JPH0516405A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPH0516405A JPH0516405A JP17371191A JP17371191A JPH0516405A JP H0516405 A JPH0516405 A JP H0516405A JP 17371191 A JP17371191 A JP 17371191A JP 17371191 A JP17371191 A JP 17371191A JP H0516405 A JPH0516405 A JP H0516405A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thermal head
- wiring electrode
- thin film
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electronic Switches (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、サーマルヘッドに関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thermal head.
【0002】[0002]
【従来の技術】従来のサーマルヘッドの技術を図3〜図
6とともに説明する。2. Description of the Related Art A conventional thermal head technology will be described with reference to FIGS.
【0003】従来のサーマルヘッドは、スッパッタリン
グ法あるいは真空蒸着法により薄膜の発熱抵抗体層を形
成しその上に同じく薄膜の配線電極層を形成する薄膜方
式と、スクリーン印刷あるいはグラビア印刷により始め
に配線電極層を形成し、その上に同じく印刷により発熱
抵抗体層を形成する印刷方式があった。The conventional thermal head starts with a thin film method in which a thin film heating resistor layer is formed by a spattering method or a vacuum vapor deposition method and a thin film wiring electrode layer is formed thereon, and screen printing or gravure printing. There is a printing method in which a wiring electrode layer is formed on the substrate and a heating resistor layer is formed on the wiring electrode layer by printing.
【0004】薄膜方式は、例えば図3,図4に示すよう
に、例えばセラミック,ガラス,エポキシ等よりなる基
板1上に主にSiO2からなる蓄熱グレーズ層2を設
け、その上部に、例えばサーメット系の発熱抵抗体材料
をスッパッタリング法あるいは真空蒸着法により薄膜の
発熱抵抗体層を形成し、フォトリソエッチングにて発熱
抵抗体列6を形成する。その上部に例えばCu,Cr,
Al,Au等からなる電極材料をスッパッタリング法あ
るいは真空蒸着法により薄膜の配線電極層を形成し、フ
ォトリソエッチングにて個別電極7a,共通電極7bを
形成する。このとき、個別電極7a,共通電極7bに挟
まれた部分が個々の発熱体となる。その上部に電極,発
熱体を覆うように例えばSiON,SiC,SiN等か
らなる保護層5をスッパッタリング法,真空蒸着法ある
いは化学気相堆積法により形成していた。[0004] thin film method, for example, as shown in FIG. 3, FIG. 4, for example ceramic, glass, mainly provided heat storage glaze layer 2 made of SiO 2 on a substrate 1 made of epoxy or the like, on the top, for example a cermet A thin-film heating resistor layer is formed from a system heating resistor material by a spattering method or a vacuum deposition method, and a heating resistor array 6 is formed by photolithography. On top of it, for example, Cu, Cr,
A thin wiring electrode layer is formed from an electrode material made of Al, Au or the like by a sputtering method or a vacuum deposition method, and individual electrodes 7a and a common electrode 7b are formed by photolithography. At this time, the portion sandwiched between the individual electrode 7a and the common electrode 7b becomes an individual heating element. A protective layer 5 made of, for example, SiON, SiC, SiN or the like is formed on the upper part thereof by a spattering method, a vacuum deposition method or a chemical vapor deposition method so as to cover the electrodes and the heating element.
【0005】一方印刷方式は、例えば図5,図6に示す
ように、例えばセラミック,ガラス,エポキシ等よりな
る基板1上に主にSiO2からなる蓄熱グレーズ層2を
設け、その上部に例えばAuレジネートを用いて印刷・
焼成・フォトリソエッチングにて個別電極8a,共通電
極8bを形成し、その上部に例えばRuレジネートから
なる発熱抵抗体9を帯状に印刷・焼成していた。このと
き、隣あう2個の共通電極8bに挟まれた部分が個々の
発熱体となる。なおこの方式では発熱抵抗体9の抵抗値
にばらつきが生じてしまうため、この抵抗体列のばらつ
きを修正するためにパルストリミングを行う必要があっ
た。その後上部に電極,発熱体を覆うように例えばホウ
珪酸鉛よりなる保護層10を印刷・焼成し、形成してい
た。On the other hand printing method, for example as shown in FIGS. 5 and 6, such as ceramic, glass, on a substrate 1 made of epoxy or the like mainly provided heat storage glaze layer 2 made of SiO 2, for example, Au on top Print using resinate
The individual electrode 8a and the common electrode 8b are formed by baking / photolithography, and the heating resistor 9 made of, for example, Ru resinate is printed / baked on the upper part of the individual electrode 8a and the common electrode 8b. At this time, the portions sandwiched by the two adjacent common electrodes 8b become individual heating elements. In this method, since the resistance value of the heating resistor 9 varies, it is necessary to perform pulse trimming in order to correct the variation in the resistor array. After that, a protective layer 10 made of, for example, lead borosilicate was printed and baked on the upper portion so as to cover the electrodes and the heating element.
