JPH05174372A - Production of magnetic recording medium - Google Patents

Production of magnetic recording medium

Info

Publication number
JPH05174372A
JPH05174372A JP33923991A JP33923991A JPH05174372A JP H05174372 A JPH05174372 A JP H05174372A JP 33923991 A JP33923991 A JP 33923991A JP 33923991 A JP33923991 A JP 33923991A JP H05174372 A JPH05174372 A JP H05174372A
Authority
JP
Japan
Prior art keywords
film
magnetic recording
protective film
recording medium
lubricating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33923991A
Other languages
Japanese (ja)
Inventor
Takaaki Hamada
隆明 濱田
Shinichi Yasuda
晋一 保田
Junya Tada
準也 多田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP33923991A priority Critical patent/JPH05174372A/en
Publication of JPH05174372A publication Critical patent/JPH05174372A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide the process for production of the magnetic recording medium which can improve the wear resistance of the magnetic recording medium and the attraction of a magnetic head to the surface of the magnetic recording medium. CONSTITUTION:A lubricating film 5 is formed by an applying method, such as spin coating method, for >=1 hours and within 6 hours after the end of the formation of a protective film 4 in the process for production of the magnetic recording medium having the protective film 4 for protecting a magnetic recording layer 3 on a substrate 1 and the lubricating film 5 provided thereon. The lubricating film 5 is formed under such conditions, by which the fluctuation from the correct value of the film thickness at the time of forming the lubricating film is minimized. Consequently, the wear resistance of the magnetic recording medium is improved and the attraction of the magnetic head to the magnetic recording medium surface is decreased.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、非磁性基板上に磁気記
録層と保護膜並びに潤滑膜を備えCSS方式(コンタク
ト・スタート・アンド・ストップ方式)を採用した磁気
ディスク装置等に適用される磁気記録媒体の製造方法に
係り、特に、上記潤滑膜形成時の膜厚についてその適正
値からの変動を抑え、磁気記録媒体の耐摩耗性と磁気記
録媒体面に対する磁気ヘッドの吸着現象を改善できる磁
気記録媒体の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to a magnetic disk device or the like which has a CSS system (contact start and stop system) provided with a magnetic recording layer, a protective film and a lubricating film on a non-magnetic substrate. The present invention relates to a method for manufacturing a magnetic recording medium, and in particular, it is possible to suppress the variation of the film thickness when the lubricating film is formed from an appropriate value, and improve the wear resistance of the magnetic recording medium and the adsorption phenomenon of the magnetic head on the surface of the magnetic recording medium. The present invention relates to a method for manufacturing a magnetic recording medium.

【0002】[0002]

【従来の技術】情報処理システムにおける外部記憶装置
の中で、上記CSS方式(コンタクト・スタート・アン
ド・ストップ方式)を採用した磁気ディスク装置等に適
用される磁気記録媒体においては、非操作時に上記磁気
記録媒体と磁気ヘッド面とが面接触し、また、操作開始
時と停止時において磁気記録媒体と磁気ヘッド面とが接
触摺動する。
2. Description of the Related Art Among external storage devices in an information processing system, a magnetic recording medium applied to a magnetic disk device or the like adopting the above-mentioned CSS system (contact start and stop system) is used when it is not operated. The magnetic recording medium and the magnetic head surface are in surface contact with each other, and the magnetic recording medium and the magnetic head surface are in sliding contact with each other when the operation is started and stopped.

【0003】そこで、非操作時における磁気記録媒体面
への磁気ヘッドの吸着現象を防止し、かつ、接触摺動時
における磁気記録媒体と磁気ヘッド双方のダメージを最
小にしてその耐久性を向上させるため、従来においては
上記非磁性基板を粗面化処理しこの粗面化処理に伴って
保護膜表面が粗面状態になっている磁気記録媒体が適用
されている。
Therefore, the phenomenon of attraction of the magnetic head to the surface of the magnetic recording medium during non-operation is prevented, and damage to both the magnetic recording medium and the magnetic head during contact sliding is minimized to improve its durability. Therefore, conventionally, a magnetic recording medium is used in which the non-magnetic substrate is roughened and the surface of the protective film is roughened by the roughening.

【0004】すなわち、この種の磁気記録媒体を製造す
るには、非磁性基板表面に対しラップ加工、ポリッシュ
加工、及び、テクスチャ加工等一連の表面処理を施して
その表面を粗面化した後、粗面化処理された非磁性基板
上に磁気記録層を成膜し、かつ、この磁気記録層上にこ
れを保護するためのカーボン、SiO2 等から成る保護
膜を成膜する。このとき、保護膜表面には上記非磁性基
板の粗面状態に対応した微小突起が多数形成されてしま
うため、この表面を研磨テープを用い研磨処理して上記
微小突起を除去すると共に、クリーニングテープを用い
上記保護膜表面をクリーニング処理して研磨処理にて削
り取られた微小突起の研磨くず等を取り除く。
That is, in order to manufacture this kind of magnetic recording medium, a series of surface treatments such as lapping, polishing and texturing are applied to the surface of the non-magnetic substrate to roughen the surface, A magnetic recording layer is formed on a roughened non-magnetic substrate, and a protective film made of carbon, SiO 2 or the like for protecting the magnetic recording layer is formed on the magnetic recording layer. At this time, a large number of minute projections corresponding to the rough surface state of the non-magnetic substrate are formed on the surface of the protective film. Therefore, the surface is polished with a polishing tape to remove the minute projections and a cleaning tape. The surface of the protective film is subjected to a cleaning treatment by using to remove the polishing dust and the like of the fine projections scraped off by the polishing treatment.

