JPH0511101A - Optical member having antireflection film - Google Patents

Optical member having antireflection film

Info

Publication number
JPH0511101A
JPH0511101A JP3185494A JP18549491A JPH0511101A JP H0511101 A JPH0511101 A JP H0511101A JP 3185494 A JP3185494 A JP 3185494A JP 18549491 A JP18549491 A JP 18549491A JP H0511101 A JPH0511101 A JP H0511101A
Authority
JP
Japan
Prior art keywords
layer
antireflection film
refractive index
optical member
underlayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3185494A
Other languages
Japanese (ja)
Other versions
JP3068252B2 (en
Inventor
Takashi Mitsuishi
剛史 三石
Kenichi Niide
謙一 新出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP3185494A priority Critical patent/JP3068252B2/en
Publication of JPH0511101A publication Critical patent/JPH0511101A/en
Application granted granted Critical
Publication of JP3068252B2 publication Critical patent/JP3068252B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To decrease the extent at which a heat resistant temp. lowers with lapse of time by forming a substrate layer of a mixture composed of SiO2 and Al2O3 and further, specifying the range of the refractive index of a substrate layer to a specific range. CONSTITUTION:This member has the substrate layer and an antireflection film on a synthetic resin. The substrate layer is formed of the mixture composed of the SiO2 and the Al2O3 in such a case and further, the range of the refractive index of the substrate layer is specified to 1.48 to 1.52. The antireflection film is formed by laminating, successively from the surface of the substrate layer, a low-refractive index layer constituted of a Ta2O5 layer and a layer mixture contg. the Ta2O5, Y2O3 and SiO2, a high-refractive index layer constituted of the Ta2O5 layer, the layer mixture contg. the Ta2O5, Y2O3 and SiO2 and the Ta2O5 layer, and a 2nd low-refractive index layer constituted of the SiO2 layer. The synthetic resin includes a homo polymer of methyl methacrylate, a copolymer consisting of methyl methacrylate and 1 kinds of other monomers as monomer components a homo polymer of diethylene glycol bisallyl carbonate, etc.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は反射防止膜を有する光学
部材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical member having an antireflection film.

【0002】[0002]

【従来の技術】合成樹脂からなる光学部材の表面反射特
性を改善するために合成樹脂の表面上に反射防止膜を施
すこと、またその反射防止膜の耐擦傷性を向上させるた
めに合成樹脂と反射防止膜との間に下地層を介在させる
ことがよく知られている。この下地層を介在させている
例として、例えば特開昭56−116003号公報(以
下、「公報1」という。)、特開平2−291502号
公報(以下、「公報2」という。)にはSiO2 のみか
らなる下地層が、また特開昭56−66802号公報
(以下「公報3」という。)には屈折率が1.54でS
iO2 とAl2 3 を混合してなる下地層を施した合成
樹脂製光学部材が開示されている。
2. Description of the Related Art An antireflection film is provided on the surface of a synthetic resin in order to improve the surface reflection characteristics of an optical member made of synthetic resin, and a synthetic resin is used in order to improve the scratch resistance of the antireflection film. It is well known that an underlayer is interposed between the antireflection film and the antireflection film. Examples of interposing this underlayer are disclosed, for example, in Japanese Patent Application Laid-Open No. 56-11003 (hereinafter referred to as “publication 1”) and Japanese Patent Application Laid-Open No. 2-291502 (hereinafter referred to as “publication 2”). An underlayer made of only SiO 2 has a refractive index of 1.54 and S in JP-A-56-66802 (hereinafter referred to as “publication 3”).
There is disclosed a synthetic resin optical member provided with an underlayer formed by mixing iO 2 and Al 2 O 3 .

【0003】[0003]

【発明が解決しようとする課題】公報1、2に開示され
ているSiO2 のみからなる下地層を施した合成樹脂製
光学部材、公報3に開示されている屈折率が1.54で
SiO2 とAl2 3 を混合してなる下地層を施した合
成樹脂製光学部材はガラス製基板のように蒸着時の基板
温度を高くして成膜することができないため、下地層が
経時的に耐熱温度の低下する程度が大きいという特性を
有する。その影響で下地層の上に施される反射防止膜も
経時的に耐熱温度の低下する程度が大きくなるという問
題を有する。この問題は例えば、以下に記す不都合が生
じる。眼鏡装用者はサウナの中で眼鏡を装用したり、ま
た自動車の中に眼鏡を置いたまま自動車の外に出ること
がよくある。このような高温の条件下で公報1〜3に開
示されている光学部材を眼鏡用レンズとして使用する場
合、前記光学部材を作製して4ケ月ぐらいで反射防止膜
にひび割れが生じやすくなる。本発明は上述した不都合
を解決するためになされ、その目的は基板が合成樹脂の
ように、蒸着時の基板温度を低くしなければならない場
合でも、経時的に耐熱温度の低下する程度が小さくなる
反射防止膜を有する光学部材を提供することにある。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention An optical member made of a synthetic resin provided with an underlayer made of only SiO 2 disclosed in Japanese Patent Laid-Open Nos. 1 and 2, and a refractive index of 1.54 disclosed in Japanese Patent No. 3 Since a synthetic resin optical member provided with an underlayer formed by mixing Al 2 O 3 and Al 2 O 3 cannot be formed by elevating the substrate temperature during vapor deposition like a glass substrate, the underlayer can be formed over time. It has the characteristic that the heat-resistant temperature is greatly reduced. Due to this influence, the antireflection film formed on the underlayer also has a problem that the heat-resistant temperature decreases with time. This problem has the following disadvantages, for example. A spectacle wearer often wears spectacles in a sauna or goes out of the car with the spectacles left in the car. When the optical members disclosed in JP-A Nos. 1 to 3 are used as eyeglass lenses under such a high temperature condition, the antireflection film is likely to crack in about 4 months after the optical member is manufactured. The present invention has been made to solve the above-mentioned inconvenience, and its object is to reduce the degree of lowering of the heat resistant temperature with time even when the substrate temperature during vapor deposition has to be lowered like a synthetic resin. An object is to provide an optical member having an antireflection film.

