JPH05132302A - Method for purifying hydrogen chloride gas - Google Patents

Method for purifying hydrogen chloride gas

Info

Publication number
JPH05132302A
JPH05132302A JP32137791A JP32137791A JPH05132302A JP H05132302 A JPH05132302 A JP H05132302A JP 32137791 A JP32137791 A JP 32137791A JP 32137791 A JP32137791 A JP 32137791A JP H05132302 A JPH05132302 A JP H05132302A
Authority
JP
Japan
Prior art keywords
hydrogen chloride
chloride gas
acid
sulfuric acid
organic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32137791A
Other languages
Japanese (ja)
Other versions
JPH0742086B2 (en
Inventor
Masami Higure
正美 日暮
Chuji Yamamoto
智勇治 山本
Yukimi Goto
幸己 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP3321377A priority Critical patent/JPH0742086B2/en
Publication of JPH05132302A publication Critical patent/JPH05132302A/en
Publication of JPH0742086B2 publication Critical patent/JPH0742086B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • C01B7/07Purification ; Separation
    • C01B7/0706Purification ; Separation of hydrogen chloride

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PURPOSE:To lower organic acid concentration in a hydrogen chloride gas by bringing a crude hydrogen chloride gas containing an organic acid into contact with sulfuric acid solution. CONSTITUTION:A crude hydrogen chloride gas containing 500-1000ppm organic acid is introduced from an inlet pipe 2 into the bottom of an adsorbing gas. A sulfuric acid solution containing <=30wt.% organic acid and kept at -10 to 30 deg.C is introduced into the top of an adsorbing tower 4 and brought into countercurrent contact with the organic acid and the liquid is passed through a pump 5 and a heat exchanger 6 to control the temperature and fed to the tower top of the absorbing tower 4. The purified hydrogen chloride gas is taken out through an inlet pipe 7 and a sulfuric acid mist separator 8 from an inlet pipe 9.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は塩化水素ガスの精製に関
するものである。さらに詳しくは有機酸を含有する塩化
水素ガスを硫酸で処理することによって該有機酸を分離
する方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to purification of hydrogen chloride gas. More specifically, it relates to a method of separating an organic acid by treating hydrogen chloride gas containing the organic acid with sulfuric acid.

【0002】[0002]

【従来の技術】従来、有機酸を含む塩化水素ガスの精製
法については、いろいろ提案されている。たとえば圧縮
液化蒸留法(特公昭42−174号),抽出法(特公昭
49−42796号),熱分解法(特公昭56−116
43)などがあるが、これらは複雑な工程を必要とし、
又使用助剤,エネルギー等の消費が大きく、工業的には
十分満足できるものではない。
2. Description of the Related Art Conventionally, various methods for purifying hydrogen chloride gas containing an organic acid have been proposed. For example, compression liquefaction distillation method (Japanese Patent Publication No. 42-174), extraction method (Japanese Patent Publication No. 49-42796), thermal decomposition method (Japanese Patent Publication No. 56-116).
43) etc., but these require complicated steps,
In addition, it consumes a large amount of auxiliary agents, energy, etc., and is not industrially sufficiently satisfactory.

【0003】この中で、熱分解法は比較的容易で確実な
精製法であるが、塩素ガスと水素ガスとを反応させ、合
成塩酸を製造する設備が必要であり、合成塩酸を必要と
しないところでは使用できない。又合成塩酸の製造量に
対して、処理できる粗製塩化水素ガスには制限がある。
Of these, the thermal decomposition method is a relatively easy and reliable refining method, but a facility for reacting chlorine gas and hydrogen gas to produce synthetic hydrochloric acid is required, and synthetic hydrochloric acid is not required. Not usable by the way. There is a limit to the amount of crude hydrogen chloride gas that can be treated with respect to the production amount of synthetic hydrochloric acid.

【0004】一方、一部の有機化合物が濃硫酸に溶解す
ることは知られており、濃硫酸に可溶な有機化合物を含
有してなる塩化水素ガスを硫酸と接触させれば、塩化水
素ガスは硫酸にほとんど溶解しないので、塩化水素ガス
中の有機化合物が硫酸に選択的に溶解し、塩化水素ガス
の精製がある程度期待できる。しかしながら、実際に硫
酸との接触によって、塩化水素ガスの高度な精製が行わ
れている例は、ほとんど見当たらない。
On the other hand, it is known that some organic compounds dissolve in concentrated sulfuric acid, and if hydrogen chloride gas containing an organic compound soluble in concentrated sulfuric acid is brought into contact with sulfuric acid, hydrogen chloride gas Is hardly dissolved in sulfuric acid, the organic compound in hydrogen chloride gas is selectively dissolved in sulfuric acid, and purification of hydrogen chloride gas can be expected to some extent. However, there are few examples in which hydrogen chloride gas is actually highly purified by contact with sulfuric acid.

