JPH051223A - Polyamide resin composition of excellent light resistance - Google Patents

Abstract

PURPOSE:To obtain the subject composition by mixing a polyamide resin with a specified ultraviolet absorber, a specified radical scavenger and a specified antioxidant. CONSTITUTION:A resin composition prepared by mixing 100 pts.wt. polyamide resin with at least 0.1 pts.wt. benzotriazole ultraviolet absorber, at least 0.1 pts.wt. hindered amine radical scavenger, and at least 0.2 pts.wt. hindered phenolic antioxidant. Examples of the benzotriazole compound include 2-[2- hydroxy-3,5-bis(alpha,alpha-dimethylbenzyl)-2H-benzotriazole. Examples of the hindered amine compound include diallylamine and ketone/diallyamine condensates, and examples of the hindered phenolic compounds include N,N'-hexamethylenebis(3,5- di-t-butyl-4-hydroxyhydroxycinnamamide).

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyamide resin composition having excellent light resistance, and more particularly to a novel polyamide resin composition which is stabilized without deterioration by ultraviolet rays.

[0002]

2. Description of the Related Art Generally, a polyamide resin is a thermoplastic resin having excellent heat resistance, abrasion resistance, molding processability, etc. Widely used in automobile parts, machine parts, etc. For example, in automobile interior materials, light resistance is particularly required, and an ultraviolet absorber, a radical scavenger and the like are blended with a polyamide resin. However, in the conventional combination of combinations, cracking due to ultraviolet rays, fading, and deterioration of mechanical properties occurred, and thus the practicability was poor.

Therefore, the inventors of the present invention continued to earnestly study to solve the above problems and develop a highly practical polyamide resin composition which is not deteriorated by ultraviolet rays.

[0004]

As a result, it has been found that the above problems can be solved by blending a specific ultraviolet absorber, a radical scavenger and an antioxidant in a polyamide resin in a predetermined ratio. The present invention has been completed based on such findings. That is, the present invention relates to 100 parts by weight of a polyamide resin, 0.1 part by weight or more of a (A) benzotriazole-based compound ultraviolet absorber (hereinafter referred to as component (A)), and (B) a hindered amine-based compound radical. 0.1 parts by weight or more of a scavenger (hereinafter referred to as (B) component) and 0.2 parts by weight or more of (C) an antioxidant of a hindered phenolic compound (hereinafter referred to as (C) component). The present invention provides a polyamide resin composition having excellent light resistance.

The polyamide resin composition of the present invention is prepared by blending the polyamide resin with the components (A), (B) and (C) as described above. Here, various polyamide resins can be used. Examples thereof include polylactams such as nylon 6, nylon 11 and nylon 12; polyamides obtained from dicarboxylic acids and diamines such as nylon 66, nylon 10, nylon 612 and nylon 46;
Nylon 6/66, Nylon 6/12, Nylon 6/6
12, copolymer polyamides such as nylon 6/66/610; half obtained from aromatic dicarboxylic acid such as nylon 6 / 6T (T: terephthalic acid component), isophthalic acid and metaxylene diamine or alicyclic diamine Aromatic polyamides; polyester amide, polyether amide, polyester ether amide and the like can be mentioned. As the polyamide resin, the above various polyamides may be used alone, or two or more kinds of polyamide resins may be used in combination.

Further, as the polyamide resin which can be used in the present invention, as long as it is selected from the above-mentioned polyamides, various resins can be used without being restricted by the kind, concentration and molecular weight of the terminal group of these polyamides. However, high amino terminated polyamides are especially preferred. It is also possible to use a polyamide in which low molecular weight substances such as monomers and oligomers that remain or are formed during polymerization of the polyamide are mixed.

The component (A) may be any benzotriazole compound UV absorber, for example, 2
-[2-Hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole (trade name: Tinuvin 234); 2- (2'-hydroxy-
5'-methylphenyl) benzotriazole; 2-
(2'-hydroxy-3 ', 5'-di-t-butylphenyl) benzotriazole; 2- (2'-hydroxy-
3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole; 2- (2'-hydroxy-
3 ', 5'-di-t-aluminumphenyl) benzotriazole; 2- (2'-hydroxy-4'-octylphenyl) benzotriazole and the like.