【0004】[0004]

【課題を解決するための手段】上述した目的は、以下に
記す発明によって達成された。その発明は、合成樹脂上
に下地層と反射防止膜とを有する光学部材であって、前
記下地層はSiO2 とAl2 3 との混合物からなり、
さらに前記下地層の屈折率の範囲が1.48〜1.52
であることを特徴とする反射防止膜を有する光学部材で
ある。
The above-mentioned objects have been achieved by the invention described below. The invention is an optical member having a base layer and an antireflection film on a synthetic resin, wherein the base layer is made of a mixture of SiO 2 and Al 2 O 3 .
Further, the range of the refractive index of the underlayer is 1.48 to 1.52.
Is an optical member having an antireflection film.

【0005】以下、本発明について詳細に説明する。下
地層の屈折率の範囲を1.48〜1.52とし、さらに
膜素材の必須成分をSiO2 とAl2 3 に特定するこ
とによって従来の特性を損なわずに下地層の耐熱温度が
向上し、経時的な耐熱温度の低下の程度が小さくなる。
さらに、基板が合成樹脂のように蒸着時の基板温度を低
くしなければならない場合であっても、この下地層を施
すことによって、下地層の表面上に施された反射防止膜
全体の耐熱温度が向上し、経時的な耐熱温度の低下の程
度が小さくなることを本発明者は見い出した。
The present invention will be described in detail below. By setting the range of the refractive index of the underlayer to 1.48 to 1.52 and specifying SiO 2 and Al 2 O 3 as the essential components of the film material, the heat resistance temperature of the underlayer is improved without impairing the conventional characteristics. However, the degree of decrease in the heat resistant temperature with time becomes small.
Furthermore, even when the substrate temperature is required to be low during vapor deposition such as synthetic resin, by applying this underlayer, the heat-resistant temperature of the entire antireflection film applied on the surface of the underlayer is improved. The present inventor has found that the heat resistance temperature decreases with time and the degree of decrease in heat resistant temperature with time decreases.

【0006】上述した範囲外の下地層の屈折率、例えば
1.48未満、1.52を超える場合、また下地層の必
須成分がSiO2 とAl2 3 との混合物ではない場合
には、耐熱温度が向上せず、さらに経時的な耐熱温度の
低下の程度が小さくならないので好ましくない。
When the refractive index of the underlayer outside the above range, for example, less than 1.48 or more than 1.52, or when the essential component of the underlayer is not a mixture of SiO 2 and Al 2 O 3 , This is not preferable because the heat resistant temperature does not improve and the degree of decrease in the heat resistant temperature with time does not decrease.

【0007】本発明における下地層は、上述した効果を
損なわない程度でTa2 5 、Y2 3 、TiO2 、Z
rO2 、MgF2 等の金属を混合することが可能であ
る。また下地層の膜厚の範囲は特に限定されないが、反
射防止膜のひび割れ(クラック)発生温度を高くさせる
ために0.125λ〜0.8λ(λ=500nm)が特
に好ましい。
The underlayer in the present invention is made of Ta 2 O 5 , Y 2 O 3 , TiO 2 , Z, to the extent that the above-mentioned effects are not impaired.
It is possible to mix metals such as rO 2 and MgF 2 . The range of the film thickness of the underlayer is not particularly limited, but 0.125λ to 0.8λ (λ = 500 nm) is particularly preferable in order to raise the crack generation temperature of the antireflection film.

