JPH05136441A - Material resistant to oxygen atom - Google Patents
Material resistant to oxygen atomInfo
- Publication number
- JPH05136441A JPH05136441A JP3293986A JP29398691A JPH05136441A JP H05136441 A JPH05136441 A JP H05136441A JP 3293986 A JP3293986 A JP 3293986A JP 29398691 A JP29398691 A JP 29398691A JP H05136441 A JPH05136441 A JP H05136441A
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- insulating film
- resin
- solar cell
- resistant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Paints Or Removers (AREA)
- Formation Of Insulating Films (AREA)
- Photovoltaic Devices (AREA)
- Organic Insulating Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、たとえば酸素原子によ
る表面劣化を受けない宇宙用太陽電池等の耐酸素性基板
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an oxygen resistant substrate such as a space solar cell which is not surface-degraded by oxygen atoms.
【０００２】[0002]
【従来の技術】スペースシャトルによる低地球軌道（高
度約１００〜１，０００ｋｍ）での飛行の成功以来、宇
宙基地を初めとする低地球軌道宇宙機の開発が盛んに行
われるようになってきた。しかし、J.Spacecraft andRo
ckets，Vol.23（1986),p.505-511 に示されているよう
に、この高度（低地球軌道）での大気の主成分は酸素原
子であり、この中を宇宙機が飛行すると、宇宙機の大気
に曝露されている部分の表面は酸素原子の衝突によって
著しく劣化する。2. Description of the Related Art Since the successful flight in the low earth orbit (altitude of about 100 to 1,000 km) by the space shuttle, the development of low earth orbit spacecraft including space stations has been actively conducted. .. But J. Spacecraft and Ro
As shown in ckets, Vol.23 (1986), p.505-511, the main component of the atmosphere at this altitude (low earth orbit) is oxygen atom, and when a spacecraft flies in it, The surface of the spacecraft exposed to the atmosphere is significantly deteriorated by the collision of oxygen atoms.
【０００３】例えば、22nd Aero. Sci. Meet, Paper N
o.84-0548(1984)に示された酸素原子による宇宙機表面
材料の劣化に関するフライト実験の結果を見ると、カプ
トンやマイラー（いずれも商標）といった従来の太陽電
池の基板材料では、数十時間の飛行でおよそ１０μｍも
の膜厚減少が生じ、現在開発中あるいは今後の開発が予
定されている宇宙基地を初めとした長期利用（数ケ月〜
数十年以上）の宇宙機に搭載する太陽電池の基板に使用
するのは困難である。For example, 22nd Aero. Sci. Meet, Paper N
Looking at the results of flight experiments on the deterioration of spacecraft surface materials by oxygen atoms shown in o.84-0548 (1984), it is estimated that the substrate materials for conventional solar cells such as Kapton and Mylar Film thickness reduction of about 10 μm occurred in time flight, and long-term use including space station currently under development or planned for future development (for several months ~
It is difficult to use it as a substrate for solar cells mounted on spacecraft for several decades or more).
【０００４】[0004]
【発明が解決しようとする課題】その対策として、カプ
トン等の宇宙機表面材料の上にシリコーン系樹脂膜から
なる絶縁膜を塗布することにより、表面材料の耐酸素原
子性を向上させることが有効であることが分かっている
が、太陽電池の基板材料から絶縁膜が剥離する欠点があ
った。As a countermeasure, it is effective to improve the oxygen atomic resistance of the surface material by applying an insulating film made of a silicone resin film on the surface material of the spacecraft such as Kapton. However, there is a drawback that the insulating film is peeled from the substrate material of the solar cell.
【０００５】本発明は、上記のような問題を解消するた
めになされたもので、宇宙空間における酸素原子に曝露
される環境下で、長期（数十年）に使用しても表面劣化
を受けることのない、また、太陽電池の基板材料等から
剥離しない耐酸素原子性を有する絶縁膜を形成した耐酸
素原子性材料を得ることを目的とする。The present invention has been made in order to solve the above problems, and undergoes surface deterioration even when used for a long period (several decades) in an environment exposed to oxygen atoms in outer space. In addition, it is an object of the present invention to obtain an oxygen-atom-resistant material having an insulating film having oxygen-atom resistance that does not peel off from a substrate material or the like of a solar cell.
