JPH051812Y2 - - Google Patents

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Publication number
JPH051812Y2
JPH051812Y2 JP10691585U JP10691585U JPH051812Y2 JP H051812 Y2 JPH051812 Y2 JP H051812Y2 JP 10691585 U JP10691585 U JP 10691585U JP 10691585 U JP10691585 U JP 10691585U JP H051812 Y2 JPH051812 Y2 JP H051812Y2
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JP
Japan
Prior art keywords
laser beam
inspected
window
vacuum
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP10691585U
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Japanese (ja)
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JPS6216461U (en
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Publication of JPS6216461U publication Critical patent/JPS6216461U/ja
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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【考案の詳細な説明】 産業上の利用分野 本考案は、例えば半導体製造用真空装置のよう
な真空プロセス装置に使用され得る表面異物検査
装置に関するものである。
[Detailed Description of the Invention] Industrial Application Field The present invention relates to a surface foreign matter inspection device that can be used in vacuum process equipment such as vacuum equipment for semiconductor manufacturing.

従来の技術 例えば、半導体製造技術等において、ウエハ等
の基板表面上に付着しているダスト粒子等の異物
を観察、検査することは、歩留り向上の観点から
も重要なことである。
BACKGROUND ART For example, in semiconductor manufacturing technology, it is important to observe and inspect foreign substances such as dust particles attached to the surface of a substrate such as a wafer from the viewpoint of improving yield.

従来用いられてきた基板表面上の異物を検査す
る方法としては、レーザ光線等の光を利用してそ
の散乱光により異物の粒径等を検出する方法や顕
微鏡、走査型電子顕微鏡を利用して検査する方法
等がある。
Conventionally used methods for inspecting foreign matter on the surface of a substrate include a method that uses light such as a laser beam to detect the particle size of the foreign matter from the scattered light, and a method that uses a microscope or scanning electron microscope. There are methods of testing.

この中でラインで速やかに検査できる光散乱法
が広く用いられており、その中でも、検出感度が
高く、小さな粒子まで検出できるという理由で、
レーザを光源としたものが利用されている。これ
らのものは完成された装置として市販されている
が、製造工程中に検査工程を別個に加える必要が
あり、その分だけ、時間的にもマイナスとなる。
Among these, the light scattering method is widely used because it can be quickly inspected on the line, and among them, it has high detection sensitivity and can detect even the smallest particles.
A light source using a laser is used. Although these devices are commercially available as complete devices, it is necessary to add a separate inspection step during the manufacturing process, which results in a time penalty.

そのために、異物検査装置を製造装置に組み込
むという要求があり、特に、真空プロセス装置の
ような特殊な環境の装置に組み込み、インライン
で測定したいという要望が益々強まつている。と
ころで、大気中で使用される従来のレーザダスト
モニタと異なり、レーザ光線を真空装置内へ導入
する場合、あるいはウエハ上で鏡面反射した光を
真空装置外へ出す場合には、必ず真空窓が必要と
なり、真空窓部分での反射光がバツクグラウンド
を上げる等の問題となり、検出感度を低下させる
ことになる。
For this reason, there is a demand for incorporating a foreign matter inspection device into manufacturing equipment, and in particular, there is an increasing demand for in-line measurement by incorporating the foreign matter inspection device into a device with a special environment such as a vacuum process device. By the way, unlike conventional laser dust monitors that are used in the atmosphere, a vacuum window is always required when introducing a laser beam into a vacuum equipment, or when emitting light specularly reflected on a wafer out of a vacuum equipment. This causes a problem such as the reflected light at the vacuum window portion increasing the background, resulting in a decrease in detection sensitivity.

一方、レーザ光線の反射光を極力低く抑えるた
めに、ブリユースタ窓を用いることは公知であ
る。しかし、ブリユースタ窓は特定の入射角にの
み効果があり、少しでも角度がずれると、反射率
が高くなる。また、レーザが偏光している場合に
だけ有効なものである。従つて、ウエハ等の表面
をスキヤンする必要がある場合には、ブリユース
タ窓は適さない。
On the other hand, it is known to use a Brieuster window in order to suppress the reflected light of the laser beam as low as possible. However, the Brieuxta window is only effective at a specific angle of incidence, and even a slight deviation in the angle increases the reflectance. Also, it is effective only when the laser is polarized. Therefore, Brieuster windows are not suitable when it is necessary to scan the surface of a wafer or the like.

