JPH05135725A - Removing method for organic gas molecule in charged particle beam device - Google Patents

Removing method for organic gas molecule in charged particle beam device

Info

Publication number
JPH05135725A
JPH05135725A JP32005891A JP32005891A JPH05135725A JP H05135725 A JPH05135725 A JP H05135725A JP 32005891 A JP32005891 A JP 32005891A JP 32005891 A JP32005891 A JP 32005891A JP H05135725 A JPH05135725 A JP H05135725A
Authority
JP
Japan
Prior art keywords
sample
organic gas
sample chamber
gas molecules
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP32005891A
Other languages
Japanese (ja)
Inventor
Nobuaki Tamura
伸昭 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP32005891A priority Critical patent/JPH05135725A/en
Publication of JPH05135725A publication Critical patent/JPH05135725A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To provide the removing method of organic gas molecules in a charged particles beam device preventing the formation of a film on the surface of a sample when an electron beam is radiated to the sample. CONSTITUTION:When no sample observation is made, a secondary electron detector 7 is turned off, a sample chamber 3 is leaked, a sample stage 5 is extracted, and a sample 6 is extracted from the sample stage 5. The sample stage 5 is set to the original position, and the sample chamber 3 is exhausted with a vacuum pump 4 to high vacuum. A power source 9 is controlled to feed a current to a tungsten filament 10. Thermoelectrons are radially emitted from the filament 10. The energy of the thermoelectrons is set from several eV to tens eV by the power source 9 and a resistor 11. When the thermoelectrons are radiated to organic gas molecules adsorbed on the wall face of the sample chamber 3, the organic gas molecules are polymerized and deposited on the wall face of the sample chamber 3 as a film. When an electron beam is radiated to the sample 6 for sample observation, no film is formed on the surface of the sample 6, and the sample 6 is not polluted.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】 本発明は走査電子顕微鏡、X線
マイクロアナライザなどの荷電粒子ビーム装置における
有機ガス分子の除去方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing organic gas molecules in a charged particle beam device such as a scanning electron microscope and an X-ray microanalyzer.

【0002】[0002]

【従来の技術】 走査電子顕微鏡やX線マイクロアナラ
イザ等においては、試料は集束された電子線でもって二
次元的に走査され、この走査によって試料からは二次電
子や反射電子やX線等が放出される。これらは検出器に
より検出され、試料特有の情報信号に基づいて、陰極線
管のスクリーンには、試料走査領域の像が表示される。
2. Description of the Related Art In a scanning electron microscope, an X-ray microanalyzer, etc., a sample is two-dimensionally scanned with a focused electron beam, and this scanning causes secondary electrons, backscattered electrons, X-rays, etc. to be emitted from the sample. Is released. These are detected by the detector, and the image of the sample scanning area is displayed on the screen of the cathode ray tube based on the information signal specific to the sample.

【0003】このような電子線の照射を伴なう装置にお
いては、真空ポンプの油や試料ステージのグリース等か
ら生じた蒸気、すなわちハイドロカーボンを主体とした
有機ガス分子が試料室壁面などに吸着して油膜となった
り、試料室内で分子運動をする。試料室内の有機ガス分
子はこのように吸脱着を繰り返し、長時間排気してもな
かなか減少しない。試料観察のため試料に電子線照射を
行なうと、この有機ガス分子が電子線によって重合し、
試料表面に被膜が形成される。このような試料汚染を軽
減するため、試料観察を行わない時に試料室を50〜6
0℃でベーキング処理し、試料室内の有機ガス分子を取
り除いている。
In such an apparatus involving electron beam irradiation, vapor generated from oil of a vacuum pump or grease of a sample stage, that is, organic gas molecules mainly composed of hydrocarbon are adsorbed on a wall surface of a sample chamber or the like. Then, it becomes an oil film or moves in the sample chamber. The organic gas molecules in the sample chamber are repeatedly adsorbed and desorbed in this way, and do not easily decrease even after evacuation for a long time. When the sample is irradiated with an electron beam to observe the sample, the organic gas molecules are polymerized by the electron beam,
A film is formed on the sample surface. In order to reduce such sample contamination, set the sample chamber to 50-6
Baking is performed at 0 ° C. to remove organic gas molecules in the sample chamber.