【0005】次いで、クリーニング処理された保護膜上
にスピンコート法等の塗布手段によりフロロカーボン系
の潤滑剤を塗布して潤滑膜を形成し、かつ、バーニッシ
ュヘッドを用いて潤滑膜が形成された磁気記録媒体表面
に付着する塵埃等の付着物を除去した後、グライドハイ
トテスト(glide height test…ヘッド滑走特性試験)を
行って所定の規格に適合した磁気記録媒体を製造してい
る。
Then, a fluorocarbon type lubricant was applied to the cleaned protective film by a coating means such as a spin coat method to form a lubricating film, and the lubricating film was formed using a burnish head. After removing dusts and other deposits adhering to the surface of the magnetic recording medium, a glide height test (head sliding characteristic test) is performed to manufacture a magnetic recording medium conforming to a predetermined standard.

【0006】[0006]

【発明が解決しようとする課題】ところで、上記保護膜
上に形成される潤滑膜についてはその膜厚が適正な値よ
り薄くなると、磁気ヘッドが接触摺動する際に磁気記録
媒体に損傷を与え易くなり磁気記録媒体の耐摩耗性が劣
化してしまうことが知られている。
By the way, when the thickness of the lubricating film formed on the protective film is smaller than an appropriate value, the magnetic recording medium is damaged when the magnetic head slides in contact with it. It is known that it becomes easy and the wear resistance of the magnetic recording medium deteriorates.

【0007】他方、上記潤滑膜の膜厚が適正値よりも厚
くなると、磁気記録媒体面上で磁気ヘッドが静止してい
る際に余剰の潤滑剤が磁気記録媒体と磁気ヘッド間に入
り込み易く、この結果、磁気ヘッドが磁気記録媒体面に
吸着されてしまいその起動時に磁気記録媒体の磁気記録
層や保護膜が剥離したり磁気ヘッドが損傷し易いことも
知られている。
On the other hand, if the thickness of the lubricating film becomes thicker than an appropriate value, excess lubricant easily enters between the magnetic recording medium and the magnetic head when the magnetic head is stationary on the surface of the magnetic recording medium, As a result, it is also known that the magnetic head is attracted to the surface of the magnetic recording medium, and the magnetic recording layer and the protective film of the magnetic recording medium are peeled off or the magnetic head is easily damaged when the magnetic head is activated.

【0008】そこで、磁気記録媒体や磁気ヘッド等の耐
久性を確保するためには上記保護膜上に形成する潤滑膜
の膜厚を適正な値に設定しその膜厚の変動を極力抑える
ことが重要となる。
Therefore, in order to ensure the durability of the magnetic recording medium, the magnetic head, etc., it is necessary to set the film thickness of the lubricating film formed on the protective film to an appropriate value and suppress the fluctuation of the film thickness as much as possible. It becomes important.

【0009】しかし、上記保護膜の表面状態とこの保護
膜上に塗布形成される潤滑膜の膜厚との関係については
未だ十分に解明されておらず、従って、潤滑膜の膜厚を
適正値に設定する際の塗布条件設定には困難が伴うた
め、結果として保護膜上に形成される潤滑膜の膜厚がそ
の適正値から大きく変動し易い問題点があった。
However, the relationship between the surface condition of the protective film and the film thickness of the lubricating film formed by coating on the protective film has not yet been sufficiently clarified. Since there is difficulty in setting the coating conditions when setting the above value, there is a problem that the film thickness of the lubricating film formed on the protective film is likely to largely fluctuate from its proper value.

【0010】このため、潤滑膜の膜厚が適正値より薄く
なり過ぎると上述したように磁気記録媒体の耐摩耗性が
劣化し易く、また、適正値より厚くなり過ぎると磁気記
録媒体や磁気ヘッドが共に損傷し易くなるといった問題
点があった。
Therefore, if the thickness of the lubricating film is too thin than the proper value, the wear resistance of the magnetic recording medium is apt to be deteriorated as described above, and if it is too thick than the proper value, the magnetic recording medium and the magnetic head are too thick. However, there is a problem that both are easily damaged.

【0011】本発明はこの様な問題点に着目してなされ
たもので、その課題とするところは、潤滑膜形成時の膜
厚についてその適正値からの変動を抑え磁気記録媒体の
耐摩耗性と磁気ヘッドの吸着現象を改善できる磁気記録
媒体の製造方法を提供することにある。
The present invention has been made by paying attention to such a problem, and an object thereof is to suppress the variation of the film thickness at the time of forming the lubricating film from its proper value and to improve the wear resistance of the magnetic recording medium. Another object of the present invention is to provide a method of manufacturing a magnetic recording medium that can improve the attraction phenomenon of a magnetic head.

【0012】[0012]

【課題を解決するための手段】このような課題を解決す
るため本発明者等が鋭意研究を重ねた結果、潤滑膜形成
時の膜厚についてその適正値からの変動を抑えるために
は上記保護膜の成膜終了後から潤滑膜形成までの時間が
重要なパラメータであることを各種実験を通じて発見し
本発明を完成するに至ったものである。
As a result of intensive studies conducted by the present inventors in order to solve such a problem, as a result of the above protection in order to suppress the fluctuation of the film thickness during the formation of a lubricating film from its proper value. Through various experiments, it was discovered through various experiments that the time from the completion of film formation to the formation of the lubricating film is an important parameter, and the present invention has been completed.

【0013】すなわち請求項1に係る発明は、非磁性基
板上に磁気記録層とこの上に設けられた保護膜とこの保
護膜上に設けられた潤滑膜とを備える磁気記録媒体の製
造方法を前提とし、上記保護膜の成膜終了後から1時間
以上6時間以内に上記潤滑膜を形成することを特徴とす
るものである。
That is, the invention according to claim 1 is a method of manufacturing a magnetic recording medium comprising a magnetic recording layer on a non-magnetic substrate, a protective film provided on the magnetic recording layer, and a lubricating film provided on the protective film. As a premise, it is characterized in that the lubricating film is formed within 1 hour to 6 hours after the formation of the protective film.

