JPH05144695A - Aligner - Google Patents

Abstract

PURPOSE:To speed up exposure work and keep a reticle normal, by a method wherein, when the reticle is extracted or accommodated, a recognition mark of the reticle is read in the state that the end portion of the reticle is exposed from a reticle library and stopped. CONSTITUTION:A lot of reticles 1 contained in reticle cassettes 3 are accommodated in a reticle library 4. The position of the reticle cassette 3 is registered in a data storing part 13. The reticle 1 is drawn out by the minimum range capable of reading a bar code 2. Data obtained by reading each bar code 2 and the position of the reticle library 4 are made to correspond with each other, and stored in the data storing part 13. When a specified reticle 1 is taken out from the reticle library 4 and transferred to a reticle stage 10, the data in the data storing part 13 and the data in an exposure condition storing part 15 are compared by a data comparator 16. When coincidence is obtained, exposure conditions are sent from the exposure condition storing part 15 to a temporary storage device 17.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus used for pattern formation in the manufacturing process of semiconductor devices, liquid crystal display devices and the like.

[0002]

2. Description of the Related Art As a method of forming a fine resist pattern on a substrate in a manufacturing process of a semiconductor device, a liquid crystal display device, etc., a contact exposure method of exposing a mask by closely contacting it with the substrate and exposing the mask slightly away from the substrate There is a proximity exposure method or a projection exposure method for reducing and projecting a reticle on a substrate using an optical system.

In recent years, as patterns have been miniaturized,
Also in the projection exposure method, a method of projecting the reticle on the substrate at a ratio of 1: 1 to a method of reducing the reticle to 1/5 or 1/10 has become the mainstream. In this case, a reticle in which a pattern five times or ten times as large as the pattern actually formed on the substrate is formed on glass by a thin film of chromium or chromium oxide is used. On the other hand, the exposure apparatus is almost completely computer-controlled, and the reticle is set automatically.

A conventional exposure apparatus will be described below.
FIG. 9 is a schematic perspective view of a reticle confirmation apparatus used in a conventional exposure apparatus. In FIG. 9, 21 is a reticle cassette, 22 is a bar code formed on the side surface of the reticle cassette 21, 23 is a bar code reader, 24 is a reticle, 25 is a bar code formed on the surface end of the reticle 24, and 26 is The tray of the cassette 24, 27 is a bar code reader, and 28a and 28b are decoders.

The operation of the reticle confirming apparatus constructed as above will be described below. The normal reticle 24 is stored in a reticle cassette 21 in a state of being placed on a tray 26, and the reticle cassette 21 is stored in a storage box (not shown) called a normal reticle library of an exposure device (not shown). There is. FIG. 9 shows a state in which the reticle cassette 21 is pulled out in the A direction from the reticle library, and the tray 26 is pulled out in the A direction from the reticle cassette 21. First, while the reticle cassette 21 is being pulled out, the barcode 22 formed on the side surface of the reticle cassette 21 is read by the barcode reader 23.
Read by the bar code 2 formed on the surface end of the reticle 24 while the tray 26 is being pulled out next time.
5 is read by the barcode reader 27. The signals thus read are converted by the decoders 28a and 28b, and the data written in the respective bar codes 22 and 25 are read out.

[0006]

However, in the above-mentioned conventional configuration, at the stage of taking out the reticle cassette from the reticle library and reading the bar code, it cannot be confirmed whether or not a predetermined reticle is contained in the reticle cassette. Next, when the reticle is pulled out from the reticle cassette, the bar code formed on the reticle is read, and then it is determined whether or not it is the reticle that is finally needed. In that case, there is a problem that the process and the control system become complicated, such as a work for replacing.

The present invention solves the above-mentioned conventional problems, and provides an exposure apparatus capable of associating the position of the reticle library with the reticle immediately after the reticle stored in the reticle cassette is stored in the reticle library. The purpose is to

[0008]

In order to achieve this object, an exposure apparatus of the present invention comprises a reticle library for accommodating a plurality of reticles each having a recognition mark at its end in a reticle cassette, and a plurality of reticle libraries. 1 from the reticle
Reticle selection means for selecting sheets, a transfer jig for pulling out or storing the reticle from the reticle library, and reticle recognition when the reticle is pulled out or stored and its end is exposed from the reticle library and stopped It has a structure including a recognition mark reading means for reading a mark, a reticle stage provided in the exposure optical path for fixing the reticle, and a reticle transfer means for transferring the reticle between the reticle stage and the reticle library.

