JPH05190136A - High frequency inductive coupling plasma analyzing device - Google Patents

High frequency inductive coupling plasma analyzing device

Info

Publication number
JPH05190136A
JPH05190136A JP4022015A JP2201592A JPH05190136A JP H05190136 A JPH05190136 A JP H05190136A JP 4022015 A JP4022015 A JP 4022015A JP 2201592 A JP2201592 A JP 2201592A JP H05190136 A JPH05190136 A JP H05190136A
Authority
JP
Japan
Prior art keywords
wall
high frequency
spray chamber
nebulizer
sample liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4022015A
Other languages
Japanese (ja)
Other versions
JP3471821B2 (en
Inventor
Mitsuyasu Iwanaga
光恭 岩永
Kiichiro Otsuka
紀一郎 大塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP02201592A priority Critical patent/JP3471821B2/en
Publication of JPH05190136A publication Critical patent/JPH05190136A/en
Application granted granted Critical
Publication of JP3471821B2 publication Critical patent/JP3471821B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To improve the measurement sensitivity with the simple constitution. CONSTITUTION:A heating means for heating the wall A of a spray chamber 8 opposed to the injection hole of a nebulizer 3 by a heater 21, etc., is installed. In this constitution, the heater 21 is allowed to conduct, from an electric power source, and in the state where the wall A part is heated to a proper temperature, a sample liquid is jetted into the spray chamber 8 from the nebulizer 3. When the atomized mist droplets of the sample liquid approach the wall A part in heated state, the particle diameter is reduced further by the heat on the wall surface. The sample liquid droplet whose particle diameter is reduced and tends to be easily loaded on the gas stream formed along the wall surface, and then introduced into a plasma torch 1 through an introducing pipe 9, loaded on this stream, and ionized by the method described in the conventional examples, and mass-analyzed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液体試料を霧化させる
ための液体試料霧化装置に関し、特に、高周波誘導結合
プラズマ(ICP)イオン源と質量分析装置とを結合し
た高周波誘導結合プラズマ質量分析装置(ICP−M
S)に使用して有効な液体試料霧化装置を提供するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid sample atomizing device for atomizing a liquid sample, and more particularly to a high frequency inductively coupled plasma mass in which a high frequency inductively coupled plasma (ICP) ion source and a mass spectrometer are combined. Analyzer (ICP-M
The present invention provides an effective liquid sample atomizing device for use in S).

【0002】[0002]

【従来の技術】図2はICP−MSの一例を示してい
る。
2. Description of the Related Art FIG. 2 shows an example of ICP-MS.

【0003】同図において、1は高周波誘導コイル2を
巻回した石英等の電気絶縁体製プラズマトーチ、3は図
示外のガス供給源から供給される不活性ガス、例えば、
アルゴンガスGと共に試料液を噴霧するためのネブライ
ザである。4は前記コイル2に高周波電圧を印加するた
めの高周波電源、5は試料液6を収納すると共に前記ネ
ブライザ3に導入管7を介して接続された試料ボトルで
ある。8はスプレーチャンバー、9はスプレーチャンバ
ー内にネブライザー3によって噴霧された試料液6をプ
ラズマトーチ1内に導入する導入管である。10は前記
コイル2からの高周波をシールドするためのケースで、
このケースは前記高周波電源4のアース側と接続されて
いる。11はサンプリングコーン12とスキマー13,
14からなるインターフェース、15は質量分析装置
で、内部に質量分析系16が設けてある。17はイオン
を加速,収束してこの質量分析系16に導入するための
電極群である。18は前記質量分析装置15内を高真空
に保つための油拡散ポンプ、19,20は前記ノズル1
2とスキマー13の間の空間A1及びスキマー13と1
4の間の空間A2を排気するための油回転ポンプであ
る。
In the figure, 1 is a plasma torch made of an electrically insulating material such as quartz around which a high frequency induction coil 2 is wound, 3 is an inert gas supplied from a gas supply source (not shown), for example,
It is a nebulizer for spraying a sample solution together with an argon gas G. Reference numeral 4 is a high-frequency power source for applying a high-frequency voltage to the coil 2, and reference numeral 5 is a sample bottle that contains a sample solution 6 and is connected to the nebulizer 3 via an introduction tube 7. Reference numeral 8 is a spray chamber, and 9 is an introduction tube for introducing the sample solution 6 sprayed by the nebulizer 3 into the spray chamber into the plasma torch 1. 10 is a case for shielding the high frequency from the coil 2,
This case is connected to the ground side of the high frequency power supply 4. 11 is a sampling cone 12 and a skimmer 13,
An interface consisting of 14 and a mass spectroscope 15 are provided with a mass spectrometric system 16 inside. Reference numeral 17 denotes an electrode group for accelerating and converging ions to introduce them into the mass spectrometric system 16. Reference numeral 18 is an oil diffusion pump for maintaining a high vacuum inside the mass spectrometer 15, and 19 and 20 are the nozzle 1
Space A1 between 2 and skimmer 13 and skimmer 13 and 1
4 is an oil rotary pump for exhausting the space A2 between the four.

