JPH05194784A - Photopolymerizable organic composition - Google Patents

Photopolymerizable organic composition

Info

Publication number
JPH05194784A
JPH05194784A JP4289796A JP28979692A JPH05194784A JP H05194784 A JPH05194784 A JP H05194784A JP 4289796 A JP4289796 A JP 4289796A JP 28979692 A JP28979692 A JP 28979692A JP H05194784 A JPH05194784 A JP H05194784A
Authority
JP
Japan
Prior art keywords
aryl ketone
deep
photopolymerizable organic
photopolymerizable
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4289796A
Other languages
Japanese (ja)
Inventor
James V Crivello
ジェームス・ビンセント・クリベロ
Julia L Lee
ジュリア・ラム・リー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPH05194784A publication Critical patent/JPH05194784A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/68Arsenic compounds without As—C bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE: To photo-cure a composition obtained by photopolymerizing photopolymerizable organic materials such as epoxy resins to a greater depth and thickness.
CONSTITUTION: Photopolymerizable organic resin compositions are comprised of (A) photopolymerizable organic materials and (B) photoinitiators comprising aryl ketone-containing diaryliodonium salts having the formula; R1-I+-RX- (wherein R is a 6-13C monovalent aromatic hydrocarbon group or halo substituted monovalent aromatic hydrocarbon group and R1 is a monovalent aryl ketone group which is attached to iodine by a nuclear carbon atom to form a carbon-iodine bond, and X- is a counter ion). The photoinitiators (B) having monovalent aryl ketone groups can effect deep section cure of (A) photopolymerizable organic materials and cure the materials to greater thickness, as compared to the diaryliodonium salts of the prior arts.
COPYRIGHT: (C)1993,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はアリールケトン含有ヨー
ドニウム塩、それらの合成法及び光重合性有機物質中に
おける光開始剤としてのそれらの使用に関するものであ
る。
FIELD OF THE INVENTION The present invention relates to arylketone-containing iodonium salts, a process for their synthesis and their use as photoinitiators in photopolymerizable organic materials.

【0002】[0002]

【従来の技術】本発明以前においては、Smithの米
国特許第4,378,277号明細書に示されるごと
く、ジフェニルヨードニウムヘキサフルオロアーセネー
トのようなジアリールヨードニウム塩がエポキシ樹脂の
カチオン重合用の光開始剤として使用されていた。
Prior to the present invention, diaryl iodonium salts, such as diphenyl iodonium hexafluoroarsenate, were used for the cationic polymerization of epoxy resins as disclosed in Smith, U.S. Pat. No. 4,378,277. It was used as an initiator.

【0003】[0003]

【発明が解決しようとする課題】上述のジアリールヨー
ドニウム塩は比較的短時間でエポキシ樹脂を不粘着状態
に転化せしめるのに有効であったが、硬化フイルムは屡
々ジアリールヨードニウム塩を活性化するに必要な紫外
線に対するバリヤーとして作用するので満足な厚みをも
つ硬化エポキシ樹脂生成物を取得することは往々にして
困難であった。改善された厚みの硬化皮膜はSmith
の米国特許第4,173,476号明細書に示されるご
とくある種のスルホニウム塩を使用することによって達
成されていた。したがって特別の用途においてはジアリ
ールヨードニウム塩を使用してUV重合性有機物質にお
いてより深部の硬化を達成することが望ましい。
While the above-mentioned diaryliodonium salts have been effective in converting epoxy resins to tack free states in a relatively short time, cured films are often necessary to activate diaryliodonium salts. It is often difficult to obtain a cured epoxy resin product with a satisfactory thickness, as it acts as a barrier to strong UV radiation. Hardened coating with improved thickness is Smith
This has been accomplished by using certain sulfonium salts, as shown in U.S. Pat. No. 4,173,476. It is therefore desirable to use diaryliodonium salts in special applications to achieve deeper cure in UV-polymerizable organic materials.

【0004】[0004]

【課題を解決する為の手段】本発明は式: R1 −I+ −R X- 即ち、 [RR1 I]+ - (1) (式中、RはC(6-13)一価芳香族炭化水素基又はハロ置
換一価芳香族炭化水素基であり、R1 は核炭素原子によ
って沃素に結合されている一価アリールケトン基であ
り、そしてX- は対イオンである)をもつアリールケト
ン含有ジアリールヨードニウム塩はエポキシ樹脂のごと
き広範囲の光重合性有機物質とともに深部光重合性有機
物質の製造のために使用し得るという新知見に基づくも
のである。式(1)のアリールケトン含有ジアリールヨ
ードニウム塩はジアリールヨードニウムトシレート前駆
体と適当な対イオン源、たとえばヘキサフルオロ金属塩
又はメタロイド塩との間の簡単な複分解によって製造す
ることができる。ジアリールヨードニウムトシレート塩
前駆体はアリールヨードソトシレートと芳香族ケトンと
を次式に従って直接縮合させることによって製造し得
る。すなわち、
The present invention, there is provided a means for solving] The formula: R 1 -I + -R X - i.e., [RR 1 I] + X - (1) ( wherein, R C (6-13) monovalent An aromatic hydrocarbon group or a halo-substituted monovalent aromatic hydrocarbon group, R 1 is a monovalent arylketone group linked to iodine by a nuclear carbon atom, and X is a counterion). The arylketone-containing diaryliodonium salts are based on the new finding that they can be used for the preparation of deep photopolymerizable organic materials with a wide range of photopolymerizable organic materials such as epoxy resins. The arylketone-containing diaryliodonium salt of formula (1) can be prepared by simple metathesis between a diaryliodonium tosylate precursor and a suitable counterion source such as a hexafluorometal salt or a metalloid salt. The diaryl iodonium tosylate salt precursor can be prepared by directly condensing an aryl iodosotosylate and an aromatic ketone according to the following formula. That is,