【0004】[0004]

【発明が解決しようとする課題】 しかしながら、前記
したように試料をセットする試料ステージには多量のグ
リースが使用されているので、前記ベーキング処理によ
りグリースが蒸発し、試料室内の有機ガス分子の量はベ
ーキング処理前より多くなる場合がある。このため、試
料観察のため試料に電子線照射を行うと、試料汚染は更
にひどくなる。試料が汚染されると試料の微細構造が変
化し、詳細な像観察が行えない。また、X線マイクロア
ナライザにおいて試料の元素分析を行った場合、試料表
面にできる被膜により正確な元素分析ができない。
However, since a large amount of grease is used in the sample stage for setting the sample as described above, the baking process evaporates the grease, and the amount of organic gas molecules in the sample chamber increases. May be more than before baking. For this reason, when the sample is irradiated with an electron beam for observing the sample, the sample is further contaminated. When the sample is contaminated, the fine structure of the sample changes, and detailed image observation cannot be performed. Further, when the elemental analysis of the sample is carried out by the X-ray microanalyzer, the film formed on the surface of the sample cannot provide accurate elemental analysis.

【0005】本発明はこのような点に鑑みて成されたも
ので、その目的は、試料に電子線照射を行なった時、試
料表面に被膜が形成されるのを防ぐ荷電粒子ビーム装置
における有機ガス分子の除去方法を提供することであ
る。
The present invention has been made in view of the above circumstances, and an object of the present invention is to prevent the formation of a film on the surface of a sample when the sample is irradiated with an electron beam. It is to provide a method for removing gas molecules.

【0006】[0006]

【課題を解決するための手段】 本発明の荷電粒子ビー
ム装置における有機ガス分子の除去方法は、試料を試料
室から退避させ、試料室内に配置された熱電子放出源か
ら放射される熱電子により試料室内の有機ガス分子を被
膜化して試料室壁などに付着させるようにした。また、
試料表面をカバー部材でカバーし、試料室内に配置され
た熱電子放出源から放射される熱電子により試料室内の
有機ガス分子を被膜化して試料室壁などに付着させるよ
うにした。
A method for removing organic gas molecules in a charged particle beam apparatus according to the present invention is a method in which a sample is retracted from a sample chamber, and thermoelectrons emitted from a thermoelectron emission source arranged in the sample chamber are used. The organic gas molecules in the sample chamber were formed into a film and attached to the walls of the sample chamber. Also,
The surface of the sample was covered with a cover member, and the organic gas molecules in the sample chamber were made into a film by thermoelectrons emitted from a thermoelectron emission source arranged in the sample chamber to be attached to the wall of the sample chamber.

【0007】[0007]

【実施例】 図1は本発明を説明するために示した走査
電子顕微鏡の概略図である。図において、1は電子発生
源、2は集束レンズ,偏向器,対物レンズなどから成る
電子光学系、3は試料室、4は真空ポンプ、5は試料ス
テージ、6は試料、7は二次電子検出器である。8は熱
電子放出機構で、電源9,タングステンフィラメント1
0,抵抗11から成る。
EXAMPLE FIG. 1 is a schematic view of a scanning electron microscope shown for explaining the present invention. In the figure, 1 is an electron generation source, 2 is an electron optical system including a focusing lens, a deflector, an objective lens, etc., 3 is a sample chamber, 4 is a vacuum pump, 5 is a sample stage, 6 is a sample, 7 is a secondary electron. It is a detector. Reference numeral 8 is a thermionic emission mechanism, which includes a power source 9 and a tungsten filament 1.
It consists of 0 and resistance 11.

