JPH05190582A - Resin sealed semiconductor device and manufacture thereof - Google Patents

Resin sealed semiconductor device and manufacture thereof

Info

Publication number
JPH05190582A
JPH05190582A JP118292A JP118292A JPH05190582A JP H05190582 A JPH05190582 A JP H05190582A JP 118292 A JP118292 A JP 118292A JP 118292 A JP118292 A JP 118292A JP H05190582 A JPH05190582 A JP H05190582A
Authority
JP
Japan
Prior art keywords
resin
adhesive
semiconductor element
semiconductor device
adhesive member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP118292A
Other languages
Japanese (ja)
Inventor
Yutaka Okuaki
裕 奥秋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP118292A priority Critical patent/JPH05190582A/en
Publication of JPH05190582A publication Critical patent/JPH05190582A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic

Abstract

PURPOSE:To obtain a resin sealed semiconductor device where resin is prevented from oozing out and which is stable in electrical insulation by a method wherein an adhesive member impregnated with adhesive agent is formed using insulating cloth as filler and provided onto inner leads, and a semiconductor element is bonded to the inner leads through the intermediary of the adhesive member by thermocompression. CONSTITUTION:A semiconductor element is bonded to the inner leads of a lead frame to form a resin-sealed semiconductor device, where the semiconductor element 3 is fixed to the inner leads 2 through the intermediary of an adhesive member 4, and the adhesive member 4 is formed of an insulating cloth 5 impregnated with adhesive agent 6.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、樹脂封止半導体装置の
リードフレームのインナリードに半導体素子を固着する
技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for fixing a semiconductor element to an inner lead of a lead frame of a resin-sealed semiconductor device.

【0002】[0002]

【従来の技術】従来、このような分野の技術としては、
例えば特開昭64−33939号公報に示すようなもの
があった。かかる従来の半導体装置の接着剤のベース樹
脂には、各種の熱可塑あるいは熱硬化性樹脂が用いら
れ、具体的にはポリフエニレンサルフアイド、芳香族ポ
リエステル、ポリエーテルスルフオン、ポリアミドイミ
ド、ポリイミド等の熱可塑性樹脂やエポキシ樹脂、シリ
コン樹脂、ポリイミド樹脂等の熱硬化性樹脂を用いるこ
とができる。
2. Description of the Related Art Conventionally, as a technique in such a field,
For example, there is one as shown in JP-A-64-33939. Various thermoplastic or thermosetting resins are used as the base resin of the adhesive of such a conventional semiconductor device, specifically, polyphenylene sulfide, aromatic polyester, polyether sulfone, polyamide imide, polyimide. It is possible to use a thermoplastic resin such as or a thermosetting resin such as an epoxy resin, a silicon resin, or a polyimide resin.

【0003】また、ベース樹脂に配合される充填剤は、
無機充填剤としてガラス、シリカ、アルミナ、ジルコン
等の微粉末を高温火炎中で溶融させ、その表面張力で球
型化したものが用いられる。有機充填剤として懸濁重合
によって得られるポリビニルカルバゾル、フエノール樹
脂、エポキシ樹脂、ポリイミド樹脂等の球型微粉末が用
いられる。充填剤はベース樹脂に対して任意の割合で配
合することが出来るが、作業性、接着性の観点から10
〜80容量%の範囲が望ましい。ベース樹脂に対する充
填剤の混合は、ベース樹脂の性状に応じ常温あるいは加
熱溶融状態で、または有機溶剤に溶かしたワニス状態
で、機械的に攪拌混合することによって行なわれる。得
られた接着剤のリードフレームへの塗布は、接着剤の性
状に応じ常温ないしは接着剤の溶融温度以上の高温で行
なわれる。ベース樹脂として熱硬化性樹脂を用いた接着
剤はリードフレームに塗布する際、高温で行なうと樹脂
の硬化反応が進行し接着剤としての働きを失ってしまう
ため、それより、低温で行なうことが必要である。
Further, the filler compounded in the base resin is
As the inorganic filler, fine powder of glass, silica, alumina, zircon or the like is melted in a high-temperature flame and spherically shaped by its surface tension. As the organic filler, spherical fine powder such as polyvinyl carbazole obtained by suspension polymerization, phenol resin, epoxy resin and polyimide resin is used. The filler can be blended in any ratio to the base resin, but from the viewpoint of workability and adhesiveness, it is 10
The range of ˜80% by volume is desirable. The filler is mixed with the base resin by mechanically stirring and mixing at room temperature or in a heat-melted state or in a varnish state dissolved in an organic solvent, depending on the properties of the base resin. Application of the obtained adhesive to the lead frame is carried out at room temperature or at a temperature higher than the melting temperature of the adhesive, depending on the properties of the adhesive. When an adhesive using a thermosetting resin as a base resin is applied to a lead frame at a high temperature, the curing reaction of the resin proceeds and the adhesive loses its function. is necessary.