【０００６】[0006]
【課題を解決するための手段】本発明に係わる宇宙用太
陽電池等に用いられる耐酸素原子性材料は、宇宙用太陽
電池の太陽電池セル等を支持する基板材料の上に、耐酸
素原子性を有し、また、基板材料から剥離しない樹脂か
らなる絶縁膜を形成したものである。本発明では、宇宙
機搭載用の太陽電池等の基板材料として、耐酸素原子性
を有する樹脂を適用することにより、従来は不可能であ
った宇宙における酸素原子に曝露された環境下での長期
使用（数ケ月〜数十年以上）が可能な、かつ、基板材料
から剥離しない絶縁膜を有する太陽電池を実現するもの
である。An oxygen-resistant atomic material for use in a space solar cell or the like according to the present invention is obtained by applying an oxygen-resistant atomic resistance material on a substrate material supporting a solar cell or the like of a space solar cell. And an insulating film made of a resin that does not separate from the substrate material. In the present invention, by applying a resin having oxygen atomic resistance as a substrate material for a solar cell or the like for mounting on a spacecraft, it has been impossible to achieve a long-term environment in the environment exposed to oxygen atoms in space. It is intended to realize a solar cell having an insulating film which can be used (for several months to several decades or more) and which is not peeled off from a substrate material.
【０００７】本発明において、基板材料の上に絶縁膜を
形成するための耐酸素原子性を有する樹脂としては、炭
素を除くＩＶｂ族系の樹脂が使用でき、特に酸素原子に
直接曝露されても膜厚減少などの劣化の生じない耐酸素
原子シリコーン系樹脂膜が好ましい。このようなシリコ
ーン系樹脂としては、例えば「デンキカガク（Denkikag
aku） Vol.51 No.7 p.554-558（1983）」や特願昭２−
１７８０２７に開示されている下記一般式（Ｉ）で表さ
れる梯子型シリコーンポリマーがあげられる。In the present invention, as the resin having oxygen resistance against oxygen for forming an insulating film on a substrate material, a IVb group resin other than carbon can be used, and even if it is directly exposed to oxygen atoms. An oxygen resistant atom silicone resin film that does not cause deterioration such as film thickness reduction is preferred. Examples of such silicone-based resin include, for example, "Denkikagaku
(aku) Vol.51 No.7 p.554-558 (1983) "and Japanese Patent Application Sho2-
178027 is a ladder-type silicone polymer represented by the following general formula (I).
【０００８】[0008]
【化２】 [Chemical 2]
【０００９】（式中、Ｒ1 はフェニル基または低級アル
キル基であり、Ｒ1 は同種でもよく、異種でもよい。Ｒ
2 は水素原子または低級アルキル基であり、Ｒ2 は同種
でもよく、異種でもよい。ｎは２０〜１０００の整数を
示す。）また、この式で示されるシリコーンラダー系樹
脂と、固形分が５〜３０ｗｔ％になるように加えた芳香
族系の有機溶剤と、樹脂分に対して１５０〜３０００ｐ
ｐｍのシランカップリング剤とを含有するものを使用す
ることが好ましい。(In the formula, R 1 is a phenyl group or a lower alkyl group, and R 1 may be the same or different.
2 is a hydrogen atom or a lower alkyl group, and R 2 may be the same or different. n shows the integer of 20-1000. ) Further, the silicone ladder resin represented by this formula, the aromatic organic solvent added so that the solid content becomes 5 to 30 wt%, and the resin content of 150 to 3000 p
It is preferable to use the one containing a silane coupling agent of pm.
【００１０】[0010]
【作用】前記のような耐酸素原子性を有する樹脂からな
る絶縁膜は、平坦性に富み、低地球軌道の大気の酸素原
子に酸素原子に曝露されても膜厚減少といった劣化が生
じない。また、太陽電池の基板材料から剥離がない。こ
のような樹脂からなる絶縁膜を、従来と同様の基板材料
上に形成した太陽電池用の耐酸素原子性基板は、低地球
軌道の大気に曝露された環境下での長期使用が可能であ
る。特に、シランカップリング剤を適量添加することに
よって、基板から剥離することが防止され、接着性の改
善されたシリコーンラダー系樹脂膜を形成でき、溶媒に
芳香族系の有機溶剤を用いることにより保存性を高め
る。The insulating film made of the resin having the oxygen resistance as described above has a good flatness and does not cause the deterioration such as the film thickness reduction even when the oxygen atoms in the atmosphere in the low earth orbit are exposed to the oxygen atoms. Further, there is no peeling from the substrate material of the solar cell. An oxygen-resistant atomic substrate for solar cells, in which an insulating film made of such a resin is formed on the same substrate material as before, can be used for a long time in an environment exposed to the atmosphere in low earth orbit. .. In particular, by adding an appropriate amount of silane coupling agent, it is possible to form a silicone ladder resin film that is prevented from peeling from the substrate and has improved adhesiveness, and save by using an aromatic organic solvent as the solvent. Enhance sex.