【0008】この様な構成において、試料室3は真空ポ
ンプ4により高真空に排気される。また、電子線発生源
1から射出された電子は、電子光学系2で集束および偏
向されて試料6上を二次元的に走査する。この走査によ
り試料6から放出される二次電子は二次電子検出器7で
検出され、陰極線管(図示せず)に供給される。
In such a structure, the sample chamber 3 is evacuated to a high vacuum by the vacuum pump 4. The electrons emitted from the electron beam generation source 1 are focused and deflected by the electron optical system 2 to scan the sample 6 two-dimensionally. Secondary electrons emitted from the sample 6 by this scanning are detected by the secondary electron detector 7 and supplied to a cathode ray tube (not shown).

【0009】前記したように、真空ポンプ4の油や試料
ステージ5のグリース等から発生した蒸気、すなわちハ
イドロカーボンを主体とした有機ガス分子は試料室壁面
などに吸着して油膜となったり、試料室内で分子運動を
する。試料観察のため試料6に電子線照射を行なうと、
この有機ガス分子は電子線によって重合し、試料表面に
被膜が形成される。
As described above, the vapor generated from the oil of the vacuum pump 4 and the grease of the sample stage 5, that is, the organic gas molecules mainly composed of hydrocarbon are adsorbed on the wall surface of the sample chamber to form an oil film, Moves molecules indoors. When the sample 6 is irradiated with an electron beam to observe the sample,
The organic gas molecules are polymerized by the electron beam to form a film on the sample surface.

【0010】以下に、試料室3のクリーニングについて
述べる。
The cleaning of the sample chamber 3 will be described below.

【0011】試料観察を行わない時に二次電子検出器7
をOFFにし、試料室3をリークして試料ステージ5を
引き出し、試料6を試料ステージ5から取り外す。試料
6を取り外したら、試料ステージ5を元の位置にセット
し試料室3を真空ポンプ4により高真空に排気する。次
に、電源9を制御してタングステンフィラメント10に
電流を流す。この結果、フィラメント10からは熱電子
が放射状に飛び出す。この熱電子のエネルギーは、抵抗
11と抵抗11に流れる電流の積により数〜数十eVに
なる。試料室3の壁面などに吸着している有機ガス分子
に熱電子が照射されると、有機ガス分子は重合して試料
室壁面に被膜として着く。フィラメント10から放出さ
れる熱電子のエネルギーを数〜数十eVに制御するの
は、ハイドロカーボンを主体とした有機ガス分子はこの
エネルギーの電子線に当ると最も被膜に成りやすいから
である。そして、電源9を切って試料室3のクリーニン
グは終了する。
The secondary electron detector 7 when the sample is not observed
Is turned off, the sample chamber 3 is leaked, the sample stage 5 is pulled out, and the sample 6 is removed from the sample stage 5. After removing the sample 6, the sample stage 5 is set to the original position, and the sample chamber 3 is evacuated to a high vacuum by the vacuum pump 4. Next, the power supply 9 is controlled to supply a current to the tungsten filament 10. As a result, thermoelectrons are radially ejected from the filament 10. The energy of this thermoelectron becomes several to several tens eV due to the product of the resistance 11 and the current flowing through the resistance 11. When the thermoelectrons are applied to the organic gas molecules adsorbed on the wall surface of the sample chamber 3, the organic gas molecules are polymerized and reach the sample chamber wall surface as a film. The energy of thermoelectrons emitted from the filament 10 is controlled to several to several tens of eV because the organic gas molecules mainly composed of hydrocarbon are most likely to form a film when hit with an electron beam of this energy. Then, the power source 9 is turned off, and the cleaning of the sample chamber 3 is completed.