【0004】このようにして、リードフレームに接着剤
を塗布した後、再度リードフレームを接着剤の溶融温度
以上に加熱し、すばやく半導体素子を所定の位置に固着
し、熱可塑系接着剤を用いた場合は、そのまま冷却し、
また、熱硬化系接着剤を用いた場合は樹脂の硬化反応が
完了した後冷却することによって、半導体素子をリード
フレームに接着することができる。
After the lead frame is coated with the adhesive in this manner, the lead frame is heated again to a temperature higher than the melting temperature of the adhesive to quickly fix the semiconductor element at a predetermined position, and the thermoplastic adhesive is used. If it is, cool it down,
When a thermosetting adhesive is used, the semiconductor element can be bonded to the lead frame by cooling after the curing reaction of the resin is completed.

【0005】接着剤を予め半導体素子の裏面に塗ってお
き、これをインナリードに接着することも考えられる
が、封止樹脂と接着剤間の接着性を封止樹脂と半導体素
子間の接着性と比較すると、封止樹脂と接着剤間の接着
性の方がかなり劣り、このような方法を用いた場合は、
従来のように絶縁フィルムやシートを用いた場合と同様
にインナリード間に隙間が発生し易く、諸特性が良好な
封止品を得ることが難しい。
It is conceivable to apply an adhesive agent to the back surface of the semiconductor element in advance and adhere it to the inner leads. However, the adhesiveness between the encapsulating resin and the adhesive agent is the adhesive property between the encapsulating resin and the semiconductor element. Compared with, the adhesiveness between the sealing resin and the adhesive is considerably inferior, and when such a method is used,
As in the conventional case where an insulating film or sheet is used, a gap is likely to occur between the inner leads, and it is difficult to obtain a sealed product having various characteristics.

【0006】[0006]

【発明が解決しようとする課題】このように、上記した
従来技術では、充填剤を配合した熱可塑性または熱硬化
性樹脂接着剤によって、半導体素子をリードフレームの
インナリードと接着するようにしたので、接着剤の樹脂
分がインナリードの裏面等に滲み出しまい、インナリー
ド裏面が不安定になり、ワイヤボンディング工程でクラ
ンプする時に接合が不安定になるという問題点があっ
た。
As described above, in the above-mentioned conventional technique, the semiconductor element is bonded to the inner lead of the lead frame by the thermoplastic or thermosetting resin adhesive containing the filler. However, there is a problem that the resin component of the adhesive oozes out to the back surface of the inner lead and the like, the back surface of the inner lead becomes unstable, and the bonding becomes unstable when clamping in the wire bonding process.

【0007】また、粒形の充填剤を配合するようにした
ので、半導体素子の固着時に微小移動させる時に、イン
ナリードの幅は極めて狭いので、粒形の充填剤がインナ
リード主表面からずれて、インナリード上に存在しない
場合があり、一定の間隔が保持されず、電気的絶縁性に
問題点があった。本発明は、上記問題点を除去し、絶縁
性クロスを充填材として接着剤を含浸させた接着部材を
形成し、インナリード上に配置し、半導体素子を加熱押
圧して固着するようにしたので、樹脂の滲み出しが低減
化されるとともに、電気的絶縁性が安定化された樹脂封
止半導体装置及びその製造方法を提供することを目的と
する。
Further, since the granular filler is mixed, the width of the inner lead is extremely narrow when the semiconductor element is moved minutely when the semiconductor element is fixed. Therefore, the granular filler is displaced from the main surface of the inner lead. In some cases, they did not exist on the inner leads, so that a constant interval was not maintained, and there was a problem in electrical insulation. The present invention eliminates the above-mentioned problems, forms an adhesive member impregnated with an adhesive using an insulating cloth as a filler, and arranges the adhesive member on the inner lead, so that the semiconductor element is fixed by heating and pressing. It is an object of the present invention to provide a resin-encapsulated semiconductor device in which resin bleeding is reduced and electrical insulation is stabilized, and a method for manufacturing the same.