【0014】この様な技術的手段において上記潤滑膜の
形成時期を保護膜の成膜終了後から1時間以上6時間以
内に設定した理由は以下の実験結果に基づいている。
The reason why the time for forming the lubricating film is set to be 1 hour to 6 hours after the completion of forming the protective film in such technical means is based on the following experimental results.

【0015】すなわち、図2は、カーボンより成る保護
膜をスパッタリング法にて成膜した後、この保護膜面上
にスピンコート法により潤滑膜を形成するまでの時間を
0時間から8時間まで適宜条件を変えて設定し、各条件
下において形成された潤滑膜の膜厚(平均値)について
その適正値(基準膜厚)に対する変動巾を各々プロット
したものであり、また、図3は、カーボンより成る保護
膜をスパッタリング法にて成膜した後、この保護膜面上
にスピンコート法により潤滑膜を形成するまでの時間を
0時間から20時間まで適宜条件を変えて設定し、各条
件下において形成された個々の潤滑膜の膜厚についてそ
の適正値(基準膜厚)に対する変動巾を個々プロットし
たものである。
That is, in FIG. 2, after the protective film made of carbon is formed by the sputtering method, the time until the lubricating film is formed on the surface of the protective film by the spin coating method is appropriately from 0 to 8 hours. The conditions are set differently, and the variation widths of the film thickness (average value) of the lubricating film formed under each condition with respect to the appropriate value (reference film thickness) are plotted, and FIG. After a protective film made of is formed by the sputtering method, the time until the lubricating film is formed on the surface of the protective film by the spin coating method is set from 0 hours to 20 hours by appropriately changing the conditions. FIG. 3 is a plot of the fluctuation width of the film thickness of each lubricating film formed in (3) with respect to its appropriate value (reference film thickness).

【0016】そして、図2に示された結果から明らかな
ように潤滑膜の膜厚(平均値)は、保護膜の成膜直後か
ら潤滑膜の形成までの時間に対応させてみた場合に1時
間未満で急激に減少しその後安定化している。このた
め、潤滑膜の形成時期を上記保護膜の成膜終了から1時
間未満に設定すると、潤滑膜の膜厚の変動を抑えること
が難しく、かつ、適正値(基準膜厚)よりも厚くなった
ものが含まれるようになり得られた磁気記録媒体面に磁
気ヘッドが吸着され易くなる弊害が生ずる。
As is clear from the results shown in FIG. 2, the film thickness (average value) of the lubricating film is 1 when it is made to correspond to the time immediately after the formation of the protective film until the formation of the lubricating film. It decreases sharply in less than time and then stabilizes. For this reason, if the time for forming the lubricating film is set to less than 1 hour after the film formation of the protective film is completed, it is difficult to suppress the fluctuation of the film thickness of the lubricating film, and it becomes thicker than an appropriate value (reference film thickness). However, the magnetic head is likely to be attracted to the surface of the obtained magnetic recording medium.

【0017】他方、潤滑膜の形成時期が上記保護膜の成
膜終了から6時間を越えると、図3に示すように潤滑膜
の膜厚の変動巾が大きくなり、かつ、その膜厚は適正値
(基準膜厚)よりも薄い方へシフトすることが確認でき
る。このため、潤滑膜の形成時期を上記保護膜の成膜終
了から6時間以降に設定すると、潤滑膜の膜厚が適正値
(基準膜厚)よりも薄くなったものが含まれるようにな
り得られた磁気記録媒体の耐摩耗性が劣化する弊害が生
ずる。
On the other hand, when the time for forming the lubricating film exceeds 6 hours after the formation of the protective film, the fluctuation range of the film thickness of the lubricating film becomes large as shown in FIG. 3, and the film thickness is proper. It can be confirmed that the value shifts to a smaller value than the value (reference film thickness). For this reason, if the lubricating film formation time is set to 6 hours or more after the completion of the formation of the protective film, the lubricating film may have a thickness smaller than an appropriate value (reference film thickness). A harmful effect that the wear resistance of the obtained magnetic recording medium deteriorates occurs.

【0018】この様な技術的根拠に基づきこの技術的手
段においては上記潤滑膜の形成時期を保護膜の成膜終了
後から1時間以上6時間以内に設定したものである。
On the basis of such technical grounds, in this technical means, the time for forming the lubricating film is set to be 1 hour to 6 hours after the completion of the formation of the protective film.

【0019】尚、上記潤滑膜における膜厚の適正値を設
定する基準については、適用された保護膜並びに潤滑剤
の材質、基板表面及び保護膜表面の粗面化状態、磁気ヘ
ッドの底面構造、及び、保護膜面に対する磁気ヘッドの
ヘッド荷重等のファクターを考慮し適宜条件が設定され
る。
The criteria for setting the appropriate value of the film thickness of the lubricating film are as follows: the material of the applied protective film and lubricant, the roughened state of the substrate surface and the protective film surface, the bottom structure of the magnetic head, Also, the conditions are appropriately set in consideration of factors such as the head load of the magnetic head with respect to the protective film surface.

【0020】ここで、潤滑膜の形成時期を保護膜の成膜
終了から1時間未満に設定した場合に潤滑膜の膜厚変動
を抑えることが難しくかつその膜厚が適正値(基準膜
厚)よりも厚くなる理由と、上記潤滑膜の形成時期を保
護膜の成膜終了から6時間以降に設定した場合に潤滑膜
の膜厚が適正値(基準膜厚)よりも薄くなる理由につい
て本発明者等は以下のように推察している。
Here, when the lubricating film formation time is set to less than 1 hour after the completion of the formation of the protective film, it is difficult to suppress the fluctuation of the lubricating film thickness and the film thickness has an appropriate value (reference film thickness). The reason why the thickness of the lubricant film becomes thinner than an appropriate value (reference film thickness) when the time for forming the lubricant film is set to 6 hours or more after the completion of the formation of the protective film The inferees speculate as follows.