【００１１】[0011]
【実施例】実施例１．以下、本発明を実施例に基づき、
具体的に説明するが、本発明はかかる実施例のみに限定
されるものではない。図１は、本発明の一実施例を示す
図であり、（ａ）は平面材料の場合、（ｂ）は曲面材料
の場合を示している。図中５は宇宙機器の構造体部分
で、８は耐酸素原子性を有する第ＩＶｂ族金属元素を含
んだ樹脂膜からなる絶縁膜である。EXAMPLES Example 1. Hereinafter, the present invention based on examples,
Although specifically described, the present invention is not limited to such an embodiment. 1A and 1B are views showing an embodiment of the present invention, in which FIG. 1A shows a case of a flat material and FIG. 1B shows a case of a curved material. In the figure, 5 is a structural part of space equipment, and 8 is an insulating film made of a resin film containing a Group IVb metal element having oxygen resistance.
【００１２】また、図２は、太陽電池の例を示す図であ
り、太陽電池の要部断面図である。図において、１は太
陽電池セル、２は太陽電池セル１の外面を覆うカバーガ
ラス、３は太陽電池セル１とカバーガラス２を接着する
接着剤、４は各太陽電池セル１を接続するインタコネク
タで、複数の太陽電池セル１は接続された状態で太陽電
池基板５に接着剤６により接着されている。太陽電池基
板５は耐酸素原子性に乏しい従来と同様の基板材料から
なる。例えばＣＦＲＰ等の構造材料７ａに絶縁フィルム
７ｂを積層した積層体の上に、耐酸素原子性を有するシ
リコーン系樹脂からなる絶縁膜８を積層したものであ
り、従来と同様の基板材料からなる構造材料７ａおよび
絶縁フィルム７ｂの積層体の表面に、前記一般式（Ｉ）
のシリコーンポリマーを厚さ０．１〜１００μｍになる
ようにコーティングすることにより形成される。FIG. 2 is a diagram showing an example of a solar cell, which is a cross-sectional view of the main part of the solar cell. In the figure, 1 is a solar cell, 2 is a cover glass that covers the outer surface of the solar cell 1, 3 is an adhesive that bonds the solar cell 1 and the cover glass 2, and 4 is an interconnector that connects the solar cells 1 Then, the plurality of solar battery cells 1 are bonded to the solar battery substrate 5 with the adhesive 6 in a connected state. The solar cell substrate 5 is made of the same substrate material as the conventional one, which is poor in oxygen atomic resistance. For example, an insulating film 8 made of a silicone-based resin having oxygen atom resistance is laminated on a laminated body in which an insulating film 7b is laminated on a structural material 7a such as CFRP. On the surface of the laminate of the material 7a and the insulating film 7b, the general formula (I)
It is formed by coating the above silicone polymer of 0.1 to 100 μm in thickness.
【００１３】以上の図１、図２に示した宇宙機器の構造
体部分５及び太陽電池基板５は、低地球軌道の大気の酸
素原子に直接曝露されても劣化しない耐酸素原子性シリ
コーン系樹脂の絶縁膜８を基板材料５の上に設けること
によって、酸素原子による劣化から基板材料５の表面を
保護し、また、基板材料５から剥離がない絶縁膜を形成
させ、従来は不可能であった宇宙における酸素原子に曝
露される環境下で長期利用（数ケ月〜数十年以上）が可
能である。The structure portion 5 and the solar cell substrate 5 of the space equipment shown in FIGS. 1 and 2 are oxygen-resistant atomic silicone resin that does not deteriorate even when directly exposed to oxygen atoms in the atmosphere in low earth orbit. By providing the insulating film 8 of No. 1 on the substrate material 5, the surface of the substrate material 5 is protected from deterioration due to oxygen atoms, and an insulating film which is not peeled off from the substrate material 5 is formed. It can be used for a long time (several months to several decades or more) under the environment exposed to oxygen atoms in the universe.
