JPH0517817A - Hardening device - Google Patents
Hardening deviceInfo
- Publication number
- JPH0517817A JPH0517817A JP17092991A JP17092991A JPH0517817A JP H0517817 A JPH0517817 A JP H0517817A JP 17092991 A JP17092991 A JP 17092991A JP 17092991 A JP17092991 A JP 17092991A JP H0517817 A JPH0517817 A JP H0517817A
- Authority
- JP
- Japan
- Prior art keywords
- hardening
- chamber
- pressure
- cooling
- quenching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Heat Treatments In General, Especially Conveying And Cooling (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、金属の熱処理装置の
加熱装置に連続して設置される焼入装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a quenching device which is continuously installed on a heating device of a metal heat treatment device.
【0002】[0002]
【従来の技術と発明の解決すべき課題】従来、熱処理を
施される被処理物が、多品種にわたる場合、各被処理物
の材質、寸法、形状等や、各被処理物に要求される硬
さ、金属組織および歪み量等の品質に応じて、種類や温
度の異なる液状冷却剤の入れられた焼入冷却液槽を複数
用意しておき、各被処理物に応じた冷却剤を用いて焼入
れを行っていた。2. Description of the Related Art Conventionally, when there are many kinds of objects to be heat-treated, the material, size, shape, etc. of each object to be processed and each object to be processed are required. Depending on the quality such as hardness, metal structure and amount of strain, prepare multiple quenching cooling liquid tanks containing liquid cooling agents of different types and temperatures, and use the cooling agent suitable for each workpiece. I was quenching.
【0003】しかしながら、従来の方法では設備コスト
および操業コストが高くなるとともに、大きな設置スペ
ースが必要になるという問題があった。しかも、全自動
ラインの場合、搬送経路が複雑になるという問題があっ
た。However, the conventional method has a problem that the equipment cost and the operating cost are high and a large installation space is required. Moreover, in the case of a fully automatic line, there is a problem that the transport route becomes complicated.
【0004】さらに、従来の方法によっても、被処理物
の焼入後の状態は、冷却剤の種類により決まるので、硬
さ、金属組織および歪み量等の品質を微妙に調節するこ
とができないという問題があった。すなわち、これらの
品質は、冷却時間と温度との関係を表す冷却曲線により
決定される。たとえば図3に実線(A)で示すように、冷
却の第1段階(X) では、冷却剤の蒸気膜が被処理物の全
面を覆うので冷却速度は遅く、ついで所定の特性温度に
なると第2段階(Y) に移行して冷却速度は急激に大きく
なり、その後対流により冷却が進む第3段階(Z) に移行
して冷却速度は最も遅くなる(Cの部分)。そして、各
段階の時間、冷却速度、および開始または終了温度を変
更することによって上記品質が変わる。ところが、冷却
剤の種類によって冷却曲線は決まるので、硬さ、金属組
織および歪み量等の品質を微妙に調節することができな
いそこで、この問題を解決するために、冷却剤を撹拌
または噴射により流動させたり、前もって冷却剤の温
度を変更したり、水溶性冷却剤を用いた場合にはその
濃度を変化させたりすることが考えられている。Further, even by the conventional method, the state after quenching of the object to be treated is determined by the kind of the cooling agent, so that the quality such as hardness, metallographic structure and strain amount cannot be finely adjusted. There was a problem. That is, these qualities are determined by a cooling curve that represents the relationship between cooling time and temperature. For example, as shown by the solid line (A) in FIG. 3, in the first stage (X) of cooling, the vapor film of the coolant covers the entire surface of the object to be treated, so that the cooling rate is slow, and then the predetermined characteristic temperature is reached. The cooling rate increases sharply after shifting to the second stage (Y), and then to the third stage (Z) where cooling proceeds by convection, the cooling rate becomes the slowest (part C). The quality is changed by changing the time of each stage, the cooling rate, and the start or end temperature. However, since the cooling curve is determined by the type of coolant, it is not possible to delicately adjust the quality such as hardness, metallurgical structure and strain amount.Therefore, in order to solve this problem, the coolant is agitated or jetted to flow. It is considered that the temperature of the coolant is changed in advance, or that the concentration of the water-soluble coolant is changed when the coolant is used.