[0009]

With this configuration, immediately after the reticle stored in the reticle cassette is stored in the reticle library,
The reticle was pulled out from the reticle cassette to the extent that the recognition mark formed on the end of the reticle by the transfer jig was visible, the recognition mark was read, and it was connected to the computer that controls the exposure device in association with the position in the reticle library. It can be stored in the data storage unit. At this stage, the data of all the reticles stored in the reticle library are associated with the positions in the reticle library.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a configuration diagram of a main part of an exposure apparatus according to an embodiment of the present invention. In FIG. 1, 1 is a reticle, 2 is a bar code formed on the end of the surface of the reticle 1, 3 is a reticle cassette containing the reticle 1, 4 is a reticle library for storing a large number of reticle cassettes 3, and 5 is a reticle library. A bar code reader, 6 and 7 are transfer jigs for pulling out and transferring the reticle 1 from the reticle cassette 3, 8a is a condenser lens of the exposure apparatus, 9 is an exposure optical path of the exposure apparatus, 10 is a reticle stage, and 11 is set on the reticle stage 10. The reticle 12 is a dust inspection machine for inspecting whether or not dust is attached to the surface of the reticle 1.
Reference numeral 8b is a reduction projection lens of the exposure apparatus. In the exposure apparatus, in addition to the above components, reticle selecting means for selecting a predetermined reticle 1, transfer means for transferring the reticle 1,
Although there is control means including a computer for controlling a series of operations, it is omitted in FIG. 1 for simplicity.

The operation of the exposure apparatus configured as described above will be described below. Reticle library 4 has reticle 1 stored in reticle cassette 3
, But the position of the reticle cassette 3 is registered in the data storage unit 13 described later. When all reticle cassettes 3 have been stored, transfer jig 6
Draws the ends of the reticle 1 one by one from the reticle cassette 3, the bar code reader 5 reads the bar code 2 with transmitted light or reflected light, and returns the reticle 1 to the original reticle cassette 3. At this time, the reticle 1 has only to be pulled out to the minimum so that the barcode 2 can be read. In this manner, the barcodes 2 are read one by one, and the data and the position of the reticle library 4 are made to correspond to each other and stored in the data storage unit 13 described later.

In actual exposure, one reticle 1
Are taken out from the reticle library 4 and sent to the reticle stage 10. If necessary, they are passed through the dust inspection machine 12. Next, when the reticle 1 is exchanged and the next exposure is performed, the transfer jig 7 takes out the reticle 1 on the reticle stage 10, while the transfer jig 6 pulls out the next reticle 1 from the reticle library 4. Further, it is necessary to provide a transfer jig retreat path so that the transfer jigs 6 and 7 do not collide with each other in the transfer path.

Data exchange in this embodiment will be described below with reference to the block diagram of the data processing apparatus shown in FIG. As shown in FIG. 2, the data of the reticle 1 read by the barcode reader 5 is compared with the data about the position of the reticle library 4 stored in the data storage unit 13 by the data comparator 14. When the data of the reticle 1 is not stored in the data storage unit 13, the data is written, and when the data of the reticle 1 is already stored, both are collated. On the other hand, the exposure condition storage unit 15 of the database stores the exposure conditions of all the reticles in principle. When the predetermined reticle 1 is taken out from the reticle library 4 and transferred to the reticle stage 10, the data in the data storage unit 13 and the data in the exposure condition storage unit 15 are compared with each other in the data comparator 1.
6, the exposure conditions are sent from the exposure condition storage unit 15 to the temporary storage device 17 in the exposure apparatus if they match.
However, when the exposure condition is temporarily changed, the exposure condition input 18 is performed each time.

Next, detailed operations of the exposure apparatus of this embodiment will be described with reference to the flow charts shown in FIGS. The reference numerals used in the description of these flowcharts are the same as those shown in FIG. 1 or FIG. Also
S30 and the like are symbols indicating steps.

FIG. 3 is a flow chart of the reticle storage work in the exposure apparatus of this embodiment. Although this flow chart shows the work of storing the reticle 1 required in the reticle library 4 prior to the exposure process, the same work is required when a new reticle 1 is added. First, the work starts in S30, and the reticle cassette 3 storing the reticle 1 is stored in the reticle library 4 in S31. When all the reticle cassettes 3 have been stored, the door of one reticle cassette 3 (see FIG.
(Not shown). Next, in S33, the end of the reticle 1 is pulled out by the transfer jig 6, and in S34, the barcode 2 on the reticle 1 is read by the barcode reader 5, and then S35.
The data read in step 1 and the place where the reticle 1 was stored are stored in the data storage unit 13 of FIG. 2 in association with each other. Next, the reticle 1 pulled out in S36 is returned to the reticle cassette 3, and the door of the reticle cassette 3 is closed.
The steps from S32 to S37 are performed for all the reticles 1 stored in the reticle library 4, and finally the reticle storage operation is completed in S38.