また、レーザをスキヤンせずにウエハをステー
ジごと動かすことが考えられるが、ステージを動
かすことは、インライン装置に組み込むことを考
えると、非現実的であり、またステージが動くこ
とによりダストが発生する恐れがあり、好ましく
ない。
Additionally, it is possible to move the wafer along with the stage without scanning the laser, but moving the stage is impractical when considering incorporating it into an in-line device, and moving the stage also generates dust. It's scary and undesirable.

これらの問題を解決するために、先に、レーザ
光線導入用真空窓およびレーザ光線導出用真空窓
に反射防止膜を備えたガラスを使用することを提
案し、これにより、インライン真空装置に組み込
み可能な実用的な表面異物検査装置が実現でき
た。
In order to solve these problems, we first proposed the use of glass with an anti-reflection coating for the vacuum window for introducing the laser beam and the vacuum window for guiding the laser beam, which makes it possible to incorporate it into in-line vacuum equipment. A practical surface foreign matter inspection device has been realized.

この表面異物検査装置では、図面の第2図に示
すように、真空容器A内の例えば4インチのウエ
ハBをレーザスキヤナCによりレーザ光線導入用
真空窓D介してレーザスキヤンした場合に、ウエ
ハBの端部で鏡面反射した光はレーザ光線導出用
真空窓Eで約0.4%程度矢印で示すように真空容
器A内に反射され、真空容器Aの内壁に当る。真
空容器Aの内壁に当つた光はそこで乱反射し、真
空容器A内で大きな迷光となる。バツクグラウン
ドを決定するフアクタは、レーザ光線導入用真空
窓Dおよびレーザ光線導出用真空窓Eにおける反
射光の乱反射およびウエハB上での乱反射であ
る。従つて、バツクグラウンドが上昇し、ダスト
の信号よりもバツクグラウンドが大きくなるた
め、ダストの測定が不可能になる。その結果、事
実上はウエハ径の半分以下程度しか測定できない
ことになる。
In this surface foreign matter inspection apparatus, as shown in FIG. 2 of the drawings, when a 4-inch wafer B in a vacuum container A is laser scanned by a laser scanner C through a vacuum window D for introducing laser beams, the wafer B is About 0.4% of the light specularly reflected at the end is reflected into the vacuum chamber A by the vacuum window E for guiding the laser beam, as shown by the arrow, and hits the inner wall of the vacuum chamber A. The light hitting the inner wall of the vacuum container A is diffusely reflected there and becomes a large stray light inside the vacuum container A. The factors that determine the background are the diffused reflection of the reflected light at the laser beam introducing vacuum window D and the laser beam leading vacuum window E, and the diffused reflection on the wafer B. Therefore, the background rises and becomes larger than the dust signal, making it impossible to measure the dust. As a result, it is actually possible to measure only about half or less of the wafer diameter.

ところで、半導体プロセスにおいては、ウエハ
1枚当りのダストが10個以下という厳しい基準が
あり、ウエハ全面を測定できるモニタでなけれ
ば、インプロセスモニタとしては完全なものとは
言えない。
By the way, in the semiconductor process, there is a strict standard that the number of dust particles per wafer is 10 or less, and unless the monitor can measure the entire surface of the wafer, it cannot be called a perfect in-process monitor.

考案が解決しようとする問題点 第2図に示すような表面異物検査装置において
は、レーザ光線導入用真空窓およびレーザ光線導
出用真空窓に反射防止膜を備えたガラスを使用し
たことによつて0.5μm程度の粒径のダストを検出
できるようになつたが、しかしこの場合に、ウエ
ハ全面をスキヤンすることはできない。仮にウエ
ハ全面をスキヤンしようとすると、上述のように
反射光が真空容器の内壁に当り、バツクグラウン
ドを上昇させるため測定不能となる問題が生じ
る。従つて、ウエハの寸法に関係なく、ウエハ表
面上のスキヤンできる領域が限られることにな
る。
Problems to be Solved by the Invention In the surface foreign matter inspection device shown in Figure 2, glass with an anti-reflection film is used for the vacuum window for introducing the laser beam and the vacuum window for guiding the laser beam. It has become possible to detect dust particles with a particle size of about 0.5 μm, but in this case it is not possible to scan the entire wafer surface. If an attempt was made to scan the entire surface of the wafer, the reflected light would hit the inner wall of the vacuum container as described above, raising the background and causing the problem that measurement would be impossible. Therefore, regardless of the size of the wafer, the area on the wafer surface that can be scanned is limited.