【0005】この理由は、塩化水素ガス中の有機化合物
を実際に精製塩化水素ガスと呼べる濃度まで低下させる
事が気液平衡上困難であったり、又硫酸−有機化合物−
塩化水素の3成分系の気液平衡関係が詳しく知られてい
なかったり、さらに又高度の精製が可能でも硫酸の使用
が多量となり、経済上精製技術として成立し得なかった
からと思われる。わずかにこの種の精製法として、塩化
アセチルを含む塩化水素ガスを、水,酢酸及び硫酸から
なる洗液に接触させ、塩化水素ガスから塩化アセチルを
除去する精製法(特開昭51−143596)が報告さ
れている。しかし、かかる精製法では塩化水素ガス中の
不純物として、酢酸分が200ppm(体積基準、以下
同じ)程度残存するため、一部の用途を除いて、直接他
の製造工程で使用できない。
The reason for this is that it is difficult in terms of vapor-liquid equilibrium to reduce the concentration of organic compounds in hydrogen chloride gas to a concentration that can actually be called purified hydrogen chloride gas, and sulfuric acid-organic compounds-
This is probably because the vapor-liquid equilibrium relationship of the hydrogen chloride ternary system was not known in detail, or even if high-level purification was possible, the amount of sulfuric acid used was large and could not be economically established as a purification technique. As a slight refining method of this kind, a refining method in which hydrogen chloride gas containing acetyl chloride is contacted with a washing liquid composed of water, acetic acid and sulfuric acid to remove acetyl chloride from the hydrogen chloride gas (Japanese Patent Laid-Open No. 51-143596). Has been reported. However, in such a purification method, acetic acid content of about 200 ppm (volume basis, the same applies hereinafter) remains as an impurity in hydrogen chloride gas, and therefore cannot be directly used in other manufacturing steps except for some applications.

【0006】[0006]

【発明が解決しようとする課題】本発明は、上記欠点、
つまり複雑な設備の使用や使用上の制約といった問題も
なく、きわめて経済的に有機酸を含む粗製塩化水素ガス
を、精製する方法を提供するものである。
SUMMARY OF THE INVENTION The present invention has the above-mentioned drawbacks,
That is, the present invention provides a method for purifying crude hydrogen chloride gas containing an organic acid extremely economically without problems such as the use of complicated equipment and restrictions on use.

【0007】[0007]

【課題を解決するための手段】本発明者らは、従来詳し
く知られていなかった有機酸と硫酸及び塩化水素との気
液平衡関係を詳細に研究した結果、有機酸を含む塩化水
素ガスを硫酸と接触させる事によって容易に高度かつ経
済的に精製できることを見出した。
The present inventors have studied in detail the gas-liquid equilibrium relationship between an organic acid and sulfuric acid and hydrogen chloride, which have not been known in detail in the past, and as a result, It was found that it can be easily and economically refined by bringing it into contact with sulfuric acid.

【0008】即ち、本発明の第一の発明は、有機酸を含
有している塩化水素ガスから、当該有機酸を除去する方
法において、該粗製塩化水素ガスを硫酸溶液に接触させ
る事を特徴とする塩化水素ガスの精製方法であり、第二
の発明は、有機酸を最大30重量%含む硫酸溶液に、−
10〜30℃の温度で該粗製塩化水素ガスを接触させる
ことを特徴とする請求項1記載の塩化水素ガスの精製方
法である。
That is, the first invention of the present invention is characterized in that in the method for removing the organic acid from the hydrogen chloride gas containing the organic acid, the crude hydrogen chloride gas is brought into contact with a sulfuric acid solution. A second aspect of the present invention is a method for purifying hydrogen chloride gas, wherein a sulfuric acid solution containing a maximum of 30% by weight of an organic acid is added.
The method for purifying hydrogen chloride gas according to claim 1, wherein the crude hydrogen chloride gas is contacted at a temperature of 10 to 30 ° C.