【００１４】次に、絶縁膜８の具体的形成方法について
説明する。例えば、絶縁膜８に用いるシリコーンラダー
系樹脂として、ポリフェニルシルセスキオキサン、ポリ
フェニルビニルシルセスキオキサン、ポリフェニルメチ
ルシルセスキオキサン、ポリメチルビニルシルセスキオ
キサン、ポリメチルシルセスキオキサン、ポリビニルシ
ルセスキオキサン、ポリアリールシルセスキオキサンの
うちの少なくとも１種が用いられる。この発明に係わる
芳香族系の有機溶剤として、非極性のベンゼン、トルエ
ン、メトキシベンゼン、エトキシベンゼン、オルトジメ
トキシベンゼンのうちの少なくとも１種が用いられる。
また、シランカップリング剤としてビニルトリエトキシ
シラン、ビニルトリメトキシシラン、β−（３、４エポ
キシシクロヘキシル）エチルトリメトキシシラン、γ−
グリシドキシプロピルトリメトキシシラン、γ−グリシ
ドキシプロピルメチルジエトキシシランのうちの少なく
とも１種が用いられる。Next, a specific method of forming the insulating film 8 will be described. For example, as the silicone ladder resin used for the insulating film 8, polyphenylsilsesquioxane, polyphenylvinylsilsesquioxane, polyphenylmethylsilsesquioxane, polymethylvinylsilsesquioxane, polymethylsilsesquioxane At least one of polyvinyl silsesquioxane, polyvinyl silsesquioxane, and polyaryl silsesquioxane is used. As the aromatic organic solvent according to the present invention, at least one of nonpolar benzene, toluene, methoxybenzene, ethoxybenzene and orthodimethoxybenzene is used.
Further, as a silane coupling agent, vinyltriethoxysilane, vinyltrimethoxysilane, β- (3,4epoxycyclohexyl) ethyltrimethoxysilane, γ-
At least one of glycidoxypropyltrimethoxysilane and γ-glycidoxypropylmethyldiethoxysilane is used.
【００１５】次いで上記された該シリコーン系樹脂をア
ニソールに溶解して濃度２６％としたものを太陽電池基
板５のＣＦＲＰからなる構造材料７ａおよび絶縁フィル
ム７ｂの積層体上にコーティングし、窒素雰囲気中１５
０°Ｃにて３０分間加熱して、乾燥して、膜厚約１１μ
ｍのシリコーンポリマーの絶縁膜８を形成した。Next, the silicone resin described above is dissolved in anisole to a concentration of 26% and coated on the laminated body of the structural material 7a made of CFRP and the insulating film 7b of the solar cell substrate 5 in a nitrogen atmosphere. 15
Heat at 0 ° C for 30 minutes and dry to a film thickness of about 11μ
An insulating film 8 of m silicone resin was formed.
【００１６】上記のようにして得られた平坦な表面を有
するシリコーンポリマーの絶縁膜８をコーティングした
太陽電池基板５を試料として、酸素原子照射装置を用い
て酸素原子照射実験を実施した。照射した酸素原子のフ
ラックスは、実際のスペースシャトルでのフライト実験
と同じ１０14〜１０15個／ｃｍ2 ・ｓｅｃに合わせて行
った。照射前の膜厚を測定した結果を図３に、照射後の
膜厚の測定結果を図４に示す。膜厚の測定は、シリコー
ンポリマーの絶縁膜８と、絶縁膜８の一部を積層体表面
が露出するまで除去して形成した開口との段差を計測し
て行った。図３および図４から明らかなように、シリコ
ーンポリマーの絶縁膜８の照射前後の膜厚変化は殆どな
かった。また、シリコーンラダー系樹脂からなる絶縁膜
と基板材料が剥離するような接着性の劣化はみられなか
った。この結果より、従来と同様の太陽電池基板材料の
上に上記のシリコーン系樹脂からなる絶縁膜を設けた太
陽電池基板は、酸素原子による表面劣化を受けにくく、
また、基板材料から剥離しないことから、宇宙空間にお
ける酸素原子に直接曝露される環境下で長期に使用する
太陽電池として適用できることがわかる。なお、本発明
は上記実施例に限定されることなく、種々変形して実施
することができ、絶縁膜もＳｉだけでなく、Ｇｅ、Ｓ
ｎ、Ｐｂ等の炭素を除く他のＩＶｂ族系の樹脂からなる
絶縁膜を設けることによっても目的は達せられる。An oxygen atom irradiation experiment was carried out by using an oxygen atom irradiation apparatus, using the solar cell substrate 5 coated with the insulating film 8 of the silicone polymer having the flat surface obtained as described above as a sample. The flux of the irradiated oxygen atoms was adjusted to the same 10 14 to 10 15 pieces / cm 2 · sec as in the flight experiment on the actual space shuttle. The result of measuring the film thickness before irradiation is shown in FIG. 3, and the result of measuring the film thickness after irradiation is shown in FIG. The film thickness was measured by measuring the level difference between the insulating film 8 of silicone polymer and the opening formed by removing a part of the insulating film 8 until the surface of the laminate was exposed. As is clear from FIGS. 3 and 4, there was almost no change in the film thickness of the insulating film 8 of the silicone polymer before and after irradiation. Further, no deterioration of the adhesiveness was observed such that the insulating film made of the silicone ladder resin and the substrate material were separated. From this result, the solar cell substrate provided with an insulating film made of the above silicone-based resin on the same solar cell substrate material as the conventional one is less susceptible to surface deterioration due to oxygen atoms,
In addition, since it does not peel off from the substrate material, it can be seen that it can be applied as a solar cell used for a long period of time in an environment where it is directly exposed to oxygen atoms in outer space. The present invention is not limited to the above-described embodiment, and can be carried out in various modified forms, and the insulating film is not limited to Si, but Ge, S, etc.