【0008】本発明における反射防止膜の膜構成は特に
限定されず、λ/4−λ/4の2層膜、λ/4−λ/4
−λ/4あるいはλ/4−λ/2−λ/4の3層膜、さ
らに4層以上の多層膜などを用いることができる。特に
好ましい膜構成は以下に記述する二つの反射防止膜が挙
げられる。その第1の反射防止膜(特許請求の範囲の欄
の請求項2に該当する。)は、下地層の表面から順にT
2 5 層と、Ta2 5 、Y2 3 およびSiO2
を含む混合層より構成される第1の低屈折率層;Ta2
5 層と、Ta2 5 、Y2 3 およびSiO2 とを含
む混合層と、Ta2 5 層より構成される高屈折率層;
SiO2 層より構成される第2の屈折率層を積層して構
成されるものである。また第2の反射防止膜(特許請求
の範囲の欄の請求項3に該当する。)は、下地層の表面
から順にTa2 5 、Y2 3 及びSiO2 とを含む混
合層と、Ta2 5 層より構成される第1の低屈折率
層;Ta2 5 、Y2 3 およびSiO2 とを含む混合
層と、Ta2 5 層と、Ta2 5 、Y2 3 およびS
iO2 とを含む混合層より構成される高屈折率層;Si
2 層より構成される第2の低屈折率層を積層して構成
されるものである。
The film constitution of the antireflection film in the present invention is not particularly limited, and it is a two-layer film of λ / 4-λ / 4, λ / 4-λ / 4.
A three-layer film of -λ / 4 or λ / 4-λ / 2-λ / 4, and a multilayer film of four or more layers can be used. Particularly preferable film configurations include the two antireflection films described below. The first antireflection film (corresponding to claim 2 in the scope of the claims) has a T layer in order from the surface of the underlayer.
A first low refractive index layer composed of an a 2 O 5 layer and a mixed layer containing Ta 2 O 5 , Y 2 O 3 and SiO 2 ; Ta 2
O 5 layer and, Ta 2 O 5, Y 2 O 3 , and a mixed layer containing a SiO 2, Ta 2 O 5 layer than configured high refractive index layer;
It is constructed by laminating a second refractive index layer composed of a SiO 2 layer. The second antireflection film (corresponding to claim 3 in the section of the claims) is a mixed layer containing Ta 2 O 5 , Y 2 O 3 and SiO 2 in order from the surface of the underlayer. Ta 2 O 5 layer first low refractive index layer composed of; a mixed layer containing a Ta 2 O 5, Y 2 O 3 and SiO 2, and Ta 2 O 5 layer, Ta 2 O 5, Y 2 O 3 and S
A high refractive index layer composed of a mixed layer containing iO 2 ; Si
It is constructed by laminating a second low refractive index layer composed of an O 2 layer.

【0009】これらの反射防止膜が特に好ましい理由
は、これらの反射防止膜自体が良好な耐熱性を有し、さ
らに経時的な耐熱温度の低下の程度が小さいという特性
を有しているためである。本発明における下地層の上に
これらの反射防止膜を施すことによって耐熱性に優れ、
さらに経時的な耐熱温度の低下の程度が極めて小さい反
射防止膜を有する光学部材を得ることができる。
The reason why these antireflection films are particularly preferable is that these antireflection films themselves have good heat resistance and further have a characteristic that the degree of decrease in heat resistant temperature with time is small. is there. By providing these antireflection films on the underlayer in the present invention, excellent heat resistance,
Furthermore, it is possible to obtain an optical member having an antireflection film whose degree of decrease in heat resistant temperature with time is extremely small.

【0010】また他の特に好ましい反射防止膜の例とし
て、前述した下地層と同じ屈折率範囲、同じ膜素材から
なる層を反射防止膜の中に設けたものが挙げられる。
(特許請求の範囲の欄の請求項4に該当する。)この層
を反射防止膜の中に設けることにより、さらに反射防止
膜の耐熱性が向上し、経時的な耐熱温度の低下の程度が
小さくなる。
Another example of another particularly preferable antireflection film is one in which a layer made of the same film material and having the same refractive index range as that of the underlayer is provided in the antireflection film.
(Corresponding to claim 4 in the scope of claims.) By providing this layer in the antireflection film, the heat resistance of the antireflection film is further improved, and the degree of decrease in the heat resistance temperature with time is reduced. Get smaller.

【0011】本発明の光学部材に用いる合成樹脂として
は、メチルメタクリレート単独重合体、メチルメタクリ
レートと1種以上の他のモノマーとをモノマー成分とす
る共重合体、ジエチレングリコールビスアリルカーボネ
ート単独重合体、ジエチレングリコールビスアリルカー
ボネートと1種以上の他のモノマーとをモノマー成分と
する共重合体、イオウ含有共重合体、ハロゲン含有共重
合体、ポリカーボネート、ポリスチレン、ポリ塩化ビニ
ル、不飽和ポリエステル、ポリエチレンテレフタレー
ト、ポリウレタンなどの重合体が挙げられる。
Examples of the synthetic resin used in the optical member of the present invention include a methyl methacrylate homopolymer, a copolymer containing methyl methacrylate and at least one other monomer as a monomer component, diethylene glycol bisallyl carbonate homopolymer, diethylene glycol. Copolymers containing bisallyl carbonate and one or more other monomers as monomer components, sulfur-containing copolymers, halogen-containing copolymers, polycarbonate, polystyrene, polyvinyl chloride, unsaturated polyester, polyethylene terephthalate, polyurethane, etc. Polymers of

【0012】合成樹脂の上に下地層、反射防止膜を設け
る場合には、合成樹脂表面に有機ケイ素重合体を含むハ
ードコート層をディッピング法、スピンコート法等の塗
布法により成膜し、このハードコート層上に下地層およ
び反射防止膜を設けることが好ましい。なお、本発明の
反射防止膜を成膜するにあたっては、真空蒸着法の他、
同様の焼結体をターゲット材料とするスパッタリング法
や、イオンプレーティング法等の方法を用いることもで
きる。
When a base layer and an antireflection film are provided on a synthetic resin, a hard coat layer containing an organosilicon polymer is formed on the surface of the synthetic resin by a coating method such as a dipping method or a spin coating method. It is preferable to provide a base layer and an antireflection film on the hard coat layer. In forming the antireflection film of the present invention, in addition to the vacuum vapor deposition method,
A sputtering method using a similar sintered body as a target material, an ion plating method, or the like can also be used.

