JPH0311546A - Mass analyzer for high frequency inductive coupling plasma - Google Patents
Mass analyzer for high frequency inductive coupling plasmaInfo
- Publication number
- JPH0311546A JPH0311546A JP1147021A JP14702189A JPH0311546A JP H0311546 A JPH0311546 A JP H0311546A JP 1147021 A JP1147021 A JP 1147021A JP 14702189 A JP14702189 A JP 14702189A JP H0311546 A JPH0311546 A JP H0311546A
- Authority
- JP
- Japan
- Prior art keywords
- skimmer
- electrode
- nozzle
- plasma
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008878 coupling Effects 0.000 title 1
- 238000010168 coupling process Methods 0.000 title 1
- 238000005859 coupling reaction Methods 0.000 title 1
- 230000001939 inductive effect Effects 0.000 title 1
- 150000002500 ions Chemical class 0.000 claims description 21
- 238000004949 mass spectrometry Methods 0.000 claims description 11
- 238000009616 inductively coupled plasma Methods 0.000 claims description 9
- 239000012777 electrically insulating material Substances 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 abstract description 3
- 239000011810 insulating material Substances 0.000 abstract 2
- 241000238634 Libellulidae Species 0.000 description 24
- 239000007788 liquid Substances 0.000 description 4
- 239000006199 nebulizer Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000615 nonconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、高周波誘導結合プラズマ(ICP)イオン源
と質量分析装置とを結合した高周波誘導結合プラズマ質
量分析装置(ICP−MS)に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an inductively coupled plasma mass spectrometer (ICP-MS) that combines an inductively coupled plasma (ICP) ion source and a mass spectrometer. be.
[従来の技術]
かかるICP−MSは第2図に示すような構造を有して
いる。[Prior Art] Such an ICP-MS has a structure as shown in FIG.
同図において、1はICPイオン源で、高周波コイル2
を巻回した石英等の電気絶縁体製プラズマトーチ3と試
料液を噴霧するだめのネプライザ4とから構成されてい
る。5は試料液6を収納すると共に導入管7を介してネ
プライザ4に接続された試料ボトルである。尚、図示し
ないがプラズマトーチ3の外周には高周波コイルからの
2がらの高周波をシールドするためのアース電位に保た
れたシールドケースが設けである。In the figure, 1 is an ICP ion source, and a high frequency coil 2
The torch is composed of a plasma torch 3 made of an electrical insulator such as quartz, and a nebulizer 4 for spraying a sample liquid. Reference numeral 5 designates a sample bottle that stores a sample liquid 6 and is connected to the nebulizer 4 via an introduction tube 7. Although not shown, a shield case kept at ground potential is provided around the outer periphery of the plasma torch 3 to shield two high frequency waves from the high frequency coil.
8は電気良導体で形成されたコーン状のノズル9と第1
及び第2のスキマー10.11とがらなルインターフェ
ース、12は質量分析装置で、内部に質量分析系13が
設けである。8 is a cone-shaped nozzle 9 made of a good electrical conductor and a first
12 is a mass spectrometer, and a mass spectrometry system 13 is provided inside.
14は前記質量分析装置]−2内を高真空に保つための
油拡散ポンプ、15.16は前記ノズル9と第1のスキ
マー10及び第1.第2のスキマー10と11との間に
夫々形成される空間Sl、S2を排気管17.18を介
して排気するための油回転ポンプである。14 is an oil diffusion pump for maintaining a high vacuum inside the mass spectrometer]-2; 15.16 is the nozzle 9, the first skimmer 10, and the first skimmer 10; This is an oil rotary pump for exhausting the spaces Sl and S2 formed between the second skimmers 10 and 11, respectively, through exhaust pipes 17 and 18.
19はイオンを加速、収束して前記質量分析系13に導
くための電極群である。Reference numeral 19 denotes a group of electrodes for accelerating and converging ions and guiding them to the mass spectrometry system 13.
かかる構成において、プラズマト−チ3内には図示外の
ガス供給源からアルゴンガスが供給され、また1、ネプ
ライザ4から試料液6が霧状となって導入される。この
状態において、高周波コイル2に電力を印加して高周波
磁界を形成するとプラズマPが発生するため、このプラ
ズマ内の試料イオンがノズル9.各スキマー10.11
を通ってインターフェース8内に進入する。このインタ
ーフェース内に進入したイオンは電極群17により加速
、収束されて試料分析系13に導入される。In this configuration, argon gas is supplied into the plasma torch 3 from a gas supply source not shown, and a sample liquid 6 is introduced in the form of a mist from the nebulizer 4. In this state, when power is applied to the high frequency coil 2 to form a high frequency magnetic field, a plasma P is generated, and sample ions in this plasma are transferred to the nozzle 9. Each skimmer 10.11
It enters into the interface 8 through. Ions that have entered this interface are accelerated and focused by the electrode group 17 and introduced into the sample analysis system 13.