【0008】[0008]

【課題を解決するための手段】本発明は、上記目的を達
成するために、リードフレームのインナリードに半導体
素子を固着してなる樹脂封止半導体装置において、前記
半導体素子を前記インナリードに固着する接着部材であ
って、該接着部材は、被含浸部材と、該被含浸部材に含
浸される接着剤とを設けるようにしたものである。
To achieve the above object, the present invention provides a resin-sealed semiconductor device in which a semiconductor element is fixed to an inner lead of a lead frame, the semiconductor element being fixed to the inner lead. The adhesive member is provided with an impregnated member and an adhesive with which the impregnated member is impregnated.

【0009】また、リードフレームのインナリードに半
導体素子を固着してなる樹脂封止半導体装置の製造方法
において、前記半導体素子を前記リードフレームに固着
するにあたり、インナリードの主表面に接着部材を配置
し、加熱ガスにて軟化または溶融させ、前記半導体素子
を押圧し、固着させるようにしたものである。
In the method of manufacturing a resin-sealed semiconductor device in which a semiconductor element is fixed to the inner lead of the lead frame, an adhesive member is arranged on the main surface of the inner lead when fixing the semiconductor element to the lead frame. Then, the semiconductor element is pressed or fixed by softening or melting with heating gas.

【0010】[0010]

【作用】本発明によれば、アイランドを除去したリード
フレームに半導体素子を固着する樹脂封止半導体装置に
おいて、インナリード内方端主面へ絶縁性クロスに接着
剤(接着樹脂)を含浸させた接着部材を載置し、半導体
素子を押圧固着し、接着樹脂を加熱溶融させて、前記イ
ンナリード内方端主表面に半導体素子を固着する。
According to the present invention, in a resin-sealed semiconductor device in which a semiconductor element is fixed to a lead frame from which islands are removed, an insulating cloth is impregnated with an adhesive (adhesive resin) on the inner surface of the inner lead inner end. An adhesive member is placed, the semiconductor element is pressed and fixed, the adhesive resin is heated and melted, and the semiconductor element is fixed to the inner surface of the inner lead inner end.

【0011】したがって、従来のように、半導体素子の
固着にあたり、接着剤がインナリード下側に軟化又は液
状化している状態で半導体素子を押圧工程によって、接
着剤がインナリード下側に流れ出して、突起部を形成す
ることを防止することができる。
Therefore, as in the conventional case, when the semiconductor element is fixed, the adhesive flows out to the lower side of the inner lead by the pressing step of the semiconductor element while the adhesive is softened or liquefied to the lower side of the inner lead. It is possible to prevent the formation of the protrusion.

【0012】[0012]

【実施例】以下、本発明の実施例について図を用いて説
明する。図1は本発明の実施例を示す半導体素子のリー
ドフレームへの実装状態を示す要部断面図(図3のA−
A断面図)、図2は本発明の実施例を示す樹脂封止半導
体装置の断面図、図3は本発明の実施例を示す樹脂封止
半導体装置の平面図、図4はその樹脂封止半導体装置の
絶縁性クロスを示す図、図5はその絶縁性クロスに接着
剤が含浸された接着部材の断面図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a main portion showing a mounting state of a semiconductor element on a lead frame showing an embodiment of the present invention (A- in FIG. 3).
2 is a sectional view of a resin-encapsulated semiconductor device showing an embodiment of the present invention, FIG. 3 is a plan view of a resin-encapsulated semiconductor device showing an embodiment of the present invention, and FIG. FIG. 5 is a view showing an insulating cloth of a semiconductor device, and FIG. 5 is a sectional view of an adhesive member in which the insulating cloth is impregnated with an adhesive.

【0013】なお、ここで、パッケージの外形寸法を、
規格サイズに維持し、大型の半導体素子を搭載する技術
として、一般的に樹脂封止半導体装置に用いられるリー
ドフレームのアイランドを削除した実装技術が用いられ
る。これらの図に示すように、1はリードフレーム、2
はそのインナリード、3は半導体素子、4は接着部材で
あり、2層の絶縁性クロス5、例えば、ガラス繊維クロ
ス(織布)と接着剤6からなる。
Here, the external dimensions of the package are
As a technique for maintaining a standard size and mounting a large-sized semiconductor element, a mounting technique in which an island of a lead frame which is generally used for a resin-sealed semiconductor device is deleted is used. As shown in these figures, 1 is a lead frame, 2 is
Is an inner lead thereof, 3 is a semiconductor element, 4 is an adhesive member, and is composed of two layers of insulating cloth 5, for example, glass fiber cloth (woven cloth) and adhesive 6.