【0021】まず、保護膜の成膜終了後1時間未満に潤
滑膜を形成した場合、保護層表面は非常に活性状態にあ
るためその表面において水分や酸素の吸着現象が起こ
る。そして、上記時間内において潤滑膜の形成時期が僅
かずれても保護膜表面の水分や酸素の吸着量は著しく相
違し、かつ、保護膜の状態もその時々で異なり不安定な
ため潤滑剤の付きも安定せず、従って、潤滑膜の膜厚変
動を抑えることが困難になるものと推論している。更
に、保護膜表面が非常に活性状態にあることから安定時
に較べ潤滑剤が付き易く、この結果潤滑膜の膜厚が適正
値(基準膜厚)よりも厚くなるものと推論している。
First, when the lubricating film is formed within 1 hour after the completion of the formation of the protective film, the surface of the protective layer is in a very active state, so that the phenomenon of adsorption of water and oxygen occurs on the surface. Even if the timing of forming the lubricating film is slightly deviated within the above time, the amount of water and oxygen adsorbed on the surface of the protective film is significantly different, and the state of the protective film is also different from time to time and is unstable. It is inferred that even if it is not stable, it becomes difficult to suppress the variation in the thickness of the lubricating film. Furthermore, since the surface of the protective film is in a very active state, it is inferred that the lubricant is more likely to adhere than when it is stable, and as a result, the film thickness of the lubricating film becomes thicker than an appropriate value (reference film thickness).

【0022】他方、保護膜の成膜終了後6時間を越えて
潤滑膜を形成した場合、大気中に低濃度で存在する分子
の保護膜表面への吸着量が無視できなくなり、また、長
時間放置によるごみの付着等も生ずるため保護膜の状態
が不安定となり、潤滑膜の形成時期を1時間未満に設定
した場合と同様に潤滑膜の膜厚変動を抑えることが困難
となり、かつ、保護膜表面の活性状態が低下しているた
め安定時に較べて潤滑剤も付き難くなり潤滑膜の膜厚が
適正値(基準膜厚)よりも薄くなるものと推論してい
る。
On the other hand, when the lubricating film is formed for more than 6 hours after the formation of the protective film, the adsorption amount of molecules existing in low concentration in the atmosphere on the surface of the protective film cannot be neglected, and the long time is required. Since the dust adheres to the protective film when left unattended, the state of the protective film becomes unstable, making it difficult to suppress the fluctuation of the thickness of the lubricating film as in the case where the lubricating film formation time is set to less than 1 hour. It is inferred that since the active state of the film surface is lowered, it becomes more difficult for the lubricant to adhere to the film compared to when it is stable, and the film thickness of the lubricating film becomes thinner than the appropriate value (reference film thickness).

【0023】これに対し、上記潤滑膜の形成時期を保護
膜の成膜終了後から1時間以上6時間以内に設定した場
合、保護膜表面に吸着される水分や酸素は飽和してお
り、かつ、大気中に低濃度で存在する分子の保護膜表面
への吸着量やごみの付着等も無視できるため、潤滑膜の
膜厚変動が抑えられるものであると推論している。
On the other hand, when the time for forming the lubricating film is set to 1 hour to 6 hours after the completion of the formation of the protective film, the water and oxygen adsorbed on the surface of the protective film are saturated, and It is inferred that the variation in the thickness of the lubricating film can be suppressed because the adsorption amount of molecules existing in low concentration in the atmosphere on the surface of the protective film and the adhesion of dust can be ignored.

【0024】次に、保護膜成膜後においてこの表面を研
磨テープ並びにクリーニングテープを用いて行う研磨処
理及びクリーニング処理については、上記保護膜の成膜
終了後から潤滑膜の形成までの間のどの時点でこれを行
ってもよく任意である。
Next, regarding the polishing treatment and the cleaning treatment which are carried out on the surface using a polishing tape and a cleaning tape after the formation of the protective film, the steps from the completion of the formation of the protective film to the formation of the lubricating film are described. This may be done at any point in time and is optional.

【0025】但し、保護膜成膜直後において上記研磨処
理等を施した場合、保護膜が高温、不安定状態にありこ
の状態下で研磨処理等を施すと保護膜表面にスクラッチ
傷等が付き易く、かつ、保護膜成膜直後においては処理
工程上も時間的に余裕がないため避けた方が望ましい。
However, when the above-mentioned polishing treatment or the like is performed immediately after the formation of the protective film, the protective film is in a high temperature and unstable state, and if the polishing treatment or the like is performed under this condition, scratches or the like are likely to occur on the surface of the protective film. Moreover, it is desirable to avoid it because there is no time margin in the processing step immediately after forming the protective film.

【0026】この技術的手段において磁気記録媒体の非
磁性基板については従来と同様の材料を適用することが
でき、例えば、磁気ディスクとして使用されるものにつ
いては高純度アルミニウム、アルミニウム合金、セラミ
ックス、硬質プラスチック等から成る円盤状基板が適用
できる。尚、広く利用されている高純度アルミニウム基
板については表面をアルマイト処理後鏡面仕上げを行う
か、上記表面を無電解メッキ等によりNi−P合金、N
i−Cu−P合金等の皮膜を形成した後鏡面仕上げ処理
を施す。このように硬化処理した基板は、公知のように
研摩テープや研摩液を使用して板材の円周方向にほぼ同
心円状の傷をつける粗面化加工いわゆるテクスチャ加工
を施す。
In this technical means, the same material as the conventional one can be applied to the non-magnetic substrate of the magnetic recording medium. For example, those used as magnetic disks are high-purity aluminum, aluminum alloys, ceramics and hard materials. A disk-shaped substrate made of plastic or the like can be applied. For widely used high-purity aluminum substrates, the surface is anodized and then mirror-finished, or the surface is electroless plated to form Ni-P alloy, N
After forming a film of i-Cu-P alloy or the like, mirror finishing treatment is performed. The substrate thus hardened is subjected to a so-called roughening process using a polishing tape or a polishing liquid as is well known so as to make substantially concentric scratches in the circumferential direction of the plate material.

