JPH0517878B2 - - Google Patents
Info
- Publication number
- JPH0517878B2 JPH0517878B2 JP60004919A JP491985A JPH0517878B2 JP H0517878 B2 JPH0517878 B2 JP H0517878B2 JP 60004919 A JP60004919 A JP 60004919A JP 491985 A JP491985 A JP 491985A JP H0517878 B2 JPH0517878 B2 JP H0517878B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- salts
- salt
- water
- copolymers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 phytic acid ammonium salt Chemical class 0.000 claims description 28
- 150000003839 salts Chemical class 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 14
- 235000002949 phytic acid Nutrition 0.000 claims description 13
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical class OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Phytic acid Natural products OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 claims description 11
- 229940068041 phytic acid Drugs 0.000 claims description 11
- 239000000467 phytic acid Substances 0.000 claims description 11
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 10
- 238000007645 offset printing Methods 0.000 claims description 10
- 150000002148 esters Chemical class 0.000 claims description 9
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- 239000003093 cationic surfactant Substances 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 claims description 5
- 150000001449 anionic compounds Chemical class 0.000 claims description 5
- 239000013522 chelant Substances 0.000 claims description 5
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 4
- 150000003863 ammonium salts Chemical class 0.000 claims description 4
- 235000019253 formic acid Nutrition 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 4
- 239000010452 phosphate Substances 0.000 claims description 4
- 229920000137 polyphosphoric acid Chemical class 0.000 claims description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 229920006243 acrylic copolymer Polymers 0.000 claims description 3
- 229920006222 acrylic ester polymer Polymers 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 3
- 239000001913 cellulose Substances 0.000 claims description 3
- 229920002678 cellulose Polymers 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 3
- 150000003014 phosphoric acid esters Chemical class 0.000 claims description 3
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 claims description 2
- 239000004480 active ingredient Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 description 14
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 12
- 238000007639 printing Methods 0.000 description 11
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 235000011187 glycerol Nutrition 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 4
- 229960004889 salicylic acid Drugs 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 2
- ALRHLSYJTWAHJZ-UHFFFAOYSA-N 3-hydroxypropionic acid Chemical compound OCCC(O)=O ALRHLSYJTWAHJZ-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- 229910006147 SO3NH2 Inorganic materials 0.000 description 2
- 239000004288 Sodium dehydroacetate Substances 0.000 description 2
- IWEDUKDKQUXPLH-NFJZTGFVSA-L [Mg++].OP(O)(=O)O[C@H]1[C@@H](OP(O)(O)=O)C(OP(O)([O-])=O)[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)C1OP(O)([O-])=O Chemical compound [Mg++].OP(O)(=O)O[C@H]1[C@@H](OP(O)(O)=O)C(OP(O)([O-])=O)[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)C1OP(O)([O-])=O IWEDUKDKQUXPLH-NFJZTGFVSA-L 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000003975 dentin desensitizing agent Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- YAGKRVSRTSUGEY-UHFFFAOYSA-N ferricyanide Chemical compound [Fe+3].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] YAGKRVSRTSUGEY-UHFFFAOYSA-N 0.000 description 2
- 239000004220 glutamic acid Substances 0.000 description 2
- 235000013922 glutamic acid Nutrition 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 229960003330 pentetic acid Drugs 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- GJAWHXHKYYXBSV-UHFFFAOYSA-N quinolinic acid Chemical compound OC(=O)C1=CC=CN=C1C(O)=O GJAWHXHKYYXBSV-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- FSYKKLYZXJSNPZ-UHFFFAOYSA-N sarcosine Chemical compound C[NH2+]CC([O-])=O FSYKKLYZXJSNPZ-UHFFFAOYSA-N 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 235000019259 sodium dehydroacetate Nutrition 0.000 description 2
- 229940079839 sodium dehydroacetate Drugs 0.000 description 2
- 235000019254 sodium formate Nutrition 0.000 description 2