【0005】しかしながら、の方法では、冷却剤の均
一な流速を得られず、被処理物の歪みが大きくなるとい
う問題がある。の方法では、温度の変更のために長時
間を要するとともに硬化の程度に制限を受けるという問
題がある。の方法では、冷却剤の種類を変更するのと
同じで、各被処理物ごとに対応できないという問題があ
る。However, the method (1) has a problem that a uniform flow velocity of the coolant cannot be obtained and the strain of the object to be treated becomes large. The method (1) has a problem that it takes a long time to change the temperature and the degree of curing is limited. This method is the same as changing the type of the coolant, and has a problem that it cannot be applied to each object to be treated.
【0006】この発明の目的は、上記問題を解決した焼
入装置を提供することにある。An object of the present invention is to provide a quenching device that solves the above problems.
【0007】[0007]
【課題を解決するための手段】この発明による焼入装置
は、密閉構造とされた焼入室内に焼入冷却液槽が設けら
れ、焼入室に、焼入室内の圧力を制御する圧力制御装置
が設けられているものである。In a quenching apparatus according to the present invention, a quenching cooling liquid tank is provided in a quenching chamber having a closed structure, and a pressure control device for controlling the pressure in the quenching chamber. Is provided.
【0008】[0008]
【作用】焼入時に、焼入室内の圧力を変動させると、冷
却剤の種類を変えることなく、上記冷却曲線を任意に変
化させることができる。When the pressure in the quenching chamber is changed during quenching, the cooling curve can be arbitrarily changed without changing the kind of the coolant.
【0009】[0009]
【実施例】以下、この発明の実施例を、図面を参照して
説明する。Embodiments of the present invention will be described below with reference to the drawings.
【0010】図1および図2は、この発明による焼入装
置の1実施例を示す。1 and 2 show an embodiment of a quenching apparatus according to the present invention.
【0011】図1および図2において、焼入装置は、加
熱装置の加熱室(1)に連なって設けられかつ密閉構造と
された焼入室(2) を備えている。加熱室(1) の出口(1
a)、焼入室(2) の入口(2a)および同出口(2b)にはそれぞ
れ可動扉(3)(4)(5) が設けられている。焼入室(2) の入
口(2a)および同出口(2b)に設けられた可動扉(4)(5)は、
閉鎖時にそれぞれロック装置(6) により入口(2a)および
出口(2b)の周縁部に押し付けられるようになっており、
このとき入口(2a)および出口(2b)の周縁部との間に配置
されたOリング(7) によって焼入室(2) が密閉構造とさ
れる。In FIGS. 1 and 2, the quenching apparatus includes a quenching chamber (2) which is connected to the heating chamber (1) of the heating device and has a closed structure. Exit (1) of heating chamber (1)
a), the entrance (2a) and the exit (2b) of the quenching chamber (2) are provided with movable doors (3), (4) and (5), respectively. The movable doors (4) and (5) provided at the entrance (2a) and the exit (2b) of the quenching chamber (2) are
It is designed to be pressed against the peripheral portions of the inlet (2a) and the outlet (2b) by the lock device (6) when closed.
At this time, the quenching chamber (2) is sealed by the O-ring (7) arranged between the inlet (2a) and the peripheral edge of the outlet (2b).
【0012】焼入室(2) 内の下部には焼入冷却液槽(8)
が設けられており、この中に液状冷却剤(9) が入れられ
ている。焼入冷却液槽(8) には、冷却剤(9) を流動させ
る撹拌機(11)が配置されている。また、図示は省略した
が、焼入冷却液槽(8) には冷却剤(9) の温度調節装置が
設けられている。焼入室(2) 内には、上部空間(12)と焼
入冷却液槽(8) 内との間で上下動するエレベータ(13)が
設けられている。At the bottom of the quenching chamber (2) is a quenching cooling liquid tank (8)
Is provided in which the liquid coolant (9) is placed. The quenching cooling liquid tank (8) is provided with a stirrer (11) for flowing the coolant (9). Although not shown, the quenching cooling liquid tank (8) is provided with a temperature control device for the coolant (9). In the quenching chamber (2), there is provided an elevator (13) which moves up and down between the upper space (12) and the quenching cooling liquid tank (8).
