JPH05194784A - Photopolymerizable organic composition - Google Patents
Photopolymerizable organic compositionInfo
- Publication number
- JPH05194784A JPH05194784A JP4289796A JP28979692A JPH05194784A JP H05194784 A JPH05194784 A JP H05194784A JP 4289796 A JP4289796 A JP 4289796A JP 28979692 A JP28979692 A JP 28979692A JP H05194784 A JPH05194784 A JP H05194784A
- Authority
- JP
- Japan
- Prior art keywords
- aryl ketone
- deep
- photopolymerizable organic
- photopolymerizable
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 25
- -1 aryl ketone Chemical class 0.000 claims abstract description 34
- 239000003822 epoxy resin Substances 0.000 claims abstract description 11
- 239000011368 organic material Substances 0.000 claims abstract description 11
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 11
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims abstract description 6
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 3
- 239000011630 iodine Substances 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract 2
- 239000011342 resin composition Substances 0.000 claims abstract 2
- 239000000126 substance Substances 0.000 claims description 24
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 claims description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims 1
- 125000005520 diaryliodonium group Chemical group 0.000 abstract description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 125000000468 ketone group Chemical group 0.000 abstract 2
- ILBBNQMSDGAAPF-UHFFFAOYSA-N 1-(6-hydroxy-6-methylcyclohexa-2,4-dien-1-yl)propan-1-one Chemical compound CCC(=O)C1C=CC=CC1(C)O ILBBNQMSDGAAPF-UHFFFAOYSA-N 0.000 abstract 1
- 125000001475 halogen functional group Chemical group 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 239000004593 Epoxy Substances 0.000 description 6
- 150000008365 aromatic ketones Chemical class 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 229910052752 metalloid Inorganic materials 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005649 metathesis reaction Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RBHIUNHSNSQJNG-UHFFFAOYSA-N 6-methyl-3-(2-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2(C)OC2CC1C1(C)CO1 RBHIUNHSNSQJNG-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000004292 cyclic ethers Chemical class 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- NPFYZDNDJHZQKY-UHFFFAOYSA-N 4-Hydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 NPFYZDNDJHZQKY-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000012955 diaryliodonium Substances 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical class C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 150000002738 metalloids Chemical class 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 125000003396 thiol group Chemical class [H]S* 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- ZWAJLVLEBYIOTI-OLQVQODUSA-N (1s,6r)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CCC[C@@H]2O[C@@H]21 ZWAJLVLEBYIOTI-OLQVQODUSA-N 0.000 description 1
- VFPHRVOCSLPNMP-UHFFFAOYSA-N (2-benzylnaphthalen-1-yl)-phenylmethanone Chemical compound C=1C=CC=CC=1CC=1C=CC2=CC=CC=C2C=1C(=O)C1=CC=CC=C1 VFPHRVOCSLPNMP-UHFFFAOYSA-N 0.000 description 1
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- MFYLRNKOXORIPK-UHFFFAOYSA-N (3-nitrophenyl)-phenylmethanone Chemical compound [O-][N+](=O)C1=CC=CC(C(=O)C=2C=CC=CC=2)=C1 MFYLRNKOXORIPK-UHFFFAOYSA-N 0.000 description 1
- KEOLYBMGRQYQTN-UHFFFAOYSA-N (4-bromophenyl)-phenylmethanone Chemical compound C1=CC(Br)=CC=C1C(=O)C1=CC=CC=C1 KEOLYBMGRQYQTN-UHFFFAOYSA-N 0.000 description 1
- IOHJRUFWMYLKED-UHFFFAOYSA-N 1,3,3-trimethylazetidine Chemical compound CN1CC(C)(C)C1 IOHJRUFWMYLKED-UHFFFAOYSA-N 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- XHLHPRDBBAGVEG-UHFFFAOYSA-N 1-tetralone Chemical compound C1=CC=C2C(=O)CCCC2=C1 XHLHPRDBBAGVEG-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- CXURGFRDGROIKG-UHFFFAOYSA-N 3,3-bis(chloromethyl)oxetane Chemical compound ClCC1(CCl)COC1 CXURGFRDGROIKG-UHFFFAOYSA-N 0.000 description 1
- PWGVOCGNHYMDLS-UHFFFAOYSA-N 3-(2-methoxyethoxy)propan-1-amine Chemical compound COCCOCCCN PWGVOCGNHYMDLS-UHFFFAOYSA-N 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- IFQUPKAISSPFTE-UHFFFAOYSA-N 4-benzoylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(=O)C1=CC=CC=C1 IFQUPKAISSPFTE-UHFFFAOYSA-N 0.000 description 1
- SGSKTOKJZHJRCN-UHFFFAOYSA-N 4-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(Cl)=CC=C2 SGSKTOKJZHJRCN-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 1
- GDALETGZDYOOGB-UHFFFAOYSA-N Acridone Natural products C1=C(O)C=C2N(C)C3=CC=CC=C3C(=O)C2=C1O GDALETGZDYOOGB-UHFFFAOYSA-N 0.000 description 1
- 229910017048 AsF6 Inorganic materials 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052781 Neptunium Inorganic materials 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- YTEISYFNYGDBRV-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)oxy-dimethylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)O[Si](C)C YTEISYFNYGDBRV-UHFFFAOYSA-N 0.000 description 1
- NRTJGTSOTDBPDE-UHFFFAOYSA-N [dimethyl(methylsilyloxy)silyl]oxy-dimethyl-trimethylsilyloxysilane Chemical compound C[SiH2]O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C NRTJGTSOTDBPDE-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- FZEYVTFCMJSGMP-UHFFFAOYSA-N acridone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3NC2=C1 FZEYVTFCMJSGMP-UHFFFAOYSA-N 0.000 description 1
- 229910052768 actinide Inorganic materials 0.000 description 1
- 150000001255 actinides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 125000005251 aryl acyl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000003180 beta-lactone group Chemical group 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- RFVHVYKVRGKLNK-UHFFFAOYSA-N bis(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(OC)C=C1 RFVHVYKVRGKLNK-UHFFFAOYSA-N 0.000 description 1
- 229940106691 bisphenol a Drugs 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Chemical group 0.000 description 1
- 239000001257 hydrogen Chemical group 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 239000005414 inactive ingredient Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000002919 oxepanes Chemical class 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- LIGACIXOYTUXAW-UHFFFAOYSA-N phenacyl bromide Chemical compound BrCC(=O)C1=CC=CC=C1 LIGACIXOYTUXAW-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical group C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- GHKGUEZUGFJUEJ-UHFFFAOYSA-M potassium;4-methylbenzenesulfonate Chemical compound [K+].CC1=CC=C(S([O-])(=O)=O)C=C1 GHKGUEZUGFJUEJ-UHFFFAOYSA-M 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N propiophenone Chemical compound CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003413 spiro compounds Chemical class 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000007984 tetrahydrofuranes Chemical class 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- VFWRNIOSEGGKQE-UHFFFAOYSA-N thiourea;1,3,5-triazine-2,4,6-triamine Chemical compound NC(N)=S.NC1=NC(N)=NC(N)=N1 VFWRNIOSEGGKQE-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/68—Arsenic compounds without As—C bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はアリールケトン含有ヨー
ドニウム塩、それらの合成法及び光重合性有機物質中に
おける光開始剤としてのそれらの使用に関するものであ
る。FIELD OF THE INVENTION The present invention relates to arylketone-containing iodonium salts, a process for their synthesis and their use as photoinitiators in photopolymerizable organic materials.