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 2
- DSOWAKKSGYUMTF-GZOLSCHFSA-M sodium;(1e)-1-(6-methyl-2,4-dioxopyran-3-ylidene)ethanolate Chemical compound [Na+].C\C([O-])=C1/C(=O)OC(C)=CC1=O DSOWAKKSGYUMTF-GZOLSCHFSA-M 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- LGNQGTFARHLQFB-UHFFFAOYSA-N 1-dodecyl-2-phenoxybenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1OC1=CC=CC=C1 LGNQGTFARHLQFB-UHFFFAOYSA-N 0.000 description 1
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- QWCKQJZIFLGMSD-UHFFFAOYSA-N 2-Aminobutanoic acid Natural products CCC(N)C(O)=O QWCKQJZIFLGMSD-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- XKNCTQRIHLMQLT-UHFFFAOYSA-N 2-tert-butylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(C(C)(C)C)=CC=C21 XKNCTQRIHLMQLT-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- KWYJDIUEHHCHCZ-UHFFFAOYSA-N 3-[2-[bis(2-carboxyethyl)amino]ethyl-(2-carboxyethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CCC(O)=O)CCN(CCC(O)=O)CCC(O)=O KWYJDIUEHHCHCZ-UHFFFAOYSA-N 0.000 description 1
- 101710134784 Agnoprotein Proteins 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- QWCKQJZIFLGMSD-GSVOUGTGSA-N D-alpha-aminobutyric acid Chemical compound CC[C@@H](N)C(O)=O QWCKQJZIFLGMSD-GSVOUGTGSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- QEVGZEDELICMKH-UHFFFAOYSA-N Diglycolic acid Chemical compound OC(=O)COCC(O)=O QEVGZEDELICMKH-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- JYXGIOKAKDAARW-UHFFFAOYSA-N N-(2-hydroxyethyl)iminodiacetic acid Chemical compound OCCN(CC(O)=O)CC(O)=O JYXGIOKAKDAARW-UHFFFAOYSA-N 0.000 description 1
- AZIHIQIVLANVKD-UHFFFAOYSA-N N-(phosphonomethyl)iminodiacetic acid Chemical compound OC(=O)CN(CC(O)=O)CP(O)(O)=O AZIHIQIVLANVKD-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 108010077895 Sarcosine Proteins 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FENRSEGZMITUEF-ATTCVCFYSA-E [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].OP(=O)([O-])O[C@@H]1[C@@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H]1OP(=O)([O-])[O-] Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].OP(=O)([O-])O[C@@H]1[C@@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H]1OP(=O)([O-])[O-] FENRSEGZMITUEF-ATTCVCFYSA-E 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- 229960005261 aspartic acid Drugs 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229940000635 beta-alanine Drugs 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- STIAPHVBRDNOAJ-UHFFFAOYSA-N carbamimidoylazanium;carbonate Chemical compound NC(N)=N.NC(N)=N.OC(O)=O STIAPHVBRDNOAJ-UHFFFAOYSA-N 0.000 description 1
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229920006317 cationic polymer Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000586 desensitisation Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- DEFVIWRASFVYLL-UHFFFAOYSA-N ethylene glycol bis(2-aminoethyl)tetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)CCOCCOCCN(CC(O)=O)CC(O)=O DEFVIWRASFVYLL-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 229960002989 glutamic acid Drugs 0.000 description 1
- 229960002449 glycine Drugs 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940083094 guanine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- WPEXVRDUEAJUGY-UHFFFAOYSA-B hexacalcium;(2,3,4,5,6-pentaphosphonatooxycyclohexyl) phosphate Chemical compound [Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])(=O)OC1C(OP([O-])([O-])=O)C(OP([O-])([O-])=O)C(OP([O-])([O-])=O)C(OP([O-])([O-])=O)C1OP([O-])([O-])=O WPEXVRDUEAJUGY-UHFFFAOYSA-B 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- CDAISMWEOUEBRE-GPIVLXJGSA-N inositol Chemical compound O[C@H]1[C@H](O)[C@@H](O)[C@H](O)[C@H](O)[C@@H]1O CDAISMWEOUEBRE-GPIVLXJGSA-N 0.000 description 1
- UETZVSHORCDDTH-UHFFFAOYSA-N iron(2+);hexacyanide Chemical compound [Fe+2].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] UETZVSHORCDDTH-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 235000014380 magnesium carbonate Nutrition 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229960004838 phosphoric acid Drugs 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- WFIZEGIEIOHZCP-UHFFFAOYSA-M potassium formate Chemical compound [K+].[O-]C=O WFIZEGIEIOHZCP-UHFFFAOYSA-M 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229940043230 sarcosine Drugs 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- CDAISMWEOUEBRE-UHFFFAOYSA-N scyllo-inosotol Natural products OC1C(O)C(O)C(O)C(O)C1O CDAISMWEOUEBRE-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940083982 sodium phytate Drugs 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 235000010356 sorbitol Nutrition 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