FIG. 4 is a flowchart of the reticle selection work in the exposure apparatus of this embodiment. This flowchart shows the work of selecting the reticle 1 required in the exposure process. First, the work is started in S40, and the start of the exposure work is instructed in S41. Next, in S42, the reticle name is extracted from the data storage unit 13 and displayed in the display unit (abbreviated as CRT) in S43. Next, in S44, it is determined whether or not there is the desired reticle 1 on the CRT (Yes or No determination),
If so, select reticle 1 in S45. By this selection, the transfer jig 6 pulls out the end of the predetermined reticle 1, and the bar code 2 formed on the end of the reticle 1 is read by the bar code reader 5 in S47. This data is C
Although it is displayed on the RT, it is determined in S48 whether the data matches the reticle 1 selected in S45, and if they match, the reticle selection operation ends in S49. On the other hand, if the desired reticle 1 is not displayed on the CRT in S44, the process returns to S30 shown in FIG. 3 and the reticle 1 is newly added to the reticle library 4. If the data read in S48 is different from that of the desired reticle 1, it is determined in S481 whether or not to proceed with the work, and if ignored, the process proceeds to S60 shown in FIG. 6 described later. However, if not ignored, it is determined in S482 whether to reconfirm. If you do not reconfirm, see Figure 3.
Return to S30 and newly install reticle 1 reticle library 4
However, in the case of reconfirmation, the process proceeds to S50 shown in FIG. 5 described later.

FIG. 5 is a flowchart of the reticle reconfirmation work of the exposure apparatus of this embodiment. This flowchart is mainly a work subsequent to S482 in FIG. First S50
Then, the work starts, and in S51, the barcode 2 written on the end of the reticle 1 is read by the barcode reader 5,
The data is temporarily stored in S52. The reticle 1 is returned to the reticle cassette 3 in S53, the door of the reticle cassette 3 is closed in S54, and it is returned to the reticle library 4.
Next, in S55, the data in the data storage unit 13 is corrected, and S56 is performed.
Then, the reticle reconfirmation work is completed, and the process returns to S41 shown in FIG.

FIG. 6 is a flowchart of the dust inspection work in the exposure apparatus of this embodiment. First, the work starts in S60, and it is determined in S61 whether or not to perform the dust inspection. If the dust inspection is not performed, the reticle 1 is kept waiting in S67 and the process proceeds to S70 shown in FIG. 7, which will be described later. Undergo an inspection. Next, in S64, it is determined whether or not the dust is on the reticle 1. If there is dust that affects the pattern formation, the process proceeds to S73 shown in FIG. 7 described later, and if not, the reticle 1 is taken out from the dust inspection machine 12 in S65. , The dust inspection work is completed in S66, but the reticle is also in the standby state in S68 at this time.

FIG. 7 is a flow chart of the reticle removing work for removing the reticle from the reticle stage of the exposure apparatus of this embodiment. First, in S70, the work is started, and in S71, it is determined whether or not the reticle 11 is on the reticle stage 10 installed in the exposure optical path 9 between the condenser lens 8 and the reduction projection lens 13 of the exposure apparatus. The process proceeds to S80 shown in FIG. 8 to be described later, but if there is, the reticle 11 is sent in S72.
Are removed from the reticle stage 10. This operation is performed by either the transfer jig 6 or the transfer jig 7 which is free (the transfer jig 7 in the case of FIG. 1), and transfers the reticle 11 toward the reticle library 4 in S73. At this time, if another transfer jig (in this case, the transfer jig 6) is present in the transfer path, it is necessary to allow the transfer jig 6 to escape to the bypass. Before being delivered to the predetermined position of the reticle library 4 in this manner, the barcode 2 of the reticle 11 returned in S74 is read and data is stored in S75. If necessary, the data in the data storage unit 13 is rewritten. Finally, the reticle 11 is stored in the reticle cassette 3, and further stored in the reticle library 4, and the reticle removal work is completed in S78. After that, the process returns again to S70 and then S71 to S80.