【0002】[0002]
【従来の技術】本発明以前においては、Smithの米
国特許第4,378,277号明細書に示されるごと
く、ジフェニルヨードニウムヘキサフルオロアーセネー
トのようなジアリールヨードニウム塩がエポキシ樹脂の
カチオン重合用の光開始剤として使用されていた。Prior to the present invention, diaryl iodonium salts, such as diphenyl iodonium hexafluoroarsenate, were used for the cationic polymerization of epoxy resins as disclosed in Smith, U.S. Pat. No. 4,378,277. It was used as an initiator.
【0003】[0003]
【発明が解決しようとする課題】上述のジアリールヨー
ドニウム塩は比較的短時間でエポキシ樹脂を不粘着状態
に転化せしめるのに有効であったが、硬化フイルムは屡
々ジアリールヨードニウム塩を活性化するに必要な紫外
線に対するバリヤーとして作用するので満足な厚みをも
つ硬化エポキシ樹脂生成物を取得することは往々にして
困難であった。改善された厚みの硬化皮膜はSmith
の米国特許第4,173,476号明細書に示されるご
とくある種のスルホニウム塩を使用することによって達
成されていた。したがって特別の用途においてはジアリ
ールヨードニウム塩を使用してUV重合性有機物質にお
いてより深部の硬化を達成することが望ましい。While the above-mentioned diaryliodonium salts have been effective in converting epoxy resins to tack free states in a relatively short time, cured films are often necessary to activate diaryliodonium salts. It is often difficult to obtain a cured epoxy resin product with a satisfactory thickness, as it acts as a barrier to strong UV radiation. Hardened coating with improved thickness is Smith
This has been accomplished by using certain sulfonium salts, as shown in U.S. Pat. No. 4,173,476. It is therefore desirable to use diaryliodonium salts in special applications to achieve deeper cure in UV-polymerizable organic materials.
【0004】[0004]
【課題を解決する為の手段】本発明は式: R1 −I+ −R X- 即ち、 [RR1 I]+ X- (1) (式中、RはC(6-13)一価芳香族炭化水素基又はハロ置
換一価芳香族炭化水素基であり、R1 は核炭素原子によ
って沃素に結合されている一価アリールケトン基であ
り、そしてX- は対イオンである)をもつアリールケト
ン含有ジアリールヨードニウム塩はエポキシ樹脂のごと
き広範囲の光重合性有機物質とともに深部光重合性有機
物質の製造のために使用し得るという新知見に基づくも
のである。式(1)のアリールケトン含有ジアリールヨ
ードニウム塩はジアリールヨードニウムトシレート前駆
体と適当な対イオン源、たとえばヘキサフルオロ金属塩
又はメタロイド塩との間の簡単な複分解によって製造す
ることができる。ジアリールヨードニウムトシレート塩
前駆体はアリールヨードソトシレートと芳香族ケトンと
を次式に従って直接縮合させることによって製造し得
る。すなわち、The present invention, there is provided a means for solving] The formula: R 1 -I + -R X - i.e., [RR 1 I] + X - (1) ( wherein, R C (6-13) monovalent An aromatic hydrocarbon group or a halo-substituted monovalent aromatic hydrocarbon group, R 1 is a monovalent arylketone group linked to iodine by a nuclear carbon atom, and X − is a counterion). The arylketone-containing diaryliodonium salts are based on the new finding that they can be used for the preparation of deep photopolymerizable organic materials with a wide range of photopolymerizable organic materials such as epoxy resins. The arylketone-containing diaryliodonium salt of formula (1) can be prepared by simple metathesis between a diaryliodonium tosylate precursor and a suitable counterion source such as a hexafluorometal salt or a metalloid salt. The diaryl iodonium tosylate salt precursor can be prepared by directly condensing an aryl iodosotosylate and an aromatic ketone according to the following formula. That is,
【0005】[0005]
【化5】 (式中、Tos- はトシレートであり、R及びR1 は前
記定義したとおりである。)アリールヨードソトシレー
トの直接縮合を伴うジアリールヨードニウム塩の合成は
Koser,Wettach及びSmithによってJ
ournal of Organic Chemist
ry,45,1944(1980)に報告されている。
前述したごとく、アリールケトン含有アリールヨードニ
ウムトシレートの式(1)をもつアリールケトン含有ジ
アリールヨードニウム塩への転化は次式によって示され
るごとく簡単な複分解によって達成し得る。すなわち、[Chemical 5] (Wherein Tos − is tosylate and R and R 1 are as defined above.) The synthesis of diaryl iodonium salts involving the direct condensation of aryl iodosotosylate is described by Koser, Wetach and Smith in J.
individual of Organic Chemist
ry, 45 , 1944 (1980).