【0013】本発明の反射防止膜を有する光学部材は、
眼鏡レンズのほか、カメラ用レンズ、自動車の窓ガラ
ス、ワードプロセッサーのディスプレイに付設する光学
フィルターなどに使用することが可能である。
The optical member having the antireflection film of the present invention is
In addition to eyeglass lenses, it can be used for camera lenses, automobile window glass, and optical filters attached to word processor displays.

【0014】[0014]

【実施例】以下、実施例により本発明を詳細に説明する
が、本発明はこれらの実施例に限定されるものではな
い。なお、実施例及び比較例で得られた反射防止膜を有
する光学部材は、以下に示す試験方法により、諸物性を
測定した。
EXAMPLES The present invention is described in detail below with reference to examples, but the present invention is not limited to these examples. The physical properties of the optical members having the antireflection film obtained in Examples and Comparative Examples were measured by the following test methods.

【0015】(a)耐擦傷性試験 #0000のスチールウールにより表面を往復回数で1
0回こすって耐擦傷性を次のように判定した。 A:わずかに傷がつく B:多く傷がつく C:膜のはがれが生じる
(A) Scratch resistance test # 0000 Steel wool with a number of reciprocations of 1 on the surface
The scratch resistance was evaluated by rubbing 0 times as follows. A: Slightly scratched B: Many scratches C: Film peeling occurs

【0016】(b)密着性試験 JIS−Z−1522に従いゴバン目を10×10個作
りセロファン粘着テープにより剥離試験を3回行い、残
ったゴバン目の数を数えた。
(B) Adhesion Test In accordance with JIS-Z-1522, 10 × 10 goggles were made, and a peeling test was performed three times with a cellophane adhesive tape, and the number of remaining goggles was counted.

【0017】(c)視感反射率(片面) 日立製作所製U3410型自記分光光度計を用い、視感
反射率を求めた。 (d)耐熱性試験 蒸着膜形成直後の反射防止膜を有する光学部材をオーブ
ンに1時間入れて加熱し、クラックの発生の有無を調べ
た。加熱温度は、50℃より始め、5℃づつ上げて、ク
ラックが発生する温度を調べた。
(C) Luminous reflectance (single-sided) Luminous reflectance was determined using a U3410 type self-recording spectrophotometer manufactured by Hitachi Ltd. (D) Heat resistance test An optical member having an antireflection film immediately after formation of a vapor deposition film was placed in an oven for 1 hour to be heated and examined for the occurrence of cracks. The heating temperature was started from 50 ° C. and increased by 5 ° C., and the temperature at which cracks were generated was examined.

【0018】(e)経時的な耐熱性試験 蒸着形成直後の反射防止膜を有する光学部材を4ケ月間
屋外暴露を行い、その後、前記した耐熱性試験と同じ方
法により評価を行った。
(E) Temporal heat resistance test An optical member having an antireflection film immediately after vapor deposition was exposed outdoors for 4 months, and then evaluated by the same method as the heat resistance test.

【0019】(f)耐酸性試験 20℃、10%塩酸水溶液に1時間浸漬した後、耐酸性
を次のように判定した。 ○:浸漬前と変化せず ×:反射防止膜にはがれが生じる
(F) Acid resistance test After being immersed in a 10% hydrochloric acid aqueous solution at 20 ° C. for 1 hour, the acid resistance was judged as follows. ○: No change from before immersion ×: Peeling occurs on the antireflection film

【0020】(g)耐アルカリ性試験 20℃、10%水酸化ナトリウム水溶液に1時間浸漬し
た後、耐アルカリ性を次のように判定した。 ○:浸漬前と変化せず ×:反射防止膜にはがれが生じる
(G) Alkali resistance test After being immersed in a 10% sodium hydroxide aqueous solution at 20 ° C. for 1 hour, the alkali resistance was judged as follows. ○: No change from before immersion ×: Peeling occurs on the antireflection film

【0021】実施例1 まず反射防止膜を設ける合成樹脂として、ジエチレング
ルコールビスアリルカーボネートを主成分とし、紫外線
吸収剤として2−ヒドロキシ−4−n−オプトキシベン
ゾフェノンを、前者/後者の重量比が99.97/0.
03となるように含有する、屈折率が1.499のプラ
スチックレンズを用意した。
Example 1 First, as a synthetic resin for providing an antireflection film, diethylene glycol bisallyl carbonate was used as a main component, 2-hydroxy-4-n-optoxybenzophenone was used as an ultraviolet absorber, and the weight ratio of the former to the latter was adjusted. 99.97 / 0.
A plastic lens having a refractive index of 1.499, which is contained so as to have a value of 03, was prepared.

【0022】(i)ハードコート層(nd1.50)の
形成 前記プラスチックレンズを、80モル%のコロイダルシ
リカと20モル%のγ−グリシドキシプロピルトリメト
キシシランを含有するコーティング液に浸漬し、その後
硬化してハードコート層を設けた。
(I) Formation of Hard Coat Layer (nd 1.50) The above plastic lens was dipped in a coating solution containing 80 mol% of colloidal silica and 20 mol% of γ-glycidoxypropyltrimethoxysilane, Then, it was cured to form a hard coat layer.