【0012】試料を観察する場合は、試料室3をリーク
して試料ステージ5を引き出す。試料ステージ5に試料
6をセットしたら試料ステージ5を元の位置にセットし
試料室3を真空ポンプ4により高真空に排気する。そし
て、二次電子検出器7をONにし、電子線を試料6に照
射する。前記クリーニングにより、試料室内の有機ガス
分子は被膜となっているので、試料室内の有機ガス分子
は減少している。この為、試料表面に被膜が形成される
ことはなく、試料汚染は発生しない。試料室内の有機ガ
ス分子の量は時間と共に増えるが、試料観察を行わない
時に前記クリーニングを行えば、従来に比べ試料汚染は
大巾に軽減できる。
When observing the sample, the sample chamber 3 is leaked and the sample stage 5 is pulled out. After the sample 6 is set on the sample stage 5, the sample stage 5 is set to the original position and the sample chamber 3 is evacuated to a high vacuum by the vacuum pump 4. Then, the secondary electron detector 7 is turned on, and the sample 6 is irradiated with an electron beam. As a result of the cleaning, the organic gas molecules in the sample chamber are formed into a film, so that the organic gas molecules in the sample chamber are reduced. Therefore, no film is formed on the sample surface, and sample contamination does not occur. The amount of organic gas molecules in the sample chamber increases with time, but if the cleaning is performed when the sample is not observed, the sample contamination can be greatly reduced as compared with the conventional case.

【0013】図2に示すようにカバー部材12を設け、
試料室3のクリーニング時にカバー部材12を移動させ
て試料6をカバーするようにすれば、試料6を試料ステ
ージ5から取り外す必要はない。
A cover member 12 is provided as shown in FIG.
If the cover member 12 is moved to cover the sample 6 at the time of cleaning the sample chamber 3, it is not necessary to remove the sample 6 from the sample stage 5.

【0014】また、試料交換室を持つ装置の場合、試料
交換時も試料室の真空は保たれているため、有機ガスを
壁面に被膜として付着させた効果を長時間にわたって持
続することができる。
Further, in the case of an apparatus having a sample exchange chamber, since the vacuum of the sample chamber is maintained even during sample exchange, the effect of adhering the organic gas as a film on the wall surface can be maintained for a long time.

【0015】また、本発明はX線マイクロアナライザや
電子ビーム描画装置、さらにはイオンビーム描画装置な
どにも応用できる。
The present invention can also be applied to an X-ray microanalyzer, an electron beam drawing apparatus, an ion beam drawing apparatus, and the like.

【0016】[0016]

【発明の効果】 本発明によれば、試料を試料室から退
避させ、もしくは試料表面をカバー部材でカバーして、
試料室内に配置された熱電子放出源から放射される熱電
子により試料室内の有機ガス分子を被膜化して試料室壁
などに付着させるようにしたので、観察の際に試料に電
子線照射を行なっても試料表面には被膜は形成されな
い。このため、試料の観察が十分に行なえ、また、試料
の分析が正確に行える。
According to the present invention, the sample is retracted from the sample chamber, or the sample surface is covered with a cover member,
The thermoelectrons emitted from the thermoelectron emission source placed inside the sample chamber made the organic gas molecules inside the sample chamber film-attached to the walls of the sample chamber, so that the sample was irradiated with electron beams during observation. However, no film is formed on the sample surface. Therefore, the sample can be sufficiently observed, and the sample can be analyzed accurately.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明を説明するために示した走査電子顕微
鏡の概略図である。
FIG. 1 is a schematic view of a scanning electron microscope shown to explain the present invention.

【図2】 試料をカバー部材でカバーする事を説明する
ために示した図である。
FIG. 2 is a view shown for explaining covering a sample with a cover member.

【符号の説明】[Explanation of symbols]

1…電子発生源 2…電子光学系 3…試料室 4…真空ポンプ 5…試料ステージ 6…試料 7…二次電子検出器 8…熱電子放出機構 9…電源 10…タングステンフィラメント 11…抵抗 12…カバー部材 DESCRIPTION OF SYMBOLS 1 ... Electron generation source 2 ... Electron optical system 3 ... Sample chamber 4 ... Vacuum pump 5 ... Sample stage 6 ... Sample 7 ... Secondary electron detector 8 ... Thermionic emission mechanism 9 ... Power supply 10 ... Tungsten filament 11 ... Resistor 12 ... Cover member

