JPH0493367A - Photocurable coating material - Google Patents
Photocurable coating materialInfo
- Publication number
- JPH0493367A JPH0493367A JP21202990A JP21202990A JPH0493367A JP H0493367 A JPH0493367 A JP H0493367A JP 21202990 A JP21202990 A JP 21202990A JP 21202990 A JP21202990 A JP 21202990A JP H0493367 A JPH0493367 A JP H0493367A
- Authority
- JP
- Japan
- Prior art keywords
- parts
- coating material
- photocurable
- acrylic acid
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 16
- 239000011248 coating agent Substances 0.000 title claims abstract description 13
- 239000000463 material Substances 0.000 title claims abstract description 13
- 239000000178 monomer Substances 0.000 claims abstract description 18
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims abstract description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 11
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 150000001334 alicyclic compounds Chemical class 0.000 claims description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 abstract description 7
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 abstract description 4
- 238000010894 electron beam technology Methods 0.000 abstract description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 abstract description 2
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 abstract description 2
- 229930003836 cresol Natural products 0.000 abstract description 2
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 125000002950 monocyclic group Chemical group 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 description 17
- 238000003786 synthesis reaction Methods 0.000 description 17
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 239000002253 acid Substances 0.000 description 9
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229960001755 resorcinol Drugs 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000003350 kerosene Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- -1 octylphenol Chemical compound 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- BJEMXPVDXFSROA-UHFFFAOYSA-N 3-butylbenzene-1,2-diol Chemical compound CCCCC1=CC=CC(O)=C1O BJEMXPVDXFSROA-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009500 colour coating Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 229960004337 hydroquinone Drugs 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- XPWSMXMGZIRGMG-UHFFFAOYSA-N prop-2-enoic acid;2-prop-2-enoyloxyethyl prop-2-enoate Chemical class OC(=O)C=C.C=CC(=O)OCCOC(=O)C=C XPWSMXMGZIRGMG-UHFFFAOYSA-N 0.000 description 1
- FAIDIRVMPHBRLT-UHFFFAOYSA-N propane-1,2,3-triol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OCC(O)CO FAIDIRVMPHBRLT-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔発明の目的]
(産業上の利用分野)
本発明は、紫外線や電子線などを照射した場合に硬化し
、しかも印刷適性、光沢、洗浄性等に優れた光硬化性被
覆剤に関する。[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) The present invention is a photocurable material that cures when irradiated with ultraviolet rays or electron beams, and has excellent printability, gloss, and washability. The present invention relates to a sexual coating agent.
(従来の技術)
近年、活性エネルギー線による硬化性被覆剤の研究は盛
んに行われてあり、その中でも印刷インキ。(Prior Art) In recent years, research has been actively conducted on coating materials that can be cured by active energy rays, and among them, printing inks.
クリヤーフェス、塗料、接着剤、フォトレジスト等の分
野では実用化が進められている。これらはラジカル重合
性モノマー、プレポリマーと2必要に応じてラジカル重
合開始剤、顔料からなっており、プレポリマーとしては
アルキッドアクリレート、ポリエステルアクリレート
エポキシアクリレート ウレタン変性アクリレート等が
、またモノマーとしては。Practical applications are progressing in fields such as clear faces, paints, adhesives, and photoresists. These consist of a radically polymerizable monomer, a prepolymer, and 2 radical polymerization initiators and pigments as necessary.The prepolymers include alkyd acrylate and polyester acrylate.
Epoxy acrylate, urethane-modified acrylate, and other monomers.
エチレングリコールジアクリレート トリエチレングリ
コールジアクリレート、トリプロピレングリコールジア
クリレートなどのグリコール類のアクリル酸エステル、
或いはグリセリン、トリメチロールプロパン、ペンタエ
リスリトール等の多価アルコールのアクリル酸エステル
、例えばグリセリンジアクリレート、トリメチロールプ
ロパントリアクリレートペンタエリスリトールトリアク
リレート、ペンタエリスリトールテトラアクリレート等
がある。Ethylene glycol diacrylate Acrylic acid esters of glycols such as triethylene glycol diacrylate and tripropylene glycol diacrylate,
Alternatively, there are acrylic acid esters of polyhydric alcohols such as glycerin, trimethylolpropane, and pentaerythritol, such as glycerin diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, and pentaerythritol tetraacrylate.
