JPH05188232A - Manufacture of thin oxide glass film and device therefor - Google Patents

Manufacture of thin oxide glass film and device therefor

Info

Publication number
JPH05188232A
JPH05188232A JP392592A JP392592A JPH05188232A JP H05188232 A JPH05188232 A JP H05188232A JP 392592 A JP392592 A JP 392592A JP 392592 A JP392592 A JP 392592A JP H05188232 A JPH05188232 A JP H05188232A
Authority
JP
Japan
Prior art keywords
oxide glass
thin film
substrate
pressure
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP392592A
Other languages
Japanese (ja)
Inventor
Masahide Saito
真秀 斉藤
Haruhiko Aikawa
晴彦 相川
Hiroo Kanamori
弘雄 金森
Akira Urano
章 浦野
Chizai Hirose
智財 広瀬
Shinji Ishikawa
真二 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP392592A priority Critical patent/JPH05188232A/en
Publication of JPH05188232A publication Critical patent/JPH05188232A/en
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1446—Means for after-treatment or catching of worked reactant gases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Optical Integrated Circuits (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

PURPOSE:To provide a method to manufacture a thin oxide glass film having more uniform quality. CONSTITUTION:Fine oxide glass particles are deposited on each substrate 1 by supplying fuel and a gaseous starting material to a torch 13. A turn table 12 is rotated simultaneously and the torch 13 is moved back and forth, so the fine oxide glass particles are uniformly supplied on substrate 1. Besides, since a sucking flow rate of an evacuating pipe 14 is increased or decreased and the pressure in a reaction vessel 16 is kept constant, a relatively stable convection is formed in the vessel 16 and an oxyhydrogen flame is made stable. Thus a fine oxide glass particle layer deposited on each substrate 1 is made to be a uniform quality and have constant thickness within the same substrate or between respective substrates. Thereafter, each substrate 1 is heated to high temperature in a separate oven and the deposited fine oxide glass particle layer is made transparent to obtain an oxide glass film having a uniform quality.

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【産業上の利用分野】本発明は、光導波路等を構成する
ために用いる酸化物ガラス薄膜の製造方法及び装置に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for producing an oxide glass thin film used for forming an optical waveguide or the like.

【０００２】[0002]

【従来の技術】図２は、従来の酸化物ガラス薄膜の製造
装置を示す。反応容器６内のターンテーブル２上には複
数の基板１が載置される。これらの基板１には、トーチ
３からの火炎流にともなってガラス微粒子が堆積され
る。基板１に堆積されなかったガラス微粒子や排気ガス
は排気管４に吸引される。この場合、基板１上にガラス
微粒子を一様に堆積するため、基板１を載置したターン
テーブル２は、反応器６に対して回転される。また、ト
ーチ３もターンテーブル２の動径方向に往復移動され
る。このターンテーブル２には下部ヒータ５が設けられ
ていて、ターンテーブル２上の基板１を一様に加熱す
る。なお、従来例の具体的内容については、特開昭５８
−１０５１１１号公報等に詳しく記載されている。2. Description of the Related Art FIG. 2 shows a conventional apparatus for producing an oxide glass thin film. A plurality of substrates 1 are placed on the turntable 2 in the reaction container 6. Glass fine particles are deposited on these substrates 1 along with the flame flow from the torch 3. The glass particles and exhaust gas not deposited on the substrate 1 are sucked into the exhaust pipe 4. In this case, since the glass particles are uniformly deposited on the substrate 1, the turntable 2 on which the substrate 1 is placed is rotated with respect to the reactor 6. The torch 3 is also reciprocated in the radial direction of the turntable 2. The turntable 2 is provided with a lower heater 5 to uniformly heat the substrate 1 on the turntable 2. The specific contents of the conventional example are described in JP-A-58.
It is described in detail in Japanese Patent Publication No. 105111.

【０００３】[0003]

【発明が解決しようとする課題】しかし、従来の装置で
は、反応容器６内の圧力が制御されていなかったため、
各種要因によって反応容器６内の圧力が不安定に変動し
ていた。このため、下部ヒータ５の加熱等に起因する反
応容器６内の自然対流に乱れや変動が生じ、トーチ３か
らの火炎流にも乱れや変動が生じていた。この結果、均
質な酸化物ガラス薄膜を製造することができなかった。However, in the conventional apparatus, since the pressure inside the reaction vessel 6 was not controlled,
The pressure inside the reaction vessel 6 fluctuated unstablely due to various factors. Therefore, the natural convection in the reaction vessel 6 due to the heating of the lower heater 5 or the like is disturbed or fluctuated, and the flame flow from the torch 3 is also disturbed or fluctuated. As a result, it was not possible to manufacture a homogeneous oxide glass thin film.