そこで、本考案の目的は、被検査物の全領域を
スキヤンでき、しかも反射光の問題を解決した真
空中で使用可能な表面異物検査装置を提供するこ
とにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a surface foreign matter inspection device that can scan the entire area of an object to be inspected, solves the problem of reflected light, and can be used in a vacuum.

問題点を解決するための手段 上記の目的を達成するために、本考案による真
空中で使用可能な表面異物検査装置は、異物検査
すべき被検査物を収容する真空容器に反射防止膜
を備えたレーザ光線導入用窓と上記真空容器内の
被検査物上で鏡面反射したレーザ光線を外部へ導
出する反射防止膜を備えたレーザ光線導出用窓と
を設け、上記真空容器内の被検査物表面上に導入
されるレーザ光線を上記被検査物表面上で少なく
とも一つの方向に走査させるレーザスキヤナを上
記レーザ光線導入用窓に連結して設け、被検査物
上の異物によつて乱反射したレーザ光線を検出で
きる位置に検出器を設け、上記レーザ光線導出用
窓を、上記レーザスキヤナから上記容器内の被検
査物表面を通つて上記レーザ光線導出用窓までの
長さに等しい曲率半径をもつた外側に凸の球面状
に形成したことを特徴としている。
Means for Solving the Problems In order to achieve the above object, the surface foreign matter inspection device according to the present invention, which can be used in a vacuum, is equipped with an anti-reflection coating on a vacuum container containing an object to be inspected for foreign matter. A window for introducing a laser beam and a window for guiding a laser beam provided with an anti-reflection film that guides the laser beam specularly reflected on the object to be inspected in the vacuum container to the outside, A laser scanner that scans the surface of the object to be inspected in at least one direction with a laser beam introduced onto the surface is connected to the laser beam introducing window, and the laser beam is diffusely reflected by foreign matter on the object to be inspected. A detector is provided at a position where the laser beam leading window can be detected, and the laser beam leading window is provided with an outer side having a radius of curvature equal to the length from the laser scanner to the laser beam leading window through the surface of the object to be inspected in the container. It is characterized by being formed into a convex spherical shape.

作 用 このように構成した本考案による真空中で使用
可能な表面異物検査装置においては、真空容器に
設けたレーザ光線導入用窓を通たレーザ光線は真
空容器内の被検査物表面上に導入され、このレー
ザ光線により被検査物表面上をX,Y方向に走査
する。この場合、レーザスキヤナは、真空容器内
の被検査物表面上をX,Y方向あるいはX方向の
みにスキヤンすることができ、X,Y両方向にス
キヤンするときは被検査物は測定中動かさない。
一方、X方向のみにスキヤンするときには、被検
査物をインラインの搬送系によつて適当な速度で
Y方向に送りながら検査を行なうことができる。
被検査物表面上で鏡面反射した光線はレーザ光線
導出用窓に垂直に入射し、このレーザ光線導出用
窓で反射された0.4%程度の反射光線は全て同一
経路を通つて被検査物表面上に戻ることになる。
もしこの被検査物表面上に何らかの異物が存在し
ていると、導入されたレーザ光線は被検査物上で
鏡面反射してレーザ光線導出用真空窓を通つて外
部へ導出される他、その異物に衝突したレーザ光
線部分は乱反射して検出器に入射する。これによ
り、検出器は被検査物表面上の異物を検出する。
この場合、一連の異物検査操作はインラインで行
なうことができる。
Function: In the surface foreign matter inspection device of the present invention configured as described above, which can be used in a vacuum, the laser beam passes through the laser beam introduction window provided in the vacuum container and is introduced onto the surface of the object to be inspected inside the vacuum container. This laser beam scans the surface of the object to be inspected in the X and Y directions. In this case, the laser scanner can scan the surface of the object to be inspected inside the vacuum container in the X and Y directions or only in the X direction, and when scanning in both the X and Y directions, the object to be inspected does not move during measurement.
On the other hand, when scanning only in the X direction, the inspection can be carried out while sending the object to be inspected in the Y direction at an appropriate speed using an in-line conveyance system.
The light beam specularly reflected on the surface of the object to be inspected is perpendicularly incident on the window for guiding the laser beam, and approximately 0.4% of the reflected light rays reflected by the window for guiding the laser beam all pass through the same path and reach the surface of the object to be inspected. will return to.
If any foreign matter is present on the surface of the object to be inspected, the introduced laser beam will be specularly reflected on the object to be inspected and will be led out through the vacuum window for guiding the laser beam, as well as the foreign object. The portion of the laser beam that collides with the detector is diffusely reflected and enters the detector. Thereby, the detector detects foreign matter on the surface of the object to be inspected.
In this case, a series of foreign object inspection operations can be performed in-line.

