にて行いガラス化するのが好ましい。
These raw materials are thoroughly mixed and heated,
Melt to obtain oxynitride glass. The mixture is preferably melted at 1400 to 1900 ° C. for 3 to 100 hours at a heating rate of 10 to 800 ° C./min in an atmosphere of an inert gas such as nitrogen or argon to vitrify.

【0013】本発明の製造法にて得られる好ましいオキ
シナイトライドガラスはSi−Ca−M−O−NまたはS
i−Ca−Mg−M−O−Nガラス系を有する。金属Mは
Al、Sr、La、Ba、Y、Ti、Zr、Ce、N
a、K、Sb、B、Cr、Pb、V、Snなどの少なく
とも1種である。また、このオキシナイトライドガラス
はSiO2 0〜40モル%、CaO 26〜70モル%、
MgO 0〜20モル%および M222原子%以下を含む
のが好ましく、5原子%以上の窒素を含有し、Si−N
結合に基づく緊密な架橋構造を有するのが好ましい。得
られた好ましいガラスは窒素含有量5〜30原子%、弾
性率100〜220GPa、引張強度1.0〜7GPa
を有する。なお、窒素含有量の調整は原料中の酸窒化物
また窒化物の量により行うことができる。
A preferred oxynitride glass obtained by the production method of the present invention is Si-Ca-M-O-N or S.
It has an i-Ca-Mg-M-O-N glass system. Metal M is Al, Sr, La, Ba, Y, Ti, Zr, Ce, N
It is at least one kind of a, K, Sb, B, Cr, Pb, V, Sn and the like. Further, this oxynitride glass contains SiO 2 0 to 40 mol%, CaO 26 to 70 mol%,
It is preferable to contain 0 to 20 mol% of MgO and 22 atom% or less of M 2 and contain 5 atom% or more of nitrogen.
It is preferred to have a tightly crosslinked structure based on the bonds. The preferred glass obtained has a nitrogen content of 5 to 30 atom%, an elastic modulus of 100 to 220 GPa, and a tensile strength of 1.0 to 7 GPa.
Have. The nitrogen content can be adjusted by the amount of oxynitride or nitride in the raw material.

【0014】[0014]

【実施例】つぎに本発明を実施例に基づきさらに具体的
に説明する。実施例中、%はモル%を意味する。
EXAMPLES Next, the present invention will be described more specifically based on examples. In the examples,% means mol%.

【0015】[実施例1]ガラス原料としてSiO
2(0.7%)、Si22O(35.6%)、CaO(55.
5%)、MgO(6.3%)、Al23(1.9%)[窒
素含有量22.7原子%]の各粉末を用いた。このガラ
ス原料を混合して加熱装置内の溶融ルツボ(内径50m
m、高さ200mm)に供給した。ルツボ内の混合物を
窒素雰囲気下、1770℃にて溶融した。溶融1時間で
完全にガラス化した。
[Example 1] SiO as a glass raw material
2 (0.7%), Si 2 N 2 O (35.6%), CaO (55.
5%), MgO (6.3%), and Al 2 O 3 (1.9%) [nitrogen content 22.7 atomic%] were used. This glass raw material is mixed and the melting crucible in the heating device (inner diameter 50 m
m, height 200 mm). The mixture in the crucible was melted at 1770 ° C. under a nitrogen atmosphere. It was completely vitrified within 1 hour of melting.

【0016】[実施例2]溶融温度を1720℃とした
以外は、実施例1と同様にしてオキシナイトライドガラ
スを製造した。溶融5時間で原料は完全にガラス化し
た。
[Example 2] An oxynitride glass was produced in the same manner as in Example 1 except that the melting temperature was 1720 ° C. The raw material was completely vitrified within 5 hours of melting.