Landscapes
- Printing Plates And Materials Therefor (AREA)
Description
<産業上の利用分野>
本発明は電子写真オフセツト印刷版面処理液に
関し、シアン化合物を一切含有しない、シアンフ
リーオフセツト印刷用不感脂化処理液に関するも
のである。
<従来の技術>
電子写真オフセツト印刷原版(以下マスターと
称する)は、酸化亜鉛のごとき光導電性微粉末体
を樹脂結着剤中に分散した感光層を有し、この層
上に通常の電子写真操作を施して、親油性画像を
形成させることによつて得られる。
一般にオフセツト印刷では、水に湿潤され易い
非画線部(親水性部)と湿潤され難い画線部(親
油性部)とから構成された版が使用されている
が、電子写真オフセツト印刷原版は、その画線部
が疎水性の光導電層より成つているためそのまま
印刷を施すと、印刷インキは非画線部に付着され
正常な印刷を行うことができない。
それ故に印刷に先だつて、印刷原版の非画線部
を不感脂化処理して、親水性を付与してやる必要
がある。従来よりこの種の不感脂化処理液とし
て、フエロシアン塩、フエリシアン塩を主成分と
するシアン化合物含有処理液、アンミンコバルト
醋体、フイチン酸及びその誘導体、グアニジン誘
導体を主成分としたシアンフリー処理液が提起さ
れている。
しかしながら、これらの処理液は充分満足出来
る処理液とは言えない。即ち、前者のフエロシア
ン塩、フエリシアン塩含有処理液の場合は、不感
脂化力は強く、強固な親水性被膜形成能を持ち、
成膜速度も速い利点はあるが、反面フエロシアン
イオン、フエリシアンイオンは熱は光に対し不安
定で光にさらすと着色し、沈澱を生じて不感脂化
力が弱まり、さらにシアンイオン(CN)を含有
することで遊離シアンとして検出されることによ
り排水等、公害の面において種々の問題を提起す
る欠点を持つている。
一方、こうした点を考慮して後者のような不感
脂化剤を主成分としたシアンフリー処理液が提案
されているが、これらによつても未だ充分満足す
べき平版印刷原版を得る処理液とは言えない。具
体的には、前者に比べ成膜速度が遅く、プロセツ
サーを用いたエツチング方式では1回通しで直ち
に印刷可能な物理強度の高い親水性被膜形成が出
来ず、地汚れや網点階調につぶれを生じる欠点を
有している。
従来、イノシツトヘキサリン酸エステル及びそ
の金属誘導体は金属とキレート化合物を形成する
ことは周知の通りで、オフセツト印刷原版の不感
脂化剤としてすでに種々提供されている。
しかしこれらは、いずれも成膜速度が遅く、プ
ロセツサー1回の処理で印刷可能な親水性被膜が
形成されず、このためインキ分離性が悪く、地汚
れや網点階調のつぶれを生じ又印刷環境の影響を
うけやすく低湿度ではプロセツサー2回で地汚れ
が発生する欠点がある。
本発明者らは、先に特公昭58−5799でイノシツ
トヘキサリン酸エステルのナトリウムフイテー
ト、カリウムフイテート、カルシウムフイテート
などの1価、2価の金属塩と水溶性カチオンポリ
マーとのイオンコンプレツクスを提案したが、こ
の場合は保水性が向上したが、満足すべきエツチ
ングスピードが得られないという欠点を有してい
た。
<発明が解決しようとする問題点>
本発明は、上記の事情に鑑みてなされたもので
あり、皮膜速度が早く、プロセツサー1回の処理
で印刷可能な親水性被膜を形成することが出来る
シアンフリーオフセツト印刷用不感脂化処理液を
提供するものである。
<問題点を解決するための手段>
本発明は、
(a) フイチン酸、フイチン酸金属塩、フイチン酸
アンモニウム塩、フイチン酸有機アミン塩、1
位もしくは4位の水酸基が不活性化されている
イノシツトヘキサリン酸エステル誘導体、ビニ
ルスルホン酸(塩)重合体又は共重合体、リン
酸セルロース(塩)、2−ヒドロキシエチル
(メタ)アクリル酸エステル重合体又は共重合
体のリン酸エステル(塩)、2−ヒドロキシプ
ロピル(メタ)アクリル酸エステル重合体又は
共重合体のリン酸エステル(塩)から選ばれた
少なくとも1種の亜鉛イオンとキレート形成能
を有するアニオン化合物。
(b) カチオン界面活性剤
(c) ギ酸、修酸、硫酸、硝酸、スルフアミン酸、
リン酸、ポリリン酸もしくは炭酸の、アルカリ
金属塩、アリカリ土金属塩、アンモニウム塩ま
たは有機アミン塩から選ばれた少なくとも1種
の常温における水に対する溶解度が10%以上の
電解質化合物
からなるシアンフリーオフセツト印刷用不感脂化
処理液である。
本発明の処理液に用いる亜鉛イオンとキレート
形成能を有する水溶性アニオン化合物としては、
特開昭57−199694号明細書、特公昭45−24609号
明細書、特開昭51−103501号明細書や特開昭54−
10003号明細書に記載されているフイチン酸また
はその金属塩、特願昭58−130348号明細書に記載
されているフイチン酸アンモニウム塩または有機
アミン塩、特開昭53−83806号明細書、特開昭53
−83807号明細書、特開昭53−109701号明細書3
特開昭53−127002号明細書、特開昭53−127003号
明細書や特開昭54−44901号明細書に記載されて
いる1位または4位の水酸基が不活性化されてい
るイノシツトヘキサリン酸エステル誘導体、ビニ
ルホスホン酸(塩)重合体又は共重合体、リン酸
セルロース(塩)、2−ヒドロキシエチル(メタ)
アクリル酸エステル重合体又は共重合体のリン酸
エステル(塩)、2−ヒドロキシプロピル(メタ)
アクリル酸エステル重合体又は共重合体のリン酸
エステル(塩)が挙げられる。
本発明の処理液に用いるカチオン界面活性剤は
具体的には、RN
(CH3)3・Cl
(但しRは炭
素数5以上のアルキル基)、
<Industrial Field of Application> The present invention relates to an electrophotographic offset printing plate surface treatment liquid, and more particularly to a desensitization treatment liquid for cyan-free offset printing that does not contain any cyan compounds. <Prior art> An electrophotographic offset printing original plate (hereinafter referred to as a master) has a photosensitive layer in which photoconductive fine powder such as zinc oxide is dispersed in a resin binder, and a conventional electronic printing plate is formed on this layer. Obtained by photographic manipulation to form a lipophilic image. Generally, in offset printing, a plate is used that consists of a non-image area that is easily wetted by water (hydrophilic area) and an image area that is difficult to wet (oleophilic area), but electrophotographic offset printing original plates are Since the image area is made of a hydrophobic photoconductive layer, if printing is performed as is, the printing ink will adhere to the non-image area and normal printing will not be possible. Therefore, prior to printing, it is necessary to desensitize the non-image areas of the printing plate to impart hydrophilic properties. Conventionally, this type of desensitizing treatment liquid includes ferrocyanate, a cyanide compound-containing treatment liquid containing ferricyanide as a main component, and a cyanide-free treatment liquid containing ammine cobalt base, phytic acid and its derivatives, and guanidine derivatives as main components. has been raised. However, these processing solutions cannot be said to be fully satisfactory processing solutions. That is, in the case of the former ferrocyan salt and ferricyan salt-containing treatment solution, the desensitizing power is strong and the ability to form a strong hydrophilic film is strong.