The purpose can also be achieved by providing an insulating film made of other IVb group resin other than carbon such as n and Pb.
【００１７】実施例２．図５は、本発明の他の実施例を
示す図であり、４はインタコネクタの露出電線、８はイ
ンタコネクタ４の露出電線の周囲を前述した樹脂膜でお
おった絶縁膜である。このように、この発明に係る絶縁
膜は、平面や曲面ばかりでなく、インタコネクタ等の電
線や配線の保護膜としても用いることができる。Embodiment 2. FIG. 5 is a diagram showing another embodiment of the present invention, in which 4 is an exposed wire of the interconnector and 8 is an insulating film in which the exposed wire of the interconnector 4 is covered with the above-mentioned resin film. As described above, the insulating film according to the present invention can be used not only as a flat surface or a curved surface but also as a protective film for electric wires and wiring such as interconnectors.
【００１８】実施例３．上記実施例では、宇宙機器の構
造体部分や宇宙用太陽電池を例にしたが、宇宙用に限る
ものではなく、酸素原子が存在する環境下であれば、こ
の発明は同様の効果を奏する。Example 3. In the above embodiments, the structure portion of the space equipment and the solar cell for space are taken as an example, but the present invention is not limited to space use, and the present invention has the same effect in an environment where oxygen atoms are present.
【００１９】[0019]
【発明の効果】以上のように、本発明によれば、酸素原
子による表面劣化を受けない絶縁膜を基板材料の上に形
成したので、宇宙等における酸素原子に直接曝露される
環境下で長期（数ケ月〜数十年以上）使用できる耐酸素
原子性材料を得ることができる。As described above, according to the present invention, since the insulating film which is not surface-deteriorated by oxygen atoms is formed on the substrate material, it can be exposed to oxygen atoms in space for a long period of time. An oxygen-resistant atomic material that can be used (for several months to several decades or more) can be obtained.
【図１】本発明の一実施例による平面、曲面の断面図。FIG. 1 is a sectional view of a flat surface and a curved surface according to an embodiment of the present invention.
【図２】本発明の一実施例による太陽電池の要部断面
図。FIG. 2 is a sectional view of a main part of a solar cell according to an embodiment of the present invention.
【図３】酸素原子照射前のグラフ図。FIG. 3 is a graph before oxygen atom irradiation.
【図４】照射後の絶縁膜の膜厚測定結果を示すグラフ
図。FIG. 4 is a graph showing a measurement result of a film thickness of an insulating film after irradiation.
【図５】本発明の他の実施例を示す図。FIG. 5 is a diagram showing another embodiment of the present invention.
１ 太陽電池セル ２ カバーガラス ３、６ 接着剤 ４ インタコネクタ ５ 太陽電池基板 ７ａ 構造材料 ７ｂ 絶縁フィルム ８ 絶縁膜 DESCRIPTION OF SYMBOLS 1 Solar cell 2 Cover glass 3,6 Adhesive 4 Interconnector 5 Solar cell substrate 7a Structural material 7b Insulating film 8 Insulating film
フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ０９Ｄ 183/04 ＰＭＴ 8319−4Ｊ Ｈ０１Ｂ 3/46 Ｚ 9059−5Ｇ Ｈ０１Ｌ 21/312 Ｃ 8518−4Ｍ 31/042 // Ｃ０８Ｌ 83:00 Front page continuation (51) Int.Cl. 5 Identification code Office reference number FI Technical display location C09D 183/04 PMT 8319-4J H01B 3/46 Z 9059-5G H01L 21/312 C 8518-4M 31/042 / / C08L 83:00
Claims (3)
性を有する樹脂からなる絶縁体。1. An oxygen-atom resistant material having the following elements: (a) a material used in the presence of oxygen atoms, (b) a resin having oxygen-resistant atomic resistance, which covers at least a part of the above material. Insulator.
