JPH05120446A - Pattern plotting system - Google Patents

Abstract

PURPOSE:To enable a high-speed plotting processing by optimization, at the time of operating the painting-out plotting of a span using a bit pattern whose width is larger than the access width of a bit unit to a frame memory, and whose width is not the multiple value. CONSTITUTION:A parameter is received from a host routine by a data inputting part 1, worked into a form suited to the span plotting by a data calculating part 2, and a bit map is plotting-outputted to a map display by a plotting outputting part 3. Even when the width of the pattern is larger than the access width of the bit unit, it is not necessary to extend the pattern data at each time of access, and the preparation of a mask pattern is operated by a simple command, so that the processing performance of the plotting can be sharply improved.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern drawing method, and more particularly, to a pattern display in which a bitmap display is used as a display device and a frame memory mapped in a memory space is accessed to perform drawing output on the bitmap display. Regarding the scheme. When performing fill drawing of a span that uses a bit pattern that is wider than the bit-wise access width of the frame memory and is a value other than its multiple, by using auxiliary pattern data called the end data, Minimize the pattern development of
The present invention relates to a pattern drawing method whose speed is improved by optimization.

[0002]

2. Description of the Related Art In recent years, information processing systems have been developed so as to enhance the interactivity with users, and the terminals having a bitmap display and a mouse have become the mainstream. Under such an environment, the user interface of the application program is changing from the one using characters to the one using graphics, but the load on the system of graphic processing is high, and improvement of its processing speed is an important issue. Has become. In particular, in pattern drawing in which a bit pattern is used for filling, the data manipulation of the mask pattern used at the time of drawing is complicated, and the processing must take a considerable amount of time.

Therefore, a method has been proposed in which an algorithm optimized for each pattern width is used to increase the speed.

In this pattern drawing method, the pattern width is equal to the access width, the access width is a divisor of the access width, and the access width is a multiple of the access width with reference to the bit-wise access width to the frame memory. It is classified into 5 smaller than the access width and not a divisor, and 5 larger than the access width and not a multiple. Of these, the former three can expand or divide the bit pattern into units of access width, so there is no need to generate a mask pattern when accessing the frame memory, and high-speed drawing can be performed, while the latter two are the frame memory. It is necessary to generate a mask pattern at the time of access, and the algorithm is general and slow when it is larger than the access width.

[0005]

However, in such a conventional technique, although the span drawing of a bit pattern having a specific width is speeded up, the span drawing of a bit pattern having a width other than that can be performed. No speedup has been made. Particularly, in the conventional technique, since the remainder command is used for generating the mask pattern in the pattern drawing when the access width is larger than the access width, this is a very heavy load.

Therefore, when a pattern is drawn, there is a problem that some of them are displayed at high speed depending on the width of the pattern, and some of them take much time to display. This has been a strong constraint for the creators of applications that require high-speed processing in that the usable patterns are limited.

[0007]

According to the pattern drawing method of the present invention, a bitmap display is used as a display device, and a frame memory mapped in a memory space is accessed to perform drawing output on the bitmap display. In the case of performing a filled drawing of a span using a bit pattern, a data input section for obtaining data necessary for drawing, a data calculation section for processing the data into a format suitable for span drawing, and the data And a drawing output unit 3 for accessing the frame memory on the basis of the drawing and outputting the drawing on the bitmap display, using a bit pattern having a width larger than the access width in bit units to the frame memory and having a width other than its multiple value. Auxiliary pattern data called the end data when the filled drawing of the specified span is performed Using configured.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The embodiments will be described below with reference to the drawings. In this embodiment, it is assumed that the internal representation of the integer is 32 bits and the access width of the frame memory is 16 bits.

FIG. 1 is a block diagram showing the configuration of an embodiment of the present invention, and FIG. 2 is a flow chart showing the processing of the data calculation unit 1. 3 is a flowchart showing the processing of the drawing output unit 3, FIG. 4 is a flowchart showing the processing of the data correction unit 22, FIG. 5 is an explanatory diagram showing the relationship between the drawing span and parameters, and FIG. 6 is an explanatory diagram of the end data. is there.

First, the function of this embodiment will be described with reference to FIG.

The data input unit 1 is, for example, for interpreting the parameters passed from the host routine to obtain the coordinates of the start point of the span, the width of the span, the pattern data and the width of the bit pattern, and the data calculation unit 2 Is the data input section 1
The above data obtained in step 2 is processed into a format suitable for span drawing, and the initial value is determined. The drawing output unit 3 is the data calculation unit 2
The frame memory is accessed on the basis of the above-described data processed in (1) and the drawing output to the bitmap display is performed.

Next, the operation of this embodiment will be described with reference to FIG.

The process 11 calculates the number of units of the bit pattern (the unit of the bit pattern is defined as one unit when the pattern is divided into 16 bits).
The process 12 calculates the initial value of the drawing coordinate according to the coordinates of the start point of the span (the drawing coordinate is 16
Indicates the position of the beginning of a bit boundary). The process 13 calculates the initial value of the pattern coordinates according to the coordinates of the start point of the span. The pattern coordinates indicate the position where the first bit of the pattern should be drawn. The process 14 calculates the address position in the frame memory at which drawing is to be performed according to the coordinates of the start point of the span.