【0014】このように、アイランドの代用として用い
られるインナリード2の主表面上に、半導体素子3を固
着搭載する接着部材4として、例えば、図4に示すよう
な絶縁性クロス5に、図5に示すように接着剤6を含浸
させて形成し、所定の形状にプレス等で打ち抜き加工に
よって、小片化し、接着部材4とする。なお、絶縁性ク
ロス5は、2層に形成しているが、一層でもよい。
As described above, as the adhesive member 4 for fixing and mounting the semiconductor element 3 on the main surface of the inner lead 2 used as a substitute for the island, for example, the insulating cloth 5 as shown in FIG. The adhesive member 6 is formed by impregnating it with the adhesive 6 as shown in FIG. Although the insulating cloth 5 is formed in two layers, it may be formed in one layer.

【0015】また、接着剤6も熱可塑性樹脂でもよい
し、熱硬化性樹脂でもよい。この場合にはBステージ化
した前記熱硬化性樹脂が好適である。接着剤6としての
樹脂は固着機能が得られれば、限定するものではない。
接着部材4の厚さも半導体素子3を固着でき、また、加
熱押圧固着時に下側に軟化又は液状化した接着剤が滲み
出し、又は落下しない程度の量から成る厚さに形成され
ておれば、特に限定されるものではない。
The adhesive 6 may also be a thermoplastic resin or a thermosetting resin. In this case, the B-staged thermosetting resin is suitable. The resin as the adhesive 6 is not limited as long as it has a fixing function.
If the thickness of the adhesive member 4 is such that the semiconductor element 3 can be fixed and that the softened or liquefied adhesive does not exude or fall to the lower side at the time of heating and pressing fixation, It is not particularly limited.

【0016】固着条件については、例えばエポキシ樹脂
を接着剤に使用した場合には、100℃前後に加熱され
たガスを、インナリード2上に個片化された接着部材4
を載置し、前記加熱ガスを吹きつけ、接着剤6を軟化又
は溶融液状化させて半導体素子3を押圧して固着させ
る。その後、150℃程度の恒温槽等で完全固化接着さ
せる。加熱ガスは一般的にN2 ガスが用いられる。固化
条件については、恒温槽を用いなくてもよく、加熱ガス
にて固着させると同時に固化させてもよく、限定するも
のでない。
Regarding the fixing conditions, for example, when an epoxy resin is used as the adhesive, the gas heated to around 100 ° C. is singulated on the inner leads 2 to separate the adhesive member 4.
Is placed, the heating gas is blown, the adhesive 6 is softened or melted and liquefied, and the semiconductor element 3 is pressed and fixed. Then, it is completely solidified and adhered in a constant temperature bath at about 150 ° C. Generally, N 2 gas is used as the heating gas. The solidifying conditions are not limited, and may not be a constant temperature bath and may be fixed by heating gas and solidified at the same time.

【0017】クロスはメッシュ状に特殊織りしたもので
も、平織りしたものでもよく、織り方に限定はしない。
また、不織布でもよい。クロスの厚さも0.1〜0.5
mm程度の単層でも数枚重ねて接着剤の含浸能力を増加
させてもよい。クロスに代わってスポンジ状の部材に接
着剤を含浸させて半導体素子の固着に用いるようにして
もよい。スポンジ状の部材については、金属極細線を表
面不導体化処理して用いることができる。放熱(伝熱)
性が良く、高周波半導体素子の搭載に好適である。半導
体素子が大型化しているので、封止エリヤと半導体素子
が略同一程度の実装であるので、インナリード内方端か
ら外部リードへかけての樹脂封止エリヤからインナリー
ド上を接着剤が滲み出すを防止することができるので、
外部水分、不純物の侵入を防止することができる。
The cloth may be specially woven into a mesh or plain woven, and the weaving method is not limited.
Further, it may be a non-woven fabric. The thickness of the cloth is 0.1-0.5
The impregnation ability of the adhesive may be increased by stacking several single layers each having a thickness of about mm. Instead of the cloth, a sponge-like member may be impregnated with an adhesive to be used for fixing the semiconductor element. As for the sponge-like member, a metal ultrafine wire can be used after being subjected to a surface non-conductor treatment. Heat dissipation (heat transfer)
It has good properties and is suitable for mounting high frequency semiconductor elements. Since the size of the semiconductor element is increasing, the sealing area and the semiconductor element are mounted to about the same level. You can prevent it from coming out,
It is possible to prevent external moisture and impurities from entering.