またアクリレートとして1重合後に柔軟性を付与するな
どの為にエチレンオキサイドやプロピレンオキサイドを
導入したものもある。There are also acrylates in which ethylene oxide or propylene oxide is introduced in order to impart flexibility after one polymerization.
例えば、特開昭53−11925号公報に見られるペン
タエリスリトールにエチレンオキサイドやプロピレンオ
キサイドを付加した(メタ)アクリレートモツマ−が開
示されている。その他アルキレンオキサイドに導入した
(メタ)アクリレートモノマーとしては、特公昭54−
22333号公報に1核体の多価フェノールにエチレン
オキサイドやプロピレンオキサイドを付加した(メタ)
アクリレートモノマーが開示されている。更には特公昭
60−28288号公報には、芳香族基を有する一価の
炭化水素基で置換されたフェノール誘導体へのアルキレ
ンオキサイド付加物の(メタ)アクリレートモノマーが
また特開昭57−51768号公報にはフェノールノボ
ラックにアルキレンオキサイドを付加した(メタ)アク
リレートモノマーを併用する組成物が開示されている。For example, JP-A-53-11925 discloses a (meth)acrylate motsumer obtained by adding ethylene oxide or propylene oxide to pentaerythritol. Other (meth)acrylate monomers introduced into alkylene oxide include
Publication No. 22333 describes the addition of ethylene oxide or propylene oxide to a mononuclear polyhydric phenol (meth).
Acrylate monomers are disclosed. Furthermore, Japanese Patent Publication No. 60-28288 discloses a (meth)acrylate monomer of an alkylene oxide adduct to a phenol derivative substituted with a monovalent hydrocarbon group having an aromatic group. The publication discloses a composition in which a (meth)acrylate monomer in which an alkylene oxide is added to a phenol novolac is used in combination.
最近の活性エネルギー線硬化性被覆剤に求められる物性
としては2印刷通性、光沢、洗浄性(白灯油で洗浄し5
い)について、油性インキに近いレベルが求められてき
た。The physical properties required of recent active energy ray-curable coatings are 2. Printability, gloss, and washability (washed with white kerosene, 5.
There has been a demand for a level similar to that of oil-based inks.
しかし、従来のモノマー構成では上記レベルヲ満足でき
ず、硬化性被覆剤の適用範囲を狭めているのが実情であ
った。However, the conventional monomer composition cannot satisfy the above-mentioned level, and the actual situation is that the scope of application of the curable coating material is narrowed.
(発明が解決しようとする課題)
本発明は、印刷適性、光沢、洗浄性等に優れた光硬化性
被覆剤を提供するものである。(Problems to be Solved by the Invention) The present invention provides a photocurable coating material that is excellent in printability, gloss, washability, etc.
(課題を解決するための手段)
本発明は、1核体フェノールまたは水酸基含有脂環式化
合物のブチレンオキサイド付加体にアクリル酸またはメ
タクリル酸を反応させてなるモノマーを含有する光硬化
性被覆剤であり、さらに光硬化性二重結合を有するプレ
ポリマーおよびまたは光硬化性二重結合を有しない樹脂
を含む光硬化性被覆剤である。(Means for Solving the Problems) The present invention provides a photocurable coating material containing a monomer obtained by reacting a mononuclear phenol or a butylene oxide adduct of a hydroxyl group-containing alicyclic compound with acrylic acid or methacrylic acid. It is a photocurable coating material which further includes a prepolymer having a photocurable double bond and/or a resin having no photocurable double bond.
本発明に係わる1核体フェノールとしては1例えば次の
一般式で表される化合物である。The mononuclear phenol according to the present invention is, for example, a compound represented by the following general formula.
R−P h−(OH) 、−3
(式中、RはCP、H2,1I(nは0〜9)、Phは
フェニル基、をそれぞれ示す。)
例えば、フェノール、アルキル(炭素数1〜9)フェノ
ール、例えばクレゾール、t−ブチルフェノール、オク
チルフェノール、ノニルフェノール、カテコール、t−
ブチルカテコール、レゾルシン、ハイドロキノン、ピロ
ガロール等が例示できる。R-P h-(OH), -3 (In the formula, R represents CP, H2,1I (n is 0 to 9), and Ph represents a phenyl group.) For example, phenol, alkyl (having 1 to 1 carbon atoms) 9) Phenols, such as cresol, t-butylphenol, octylphenol, nonylphenol, catechol, t-
Examples include butylcatechol, resorcinol, hydroquinone, and pyrogallol.