実施例 以下、図面第1図を参照して本考案の実施例に
ついて説明する。
Embodiments Hereinafter, embodiments of the present invention will be described with reference to FIG. 1 of the drawings.

図面には真空装置内の基板上の異物の検出に適
用した本考案による表面異物検査装置の要部を示
し、1は真空容器で、この真空容器1にはY方向
に動くことのできる可動テーブル2が設けられ、
この可動テーブル2上には基板ホルダ3が取付け
られ、その上に被検査物である基板4が装着され
ている。真空容器1は、基板4に対して予定の入
射角度でレーザ光線を導入できる位置にレーザ光
線導入用口部5を、また基板4に入射したレーザ
光線が鏡面反射して進む位置にレーザ光線導出用
口部6を備えている。レーザ光線導入用口部5に
は真空窓7が密封的に装着され、レーザ光線導出
用口部6には外側に凸の球面状の真空窓8が密封
的に装着されている。これらの真空窓7,8は反
射防止膜を備えている。9はレーザ光線導入用真
空口部5に取付られたレーザスキヤナで、レーザ
光源10からのレーザ光線を基板4上でX方向に
走査させるスキヤナ9aとスキヤナミラー9bと
を備えている。
The drawing shows the main parts of the surface foreign matter inspection device according to the present invention, which is applied to detect foreign matter on a substrate in a vacuum device. 1 is a vacuum container, and this vacuum container 1 includes a movable table that can move in the Y direction. 2 is provided,
A substrate holder 3 is mounted on the movable table 2, and a substrate 4, which is an object to be inspected, is mounted on the substrate holder 3. The vacuum container 1 has a laser beam introducing opening 5 at a position where the laser beam can be introduced into the substrate 4 at a predetermined incident angle, and a laser beam guiding port 5 at a position where the laser beam incident on the substrate 4 is specularly reflected and proceeds. It is equipped with an opening part 6. A vacuum window 7 is hermetically installed in the laser beam introduction opening 5, and a spherical vacuum window 8 convex to the outside is hermetically installed in the laser beam exit opening 6. These vacuum windows 7, 8 are provided with anti-reflection coatings. Reference numeral 9 denotes a laser scanner attached to the vacuum port 5 for introducing the laser beam, and includes a scanner 9a and a scanner mirror 9b for scanning the laser beam from the laser light source 10 on the substrate 4 in the X direction.

レーザ光線導入用口部5における真空窓7とレ
ーザ光線導出用口部6における真空窓8とを通る
平面に対して所要の角度を成して光電子増倍管か
ら成り得る検出器11が真空容器1に取付けられ
ている。検出器11としては任意の適当な型式の
ものが用いられ得、その出力は例えばコンピユー
タ装置(図示してない)に接続されている。
A detector 11, which may be a photomultiplier tube, is placed in the vacuum container at a predetermined angle with respect to a plane passing through the vacuum window 7 at the laser beam introduction port 5 and the vacuum window 8 at the laser beam exit port 6. It is attached to 1. Any suitable type of detector 11 may be used, the output of which is connected to, for example, a computer device (not shown).

レーザ光線導出用口部6に密封的に装着されて
外側に凸の球面状の真空窓8は、スキヤナミラー
9bから基板4上を通り真空窓8までの距離に実
質的に等しい曲率半径をもつている。
An outwardly convex spherical vacuum window 8 that is sealed in the laser beam guiding port 6 has a radius of curvature that is substantially equal to the distance from the scanner mirror 9b to the vacuum window 8 passing over the substrate 4. There is.