【0004】この様な構成において、プラズマトーチ1
内には図示外のガス供給源からアルゴンガスが供給さ
れ、この状態において、高周波電源4からコイル2に高
周波電力を印加して高周波磁界を形成すると、高周波誘
導プラズマ(以下プラズマと称す)Pが発生する。この
プラズマP内にネブライザ3から試料液6が霧状となっ
て導入されて、試料がイオン化される。このプラズマ内
の試料イオンがサンプリングコーン12,各スキマー1
3,14を通ってインターフェース11内に進入する。
このインターフェース内に進入したイオンは電極群17
により加速,収束されて質量分析系16に導入され質量
分析される。この質量分析系としては、Qポール型及び
磁場型のいずれを用いてもよい
In such a structure, the plasma torch 1
Argon gas is supplied to the coil from a gas supply source (not shown). In this state, when high frequency power is applied from the high frequency power source 4 to the coil 2 to form a high frequency magnetic field, a high frequency induction plasma (hereinafter referred to as plasma) P is generated. Occur. The sample liquid 6 is atomized into the plasma P from the nebulizer 3 and the sample is ionized. The sample ions in this plasma are sampling cone 12, each skimmer 1
Enter the interface 11 through 3, 14.
Ions that have entered this interface are electrode group 17
Are accelerated and converged by and are introduced into the mass spectrometric system 16 for mass spectrometric analysis. As this mass analysis system, either a Q-pole type or a magnetic field type may be used.

【0005】[0005]

【発明が解決しようとする課題】前述した従来技術にお
いて、高感度分析が可能になったが、さらなる感度的向
上が必要とされている。
In the above-mentioned conventional technique, high-sensitivity analysis has become possible, but further improvement in sensitivity is required.

【0006】そこで、本発明はかかる点に鑑みてなされ
たものであり、簡単な構成で、測定感度を向上させるこ
とを目的とするものである。
Therefore, the present invention has been made in view of the above points, and an object thereof is to improve the measurement sensitivity with a simple structure.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するた
め、本発明の高周波誘導結合プラズマ分析装置は、液体
試料を噴霧孔から噴霧室内に噴霧する噴霧器と、噴霧器
によって霧状になった試料をプラズマトーチへ導入する
ようにした高周波誘導結合プラズマ分析装置において、
前記噴霧室内の噴霧孔に対向する壁面を加熱する手段を
設けたことを特徴とするものである。
In order to achieve the above object, a high frequency inductively coupled plasma analyzer according to the present invention comprises a sprayer for spraying a liquid sample from a spray hole into a spray chamber, and a sample atomized by the sprayer. In the high frequency inductively coupled plasma analyzer that is introduced into the plasma torch,
It is characterized in that a means for heating the wall surface facing the spray hole in the spray chamber is provided.