【０００４】そこで、本発明は、反応容器６内に生じて
いる自然対流の乱れを抑制することによって、より均質
な酸化物ガラス薄膜を製造しうる方法及びその装置を提
供することを目的とする。Therefore, an object of the present invention is to provide a method and an apparatus for producing a more homogeneous oxide glass thin film by suppressing the disturbance of natural convection generated in the reaction vessel 6. ..

【０００５】[0005]

【課題を解決するための手段】上記課題を解決するた
め、本発明に係る酸化物ガラス薄膜の製造方法では、反
応容器内に酸水素炎とともに原料を供給して酸化物ガラ
ス微粒子を生成し、該酸化物ガラス微粒子を基板上に堆
積して多孔質状の薄膜を形成した後、該基板を高温で加
熱して前記多孔質状の薄膜を透明化する。さらに、かか
る製造方法においては、多孔質状の薄膜を形成する際に
発生する余剰の酸化物ガラス微粒子を吸引排気する排気
管の排気圧を制御することによって、反応容器内の圧力
を所定値に保ちつつ多孔質状の薄膜を形成することとし
ている。In order to solve the above problems, in the method for producing an oxide glass thin film according to the present invention, a raw material is supplied together with an oxyhydrogen flame into a reaction vessel to produce oxide glass fine particles, After depositing the oxide glass fine particles on the substrate to form a porous thin film, the substrate is heated at a high temperature to make the porous thin film transparent. Furthermore, in such a manufacturing method, by controlling the exhaust pressure of the exhaust pipe that sucks and exhausts the excess oxide glass fine particles generated when forming the porous thin film, the pressure in the reaction vessel is set to a predetermined value. A porous thin film is formed while maintaining the temperature.

【０００６】また、本発明に係る酸化物ガラス薄膜の製
造装置は、（ａ）反応容器内に酸水素炎とともに原料を
供給して酸化物ガラス微粒子を生成し、この酸化物ガラ
ス微粒子を基板上に堆積して多孔質状の薄膜を形成する
火炎堆積手段と、（ｂ）多孔質状の薄膜を形成する際に
発生する余剰の酸化物ガラス微粒子を吸引排気する排気
管と、（ｂ）この排気管の排気圧を制御することによっ
て、多孔質状の薄膜を形成する際の反応容器内の圧力を
所定値に保つ圧力制御手段とを備えることとしている。Further, in the apparatus for producing an oxide glass thin film according to the present invention, (a) a raw material is supplied together with an oxyhydrogen flame into a reaction vessel to generate oxide glass fine particles, and the oxide glass fine particles are placed on a substrate. And (b) an exhaust pipe for sucking and exhausting excess oxide glass fine particles generated when the porous thin film is formed, and (b) By controlling the exhaust pressure of the exhaust pipe, there is provided a pressure control means for maintaining the pressure inside the reaction container at a predetermined value when forming the porous thin film.

【０００７】[0007]

【作用】上記酸化物ガラス薄膜の製造方法によれば、排
気管の排気圧を制御することによって多孔質状の薄膜を
形成する際の反応容器内の圧力を所定値に保つこととし
ている。このため、反応容器内の圧力が安定化するのみ
ならず、反応容器内に比較的安定な対流を形成すること
ができる。この結果、酸水素炎を安定なものとすること
ができ、形成された多孔質状の薄膜の膜厚等をより均質
なものとすることができる。According to the above-mentioned method for producing an oxide glass thin film, the pressure inside the reaction vessel when forming the porous thin film is kept at a predetermined value by controlling the exhaust pressure of the exhaust pipe. Therefore, not only the pressure in the reaction container is stabilized, but also relatively stable convection can be formed in the reaction container. As a result, the oxyhydrogen flame can be made stable, and the film thickness of the formed porous thin film can be made more uniform.