【0018】なお、図3に示すように、インナリード2
の先端は金属細線7を介して、半導体素子のパッドに接
続され、半導体素子3は封止樹脂8により封止される。
また、上記実施例は、COL(チップ・オン・リード)
の場合を示したが、図6に示すように、LOC(リード
・オン・チップ)タイプに構成してもよい。すなわち、
リードフレーム11のインナリード12の下方に半導体
素子13を固着するにあたり、絶縁性クロス15に接着
剤16を含浸させた接着部材14を介して、半導体素子
13を固着する。半導体素子13は封止樹脂18によ
り、封止される。
As shown in FIG. 3, the inner lead 2
Is connected to the pad of the semiconductor element through the thin metal wire 7, and the semiconductor element 3 is sealed with the sealing resin 8.
In addition, the above embodiment is based on COL (chip on lead).
However, as shown in FIG. 6, a LOC (lead-on-chip) type may be used. That is,
When the semiconductor element 13 is fixed below the inner lead 12 of the lead frame 11, the semiconductor element 13 is fixed via the adhesive member 14 in which the insulating cloth 15 is impregnated with the adhesive 16. The semiconductor element 13 is sealed with the sealing resin 18.

【0019】したがって、図示しないが、接着剤16の
滲み出しがなく、インナリード12と半導体素子13の
パッドとの接続を良好に行うことができる。なお、本発
明は上記実施例に限定されるものではなく、本発明の趣
旨に基づき種々の変形が可能であり、それらを本発明の
範囲から排除するものではない。
Therefore, although not shown, the adhesive 16 does not seep out and the inner lead 12 and the pad of the semiconductor element 13 can be connected well. It should be noted that the present invention is not limited to the above embodiments, and various modifications can be made based on the spirit of the present invention, and they are not excluded from the scope of the present invention.

【0020】[0020]

【発明の効果】以上、詳細に説明したように、本発明に
よれば、アイランドを削除したリードフレームのインナ
リードに絶縁性クロスに接着剤を含浸させて、半導体素
子を固着するようにしたので、半導体素子の固着にあた
り、従来のように、接着剤がインナリード下側に軟化又
は液状化している状態で半導体素子を押圧工程によっ
て、接着剤がインナリード下側に流れ出して、突起部を
形成することを防止することができる。
As described above in detail, according to the present invention, the inner lead of the lead frame from which the island is removed is impregnated with the insulating cloth to fix the semiconductor element. When fixing the semiconductor element, the adhesive flows out to the lower side of the inner lead by the pressing step of the semiconductor element while the adhesive is softened or liquefied to the lower side of the inner lead as in the conventional case, and the protrusion is formed. Can be prevented.

【0021】したがって、後工程の金属細線による配線
工程において、不具合の発生を低減させることができ
る。また、接着工程も小片化した接着部材なので取り扱
いが容易で作業の効率化を図ることができる。更に、電
気的絶縁性の向上及び安定化を図ることができる。
Therefore, it is possible to reduce the occurrence of defects in the wiring process using the fine metal wires in the subsequent process. In addition, since the bonding process is a small-sized bonding member, the handling is easy and the work efficiency can be improved. Furthermore, the electrical insulation can be improved and stabilized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示す半導体素子のリードフレ
ームへの実装状態を示す要部断面図である。
FIG. 1 is a cross-sectional view of essential parts showing a mounting state of a semiconductor element on a lead frame showing an embodiment of the present invention.

【図2】本発明の実施例を示す樹脂封止半導体装置の断
面図である。
FIG. 2 is a sectional view of a resin-encapsulated semiconductor device showing an embodiment of the present invention.

【図3】本発明の実施例を示す樹脂封止半導体装置の平
面図である。
FIG. 3 is a plan view of a resin-encapsulated semiconductor device showing an embodiment of the present invention.