Although it has the advantage of fast film formation speed, on the other hand, ferrocyan ions and ferricyan ions are thermally unstable to light and become colored and precipitate when exposed to light, weakening their desensitizing power. ), which is detected as free cyanide, which poses various problems in terms of pollution, such as drainage. On the other hand, in consideration of these points, cyan-free processing liquids containing a desensitizing agent as the main component have been proposed, but even with these, it is still not possible to obtain a sufficiently satisfactory lithographic printing original plate. I can't say that. Specifically, the film formation speed is slower than the former, and the etching method using a processor cannot form a hydrophilic film with high physical strength that can be immediately printed in one pass, resulting in background smudges and halftone gradation. It has the disadvantage of causing It is well known that inositohexalic acid esters and their metal derivatives form chelate compounds with metals, and various types of desensitizing agents for offset printing original plates have been provided. However, with these methods, the film formation speed is slow, and a hydrophilic film that can be printed is not formed in a single processing using a processor.As a result, ink separation is poor, causing background smearing and halftone gradation, and printing. It is easily influenced by the environment and has the disadvantage that under low humidity conditions, background smudges may occur even after the processor has been used twice. The present inventors previously reported in Japanese Patent Publication No. 58-5799 that ions of monovalent and divalent metal salts such as sodium phytate, potassium phytate, and calcium phytate of inositohexalic acid ester and water-soluble cationic polymers were used. A complex method was proposed, but although this improved water retention, it had the disadvantage that a satisfactory etching speed could not be obtained. <Problems to be Solved by the Invention> The present invention has been made in view of the above-mentioned circumstances. The present invention provides a desensitizing treatment liquid for free offset printing. <Means for solving the problems> The present invention provides: (a) phytic acid, phytic acid metal salt, phytic acid ammonium salt, phytic acid organic amine salt, 1
Inositohexalic acid ester derivatives, vinyl sulfonic acid (salt) polymers or copolymers, cellulose phosphate (salt), 2-hydroxyethyl (meth)acrylic acid, in which the hydroxyl group at position or 4-position is inactivated. Chelate with at least one zinc ion selected from phosphate esters (salts) of ester polymers or copolymers, phosphoric esters (salts) of 2-hydroxypropyl (meth)acrylic ester polymers or copolymers. Anionic compound with the ability to form. (b) Cationic surfactants (c) Formic acid, oxalic acid, sulfuric acid, nitric acid, sulfamic acid,
Cyanide-free offset consisting of at least one electrolyte compound selected from alkali metal salts, alkaline earth metal salts, ammonium salts, or organic amine salts of phosphoric acid, polyphosphoric acid, or carbonic acid and having a solubility in water of 10% or more at room temperature. This is a desensitizing liquid for printing. The water-soluble anionic compound having the ability to form a chelate with zinc ions used in the treatment solution of the present invention includes:
JP-A-57-199694, JP-B-45-24609, JP-A-51-103501 and JP-A-54-
Phytic acid or its metal salt as described in Japanese Patent Application No. 10003, ammonium salt or organic amine salt of phytic acid as described in Japanese Patent Application No. 58-130348, Japanese Patent Application No. 83806-1986, 1978
-83807 specification, JP-A-53-109701 specification 3
Inosite in which the hydroxyl group at the 1st or 4th position is inactivated, as described in JP-A-53-127002, JP-A-53-127003, and JP-A-54-44901 Hexaphosphate derivative, vinylphosphonic acid (salt) polymer or copolymer, cellulose phosphate (salt), 2-hydroxyethyl (meth)
Phosphate ester (salt) of acrylic ester polymer or copolymer, 2-hydroxypropyl (meth)