【０００８】また、上記酸化物ガラス薄膜の製造装置に
よれば、圧力制御手段が、排気管の排気圧を制御するこ
とによって多孔質状の薄膜を形成する際の反応容器内の
圧力を所定値に保つこととしている。この結果、上記製
造方法と同様に、酸水素炎を安定なものとすることがで
き、形成された多孔質状の薄膜の膜厚等をより均質なも
のとすることができる。Further, according to the above oxide glass thin film manufacturing apparatus, the pressure control means controls the pressure inside the reaction container when the porous thin film is formed by controlling the exhaust pressure of the exhaust pipe to a predetermined value. I will keep it. As a result, the oxyhydrogen flame can be made stable and the film thickness of the formed porous thin film can be made more uniform, as in the case of the above manufacturing method.

【０００９】[0009]

【実施例】以下、本発明の実施例について具体的に説明
する。EXAMPLES Examples of the present invention will be specifically described below.

【００１０】図１は、実施例に係る酸化物ガラス薄膜の
製造装置の構成を示した図である。反応容器１６上部に
は、トーチ１３のガス噴出口と排気管１４の吸入口とが
設けられている。トーチ１３には燃料および原料ガスが
供給される。トーチ１３からは、燃料ガスによって生じ
た酸水素炎と、これによって原料ガスから合成された酸
化物ガラス微粒子とが各基板１上に供給される。これら
の基板１上に堆積されなかったガラス微粒子や排気ガス
は、排気管１４に吸引され、排気処理装置にて処理され
る。FIG. 1 is a diagram showing the structure of an oxide glass thin film manufacturing apparatus according to an embodiment. A gas ejection port of the torch 13 and a suction port of the exhaust pipe 14 are provided above the reaction vessel 16. Fuel and source gas are supplied to the torch 13. From the torch 13, the oxyhydrogen flame generated by the fuel gas and the oxide glass fine particles synthesized from the raw material gas by this are supplied onto each substrate 1. The glass particles and the exhaust gas not deposited on the substrate 1 are sucked into the exhaust pipe 14 and processed by the exhaust processing device.

【００１１】反応容器１６内に定常的な自然対流を形成
して酸水素炎を安定なものとするため、反応容器１６内
の圧力をモニタしながら排気管１４の吸引流量を制御す
る。具体的には、排気管１４から排気処理装置につなが
る排気ダクト２４の一部を分岐して余剰空気取入用ダク
ト３４を形成し、ここからの空気を反応容器１６内から
の排気ガスとともに排気処理装置に吸引させる。この場
合、反応容器１６上部に設けた圧力センサ素子１７ａに
よって、反応容器１６内の圧力をモニタする。検出され
た圧力は、センサドライバ１７ｂの出力として制御装置
１８に入力される。制御装置１８は、弁コントローラ１
９ａを制御しつつバタフライ弁１９ｂを調節し、余剰空
気取入用ダクト３４からの空気流入量を制御する。これ
により、排気管１４の排気圧すなわち吸引流量を増減さ
せて反応容器１６内の圧力を一定に保つことができる。In order to form a steady natural convection in the reaction vessel 16 and stabilize the oxyhydrogen flame, the suction flow rate of the exhaust pipe 14 is controlled while monitoring the pressure in the reaction vessel 16. Specifically, a part of the exhaust duct 24 connected to the exhaust treatment device is branched from the exhaust pipe 14 to form a surplus air intake duct 34, and the air from here is exhausted together with the exhaust gas from the inside of the reaction vessel 16. Let the processor aspirate. In this case, the pressure inside the reaction container 16 is monitored by the pressure sensor element 17a provided above the reaction container 16. The detected pressure is input to the control device 18 as an output of the sensor driver 17b. The controller 18 is the valve controller 1
The butterfly valve 19b is adjusted while controlling 9a to control the inflow amount of air from the excess air intake duct 34. Thereby, the exhaust pressure of the exhaust pipe 14, that is, the suction flow rate can be increased or decreased to keep the pressure in the reaction container 16 constant.

【００１２】各基板１上にガラス微粒子を均一に供給し
堆積させるため、基板１を支持するターンテーブル１２
は水平面内で回転する。また、トーチ１３もターンテー
ブル１２の回転の半径方向に往復移動する。この結果、
トーチ１３はターンテーブル１２に対して２次元的に走
査されることとなる。A turntable 12 for supporting the substrates 1 is provided in order to uniformly supply and deposit glass particles on each substrate 1.
Rotates in the horizontal plane. The torch 13 also reciprocates in the radial direction of rotation of the turntable 12. As a result,
The torch 13 is two-dimensionally scanned with respect to the turntable 12.