【0005】[0005]

【化5】 (式中、Tos- はトシレートであり、R及びR1 は前
記定義したとおりである。)アリールヨードソトシレー
トの直接縮合を伴うジアリールヨードニウム塩の合成は
Koser,Wettach及びSmithによってJ
ournal of Organic Chemist
ry,45,1944(1980)に報告されている。
前述したごとく、アリールケトン含有アリールヨードニ
ウムトシレートの式(1)をもつアリールケトン含有ジ
アリールヨードニウム塩への転化は次式によって示され
るごとく簡単な複分解によって達成し得る。すなわち、
[Chemical 5] (Wherein Tos is tosylate and R and R 1 are as defined above.) The synthesis of diaryl iodonium salts involving the direct condensation of aryl iodosotosylate is described by Koser, Wetach and Smith in J.
individual of Organic Chemist
ry, 45 , 1944 (1980).
As mentioned above, the conversion of arylketone-containing aryliodonium tosylate to arylketone-containing diaryliodonium salt having the formula (1) can be accomplished by simple metathesis as shown by the following formula. That is,

【0006】[0006]

【化6】 [RR1 I]+ Tos- +MX→式(1)+MTos- (式中、Mは金属又はメタロイドである。)Embedded image [RR 1 I] + Tos + MX → Formula (1) + MTos (In the formula, M is a metal or a metalloid.)

【0007】[0007]

【実施例】本発明によれば、(A)光重合性有機物質;
及び(B)式(1)のアリールケトン含有ヨードニウム
光開始剤の有効量;を含有してなる深部光重合性有機樹
脂組成物が提供される。
EXAMPLES According to the present invention, (A) a photopolymerizable organic substance;
And (B) an effective amount of the aryl ketone-containing iodonium photoinitiator of the formula (1);

【0008】式(1)のRの範囲内に包含される基はた
とえばフェニル,トリル,ナフチル,アンスリル基のよ
うなC(6-13)一価芳香族炭化水素基及び1個ないし4個
までの一価の基、たとえばC(1-8) アルコキシ,C
(1-8) アルキル,ニトロ,クロル,ヒドロキシ等の基で
置換されたC(6-13)一価芳香族炭化水素基ベンゾイル,
フェニルアシル等のごときアリールアシル基;ピリジ
ル,フルフリル等のごとき芳香族複素環式基である。
Groups within the scope of R in formula (1) include C (6-13) monovalent aromatic hydrocarbon groups such as phenyl, tolyl, naphthyl, anthryl groups and up to 1 to 4 groups. Monovalent groups such as C (1-8) alkoxy, C
(1-8) C (6-13) monovalent aromatic hydrocarbon group benzoyl substituted with a group such as alkyl, nitro, chloro and hydroxy,
An arylacyl group such as phenylacyl; an aromatic heterocyclic group such as pyridyl, furfuryl and the like.

【0009】式(1)のR1 の範囲内に包含される基は
たとえば、
Groups included within R 1 of formula (1) are, for example:

【0010】[0010]

【化7】 [Chemical 7]

【0011】[0011]

【化8】 [Chemical 8]

【0012】[0012]

【化9】 [Chemical 9]

【0013】[0013]

【化10】 [Chemical 10]

【0014】である。式(1)のX- に包含される陰イ
オンの例はBF4 - ,PF6 - ,AsF6 - ,SbF6
- ,ClO4 - ,CF3 SO3 - ,FSO3 - ,CF3
CO2 - ,AlCl4 - ,BCl4 - ,Br- ,C
- ,HSO4 - ,CH3 CO2 - ,NO 3 - ,等であ
る。
[0014] X in formula (1)-Yin Yi included in
Example of ON is BFFour -, PF6 -, AsF6 -, SbF6
-, ClOFour -, CF3SO3 -, FSO3 -, CF3
CO2 -, AlClFour -, BClFour -, Br-, C
l-, HSOFour -, CH3CO2 -, NO 3 -, Etc.
It

【0015】式(1)のアリールケトン含有ヨードニウ
ム塩の範囲内に包含される化合物の例はつぎのごときも
のである。
Examples of compounds included within the scope of arylketone-containing iodonium salts of formula (1) are as follows:

【0016】[0016]

【化11】 [Chemical 11]

【0017】[0017]

【化12】 [Chemical formula 12]

【0018】[0018]

【化13】 [Chemical 13]

【0019】[0019]

【化14】 [Chemical 14]

【0020】[0020]

【化15】 [Chemical 15]

【0021】[0021]

【化16】 [Chemical 16]

【0022】[0022]

【化17】 [Chemical 17]

【0023】[0023]

【化18】 [Chemical 18]

