JPH0497335U - - Google Patents
Info
- Publication number
- JPH0497335U JPH0497335U JP10957691U JP10957691U JPH0497335U JP H0497335 U JPH0497335 U JP H0497335U JP 10957691 U JP10957691 U JP 10957691U JP 10957691 U JP10957691 U JP 10957691U JP H0497335 U JPH0497335 U JP H0497335U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10957691U JPH0497335U (en) | 1991-12-11 | 1991-12-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10957691U JPH0497335U (en) | 1991-12-11 | 1991-12-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0497335U true JPH0497335U (en) | 1992-08-24 |
Family
ID=31856797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10957691U Pending JPH0497335U (en) | 1991-12-11 | 1991-12-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0497335U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006111927A (en) * | 2004-10-15 | 2006-04-27 | Cyg Gijutsu Kenkyusho Kk | Sputtering system |
JP4627835B2 (en) * | 2000-03-23 | 2011-02-09 | キヤノンアネルバ株式会社 | Sputtering apparatus and thin film forming method |
-
1991
- 1991-12-11 JP JP10957691U patent/JPH0497335U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4627835B2 (en) * | 2000-03-23 | 2011-02-09 | キヤノンアネルバ株式会社 | Sputtering apparatus and thin film forming method |
JP2006111927A (en) * | 2004-10-15 | 2006-04-27 | Cyg Gijutsu Kenkyusho Kk | Sputtering system |
JP4583868B2 (en) * | 2004-10-15 | 2010-11-17 | 株式会社昭和真空 | Sputtering equipment |