【００１３】また、ターンテーブル１２上に載置された
各基板１の温度を一定に保つため、ターンテーブル１２
の底面には下部ヒータ１５が固設されている。Further, in order to keep the temperature of each substrate 1 placed on the turntable 12 constant, the turntable 12
A lower heater 15 is fixedly installed on the bottom surface of the.

【００１４】図１の製造装置の動作について簡単に説明
する。トーチ１３に燃料および原料ガスを供給すること
により、酸化物ガラス微粒子を各基板１上に堆積する。
これと同時に、ターンテーブル１６を回転させ、かつ、
トーチ１３を往復移動させているので、トーチ１３から
の酸化物ガラス微粒子は各基板４上に一様に供給され
る。さらにこの場合、排気管１４の排気圧を増減させて
反応容器１６内の圧力を一定に保っているので、反応容
器１６内に比較的安定な対流が形成され、酸水素炎を安
定で変動の少ないものとすることができる。この結果、
各基板１上に堆積される酸化物ガラス微粒子層を、同一
基板内あるいは基板相互間で均質かつ一定の厚みにする
ことができる。その後、各基板１を別の炉内で高温に加
熱し、堆積された酸化物ガラス微粒子層を透明化して酸
化物ガラス薄膜を得る。また、上記の動作を繰り返して
屈折率の異なる酸化物ガラス薄膜を形成し、さらにＲＩ
Ｅ等によるエッチングを組み合わせれば、各基板１上に
光導波路を形成することもできる。The operation of the manufacturing apparatus shown in FIG. 1 will be briefly described. By supplying the fuel and the raw material gas to the torch 13, oxide glass fine particles are deposited on each substrate 1.
At the same time, rotate the turntable 16 and
Since the torch 13 is moved back and forth, the oxide glass fine particles from the torch 13 are uniformly supplied onto each substrate 4. Further, in this case, the exhaust pressure of the exhaust pipe 14 is increased or decreased to keep the pressure in the reaction vessel 16 constant, so that relatively stable convection is formed in the reaction vessel 16 and the oxyhydrogen flame is stable and fluctuates. Can be few. As a result,
The oxide glass fine particle layer deposited on each substrate 1 can have a uniform and constant thickness within the same substrate or between the substrates. Then, each substrate 1 is heated to a high temperature in another furnace to make the deposited oxide glass fine particle layer transparent and obtain an oxide glass thin film. Further, the above operation is repeated to form an oxide glass thin film having a different refractive index.
An optical waveguide can be formed on each substrate 1 by combining etching with E or the like.

【００１５】以下、図１の製造装置を用いて行う具体的
製造方法について説明する。酸化物ガラス微粒子の多孔
質膜を堆積するにあたって、基板１としては外径７５ｍ
ｍ、厚さ０．５ｍｍのシリコン基板を用い、半径５０ｃ
ｍのターンテーブル１２上に配置した。A specific manufacturing method using the manufacturing apparatus shown in FIG. 1 will be described below. When depositing a porous film of oxide glass particles, the substrate 1 has an outer diameter of 75 m.
m, 0.5 mm thick silicon substrate, radius 50c
It was placed on the turntable 12 of m.

【００１６】酸化物ガラス微粒子の堆積条件は、ターン
テーブル１２の回転速度を５ｒｐｍとし、トーチ１３の
移動速度を１ｍｍ／ｓとし、その移動量を１５０ｍｍと
した。また、トーチ１３に供給するＯ2 ガスを５ｌ／ｍ
ｉｎとし、Ｈ2 ガスを２．５ｌ／ｍｉｎとした。このと
き、下部ヒータ２０はターンテーブル１６が８００℃に
なるように設定した。ガラス原料は、次の条件でトーチ
１３に供給した。Regarding the deposition conditions of the oxide glass particles, the rotation speed of the turntable 12 was 5 rpm, the moving speed of the torch 13 was 1 mm / s, and the moving amount thereof was 150 mm. Also, the O 2 gas supplied to the torch 13 was 5 l / m 2.
and H 2 gas at 2.5 l / min. At this time, the lower heater 20 was set so that the temperature of the turntable 16 was 800 ° C. The glass raw material was supplied to the torch 13 under the following conditions.