また、水酸基含有脂環式化合物としては、1核体フェノ
ールの水添加化合物またはトリシクロデカンモノまたは
ジ−メチロール、トリシクロデカンモノまたはジ−アル
コール等が例示できる。Further, examples of the hydroxyl group-containing alicyclic compound include a water-added compound of mononuclear phenol, tricyclodecane mono- or di-methylol, tricyclodecane mono- or di-alcohol, and the like.
更に詳しくはブチレンオキサイドの付加に於いては水酸
化ナトリウムなどのアルカリ触媒下2反応温度180″
C−160℃の間で付加させる。More specifically, in the addition of butylene oxide, the reaction temperature is 180" under an alkali catalyst such as sodium hydroxide.
The addition is carried out between C and 160C.
アクリルエステル化反応は、触媒として硫酸、パラトル
エンスルホン酸等のいづれを用いても良い。In the acrylic esterification reaction, any of sulfuric acid, paratoluenesulfonic acid, etc. may be used as a catalyst.
また重合禁止剤としてはハイドロキノン、ハイドロキノ
ン七ツメチルエーテル等が使用できる。Further, as a polymerization inhibitor, hydroquinone, hydroquinone 7-methyl ether, etc. can be used.
これら触媒2重合禁止剤の存在下アクリル酸が熱重合し
ない温度以下1通常80〜110°Cの範囲で空気を吹
き込みながら反応させる。またこのとき使用する共沸溶
媒としてはベンゼン、トルエン、キシレン、n−ヘキサ
ン、メチルイソブチルケトンなどの水と共沸化合物をつ
くり、実質的には水と混合しない有機溶媒の単独または
混合物が使用し得る。In the presence of these catalytic double polymerization inhibitors, the reaction is carried out while blowing air at a temperature below the temperature at which acrylic acid does not undergo thermal polymerization, usually in the range of 80 to 110°C. The azeotropic solvent used at this time may be organic solvents that form azeotropic compounds with water, such as benzene, toluene, xylene, n-hexane, methyl isobutyl ketone, etc., and are substantially immiscible with water, either alone or in mixtures. obtain.
ブチレンオキサイドの付加モル数については、1核体フ
ェノールまたは水酸基含有脂環式化合物の水酸基1個に
対し、1〜10モルが好ましく、特に1゜5〜3モルが
望ましい。これより少ないときは親油性が低く、また多
い場合は、硬化性が劣化する。The number of moles of butylene oxide added is preferably 1 to 10 moles, particularly preferably 1.5 to 3 moles, per hydroxyl group of the mononuclear phenol or hydroxyl group-containing alicyclic compound. When the amount is less than this, the lipophilicity is low, and when it is more than this, the curability is deteriorated.
アクリル酸またはメタクリル酸の反応量は、 (メタ)
アクリル酸のカルボキシル基/ブチレンオキサイド付加
体の水酸基=1.1〜0.9程度である。The reaction amount of acrylic acid or methacrylic acid is (meth)
Carboxyl group of acrylic acid/hydroxyl group of butylene oxide adduct=about 1.1 to 0.9.
用途としては例えば種々原反のクリアコーティング、オ
ーバーブリントワ、ニス等の顔料を含まないコーティン
グ剤、更には2例えばオフセットインキ。Applications include, for example, clear coatings for various raw materials, overprinting agents, coatings that do not contain pigments such as varnishes, and furthermore, for example, offset inks.
シルクスクリーンインキ等の顔料を含むカラーコーティ
ング等の光硬化性被覆剤に使用出来る。It can be used in photocurable coatings such as color coatings containing pigments such as silk screen inks.
本発明の光硬化性被覆剤としては、モノマーの他に、光
硬化性二重結合を有する化合物、つまりプレポリマー、
他のモノマーを併用することができる。In addition to the monomer, the photocurable coating material of the present invention includes a compound having a photocurable double bond, that is, a prepolymer,
Other monomers can be used in combination.