【0009】本発明に適用可能な代表的な有機酸として
は、ギ酸、酢酸、プロピオン酸、酪酸、イソ酪酸、吉草
酸、ピバル酸、ラウリン酸、ミリスチン酸、パルミチン
酸、ステアリン酸、アクリル酸、プロピオル酸、メタク
リル酸、クロトン酸、オレイン酸、安息香酸等のモノカ
ルボン酸、及びシュウ酸、マロン酸、コハク酸、グルタ
ル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライ
ン酸、セバシン酸、マレイン酸、フマル酸、イタコン
酸、フタル酸、イソフタル酸、テレフタル酸等のジカル
ボン酸などが挙げられる。
Typical organic acids applicable to the present invention include formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, pivalic acid, lauric acid, myristic acid, palmitic acid, stearic acid, acrylic acid, Monocarboxylic acids such as propiolic acid, methacrylic acid, crotonic acid, oleic acid, benzoic acid, and oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, maleic acid And dicarboxylic acids such as fumaric acid, itaconic acid, phthalic acid, isophthalic acid, and terephthalic acid.

【0010】不純物として上記のような有機酸を500
〜1000ppm含有してなる粗製塩化水素ガスを、こ
れらの有機酸を0〜30重量%含む硫酸溶液に、−10
〜30℃の温度で、充填塔のような既知の吸収塔を使用
して、効率よく接触させ、塩化水素ガス中の有機酸を選
択的に硫酸に溶解せしめ、塩化水素ガスの精製を行うこ
とができる。
As an impurity, 500 of the above organic acids is used.
The crude hydrogen chloride gas containing 1000 ppm to 1000 ppm was added to a sulfuric acid solution containing these organic acids in an amount of 0 to 30% by weight.
Using a known absorption tower such as a packed tower at a temperature of up to 30 ° C. to efficiently bring them into contact with each other to selectively dissolve an organic acid in hydrogen chloride gas in sulfuric acid to purify hydrogen chloride gas. You can

【0011】ここで0〜30重量%の酢酸を含む硫酸溶
液が選ばれるのは、主として経済的な理由と気液平衡関
係からくる制限によるものである。従って、工業的に有
利であるためには、精製塩化水素ガス中の有機酸濃度を
許容される一定濃度以下に保ちながら、吸収液である硫
酸溶液中に粗製塩化水素ガス中の有機酸を極力溶解させ
る事が好ましい。
The reason why the sulfuric acid solution containing 0 to 30% by weight of acetic acid is selected is mainly due to economic reasons and restrictions due to the gas-liquid equilibrium relationship. Therefore, in order to be industrially advantageous, while keeping the organic acid concentration in the purified hydrogen chloride gas below an allowable constant concentration, the organic acid in the crude hydrogen chloride gas should be added as much as possible to the sulfuric acid solution that is the absorbing liquid. It is preferable to dissolve it.

【0012】本発明者らの研究によれば、塩化水素ガス
中に含まれる有機酸の硫酸溶液への溶解は、これに接触
している硫酸溶液中の有機酸濃度に依存し、塩化水素ガ
ス中の有機酸濃度と硫酸中の有機酸濃度との間には一定
の気液平衡関係が成立している。この為、精製塩化水素
ガス中の有機酸濃度を一定の濃度以下に保つには、吸収
液である硫酸溶液中の有機酸濃度と温度の管理が重要で
ある。
According to the research conducted by the present inventors, the dissolution of an organic acid contained in hydrogen chloride gas in a sulfuric acid solution depends on the concentration of the organic acid in the sulfuric acid solution in contact with the hydrogen chloride gas. A certain gas-liquid equilibrium relationship is established between the organic acid concentration in the solution and the organic acid concentration in sulfuric acid. Therefore, in order to keep the concentration of the organic acid in the purified hydrogen chloride gas below a certain concentration, it is important to control the concentration and temperature of the organic acid in the sulfuric acid solution which is the absorbing liquid.

【0013】硫酸溶液中の有機酸濃度については、30
重量%以下にすることが好ましく、30重量%を越える
と精製塩化水素ガス中の有機酸濃度を10ppm以下に
保つ事が困難となる。
The organic acid concentration in the sulfuric acid solution is 30
It is preferable to set the content to not more than 30% by weight, and if it exceeds 30% by weight, it becomes difficult to keep the concentration of the organic acid in the purified hydrogen chloride gas below 10 ppm.