このように構成した図示装置の動作において、
まずレーザ光線源10で発生されたレーザ光線を
スキヤナ9aによつてスキヤンし、スキヤナミラ
ー9bからレーザ光線導入用口部5における真空
窓7を通つて可動テーブル2上の基板4上に導入
され、X方向に走査する。レーザ光線で走査した
基板4に異物がなければ、レーザ光線はその基板
4で鏡面反射してレーザ光線導出用口部6におけ
る真空窓8を通つて真空容器1外へ出て行く。も
し基板に異物があれば、その異物に衝突したレー
ザ光線部分は散乱され、この散乱光は検出器11
により検出され、こうして基板上の異物を検出す
ることができる。
In the operation of the illustrated device configured in this way,
First, the laser beam generated by the laser beam source 10 is scanned by the scanner 9a, and is introduced from the scanner mirror 9b through the vacuum window 7 in the laser beam introduction opening 5 onto the substrate 4 on the movable table 2. Scan in the direction. If there is no foreign matter on the substrate 4 scanned by the laser beam, the laser beam is specularly reflected by the substrate 4 and exits the vacuum chamber 1 through the vacuum window 8 in the laser beam outlet 6. If there is a foreign object on the substrate, the part of the laser beam that collides with the foreign object will be scattered, and this scattered light will be sent to the detector 11.
In this way, foreign substances on the substrate can be detected.

なお、図示実施例において、検出器11の位置
は基板上の異物で乱反射した光を検出できる位置
であればどの位置でもよい。まあ、スキヤナ9a
によるスキヤン操作とY方向への基板の移動とは
同期させて行なわれるべきであることが認められ
る。さらに図示実施例では、レーザスキヤナ9は
レーザ光線をX方向にのみスキヤンさせ、Y方向
には基板を動かしながら検査するようにしている
が、当然、レーザスキヤナ9をX,Y両方向にス
キヤンするように構成し、検査中は基板を静止さ
せるようにしてもよい。
In the illustrated embodiment, the detector 11 may be located at any position as long as it can detect light diffusely reflected by foreign matter on the substrate. Well, Sukiyana 9a
It is recognized that the scanning operation by and the movement of the substrate in the Y direction should be performed in synchronization. Further, in the illustrated embodiment, the laser scanner 9 scans the laser beam only in the X direction and inspects the substrate while moving it in the Y direction, but it is of course configured to scan in both the X and Y directions. However, the board may be kept stationary during the inspection.