Examples include phosphoric acid esters (salts) of acrylic acid ester polymers or copolymers. Specifically, the cationic surfactants used in the treatment liquid of the present invention include RN (CH 3 ) 3 Cl (where R is an alkyl group having 5 or more carbon atoms),
【式】(但しRは炭
素数3以上のアルキル基)、
[Formula] (where R is an alkyl group having 3 or more carbon atoms),
【式】(但しRは
炭素数3以上のアルキル基)、
[Formula] (where R is an alkyl group having 3 or more carbon atoms),
【式】(但しRは炭素数5以上
のアルキル基)、C11H23CONH(CH2)3N
(CH3)2COOC2H5・Cl
、
などがある。
それらの中でも分子中にベンゼン環を有する分
子量約100〜1000の、ベンジル型4級アンモニウ
ム塩が好適である。
また本発明の処理液に使用する水に対する溶解
度が10%以上の有機又は無機の電解化合物として
は、ギ酸、修酸、硫酸、硝酸、スルフアミン酸、
リン酸、ポリリン酸、又は炭酸のアルカリ金属
塩、アルカリ土金属塩、アンモニウム塩又は有機
アミン塩がある。具体的にはAgNO3、Ba
(NO3)2、Ba(SO3NH2)、Ca(NO3)2、Ca
(SO3NH2)2、KHCO3、KHSO4、KNO3、
LiNO3、MgCO3、MgSO4、NH4CO3、
(NH4)2SO4、NH4SO3NH2、NaCO3、NANO3、
NaSO3NH2、HCOONa、HCOOK、
NaOOCCOONa、KOOCCOONa、炭酸グアニジ
ン、炭酸アンモニウム等をあげる事が出来る。こ
の他、亜硝酸塩や亜硫酸塩のごとく還元性の塩も
酸化されて硝酸塩や硫酸塩にかわる場合は包含さ
れる。これらの電解質化合物の水に対する溶解度
は10%重量以下では処理液とした場合に長期放置
で結晶を生じ好ましくない。好ましくは水に対す
る溶解度が20重量%以上のものである。
本発明は特定の酸の塩からなる電解質化合物を
アニオン化合物とカチオン界面活性剤のイオンコ
ンプレツクスに添加する事によつてエツチングス
ピードの高い処理液としたものである。
本発明の処理液を構成する上記物質の使用量
は、処理液1000重量部の中に亜鉛イオンとキレー
ト形成能を有する水溶性アニオン化合物が10〜
200重量部、より好ましくは40〜75重量部、電解
質化合物が20〜150重量部、より好ましくは40〜
100重量部及びカチオン界面活性剤が0.2〜20重量
部、より好ましくは1〜10重量部である。これら
の化合物をイオン交換水又は水道水に溶解させて
本処理液とする。溶解の順序はとくに制限されな
いが、好ましくは水に亜鉛イオンとキレート形成
能を有する水溶性アニオン化合物を溶解させた
後、電解質化合物を加え、その後にカチオン界面
活性剤を加える。処理液には上記成分の外にPH調
整剤や沈澱防止剤として、ギ酸、酢酸、プロピオ
ン酸、酪酸、イソ酪酸、吉草酸、イソ吉草酸、シ
ユウ酸、マロン酸、コハク酸、グルタミン酸、マ
レイン酸、フマル酸、シトラコン酸、イタコン
酸、トリカルバリル酸、プロパン−1.1.2.3.−テ
トラカルボン酸、ブタン−1.2.3.4.−テトラカル
ボン酸、グリコール酸、チオグリコール酸、乳
酸、β−ヒドロキシプロピオン酸、リンゴ酸、ク
エン酸、グルコン酸、ピルビル酸、ジグリコール
酸、チオグリコール酸、メルカプトコハク酸、サ
ルチル酸、タイロン、ピリジン−2.3−ジカルボ
ン酸、イミノジ酢酸、ヒドロキシエチルイミノジ
酢酸、ホスホノメチルイミノジ酢酸、ニトリロト
リ酢酸、エチレンジアミンテトラ酢酸、エチレン
ジアミンテトラプロピオン酸、シクロヘキサン−
1.2−ジアミンテトラ酢酸、ジエチレントリアミ
ンペンタ酢酸、グリコールエーテルジアミンテト
ラ酢酸、トリメチレンテトラアミンヘキサ酢酸、
グリシン、サルコシン、β−アラニン、α−アミ
ノ酪酸、アスパラギン酸、グルタミン酸、リン
酸、ピロリン酸、ヘキサメタリン酸、ポリリン
酸、芳香族スルホン酸(たとえばトルエンスルホ
ン酸、ベンゼンスルホン酸、t−ブチルナフタレ
ンスルホン酸、ドデシルジフエニルエーテルジス
ルホン酸、等の酸やその塩、湿潤剤としてエチレ
ングリコール、ジエチレングリコール、トリエチ
レングリコール、ポリエチレングリコール、フエ
ニルグリコール、プロピレングリコール、ソルビ
トール、グリセリン、アラビアゴム等、防腐剤と
してサリチル酸、フエノールパラ安息香酸ブチ
ル、デヒドロ酢酸ナトリウム、4−イソチアゾリ
ン−3−イオン化合物等、その他添加剤として水
溶性染料、コロイダルシリカ、アミン類など適当
量添加して使用する事が出来る。処理液を実施す
るに当たり、処理液のPH値は3〜6の範囲にする
事が好ましい。又、水で希釈して湿し水としても
使用出来る。
<実施例>
以下実施例、比較例にて本発明を詳細に説明す
る。
実施例 1
水 1000重量部
フイチン酸アンモニウム塩(50%水溶液)
100 〃
(NH4)2SO4 80 〃 [Formula] (where R is an alkyl group having 5 or more carbon atoms), C 11 H 23 CONH(CH 2 ) 3 N
( CH3 ) 2COOC2H5 ・Cl, and so on. Among them, benzyl-type quaternary ammonium salts having a benzene ring in the molecule and having a molecular weight of about 100 to 1000 are preferred. Further, examples of organic or inorganic electrolytic compounds having a solubility in water of 10% or more used in the treatment solution of the present invention include formic acid, oxalic acid, sulfuric acid, nitric acid, sulfamic acid,
Examples include alkali metal salts, alkaline earth metal salts, ammonium salts, or organic amine salts of phosphoric acid, polyphosphoric acid, or carbonic acid. Specifically, AgNO 3 , Ba
( NO3 ) 2 , Ba( SO3NH2 ) , Ca( NO3 ) 2 , Ca
( SO3NH2 ) 2 , KHCO3 , KHSO4 , KNO3 ,
LiNO3 , MgCO3 , MgSO4 , NH4CO3 ,
(NH 4 ) 2 SO 4 , NH 4 SO 3 NH 2 , NaCO 3 , NANO 3 ,
NaSO3NH2 , HCOONa , HCOOK,
Examples include NaOOCCOONa, KOOCCOONa, guanidine carbonate, and ammonium carbonate. In addition, reducing salts such as nitrites and sulfites are also included if they are oxidized and converted to nitrates or sulfates. If the solubility of these electrolyte compounds in water is less than 10% by weight, crystals will form if left for a long period of time when used as a treatment solution, which is undesirable. Preferably, the solubility in water is 20% by weight or more. The present invention provides a processing solution with a high etching speed by adding an electrolyte compound consisting of a salt of a specific acid to an ionic complex of an anionic compound and a cationic surfactant. The amount of the above substances constituting the treatment solution of the present invention is such that the amount of the water-soluble anion compound having the ability to form a chelate with zinc ions is 10 to 1000 parts by weight of the treatment solution.