【0024】本発明の光重合性組成物の記載中に使用さ
れる用語“エポキシ樹脂”は1個又は複数個のエポキシ
官能基を含む任意の単量体状、二量体状又はオリゴマー
状あるいは重合体状エポキシ物質を包含するものであ
る。たとえば、ビスフェノール−A(4,4′−イソプ
ロピリデンジフェノール)とエピクロルヒドリンとの反
応から生ずるエポキシ樹脂又は低分子量フェノールホル
ムアルデヒド樹脂(ノボラック樹脂)とエピクロルヒド
リンとの反応によって得られるエポキシ樹脂は単独で又
は反応性稀釈剤としてのエポキシ含有化合物と組合わせ
て使用し得る。フェニルグリシジルエーテル,4−ビニ
ルシクロヘキセンジオキシド,リモネンジオキシド,
1,2−シクロヘキセンオキシド,グリシジルアクリレ
ート,グリシジルメタクリレート,スチレンオキシド,
アリルグリシジルエーテル等のごとき稀釈剤は粘度調整
剤として添加し得る。
The term "epoxy resin" as used in the description of the photopolymerizable compositions of the present invention refers to any monomeric, dimeric or oligomeric form containing one or more epoxy functional groups. It includes polymeric epoxy materials. For example, the epoxy resin resulting from the reaction of bisphenol-A (4,4'-isopropylidenediphenol) with epichlorohydrin or the epoxy resin obtained by the reaction of low molecular weight phenol formaldehyde resin (novolak resin) with epichlorohydrin may be used alone or in reaction. It can be used in combination with an epoxy-containing compound as a functional diluent. Phenylglycidyl ether, 4-vinylcyclohexene dioxide, limonene dioxide,
1,2-cyclohexene oxide, glycidyl acrylate, glycidyl methacrylate, styrene oxide,
Diluents such as allyl glycidyl ether may be added as viscosity modifiers.

【0025】さらに、これらの化合物の範囲は末端又は
懸垂エポキシ基を含む重合体状物質を包含するように拡
張し得る。これらの化合物の例は共単量体の一つとして
グリシジルアクリレート又はメタクリレートを含むビニ
ル共重合体である。上述の触媒を用いて硬化し得るエポ
キシ含有重合体の他の群はエポキシシロキサン樹脂,エ
ポキシ−ポリウレタン及びエポキシ−ポリエステルであ
る。かゝる重合体は通常それらの連鎖の末端にエポキシ
官能基を有する。エポキシ−シロキサン樹脂及びその製
造法は特にE.P.Pluedemann及びG.Fa
ngerによってJ.Am.Chem.Soc.,
,632−5(1959)に記載されている。この文
献に示されるごとく、エポキシ樹脂はさらに種々の標準
的方法で、たとえばアミン,カルボン酸,チオール,フ
ェノール,アルコール等との反応によって変性すること
ができる(たとえば米国特許第2,935,488号、
第3,235,620号、第3,369,055号、第
3,379,653号、第3,398,211号、第
3,403,199号、第3,563,840号、第
3,567,797号、第3,677,995号明細書
参照)。エポキシ樹脂とともに使用し得る別の共反応剤
はInterscience Publishers,
1967年発行、Encyclopedia of P
olymer Science and Techno
logy,第6巻、第209〜271頁、特に238頁
に示されるヒドロキシ末端ポリエステルのごときヒドロ
キシ末端柔軟剤である。
Further, the range of these compounds may be extended to include polymeric materials containing terminal or pendant epoxy groups. An example of these compounds is a vinyl copolymer containing glycidyl acrylate or methacrylate as one of the comonomers. Another group of epoxy-containing polymers that can be cured with the above catalysts are epoxy siloxane resins, epoxy-polyurethanes and epoxy-polyesters. Such polymers usually have epoxy functional groups at the ends of their chains. Epoxy-siloxane resins and methods for making them are especially described by E.I. P. Pludemann and G.W. Fa
by Nger. Am. Chem. Soc. , 8
0, is described in 632-5 (1959). As shown therein, epoxy resins can be further modified in various standard ways, such as by reaction with amines, carboxylic acids, thiols, phenols, alcohols, etc. (eg US Pat. No. 2,935,488). ,
No. 3,235,620, No. 3,369,055, No. 3,379,653, No. 3,398,211, No. 3,403,199, No. 3,563,840, No. 3 , 567,797, 3,677,995). Another co-reactant that may be used with the epoxy resin is Interscience Publishers,
Published in 1967, Encyclopedia of P
polymer Science and Techno
and hydroxy-terminated softeners such as the hydroxy-terminated polyesters shown in Loggy, Volume 6, pages 209-271, especially 238.

【0026】本発明の実施に使用し得る光重合性有機物
質はホルムアルデヒドの熱硬化性有機縮合樹脂、たとえ
ば尿素系樹脂,フェノール−ホルムアルデヒド系樹脂を
包含する。さらに、メラミンチオ尿素樹脂,メラミン,
又は尿素アルデヒド樹脂,クレゾール−ホルムアルデヒ
ド樹脂及びポリエステル,アルキッド及びポリスルフィ
ドのごときその他のカルボキシ,ヒドロキシ,アミノ及
びメルカプト含有樹脂との組合せを使用し得る。
Photopolymerizable organic materials that can be used in the practice of the present invention include thermosetting organic condensation resins for formaldehyde, such as urea resins and phenol-formaldehyde resins. In addition, melamine thiourea resin, melamine,
Alternatively, a combination of urea aldehyde resins, cresol-formaldehyde resins and polyesters, alkyds and other carboxy, hydroxy, amino and mercapto containing resins such as polysulfides may be used.