【0027】また、上記磁気記録層を構成する記録材料
としては、γ−Fe2 3 から成るスパッタリング膜
や、Co系、CoNi系、CoNiCr系、CoPt
系、CoCrTa系、Fe系等のスパッタリング膜、蒸
着膜、メッキ膜等従来と同様の材料が適用でき、かつ、
磁気特性を調整するために下地層としてCr、Cr合金
等の皮膜を設けてもよい。更に、磁気記録層を保護する
保護膜としては、従来と同様にスパッタリング法、CV
D(化学的気相成長)法等の適宜成膜手段により成膜さ
れたカーボン、SiO2 、SiN、SiAlON、Zr
2 膜等が適用でき、また、この保護膜の耐摩耗性を改
善する上記潤滑剤についてもフロロカーボン系等従来の
材料がそのまま適用でき、かつ、その塗布手段も任意で
ある。
As the recording material forming the magnetic recording layer, a sputtered film made of γ-Fe 2 O 3 , Co type, CoNi type, CoNiCr type, CoPt type is used.
-Based, CoCrTa-based, and Fe-based sputtering films, vapor deposition films, plating films, and other similar materials can be applied, and
A film of Cr, Cr alloy, or the like may be provided as an underlayer to adjust the magnetic characteristics. Further, as the protective film for protecting the magnetic recording layer, the sputtering method, the CV
Carbon, SiO 2 , SiN, SiAlON, Zr formed by an appropriate film forming means such as D (chemical vapor deposition) method
An O 2 film or the like can be applied, and a conventional material such as a fluorocarbon-based material can be applied as it is to the above-mentioned lubricant for improving the wear resistance of this protective film, and its application means is also arbitrary.

【0028】[0028]

【作用】請求項1に係る発明によれば、保護膜の成膜終
了後から1時間以上6時間以内に潤滑膜を形成するた
め、潤滑膜形成時の膜厚についてその適正値からの変動
を最小限に抑えることができ、潤滑膜の膜厚が適正値に
設定された磁気記録媒体を安定して製造することが可能
となる。
According to the invention of claim 1, since the lubricating film is formed within 1 hour to 6 hours after the completion of the formation of the protective film, the fluctuation of the film thickness at the time of forming the lubricating film from the appropriate value is prevented. It can be minimized, and the magnetic recording medium in which the film thickness of the lubricating film is set to an appropriate value can be stably manufactured.

【0029】[0029]

【実施例】以下、本発明を磁気ディスクに適用した実施
例について詳細に説明する。
EXAMPLES Examples in which the present invention is applied to a magnetic disk will be described in detail below.

【0030】尚、この磁気ディスクは、図1に示すよう
に粗面化処理されたアルミニウム合金(Mg:4重量
部,Al:96重量部)から成る基板1と、この基板1
上に無電解メッキ法により成膜されたNi−P合金の硬
化処理膜2と、この硬化処理膜2上にクロムから成る下
地層(図示せず)を介しDCマグネトロンスパッタリン
グ法にて成膜された厚さ300ÅのCoCrTa磁気記
録層3と、この磁気記録層3上にDCマグネトロンスパ
ッタリング法で成膜されたカーボン保護膜4とでその主
要部が構成され、かつ、この保護膜4上にパーフロロポ
リエーテルの潤滑膜5が形成されて成るものである。
This magnetic disk comprises a substrate 1 made of a surface-roughened aluminum alloy (Mg: 4 parts by weight, Al: 96 parts by weight) as shown in FIG.
A Ni—P alloy hardening treatment film 2 formed thereon by electroless plating, and a DC magnetron sputtering method on the hardening treatment film 2 via an underlayer (not shown) made of chromium. Of the CoCrTa magnetic recording layer 3 having a thickness of 300Å and a carbon protective film 4 formed on the magnetic recording layer 3 by the DC magnetron sputtering method. The lubricating film 5 of fluoropolyether is formed.

【0031】[実施例1]この実施例に係る磁気ディス
クの製造工程を説明すると、まず、無電解メッキ法にて
Ni−P合金の硬化処理膜2が成膜された上記アルミニ
ウム合金から成る直径3.5インチの基板1に対し、ラ
ップ加工及びポリッシュ加工を施して表面粗さR
max (基準長さ内の最高山頂から最深谷底までの高さ)
が300Å以下の表面粗度を有するディスク基板を製造
した。
[Example 1] A magnetic disk manufacturing process according to this example will be described. First, a diameter of the above-mentioned aluminum alloy on which a Ni-P alloy hardening treatment film 2 is formed by an electroless plating method. Lapping and polishing are applied to the 3.5-inch substrate 1 to obtain a surface roughness R
max (height from the highest peak to the deepest valley bottom within the standard length)
A disk substrate having a surface roughness of less than 300Å was manufactured.

【0032】この粗さを有する基板1表面に対し、ポリ
エステルベースフィルム上に平均粒径6μmのアルミナ
砥粒が結着されて成る研摩テープを一定の力で押付けて
テクスチャ加工を施しその表面粗さをRtmで約600Å
に設定した。
On the surface of the substrate 1 having this roughness, a polishing tape made by bonding alumina abrasive grains having an average particle size of 6 μm on a polyester base film is pressed with a constant force to perform texture processing, and the surface roughness is obtained. At R tm about 600Å
Set to.

【0033】次に、このテクスチャ加工が施された基板
1をDCマグネトロンスパッタリング装置のチャンバー
内にセットし、チャンバー内の圧力が約10-7Torrにな
るまで真空ポンプ装置により排気した後、チャンバー内
に設置されたヒーターにより上記基板1を300℃に加
熱した。
Next, the textured substrate 1 is set in the chamber of a DC magnetron sputtering apparatus, and the inside of the chamber is evacuated by the vacuum pump apparatus until the pressure in the chamber becomes about 10 -7 Torr. The substrate 1 was heated to 300 ° C. by the heater installed in.