【0013】焼入室(2) には、焼入室(2) の上部空間(1
2)内の圧力を調整する圧力調整装置が設けられている。
圧力調整装置は、図1に示すように、焼入室(2) の上部
空間(12)内の圧力を検知する圧力センサ(15)と、焼入室
(2) にアクチュエータ付き排気弁(16)を介して接続され
た真空ポンプ(17)と、同じく焼入室(2) にアクチュエー
タ付き不活性ガス供給弁(18)を介して接続された高圧不
活性ガスタンク(19)と、アクチュエータ付きリーク弁(2
1)とを備えている。圧力センサ(15)、排気弁(16)、不活
性ガス供給弁(18)およびリーク弁(21)は、プログラムコ
ントローラ(22)に接続されている。プログラムコントロ
ーラ(22)には、予め小型の実験装置で求められた被処理
物(W) の要求品質を満たす冷却曲線を得るための圧力条
件が入力されている。なお、焼入室(2) には安全弁(23)
が設けられている。The quenching chamber (2) has a space (1) above the quenching chamber (2).
2) A pressure adjusting device for adjusting the pressure inside is provided.
As shown in FIG. 1, the pressure adjusting device includes a pressure sensor (15) for detecting the pressure in the upper space (12) of the quenching chamber (2) and a quenching chamber (2).
A vacuum pump (17) connected to (2) via an exhaust valve (16) with an actuator, and a high pressure inert gas also connected to the quenching chamber (2) via an inert gas supply valve (18) with an actuator. Gas tank (19) and leak valve with actuator (2
1) and are provided. The pressure sensor (15), the exhaust valve (16), the inert gas supply valve (18) and the leak valve (21) are connected to the program controller (22). The program controller (22) is input with pressure conditions for obtaining a cooling curve satisfying the required quality of the object to be processed (W), which is obtained in advance by a small-sized experimental device. A safety valve (23) is installed in the quenching chamber (2).
Is provided.
【0014】このような構成において、加熱室(1) の出
口(1a)および焼入室(2) の入口(2a)の可動扉(3)(4)が開
かれ、加熱室(1) において加熱された被処理物(W) が焼
入室(2) の上部空間(12)内に搬入され、上昇位置にある
エレベータ(13)上に載せられる。そして、可動扉(3)(4)
が閉められ、焼入室(2) 内が密閉状態とされる。つい
で、エレベータ(13)が下降し、被処理物(W) が冷却剤
(9) 中に浸漬される。焼入室(2) 内が密閉状態とされた
後、被処理物(W) が冷却剤(9) 中に浸漬される前または
後に、圧力調整装置により焼入室(2) 内が所定の圧力と
され、その圧力で所定時間保持される。その後、プログ
ラムコントローラ(22)に予め入力されていた条件に基い
て、排気弁(16)、不活性ガス供給弁(18)およびリーク弁
(21)が開閉されて加圧および/または減圧され、焼入室
(2) 内の圧力が変化させられる。冷却が終了すると、エ
レベータ(13)が上昇し、出口(2b)の可動扉(5) が開かれ
て搬出される。In such a structure, the movable doors (3) and (4) at the outlet (1a) of the heating chamber (1) and the inlet (2a) of the quenching chamber (2) are opened to heat the heating chamber (1). The processed object (W) is carried into the upper space (12) of the quenching chamber (2) and placed on the elevator (13) in the raised position. And movable door (3) (4)
Is closed and the quenching chamber (2) is sealed. Then, the elevator (13) descends and the object to be processed (W) becomes the coolant.