【図4】本発明の実施例を示す樹脂封止半導体装置の絶
縁性クロスを示す図である。
FIG. 4 is a diagram showing an insulating cloth of a resin-sealed semiconductor device showing an embodiment of the present invention.

【図5】本発明の実施例を示す樹脂封止半導体装置の絶
縁性クロスに接着剤が含浸された接着部材の断面図であ
る。
FIG. 5 is a cross-sectional view of an adhesive member in which an insulating cloth of a resin-encapsulated semiconductor device according to an embodiment of the present invention is impregnated with an adhesive.

【図6】本発明の他の実施例を示す樹脂封止半導体装置
の断面図である。
FIG. 6 is a cross-sectional view of a resin-encapsulated semiconductor device showing another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1,11 リードフレーム 2,12 インナリード 3,13 半導体素子 4,14 接着部材 5,15 絶縁性クロス 6,16 接着剤 7 金属細線 8,18 封止樹脂 1, 11 Lead frame 2, 12 Inner lead 3, 13 Semiconductor element 4, 14 Adhesive member 5, 15 Insulating cloth 6, 16 Adhesive 7 Metal fine wire 8, 18 Sealing resin

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 リードフレームのインナリードに半導体
素子を固着してなる樹脂封止半導体装置において、 前記半導体素子を前記インナリードに固着する接着部材
であって、該接着部材は、 (a)被含浸部材と、 (b)該被含浸部材に含浸される接着剤とからなること
を特徴とする樹脂封止半導体装置。
1. A resin-sealed semiconductor device having a semiconductor element fixed to an inner lead of a lead frame, the adhesive member fixing the semiconductor element to the inner lead, the adhesive member comprising: A resin-encapsulated semiconductor device comprising an impregnated member and (b) an adhesive with which the member to be impregnated is impregnated.
【請求項2】 前記被含浸部材は、ガラス繊維又はガラ
ス織布を含むことを特徴とする請求項1記載の樹脂封止
半導体装置。
2. The resin-encapsulated semiconductor device according to claim 1, wherein the impregnated member includes glass fiber or glass woven cloth.
【請求項3】 リードフレームのインナリードに半導体
素子を固着してなる樹脂封止半導体装置の製造方法にお
いて、 (a)前記半導体素子を前記リードフレームに固着搭載
するにあたり、インナリードの主表面に接着部材を配置
し、 (b)加熱ガスにて軟化または溶融させ、前記半導体素
子を押圧し、固着させることを特徴とする樹脂封止半導
体装置の製造方法。
3. A method of manufacturing a resin-sealed semiconductor device, comprising a semiconductor element fixed to an inner lead of a lead frame, comprising: (a) fixing the semiconductor element to the lead frame and mounting the semiconductor element on a main surface of the inner lead. A method of manufacturing a resin-encapsulated semiconductor device, which comprises disposing an adhesive member, and (b) softening or melting the same with a heating gas to press and fix the semiconductor element.
【請求項4】 前記接着部材は、クロスに接着剤を含浸
させ、プレス等の切断方法により、個片加工したことを
特徴とする樹脂封止半導体装置の製造方法。
4. The method for manufacturing a resin-encapsulated semiconductor device, wherein the adhesive member is obtained by impregnating a cloth with an adhesive and processing the individual pieces by a cutting method such as pressing.
【請求項5】 前記接着部材は、絶縁処理した金属極細
線の不織布に接着剤を含浸させた熱伝導性の接着部材を
用いることを特徴とする樹脂封止半導体装置の製造方
法。
5. The method for manufacturing a resin-sealed semiconductor device, wherein the adhesive member is a heat conductive adhesive member obtained by impregnating an insulating non-woven metal fine wire nonwoven fabric with an adhesive.
JP118292A 1992-01-08 1992-01-08 Resin sealed semiconductor device and manufacture thereof Pending JPH05190582A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP118292A JPH05190582A (en) 1992-01-08 1992-01-08 Resin sealed semiconductor device and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP118292A JPH05190582A (en) 1992-01-08 1992-01-08 Resin sealed semiconductor device and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH05190582A true JPH05190582A (en) 1993-07-30

Family

ID=11494315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP118292A Pending JPH05190582A (en) 1992-01-08 1992-01-08 Resin sealed semiconductor device and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH05190582A (en)

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