【0023】(ii)下地層および反射防止膜の形成 前記ハードコート層を有するプラスチックレンズを80
℃に加熱し、前記ハードコート層の上に真空蒸着法(真
空度2×10-5Torr)によりSiO2 とAl2 3
からなる下地層〔屈折率1.51、膜厚0.6λ(λ=
500nm)〕を形成した。次に、前記下地層の上にT
2 5 層(屈折率2.05、膜厚0.06λ)と、T
2 5 、Y2 3 およびSiO2 からなる混合層(屈
折率1.61、膜厚0.11λ)よりなる第1の低屈折
率層を形成した。この第1の低屈折率層の上にTa2
5 層(屈折率2.05、膜厚0.05λ)と、Ta2
5、Y2 3 およびSiO2 からなる混合層(屈折率
1.61、膜厚0.05λ)と、Ta2 5 層(屈折率
2.05、膜厚0.15λ)よりなる高屈折率層を形成
し、さらにこの高屈折率層の上にSiO2 からなる第2
の低屈折率層(屈折率1.46、膜厚0.25λ)を形
成して、反射防止膜付きプラスチックレンズを得た。
尚、前記第1の低屈折率層から第2の低屈折率層は前記
下地層を形成した同様の真空蒸着法により形成した。
(Ii) Formation of Underlayer and Antireflection Film A plastic lens having the above hard coat layer was formed into 80
Then, the SiO 2 and Al 2 O 3 are heated on the hard coat layer by vacuum deposition (vacuum degree 2 × 10 -5 Torr).
An underlayer consisting of [refractive index 1.51, film thickness 0.6λ (λ =
500 nm)] was formed. Next, T on the underlayer
a 2 O 5 layer (refractive index 2.05, film thickness 0.06λ), T
A first low refractive index layer made of a mixed layer (refractive index 1.61, film thickness 0.11λ) made of a 2 O 5 , Y 2 O 3 and SiO 2 was formed. Ta 2 O is formed on the first low refractive index layer.
5 layers (refractive index 2.05, film thickness 0.05λ) and Ta 2 O
High refractive index composed of a mixed layer of 5 , Y 2 O 3 and SiO 2 (refractive index 1.61, film thickness 0.05λ) and Ta 2 O 5 layer (refractive index 2.05, film thickness 0.15λ) And forming a second refractive index layer on the high refractive index layer.
A low refractive index layer (refractive index: 1.46, film thickness: 0.25λ) was formed to obtain a plastic lens with an antireflection film.
The first low refractive index layer to the second low refractive index layer were formed by the same vacuum vapor deposition method as that for forming the underlayer.

【0024】実施例1は特許請求の範囲の欄の請求項2
に該当するものである。
The first embodiment is claim 2 in the scope of claims.
It corresponds to.

【0025】得られた反射防止膜付きプラスチックレン
ズの評価結果を表2に示す。表2に示されるように実施
例1の反射防止膜付きプラスチックレンズは耐擦傷性、
密着性、耐酸性、耐アルカリ性に優れ、さらにクラック
発生温度が100℃と高く、また4ケ月間屋外暴露を行
った後のクラック発生温度が95℃と経時的な耐熱温度
の低下の程度が小さいものであった。
Table 2 shows the evaluation results of the obtained anti-reflection coating plastic lens. As shown in Table 2, the plastic lens with the antireflection film of Example 1 had scratch resistance,
Excellent adhesion, acid resistance, alkali resistance, crack generation temperature as high as 100 ° C, and crack generation temperature after outdoor exposure for 4 months of 95 ° C, showing little decrease in heat resistant temperature over time. It was a thing.

【0026】比較例1−1、比較例1−2 実施例1の比較として二つの比較例を挙げる。表1に示
すように下地層を本発明の範囲外である屈折率1.47
(比較例1−1)、1.54(比較例1−2)にした以
外はすべて実施例1と同様にして反射防止膜を作製し
た。評価結果を表2に示す。表2に示されるように比較
例1−1の反射防止膜付きプラスチックレンズのクラッ
ク発生温度が90℃、4ケ月間屋外暴露を行った後のク
ラック発生温度が70℃と、また比較例1−2の反射防
止膜付きプラスチックレンズのクラック発生温度が90
℃、4ケ月間屋外暴露を行った後のクラック発生温度が
75℃と実施例1の反射防止膜付きプラスチックレンズ
と比べ耐熱性が小さく、経時的なクラック発生温度の低
下の程度が大きいものであった。
COMPARATIVE EXAMPLE 1-1, COMPARATIVE EXAMPLE 1-2 As a comparison of Example 1, two comparative examples will be given. As shown in Table 1, the underlayer has a refractive index of 1.47 which is out of the range of the present invention.
An antireflection film was produced in the same manner as in Example 1 except that (Comparative Example 1-1) and 1.54 (Comparative Example 1-2) were used. The evaluation results are shown in Table 2. As shown in Table 2, the crack generation temperature of the plastic lens with the antireflection film of Comparative Example 1-1 was 90 ° C., and the crack generation temperature was 70 ° C. after 4 months of outdoor exposure, and Comparative Example 1- The cracking temperature of the plastic lens with anti-reflection film of No. 2 is 90
Since the cracking temperature after outdoor exposure at 4 ° C for 4 months was 75 ° C, the heat resistance was lower than that of the plastic lens with the antireflection film of Example 1, and the degree of decrease in the cracking temperature with time was large. there were.