考案の効果 以上説明してきたように、本考案によれば、異
物検査すべき被検査物を収容する真空容器に反射
防止膜を備えたレーザ光線導入用窓と上記真空容
器内の被検査物上で鏡面反射したレーザ光線を外
部へ導出する反射防止膜を備えたレーザ光線導出
用窓とを設け、上記真空容器内の被検査物表面上
に導入されるレーザ光線を上記被検査物表面上で
少なくとも一つの方向に走査させるレーザスキヤ
ナを上記レーザ光線導入用窓に連結して設け、被
検査物上の異物によつて乱反射したレーザ光線を
検出できる位置に検出器を設け、上記レーザ光線
導出用窓を、上記レーザスキヤナから上記容器内
の被検査物表面を通つて上記レーザ光線導出用窓
までの長さに等しい曲率半径をもつた外側に凸の
球面状に形成しているので、反射防止膜の作用で
反射光を4%から0.4%に減少させることができ、
ダストの最小検出粒径を2μmから0.5μmにできる
だけでなく、レーザ光線導入用窓を通つて被検査
物上に導入されたレーザ光線は被検査物上で鏡面
反射した後すべてレーザ光線導出用窓に垂直に入
射し、反射光はすべて同じ経路かまたはそれより
内側の経路を通つて戻り、従つて、被検査物の全
面をスキヤンでき、被検査物の全面の異物検出が
可能となる。これにより、本発明による装置は容
易にインライン真空プロセス装置に組み込むこと
ができる。
Effects of the Invention As explained above, according to the present invention, a laser beam introducing window provided with an anti-reflection film is provided on a vacuum container containing an object to be inspected for foreign substances, and and a laser beam emitting window equipped with an anti-reflection film to guide the specularly reflected laser beam to the outside. A laser scanner that scans in at least one direction is connected to the laser beam introducing window, a detector is provided at a position where it can detect the laser beam diffusely reflected by foreign matter on the object to be inspected, and the laser beam guiding window is formed into an outwardly convex spherical shape with a radius of curvature equal to the length from the laser scanner to the laser beam guiding window through the surface of the object to be inspected in the container, so that the anti-reflection coating is The effect can reduce reflected light from 4% to 0.4%,
Not only can the minimum detectable particle size of dust be reduced from 2μm to 0.5μm, but the laser beam introduced onto the object to be inspected through the laser beam introduction window is mirror-reflected on the object to be inspected, and then all of the laser beams are passed through the laser beam extraction window. The reflected light all returns through the same path or an inner path, and therefore the entire surface of the object to be inspected can be scanned, making it possible to detect foreign substances on the entire surface of the object. This allows the device according to the invention to be easily integrated into in-line vacuum process equipment.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例による装置を示す概
略断面図、第2図は従来例を示す概略断面図であ
る。 図中、1……真空容器、2……可動テーブル、
4……基板、5……レーザ光線導入用口部、6…
…レーザ光線導出用口部、7,8……真空窓、9
……レーザスキヤナ、9a……スキヤナ、9b…
…スキヤナミラー、10……レーザ光線、11…
…検出器。
FIG. 1 is a schematic sectional view showing an apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic sectional view showing a conventional example. In the figure, 1... vacuum container, 2... movable table,
4...Substrate, 5...Laser beam introduction opening, 6...
...Laser beam extraction port, 7, 8...Vacuum window, 9
...Laser scanner, 9a...Scaner, 9b...
...Scanner mirror, 10...Laser beam, 11...
…Detector.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 異物検査すべき被検査物を収容する真空容器に
反射防止膜を備えたレーザ光線導入用窓と上記真
空容器内の被検査物上で鏡面反射したレーザ光線
を外部へ導出する反射防止膜を備えたレーザ光線
導出用窓とを設け、上記真空容器内の被検査物表
面上に導入されるレーザ光線を上記被検査物表面
上で少なくとも一つの方向に走査させるレーザス
キヤナを上記レーザ光線導入用窓に連結して設
け、被検査物上の異物によつて乱反射したレーザ
光線を検出できる位置に検出器を設け、上記レー
ザ光線導出用窓を、上記レーザスキヤナから上記
容器内の被検査物表面を通つて上記レーザ光線導
出用窓までの長さに等しい曲率半径をもつた外側
に凸の球面状に形成したことを特徴とする真空中
で使用可能な表面異物検査装置。
A vacuum container containing an object to be inspected for foreign substances is provided with a laser beam introduction window equipped with an anti-reflection film and an anti-reflection film for directing the laser beam specularly reflected on the object to be inspected in the vacuum container to the outside. a laser beam guiding window, and a laser scanner that scans the laser beam introduced onto the surface of the object to be inspected in at least one direction on the surface of the object to be inspected in the laser beam introducing window; A detector is provided in a position where the laser beam diffusely reflected by a foreign substance on the object to be inspected can be detected, and the window for guiding the laser beam is connected from the laser scanner through the surface of the object to be inspected in the container. A surface foreign matter inspection device usable in a vacuum, characterized in that it is formed into an outwardly convex spherical shape with a radius of curvature equal to the length up to the laser beam guiding window.
JP10691585U 1985-07-15 1985-07-15 Expired - Lifetime JPH051812Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10691585U JPH051812Y2 (en) 1985-07-15 1985-07-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10691585U JPH051812Y2 (en) 1985-07-15 1985-07-15

Publications (2)

Publication Number Publication Date
JPS6216461U JPS6216461U (en) 1987-01-31
JPH051812Y2 true JPH051812Y2 (en) 1993-01-18

Family

ID=30982713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10691585U Expired - Lifetime JPH051812Y2 (en) 1985-07-15 1985-07-15

Country Status (1)

Country Link
JP (1) JPH051812Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9727362D0 (en) * 1997-12-24 1998-02-25 Gersan Ets Examining diamonds

Also Published As

Publication number Publication date
JPS6216461U (en) 1987-01-31

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