プレポリマーとしては1例えばエポキシアクリレート、
ウレタンアクリレート アルキッドアクリレート、ジア
リルフタレートプレポリマー、フェニルノボラック系多
官能アリルエーテル等がある。また紫外線にて硬化させ
る場合は光反応開始剤、増感剤を混合出来る。その他必
要に応じて有機溶剤、添加側及び種々の光硬化性を有し
ない樹脂を併用する事が可能である。Examples of prepolymers include epoxy acrylate,
Urethane acrylates include alkyd acrylates, diallyl phthalate prepolymers, and phenyl novolak-based polyfunctional allyl ethers. In addition, when curing with ultraviolet rays, a photoreaction initiator and a sensitizer can be mixed. In addition, organic solvents, additives, and various non-photocurable resins may be used in combination as necessary.
光硬化性二重結合を有しない樹脂としては2通常固形で
あり2石油樹脂、ロジン変性フェノール樹脂。Examples of resins that do not have photocurable double bonds include petroleum resins and rosin-modified phenolic resins, which are usually solid.
エポンエステル樹脂、アクリル樹脂、ジアリルフタレー
ト樹脂などである。These include Epon ester resin, acrylic resin, diallyl phthalate resin, etc.
(実 施 例)
以下本発明を合成例、実施例により説明する。例中部と
は重量部を2%とは重量%をそれぞれ表わす。(Examples) The present invention will be explained below with reference to synthesis examples and examples. Example: Middle part means parts by weight, and 2% means percent by weight.
合成例1
温度計、窒素導入装置兼ブチレンオキサイド導入装置及
び撹拌装置を付した小型オートクレーブにレゾルシン1
10部、水酸化ナトリウム2部、ブチレンオキサイド2
20部を仕込み、撹拌しつつ系内を窒素置換し、160
°C,5kg/cij以下にて徐々に反応させる。反応
終了後ゲージ圧0.1kg/cd以下になるまで撹拌を
継続させ2反応には30分を要した。Synthesis Example 1 Resorcinol 1 was placed in a small autoclave equipped with a thermometer, nitrogen introduction device/butylene oxide introduction device, and stirring device.
10 parts, 2 parts of sodium hydroxide, 2 parts of butylene oxide
Charge 20 parts, replace the system with nitrogen while stirring, and bring to 160
The reaction is carried out gradually at °C and 5 kg/cij or less. After the reaction was completed, stirring was continued until the gauge pressure became 0.1 kg/cd or less, and 30 minutes were required for the two reactions.
得られた付加体330部、アクリル酸144部。330 parts of the obtained adduct and 144 parts of acrylic acid.
ハイドロキノン0.6部、p−トルエンスルホン酸6部
、シクロヘキサン60部を撹拌機付4つ目フラスコで空
気を吹き込みながら100°Cで15時間反応させ、酸
価5.7の時点で脱溶媒し、汲み出した。得られたモノ
マーをAとする。0.6 parts of hydroquinone, 6 parts of p-toluenesulfonic acid, and 60 parts of cyclohexane were reacted at 100°C for 15 hours while blowing air in a fourth flask equipped with a stirrer, and the solvent was removed when the acid value reached 5.7. , pumped out. The obtained monomer is designated as A.
合成例2
合成例1の装置にトリシクロデカンジメチロール200
部、水酸化ナトリウム2部、ブチレンオキサイド220
部を仕込み1合成例1と同じようにして反応させた。Synthesis Example 2 Add 200 g of tricyclodecane dimethylol to the apparatus of Synthesis Example 1.
parts, sodium hydroxide 2 parts, butylene oxide 220 parts
1 part was charged and reacted in the same manner as in Synthesis Example 1.
得られた付加体420部、アクリル酸144部。420 parts of the obtained adduct and 144 parts of acrylic acid.
ハイドロキノン0.9部、p−トルエンスルホン酸9部
、シクロヘキサン90部を合成例1と同様にして反応さ
せた。得られた酸価6.0のモノマーをBとする。0.9 parts of hydroquinone, 9 parts of p-toluenesulfonic acid, and 90 parts of cyclohexane were reacted in the same manner as in Synthesis Example 1. The obtained monomer having an acid value of 6.0 is designated as B.
合成例3
合成例1の装置にレゾルシン110部、水酸化ナトリウ
ム2部、エチレンオキサイド176部を仕込み2合成例
1と同じようにして反応させた。Synthesis Example 3 110 parts of resorcin, 2 parts of sodium hydroxide, and 176 parts of ethylene oxide were charged into the apparatus of Synthesis Example 1, and reacted in the same manner as in Synthesis Example 1.