【0027】実施例2 特許請求の範囲の欄の請求項3に該当する実施例として
実施例2を挙げる。膜構成を表3に示したようにし、さ
らに成膜条件を実施例1と同じにして反射防止膜付きプ
ラスチックレンズを得た。評価結果は表4に示されるよ
うにクラック発生温度が100℃と優れ、さらに4ケ月
間屋外暴露を行った後のクラック発生温度が95℃と経
時的な耐熱温度の低下の程度が小さいものであった。
Example 2 Example 2 will be given as an example corresponding to claim 3 in the scope of claims. The film constitution was as shown in Table 3, and the film forming conditions were the same as in Example 1 to obtain a plastic lens with an antireflection film. As shown in Table 4, the evaluation result shows that the cracking temperature is excellent at 100 ° C., and the cracking temperature after the outdoor exposure for 4 months is 95 ° C., which shows a small decrease in the heat resistant temperature with time. there were.

【0028】比較例2−1、比較例2−2 実施例2の比較として比較例2−1、比較例2−2を挙
げる。下地層の屈折率を本発明の範囲外である1.47
(比較例2−1)、1.54(比較例2−2)にした以
外は実施例2と同様にして反射防止膜付きプラスチック
レンズを得た。評価結果は表4に示されるように実施例
2の反射防止膜付きプラスチックレンズと比べ耐熱性が
小さく、また経時的なクラック発生温度の低下の程度が
大きいものであった。
Comparative Example 2-1 and Comparative Example 2-2 As a comparison of Example 2, Comparative Example 2-1 and Comparative Example 2-2 will be given. The refractive index of the underlayer is 1.47, which is outside the range of the present invention.
A plastic lens with an antireflection film was obtained in the same manner as in Example 2 except that (Comparative Example 2-1) and 1.54 (Comparative Example 2-2) were used. As shown in Table 4, the evaluation results were that the heat resistance was lower than that of the plastic lens with an antireflection film of Example 2, and the degree of decrease in crack generation temperature with time was large.

【0029】実施例3 特許請求の範囲の欄の請求項2に該当するもう一つの実
施例として実施例3を挙げる。膜構成を表5に示したよ
うにし、さらに成膜条件を実施例1と同じにして反射防
止膜付きプラスチックレンズを得た。評価結果は表6に
示されるようにクラック発生温度が105℃と耐熱性に
優れ、さらに4ケ月間屋外暴露を行った後のクラック発
生温度が100℃と経時的な耐熱温度の低下の程度が小
さいものであった。
Example 3 Example 3 will be given as another example corresponding to claim 2 in the scope of claims. The film constitution was as shown in Table 5, and the film forming conditions were the same as in Example 1 to obtain a plastic lens with an antireflection film. As shown in Table 6, the evaluation results show that the cracking temperature is 105 ° C., which is excellent in heat resistance, and the cracking temperature after outdoor exposure for 4 months is 100 ° C. It was a small one.

【0030】比較例3−1、比較例3−2 実施例3の比較として比較例3−1、比較例3−2を挙
げる。下地層の屈折率を本発明の範囲外である1.47
(比較例3−1)、1.54(比較例3−2)にした以
外は実施例3と同様にして反射防止膜付きプラスチック
レンズを得た。評価結果は表6に示されるように実施例
3の反射防止膜付きプラスチックレンズと比べ耐熱性が
小さく、また経時的なクラック発生温度の低下の程度が
大きいものであった。
Comparative Example 3-1 and Comparative Example 3-2 As a comparison of Example 3, Comparative Example 3-1 and Comparative Example 3-2 will be given. The refractive index of the underlayer is 1.47, which is outside the range of the present invention.
A plastic lens with an antireflection film was obtained in the same manner as in Example 3 except that (Comparative Example 3-1) and 1.54 (Comparative Example 3-2) were used. As shown in Table 6, the evaluation results were that the heat resistance was lower than that of the plastic lens with an antireflection film of Example 3, and the degree of decrease in crack generation temperature with time was large.

【0031】実施例4〜実施例6−2 特許請求の範囲の欄の請求項4に該当する実施例として
四つの実施例を挙げる。膜構成を表7(実施例4)、表
9(実施例5)、表11(実施例6−1、実施例6−
2)に示したようにし、さらに成膜条件を実施例1と同
じようにして反射防止膜付きプラスチックレンズを得
た。評価結果は表8(実施例4)、表10(実施例
5)、表12(実施例6−1、実施例6−2)に示され
るようにすべて経時的なクラック発生温度の低下の程度
が小さいものであった。
Example 4 to Example 6-2 Four examples will be given as examples corresponding to claim 4 in the scope of claims. The film constitution is shown in Table 7 (Example 4), Table 9 (Example 5), and Table 11 (Example 6-1 and Example 6-).
As described in 2), the film forming conditions were the same as in Example 1 to obtain a plastic lens with an antireflection film. As shown in Table 8 (Example 4), Table 10 (Example 5), and Table 12 (Example 6-1 and Example 6-2), the evaluation results are all about the degree of decrease in crack generation temperature with time. Was small.