【0027】本発明の重合性組成物の製造に使用し得る
ビニル有機プレポリマーの若干の例はCH2 =CH−O
−(CH2 −CH2 O) n′−CH=CH2 (式中、
n′は約1000まで又はそれ以上の値をもつ正の整数
である);多官能性ビニルエーテル,たとえば1,2,
3−プロパントリビニルエーテル,トリメチルプロパン
トリビニルエーテル;式:
Some examples of vinyl organic prepolymers that can be used to make the polymerizable compositions of the present invention are CH 2 ═CH—O.
- (CH 2 -CH 2 O) n '-CH = CH 2 ( in the formula,
n'is a positive integer with a value of up to about 1000 or more); polyfunctional vinyl ethers such as 1,2,
3-propanetrivinylether, trimethylpropanetrivinylether; Formula:

【0028】[0028]

【化19】 [Chemical 19]

【0029】をもつプレポリマー;及び25℃で200
〜10,000センチポイズの粘度をもつ低分子量ポリ
ブタジエン等である。かゝる組成物の硬化によって得ら
れる生成物は印刷用インクとして及び熱硬化性樹脂につ
いて典型的なその他の用途に使用することができる。本
発明の重合性組成物の製造に使用し得るさらに別の種類
の光重合性有機物質は熱可塑性プラスチックスに転化し
得る環式エーテルである。かゝる環式エーテルに包含さ
れるものとしては、たとえばSchroeterの米国
特許第3,673,216号明細書に示されるごとき
3,3−ビス−クロルメチルオキセタン,アルコキシオ
キセタン類のようなオキセタン類;テトラヒドロフラン
のようなオキソラン類,オキセパン類,酸素含有スピロ
化合物,トリオキサン,ジオキソラン等があげられる。
A prepolymer having; and 200 at 25 ° C.
Low molecular weight polybutadiene having a viscosity of ˜10,000 centipoise. The products obtained by curing such compositions can be used as printing inks and in other applications typical of thermosetting resins. Yet another type of photopolymerizable organic material that can be used to make the polymerizable compositions of the present invention are cyclic ethers that can be converted into thermoplastics. Included in such cyclic ethers are oxetanes such as 3,3-bis-chloromethyl oxetane, alkoxy oxetanes such as those shown in Schroeter, U.S. Pat. No. 3,673,216. Oxolanes such as tetrahydrofuran, oxepanes, oxygen-containing spiro compounds, trioxane, dioxolane and the like.

【0030】環式エーテルに加えて、β−ラクトン類、
たとえばプロピオラクトンのような環式エステル類;
1,3,3−トリメチルアゼチジンのような環式アミン
類及び式:
In addition to cyclic ethers, β-lactones,
Cyclic esters such as propiolactone;
Cyclic amines and formulas such as 1,3,3-trimethylazetidine:

【0031】[0031]

【化20】 [Chemical 20]

【0032】(式中、R″はメチル又はフェニルのごと
き同一でも異なってもよい一価有機基でありそしてmは
3〜8の整数である)に包含される環式オルガノシリコ
ン化合物もまたかゝる光重合性有機物質に包含され得
る。環式オルガノシリコン化合物の例はヘキサメチルト
リシロキサン,オクタメチルテトラシロキサン等であ
る。本発明に従って製造される生成物は高分子量油状物
及びゴムである。
Cyclic organosilicon compounds included in the formula (wherein R "is a monovalent organic group which may be the same or different, such as methyl or phenyl, and m is an integer of 3 to 8). Examples of cyclic organosilicon compounds that can be included in such photopolymerizable organic materials are hexamethyltrisiloxane, octamethyltetrasiloxane, etc. The products produced in accordance with the present invention are high molecular weight oils and gums. ..

【0033】本発明の実施に際し、式(1)のアリール
ケトン含有ヨードニウム塩はアリールヨードソトシレー
トと芳香族ケトンとを約25〜125℃の範囲の温度で
反応させることによって製造することができる。特別の
場合には、この反応は溶融状態で行なうことができ、あ
るいは適当な有機溶剤を使用して反応を促進させること
ができる。使用し得る適当な芳香族ケトンはたとえばベ
ンゾフェノン,アセトフェノン,プロピオフェノン,4
−ベンゾイル安息香酸,4−ベンゾイルビフェニル,4
−ブロムベンゾフェノン,2−クロルベンゾフェノン,
3−ニトロベンゾフェノン,4,4′−ジメトキシベン
ゾフェノン,4−ヒドロキシベンゾフェノン,9−フル
オレノン,チオキサントン,アンスリキノン,ナフトキ
ノン,アクリドン,ベンジル1−ベンゾイルナフタリ
ン,1−テトラロン,キサントン,4−クロルチオキサ
ントン,4−アセチルビフェニル,α−ブロムアセトフ
ェノン等である。
In the practice of the present invention, the aryl ketone-containing iodonium salt of formula (1) can be prepared by reacting an aryl iodosotosylate with an aromatic ketone at a temperature in the range of about 25 to 125 ° C. In special cases, the reaction can be carried out in the molten state or suitable organic solvents can be used to accelerate the reaction. Suitable aromatic ketones which can be used are, for example, benzophenone, acetophenone, propiophenone, 4
-Benzoylbenzoic acid, 4-benzoylbiphenyl, 4
-Bromobenzophenone, 2-chlorobenzophenone,
3-nitrobenzophenone, 4,4'-dimethoxybenzophenone, 4-hydroxybenzophenone, 9-fluorenone, thioxanthone, anthriquinone, naphthoquinone, acridone, benzyl 1-benzoylnaphthalene, 1-tetralone, xanthone, 4-chlorothioxanthone, 4-acetyl Examples include biphenyl and α-bromoacetophenone.