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 試料を試料室から退避させ、試料室内に
配置された熱電子放出源から放射される熱電子により試
料室内の有機ガス分子を被膜化して試料室壁などに付着
させるようにした荷電粒子ビーム装置における有機ガス
分子の除去方法。
1. A sample is evacuated from a sample chamber, and thermoelectrons emitted from a thermoelectron emission source arranged in the sample chamber are used to form a film of organic gas molecules in the sample chamber to adhere to the walls of the sample chamber. A method for removing organic gas molecules in a charged particle beam device.
【請求項2】 試料表面をカバー部材でカバーし、試料
室内に配置された熱電子放出源から放射される熱電子に
より試料室内の有機ガス分子を被膜化して試料室壁など
に付着させるようにした荷電粒子ビーム装置における有
機ガス分子の除去方法。
2. The surface of the sample is covered with a cover member so that the organic gas molecules in the sample chamber are made into a film by thermoelectrons emitted from a thermoelectron emission source arranged in the sample chamber and adhered to the sample chamber wall or the like. Method for removing organic gas molecules in a charged particle beam device.
JP32005891A 1991-11-07 1991-11-07 Removing method for organic gas molecule in charged particle beam device Withdrawn JPH05135725A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32005891A JPH05135725A (en) 1991-11-07 1991-11-07 Removing method for organic gas molecule in charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32005891A JPH05135725A (en) 1991-11-07 1991-11-07 Removing method for organic gas molecule in charged particle beam device

Publications (1)

Publication Number Publication Date
JPH05135725A true JPH05135725A (en) 1993-06-01

Family

ID=18117251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32005891A Withdrawn JPH05135725A (en) 1991-11-07 1991-11-07 Removing method for organic gas molecule in charged particle beam device

Country Status (1)

Country Link
JP (1) JPH05135725A (en)

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WO2006123437A1 (en) * 2005-05-20 2006-11-23 Advantest Corporation Charged particle beam apparatus, contamination removing method and sample observing method
US7205541B1 (en) 2005-11-22 2007-04-17 Hitachi High-Technologies Corporation Charged particle beam apparatus
JP2007149571A (en) * 2005-11-30 2007-06-14 Hitachi High-Technologies Corp Sample measuring method and charged particle beam apparatus
JP2008130428A (en) * 2006-11-22 2008-06-05 Hitachi High-Technologies Corp Electron microscope
JP2010021345A (en) * 2008-07-10 2010-01-28 Hitachi Ltd Charged particle beam apparatus
JP2011233532A (en) * 2011-06-24 2011-11-17 Hitachi High-Technologies Corp Charged particle beam device
CN111727488A (en) * 2018-02-07 2020-09-29 株式会社日立高新技术 Cleaning device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006123437A1 (en) * 2005-05-20 2006-11-23 Advantest Corporation Charged particle beam apparatus, contamination removing method and sample observing method
US7205541B1 (en) 2005-11-22 2007-04-17 Hitachi High-Technologies Corporation Charged particle beam apparatus
JP2007141741A (en) * 2005-11-22 2007-06-07 Hitachi High-Technologies Corp Charged particle beam apparatus
US7601974B2 (en) 2005-11-22 2009-10-13 Hitachi High-Technologies Corporation Charged particle beam apparatus
US8071961B2 (en) 2005-11-30 2011-12-06 Hitachi High-Technologies Corporation Charged particle beam apparatus
JP2007149571A (en) * 2005-11-30 2007-06-14 Hitachi High-Technologies Corp Sample measuring method and charged particle beam apparatus
JP2008130428A (en) * 2006-11-22 2008-06-05 Hitachi High-Technologies Corp Electron microscope
JP2010021345A (en) * 2008-07-10 2010-01-28 Hitachi Ltd Charged particle beam apparatus
JP2011233532A (en) * 2011-06-24 2011-11-17 Hitachi High-Technologies Corp Charged particle beam device
CN111727488A (en) * 2018-02-07 2020-09-29 株式会社日立高新技术 Cleaning device
JPWO2019155540A1 (en) * 2018-02-07 2021-01-28 株式会社日立ハイテク Cleaning equipment
CN111727488B (en) * 2018-02-07 2023-06-06 株式会社日立高新技术 Cleaning device
DE112018006804B4 (en) 2018-02-07 2024-05-29 Hitachi High-Tech Canada, Inc. Cleaning device

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Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19990204