【0032】比較例4−1〜比較例6−2 実施例4の比較として比較例4−1〜比較例4−4を、
実施例5の比較として比較例5−1〜比較例5−4を、
実施例6−1、実施例6−2の比較として比較例6−1
〜比較例6−3を挙げる。膜構成を表7(比較例4−1
〜比較例4−4)、表9(比較例5−1〜比較例5−
4)、表11(比較例6−1〜比較例6−3)に示した
ようにし、さらに成膜条件を実施例1と同じようにして
反射防止膜付きプラスチックレンズを得た。評価結果は
表8(比較例4−1〜比較例4−4)、表10(比較例
5−1〜比較例5−4)、表12(比較例6−1〜比較
例6−3)に示されるように、比較例4−1〜比較例4
−4の反射防止膜付きプラスチックレンズは実施例4の
反射防止膜付きプラスチックレンズよりも、比較例5−
1〜比較例5−4の反射防止膜付きプラスチックレンズ
は実施例5の反射防止膜付きプラスチックレンズより
も、また比較例6−1〜比較例6−3の反射防止膜付き
プラスチックレンズは実施例6−1、実施例6−2の反
射防止膜付きプラスチックレンズよりも経時的なクラッ
ク発生温度の低下の程度が大きいものであった。
Comparative Example 4-1 to Comparative Example 6-2 Comparative Example 4-1 to Comparative Example 4-4 as a comparison of Example 4
As a comparison of Example 5, Comparative Examples 5-1 to 5-4,
Comparative Example 6-1 as a comparison between Example 6-1 and Example 6-2
-Comparative example 6-3 is given. The film constitution is shown in Table 7 (Comparative Example 4-1).
-Comparative Example 4-4), Table 9 (Comparative Example 5-1 to Comparative Example 5-)
4) and Table 11 (Comparative Examples 6-1 to 6-3), and the film forming conditions were the same as in Example 1 to obtain a plastic lens with an antireflection film. The evaluation results are shown in Table 8 (Comparative Example 4-1 to Comparative Example 4-4), Table 10 (Comparative Example 5-1 to Comparative Example 5-4), and Table 12 (Comparative Example 6-1 to Comparative Example 6-3). As shown in Comparative Example 4-1 to Comparative Example 4
The plastic lens with the antireflection film of Example No. -4 is a comparative example 5 rather than the plastic lens with the antireflection film of Example 4.
The plastic lens with the antireflection film of 1 to Comparative Example 5-4 is more than the plastic lens with the antireflection film of Example 5, and the plastic lens with the antireflection film of Comparative Example 6-1 to Comparative Example 6-3 is the example. The degree of decrease in crack generation temperature with time was larger than that of the plastic lenses with antireflection film of 6-1 and Example 6-2.

【0033】[0033]

【表1】 [Table 1]

【0034】[0034]

【表2】 [Table 2]

【0035】[0035]

【表3】 [Table 3]

【0036】[0036]

【表4】 [Table 4]

【0037】[0037]

【表5】 [Table 5]

【0038】[0038]

【表6】 [Table 6]

【0039】[0039]

【表7】 [Table 7]

【0040】[0040]

【表8】 [Table 8]

【0041】[0041]

【表9】 [Table 9]

【0042】[0042]

【表10】 [Table 10]

【0043】[0043]

【表11】 [Table 11]

【0044】[0044]

【表12】 [Table 12]

【0045】[0045]