(9) Immersed in. After the inside of the quenching chamber (2) is sealed, before or after the workpiece (W) is immersed in the coolant (9), the quenching chamber (2) is kept at a predetermined pressure with a pressure regulator. The pressure is maintained for a predetermined time. After that, the exhaust valve (16), the inert gas supply valve (18) and the leak valve are
(21) is opened and closed to pressurize and / or depressurize, and the quenching chamber
(2) The pressure inside is changed. When the cooling is completed, the elevator (13) rises and the movable door (5) at the exit (2b) is opened to carry it out.
【0015】上記において、焼入室(2) 内が常圧(1ba
r )のとき、被処理物(W) の冷却曲線は図3に実線(A)
で示すようになる。焼入室(2) 内を加圧していくと、第
1段階(X) での冷却速度が大きくなるとともに第1段階
(X) の時間が短くなり、しかも第3段階(Z) の冷却速度
が小さくなる。2bar および5bar のときの冷却曲線を
実線(B) および(C) で示すようになる。逆に、焼入室
(2) 内を減圧していくと、第1段階(X) での冷却速度が
小さくなるとともに第1段階(X) の時間が長くなり、し
かも第3段階(Z) の冷却速度が大きくなる。0.5bar
および0.1barのときの冷却曲線を実線(D) および(E)
で示すようになる。そして、冷却が終了するまでに焼
入室(2) 内の圧力を、加圧状態と減圧状態とが適当に組
合さるように調整することによって、冷却曲線を図3に
実線のハッチングを付した部分で任意に変化させること
が可能になる。したがって、被処理物(W) に要求される
品質を付与することができる。In the above, the inside of the quenching chamber (2) is at normal pressure (1 ba
r), the cooling curve of the object to be processed (W) is shown by the solid line (A) in Fig. 3.
As shown in. When the pressure in the quenching chamber (2) is increased, the cooling rate in the first stage (X) increases and the first stage
The time of (X) becomes shorter and the cooling rate of the third stage (Z) becomes smaller. The cooling curves at 2 bar and 5 bar are shown by solid lines (B) and (C). Conversely, the quenching room
(2) As the pressure inside is reduced, the cooling rate in the first stage (X) decreases, the time in the first stage (X) becomes longer, and the cooling rate in the third stage (Z) increases. .. 0.5 bar
And the cooling curves at 0.1 bar are shown by the solid lines (D) and (E).
As shown in. Then, by adjusting the pressure in the quenching chamber (2) until the cooling is completed so that the pressurized state and the depressurized state are properly combined, the cooling curve is shown in FIG. Can be changed arbitrarily. Therefore, the required quality can be imparted to the object to be processed (W).
【0016】上記実施例において、焼入室(2) と真空ポ
ンプ(17)とを接続する管に、排気弁(16)をまたがるよう
にバイパス管を接続しておき、このバイパス管に排気弁
(16)よりも容量の小さいアクチュエータ付き弁を設けて
おくのがよい。また、焼入室(2) と高圧不活性ガスタン
ク(19)とを接続する管に、供給弁(18)をまたがるように
バイパス管を接続しておき、このバイパス管に供給弁(1
8)よりも容量の小さいアクチュエータ付き弁を設けてお
くのがよい。これらの弁もプログラムコントローラ(22)
に接続しておく。こうすれば、焼入室(2) 内圧力の微調
整が可能となる。In the above embodiment, a bypass pipe is connected to the pipe connecting the quenching chamber (2) and the vacuum pump (17) so as to straddle the exhaust valve (16), and the exhaust valve is connected to this bypass pipe.
It is better to provide a valve with an actuator that has a smaller capacity than (16). Further, a bypass pipe is connected to the pipe connecting the quenching chamber (2) and the high-pressure inert gas tank (19) so as to straddle the supply valve (18), and the supply valve (1
It is better to install a valve with an actuator that has a smaller capacity than 8). These valves are also program controllers (22)
Connected to. This allows fine adjustment of the pressure inside the quenching chamber (2).