ところで、近時、質量分析系13に磁場型質量分析系を
使用して高い分解能を得るようにしたICP−MSが提
案されている。このように磁場型質量分析系を使用する
と試料イオンに高いエネルギーを与える必要かあるため
、同図中符号20て示すように第2のスキマー11と電
極群19間に加速電極を設置し、この電極に例えば±l
0KV程度の高電圧を印加すると共に、ノズル9.第1
及び第2のスキマー10.liにも同程度の高電圧を印
加しなければならない。Incidentally, recently, an ICP-MS has been proposed in which a magnetic field type mass spectrometry system is used as the mass spectrometry system 13 to obtain high resolution. When using a magnetic field type mass spectrometry system as described above, it is necessary to give high energy to the sample ions, so an accelerating electrode is installed between the second skimmer 11 and the electrode group 19, as shown by the reference numeral 20 in the figure. For example, ±l on the electrode
While applying a high voltage of about 0 KV, the nozzle 9. 1st
and a second skimmer 10. A similar high voltage must be applied to li as well.
[発明が解決しようとする課題]
そのため、第3図にその拡大断面図を示すように前記ノ
ズル9.第1及び第2のスキマー10゜11を支持する
インターフェース8の筐体21を例えばセラミックのよ
うな電気絶縁体で形成する必要がある。また、排気管1
7を介してノズル9や第1のスキマー10と油回転ポン
プ15との間で発生ずるグロー放電を防止するために、
排気管17をゴム等の電気絶縁物質で形成すると共に、
排気管の長さを長くする必要がある。同様に排気管18
側も同じように工夫する必要がある。さらに、ノズル9
にはICPイオン源が接近して置かれることからシール
ドケースとノズル間の放電を防止するために、シールド
ケースのノズルとの対向部分に石英ガラス等の電気絶縁
体を設置する必要がある。その結果、構造が複雑化かつ
大型化すると共に、コストアップの原因となる。[Problems to be Solved by the Invention] Therefore, as shown in an enlarged sectional view in FIG. 3, the nozzle 9. It is necessary that the housing 21 of the interface 8, which supports the first and second skimmers 10, 11, be made of an electrically insulating material, such as ceramic. Also, exhaust pipe 1
In order to prevent glow discharge occurring between the nozzle 9 or the first skimmer 10 and the oil rotary pump 15 via the
The exhaust pipe 17 is formed of an electrically insulating material such as rubber, and
It is necessary to increase the length of the exhaust pipe. Similarly, exhaust pipe 18
The other side also needs to be devised in the same way. Furthermore, nozzle 9
In order to prevent discharge between the shield case and the nozzle, since the ICP ion source is placed close to each other, it is necessary to install an electrical insulator such as quartz glass on the part of the shield case facing the nozzle. As a result, the structure becomes complicated and large, and this causes an increase in cost.
そこで、本発明はかかる不都合を解決することのできる
ICI”MSを提供することを目的とするものである。Therefore, it is an object of the present invention to provide an ICI"MS that can solve these problems.
[課題を解決するだめの手段]
上記目的を達成するため、本発明のICP−MSは高周
波誘導結合プラズマイオン源を用いて試料をイオン化し
、生じたイオンをノズル及びスキマーからなるインター
フェースを介して磁場型質量分析系に導入するようにし
た装置において、前記ノズル及びスキマーを電気絶縁物
質で形成し、該スキマーの前記磁場型質量分析系に面す
る周壁に電極を設け、該電極にイオンと同じ極性の高電
圧を印加したことを特徴とするものである。[Means for Solving the Problem] In order to achieve the above object, the ICP-MS of the present invention ionizes a sample using a high frequency inductively coupled plasma ion source, and directs the generated ions through an interface consisting of a nozzle and a skimmer. In an apparatus to be introduced into a magnetic field type mass spectrometry system, the nozzle and the skimmer are formed of an electrically insulating material, an electrode is provided on the peripheral wall of the skimmer facing the magnetic field type mass spectrometry system, and the electrode is provided with the same ions as the ions. It is characterized by applying a polar high voltage.
以下、本発明の実施例を図面に基づいて詳説する。Hereinafter, embodiments of the present invention will be explained in detail based on the drawings.
[実施例コ
第1図は本発明に係るICP−MSの一例を示す要部拡
大断面図で、第2図及び第3図と同一符号のものは同一
構成要素を示す。[Example 1] FIG. 1 is an enlarged sectional view of essential parts showing an example of an ICP-MS according to the present invention, and the same reference numerals as in FIGS. 2 and 3 indicate the same components.