As mentioned above, the conversion of arylketone-containing aryliodonium tosylate to arylketone-containing diaryliodonium salt having the formula (1) can be accomplished by simple metathesis as shown by the following formula. That is,
【0006】[0006]
【化6】 [RR1 I]+ Tos- +MX→式(1)+MTos- (式中、Mは金属又はメタロイドである。)Embedded image [RR 1 I] + Tos − + MX → Formula (1) + MTos − (In the formula, M is a metal or a metalloid.)
【0007】[0007]
【実施例】本発明によれば、(A)光重合性有機物質;
及び(B)式(1)のアリールケトン含有ヨードニウム
光開始剤の有効量;を含有してなる深部光重合性有機樹
脂組成物が提供される。EXAMPLES According to the present invention, (A) a photopolymerizable organic substance;
And (B) an effective amount of the aryl ketone-containing iodonium photoinitiator of the formula (1);
【0008】式(1)のRの範囲内に包含される基はた
とえばフェニル,トリル,ナフチル,アンスリル基のよ
うなC(6-13)一価芳香族炭化水素基及び1個ないし4個
までの一価の基、たとえばC(1-8) アルコキシ,C
(1-8) アルキル,ニトロ,クロル,ヒドロキシ等の基で
置換されたC(6-13)一価芳香族炭化水素基ベンゾイル,
フェニルアシル等のごときアリールアシル基;ピリジ
ル,フルフリル等のごとき芳香族複素環式基である。Groups within the scope of R in formula (1) include C (6-13) monovalent aromatic hydrocarbon groups such as phenyl, tolyl, naphthyl, anthryl groups and up to 1 to 4 groups. Monovalent groups such as C (1-8) alkoxy, C
(1-8) C (6-13) monovalent aromatic hydrocarbon group benzoyl substituted with a group such as alkyl, nitro, chloro and hydroxy,
An arylacyl group such as phenylacyl; an aromatic heterocyclic group such as pyridyl, furfuryl and the like.
【0009】式(1)のR1 の範囲内に包含される基は
たとえば、Groups included within R 1 of formula (1) are, for example:
【0010】[0010]
【化7】 [Chemical 7]
【0011】[0011]
【化8】 [Chemical 8]
【0012】[0012]
【化9】 [Chemical 9]
【0013】[0013]
【化10】 [Chemical 10]
【0014】である。式(1)のX- に包含される陰イ
オンの例はBF4 - ,PF6 - ,AsF6 - ,SbF6
- ,ClO4 - ,CF3 SO3 - ,FSO3 - ,CF3
CO2 - ,AlCl4 - ,BCl4 - ,Br- ,C
l- ,HSO4 - ,CH3 CO2 - ,NO 3 - ,等であ
る。[0014] X in formula (1)-Yin Yi included in
Example of ON is BFFour -, PF6 -, AsF6 -, SbF6
-, ClOFour -, CF3SO3 -, FSO3 -, CF3
CO2 -, AlClFour -, BClFour -, Br-, C
l-, HSOFour -, CH3CO2 -, NO 3 -, Etc.
It
【0015】式(1)のアリールケトン含有ヨードニウ
ム塩の範囲内に包含される化合物の例はつぎのごときも
のである。Examples of compounds included within the scope of arylketone-containing iodonium salts of formula (1) are as follows:
【0016】[0016]
【化11】 [Chemical 11]
【0017】[0017]
【化12】 [Chemical formula 12]
【0018】[0018]
【化13】 [Chemical 13]
【0019】[0019]
【化14】 [Chemical 14]
【0020】[0020]
【化15】 [Chemical 15]
【0021】[0021]
【化16】 [Chemical 16]
【0022】[0022]
【化17】 [Chemical 17]
【0023】[0023]
【化18】 [Chemical 18]
【0024】本発明の光重合性組成物の記載中に使用さ
れる用語“エポキシ樹脂”は1個又は複数個のエポキシ
官能基を含む任意の単量体状、二量体状又はオリゴマー
状あるいは重合体状エポキシ物質を包含するものであ
る。たとえば、ビスフェノール−A(4,4′−イソプ
ロピリデンジフェノール)とエピクロルヒドリンとの反
応から生ずるエポキシ樹脂又は低分子量フェノールホル
ムアルデヒド樹脂(ノボラック樹脂)とエピクロルヒド
リンとの反応によって得られるエポキシ樹脂は単独で又
は反応性稀釈剤としてのエポキシ含有化合物と組合わせ
て使用し得る。フェニルグリシジルエーテル,4−ビニ
ルシクロヘキセンジオキシド,リモネンジオキシド,
1,2−シクロヘキセンオキシド,グリシジルアクリレ
ート,グリシジルメタクリレート,スチレンオキシド,
アリルグリシジルエーテル等のごとき稀釈剤は粘度調整
剤として添加し得る。The term "epoxy resin" as used in the description of the photopolymerizable compositions of the present invention refers to any monomeric, dimeric or oligomeric form containing one or more epoxy functional groups. It includes polymeric epoxy materials. For example, the epoxy resin resulting from the reaction of bisphenol-A (4,4'-isopropylidenediphenol) with epichlorohydrin or the epoxy resin obtained by the reaction of low molecular weight phenol formaldehyde resin (novolak resin) with epichlorohydrin may be used alone or in reaction. It can be used in combination with an epoxy-containing compound as a functional diluent. Phenylglycidyl ether, 4-vinylcyclohexene dioxide, limonene dioxide,
1,2-cyclohexene oxide, glycidyl acrylate, glycidyl methacrylate, styrene oxide,
Diluents such as allyl glycidyl ether may be added as viscosity modifiers.