【0034】特別の場合には、反応の促進のために不活
性有機溶剤を使用することができる。使用し得るかゝる
不活性有機溶剤の例はクロロホルム,塩化メチレン,酢
酸,ニトロメタン,アセトニトリル,四塩化炭素等を包
含する。芳香族ケトン含有アリールヨードニウムトシレ
ートは前記定義したX- に包含される適当な陰イオンを
与える対イオンの金属塩又はメタロイド塩又は水素置換
源を用いて前述したごとき複分解反応によって式(1)
の芳香族ケトン含有アリールヨードニウム塩に転化させ
ることができる。複分解反応に使用し得る適当な金属塩
又はメタロイド塩はたとえばCrivelloの米国特
許第4,173,551号明細書に示されている。これ
らの金属塩又はメタロイド塩の例はSb,Fe,Sn,
Bi,Al,Ga,In,Ti,Zr,Sc,V,C
r,Mn,Coのような遷移金属,ランタニド類、たと
えばCe,Pr,Nd等,アクチニド類,たとえばT
h,Pa,U,Np等のごとき稀土類元素及びB,P,
As等のごときメタロイドを包含する。アリールケトン
含有ヨードニウム塩の回収は濾過,遠心分離等のごとき
技術を用いる標準的方法によって達成し得る。
In special cases, inert organic solvents can be used to accelerate the reaction. Examples of such inert organic solvents that can be used include chloroform, methylene chloride, acetic acid, nitromethane, acetonitrile, carbon tetrachloride and the like. Aromatic ketones containing aryl iodonium tosylate defined the X - Metal salts of a counterion giving suitable anions encompassed or metalloid salt or hydrogen substituted sources formula by metathesis reaction such described above with reference to (1)
Can be converted to an aromatic iodonium salt containing an aromatic ketone. Suitable metal or metalloid salts that can be used in the metathesis reaction are shown, for example, in Crivello, US Pat. No. 4,173,551. Examples of these metal salts or metalloid salts are Sb, Fe, Sn,
Bi, Al, Ga, In, Ti, Zr, Sc, V, C
transition metals such as r, Mn and Co, lanthanides such as Ce, Pr, Nd, actinides such as T
rare earth elements such as h, Pa, U, Np and B, P,
Includes metalloids such as As. Recovery of the aryl ketone containing iodonium salt may be accomplished by standard methods using techniques such as filtration, centrifugation and the like.

【0035】本発明の光重合性組成物は光重合性有機物
質と、光重合性有機物質の重量に基づいて0.1〜15
重量%であり得る有効量のアリールケトン含有ヨードニ
ウム塩とを混合することによって製造し得る。アリール
ケトン含有ヨードニウム塩は0.5重量%〜約5重量%
の量で使用することが好ましい。本発明の光重合性組成
物はシリカ,タルク,クレー,ガラス繊維,増量剤,水
和アルミナ,炭素繊維,加工助剤等のごとき不活性成分
を光重合性有機物質100重量部当り充填剤約500重
量部までの量で含有し得る。光重合性組成物は金属,ゴ
ム,プラスチック,フィルム,成形部材,紙,木材,ガ
ラス,布,コンクリート,セラミック等のごとき基体に
施すことができる。
The photopolymerizable composition of the present invention comprises a photopolymerizable organic substance and 0.1 to 15 based on the weight of the photopolymerizable organic substance.
It can be prepared by mixing with an effective amount of an aryl ketone-containing iodonium salt, which can be wt%. The aryl ketone-containing iodonium salt is 0.5% by weight to about 5% by weight.
It is preferred to use in an amount of The photopolymerizable composition of the present invention contains inactive ingredients such as silica, talc, clay, glass fibers, extenders, hydrated alumina, carbon fibers and processing aids in an amount of about 100 parts by weight of the filler per 100 parts by weight of the photopolymerizable organic substance. It can be contained in an amount of up to 500 parts by weight. The photopolymerizable composition can be applied to a substrate such as metal, rubber, plastic, film, molded member, paper, wood, glass, cloth, concrete and ceramic.