【0014】硫酸溶液の温度については、−10〜30
℃に保つ事が必要である。この理由は吸収液の温度を−
10℃以下に下げる事は吸収液の凍結の危険性,粘度の
上昇、大きな冷凍機が必要等の問題が生じ、また30℃
以上では精製塩化水素ガス中の有機酸濃度を10ppm
以下に保つ事はきわめて困難となる為である。なお、硫
酸溶液の凍結点は含有される有機酸の濃度によって変化
するので、最適の操作温度は−10〜30℃の温度範囲
において、有機酸の種類、精製塩化水素ガス中の許容有
機酸濃度及びユーティリティー使用コスト等を総合的に
考慮して決定される。
The temperature of the sulfuric acid solution is -10 to 30.
It is necessary to keep at ℃. The reason for this is that the temperature of the absorbing liquid is
Lowering the temperature below 10 ° C causes problems such as freezing of the absorption liquid, increase in viscosity, and the need for a large refrigerator.
With the above, the concentration of organic acid in the purified hydrogen chloride gas is 10 ppm.
It is very difficult to keep below. Since the freezing point of the sulfuric acid solution changes depending on the concentration of the contained organic acid, the optimum operating temperature is in the temperature range of -10 to 30 ° C, the type of organic acid and the allowable organic acid concentration in the purified hydrogen chloride gas. Also, it is determined by comprehensively considering the utility usage cost, etc.

【0015】粗製塩化水素ガスと吸収液との接触方法に
ついては、十分に気液が接触できるものであればどんな
方法でもよいが、通常、吸収塔が用いられる。この吸収
塔は理論段数10段以上のものであれば、充填塔,棚段
塔等公知のものが使用できる。又この場合塔径は、塩化
水素ガスの空塔速度が0.4m/sec程度に選ぶ事が
大切である。
The method for contacting the crude hydrogen chloride gas with the absorbing solution may be any method as long as it can sufficiently contact the gas-liquid, but an absorption tower is usually used. As the absorption tower, a known tower such as a packed tower or a tray tower can be used as long as it has a theoretical plate number of 10 or more. Further, in this case, it is important to select the tower diameter such that the superficial velocity of hydrogen chloride gas is about 0.4 m / sec.

【0016】次に、本発明の方法は、回分法又は連続法
いずれの方法でも実施できる。連続法の場合は吸収液で
ある硫酸溶液中の有機酸濃度が30重量%を越えないよ
うに、好ましくは20重量%を越えないように吸収液の
一部を吸収塔から抜き出しながら、濃硫酸を吸収塔に供
給する必要がある。
Next, the method of the present invention can be carried out by either a batch method or a continuous method. In the case of the continuous method, while the sulfuric acid solution, which is the absorbing solution, has a concentration of the organic acid not exceeding 30% by weight, preferably 20% by weight, while extracting a part of the absorbing solution from the absorption tower, concentrated sulfuric acid is used. Need to be supplied to the absorption tower.

【0017】本発明は、特に不純物として1000pp
m以下の有機酸を含む塩化水素ガス中の有機酸を10p
pm以下に精製する方法として有用である。有機酸を1
000ppm以上含む場合でも本発明の方法を適用する
事が可能であるが、この場合は吸収塔が大きくなり、ま
た硫酸の使用量も多くなる。実際、塩化水素ガス中に1
000ppm以上の有機酸を含む場合には、他の方法た
とえば冷却等によって容易に500〜1000ppmに
低下させる事ができるので、これらの前処理を行ってか
ら、本発明の精製法を適用する事が有利である。
The present invention is particularly applicable as an impurity of 1000 pp.
10 p of organic acid in hydrogen chloride gas containing organic acid of m or less
It is useful as a method for purification to pm or less. 1 organic acid
The method of the present invention can be applied even when it contains 000 ppm or more, but in this case, the absorption tower becomes large and the amount of sulfuric acid used also increases. In fact, 1 in hydrogen chloride gas
When the organic acid is contained in an amount of 000 ppm or more, it can be easily reduced to 500 to 1000 ppm by another method such as cooling. Therefore, it is possible to apply the purification method of the present invention after performing these pretreatments. It is advantageous.

【0018】[0018]

【実施例】以下実施例により本発明を具体的に説明す
る。
The present invention will be specifically described with reference to the following examples.