得られた付加体286部、アクリル酸130部。286 parts of the obtained adduct and 130 parts of acrylic acid.
ハイドロキノン0.6部、p−トルエンスルホン酸6部
、シクロヘキサン60部を合成例1と同様にして反応さ
せた。得られた酸価5.0のモノマーをCとする。0.6 parts of hydroquinone, 6 parts of p-toluenesulfonic acid, and 60 parts of cyclohexane were reacted in the same manner as in Synthesis Example 1. The obtained monomer having an acid value of 5.0 is designated as C.
合成例4
合成例1の装置にトリシクロデカンジメチロール200
部、水酸化ナトリウム2部、プロピレンキサイド174
部を仕込み5合成例1と同じようにして反応させた。Synthesis Example 4 Add 200% tricyclodecane dimethylol to the apparatus of Synthesis Example 1.
1 part, 2 parts of sodium hydroxide, 174 parts of propylene oxide
5 parts were charged and reacted in the same manner as in Synthesis Example 1.
得られた付加体374部、アクリル酸144部。374 parts of the obtained adduct and 144 parts of acrylic acid.
ハイドロキノン0.5部、P−トルエンスルホン酸5部
、シクロヘキサン50部を合成例1と同様にして反応さ
せた。得られた酸価5.1のモノマーをDとする。0.5 parts of hydroquinone, 5 parts of P-toluenesulfonic acid, and 50 parts of cyclohexane were reacted in the same manner as in Synthesis Example 1. The obtained monomer having an acid value of 5.1 is designated as D.
合成例5
トリメチロールプロパン31.6部、ノニル酸33゜5
部、キシレン5部を四つロフラスコに仕込み、窒素ガス
気流下で、200’Cで、酸価5になるまで反応させ、
酸価が1.0になった時点で、脱溶媒し、その後100
°Cに冷却した(これを中間体Mとする)。Synthesis Example 5 31.6 parts of trimethylolpropane, 33.5 parts of nonylic acid
1 part and 5 parts of xylene were placed in a four-round flask, and reacted under a nitrogen gas stream at 200'C until the acid value reached 5.
When the acid value reached 1.0, the solvent was removed, and then 100
It was cooled to °C (this is referred to as intermediate M).
さらにシクロヘキサン5部、ハイドロキノン0.1部p
lルエンスルホン酸1部を仕込み、空気を吹き込みなが
ら、アクリル酸15.3部を滴下ロートで薬1時間かけ
て仕込み、100°Cで15時間後、酸価が5.5にな
ったので、脱溶媒し、その後汲み出す。Furthermore, 5 parts of cyclohexane, 0.1 part of hydroquinone p
1 part of luenesulfonic acid was charged, and while blowing air, 15.3 parts of acrylic acid was added over 1 hour using a dropping funnel. After 15 hours at 100°C, the acid value became 5.5. Desolvent and then pump.
これをプレポリマーEとする。This will be referred to as prepolymer E.
合成例6
エビコート1004 (シェル化学■製エポキシ樹脂)
58.8部、オレイン酸41.2部、トリエチレンジア
ミン0.1部、キシレン5部を攪拌機付き四つロフスラ
スコに仕込み、窒素ガス気流下で、150°C71時間
反応させ、さらに200°C,4時間反応させ。Synthesis Example 6 Ebicoat 1004 (epoxy resin manufactured by Shell Chemical Co., Ltd.)
58.8 parts of oleic acid, 41.2 parts of triethylenediamine, and 5 parts of xylene were placed in a four-loaf flask equipped with a stirrer, and reacted at 150°C for 71 hours under a nitrogen gas stream, and further at 200°C for 4 hours. Let time react.
酸価が5.5になった時点で、汲み出した。得られた非
ラジカル重合性樹脂をFとする。It was pumped out when the acid value reached 5.5. The obtained non-radically polymerizable resin is designated as F.
以下2合成例で得られたモノマー、プレポリマー樹脂を
用い、下表の組成の光硬化性被覆側を作製した。Using the monomers and prepolymer resins obtained in the following two synthesis examples, a photocurable coating having the composition shown in the table below was prepared.