【0025】さらに、これらの化合物の範囲は末端又は
懸垂エポキシ基を含む重合体状物質を包含するように拡
張し得る。これらの化合物の例は共単量体の一つとして
グリシジルアクリレート又はメタクリレートを含むビニ
ル共重合体である。上述の触媒を用いて硬化し得るエポ
キシ含有重合体の他の群はエポキシシロキサン樹脂,エ
ポキシ−ポリウレタン及びエポキシ−ポリエステルであ
る。かゝる重合体は通常それらの連鎖の末端にエポキシ
官能基を有する。エポキシ−シロキサン樹脂及びその製
造法は特にE.P.Pluedemann及びG.Fa
ngerによってJ.Am.Chem.Soc.,8
0,632−5(1959)に記載されている。この文
献に示されるごとく、エポキシ樹脂はさらに種々の標準
的方法で、たとえばアミン,カルボン酸,チオール,フ
ェノール,アルコール等との反応によって変性すること
ができる(たとえば米国特許第2,935,488号、
第3,235,620号、第3,369,055号、第
3,379,653号、第3,398,211号、第
3,403,199号、第3,563,840号、第
3,567,797号、第3,677,995号明細書
参照)。エポキシ樹脂とともに使用し得る別の共反応剤
はInterscience Publishers,
1967年発行、Encyclopedia of P
olymer Science and Techno
logy,第6巻、第209〜271頁、特に238頁
に示されるヒドロキシ末端ポリエステルのごときヒドロ
キシ末端柔軟剤である。Further, the range of these compounds may be extended to include polymeric materials containing terminal or pendant epoxy groups. An example of these compounds is a vinyl copolymer containing glycidyl acrylate or methacrylate as one of the comonomers. Another group of epoxy-containing polymers that can be cured with the above catalysts are epoxy siloxane resins, epoxy-polyurethanes and epoxy-polyesters. Such polymers usually have epoxy functional groups at the ends of their chains. Epoxy-siloxane resins and methods for making them are especially described by E.I. P. Pludemann and G.W. Fa
by Nger. Am. Chem. Soc. , 8
0, is described in 632-5 (1959). As shown therein, epoxy resins can be further modified in various standard ways, such as by reaction with amines, carboxylic acids, thiols, phenols, alcohols, etc. (eg US Pat. No. 2,935,488). ,
No. 3,235,620, No. 3,369,055, No. 3,379,653, No. 3,398,211, No. 3,403,199, No. 3,563,840, No. 3 , 567,797, 3,677,995). Another co-reactant that may be used with the epoxy resin is Interscience Publishers,
Published in 1967, Encyclopedia of P
polymer Science and Techno
and hydroxy-terminated softeners such as the hydroxy-terminated polyesters shown in Loggy, Volume 6, pages 209-271, especially 238.
【0026】本発明の実施に使用し得る光重合性有機物
質はホルムアルデヒドの熱硬化性有機縮合樹脂、たとえ
ば尿素系樹脂,フェノール−ホルムアルデヒド系樹脂を
包含する。さらに、メラミンチオ尿素樹脂,メラミン,
又は尿素アルデヒド樹脂,クレゾール−ホルムアルデヒ
ド樹脂及びポリエステル,アルキッド及びポリスルフィ
ドのごときその他のカルボキシ,ヒドロキシ,アミノ及
びメルカプト含有樹脂との組合せを使用し得る。Photopolymerizable organic materials that can be used in the practice of the present invention include thermosetting organic condensation resins for formaldehyde, such as urea resins and phenol-formaldehyde resins. In addition, melamine thiourea resin, melamine,
Alternatively, a combination of urea aldehyde resins, cresol-formaldehyde resins and polyesters, alkyds and other carboxy, hydroxy, amino and mercapto containing resins such as polysulfides may be used.
【0027】本発明の重合性組成物の製造に使用し得る
ビニル有機プレポリマーの若干の例はCH2 =CH−O
−(CH2 −CH2 O) n′−CH=CH2 (式中、
n′は約1000まで又はそれ以上の値をもつ正の整数
である);多官能性ビニルエーテル,たとえば1,2,
3−プロパントリビニルエーテル,トリメチルプロパン
トリビニルエーテル;式:Some examples of vinyl organic prepolymers that can be used to make the polymerizable compositions of the present invention are CH 2 ═CH—O.
- (CH 2 -CH 2 O) n '-CH = CH 2 ( in the formula,
n'is a positive integer with a value of up to about 1000 or more); polyfunctional vinyl ethers such as 1,2,
3-propanetrivinylether, trimethylpropanetrivinylether; Formula:
【0028】[0028]
【化19】 [Chemical 19]
【0029】をもつプレポリマー;及び25℃で200
〜10,000センチポイズの粘度をもつ低分子量ポリ
ブタジエン等である。かゝる組成物の硬化によって得ら
れる生成物は印刷用インクとして及び熱硬化性樹脂につ
いて典型的なその他の用途に使用することができる。本
発明の重合性組成物の製造に使用し得るさらに別の種類
の光重合性有機物質は熱可塑性プラスチックスに転化し
得る環式エーテルである。かゝる環式エーテルに包含さ
れるものとしては、たとえばSchroeterの米国
特許第3,673,216号明細書に示されるごとき
3,3−ビス−クロルメチルオキセタン,アルコキシオ
キセタン類のようなオキセタン類;テトラヒドロフラン
のようなオキソラン類,オキセパン類,酸素含有スピロ
化合物,トリオキサン,ジオキソラン等があげられる。A prepolymer having; and 200 at 25 ° C.