200 parts by weight, more preferably 40 to 75 parts by weight, and 20 to 150 parts by weight of electrolyte compound, more preferably 40 to 75 parts by weight.
100 parts by weight and 0.2 to 20 parts by weight of the cationic surfactant, more preferably 1 to 10 parts by weight. These compounds are dissolved in ion-exchanged water or tap water to prepare the main treatment liquid. Although the order of dissolution is not particularly limited, preferably, after dissolving zinc ions and a water-soluble anionic compound having chelate-forming ability in water, the electrolyte compound is added, and then the cationic surfactant is added. In addition to the above ingredients, the treatment solution contains formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, isovaleric acid, oxalic acid, malonic acid, succinic acid, glutamic acid, and maleic acid as PH adjusters and anti-settling agents. , fumaric acid, citraconic acid, itaconic acid, tricarballylic acid, propane-1.1.2.3.-tetracarboxylic acid, butane-1.2.3.4.-tetracarboxylic acid, glycolic acid, thioglycolic acid, lactic acid, β-hydroxypropionic acid , malic acid, citric acid, gluconic acid, pyruvic acid, diglycolic acid, thioglycolic acid, mercaptosuccinic acid, salicylic acid, tyron, pyridine-2,3-dicarboxylic acid, iminodiacetic acid, hydroxyethyliminodiacetic acid, phosphonomethylimino Diacetic acid, nitrilotriacetic acid, ethylenediaminetetraacetic acid, ethylenediaminetetrapropionic acid, cyclohexane
1.2-diaminetetraacetic acid, diethylenetriaminepentaacetic acid, glycol ether diaminetetraacetic acid, trimethylenetetraaminehexaacetic acid,
Glycine, sarcosine, β-alanine, α-aminobutyric acid, aspartic acid, glutamic acid, phosphoric acid, pyrophosphoric acid, hexametaphosphoric acid, polyphosphoric acid, aromatic sulfonic acids (e.g. toluenesulfonic acid, benzenesulfonic acid, t-butylnaphthalenesulfonic acid) , dodecyl diphenyl ether disulfonic acid, etc., acids and their salts, wetting agents such as ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, phenyl glycol, propylene glycol, sorbitol, glycerin, gum arabic, etc., preservatives such as salicylic acid, Butyl phenol parabenzoate, sodium dehydroacetate, 4-isothiazoline-3-ion compound, etc., and other additives such as water-soluble dyes, colloidal silica, amines, etc. can be added in appropriate amounts.Execute the treatment solution. In this case, it is preferable that the PH value of the treatment liquid is in the range of 3 to 6.It can also be used as a dampening solution by diluting it with water. Example 1 Water 1000 parts by weight Ammonium phytate salt (50% aqueous solution)
100 〃 (NH 4 ) 2 SO 4 80 〃
【式】 10 〃
サリチル酸 1 〃
グリセリン 200 〃
アンモニア水を加えPH4.2に調整する。
実施例 2
水 1000重量部
フイチン酸マグネシウム(50%水溶液)
100 〃
K2SO4 50 〃 [Formula] 10 〃 Salicylic acid 1 〃 Glycerin 200 〃 Add ammonia water and adjust to PH4.2. Example 2 Water 1000 parts by weight Magnesium phytate (50% aqueous solution)
100 〃 K 2 SO 4 50 〃
【式】 5 〃
ジエチレントリアミンペンタ酢酸 10 〃
エチレングリコール 100 〃
デヒドロ酢酸ナトリウム 1 〃
アンモニア水を加えPH4.2に調整する。
実施例 3
水 1000重量部
ポリビニールアルコール硫酸エステル
100 〃
NH4SO3NH2 50 〃 [Formula] 5 〃 Diethylenetriaminepentaacetic acid 10 〃 Ethylene glycol 100 〃 Sodium dehydroacetate 1 〃 Add ammonia water and adjust the pH to 4.2. Example 3 Water 1000 parts by weight Polyvinyl alcohol sulfate ester