【0006】[0006]
【発明が解決しようとする課題】上記従来の技術のうち
薄膜方式ではスッパッタリングや真空蒸着等の真空装置
やフォトリソ工程を必要とするため大規模な設備と多く
の工程を要し、生産性,経済性の点で問題があった。一
方、印刷方式では発熱抵抗体9の形状が図5のごとく突
出するので、平坦性が悪く、印字品質が薄膜方式に比べ
劣っていた。本発明は、上記両方式の技術的長所を用い
ることにより印字品質を落すことなく低コストかつ高信
頼性のサーマルヘッドを提供することを目的とする。Among the above-mentioned conventional techniques, the thin film method requires a vacuum apparatus such as spattering and vacuum deposition, and a photolithography process, which requires a large-scale facility and many processes, resulting in high productivity. , There was a problem in terms of economy. On the other hand, in the printing method, since the shape of the heating resistor 9 protrudes as shown in FIG. 5, the flatness is poor and the printing quality is inferior to the thin film method. It is an object of the present invention to provide a low-cost and highly reliable thermal head without deteriorating print quality by using the above-mentioned technical advantages.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に本発明は、まず印刷方式で蓄熱グレーズ層上に、少な
くとも対向側端部が、蓄熱グレーズ層側へ向けての下方
に傾斜した配線電極層を形成し、その上に薄膜方式で発
熱抵抗体層を形成したものである。In order to achieve the above object, the present invention is a wiring method in which a wiring is formed on a heat storage glaze layer by a printing method in which at least the opposite end is inclined downward toward the heat storage glaze layer side. An electrode layer is formed, and a heating resistor layer is formed on the electrode layer by a thin film method.
【0008】[0008]
【作用】このように印刷方式で配線電極層を形成し、そ
の上に薄膜方式で発熱抵抗体層を形成するものであれ
ば、例えばグラビア印刷で配線電極層を形成すると真空
装置やフォトリソ工程を必要とせずに薄膜と同等の配線
電極層を得ることができる。If the wiring electrode layer is formed by the printing method and the heating resistor layer is formed thereon by the thin film method, for example, if the wiring electrode layer is formed by the gravure printing, a vacuum device or a photolithography process is performed. A wiring electrode layer equivalent to a thin film can be obtained without the need.
【0009】また、例えばスッパッタリングとフォトリ
ソ工程で形成した薄膜抵抗体層は、膜厚,抵抗値が均一
であるためパルストリミングを必要としない。さらに薄
膜抵抗体層が突出しないので、印字品質を落すことなく
工数・コストを低減し、低コストかつ高信頼性のサーマ
ルヘッドを提供することができる。The thin film resistor layer formed by, for example, spattering and photolithography does not require pulse trimming because the film thickness and resistance are uniform. Further, since the thin film resistor layer does not protrude, the number of steps and cost can be reduced without lowering the printing quality, and a low cost and highly reliable thermal head can be provided.
【0010】[0010]
【実施例】以下、本発明を平面型サーマルヘッドに応用
した一実施例を図1,図2とともに説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the present invention is applied to a flat type thermal head will be described below with reference to FIGS.
【0011】図1,図2に示すように、例えばセラミッ
ク,ガラス,エポキシ等よりなる平面型サーマルヘッド
のアルミナ基板1上に、主にSiOからなる蓄熱グレー
ズ層2を設け、その上部にまず印刷方式により、例えば
Cu,Al,Au,Ag等を主成分とする印刷レジネー
トを用いて配線電極層3を形成する。電極のパターン形
成法としては、スクリーン印刷方式で全面に配線電極層
3を形成し、焼成してからホトリソエッチング法でパタ
ーンを形成する方法と、グラビア印刷方式でパターニン
グされた配線電極層3を直接印刷・焼成して形成する方
法がある。この場合図1,図2に示すように配線電極層
3の対向側3Cは、その上につける薄膜抵抗体の断線を
避けるために、蓄熱グレーズ層2側に向けて適度な曲
線、あるいは直線の傾斜を付けている。グラビア印刷方
式では印刷・焼成時にレジネートに働く表面張力により
自然に傾斜ができるがスクリーン印刷方式ではホトリソ
エッチング時に2回以上のエッチングをすることにより
曲線、あるいは直線の傾斜を付けることができる。As shown in FIGS. 1 and 2, a heat storage glaze layer 2 mainly made of SiO is provided on an alumina substrate 1 of a flat type thermal head made of, for example, ceramic, glass, epoxy or the like, and printing is first performed on the heat storage glaze layer 2. According to the method, the wiring electrode layer 3 is formed by using a printing resinate containing Cu, Al, Au, Ag or the like as a main component. As an electrode pattern forming method, a method of forming a wiring electrode layer 3 on the entire surface by a screen printing method, baking and then forming a pattern by a photolithographic etching method, and a method of forming a wiring electrode layer 3 patterned by a gravure printing method are used. There is a method of forming by printing and firing directly. In this case, as shown in FIGS. 1 and 2, the opposite side 3C of the wiring electrode layer 3 has an appropriate curve or straight line toward the heat storage glaze layer 2 side in order to avoid disconnection of the thin film resistor provided thereon. It is inclined. In the gravure printing method, the surface tension acting on the resinate during printing / baking can naturally incline, but in the screen printing method, a curve or a straight line can be formed by etching two or more times during photolithographic etching.