【0008】[0008]

【作用】本発明では、スプレーチャンバー内に液体試料
を噴霧するネブライザの噴霧孔に対向する壁面を加熱す
る手段を設けたので、スプレーチャンバー壁に衝突し液
膜となり排出される試料液を減少させることができるた
め、ネブライザからスプレーチャンバー内に噴霧された
試料液の大半を、プラズマトーチへ導入できる。
In the present invention, since the means for heating the wall surface facing the spray hole of the nebulizer for spraying the liquid sample is provided in the spray chamber, the sample liquid which collides with the wall of the spray chamber and becomes a liquid film and is discharged is reduced. Therefore, most of the sample liquid sprayed from the nebulizer into the spray chamber can be introduced into the plasma torch.

【0009】[0009]

【実施例】以下、本発明の実施例を図面に基づいて詳述
する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0010】図1は本発明の一実施例装置の要部を示し
た概略拡大図であり、図2と同一番号のものは同一構成
要素を示す。
FIG. 1 is a schematic enlarged view showing a main part of an apparatus according to an embodiment of the present invention, and those having the same numbers as those in FIG. 2 show the same components.

【0011】図1の装置において、図2の従来例と異な
るのは、ネブライザ3の噴霧孔に対向するスプレーチャ
ンバー8の壁Aをヒータ21等で加熱する加熱手段を設
けたことである。
The apparatus of FIG. 1 is different from the conventional example of FIG. 2 in that a heating means for heating the wall A of the spray chamber 8 facing the spray hole of the nebulizer 3 with a heater 21 or the like is provided.

【0012】この様な構成において、図示外の電源から
ヒータ21に通電し、壁A部が適宜な温度になるように
加熱した状態で、ネブライザ3から試料液がスプレーチ
ャンバー8内に噴霧される。霧化された試料液の霧滴
が、加熱された壁A部に接近すると、壁面の熱により、
さらにその粒径が小さくされる。この粒径が小さくなっ
た試料液滴は壁面に沿って形成されるガスの流れに乗り
易くなり、この流れに乗って、導入管9を介してプラズ
マトーチ1内に導入され、従来例で述べた方法によっ
て、イオン化され、質量分析される。壁A部を加熱しな
い従来では、大きな霧滴はA部に接近衝突して壁面に付
着してしまったのに比べ、加熱により粒径が小さくされ
壁面に付着しにくくできる本発明では、多くの試料液を
プラズマトーチに移送することができる。
In such a structure, the sample solution is sprayed from the nebulizer 3 into the spray chamber 8 while the heater 21 is energized from a power source (not shown) so that the wall A is heated to an appropriate temperature. . When the atomized droplets of the sample liquid approach the heated wall A, the heat of the wall causes
Further, the particle size is reduced. The sample droplets having the smaller particle size easily ride on the flow of gas formed along the wall surface, and are introduced into the plasma torch 1 through the introduction pipe 9 along with this flow, as described in the conventional example. Is ionized and mass spectrometrically analyzed. In the prior art in which the wall A portion is not heated, a large fog droplet comes close to the portion A and adheres to the wall surface. The sample solution can be transferred to the plasma torch.

【0013】尚、上述した実施例においては、ネブライ
ザの噴霧孔に対向するスプレーチャンバーの壁Aにヒー
タを設けるようにしたが、これに限定されるものでな
く、例えば、壁A部外側から赤外線を照射し、または、
壁A部外側に塗布あるいは貼付した赤外線吸収材に赤外
線を照射してもよいし、加熱したオイル等の熱媒体を使
って壁A部を加熱してもよい。
In the above-described embodiment, the heater is provided on the wall A of the spray chamber facing the spray hole of the nebulizer, but the heater is not limited to this. Irradiation, or
Infrared rays may be applied to the infrared absorbing material applied or attached to the outside of the wall A portion, or the wall A portion may be heated using a heating medium such as heated oil.