本実施例において第2図及び第3図の従来例と相違する
ところは、ノズル9及び第1のスキマ10をセラミック
やルビー等の電気絶縁物質で形成すると共に、第1のス
キマーの質量分析系13側の周壁にコーン状の電極22
を固定した点である。前記電極22には加速電極20に
印加する電圧と同程度の電圧が印加される。また、この
電極のイオン通路側の端部は第1のスキマー10のイオ
ン通過孔縁部より引込ませである。これは電極22と第
2のスキマー11間の放電を抑えるためである。つまり
この電極と第1のスキマーのイオン通過孔とを一致させ
ると、第1のスキマーを通して空間S2に流れ込んだプ
ラズマ中に電極22か存在することになり、プラズマを
介して電極22と第2のスキマー11との間で放電が発
生し易くなるわけである。This embodiment is different from the conventional examples shown in FIGS. 2 and 3 in that the nozzle 9 and the first skimmer 10 are made of an electrically insulating material such as ceramic or ruby, and the mass spectrometry system of the first skimmer is A cone-shaped electrode 22 is placed on the peripheral wall on the 13 side.
is a fixed point. A voltage comparable to the voltage applied to the accelerating electrode 20 is applied to the electrode 22 . Further, the end of this electrode on the ion passage side is retracted from the edge of the ion passage hole of the first skimmer 10. This is to suppress electrical discharge between the electrode 22 and the second skimmer 11. In other words, if this electrode and the ion passage hole of the first skimmer are aligned, the electrode 22 will be present in the plasma that has flowed into the space S2 through the first skimmer, and the electrode 22 and the second This makes it easier for discharge to occur between the skimmer 11 and the skimmer 11.
尚、プラズマP(試料イオン)のインターフェース8へ
の進入は圧力差に基づくガスの流れによるものであるた
め、前記ノズル9に必ずしも高電圧を印加する必要はな
い。Incidentally, since the plasma P (sample ions) enters the interface 8 by a gas flow based on a pressure difference, it is not necessarily necessary to apply a high voltage to the nozzle 9.
このようにすれば、ノズル9及び第1のスキマ−10の
空間S]と接する面に高電圧の印加された部材が存在し
なくなるため、空間S]の排気系部におけるグロー放電
の発生を防止することができる。そのため、排気管とし
ては通常の金属で形成されたものを使用できると共に、
排気管の長さを短(することができる。また、ノズル9
も同様に電気絶縁物質で形成されて高電圧が印加されな
いため、ICPイオン源1側のシールドケースのノズル
と対向する部分に電気絶縁物質を設置する必要がなくな
る。その結果、構造を簡略化かつ小型化できると共に、
コストの低減が図られる。In this way, there will be no member to which a high voltage is applied on the surfaces of the nozzle 9 and the first skimmer 10 that are in contact with the space S, thereby preventing the occurrence of glow discharge in the exhaust system of the space S. can do. Therefore, the exhaust pipe can be made of ordinary metal, and
The length of the exhaust pipe can be shortened. Also, the length of the nozzle 9 can be shortened.
Similarly, since it is formed of an electrically insulating material and no high voltage is applied thereto, there is no need to install an electrically insulating material in the portion of the shield case on the ICP ion source 1 side facing the nozzle. As a result, the structure can be simplified and downsized, and
Cost reduction is achieved.
尚、前述の説明は本発明の一例であり、実施にあたって
は幾多の変形が考えられる。例えば上記実施例では第1
゜のスキマーと電極22とを別々に用意して両者を固定
したが、これに限定されることな(スキマーに蒸着によ
り直接電極を形成しても良い。It should be noted that the above description is an example of the present invention, and many modifications can be made in implementing the present invention. For example, in the above embodiment, the first
Although the skimmer and the electrode 22 were prepared separately and fixed together, the present invention is not limited to this; the electrode may be formed directly on the skimmer by vapor deposition.
また、上記実施例では2つの空間S]−,S2によりイ
ンターフェース8を形成したか、1つの空間S1だけ、
つまり第2のスキマー11を設けない場合にも同様に実
施できる。In addition, in the above embodiment, the interface 8 is formed by two spaces S]-, S2, or only one space S1,
In other words, the same method can be implemented even when the second skimmer 11 is not provided.