【0036】本発明の光重合性組成物を使用し得る用途
の例としては保護用,装飾用及び絶縁用被覆,ピッチン
グ用コンパウンド,印刷用インク,シーラント,接着
剤,成形用コンパウンド,電線絶縁材,織物被覆,積層
体,含浸テープ,ワニス電子部品用カプセル封じ材等を
包含する。つぎに本発明を当業者によりよく理解させる
ために本発明の実施例を示すが、これらは単に本発明を
例証するためのものであって限定するものではない。実
施例中、すべての部は重量部である。実施例1 フェニルヨードソトシレート0.025モル及びアリー
ルケトン0.05モルの混合物を130〜135℃で1
時間加熱攪拌した。反応中に混合物は均質になりついで
それを冷却してエチルエーテル100ml中に注入した。
油状物が生成するのでそれをジエチルエーテルで洗滌
し、ついでメチルエチルケトン50ml中に溶解した。得
られる溶液にヘキサフルオロ砒酸カリウム5gを添加し
た。直ちにp−トルエンスルホン酸カリウムの沈殿が生
ずるのでこれを濾過により分離した。ついで溶剤を回転
蒸発器上で除去しそして得られる固体をエタノールから
再結晶化した。ついで得られる生成物のUV吸収値(λ
max )をベックマンUV分光光度計を用いて測定した。
つぎの結果が得られた。
Examples of applications in which the photopolymerizable composition of the present invention can be used are protective, decorative and insulating coatings, pitting compounds, printing inks, sealants, adhesives, molding compounds, wire insulation materials. , Woven fabric coatings, laminates, impregnated tapes, varnishes, encapsulants for electronic components, etc. Examples of the present invention will now be given for better understanding of the present invention by those skilled in the art, but these are merely to illustrate the present invention and not to limit the present invention. In the examples, all parts are parts by weight. Example 1 A mixture of 0.025 mol of phenyliodo sotosylate and 0.05 mol of aryl ketone at 130-135 ° C.
The mixture was heated and stirred for an hour. During the reaction the mixture became homogeneous, then it was cooled and poured into 100 ml of ethyl ether.
An oil formed which was washed with diethyl ether and then dissolved in 50 ml methyl ethyl ketone. 5 g of potassium hexafluoroarsenate was added to the resulting solution. Immediately, a precipitate of potassium p-toluenesulfonate was formed, which was separated by filtration. The solvent was then removed on a rotary evaporator and the solid obtained was recrystallized from ethanol. Then, the UV absorption value (λ
max ) was measured using a Beckman UV spectrophotometer.
The following results were obtained.

【0037】[0037]

【化21】 [Chemical 21]

【0038】実施例2 3−ベンゾイルフェニルフェニルヨードニウムヘキサフ
ルオロアルセネートのリモネンジオキシド中の1%溶液
をアルミニウムカップ中に注入しそしてGEH3T7中
圧水銀アーク灯から5インチの位置で5分間照射した。
この溶液はアルミニウムカップの底に70.8ミルの厚
みで硬化したことが認められた。実施例3 リモネンジオキシド中のジフェニルヨードニウムヘキサ
フルオロアルセネートの1%溶液を用いたことを除いて
実施例2と同一の方法を反復した。5分間の照射時間の
終りに、この溶液はその表面でなお硬化不完全でありか
つ表面下では未硬化であった。3−ベンゾイルフェニル
フェニルヨードニウムヘキサフルオロアルセネート及び
シェルケミカル社製エポン(Epon)812(ビスフ
ェノール−Aジグリシジルエーテル及びブチルジグリシ
ジルエーテルの混合物)の1%混合物を実施例2に述べ
たごとく2.5分間照射した。結果はつぎのとおりであ
った。
Example 2 A 1% solution of 3-benzoylphenylphenyliodonium hexafluoroarsenate in limonene dioxide was poured into an aluminum cup and irradiated from a GEH3T7 medium pressure mercury arc lamp for 5 minutes at 5 inches.
The solution was found to cure to a bottom of an aluminum cup at a thickness of 70.8 mils. Example 3 The same procedure as in Example 2 was repeated except that a 1% solution of diphenyliodonium hexafluoroarsenate in limonene dioxide was used. At the end of the 5 minute irradiation time, the solution was still incompletely cured at its surface and uncured below the surface. A 1% mixture of 3-benzoylphenylphenyliodonium hexafluoroarsenate and Shell Chemical Epon 812 (a mixture of bisphenol-A diglycidyl ether and butyl diglycidyl ether) was added as described in Example 2 at 2.5. Irradiated for minutes. The results were as follows.

【0039】[0039]

【化22】 [Chemical formula 22]

【0040】上記結果は本発明のUV硬化性組成物は光
開始剤としてジフェニルヨードニウム塩を使用した従来
技術のUV硬化性組成物よりも厚いフイルム厚に硬化し
得ることを示している。実施例4 ユニオンカーバイドケミカル社製の3,4−エポキシシ
クロヘキシルメチル−3′,4′−エポキシシクロヘキ
サンカルボキシレート(ERL4221)中の光開始剤
の1%溶液を実施例3の方法に従ってアルミニウムカッ
プ中で1分間照射した。つぎの結果が得られた。
The above results show that the UV curable composition of the present invention can be cured to a higher film thickness than prior art UV curable compositions using a diphenyliodonium salt as a photoinitiator. Example 4 A 1% solution of the photoinitiator in 3,4-epoxycyclohexylmethyl-3 ', 4'-epoxycyclohexanecarboxylate (ERL4221) from Union Carbide Chemical Co. was placed in an aluminum cup according to the method of Example 3. Irradiated for 1 minute. The following results were obtained.

【0041】[0041]

【化23】 [Chemical formula 23]

【0042】本発明の芳香族ケトン含有ジフェニルヨー
ドニウム塩の代りにジフェニルヨードニウムヘキサフル
オロアルセネートの1%溶液を用いたことを除いて上記
方法を反復した。約14.3ミルのフィルム厚みをもつ
硬化フィルムが得られた。上記の結果はさらに本発明の
UV硬化性組成物は従来技術のUV硬化性組成物と比較
してより優れた深部硬化特性を発揮することを示してい
る。
The above procedure was repeated except that a 1% solution of diphenyliodonium hexafluoroarsenate was used in place of the aromatic ketone-containing diphenyliodonium salt of the present invention. A cured film having a film thickness of about 14.3 mils was obtained. The above results further indicate that the UV curable compositions of the present invention exhibit superior deep cure properties as compared to prior art UV curable compositions.