【００１７】１）バッファ層用のガラス微粒子層 ＳｉＣｌ4 ：２５０ｃｃ／ｍｉｎ ＢＣｌ3 ： １０ｃｃ／ｍｉｎ ＰＣｌ3 ： ２５ｃｃ／ｍｉｎ １）コア層用のガラス微粒子層 ＳｉＣｌ4 ：２５０ｃｃ／ｍｉｎ ＧｅＣｌ4 ： ４０ｃｃ／ｍｉｎ ＰＣｌ3 ： ２０ｃｃ／ｍｉｎ このとき、反応容器１６内の圧力は、圧力センサ素子１
７ａ及びセンサドライバ１７ｂの出力に基づいて制御さ
れ、一定の負圧０．３ｍｍＨ2 Ｏ±０．０２ｍｍＨ2 Ｏ
に保たれた。1) Glass fine particle layer for buffer layer SiCl 4 : 250 cc / min BCl 3 : 10 cc / min PCl 3 : 25 cc / min 1) Glass fine particle layer for core layer SiCl 4 : 250 cc / min GeCl 4 : 40 cc / min min PCl 3 : 20 cc / min At this time, the pressure in the reaction vessel 16 is equal to the pressure sensor element 1
7a and the sensor driver 17b are controlled based on the output, and a constant negative pressure of 0.3 mmH 2 O ± 0.02 mmH 2 O
Was kept at.

【００１８】上記のようにして堆積した２重構造の多孔
質膜を、別に用意した電気炉中でＨ2 ガスおよびＯ2 ガ
スの混合ガス雰囲気下で透明ガラス化した。このとき、
炉内にＨ2 ガスを５ｌ／ｍｉｎ供給し、Ｏ2 ガスを０．
５ｌ／ｍｉｎ供給し、電気炉内を１３００℃に保持し
た。実施例の方法によれば、サンプル数ｎ＝１００（１
ロットあたり２０個）に対してガラス膜厚を調べたとこ
ろ、３０μｍ±０．３μｍと良好なものであった。The double-layered porous film deposited as described above was subjected to transparent vitrification in a separately prepared electric furnace in a mixed gas atmosphere of H 2 gas and O 2 gas. At this time,
H 2 gas was supplied to the furnace at 5 l / min, and O 2 gas was adjusted to 0.
5 l / min was supplied, and the inside of the electric furnace was maintained at 1300 ° C. According to the method of the embodiment, the number of samples n = 100 (1
When the glass film thickness was examined for 20 pieces per lot), it was 30 μm ± 0.3 μm, which was excellent.

【００１９】[0019]

【発明の効果】以上説明したように、本発明の酸化物ガ
ラス薄膜の製造方法及び装置によれば、多孔質状の薄膜
の形成に際し、排気管の排気圧を制御することによって
反応容器内の圧力を所定値に保つこととしている。この
ため、反応容器内の圧力が安定化して反応容器内に比較
的安定な対流が形成される。この結果、酸水素炎を安定
なものとすることができ、さらに形成された多孔質状の
薄膜をより均質なものとすることができ、ひいては均質
な酸化物ガラス薄膜を得ることができる。As described above, according to the method and apparatus for producing an oxide glass thin film of the present invention, in forming a porous thin film, the exhaust pressure of the exhaust pipe is controlled to control the inside of the reaction vessel. The pressure is kept at a predetermined value. Therefore, the pressure in the reaction vessel is stabilized and relatively stable convection is formed in the reaction vessel. As a result, the oxyhydrogen flame can be made stable, the formed porous thin film can be made more uniform, and a homogeneous oxide glass thin film can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図１】実施例の酸化物ガラス薄膜の製造装置を示す
図。FIG. 1 is a diagram showing an apparatus for producing an oxide glass thin film of an example.

【図２】従来の酸化物ガラス薄膜の製造装置を示す図。FIG. 2 is a view showing a conventional oxide glass thin film manufacturing apparatus.