【0019】実施例1 不純物として、酢酸を約800ppm含有している塩化
水素ガスを、1Nm3/Hの割合で1リットルの濃硫酸
に20℃で吹き込み、気液接触させた。吹き込み約10
0時間後に、気液接触後の塩化水素ガスをガスクロマト
グラフ法で分析した結果、酢酸分は5ppmであった。
又この時、塩化水素ガス中の酢酸が硫酸に経時的に吸収
され、硫酸中の酢酸濃度は10重量%まで上昇した。さ
らにこの操作を続け、200時間後には、硫酸中の酢酸
濃度は20重量%になっったが、気液接触後の塩化水素
ガス中の酢酸濃度は8ppmに保たれた。以下、400
時間までこの操作を続けた結果を表1に示す。
Example 1 Hydrogen chloride gas containing about 800 ppm of acetic acid as an impurity was blown into 1 liter of concentrated sulfuric acid at a rate of 1 Nm 3 / H at 20 ° C. to make gas-liquid contact. Blowing about 10
After 0 hour, the hydrogen chloride gas after gas-liquid contact was analyzed by gas chromatography to find that the acetic acid content was 5 ppm.
At this time, acetic acid in hydrogen chloride gas was absorbed by sulfuric acid over time, and the concentration of acetic acid in sulfuric acid increased to 10% by weight. This operation was further continued, and after 200 hours, the acetic acid concentration in sulfuric acid became 20% by weight, but the acetic acid concentration in hydrogen chloride gas after the gas-liquid contact was kept at 8 ppm. Below 400
The results of continuing this operation until time are shown in Table 1.

【0020】実施例2 次に図1に示すフローを用いて実施した場合について説
明する。不純物として、酢酸と塩素からモノクロル酢酸
を製造する際に副生する、酢酸を500〜1000pp
m含む塩化水素ガス50m3 /hを導入管2より吸収塔
4(高さ3000mm,塔径200mmの充填塔)の底
部に導入し、塔頂部より導入した、酢酸を20重量%含
む硫酸溶液300リットル/hと20℃で連続的に向流
接触させた。吸収塔4の塔底から流出する液はポンプ5
を用いて、熱交換器6を通して温度調整を行い吸収塔4
の塔頂部へ供給した。洗浄塩化水素ガスは導管7〜硫酸
ミスト分離器8を通して精製塩化水素とし導管9より取
り出した。この結果、気液接触後の塩化水素ガス中の酢
酸濃度は、6時間ごとにガスクロマトグラフ分析を実施
したが、960時間にわたって10ppm以下であっ
た。なお、硫酸溶液中の酢酸濃度を一定濃度以下に保つ
ため、導管1よりフレッシュな硫酸を補給し、導管3よ
り酢酸を溶解した硫酸溶液の一部を抜き取った。
Embodiment 2 Next, a case where the flow is shown in FIG. 1 will be described. As an impurity, 500-1000 pp of acetic acid, which is a by-product when producing monochloroacetic acid from acetic acid and chlorine
Hydrogen chloride gas containing 50 m 3 / h containing m was introduced into the bottom of the absorption tower 4 (height 3000 mm, tower diameter 200 mm packed tower) from the introduction pipe 2, and the sulfuric acid solution 300 containing 20% by weight of acetic acid introduced from the tower top. Continuous countercurrent contact with liter / h at 20 ° C was carried out. The liquid flowing out from the bottom of the absorption tower 4 is pump 5
The temperature is adjusted through the heat exchanger 6 using the absorption tower 4
Was supplied to the top of the tower. The washed hydrogen chloride gas was made into purified hydrogen chloride through the conduit 7 to the sulfuric acid mist separator 8 and taken out from the conduit 9. As a result, the acetic acid concentration in the hydrogen chloride gas after the gas-liquid contact was 10 ppm or less over 960 hours when gas chromatographic analysis was performed every 6 hours. In order to keep the concentration of acetic acid in the sulfuric acid solution below a certain concentration, fresh sulfuric acid was replenished from conduit 1 and a part of the sulfuric acid solution in which acetic acid was dissolved was extracted from conduit 3.

【0021】実施例3 不純物として、酢酸を500ppm含む塩化水素ガス
を、酢酸を10重量%含む硫酸溶液と温度−7℃で実施
例2と同じ方法で接触させた。この結果、塩化水素ガス
中の酢酸濃度は1ppm以下であった。
Example 3 Hydrogen chloride gas containing 500 ppm of acetic acid as an impurity was brought into contact with a sulfuric acid solution containing 10% by weight of acetic acid at a temperature of −7 ° C. in the same manner as in Example 2. As a result, the concentration of acetic acid in hydrogen chloride gas was 1 ppm or less.