【0017】[0017]
【発明の効果】この発明の焼入装置によれば、冷却剤の
種類を変えることなく、上記冷却曲線を任意に変化させ
ることができる。したがって、被処理物が多品種にわた
った場合にも、各被処理物に、これに応じた品質を付与
することができる。According to the quenching apparatus of the present invention, the cooling curve can be arbitrarily changed without changing the kind of the coolant. Therefore, even when there are many kinds of objects to be processed, it is possible to give quality to each object to be processed.
【図1】この発明の焼入装置の実施例を示す概略正面図
である。FIG. 1 is a schematic front view showing an embodiment of a quenching apparatus of the present invention.
【図2】この発明の焼入装置の実施例を示す概略側面図
である。FIG. 2 is a schematic side view showing an embodiment of the quenching apparatus of the present invention.
【図3】焼入室内の圧力を変化させた場合の冷却曲線を
示すグラフである。FIG. 3 is a graph showing a cooling curve when the pressure in the quenching chamber is changed.
2 焼入室 8 焼入冷却液槽 2 Quenching room 8 Quenching cooling liquid tank
Claims (1)
槽が設けられ、焼入室に、焼入室内の圧力を制御する圧
力制御装置が設けられている焼入装置。Claim: What is claimed is: 1. A quenching cooling liquid tank is provided in a quenching chamber having a closed structure, and a quenching chamber is provided with a pressure control device for controlling the pressure in the quenching chamber. Input device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3170929A JP3069748B2 (en) | 1991-07-11 | 1991-07-11 | Quenching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3170929A JP3069748B2 (en) | 1991-07-11 | 1991-07-11 | Quenching method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0517817A true JPH0517817A (en) | 1993-01-26 |
JP3069748B2 JP3069748B2 (en) | 2000-07-24 |
Family
ID=15913982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3170929A Expired - Fee Related JP3069748B2 (en) | 1991-07-11 | 1991-07-11 | Quenching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3069748B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003213328A (en) * | 2002-01-22 | 2003-07-30 | Idemitsu Kosan Co Ltd | Quenching method |
WO2005098055A1 (en) | 2004-04-07 | 2005-10-20 | Oriental Engineering Co., Ltd. | Metal part cooling method, metal part producing method, and metal part cooling device |
WO2016080197A1 (en) * | 2014-11-20 | 2016-05-26 | 株式会社Ihi | Heat treatment device and cooling device |
-
1991
- 1991-07-11 JP JP3170929A patent/JP3069748B2/en not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003213328A (en) * | 2002-01-22 | 2003-07-30 | Idemitsu Kosan Co Ltd | Quenching method |
US7503985B2 (en) * | 2002-01-22 | 2009-03-17 | Idemitsu Kosan Co., Ltd. | Quenching method |
WO2005098055A1 (en) | 2004-04-07 | 2005-10-20 | Oriental Engineering Co., Ltd. | Metal part cooling method, metal part producing method, and metal part cooling device |
JPWO2005098055A1 (en) * | 2004-04-07 | 2008-02-28 | オリエンタルエンヂニアリング株式会社 | Metal part cooling method, metal part manufacturing method, and metal part cooling apparatus |
WO2016080197A1 (en) * | 2014-11-20 | 2016-05-26 | 株式会社Ihi | Heat treatment device and cooling device |
JPWO2016080197A1 (en) * | 2014-11-20 | 2017-04-27 | 株式会社Ihi | Heat treatment device and cooling device |
CN107075599A (en) * | 2014-11-20 | 2017-08-18 | 株式会社Ihi | Annealing device and cooling device |
DE112015005248B4 (en) | 2014-11-20 | 2019-07-11 | Ihi Corporation | HEAT TREATMENT DEVICE AND COOLING DEVICE |
US10392676B2 (en) | 2014-11-20 | 2019-08-27 | Ihi Corporation | Heat treatment device and cooling device |
Also Published As
Publication number | Publication date |
---|---|
JP3069748B2 (en) | 2000-07-24 |
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