【符号の説明】[Explanation of symbols]

１…基板、１２、１３…火炎堆積手段、１４…排気管、
１６…反応容器、１７ａ、１７ｂ、１８、１９ａ、１９
ｂ、３４…圧力制御手段。1 ... Substrate, 12, 13 ... Flame accumulation means, 14 ... Exhaust pipe,
16 ... Reaction container, 17a, 17b, 18, 19a, 19
b, 34 ... Pressure control means.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 浦野 章 神奈川県横浜市栄区田谷町１番地 住友電 気工業株式会社横浜製作所内 (72)発明者 広瀬 智財 神奈川県横浜市栄区田谷町１番地 住友電 気工業株式会社横浜製作所内 (72)発明者 石川 真二 神奈川県横浜市栄区田谷町１番地 住友電 気工業株式会社横浜製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akira Urano 1 Taya-cho, Sakae-ku, Yokohama-shi, Kanagawa Sumitomo Electric Industries, Ltd. Yokohama Works (72) Inventor Hirose Satomi, Taya-cho, Sakae-ku, Yokohama, Kanagawa Sumitomo Denki Kogyo Co., Ltd. Yokohama Works (72) Shinji Ishikawa 1 Taya-cho, Sakae-ku, Yokohama, Kanagawa Sumitomo Denki Kogyo Co., Ltd. Yokohama Works

Claims (2)

【特許請求の範囲】[Claims] 【請求項１】 反応容器内に酸水素炎とともに原料を供
給して酸化物ガラス微粒子を生成し、該酸化物ガラス微
粒子を基板上に堆積して多孔質状の薄膜を形成した後、
該基板を高温で加熱して前記多孔質状の薄膜を透明化す
る酸化物ガラス薄膜の製造方法において、 前記多孔質状の薄膜を形成する際に発生する余剰の酸化
物ガラス微粒子を吸引排気する排気管の排気圧を制御す
ることによって、前記反応容器内の圧力を所定値に保ち
つつ前記多孔質状の薄膜を形成することを特徴とする酸
化物ガラス薄膜の製造方法。1. A raw material is supplied together with an oxyhydrogen flame into a reaction vessel to generate oxide glass fine particles, and the oxide glass fine particles are deposited on a substrate to form a porous thin film,
In a method for producing an oxide glass thin film, which heats the substrate at a high temperature to make the porous thin film transparent, the excess oxide glass fine particles generated when the porous thin film is formed are sucked and exhausted. A method for producing an oxide glass thin film, which comprises forming the porous thin film while maintaining the pressure in the reaction vessel at a predetermined value by controlling the exhaust pressure of an exhaust pipe. 【請求項２】 反応容器内に酸水素炎とともに原料を供
給して酸化物ガラス微粒子を生成し、該酸化物ガラス微
粒子を基板上に堆積して多孔質状の薄膜を形成する火炎
堆積手段と、 前記多孔質状の薄膜を形成する際に発生する余剰の酸化
物ガラス微粒子を吸引排気する排気管と、 前記排気管の排気圧を制御することによって、前記多孔
質状の薄膜を形成する際の前記反応容器内の圧力を所定
値に保つ圧力制御手段と、 を備える酸化物ガラス薄膜の製造装置。2. A flame deposition means for supplying a raw material together with an oxyhydrogen flame into a reaction vessel to generate oxide glass fine particles, and depositing the oxide glass fine particles on a substrate to form a porous thin film. When forming the porous thin film by controlling the exhaust pressure of the exhaust pipe that sucks and exhausts the excess oxide glass fine particles generated when forming the porous thin film, and the exhaust pressure of the exhaust pipe. 1. A device for producing an oxide glass thin film, comprising: pressure control means for keeping the pressure in the reaction container at a predetermined value.
JP392592A 1992-01-13 1992-01-13 Manufacture of thin oxide glass film and device therefor Pending JPH05188232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP392592A JPH05188232A (en) 1992-01-13 1992-01-13 Manufacture of thin oxide glass film and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP392592A JPH05188232A (en) 1992-01-13 1992-01-13 Manufacture of thin oxide glass film and device therefor

Publications (1)

Publication Number Publication Date
JPH05188232A true JPH05188232A (en) 1993-07-30

Family

ID=11570725

Family Applications (1)

Application Number Title Priority Date Filing Date
JP392592A Pending JPH05188232A (en) 1992-01-13 1992-01-13 Manufacture of thin oxide glass film and device therefor

Country Status (1)

Country Link
JP (1) JPH05188232A (en)

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