【0043】上記した実施例は本発明の実施に使用し得
るきわめて多数の変形のうちの二、三についてのみ示し
たに過ぎないが、本発明は著しくより広範囲の深部UV
硬化性カチオン重合性組成物、著しくより広範囲のアリ
ールケトン含有ヨードニウム塩及びこれらの実施例に先
立つ詳細な開示中に示されるごときより広範囲の物質の
製造法に向けられるものである点を理解すべきである。
Although the above examples show only a few of the very large number of variations that can be used in the practice of the present invention, the present invention is remarkably broader in deep UV.
It is to be understood that the curable cationically polymerizable compositions, the significantly broader range of arylketone-containing iodonium salts, and the broader range of methods of preparation of the materials as set forth in the detailed disclosure preceding these examples are directed. Is.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C08L 101/00 // C08F 2/50 MDN 7442−4J ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI technical display area C08L 101/00 // C08F 2/50 MDN 7442-4J

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 つぎの成分: (A)光重合性有機物質;及び (B)式: R1 −I+ −R X- (式中、RはC(6-13)一価芳香族炭化水素基又はハロ置
換一価芳香族炭化水素基であり、R1 は核炭素原子によ
って沃素に結合されて炭素−沃素結合を形成する一価ア
リールケトン基であり、そしてX- は対イオンである)
のアリールケトン含有ヨードニウム光開始剤の有効量;
を含有してなる深部光重合性有機樹脂組成物。
1. A following components: (A) a photopolymerizable organic material; and (B) Formula: R 1 -I + -R X - ( wherein, R C (6-13) monovalent aromatic hydrocarbon Is a hydrogen group or a halo-substituted monovalent aromatic hydrocarbon group, R 1 is a monovalent arylketone group which is bonded to iodine by a nuclear carbon atom to form a carbon-iodine bond, and X is a counterion. )
An effective amount of an aryl ketone-containing iodonium photoinitiator;
A deep photopolymerizable organic resin composition containing:
【請求項2】 カチオン重合性有機物質がエポキシ樹脂
である請求項1記載の深部UV硬化性組成物。
2. The deep UV curable composition according to claim 1, wherein the cationically polymerizable organic substance is an epoxy resin.
【請求項3】 アリールケトン含有ヨードニウム塩が 【化1】 である請求項1記載の深部UV硬化性組成物。3. An aryl ketone-containing iodonium salt is represented by: The deep UV curable composition according to claim 1, wherein 【請求項4】 アリールケトン含有ヨードニウム塩が 【化2】 である請求項1記載の深部UV硬化性組成物。4. An iodonium salt containing an aryl ketone is represented by: The deep UV curable composition according to claim 1, wherein 【請求項5】 アリールケトン含有ヨードニウム塩が 【化3】 である請求項1記載の深部UV硬化性組成物。5. An iodonium salt containing an aryl ketone is represented by: The deep UV curable composition according to claim 1, wherein 【請求項6】 アリールケトン含有ヨードニウム塩が 【化4】 である請求項1記載の深部UV硬化性組成物。6. An aryl ketone-containing iodonium salt is represented by: The deep UV curable composition according to claim 1, wherein
JP4289796A 1983-05-23 1992-10-28 Photopolymerizable organic composition Pending JPH05194784A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/497,357 US4529490A (en) 1983-05-23 1983-05-23 Photopolymerizable organic compositions and diaryliodonium ketone salts used therein
US497357 1983-05-23

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP59102781A Division JPH0688927B2 (en) 1983-05-23 1984-05-23 Diaryl iodonium salt for use in photopolymerizable organic composition and method for producing the same

Publications (1)

Publication Number Publication Date
JPH05194784A true JPH05194784A (en) 1993-08-03

Family

ID=23976535

Family Applications (2)

Application Number Title Priority Date Filing Date
JP59102781A Expired - Lifetime JPH0688927B2 (en) 1983-05-23 1984-05-23 Diaryl iodonium salt for use in photopolymerizable organic composition and method for producing the same
JP4289796A Pending JPH05194784A (en) 1983-05-23 1992-10-28 Photopolymerizable organic composition

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP59102781A Expired - Lifetime JPH0688927B2 (en) 1983-05-23 1984-05-23 Diaryl iodonium salt for use in photopolymerizable organic composition and method for producing the same

Country Status (6)