100 〃 NH 4 SO 3 NH 2 50 〃
【式】
5 〃
フエノールパラ安息香酸ブチル 0.5 〃
ポリアクリル酸ナトリウム 100 〃
グリコール酸を加えPH4.5に調整する。
実施例 4
水 1000重量部
ビニルホスホン酸重合体(40%水溶液)
100 〃
HCOONa 60 〃 [Formula] 5 〃 Butyl phenol parabenzoate 0.5 〃 Sodium polyacrylate 100 〃 Add glycolic acid and adjust the pH to 4.5. Example 4 Water 1000 parts by weight Vinylphosphonic acid polymer (40% aqueous solution)
100 〃 HCOONa 60 〃
【式】 5 〃
1、2−ベンゾイソチアゾロン−3−オン
0.5 〃
グリセリン 100 〃
リン酸を加えPH4.5に調整する。
比較例 1
水 1000重量部
フイチン酸アンモニウム(50%水溶液)
100 〃
(NH4)2SO4 80 〃
サリチル酸 1 〃
グリセリン 200 〃
リン酸を加えてPH4.20に調整する。
比較例 2
水 1000重量部
フイチン酸マグネシウム(50%水溶液)
100 〃
K2SO4 50 〃
C8H17SO3
Na
10 〃
グリセリン 200 〃
アンモニア水を加えPH4.5に調整する。
比較例 3
水 1000 〃
2−ヒドロキシメタアクリル酸エステル重合体
(40%水溶液) 100 〃
NH4NO3 80 〃
C18H17N
(CH3)2CH2COO
7 〃
トルエンスルホン酸 10 〃
グリセリン 100重量部
NaOHを加えPH4.5に調整する。
酸化亜鉛〜樹脂分散系の電子写真感光材料に、
常法に従い画像形成後、上記の処理液で各々高速
エツチング処理してオフセツト原板とし、湿し水
に各々の処理液を水で5倍に希釈したものを用い
て印刷を行つた。その結果を下表に示す。[Formula] 5 〃 1,2-Benzisothiazolone-3-one
0.5 〃 Glycerin 100 〃 Add phosphoric acid and adjust to PH4.5. Comparative example 1 Water 1000 parts by weight Ammonium phytate (50% aqueous solution)
100 〃 (NH 4 ) 2 SO 4 80 〃 Salicylic acid 1 〃 Glycerin 200 〃 Add phosphoric acid and adjust to PH4.20. Comparative Example 2 Water 1000 parts by weight Magnesium phytate (50% aqueous solution)
100 〃 K 2 SO 4 50 〃 C 8 H 17 SO 3 Na 10 〃 Glycerin 200 〃 Add ammonia water and adjust to PH4.5. Comparative Example 3 Water 1000 〃 2-Hydroxymethacrylic acid ester polymer (40% aqueous solution) 100 〃 NH 4 NO 3 80 〃 C 18 H 17 N (CH 3 ) 2 CH 2 COO 7 〃 Toluenesulfonic acid 10 〃 Glycerin 100 Weight part: Add NaOH and adjust to PH4.5. Zinc oxide to resin dispersion electrophotographic materials,
After image formation according to a conventional method, each was subjected to high-speed etching treatment using the above-mentioned processing liquids to prepare an offset original plate, and printing was carried out using a dampening solution diluted 5 times with water. The results are shown in the table below.
【表】
表から判るように実施例1〜4に示した本発明
の処理液は成膜速度が早いので高速エツチング処
理しても10000枚以上の印刷で、印刷物には地汚
れもなくインキ付着性も良好で網点塊調のつぶれ
のない鮮明な画像が得られた。しかしカチオン物
質を含まない比較例1、および陰イオン性活性
剤、両性イオン性の活性剤を用いた比較例2〜3
は1枚目から地汚れを生じ、インキ分離性も悪く
印刷不可能であつた。
<発明の効果>
以上説明した如く本発明のオフセツト印刷用不
感脂化処理液は、公害問題を内在するフエロシア
ン、フエリシアン化合物を含むことなく、成膜速
度が著しく向上したので高速エツチング処理によ
つても地汚れや網点階調のつぶれの出ないすぐれ
たオフセツト印刷が可能となつた。[Table] As can be seen from the table, the processing solutions of the present invention shown in Examples 1 to 4 have a fast film formation rate, so even with high-speed etching, more than 10,000 sheets can be printed without background smearing and ink adhesion. The quality was also good, and clear images with no halftone blockiness were obtained. However, Comparative Example 1 does not contain a cationic substance, and Comparative Examples 2 to 3 use an anionic activator and a zwitterionic activator.
Scratching occurred from the first sheet, and the ink separation was poor, making printing impossible. <Effects of the Invention> As explained above, the desensitizing treatment liquid for offset printing of the present invention does not contain ferrocyan or ferricyanide compounds, which have inherent pollution problems, and the film formation rate has been significantly improved. It has also become possible to perform excellent offset printing without background smudges or halftone gradations.