Low molecular weight polybutadiene having a viscosity of ˜10,000 centipoise. The products obtained by curing such compositions can be used as printing inks and in other applications typical of thermosetting resins. Yet another type of photopolymerizable organic material that can be used to make the polymerizable compositions of the present invention are cyclic ethers that can be converted into thermoplastics. Included in such cyclic ethers are oxetanes such as 3,3-bis-chloromethyl oxetane, alkoxy oxetanes such as those shown in Schroeter, U.S. Pat. No. 3,673,216. Oxolanes such as tetrahydrofuran, oxepanes, oxygen-containing spiro compounds, trioxane, dioxolane and the like.
【0030】環式エーテルに加えて、β−ラクトン類、
たとえばプロピオラクトンのような環式エステル類;
1,3,3−トリメチルアゼチジンのような環式アミン
類及び式:In addition to cyclic ethers, β-lactones,
Cyclic esters such as propiolactone;
Cyclic amines and formulas such as 1,3,3-trimethylazetidine:
【0031】[0031]
【化20】 [Chemical 20]
【0032】(式中、R″はメチル又はフェニルのごと
き同一でも異なってもよい一価有機基でありそしてmは
3〜8の整数である)に包含される環式オルガノシリコ
ン化合物もまたかゝる光重合性有機物質に包含され得
る。環式オルガノシリコン化合物の例はヘキサメチルト
リシロキサン,オクタメチルテトラシロキサン等であ
る。本発明に従って製造される生成物は高分子量油状物
及びゴムである。Cyclic organosilicon compounds included in the formula (wherein R "is a monovalent organic group which may be the same or different, such as methyl or phenyl, and m is an integer of 3 to 8). Examples of cyclic organosilicon compounds that can be included in such photopolymerizable organic materials are hexamethyltrisiloxane, octamethyltetrasiloxane, etc. The products produced in accordance with the present invention are high molecular weight oils and gums. ..
【0033】本発明の実施に際し、式(1)のアリール
ケトン含有ヨードニウム塩はアリールヨードソトシレー
トと芳香族ケトンとを約25〜125℃の範囲の温度で
反応させることによって製造することができる。特別の
場合には、この反応は溶融状態で行なうことができ、あ
るいは適当な有機溶剤を使用して反応を促進させること
ができる。使用し得る適当な芳香族ケトンはたとえばベ
ンゾフェノン,アセトフェノン,プロピオフェノン,4
−ベンゾイル安息香酸,4−ベンゾイルビフェニル,4
−ブロムベンゾフェノン,2−クロルベンゾフェノン,
3−ニトロベンゾフェノン,4,4′−ジメトキシベン
ゾフェノン,4−ヒドロキシベンゾフェノン,9−フル
オレノン,チオキサントン,アンスリキノン,ナフトキ
ノン,アクリドン,ベンジル1−ベンゾイルナフタリ
ン,1−テトラロン,キサントン,4−クロルチオキサ
ントン,4−アセチルビフェニル,α−ブロムアセトフ
ェノン等である。In the practice of the present invention, the aryl ketone-containing iodonium salt of formula (1) can be prepared by reacting an aryl iodosotosylate with an aromatic ketone at a temperature in the range of about 25 to 125 ° C. In special cases, the reaction can be carried out in the molten state or suitable organic solvents can be used to accelerate the reaction. Suitable aromatic ketones which can be used are, for example, benzophenone, acetophenone, propiophenone, 4
-Benzoylbenzoic acid, 4-benzoylbiphenyl, 4
-Bromobenzophenone, 2-chlorobenzophenone,
3-nitrobenzophenone, 4,4'-dimethoxybenzophenone, 4-hydroxybenzophenone, 9-fluorenone, thioxanthone, anthriquinone, naphthoquinone, acridone, benzyl 1-benzoylnaphthalene, 1-tetralone, xanthone, 4-chlorothioxanthone, 4-acetyl Examples include biphenyl and α-bromoacetophenone.
【0034】特別の場合には、反応の促進のために不活
性有機溶剤を使用することができる。使用し得るかゝる
不活性有機溶剤の例はクロロホルム,塩化メチレン,酢
酸,ニトロメタン,アセトニトリル,四塩化炭素等を包
含する。芳香族ケトン含有アリールヨードニウムトシレ
ートは前記定義したX- に包含される適当な陰イオンを
与える対イオンの金属塩又はメタロイド塩又は水素置換
源を用いて前述したごとき複分解反応によって式(1)
の芳香族ケトン含有アリールヨードニウム塩に転化させ
ることができる。複分解反応に使用し得る適当な金属塩
又はメタロイド塩はたとえばCrivelloの米国特
許第4,173,551号明細書に示されている。これ
らの金属塩又はメタロイド塩の例はSb,Fe,Sn,
Bi,Al,Ga,In,Ti,Zr,Sc,V,C
r,Mn,Coのような遷移金属,ランタニド類、たと
えばCe,Pr,Nd等,アクチニド類,たとえばT
h,Pa,U,Np等のごとき稀土類元素及びB,P,
As等のごときメタロイドを包含する。アリールケトン
含有ヨードニウム塩の回収は濾過,遠心分離等のごとき
技術を用いる標準的方法によって達成し得る。In special cases, inert organic solvents can be used to accelerate the reaction. Examples of such inert organic solvents that can be used include chloroform, methylene chloride, acetic acid, nitromethane, acetonitrile, carbon tetrachloride and the like. Aromatic ketones containing aryl iodonium tosylate defined the X - Metal salts of a counterion giving suitable anions encompassed or metalloid salt or hydrogen substituted sources formula by metathesis reaction such described above with reference to (1)
Can be converted to an aromatic iodonium salt containing an aromatic ketone. Suitable metal or metalloid salts that can be used in the metathesis reaction are shown, for example, in Crivello, US Pat. No. 4,173,551. Examples of these metal salts or metalloid salts are Sb, Fe, Sn,
Bi, Al, Ga, In, Ti, Zr, Sc, V, C
transition metals such as r, Mn and Co, lanthanides such as Ce, Pr, Nd, actinides such as T
rare earth elements such as h, Pa, U, Np and B, P,
Includes metalloids such as As. Recovery of the aryl ketone containing iodonium salt may be accomplished by standard methods using techniques such as filtration, centrifugation and the like.