属元素を含む化合物の重合体であって、シランカップリ
ング剤を含有する樹脂で形成ことを特徴とする請求項１
記載の耐酸素原子性材料。2. The insulator according to claim 1, which is a polymer of a compound containing a Group IVb metal element, which is formed of a resin containing a silane coupling agent.
The oxygen-resistant atomic material described.
り、Ｒ１は同種でもよく、異種でもよい。Ｒ２は水素原
子または低級アルキル基であり、Ｒ２は同種でもよく、
異種でもよい。ｎは２０〜１０００の整数を示す。）で
示されるシリコーンラダー系樹脂と、固形分が５〜３０
ｗｔ％になるように加えた芳香族系の有機溶剤と、樹脂
分に対して１５０〜３０００ｐｐｍのシランカップリン
グ剤とを含有するシリコーンラダー系樹脂塗布液組成物
に基づいて形成することを特徴とする請求項１記載の耐
酸素原子性材料。3. The insulator according to claim 1 has the general formula: (In the formula, R1 is a phenyl group or a lower alkyl group, R1 may be the same or different, R2 is a hydrogen atom or a lower alkyl group, and R2 may be the same.
It can be different. n shows the integer of 20-1000. ) And a silicone ladder-based resin having a solid content of 5 to 30
It is formed based on a silicone ladder-based resin coating liquid composition containing an aromatic organic solvent added so as to be wt% and a silane coupling agent of 150 to 3000 ppm with respect to the resin content. The oxygen-resistant atomic material according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3293986A JP2988072B2 (en) | 1991-11-11 | 1991-11-11 | Oxygen resistant material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3293986A JP2988072B2 (en) | 1991-11-11 | 1991-11-11 | Oxygen resistant material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05136441A true JPH05136441A (en) | 1993-06-01 |
| JP2988072B2 JP2988072B2 (en) | 1999-12-06 |
Family
ID=17801774
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3293986A Expired - Fee Related JP2988072B2 (en) | 1991-11-11 | 1991-11-11 | Oxygen resistant material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2988072B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6262358B1 (en) | 1999-02-18 | 2001-07-17 | Sharp Kabushiki Kaisha | Solar cell module and solar cell panel using the same |
| JP2007129015A (en) * | 2005-11-02 | 2007-05-24 | Dainippon Printing Co Ltd | Solar cell module and reverse-surface protection sheet for solar cell module |
| JP2012004176A (en) * | 2010-06-14 | 2012-01-05 | Mitsubishi Electric Corp | Solar battery panel |
| US20120055540A1 (en) * | 2010-09-06 | 2012-03-08 | Hiroshi Yamaguchi | Solar battery module |
| JP2016519621A (en) * | 2013-03-14 | 2016-07-07 | ユニバーシティ オブ サリー | Carbon fiber reinforced plastic |
-
1991
- 1991-11-11 JP JP3293986A patent/JP2988072B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6262358B1 (en) | 1999-02-18 | 2001-07-17 | Sharp Kabushiki Kaisha | Solar cell module and solar cell panel using the same |
| JP2007129015A (en) * | 2005-11-02 | 2007-05-24 | Dainippon Printing Co Ltd | Solar cell module and reverse-surface protection sheet for solar cell module |
| JP2012004176A (en) * | 2010-06-14 | 2012-01-05 | Mitsubishi Electric Corp | Solar battery panel |
| US20120055540A1 (en) * | 2010-09-06 | 2012-03-08 | Hiroshi Yamaguchi | Solar battery module |
| JP2016519621A (en) * | 2013-03-14 | 2016-07-07 | ユニバーシティ オブ サリー | Carbon fiber reinforced plastic |
| US10550232B2 (en) | 2013-03-14 | 2020-02-04 | University Of Surrey | Thin film barrier coating for CFRP |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2988072B2 (en) | 1999-12-06 |
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