【0022】実施例4 不純物として、クロル酢酸を100〜1000ppm含
む粗製塩化水素ガスを実施例2と同じ方法によって精製
を行った。精製された塩化水素ガスを一定時間ごとに、
ガスクロマトグラフ分析を実施した結果、クロル酢酸は
検出されなかった。(クロル酢酸の検出限界:1pp
m)
Example 4 Crude hydrogen chloride gas containing 100 to 1000 ppm of chloroacetic acid as an impurity was purified by the same method as in Example 2. Purified hydrogen chloride gas at regular intervals,
As a result of gas chromatographic analysis, chloroacetic acid was not detected. (Detection limit of chloroacetic acid: 1 pp
m)

【0023】[0023]

【表1】 [Table 1]

【0024】[0024]

【発明の効果】本発明によると、有機酸とくに100〜
1000ppmのカルボン酸を含む粗製塩化水素ガスを
濃硫酸溶液で処理することにより容易かつ経済的に10
ppm以下に精製する事ができる。このため、本発明で
精製された塩化水素ガスは、そのままの状態で、他への
利用が可能である。
According to the present invention, an organic acid, especially 100-
Treating crude hydrogen chloride gas containing 1000 ppm of carboxylic acid with concentrated sulfuric acid solution facilitates and economically
It can be refined to below ppm. Therefore, the hydrogen chloride gas purified by the present invention can be used for other purposes as it is.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の態様を示す工程説明図。FIG. 1 is a process explanatory view showing an embodiment of the present invention.

【符号の説明】 1 濃硫酸送入口 2 粗製塩化水素ガス送入口 3 有機酸を溶解した硫酸溶液の排出口 4 吸収塔 5 硫酸循環ポンプ 6 水クーラー 7 洗浄塩化水素ガス排出口 8 硫酸ミスト分離器 9 精製塩化水素ガス排出口[Explanation of symbols] 1 concentrated sulfuric acid inlet 2 crude hydrogen chloride gas inlet 3 discharge outlet of sulfuric acid solution in which organic acid is dissolved 4 absorption tower 5 sulfuric acid circulation pump 6 water cooler 7 wash hydrogen chloride gas outlet 8 sulfuric acid mist separator 9 Purified hydrogen chloride gas outlet

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】有機酸を含有している塩化水素ガスから、
当該有機酸を除去する方法において、該粗製塩化水素ガ
スを硫酸溶液に接触させる事を特徴とする塩化水素ガス
の精製方法。
1. From hydrogen chloride gas containing an organic acid,
A method for purifying hydrogen chloride gas, which comprises contacting the crude hydrogen chloride gas with a sulfuric acid solution in the method for removing the organic acid.
【請求項2】有機酸を最大30重量%含む硫酸溶液に、
−10〜30℃の温度で該粗製塩化水素ガスを接触させ
ることを特徴とする請求項1記載の塩化水素ガスの精製
方法
2. A sulfuric acid solution containing up to 30% by weight of an organic acid,
The method for purifying hydrogen chloride gas according to claim 1, wherein the crude hydrogen chloride gas is contacted at a temperature of -10 to 30 ° C.
JP3321377A 1991-11-08 1991-11-08 Method for purifying hydrogen chloride gas containing organic acid Expired - Lifetime JPH0742086B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3321377A JPH0742086B2 (en) 1991-11-08 1991-11-08 Method for purifying hydrogen chloride gas containing organic acid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3321377A JPH0742086B2 (en) 1991-11-08 1991-11-08 Method for purifying hydrogen chloride gas containing organic acid

Publications (2)

Publication Number Publication Date
JPH05132302A true JPH05132302A (en) 1993-05-28
JPH0742086B2 JPH0742086B2 (en) 1995-05-10

Family

ID=18131883

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH0742086B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5842125A (en) * 1981-08-26 1983-03-11 シ−メンス・アクチエンゲゼルシヤフト Electrode for vacuum breaker
JPS6330303A (en) * 1985-07-26 1988-02-09 ヘキスト・アクチエンゲゼルシヤフト Method of purifying hydrogen chloride gas generated at time when manufacturing chloroacetic acid by contact-chlorinating acetic acid by chlorine gas

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5842125A (en) * 1981-08-26 1983-03-11 シ−メンス・アクチエンゲゼルシヤフト Electrode for vacuum breaker
JPS6330303A (en) * 1985-07-26 1988-02-09 ヘキスト・アクチエンゲゼルシヤフト Method of purifying hydrogen chloride gas generated at time when manufacturing chloroacetic acid by contact-chlorinating acetic acid by chlorine gas

Also Published As

Publication number Publication date
JPH0742086B2 (en) 1995-05-10

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