【0012】次に、その上にスッパッタリング法,真空
蒸着法等で例えば3層からなる発熱抵抗体層4を連続形
成する。先ず炭化珪素を主成分とする第1の発熱体層を
設け、更にその上に炭化チタンと酸化珪素の混合物から
なる第2の発熱体層を設け、更にその上に珪素からなる
第3の発熱体層を設ける。発熱抵抗体層4は、ホトリソ
エッチング法でパターンを形成する。そして前記発熱抵
抗体層4・配線電極層3のパターンを形成したのちに酸
窒化珪素や炭化珪素からなる保護層5をスッパッタリン
グ法,化学気相堆積法等により形成する。Next, a heating resistor layer 4 composed of, for example, three layers is continuously formed on the layer by a spattering method, a vacuum deposition method or the like. First, a first heating element layer containing silicon carbide as a main component is provided, a second heating element layer made of a mixture of titanium carbide and silicon oxide is further provided thereon, and a third heating element made of silicon is further provided thereon. Provide a body layer. The heating resistor layer 4 is patterned by the photolithographic etching method. After forming the patterns of the heating resistor layer 4 and the wiring electrode layer 3, a protective layer 5 made of silicon oxynitride or silicon carbide is formed by a spattering method, a chemical vapor deposition method or the like.
【0013】[0013]
【発明の効果】以上のように本発明は、印刷方式により
発熱体形成部付近の配線電極層の対向部に蓄熱グレーズ
層側に向けての傾斜をもたせたものであり、そしてこの
傾斜間に薄膜方式により抵抗値の均一な発熱抵抗体層を
形成するものであり、両者の欠点を補完し、印字品質を
落すことなく工数・歩留・生産性の改善ができるため、
低コストかつ高信頼性のサーマルヘッドを提供すること
が可能となる。As described above, according to the present invention, the portion facing the wiring electrode layer in the vicinity of the heating element forming portion is provided with the inclination toward the heat storage glaze layer side by the printing method, and between the inclinations. The thin-film method forms a heating resistor layer with a uniform resistance value, which complements the defects of both and improves the man-hour, yield, and productivity without degrading printing quality.
It is possible to provide a low cost and highly reliable thermal head.
【図1】本発明のサーマルヘッドの一実施例を示す発熱
抵抗体部の断面図FIG. 1 is a sectional view of a heating resistor portion showing an embodiment of a thermal head of the present invention.
【図2】図1の平面図FIG. 2 is a plan view of FIG.
【図3】従来の薄膜方式を用いたサーマルヘッドの断面
図FIG. 3 is a sectional view of a thermal head using a conventional thin film method.
【図4】図3の平面図FIG. 4 is a plan view of FIG.
【図5】従来の印刷方式を用いたサーマルヘッドの断面
図FIG. 5 is a sectional view of a thermal head using a conventional printing method.
【図6】図5の平面図6 is a plan view of FIG.
1 アルミナ基板 2 蓄熱グレーズ層 3 配線電極層 4 発熱抵抗体層 5 保護層 1 Alumina substrate 2 Heat storage glaze layer 3 Wiring electrode layer 4 Heating resistor layer 5 Protective layer
Claims (1)
けられた蓄熱グレーズ層と、前記蓄熱グレーズ層上にお
いて対向して印刷方式で設けられた配線電極層とを備
え、配線電極層の夫々の対向側端部は、前記蓄熱グレー
ズ層側へ向けての下方への傾斜を有する形状とするとと
もに、この傾斜部間に薄膜で形成した発熱抵抗体層を設
けたサーマルヘッド。1. A substrate, a heat storage glaze layer provided on at least an upper surface side of the substrate, and a wiring electrode layer provided on the heat storage glaze layer so as to face each other by a printing method. The end portions of the wiring electrode layers facing each other are shaped to have a downward slope toward the heat storage glaze layer side, and a heating resistor layer formed of a thin film is provided between the slope portions. head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17371191A JPH0516405A (en) | 1991-07-15 | 1991-07-15 | Thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17371191A JPH0516405A (en) | 1991-07-15 | 1991-07-15 | Thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0516405A true JPH0516405A (en) | 1993-01-26 |
Family
ID=15965718
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17371191A Pending JPH0516405A (en) | 1991-07-15 | 1991-07-15 | Thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0516405A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996013389A1 (en) * | 1994-10-31 | 1996-05-09 | Seiko Instruments Inc. | Thermal head and method of manufacturing same |
-
1991
- 1991-07-15 JP JP17371191A patent/JPH0516405A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996013389A1 (en) * | 1994-10-31 | 1996-05-09 | Seiko Instruments Inc. | Thermal head and method of manufacturing same |
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