【0034】そして、この基板1上に、DCマグネトロ
ンスパッタリング法により基板温度:300℃,Arガ
ス圧:10 mTorr,DC投入電力:5W/cm2 の条件
下で厚さ500ÅのCrを成膜して磁気特性を調整する
ための下地層(図示せず)を形成し、かつ、上記基板1
とスパッタリング用ターゲットの間に(−150V)の
バイアス電圧を印加して厚さ300ÅのCoCrTa磁
気記録層3を成膜した後、この上に上記下地層と同条件
でカーボン保護膜4を成膜した。
Then, a 500 Å-thick Cr film was formed on the substrate 1 by the DC magnetron sputtering method under the conditions of substrate temperature: 300 ° C., Ar gas pressure: 10 mTorr, and DC input power: 5 W / cm 2. To form a base layer (not shown) for adjusting magnetic characteristics, and
After applying a bias voltage of (-150 V) between the sputtering target and the sputtering target to form a CoCrTa magnetic recording layer 3 having a thickness of 300 Å, a carbon protective film 4 is formed thereon under the same conditions as the above-mentioned underlayer. did.

【0035】次に、カーボン保護膜4が成膜された基板
1を高速で回転させると共にポリエステルベースフィル
ム上に平均粒径2μmのアルミナ砥粒が結着されて成る
研磨テープを上記カーボン保護膜4上に密着し、かつ、
テープ研磨装置を用い研磨処理を施してカーボン保護膜
4表面の微小突起を除去した後、布製のクリーニングテ
ープを用いカーボン保護膜4表面をクリーニング処理し
た。
Next, the substrate 1 having the carbon protective film 4 formed thereon is rotated at a high speed, and a polishing tape formed by binding alumina abrasive grains having an average particle diameter of 2 μm on a polyester base film is used as the carbon protective film 4 described above. Adheres to the top, and
After performing a polishing process using a tape polishing device to remove the fine protrusions on the surface of the carbon protective film 4, the surface of the carbon protective film 4 was cleaned using a cleaning tape made of cloth.

【0036】そして、研磨処理とクリーニング処理が施
された保護膜4表面上にスピンコート法によりパーフロ
ロポリエーテル系潤滑剤(デュポン社製 商品名クライ
トックス)を塗布して潤滑膜5を形成した後、バーニッ
シュヘッドによるバーニッシュ処理を施すと共にグライ
ドハイトテストを行って磁気ディスクを製造した。
Then, on the surface of the protective film 4 which has been subjected to the polishing treatment and the cleaning treatment, a perfluoropolyether lubricant (product name: Krytox manufactured by DuPont) is applied by a spin coating method to form a lubricating film 5. After that, a burnishing treatment with a burnishing head was performed and a glide height test was performed to manufacture a magnetic disk.

【0037】尚、カーボン保護膜4の成膜終了後から上
記潤滑膜5の形成までの時間は1.3時間であった。
The time from the completion of forming the carbon protective film 4 to the formation of the lubricating film 5 was 1.3 hours.

【0038】そして、同一の条件で10枚の磁気ディス
クを製造し、かつ、各磁気ディスクの潤滑膜5の膜厚を
各々測定すると共に、適正膜厚からの変動巾も各々求め
た。また、上記潤滑膜5を形成する前に研磨処理並びに
クリーニング処理を施した際のカーボン保護膜4の表面
状態も併せて観察し表面にスクラッチ傷等が存在するか
否かを調べた。
Then, ten magnetic disks were manufactured under the same conditions, the thickness of the lubricating film 5 of each magnetic disk was measured, and the fluctuation range from the proper film thickness was also calculated. Further, the surface state of the carbon protective film 4 when the polishing process and the cleaning process were performed before the formation of the lubricating film 5 was also observed, and it was examined whether or not scratches and the like were present on the surface.

【0039】これ等変動巾の平均値とカーボン保護膜4
の表面状態の結果を表1に示す。
The average value of these fluctuation widths and the carbon protective film 4
Table 1 shows the results of the surface state of the.

【0040】[実施例2]カーボン保護膜4の成膜終了
後から潤滑膜5の形成までの時間が3.0時間である点
を除き実施例1と略同一である。
[Embodiment 2] This is substantially the same as Embodiment 1 except that the time from the completion of the formation of the carbon protective film 4 to the formation of the lubricating film 5 is 3.0 hours.

【0041】そして、実施例1と同様に潤滑膜5膜厚の
変動巾の平均値とカーボン保護膜4の表面状態の結果を
表1に示す。
Then, as in Example 1, Table 1 shows the results of the average value of the fluctuation width of the lubricating film 5 and the surface condition of the carbon protective film 4.

【0042】[実施例3]カーボン保護膜4の成膜終了
後から潤滑膜5の形成までの時間が5.0時間である点
を除き実施例1と略同一である。
[Third Embodiment] The third embodiment is substantially the same as the first embodiment except that the time from the completion of the formation of the carbon protective film 4 to the formation of the lubricating film 5 is 5.0 hours.

【0043】そして、実施例1と同様に潤滑膜5膜厚の
変動巾の平均値とカーボン保護膜4の表面状態の結果を
表1に示す。
Then, as in Example 1, Table 1 shows the results of the average value of the fluctuation width of the lubricating film 5 and the surface condition of the carbon protective film 4.

【0044】[比較例1]カーボン保護膜4の成膜終了
後から潤滑膜5の形成までの時間が0.8時間である点
を除き実施例1と略同一である。
[Comparative Example 1] This is substantially the same as Example 1 except that the time from the completion of forming the carbon protective film 4 to the formation of the lubricating film 5 is 0.8 hours.