[効果コ
以上詳述したように本発明によれば、インターフェース
内に進入したイオンに加速電位を与えるための部材(電
極)をこのインターフェース内の排気系内に設ける必要
かなくなるため、通常の排気系手段を使用することがで
きる。そのため、構造を簡略化かつ小型化できると共に
、コストの低減が図られる。[Effects] As detailed above, according to the present invention, there is no need to provide a member (electrode) in the exhaust system of this interface for applying an accelerating potential to ions that have entered the interface. system means can be used. Therefore, the structure can be simplified and downsized, and costs can be reduced.
第1図は本発明に係るICP−MSの一例を示す要部拡
大断面図、第2図及び第3図は従来例を説明するための
図である。
1、:ICPイオン源 2:高周波コイル3:プラ
ズマトーチ 4:ネブライザ6:試料液
8:インターフェース 9:ノズル
10.11:第1及び第2のスキマー
]2:質量分析装置 13:質量分析系15:油回
転ポンプ 17.17:排気管18:加速電極
22:電極
1]:筐体FIG. 1 is an enlarged sectional view of a main part showing an example of an ICP-MS according to the present invention, and FIGS. 2 and 3 are diagrams for explaining a conventional example. 1: ICP ion source 2: High frequency coil 3: Plasma torch 4: Nebulizer 6: Sample liquid 8: Interface 9: Nozzle 10.11: First and second skimmer] 2: Mass spectrometer 13: Mass spectrometry system 15 : Oil rotary pump 17.17: Exhaust pipe 18: Acceleration electrode 22: Electrode 1]: Housing
Claims (1)
化し、生じたイオンをノズル及びスキマーからなるイン
ターフェースを介して磁場型質量分析系に導入するよう
にした装置において、前記ノズル及びスキマーを電気絶
縁物質で形成し、該スキマーの前記磁場型質量分析系に
面する周壁に電極を設け、該電極にイオンと同じ極性の
高電圧を印加したことを特徴とする高周波誘導結合プラ
ズマ質量分析装置。In an apparatus in which a sample is ionized using a high-frequency inductively coupled plasma ion source and the generated ions are introduced into a magnetic field mass spectrometry system through an interface consisting of a nozzle and a skimmer, the nozzle and skimmer are made of an electrically insulating material. A high frequency inductively coupled plasma mass spectrometer, characterized in that an electrode is provided on a peripheral wall of the skimmer facing the magnetic field type mass spectrometry system, and a high voltage of the same polarity as that of the ions is applied to the electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1147021A JP2603722B2 (en) | 1989-06-09 | 1989-06-09 | High frequency inductively coupled plasma mass spectrometer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1147021A JP2603722B2 (en) | 1989-06-09 | 1989-06-09 | High frequency inductively coupled plasma mass spectrometer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0311546A true JPH0311546A (en) | 1991-01-18 |
JP2603722B2 JP2603722B2 (en) | 1997-04-23 |
Family
ID=15420754
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1147021A Expired - Fee Related JP2603722B2 (en) | 1989-06-09 | 1989-06-09 | High frequency inductively coupled plasma mass spectrometer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2603722B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999036586A1 (en) * | 1998-01-15 | 1999-07-22 | Torrex Equipment Corporation | Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor |
US6352593B1 (en) | 1997-08-11 | 2002-03-05 | Torrex Equipment Corp. | Mini-batch process chamber |
US6352594B2 (en) | 1997-08-11 | 2002-03-05 | Torrex | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
US6780464B2 (en) | 1997-08-11 | 2004-08-24 | Torrex Equipment | Thermal gradient enhanced CVD deposition at low pressure |
US7393561B2 (en) | 1997-08-11 | 2008-07-01 | Applied Materials, Inc. | Method and apparatus for layer by layer deposition of thin films |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103959428B (en) * | 2011-11-21 | 2016-12-21 | Dh科技发展私人贸易有限公司 | For applying the system and method for heavy curtain air-flow in a mass spectrometer |
-
1989
- 1989-06-09 JP JP1147021A patent/JP2603722B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6352593B1 (en) | 1997-08-11 | 2002-03-05 | Torrex Equipment Corp. | Mini-batch process chamber |
US6352594B2 (en) | 1997-08-11 | 2002-03-05 | Torrex | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
US6780464B2 (en) | 1997-08-11 | 2004-08-24 | Torrex Equipment | Thermal gradient enhanced CVD deposition at low pressure |
US7393561B2 (en) | 1997-08-11 | 2008-07-01 | Applied Materials, Inc. | Method and apparatus for layer by layer deposition of thin films |
WO1999036586A1 (en) * | 1998-01-15 | 1999-07-22 | Torrex Equipment Corporation | Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor |
US6167837B1 (en) | 1998-01-15 | 2001-01-02 | Torrex Equipment Corp. | Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor |
Also Published As
Publication number | Publication date |
---|---|
JP2603722B2 (en) | 1997-04-23 |
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Legal Events
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