【0035】本発明の光重合性組成物は光重合性有機物
質と、光重合性有機物質の重量に基づいて0.1〜15
重量%であり得る有効量のアリールケトン含有ヨードニ
ウム塩とを混合することによって製造し得る。アリール
ケトン含有ヨードニウム塩は0.5重量%〜約5重量%
の量で使用することが好ましい。本発明の光重合性組成
物はシリカ,タルク,クレー,ガラス繊維,増量剤,水
和アルミナ,炭素繊維,加工助剤等のごとき不活性成分
を光重合性有機物質100重量部当り充填剤約500重
量部までの量で含有し得る。光重合性組成物は金属,ゴ
ム,プラスチック,フィルム,成形部材,紙,木材,ガ
ラス,布,コンクリート,セラミック等のごとき基体に
施すことができる。The photopolymerizable composition of the present invention comprises a photopolymerizable organic substance and 0.1 to 15 based on the weight of the photopolymerizable organic substance.
It can be prepared by mixing with an effective amount of an aryl ketone-containing iodonium salt, which can be wt%. The aryl ketone-containing iodonium salt is 0.5% by weight to about 5% by weight.
It is preferred to use in an amount of The photopolymerizable composition of the present invention contains inactive ingredients such as silica, talc, clay, glass fibers, extenders, hydrated alumina, carbon fibers and processing aids in an amount of about 100 parts by weight of the filler per 100 parts by weight of the photopolymerizable organic substance. It can be contained in an amount of up to 500 parts by weight. The photopolymerizable composition can be applied to a substrate such as metal, rubber, plastic, film, molded member, paper, wood, glass, cloth, concrete and ceramic.
【0036】本発明の光重合性組成物を使用し得る用途
の例としては保護用,装飾用及び絶縁用被覆,ピッチン
グ用コンパウンド,印刷用インク,シーラント,接着
剤,成形用コンパウンド,電線絶縁材,織物被覆,積層
体,含浸テープ,ワニス電子部品用カプセル封じ材等を
包含する。つぎに本発明を当業者によりよく理解させる
ために本発明の実施例を示すが、これらは単に本発明を
例証するためのものであって限定するものではない。実
施例中、すべての部は重量部である。実施例1 フェニルヨードソトシレート0.025モル及びアリー
ルケトン0.05モルの混合物を130〜135℃で1
時間加熱攪拌した。反応中に混合物は均質になりついで
それを冷却してエチルエーテル100ml中に注入した。
油状物が生成するのでそれをジエチルエーテルで洗滌
し、ついでメチルエチルケトン50ml中に溶解した。得
られる溶液にヘキサフルオロ砒酸カリウム5gを添加し
た。直ちにp−トルエンスルホン酸カリウムの沈殿が生
ずるのでこれを濾過により分離した。ついで溶剤を回転
蒸発器上で除去しそして得られる固体をエタノールから
再結晶化した。ついで得られる生成物のUV吸収値(λ
max )をベックマンUV分光光度計を用いて測定した。
つぎの結果が得られた。Examples of applications in which the photopolymerizable composition of the present invention can be used are protective, decorative and insulating coatings, pitting compounds, printing inks, sealants, adhesives, molding compounds, wire insulation materials. , Woven fabric coatings, laminates, impregnated tapes, varnishes, encapsulants for electronic components, etc. Examples of the present invention will now be given for better understanding of the present invention by those skilled in the art, but these are merely to illustrate the present invention and not to limit the present invention. In the examples, all parts are parts by weight. Example 1 A mixture of 0.025 mol of phenyliodo sotosylate and 0.05 mol of aryl ketone at 130-135 ° C.
The mixture was heated and stirred for an hour. During the reaction the mixture became homogeneous, then it was cooled and poured into 100 ml of ethyl ether.
An oil formed which was washed with diethyl ether and then dissolved in 50 ml methyl ethyl ketone. 5 g of potassium hexafluoroarsenate was added to the resulting solution. Immediately, a precipitate of potassium p-toluenesulfonate was formed, which was separated by filtration. The solvent was then removed on a rotary evaporator and the solid obtained was recrystallized from ethanol. Then, the UV absorption value (λ
max ) was measured using a Beckman UV spectrophotometer.
The following results were obtained.
【0037】[0037]
【化21】 [Chemical 21]
【0038】実施例2 3−ベンゾイルフェニルフェニルヨードニウムヘキサフ
ルオロアルセネートのリモネンジオキシド中の1%溶液
をアルミニウムカップ中に注入しそしてGEH3T7中
圧水銀アーク灯から5インチの位置で5分間照射した。
この溶液はアルミニウムカップの底に70.8ミルの厚
みで硬化したことが認められた。実施例3 リモネンジオキシド中のジフェニルヨードニウムヘキサ
フルオロアルセネートの1%溶液を用いたことを除いて
実施例2と同一の方法を反復した。5分間の照射時間の
終りに、この溶液はその表面でなお硬化不完全でありか
つ表面下では未硬化であった。3−ベンゾイルフェニル
フェニルヨードニウムヘキサフルオロアルセネート及び
シェルケミカル社製エポン(Epon)812(ビスフ
ェノール−Aジグリシジルエーテル及びブチルジグリシ
ジルエーテルの混合物)の1%混合物を実施例2に述べ
たごとく2.5分間照射した。結果はつぎのとおりであ
った。 Example 2 A 1% solution of 3-benzoylphenylphenyliodonium hexafluoroarsenate in limonene dioxide was poured into an aluminum cup and irradiated from a GEH3T7 medium pressure mercury arc lamp for 5 minutes at 5 inches.