Similarly, the component (B) may be any radical scavenger of a hindered amine compound, for example, dimethyl-1- (2-hydroxyethyl) -4-dimethyl succinate.
Hydroxy-2,2,6,6-tetramethylpiperidine polycondensate (trade name: Tinuvin 622LD); bis (2,2
2,6,6-Tetramethyl-4-piperidinyl) sebacate (trade name: Tinuvin 770SL); ketone-amine condensate; diallyldiamine; diallylamine; ketone-
Examples thereof include diallylamine condensates.

Further, the component (C) may be any antioxidant of a hindered phenol compound, for example, N, N'-hexamethylenebis (3,5-di-t-butyl-4-hydroxy-). Hydrocinnamamide) (Product name:
Irganox 1098); 2,6-di-t-butyl-
p-cresol; butylated hydroxyanisole; stearyl propionate-β- (3,5-di-t-butyl-
4-hydroxyphenyl); 2,2'-methylene-bis (4-methyl-6-t-butylphenol); 4,4 '
-Thiobis (3-methyl-6-t-butylphenol); 4,4'-butylidene-bis (3-methyl-6-
t-butylphenol); 1,1,3-tris (2-methyl-4-hydroxy-5-t-butylphenyl) butane; 1,3,5-trimethyl-2,4,6-tris (3,5- Di-t-butyl-4-hydroxybenzyl)
Benzene; tetrakis [methylene-3- (3 ', 5'-
Di-t-butyl-4′-hydroxyphenyl) propionate] methane and the like.

In the polyamide resin composition of the present invention, the mixing ratio of each component for producing a polyamide resin composition having excellent light resistance is 0.1 parts of the component (A) per 100 parts by weight of the polyamide resin. More than parts by weight, and (B) component is 0.
1 part by weight or more and component (C) is 0.2 parts by weight or more,
Preferably, the component (A) is 0.2 parts by weight or more, and the component (B) is
0.15 parts by weight or more and (C) component 0.3 parts by weight or more, more preferably 0.3 parts by weight or more and 0.35 parts by weight or less, and component (B) 0.2 parts by weight. The amount is 0.25 parts by weight or less and the amount of the component (C) is 0.2 parts by weight or more and 0.5 parts by weight or less.

If the amount of the component (A) is less than 0.1 part by weight, there is a problem that cracks occur, and the amount of the component (B) is
If it is less than 0.1 part by weight, there is a disadvantage that embrittlement occurs. On the other hand, if the amount of the component (C) is less than 0.2 parts by weight, there is a problem that the mechanical strength is lowered due to the breakage of the molecular chain.

The polyamide resin composition of the present invention can be produced by mixing the polyamide resin, the components (A), (B) and (C).
The order of mixing is not particularly limited, and they can be mixed in any order.

The above mixing operation may be carried out using a known melt mixing device such as a single-screw or twin-screw extruder. As described above, the composition of the present invention contains, as a main component, a polyamide resin mixed with the above-mentioned components (A), (B) and (C). ，
An appropriate amount of a filler, a nucleating agent, a fibrous substance, a plasticizer, a lubricant, a release agent, a coupling agent, a foaming agent, a heat-resistant agent, a weather-resistant agent, a flame retardant or a sliding agent can be added.

Further, the composition of the present invention can be processed into pipes, tubes, rods, hollow molded products, injection molded products and the like, and can be subjected to post-processing such as plating and painting.

[0015]

EXAMPLES Next, the present invention will be described in more detail with reference to Examples and Comparative Examples. The present invention is not limited to the examples below.