Claims (1)
特徴とするシアンフリーオフセツト印刷用不感脂
化処理液。 (a) フイチン酸、フイチン酸金属塩、フイチン酸
アンモニウム塩、フイチン酸有機アミン塩、1
位もしくは4位の水酸基が不活性化されている
イノシツトヘキサリン酸エステル誘導体、ビニ
ルスルホン酸(塩)重合体又は共重合体、リン
酸セルロース(塩)、2−ヒドロキシエチル
(メタ)アクリル酸エステル重合体又は共重合
体のリン酸エステル(塩)、2−ヒドロキシプ
ロピル(メタ)アクリル酸エステル重合体又は
共重合体のリン酸エステル(塩)から選ばれた
少なくとも1種の亜鉛イオンとキレート形成能
を有するアニオン化合物。 (b) カチオン界面活性剤 (c) ギ酸、修酸、硫酸、硝酸、スルフアミン酸、
リン酸、ポリリン酸もしくは炭酸の、アルカリ
金属塩、アリカリ土金属塩、アンモニウム塩ま
たは有機アミン塩から選ばれた少なくとも1種
の常温における水に対する溶解度が10%以上の
電解質化合物。[Scope of Claims] 1. A desensitizing liquid for cyan-free offset printing, characterized by containing the following (a), (b) and (c) as active ingredients. (a) Phytic acid, phytic acid metal salt, phytic acid ammonium salt, phytic acid organic amine salt, 1
Inositohexalic acid ester derivatives, vinyl sulfonic acid (salt) polymers or copolymers, cellulose phosphate (salt), 2-hydroxyethyl (meth)acrylic acid, in which the hydroxyl group at position or 4-position is inactivated. Chelate with at least one zinc ion selected from phosphate esters (salts) of ester polymers or copolymers, phosphoric esters (salts) of 2-hydroxypropyl (meth)acrylic ester polymers or copolymers. Anionic compound with the ability to form. (b) Cationic surfactants (c) Formic acid, oxalic acid, sulfuric acid, nitric acid, sulfamic acid,
An electrolyte compound of at least one selected from alkali metal salts, alkaline earth metal salts, ammonium salts, and organic amine salts of phosphoric acid, polyphosphoric acid, or carbonic acid and having a solubility in water of 10% or more at room temperature.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP491985A JPS61163897A (en) | 1985-01-17 | 1985-01-17 | Desensitizing treatment liquid for offset printing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP491985A JPS61163897A (en) | 1985-01-17 | 1985-01-17 | Desensitizing treatment liquid for offset printing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61163897A JPS61163897A (en) | 1986-07-24 |
JPH0517878B2 true JPH0517878B2 (en) | 1993-03-10 |
Family
ID=11597021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP491985A Granted JPS61163897A (en) | 1985-01-17 | 1985-01-17 | Desensitizing treatment liquid for offset printing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61163897A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0662020B2 (en) * | 1987-12-18 | 1994-08-17 | 新王子製紙株式会社 | Lithographic printing plate desensitizing composition |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5615397A (en) * | 1979-07-16 | 1981-02-14 | Hoechst Co American | Water flat board finishing agent and method of finishing developed flat board |
JPS56117691A (en) * | 1980-02-21 | 1981-09-16 | Ricoh Co Ltd | Insensitive aliphatization of flat printing plate |
JPS572796A (en) * | 1980-06-10 | 1982-01-08 | Tomoegawa Paper Co Ltd | Processing liquid for offset printing |
JPS5720394A (en) * | 1980-07-11 | 1982-02-02 | Tomoegawa Paper Co Ltd | Insensitive fatting treating liquid for offset printing block |
JPS5729496A (en) * | 1980-07-29 | 1982-02-17 | Ricoh Co Ltd | Treating liquid for lithographic printing plate |
JPS57199694A (en) * | 1981-06-03 | 1982-12-07 | Oji Paper Co Ltd | Treating liquid for planographic printing plate |
JPS60236796A (en) * | 1984-05-10 | 1985-11-25 | Ricoh Co Ltd | Desensitizing liquid for planography |
-
1985
- 1985-01-17 JP JP491985A patent/JPS61163897A/en active Granted
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5615397A (en) * | 1979-07-16 | 1981-02-14 | Hoechst Co American | Water flat board finishing agent and method of finishing developed flat board |
JPS56117691A (en) * | 1980-02-21 | 1981-09-16 | Ricoh Co Ltd | Insensitive aliphatization of flat printing plate |
JPS572796A (en) * | 1980-06-10 | 1982-01-08 | Tomoegawa Paper Co Ltd | Processing liquid for offset printing |
JPS5720394A (en) * | 1980-07-11 | 1982-02-02 | Tomoegawa Paper Co Ltd | Insensitive fatting treating liquid for offset printing block |
JPS5729496A (en) * | 1980-07-29 | 1982-02-17 | Ricoh Co Ltd | Treating liquid for lithographic printing plate |
JPS57199694A (en) * | 1981-06-03 | 1982-12-07 | Oji Paper Co Ltd | Treating liquid for planographic printing plate |
JPS60236796A (en) * | 1984-05-10 | 1985-11-25 | Ricoh Co Ltd | Desensitizing liquid for planography |
Also Published As
Publication number | Publication date |
---|---|
JPS61163897A (en) | 1986-07-24 |
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Legal Events
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