【0017】[実施例3]ガラス原料としてSiO2(1
9.2%)、Si2Al444(16.7%)、CaO(4
1.2%)、Al23(22.9%)[窒素含有量13.7
原子%]の各粉末を用いた。このガラス原料を混合し実
施例1と同様にしてルツボに供給し、窒素雰囲気下、1
740℃にて溶融した。溶融3時間で完全にガラス化し
た。
Example 3 As a glass raw material, SiO 2 (1
9.2%), Si 2 Al 4 O 4 N 4 (16.7%), CaO (4
1.2%), Al 2 O 3 (22.9%) [nitrogen content 13.7
Atom%] of each powder was used. The glass raw materials were mixed and supplied to the crucible in the same manner as in Example 1, and the nitrogen atmosphere was set to 1.
Melted at 740 ° C. It was completely vitrified within 3 hours of melting.

【0018】[比較例1]実施例1と同様にしてオキシ
ナイトライドガラスを製造した。ガラス原料としてSi
2(18.5%)、Si34(17.8%)、CaO(5
5.5%)、MgO(6.3%)、Al23(1.9%)
[窒素含有量22.7原子%]の各粉末を用いた。この
ガラス原料を混合して溶融ルツボ中、窒素雰囲気下、1
770℃にて溶融した。溶融1時間では未溶融物が存在
し均一なガラスは得られず、5時間の溶融で均一なガラ
スが得られた。
[Comparative Example 1] An oxynitride glass was produced in the same manner as in Example 1. Si as a glass raw material
O 2 (18.5%), Si 3 N 4 (17.8%), CaO (5
5.5%), MgO (6.3%), Al 2 O 3 (1.9%)
Each powder having a [nitrogen content of 22.7 atomic%] was used. These glass raw materials are mixed and mixed in a melting crucible under a nitrogen atmosphere for 1
Melted at 770 ° C. Unmelted material was present in 1 hour of melting and uniform glass was not obtained, and uniform glass was obtained in 5 hours of melting.

【0019】[比較例2]比較例1と同様にして、ただ
し溶融温度を1720℃にして溶融を行ったところ5時
間後においても未溶融物が非常に多くガラス化を行うこ
とはできなかった。
[Comparative Example 2] As in Comparative Example 1, except that the melting temperature was 1720 ° C. and melting was carried out. Even after 5 hours, the unmelted material was too much to vitrify. ..

【0020】[比較例3]ガラス原料としてSiO
2(2.2%)、Si34(14.3%)、CaO(35.5
%)、Al23(48.2%)[窒素含有量13.7原子
%]の各粉末を用いた。このガラス原料を混合し、実施
例1と同様にして溶融ルツボ中、窒素雰囲気下、176
0℃にて溶融したところ、溶融5時間でガラス化した。
[Comparative Example 3] SiO as a glass raw material
2 (2.2%), Si 3 N 4 (14.3%), CaO (35.5)
%) And Al 2 O 3 (48.2%) [nitrogen content 13.7 atom%]. This glass raw material was mixed and treated in the same manner as in Example 1 in a molten crucible under a nitrogen atmosphere, 176.
When melted at 0 ° C., it was vitrified in 5 hours of melting.

【0021】[0021]

【発明の効果】本発明の方法によれば低温、短時間にて
容易にオキシナイトライドガラスを製造することができ
る。
According to the method of the present invention, oxynitride glass can be easily manufactured at low temperature and in a short time.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 酸化物および含窒素化合物を含む原料を
溶融してオキシナイトライドガラスを製造するにあた
り、ガラス原料として酸窒化物を用いるオキシナイトラ
イドガラスの製造法。
1. A method for producing an oxynitride glass, wherein an oxynitride is used as a glass raw material in producing an oxynitride glass by melting a raw material containing an oxide and a nitrogen-containing compound.
JP3701292A 1992-01-27 1992-01-27 Production of oxynitride glass Pending JPH05201734A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3701292A JPH05201734A (en) 1992-01-27 1992-01-27 Production of oxynitride glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3701292A JPH05201734A (en) 1992-01-27 1992-01-27 Production of oxynitride glass

Publications (1)

Publication Number Publication Date
JPH05201734A true JPH05201734A (en) 1993-08-10

Family

ID=12485769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3701292A Pending JPH05201734A (en) 1992-01-27 1992-01-27 Production of oxynitride glass

Country Status (1)

Country Link
JP (1) JPH05201734A (en)

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