The solution was found to cure to a bottom of an aluminum cup at a thickness of 70.8 mils. Example 3 The same procedure as in Example 2 was repeated except that a 1% solution of diphenyliodonium hexafluoroarsenate in limonene dioxide was used. At the end of the 5 minute irradiation time, the solution was still incompletely cured at its surface and uncured below the surface. A 1% mixture of 3-benzoylphenylphenyliodonium hexafluoroarsenate and Shell Chemical Epon 812 (a mixture of bisphenol-A diglycidyl ether and butyl diglycidyl ether) was added as described in Example 2 at 2.5. Irradiated for minutes. The results were as follows.
【0039】[0039]
【化22】 [Chemical formula 22]
【0040】上記結果は本発明のUV硬化性組成物は光
開始剤としてジフェニルヨードニウム塩を使用した従来
技術のUV硬化性組成物よりも厚いフイルム厚に硬化し
得ることを示している。実施例4 ユニオンカーバイドケミカル社製の3,4−エポキシシ
クロヘキシルメチル−3′,4′−エポキシシクロヘキ
サンカルボキシレート(ERL4221)中の光開始剤
の1%溶液を実施例3の方法に従ってアルミニウムカッ
プ中で1分間照射した。つぎの結果が得られた。The above results show that the UV curable composition of the present invention can be cured to a higher film thickness than prior art UV curable compositions using a diphenyliodonium salt as a photoinitiator. Example 4 A 1% solution of the photoinitiator in 3,4-epoxycyclohexylmethyl-3 ', 4'-epoxycyclohexanecarboxylate (ERL4221) from Union Carbide Chemical Co. was placed in an aluminum cup according to the method of Example 3. Irradiated for 1 minute. The following results were obtained.
【0041】[0041]
【化23】 [Chemical formula 23]
【0042】本発明の芳香族ケトン含有ジフェニルヨー
ドニウム塩の代りにジフェニルヨードニウムヘキサフル
オロアルセネートの1%溶液を用いたことを除いて上記
方法を反復した。約14.3ミルのフィルム厚みをもつ
硬化フィルムが得られた。上記の結果はさらに本発明の
UV硬化性組成物は従来技術のUV硬化性組成物と比較
してより優れた深部硬化特性を発揮することを示してい
る。The above procedure was repeated except that a 1% solution of diphenyliodonium hexafluoroarsenate was used in place of the aromatic ketone-containing diphenyliodonium salt of the present invention. A cured film having a film thickness of about 14.3 mils was obtained. The above results further indicate that the UV curable compositions of the present invention exhibit superior deep cure properties as compared to prior art UV curable compositions.
【0043】上記した実施例は本発明の実施に使用し得
るきわめて多数の変形のうちの二、三についてのみ示し
たに過ぎないが、本発明は著しくより広範囲の深部UV
硬化性カチオン重合性組成物、著しくより広範囲のアリ
ールケトン含有ヨードニウム塩及びこれらの実施例に先
立つ詳細な開示中に示されるごときより広範囲の物質の
製造法に向けられるものである点を理解すべきである。Although the above examples show only a few of the very large number of variations that can be used in the practice of the present invention, the present invention is remarkably broader in deep UV.
It is to be understood that the curable cationically polymerizable compositions, the significantly broader range of arylketone-containing iodonium salts, and the broader range of methods of preparation of the materials as set forth in the detailed disclosure preceding these examples are directed. Is.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C08L 101/00 // C08F 2/50 MDN 7442−4J ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI technical display area C08L 101/00 // C08F 2/50 MDN 7442-4J
Claims (6)
換一価芳香族炭化水素基であり、R1 は核炭素原子によ
って沃素に結合されて炭素−沃素結合を形成する一価ア
リールケトン基であり、そしてX- は対イオンである)
のアリールケトン含有ヨードニウム光開始剤の有効量;
を含有してなる深部光重合性有機樹脂組成物。1. A following components: (A) a photopolymerizable organic material; and (B) Formula: R 1 -I + -R X - ( wherein, R C (6-13) monovalent aromatic hydrocarbon Is a hydrogen group or a halo-substituted monovalent aromatic hydrocarbon group, R 1 is a monovalent arylketone group which is bonded to iodine by a nuclear carbon atom to form a carbon-iodine bond, and X − is a counterion. )
An effective amount of an aryl ketone-containing iodonium photoinitiator;
A deep photopolymerizable organic resin composition containing:
である請求項1記載の深部UV硬化性組成物。2. The deep UV curable composition according to claim 1, wherein the cationically polymerizable organic substance is an epoxy resin.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/497,357 US4529490A (en) | 1983-05-23 | 1983-05-23 | Photopolymerizable organic compositions and diaryliodonium ketone salts used therein |
US497357 | 1983-05-23 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59102781A Division JPH0688927B2 (en) | 1983-05-23 | 1984-05-23 | Diaryl iodonium salt for use in photopolymerizable organic composition and method for producing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05194784A true JPH05194784A (en) | 1993-08-03 |
Family
ID=23976535
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59102781A Expired - Lifetime JPH0688927B2 (en) | 1983-05-23 | 1984-05-23 | Diaryl iodonium salt for use in photopolymerizable organic composition and method for producing the same |
JP4289796A Pending JPH05194784A (en) | 1983-05-23 | 1992-10-28 | Photopolymerizable organic composition |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59102781A Expired - Lifetime JPH0688927B2 (en) | 1983-05-23 | 1984-05-23 | Diaryl iodonium salt for use in photopolymerizable organic composition and method for producing the same |
Country Status (6)
Country | Link |
---|---|
US (1) | US4529490A (en) |
JP (2) | JPH0688927B2 (en) |
CA (1) | CA1231096A (en) |
DE (1) | DE3418388C2 (en) |
FR (1) | FR2546516B1 (en) |