【0045】そして、実施例1と同様に潤滑膜5膜厚の
変動巾の平均値とカーボン保護膜4の表面状態の結果を
表1に示す。
Then, as in Example 1, Table 1 shows the results of the average value of the fluctuation width of the lubricating film 5 and the surface condition of the carbon protective film 4.

【0046】[比較例2]カーボン保護膜4の成膜終了
後から潤滑膜5の形成までの時間が6.3時間である点
を除き実施例1と略同一である。
[Comparative Example 2] This is substantially the same as Example 1 except that the time from the completion of the formation of the carbon protective film 4 to the formation of the lubricating film 5 is 6.3 hours.

【0047】そして、実施例1と同様に潤滑膜5膜厚の
変動巾の平均値とカーボン保護膜4の表面状態の結果を
表1に示す。
Then, as in Example 1, Table 1 shows the results of the average value of the fluctuation width of the lubricating film 5 and the surface condition of the carbon protective film 4.

【0048】[比較例3]カーボン保護膜4の成膜終了
後から潤滑膜5の形成までの時間が21.7時間である
点を除き実施例1と略同一である。
[Comparative Example 3] This is substantially the same as Example 1 except that the time from the completion of the formation of the carbon protective film 4 to the formation of the lubricating film 5 is 21.7 hours.

【0049】そして、実施例1と同様に潤滑膜5膜厚の
変動巾の平均値とカーボン保護膜4の表面状態の結果を
表1に示す。
Then, as in Example 1, Table 1 shows the results of the average value of the fluctuation width of the lubricating film 5 and the surface condition of the carbon protective film 4.

【0050】[0050]

【表1】 『比較テスト』次に、各実施例と比較例に係る磁気ディ
スクについて以下に述べるような各種比較テストを行っ
た。
[Table 1] "Comparative Test" Next, various comparative tests as described below were performed on the magnetic disks according to the examples and the comparative examples.

【0051】(1)CSSテスト 潤滑膜5が形成された実施例並びに比較例に係る磁気デ
ィスクを回転スピンドルにセットし、かつ、これ等磁気
ディスクの半径20mmの位置に薄膜磁気ヘッド(スライ
ダ材質:Al2 3 ・TiC,スライダ寸法:長さ3.
20mm、幅:2.66mm,荷重:7.2g重)をおいた
後、0rpm(すなわち薄膜磁気ヘッドが磁気ディスク
面に接触している状態)→3600rpm(すなわち薄
膜磁気ヘッドが磁気ディスク面から浮上している状態。
尚、本試験では浮上量:0.13μm)→0rpm(す
なわち薄膜磁気ヘッドが再び浮上状態から接触状態に戻
る)の工程を30秒の周期で行ってCSSテスト(コン
タクト・スタート・アンド・ストップ)を実施し、開始
前の摩擦係数、開始してから5,000回後の摩擦係
数、20,000回後の摩擦係数をそれぞれ測定した。
(1) CSS Test The magnetic disks according to the example and the comparative example on which the lubricating film 5 is formed are set on a rotary spindle, and the thin film magnetic head (slider material: Al 2 O 3 · TiC, slider dimensions: length 3.
After applying 20 mm, width: 2.66 mm, load: 7.2 g weight, 0 rpm (that is, the state where the thin film magnetic head is in contact with the magnetic disk surface) → 3600 rpm (that is, the thin film magnetic head floats from the magnetic disk surface) The state of doing.
In this test, the flying height: 0.13 μm) → 0 rpm (that is, the thin film magnetic head returns from the floating state to the contact state) at a cycle of 30 seconds to perform a CSS test (contact start and stop). Was carried out, and the friction coefficient before the start, the friction coefficient after 5,000 times from the start, and the friction coefficient after 20,000 times were measured.

【0052】そして、この結果を表2に示す。The results are shown in Table 2.

【0053】(2)吸着テスト 次に、上記薄膜磁気ヘッドを各磁気ディスク面上に接触
させた状態で温度30℃、湿度80%RHの環境下で4
8時間放置した後、磁気ディスクを回転させて磁気ディ
スクの起動時における摩擦係数いわゆる吸着力を測定し
た。
(2) Adsorption test Next, the thin-film magnetic head was brought into contact with the surface of each magnetic disk, and was placed in an environment of temperature 30 ° C. and humidity 80% RH for 4 hours.
After standing for 8 hours, the magnetic disk was rotated to measure the friction coefficient at the time of starting the magnetic disk, so-called adsorption force.

【0054】そして、この結果を同じく表2に示す。The results are also shown in Table 2.

【0055】[0055]

【表2】 『評価』実施例1〜3に係る磁気ディスクにおいては、
その潤滑膜における膜厚の適正膜厚からの変動巾の平均
値が表1に示されているように2Å以下に抑えられてお
り、かつ、研磨処理並びにクリーニング処理後における
カーボン保護膜の表面状態も良好であった。このため、
表2に示されているようにCSSテストにおける摩擦係
数と吸着テストにおける摩擦係数が0.5を下回る値と
なっており、磁気ディスクの耐摩耗性とこれ等磁気ディ
スク面に対する磁気ヘッドの吸着特性が改善されている
ことが確認された。
[Table 2] “Evaluation” In the magnetic disks according to Examples 1 to 3,
The average value of the fluctuation range of the film thickness of the lubricating film from the proper film thickness is suppressed to 2Å or less as shown in Table 1, and the surface state of the carbon protective film after the polishing process and the cleaning process is performed. Was also good. For this reason,
As shown in Table 2, the friction coefficient in the CSS test and the friction coefficient in the adsorption test are less than 0.5, and the wear resistance of the magnetic disk and the adsorption characteristic of the magnetic head on the surface of the magnetic disk. Was confirmed to have been improved.