Country Link
US (1) US4529490A (en)
JP (2) JPH0688927B2 (en)
CA (1) CA1231096A (en)
DE (1) DE3418388C2 (en)
FR (1) FR2546516B1 (en)
GB (1) GB2140410B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999048945A1 (en) * 1998-03-20 1999-09-30 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4661429A (en) * 1986-04-28 1987-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
US4840977A (en) * 1987-10-01 1989-06-20 General Electric Company Polymeric iodonium salts, method for making, and heat curable compositions
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
EP0544842A4 (en) * 1991-01-04 1993-07-21 James V. Crivello Electron beam curable epoxy compositions
US5260349A (en) * 1991-01-04 1993-11-09 Polyset Corporation Electron beam curable epoxy compositions
US5206116A (en) * 1991-03-04 1993-04-27 Shipley Company Inc. Light-sensitive composition for use as a soldermask and process
US5242042A (en) * 1992-12-21 1993-09-07 Inventio Ag Escalator having lateral safety boundaries
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
US5488147A (en) * 1994-07-21 1996-01-30 Minnesota Mining And Manufacturing Company Diaryliodonium fluoroalkyl sulfonate salts and a method of making
AU3208097A (en) * 1996-05-20 1997-12-09 First Chemical Corporation Photoactive compounds for use with narrow wavelength band ultraviolet (uv) curing systems
US6479706B1 (en) 1997-02-04 2002-11-12 Albemarle Corporation Aminobenzophenones and photopolymerizable compositions including the same
JP2001106648A (en) * 1999-08-02 2001-04-17 Nippon Soda Co Ltd Photo-setting composition comprising iodonium salt compound
DE60011778T2 (en) 1999-08-02 2004-11-11 Nippon Soda Co. Ltd. PHOTO-NETWORKABLE COMPOSITIONS WITH AN IODONIUM SALT COMPOUND
EP1481973B1 (en) 2002-03-04 2008-12-31 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
JP4732102B2 (en) * 2005-09-29 2011-07-27 富士フイルム株式会社 Ink composition, inkjet recording method, printed matter, lithographic printing plate preparation method
US8343608B2 (en) 2010-08-31 2013-01-01 General Electric Company Use of appended dyes in optical data storage media
JP6948828B2 (en) * 2017-05-12 2021-10-13 東洋合成工業株式会社 Iodonium salt compounds, photoacid generators and compositions containing them, and methods for manufacturing devices.

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3692560A (en) * 1969-09-18 1972-09-19 Bayer Ag Acid hardening resins which can be activated by ultraviolet light
US4069056A (en) * 1974-05-02 1978-01-17 General Electric Company Photopolymerizable composition containing group Va aromatic onium salts
US4136102A (en) * 1974-05-02 1979-01-23 General Electric Company Photoinitiators
US4378277A (en) * 1974-05-08 1983-03-29 Minnesota Mining & Manufacturing Company Photopolymerizable epoxy-containing compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4148987A (en) * 1977-05-04 1979-04-10 Rohm And Haas Company Radiation-curable monomers and polymers thereof
GB1587536A (en) * 1977-07-05 1981-04-08 Ciba Geigy Ag Expoxide resin-impregnated composites
JPS5820422B2 (en) * 1977-11-04 1983-04-22 東京応化工業株式会社 Method for forming ultra-fine patterns
US4401537A (en) * 1978-12-26 1983-08-30 Minnesota Mining And Manufacturing Company Liquid crystal display and photopolymerizable sealant therefor
AU536842B2 (en) * 1978-12-29 1984-05-24 Fujisawa Pharmaceutical Co., Ltd. Cephalosporin antibiotics
US4332798A (en) * 1978-12-29 1982-06-01 Fujisawa Pharmaceutical Co., Ltd. 7-Amino-thia-diazole oxyimino derivatives of cephem and cephem compounds
US4351708A (en) * 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999048945A1 (en) * 1998-03-20 1999-09-30 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound

Also Published As

Publication number Publication date
US4529490A (en) 1985-07-16
CA1231096A (en) 1988-01-05
DE3418388A1 (en) 1984-11-29
GB8332587D0 (en) 1984-01-11
JPH0688927B2 (en) 1994-11-09
FR2546516A1 (en) 1984-11-30
FR2546516B1 (en) 1989-03-31
DE3418388C2 (en) 1993-10-07
GB2140410B (en) 1986-11-26
GB2140410A (en) 1984-11-28
JPS6047029A (en) 1985-03-14

Similar Documents

Publication Publication Date Title
US4216288A (en) Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents
JPH05194784A (en) Photopolymerizable organic composition
US4108747A (en) Curable compositions and method for curing such compositions
US4231951A (en) Complex salt photoinitiator
US4173476A (en) Complex salt photoinitiator
US4374066A (en) Method for making triarylsulfonium salts
KR840001676B1 (en) Photocurable composition
US4086091A (en) Method of applying and curing epoxy coating compositions using dicarbonyl chelate of group IIIa-Va element and UV irradiation
US4450360A (en) Alkylaryliodonium salts and method for making
JPH04980B2 (en)
US4264703A (en) Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts
US5073643A (en) High yield synthesis of hydroxyl-containing cationic photoinitiators
EP0276716A2 (en) UV curable epoxy resin compositions with delayed cure
US4683317A (en) Photopolymerizable organic compositions and diaryliodonium salts used therein
JPS6136530B2 (en)
EP0011918B1 (en) Polymerisable compositions, derived coatings and other polymerised products
JPH0689109B2 (en) Method for promoting curing of photopolymerizable alicyclic epoxy composition
JP3716416B2 (en) Novel sulfonium salt compounds and polymerization initiators
WO2001012720A1 (en) Onium gallates cationic initiators
US4857562A (en) UV curable epoxy resin compositions with delayed cure
JPS6134753B2 (en)
GB2042550A (en) Cationically heat polymerisable materials
JPS6146002B2 (en)
JPH0515721B2 (en)
US4929305A (en) Method of bonding using UV curable epoxy resin compositions with delayed cure

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 19960206