The process 15 calculates the width of the span in access units according to the coordinates of the start point of the span and the width of the span. The process 16 calculates the initial value of the shift amount according to the coordinates of the start point of the span. The shift amount is given by the value of the lower 4 bits of the pattern coordinate. However, when the value is 0, the process 16 is reset.

The process 17 calculates the initial value of the unit index in the bit pattern according to the coordinates of the start point of the span. Process 18 calculates the end data for performing pattern development at high speed. The termination data is the last 32 bits of data of the bit pattern, and the last bit of the termination data and the last bit of the bit pattern are matched. When the bit pattern is smaller than 32 bits, the data other than the bit pattern of the end data is undefined. The process 19 stores the pattern unit indicated by the index in the register.

FIG. 5 is an explanatory diagram showing the relationship between the drawing span and the above parameters, and FIG. 6 is an explanatory diagram of the end data.

Next, the drawing output unit 3 will be described with reference to FIGS. 3 and 4.
The operation of this embodiment will be described with a focus on.

The process 21 examines the access width and decides whether to make the next access. If the access width is 0, the entire process is stopped. The data correction unit 22 is composed of processes 31 to 39 and configures parameters.

In the process 23, first, the data in the register is left-shifted by 16 bits, the pattern unit indicated by the corrected index is stored in the lower 16 bits, and then the data in the register is right-shifted by the shift amount. An object is generated as a mask pattern. Process 24 is process 23
The mask data generated in step 1 is written in a specific position in the frame memory indicated by the address. Process 25
Updates the above address to indicate the next access position. The process 26 adds the access width of 16 to the current drawing coordinate value. The process 27 subtracts 1 from the current access width and returns to the process 21.

Next, referring to FIG. 4, the process 31 checks the value of the index, and if the value is equal to the number of units of the pattern, the process 39 is performed, and the process of the data correction unit 22 is ended. The process 32 adds the value of the pattern width to the current pattern coordinate value. The process 33 sets the value of the lower 4 bits of the pattern coordinate value corrected in the process 32 as the shift amount.
However, when the value is 0, it is reset to 16. Process 34
Examines the value of the pattern coordinate, and if the value is larger than the current drawing coordinate value, performs the processes 35 and 36 and ends the process of the data correction unit 22. Otherwise, process 3
After performing steps 7 and 38, the data correction unit is ended.

That is, the process 35 stores the end data in the register, and the process 36 sets 0 in the index.
The process 37 stores the pattern unit of the index 0 in the register, the process 38 sets the index to 1, and the process 39 adds 1 to the index and ends.

FIG. 5 shows the concept of the relationship between the drawing span and the above parameters. The drawing coordinate is a coordinate value on the horizontal axis (on the x-axis) that increases from the origin for each access width, and is smaller than the starting point coordinate of the drawing span and has the maximum coordinate as its initial value. The pattern coordinates are coordinate values on the horizontal axis that increase from the origin for each pattern width, and the coordinates that are smaller than the coordinates of the start point of the span and are the maximum are the initial values. The shift amount represents a deviation between the pattern coordinate and the drawing coordinate, and is obtained by obtaining the difference between the pattern coordinate and the maximum drawing coordinate value smaller than the coordinate value.

FIG. 6 shows the concept of the end data. When the pattern width is 32 bits or more as shown in the diagram (A) of FIG. 6, the lower 32 bits of the pattern (32 bits counting from the right end of the pattern width in the drawing)
When the pattern width is smaller than 32, as shown in the division B of FIG. 6 in which the data value is, the pattern is right-justified and stored in the 32-bit data area. At this time, the value of the bit higher than the pattern bit (the bit in the shaded area at the left end of the end data in the drawing) is undefined. It should be noted that, here, the y coordinate of the drawing span in FIG. 5 is set to a constant value, and a line segment is displayed.
That is, it is displayed as a set of direct (the value of x is a line segment having an upper limit and a lower limit) parallel to the x axis.

[0024]

As described above, according to the present invention, even if the width of the pattern is larger than the access width in bit units, it is not necessary to expand the pattern data for each access, and the mask pattern of the mask pattern can be formed by a simple instruction. Since the generation can be performed, there is an effect that the drawing processing performance can be significantly improved.

[Brief description of drawings]

FIG. 1 is a block diagram showing the configuration of an embodiment of the present invention.

FIG. 2 is a flowchart showing the processing of the data calculation unit 1.

FIG. 3 is a flowchart showing the processing of the drawing output unit 3.

FIG. 4 is a flowchart showing the processing of the data correction unit 22.

FIG. 5 is an explanatory diagram showing a relationship between a drawing span and parameters.

FIG. 6 is an explanatory diagram of end data.

[Explanation of symbols]

 1 data input part 2 data calculation part 3 drawing output part

Claims (1)

[Claims] 1. A system for performing drawing output on a bit map display by using a bit map display as a display device and accessing a frame memory mapped in a memory space, to perform span drawing using a bit pattern. When performing, a data input unit for obtaining data necessary for drawing, a data calculation unit for processing the data into a format suitable for span drawing, and accessing a frame memory on the basis of the data to display on a bitmap display. And a drawing output unit 3 that performs drawing output to the frame memory, and when the filled drawing of the span is performed using a bit pattern having a width larger than the bit-wise access width to the frame memory and a width other than its multiple value, A pattern drawing method characterized by comprising auxiliary pattern data to be called .