Example 1 2 kg of nylon 6 (relative viscosity 3.10, amino terminal group concentration 4.9 × 10 ⁻⁵ equivalent / g) as a polyamide resin and 2- [2-hydroxy-3,5 as an ultraviolet absorber. -Bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole (trade name: Tinuvin 234) 0.30 parts by weight, dimethyl succinate-1- as a radical scavenger
(2-hydroxyethyl) -4-hydroxy-2,2
0.25 parts by weight of 6,6-tetramethylpiperidine polycondensate (trade name: Tinuvin 622LD) and N, N′-hexamethylenebis (3,5-di-t-butyl-4-hydroxy) as an antioxidant. Hydrocinnamamide) (trade name: Irganox 1098) was mixed in an amount of 0.40 parts by weight and mixed in a Henschel mixer. The obtained mixture was granulated by using the same-direction twin-screw extruder (inner diameter 30 mm, PCM30).

The resulting granulated product was 1 mm × with an injection molding machine (Cycap MIII 165/75, manufactured by Sumitomo Heavy Industries Ltd.)
A 50 mm × 50 mm flat plate is formed, and a black panel temperature of 8 is obtained using a fade meter (manufactured by Suga Test Instruments Co., Ltd.).
Ultraviolet irradiation was performed at 3 ° C. and 50% humidity for 1000 hours, and the appearance was judged with a microscope (magnification: 20 times). The results obtained are shown in Table 1.

Example 2 Instead of Tinuvin 622LD as a radical scavenger,
0.2 of bis (2,2,6,6-tetramethyl-4-piperidinyl) sebacate (trade name: Tinuvin 770LS)
The same operation as in Example 1 was performed except that 5 parts by weight was used. The results obtained are shown in Table 1.

Example 3 The same operation as in Example 1 was carried out except that 0.20 part by weight of tinuvin 622LD and 0.20 part by weight of tinuvin 770LS were used as the radical scavenger. The results obtained are shown in Table 1.

Comparative Example 1 The same operation as in Example 1 was carried out except that the ultraviolet absorber, radical scavenger and antioxidant were not used. The results obtained are shown in Table 1.

Comparative Example 2 The same operation as in Example 1 was performed except that the radical scavenger and the antioxidant were not used. The results obtained are shown in Table 1.

Comparative Example 3 The same operation as in Example 1 was carried out except that no antioxidant was used. The results obtained are shown in Table 1.

Comparative Example 4 The same operation as in Example 1 was carried out except that the radical scavenger was not used. The results obtained are shown in Table 1.

Comparative Example 5 The same operation as in Example 1 was carried out except that 0.05 part by weight of Tinuvin 234 was used as an ultraviolet absorber. The results obtained are shown in Table 1.

[0025]

[Table 1]

[0026]

[Table 2]

[0027]

As described above, according to the present invention, the ultraviolet absorber, the radical scavenger and the antioxidant are blended in the polyamide resin in a specific ratio to stabilize the polyamide resin so as not to be deteriorated by ultraviolet rays. The novel polyamide resin composition can be easily obtained.

Therefore, the polyamide resin composition of the present invention can be widely used as various engineering plastics required to have light resistance, such as various electronic / electrical parts, automobile parts (particularly automobile interior materials), mechanical parts and the like.

Continued front page    (72) Inventor Toru Shiryu             3-2 Chidori-cho, Kawasaki-ku, Kawasaki-shi, Kanagawa Showa             Kawasaki Resin Research Laboratory, Electric Works Co., Ltd.

Claims (4)

[Claims] 1. A polyamide resin is added to 100 parts by weight of (A).
0.1 parts by weight or more of a UV absorber of a benzotriazole compound, 0.1 part by weight or more of a radical scavenger of (B) a hindered amine compound, and 0.2 parts of an antioxidant of (C) a hindered phenol compound. A polyamide resin composition having excellent light resistance, which is blended in an amount of at least parts by weight. 2. The benzotriazole compound is 2-
The polyamide resin composition according to claim 1, which is [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole. 3. The hindered amine compound is dimethyl succinate-1- (2-hydroxyethyl) -4-hydroxy-2,2,6,6-tetramethylpiperidine polycondensate and / or bis (2,2,2). 6,6-Tetramethyl-4
-Piperidinyl) sebacate, The polyamide resin composition according to claim 1. 4. The hindered phenol compound is N,
N'-hexamethylenebis (3,5-di-t-butyl-
4-hydroxy-hydrocinnamamide).
The polyamide resin composition described.