FIG. 8 is a flowchart of the exposure work in the exposure apparatus of this embodiment. First, the work is started in S80, and in S81, the reticle 1 waiting in S67 or S68 shown in FIG. 6 is taken. Next, in S82, reticle stage 1
Set reticle 1 on 0. Next, in S83, it is determined whether or not the work is to be performed under the exposure conditions determined, and if the work is performed under the conditions, the exposure work is performed in S84, and after the exposure work is completed, the reticle 11 on the reticle stage 10 is removed.
The removed reticle 11 is stored in the reticle cassette 3 by the transfer jig 7, but the end is stopped with the end exposed, and the barcode 2 is read by the barcode reader 5. The read data is temporarily stored as data, and after being compared with the data in the data storage unit 13, the corresponding data in the data storage device 13 is rewritten if necessary. Finally, in S89, store the reticle 11 in the cassette 3 and S
At 90, the exposure work is completed. On the other hand, when the exposure conditions determined in S83 are not met, the exposure conditions are temporarily changed in S91, and the changed exposure conditions in S92 are stored in the temporary storage device 17 in the exposure apparatus. Next, in S93, it is determined whether or not the exposure condition of the exposure condition storage unit 15 of the database is rewritten. If not rewritten, the process proceeds to the exposure operation of S84, but if rewritten, if rewritten, the process proceeds to S84.

[0021]

As described above, according to the present invention, when a reticle is pulled out from or stored in a reticle library that stores a large number of reticles used for pattern formation, the reticle is stopped with its end exposed from the reticle library. With the configuration provided with the recognition mark reading means for reading the recognition mark, the position of the reticle library and the reticle can be made to correspond to each other immediately after the reticle is stored in the reticle library, so that the exposure work can be speeded up and the reticle can be kept normal. It is possible to realize an excellent exposure apparatus that can be used, and it exhibits an excellent effect when used in a pattern forming process for a semiconductor device, a liquid crystal display device, or the like.

[Brief description of drawings]

FIG. 1 is a configuration diagram of a main part of an exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a block diagram of a data processing device in the exposure apparatus.

FIG. 3 is a flowchart of a reticle storage operation in the exposure apparatus.

FIG. 4 is a flowchart of reticle selection work in the exposure apparatus.

FIG. 5 is a flowchart of a reticle reconfirmation work of the exposure apparatus.

FIG. 6 is a flowchart of a dust inspection work in the exposure apparatus.

FIG. 7 is a flowchart of reticle removal work in the exposure apparatus.

FIG. 8 is a flowchart of an exposure work in the exposure apparatus.

FIG. 9 is a schematic perspective view of a reticle confirmation device used in a conventional exposure apparatus.

[Explanation of symbols]

 1 reticle 2 bar code (recognition mark) 3 reticle cassette 4 reticle library 5 bar code reader (recognition mark reading means) 6 transfer jig 7 transfer jig 9 exposure optical path 10 reticle stage

Claims (9)

[Claims] 1. A reticle library for accommodating a plurality of reticles each having an identification mark at an end of a reticle cassette, a reticle selecting means for selecting a predetermined one of the plurality of reticles, and a reticle library. A transfer jig for pulling out or storing the reticle, a recognition mark reading unit for reading the recognition mark of the reticle when the reticle is pulled out or stored, with its end exposed from the reticle library and stopped, and a condenser lens. An exposure apparatus provided with a reticle stage for fixing a reticle provided in an exposure optical path between a reduction projection lens and a reticle transfer means for transferring the reticle between the reticle stage and the reticle library. 2. The data by the reticle recognition mark is
The exposure apparatus according to claim 1, which is a reticle number indicating an applied product, a processing step, and the like. 3. The exposure apparatus according to claim 1, wherein the recognition mark provided on the reticle is a bar code or an optically readable symbol or character. 4. The exposure apparatus according to claim 1, further comprising a dust inspection device in a reticle transfer path or a bypass path between the reticle library and the reticle stage. 5. The operation of pulling out the end portion of the reticle from the reticle cassette to the extent that the transfer jig can read the recognition mark after the reticle stored in the reticle cassette is stored in the reticle library, and the recognition mark is read by the recognition mark reading means. The exposure apparatus according to claim 1, further comprising control means for controlling a reading operation and an operation of returning the reticle to the reticle cassette. 6. The exposure apparatus according to claim 1, wherein the recognition mark reading means is provided on the transfer jig. 7. The reticle transfer means has a plurality of independent transfer jigs, and when one transfer jig is transferring the reticle from the reticle library to the reticle stage,
The exposure apparatus according to claim 1, wherein the other transfer jig transfers the reticle from the reticle stage to the reticle cassette. 8. A data storage unit for storing data read from a recognition mark of a reticle, a positional relationship of a reticle library in which the reticle is stored, and an exposure condition in an exposure operation using the reticle. Item 1. The exposure apparatus according to item 1. 9. An exposure condition corresponding to the reticle is transferred from the data storage unit to the temporary storage device when a data storage unit and a temporary storage device are added and the reticle is fixed to the reticle stage. The exposure apparatus according to claim 1, wherein