【0056】一方、比較例1においてはカーボン保護膜
成膜後から潤滑膜形成までの時間が0.8時間と短く、
この結果、表1に示されているように潤滑膜の膜厚が上
記適正膜厚よりも最高で4Å厚くなっており、その変動
巾の平均値も約5Åと大きく、かつ、カーボン保護膜表
面に多数のスクラッチ傷が発生していた。このため、表
2に示されているようにCSSテストにおける摩擦係数
と吸着テストにおける摩擦係数が実施例に係る磁気ディ
スクに較べて大きな値となっており、得られた磁気ディ
スクの耐摩耗性とこれ等磁気ディスク面に対する磁気ヘ
ッドの吸着特性が劣っていることが確認できた。
On the other hand, in Comparative Example 1, the time from the formation of the carbon protective film to the formation of the lubricating film was as short as 0.8 hours,
As a result, as shown in Table 1, the thickness of the lubricating film is 4 Å thicker than the above-mentioned appropriate film thickness, the average value of the fluctuation width is also large at about 5 Å, and the surface of the carbon protective film is large. There were many scratches on the surface. Therefore, as shown in Table 2, the coefficient of friction in the CSS test and the coefficient of friction in the adsorption test have larger values than those of the magnetic disks according to the examples, and the obtained magnetic disks have wear resistance. It was confirmed that the magnetic head had poor adsorption properties on the magnetic disk surface.

【0057】次に、比較例2〜3においてはカーボン保
護膜成膜後から潤滑膜形成までの時間が6時間以上と長
く、この結果、表1に示されているように潤滑膜の膜厚
が上記適正膜厚より最高で4〜5Å薄くなっており、そ
の変動巾の平均値も3.8〜5.6Åと大きくなってい
る。また、研磨処理並びにクリーニング処理後における
カーボン保護膜の表面状態は良好であり、かつ、表2に
示されているように吸着テストにおける摩擦係数にも問
題はなかったが、CSSテストにおける摩擦係数は実施
例に係る磁気ディスクに較べてかなり大きな値となって
おり耐摩耗性が劣っていることが確認できた。
Next, in Comparative Examples 2 to 3, the time from the formation of the carbon protective film to the formation of the lubricating film was as long as 6 hours or more, and as a result, as shown in Table 1, the film thickness of the lubricating film was Is thinner than the above-mentioned appropriate film thickness by 4 to 5Å at the maximum, and the average value of the fluctuation range is as large as 3.8 to 5.6Å. Further, the surface state of the carbon protective film after the polishing treatment and the cleaning treatment was good, and as shown in Table 2, there was no problem in the friction coefficient in the adsorption test, but the friction coefficient in the CSS test was It was confirmed that the wear resistance was inferior because the value was considerably larger than that of the magnetic disk according to the example.

【0058】[0058]

【発明の効果】請求項1に係る発明によれば、潤滑膜形
成時の膜厚についてその適正値からの変動を最小限に抑
えることができ、潤滑膜の膜厚が適正値に設定された磁
気記録媒体を安定して製造することが可能となる。
According to the invention of claim 1, it is possible to minimize the fluctuation of the film thickness when the lubricating film is formed from the proper value, and the film thickness of the lubricating film is set to the proper value. It is possible to stably manufacture the magnetic recording medium.

【0059】従って、磁気記録媒体の耐摩耗性と磁気記
録媒体面に対する磁気ヘッドの吸着現象を改善できる効
果を有している。
Therefore, it has the effect of improving the wear resistance of the magnetic recording medium and the phenomenon of attraction of the magnetic head to the surface of the magnetic recording medium.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例に係る磁気ディスクの断面図。FIG. 1 is a sectional view of a magnetic disk according to an embodiment.

【図2】保護膜成膜後から潤滑膜を形成するまでの時間
と、各条件下で形成された潤滑膜の膜厚(平均値)につ
いてその適正値に対する変動巾との関係を示したグラフ
図。
FIG. 2 is a graph showing the relationship between the time from the formation of the protective film to the formation of the lubricating film and the fluctuation range of the film thickness (average value) of the lubricating film formed under each condition with respect to its appropriate value. Fig.

【図3】保護膜成膜後から潤滑膜を形成するまでの時間
と、各条件下で形成された個々の潤滑膜の膜厚について
その適正値に対する変動巾との関係を示したグラフ図。
FIG. 3 is a graph showing the relationship between the time from the formation of the protective film to the formation of the lubricating film and the fluctuation range of the film thickness of each lubricating film formed under each condition with respect to its proper value.

【符号の説明】[Explanation of symbols]

1 基板 2 硬化処理膜 3 磁気記録層 4 保護膜 5 潤滑膜 1 substrate 2 hardening treatment film 3 magnetic recording layer 4 protective film 5 lubricating film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】非磁性基板上に磁気記録層とこの上に設け
られた保護膜とこの保護膜上に設けられた潤滑膜とを備
える磁気記録媒体の製造方法において、 上記保護膜の成膜終了後から1時間以上6時間以内に上
記潤滑膜を形成することを特徴とする磁気記録媒体の製
造方法。
1. A method of manufacturing a magnetic recording medium comprising a magnetic recording layer, a protective film provided on the magnetic recording layer, and a lubricating film provided on the protective film on a non-magnetic substrate. A method of manufacturing a magnetic recording medium, characterized in that the lubricating film is formed within 1 hour to 6 hours after the end.
JP33923991A 1991-12-24 1991-12-24 Production of magnetic recording medium Pending JPH05174372A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33923991A JPH05174372A (en) 1991-12-24 1991-12-24 Production of magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33923991A JPH05174372A (en) 1991-12-24 1991-12-24 Production of magnetic recording medium

Publications (1)

Publication Number Publication Date
JPH05174372A true JPH05174372A (en) 1993-07-13

Family

ID=18325570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33923991A Pending JPH05174372A (en) 1991-12-24 1991-12-24 Production of magnetic recording medium

Country Status (1)

Country Link
JP (1) JPH05174372A (en)

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