【発明の効果】本発明の反射防止膜を有する光学部材
は、プラスチック基板のように低い基板温度で成膜する
場合でも耐擦傷性、密着性、耐酸性、耐アルカリ性が良
好なばかりでなく、経時的な耐熱温度の低下が小さい。
したがって、本発明の光学部材は例えば、作製して長時
間保存する可能性のある眼鏡レンズに特に好適に用いる
ことができる。
The optical member having the antireflection film of the present invention not only has good scratch resistance, adhesion, acid resistance and alkali resistance even when formed at a low substrate temperature such as a plastic substrate. Small decrease in heat resistant temperature over time.
Therefore, the optical member of the present invention can be particularly preferably used for a spectacle lens that may be manufactured and stored for a long time.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 合成樹脂上に下地層と反射防止膜とを有
する光学部材であって、前記下地層はSiO2 とAl2
3 との混合物からなり、さらに前記下地層の屈折率の
範囲が1.48〜1.52であることを特徴とする反射
防止膜を有する光学部材。
1. An optical member having a base layer and an antireflection film on a synthetic resin, wherein the base layer is SiO 2 and Al 2.
An optical member having an antireflection film, which is made of a mixture with O 3, and in which the range of the refractive index of the underlayer is 1.48 to 1.52.
【請求項2】 前記反射防止膜は下地層の表面から順
に、Ta2 5 層と、Ta2 5 、Y2 3 およびSi
2 とを含む混合層より構成される第1の低屈折率層;
Ta2 5 層と、Ta2 5 、Y2 3 およびSiO2
とを含む混合層と、Ta2 5 層より構成される高屈折
率層;SiO2 層より構成される第2の低屈折率層を積
層してなることを特徴とする請求項1記載の反射防止膜
を有する光学部材。
2. The antireflection film comprises a Ta 2 O 5 layer, Ta 2 O 5 , Y 2 O 3 and Si in this order from the surface of the underlayer.
A first low refractive index layer composed of a mixed layer containing O 2 ;
Ta 2 O 5 layer and Ta 2 O 5 , Y 2 O 3 and SiO 2
2. A mixed layer containing: and a high refractive index layer composed of a Ta 2 O 5 layer; and a second low refractive index layer composed of a SiO 2 layer are laminated. An optical member having an antireflection film.
【請求項3】 前記反射防止膜は下地層の表面から順
に、Ta2 5 、Y2 3 およびSiO2 とを含む混合
層と、Ta2 5 層より構成される第1の低屈折率層;
Ta2 5 、Y2 3 およびSiO2 とを含む混合層
と、Ta2 5 層と、Ta2 5 、Y2 3 およびSi
2 とを含む混合層より構成される高屈折率層;SiO
2 層より構成される第2の低屈折率層を積層してなるこ
とを特徴とする請求項1記載の反射防止膜を有する光学
部材。
3. The first anti-reflection film comprising a mixed layer containing Ta 2 O 5 , Y 2 O 3 and SiO 2 and a Ta 2 O 5 layer in order from the surface of the underlayer. Stratum;
A mixed layer containing Ta 2 O 5 , Y 2 O 3 and SiO 2 , a Ta 2 O 5 layer, Ta 2 O 5 , Y 2 O 3 and Si
High refractive index layer composed of mixed layer containing O 2 ; SiO
The optical member having an antireflection film according to claim 1, wherein a second low refractive index layer composed of two layers is laminated.
【請求項4】 前記反射防止膜はSiO2 とAl2 3
との混合層を有し、さらにその混合層の屈折率の範囲が
1.48〜1.52であることを特徴とする請求項1記
載の反射防止膜を有する光学部材。
4. The antireflection film is formed of SiO 2 and Al 2 O 3
2. The optical member having an antireflection film according to claim 1, wherein the optical layer has a mixed layer of and the refractive index of the mixed layer is 1.48 to 1.52.
【請求項5】 前記合成樹脂と前記下地層の間に有機ケ
イ素重合体を含むハードコート層を介在させたことを特
徴とする請求項1〜4いずれか1項記載の反射防止膜を
有する光学部材。
5. An optical system having an antireflection film according to claim 1, wherein a hard coat layer containing an organic silicon polymer is interposed between the synthetic resin and the underlayer. Element.
【請求項6】 前記光学部材は眼鏡用レンズであること
を特徴とする請求項1〜5いずれか1項記載の反射防止
膜を有する光学部材。
6. The optical member having an antireflection film according to claim 1, wherein the optical member is an eyeglass lens.
JP3185494A 1991-06-28 1991-06-28 Optical member having antireflection film Expired - Fee Related JP3068252B2 (en)

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JPH0511101A true JPH0511101A (en) 1993-01-19
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6004850A (en) * 1998-02-23 1999-12-21 Motorola Inc. Tantalum oxide anti-reflective coating (ARC) integrated with a metallic transistor gate electrode and method of formation
US6606196B2 (en) * 2000-08-29 2003-08-12 Hoya Corporation Optical element having antireflection film
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US7692855B2 (en) 2006-06-28 2010-04-06 Essilor International Compagnie Generale D'optique Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers
US8028914B2 (en) 2006-01-17 2011-10-04 Shiseido Co., Ltd. Laminated material having recorded information thereon, article to which the same is affixed, information reading method, and information reading apparatus

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6004850A (en) * 1998-02-23 1999-12-21 Motorola Inc. Tantalum oxide anti-reflective coating (ARC) integrated with a metallic transistor gate electrode and method of formation
US6294820B1 (en) 1998-02-23 2001-09-25 Motorola, Inc. Metallic oxide gate electrode stack having a metallic gate dielectric metallic gate electrode and a metallic arc layer
US6606196B2 (en) * 2000-08-29 2003-08-12 Hoya Corporation Optical element having antireflection film
JP2007505369A (en) * 2003-05-23 2007-03-08 オプティマ インコーポレイテッド Ultra low residual reflection and low stress lens coating
US8028914B2 (en) 2006-01-17 2011-10-04 Shiseido Co., Ltd. Laminated material having recorded information thereon, article to which the same is affixed, information reading method, and information reading apparatus
WO2008001011A2 (en) * 2006-06-28 2008-01-03 Essilor International (Compagnie Generale D'optique) Optical article coated with an underlayer and with a temperature-resistant multi-layer anti-reflection coating, and manufacturing method
FR2903197A1 (en) * 2006-06-28 2008-01-04 Essilor Int OPTICAL ARTICLE COATED WITH A TEMPERATURE-RESISTANT MULTILAYER COATED ANTI-REFLECTING COATING AND COATING, AND METHOD OF MANUFACTURING THE SAME
WO2008001011A3 (en) * 2006-06-28 2008-03-06 Essilor Int Optical article coated with an underlayer and with a temperature-resistant multi-layer anti-reflection coating, and manufacturing method
US7692855B2 (en) 2006-06-28 2010-04-06 Essilor International Compagnie Generale D'optique Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers
US9625620B2 (en) 2006-06-28 2017-04-18 Essilor International (Compagnie Generale D'optique) Optical article coated with a sub-layer and with a heat-resistant, multilayered antireflection coating, and method for producing same
WO2008133136A1 (en) * 2007-04-16 2008-11-06 Konica Minolta Opto, Inc. Reflecting mirror

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