【0014】[0014]

【発明の効果】以上詳述したように本発明によれば、ス
プレーチャンバの壁A部に設けられた加熱手段によっ
て、大半の試料液をプラズマトーチに移送することがで
き、簡単な構成で、測定感度を向上させることができ
る。
As described in detail above, according to the present invention, most of the sample liquid can be transferred to the plasma torch by the heating means provided on the wall A of the spray chamber, and with a simple structure, The measurement sensitivity can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例装置の要部を示した概略図で
ある。
FIG. 1 is a schematic diagram showing a main part of an apparatus according to an embodiment of the present invention.

【図2】従来装置の要部概略図である。FIG. 2 is a schematic view of a main part of a conventional device.

【符号の説明】[Explanation of symbols]

1:プラズマトーチ 2:高周波誘導コイル 3:ネブライザ 4:高周波電源 5:試料ボトル 6:試料液 7,9:導入管 8:スプレーチャンバー 10:ケース 11:インターフェース 12:サンプリングコーン 13:第1のスキマー 14:第2のスキマー 15:質量分析装置 16:質量分析系 17:電極群 18:油拡散ポンプ 19,20:油回転ポンプ 21:ヒータ 1: Plasma torch 2: High frequency induction coil 3: Nebulizer 4: High frequency power supply 5: Sample bottle 6: Sample liquid 7, 9: Introducing tube 8: Spray chamber 10: Case 11: Interface 12: Sampling cone 13: First skimmer 14: Second skimmer 15: Mass spectrometer 16: Mass spectrometer 17: Electrode group 18: Oil diffusion pump 19, 20: Oil rotary pump 21: Heater

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】液体試料を噴霧孔から噴霧室内に噴霧する
噴霧器と、噴霧器によって霧状になった試料をプラズマ
トーチへ導入するようにした高周波誘導結合プラズマ分
析装置において、前記噴霧室内の噴霧孔に対向する壁面
を加熱する手段を設けたことを特徴とする高周波誘導結
合プラズマ分析装置。
1. A sprayer for spraying a liquid sample into a spray chamber from a spray hole, and a high-frequency inductively coupled plasma analyzer for introducing a sample atomized by the sprayer into a plasma torch. A high-frequency inductively coupled plasma analysis device, characterized in that a means for heating a wall surface facing to is provided.
JP02201592A 1992-01-10 1992-01-10 High frequency inductively coupled plasma analyzer Expired - Fee Related JP3471821B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02201592A JP3471821B2 (en) 1992-01-10 1992-01-10 High frequency inductively coupled plasma analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02201592A JP3471821B2 (en) 1992-01-10 1992-01-10 High frequency inductively coupled plasma analyzer

Publications (2)

Publication Number Publication Date
JPH05190136A true JPH05190136A (en) 1993-07-30
JP3471821B2 JP3471821B2 (en) 2003-12-02

Family

ID=12071173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02201592A Expired - Fee Related JP3471821B2 (en) 1992-01-10 1992-01-10 High frequency inductively coupled plasma analyzer

Country Status (1)

Country Link
JP (1) JP3471821B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021175968A (en) * 2020-04-23 2021-11-04 株式会社Sumco Sample introducing device, inductively coupled plasma analyzer, and analysis method
JP2022548565A (en) * 2019-09-12 2022-11-21 サーモ フィッシャー サイエンティフィック (エキュブラン) エスアーエールエル Spark stand and maintenance method
US11579092B2 (en) 2020-04-23 2023-02-14 Sumco Corporation Sample introduction device, inductively coupled plasma analyzing device and analyzing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022548565A (en) * 2019-09-12 2022-11-21 サーモ フィッシャー サイエンティフィック (エキュブラン) エスアーエールエル Spark stand and maintenance method
JP2021175968A (en) * 2020-04-23 2021-11-04 株式会社Sumco Sample introducing device, inductively coupled plasma analyzer, and analysis method
US11579092B2 (en) 2020-04-23 2023-02-14 Sumco Corporation Sample introduction device, inductively coupled plasma analyzing device and analyzing method

Also Published As

Publication number Publication date
JP3471821B2 (en) 2003-12-02

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