表−1
7cmの強度を有する高圧水銀灯1灯の下、10cmの
ところをコンベアスピード100 ta/分で照射した
。また、実施例3.比較例7についてはカーテンビーム
型電子線照射装置を用い、10Mradの照射を行い、
硬化させた。その後村上色彩製光沢針60−60で光沢
値を測定した。また、印刷後、白灯油での印刷機の洗浄
性をテストした。Table 1 A 10 cm area was irradiated under a single high pressure mercury lamp with an intensity of 7 cm at a conveyor speed of 100 ta/min. Also, Example 3. For Comparative Example 7, irradiation was performed at 10 Mrad using a curtain beam type electron beam irradiation device.
hardened. Thereafter, the gloss value was measured using a Murakami Color Gloss Needle 60-60. Additionally, after printing, the cleaning performance of the printing press with white kerosene was tested.
また、実施例4.比較例8についてはテストコーターで
5μmの膜厚でマリコート紙(北越製紙■製)に塗工し
、上記の高圧水銀灯1灯で50m/分のコンベアスピー
ドで照射し、光沢を測定した。さらにコーターでの洗浄
性を試験した。Also, Example 4. For Comparative Example 8, a test coater was used to coat Maricoat paper (manufactured by Hokuetsu Paper Co., Ltd.) to a film thickness of 5 μm, and the gloss was measured by irradiating with the above-mentioned high-pressure mercury lamp at a conveyor speed of 50 m/min. Furthermore, the washability with a coater was tested.
結果を表−2に示す。The results are shown in Table-2.
WORDハイデルベルグ印刷機で印刷し、El]刷時の
非画線部への汚れ発生枚数を測定した。Printing was performed using a WORD Heidelberg printing machine, and the number of sheets with stains on non-image areas during printing was measured.
さらに実施例1〜2.比較例5〜6について120曽発
明の効果]
本発明の光硬化性被覆剤は、印刷適性、光沢、洗浄性に
優れ、その適用範囲を拡げることができる。Furthermore, Examples 1-2. 120 Effects of the Invention for Comparative Examples 5 and 6] The photocurable coating material of the present invention has excellent printability, gloss, and washability, and can expand its range of application.
Claims (1)
ブチレンオキサイド付加体にアクリル酸またはメタクリ
ル酸を反応させてなるモノマーを含有することを特徴と
する光硬化性被覆剤。 2、さらに光硬化性二重結合を有するプレポリマーおよ
びまたは光硬化性二重結合を有しない樹脂を含む請求項
1記載の光硬化性被覆剤。[Scope of Claims] A photocurable coating material comprising a monomer obtained by reacting a mononuclear phenol or a butylene oxide adduct of a hydroxyl group-containing alicyclic compound with acrylic acid or methacrylic acid. 2. The photocurable coating material according to claim 1, further comprising a prepolymer having a photocurable double bond and/or a resin having no photocurable double bond.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21202990A JPH0493367A (en) | 1990-08-10 | 1990-08-10 | Photocurable coating material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21202990A JPH0493367A (en) | 1990-08-10 | 1990-08-10 | Photocurable coating material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0493367A true JPH0493367A (en) | 1992-03-26 |
Family
ID=16615692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21202990A Pending JPH0493367A (en) | 1990-08-10 | 1990-08-10 | Photocurable coating material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0493367A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013146482A1 (en) * | 2012-03-30 | 2013-10-03 | 日本ビー・ケミカル株式会社 | Hard coating composition and composition for forming high refractive index anti-blocking layer |
JP2013209483A (en) * | 2012-03-30 | 2013-10-10 | Nippon Bee Chemical Co Ltd | High-refractive index antiblocking layer-forming composition |
JP2013209481A (en) * | 2012-03-30 | 2013-10-10 | Nippon Bee Chemical Co Ltd | Hard coating composition |
-
1990
- 1990-08-10 JP JP21202990A patent/JPH0493367A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013146482A1 (en) * | 2012-03-30 | 2013-10-03 | 日本ビー・ケミカル株式会社 | Hard coating composition and composition for forming high refractive index anti-blocking layer |
JP2013209483A (en) * | 2012-03-30 | 2013-10-10 | Nippon Bee Chemical Co Ltd | High-refractive index antiblocking layer-forming composition |
JP2013209481A (en) * | 2012-03-30 | 2013-10-10 | Nippon Bee Chemical Co Ltd | Hard coating composition |
US9938426B2 (en) | 2012-03-30 | 2018-04-10 | Teijin Limited | Hard coating composition and composition for forming a high refractive index antiblocking layer |
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