GB (1) | GB2140410B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999048945A1 (en) * | 1998-03-20 | 1999-09-30 | Nippon Soda Co., Ltd. | Photocurable composition containing iodonium salt compound |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4661429A (en) * | 1986-04-28 | 1987-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
US4840977A (en) * | 1987-10-01 | 1989-06-20 | General Electric Company | Polymeric iodonium salts, method for making, and heat curable compositions |
US5108859A (en) * | 1990-04-16 | 1992-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
EP0544842A4 (en) * | 1991-01-04 | 1993-07-21 | James V. Crivello | Electron beam curable epoxy compositions |
US5260349A (en) * | 1991-01-04 | 1993-11-09 | Polyset Corporation | Electron beam curable epoxy compositions |
US5206116A (en) * | 1991-03-04 | 1993-04-27 | Shipley Company Inc. | Light-sensitive composition for use as a soldermask and process |
US5242042A (en) * | 1992-12-21 | 1993-09-07 | Inventio Ag | Escalator having lateral safety boundaries |
US5502083A (en) * | 1993-06-18 | 1996-03-26 | Nippon Kayaku Kabushiki Kaisha | Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product |
US5488147A (en) * | 1994-07-21 | 1996-01-30 | Minnesota Mining And Manufacturing Company | Diaryliodonium fluoroalkyl sulfonate salts and a method of making |
AU3208097A (en) * | 1996-05-20 | 1997-12-09 | First Chemical Corporation | Photoactive compounds for use with narrow wavelength band ultraviolet (uv) curing systems |
US6479706B1 (en) | 1997-02-04 | 2002-11-12 | Albemarle Corporation | Aminobenzophenones and photopolymerizable compositions including the same |
JP2001106648A (en) * | 1999-08-02 | 2001-04-17 | Nippon Soda Co Ltd | Photo-setting composition comprising iodonium salt compound |
DE60011778T2 (en) | 1999-08-02 | 2004-11-11 | Nippon Soda Co. Ltd. | PHOTO-NETWORKABLE COMPOSITIONS WITH AN IODONIUM SALT COMPOUND |
EP1481973B1 (en) | 2002-03-04 | 2008-12-31 | Wako Pure Chemical Industries, Ltd. | Heterocycle-bearing onium salts |
JP4732102B2 (en) * | 2005-09-29 | 2011-07-27 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed matter, lithographic printing plate preparation method |
US8343608B2 (en) | 2010-08-31 | 2013-01-01 | General Electric Company | Use of appended dyes in optical data storage media |
JP6948828B2 (en) * | 2017-05-12 | 2021-10-13 | 東洋合成工業株式会社 | Iodonium salt compounds, photoacid generators and compositions containing them, and methods for manufacturing devices. |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3692560A (en) * | 1969-09-18 | 1972-09-19 | Bayer Ag | Acid hardening resins which can be activated by ultraviolet light |
US4069056A (en) * | 1974-05-02 | 1978-01-17 | General Electric Company | Photopolymerizable composition containing group Va aromatic onium salts |
US4136102A (en) * | 1974-05-02 | 1979-01-23 | General Electric Company | Photoinitiators |
US4378277A (en) * | 1974-05-08 | 1983-03-29 | Minnesota Mining & Manufacturing Company | Photopolymerizable epoxy-containing compositions |
US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
US4148987A (en) * | 1977-05-04 | 1979-04-10 | Rohm And Haas Company | Radiation-curable monomers and polymers thereof |
GB1587536A (en) * | 1977-07-05 | 1981-04-08 | Ciba Geigy Ag | Expoxide resin-impregnated composites |
JPS5820422B2 (en) * | 1977-11-04 | 1983-04-22 | 東京応化工業株式会社 | Method for forming ultra-fine patterns |
US4401537A (en) * | 1978-12-26 | 1983-08-30 | Minnesota Mining And Manufacturing Company | Liquid crystal display and photopolymerizable sealant therefor |
AU536842B2 (en) * | 1978-12-29 | 1984-05-24 | Fujisawa Pharmaceutical Co., Ltd. | Cephalosporin antibiotics |
US4332798A (en) * | 1978-12-29 | 1982-06-01 | Fujisawa Pharmaceutical Co., Ltd. | 7-Amino-thia-diazole oxyimino derivatives of cephem and cephem compounds |
US4351708A (en) * | 1980-02-29 | 1982-09-28 | Ciba-Geigy Corporation | Photochemically or thermally polymerizable mixtures |
US4339567A (en) * | 1980-03-07 | 1982-07-13 | Ciba-Geigy Corporation | Photopolymerization by means of sulphoxonium salts |
-
1983
- 1983-05-23 US US06/497,357 patent/US4529490A/en not_active Expired - Lifetime
- 1983-12-07 GB GB08332587A patent/GB2140410B/en not_active Expired
-
1984
- 1984-05-03 FR FR848406867A patent/FR2546516B1/en not_active Expired
- 1984-05-17 DE DE3418388A patent/DE3418388C2/en not_active Expired - Fee Related
- 1984-05-18 CA CA000454687A patent/CA1231096A/en not_active Expired
- 1984-05-23 JP JP59102781A patent/JPH0688927B2/en not_active Expired - Lifetime
-
1992
- 1992-10-28 JP JP4289796A patent/JPH05194784A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999048945A1 (en) * | 1998-03-20 | 1999-09-30 | Nippon Soda Co., Ltd. | Photocurable composition containing iodonium salt compound |
Also Published As
Publication number | Publication date |
---|---|
US4529490A (en) | 1985-07-16 |
CA1231096A (en) | 1988-01-05 |
DE3418388A1 (en) | 1984-11-29 |
GB8332587D0 (en) | 1984-01-11 |
JPH0688927B2 (en) | 1994-11-09 |
FR2546516A1 (en) | 1984-11-30 |
FR2546516B1 (en) | 1989-03-31 |
DE3418388C2 (en) | 1993-10-07 |
GB2140410B (en) | 1986-11-26 |
GB2140410A (en) | 1984-11-28 |
JPS6047029A (en) | 1985-03-14 |
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