JPH0491077A - Pyridone compound - Google Patents
Pyridone compoundInfo
- Publication number
- JPH0491077A JPH0491077A JP2205255A JP20525590A JPH0491077A JP H0491077 A JPH0491077 A JP H0491077A JP 2205255 A JP2205255 A JP 2205255A JP 20525590 A JP20525590 A JP 20525590A JP H0491077 A JPH0491077 A JP H0491077A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- group
- formula
- acid
- protecting group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Pyridone compound Chemical class 0.000 title claims abstract description 28
- 125000006239 protecting group Chemical group 0.000 claims abstract description 8
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 13
- 238000006243 chemical reaction Methods 0.000 abstract description 7
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000003242 anti bacterial agent Substances 0.000 abstract description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 abstract description 2
- 125000005843 halogen group Chemical group 0.000 abstract description 2
- 125000005905 mesyloxy group Chemical group 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229930186147 Cephalosporin Natural products 0.000 description 11
- 229940124587 cephalosporin Drugs 0.000 description 11
- 239000000243 solution Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 238000001914 filtration Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 150000001780 cephalosporins Chemical class 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- ILVXOBCQQYKLDS-UHFFFAOYSA-N pyridine N-oxide Chemical group [O-][N+]1=CC=CC=C1 ILVXOBCQQYKLDS-UHFFFAOYSA-N 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- UBQKCCHYAOITMY-UHFFFAOYSA-N pyridin-2-ol Chemical class OC1=CC=CC=N1 UBQKCCHYAOITMY-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 150000003952 β-lactams Chemical class 0.000 description 2
- UQJXHLBZULXQBV-CQSZACIVSA-N (4-methoxyphenyl)methyl (6r)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound C1=CC(OC)=CC=C1COC(=O)C1=CCS[C@H]2N1C(=O)C2 UQJXHLBZULXQBV-CQSZACIVSA-N 0.000 description 1
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical group NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 description 1
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- QRAFJHXNLQTXQW-UHFFFAOYSA-N 2-methylpropyl hydrogen carbonate Chemical compound CC(C)COC(O)=O QRAFJHXNLQTXQW-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- NQTADLQHYWFPDB-UHFFFAOYSA-N N-Hydroxysuccinimide Chemical compound ON1C(=O)CCC1=O NQTADLQHYWFPDB-UHFFFAOYSA-N 0.000 description 1
- 241000589517 Pseudomonas aeruginosa Species 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000004599 antimicrobial Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 150000007932 benzotriazole esters Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- 125000001271 cephalosporin group Chemical group 0.000 description 1
- 150000001782 cephems Chemical group 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- YPHMISFOHDHNIV-FSZOTQKASA-N cycloheximide Chemical compound C1[C@@H](C)C[C@H](C)C(=O)[C@@H]1[C@H](O)CC1CC(=O)NC(=O)C1 YPHMISFOHDHNIV-FSZOTQKASA-N 0.000 description 1
- 150000002168 ethanoic acid esters Chemical class 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- CQDGTJPVBWZJAZ-UHFFFAOYSA-N monoethyl carbonate Chemical compound CCOC(O)=O CQDGTJPVBWZJAZ-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 125000006501 nitrophenyl group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- HNKJADCVZUBCPG-UHFFFAOYSA-N thioanisole Chemical compound CSC1=CC=CC=C1 HNKJADCVZUBCPG-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- AALUTIYNYXEFNT-UHFFFAOYSA-N trimethylsilane hydroiodide Chemical compound C[SiH](C)C.I AALUTIYNYXEFNT-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Pyridine Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は新規なピリドン化合物に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to novel pyridone compounds.
更に詳しくは、本発明は抗菌剤として有用なセファロス
ポリン誘導体の製造に用いられる新規な中間体化合物に
関する。More particularly, the present invention relates to novel intermediate compounds used in the preparation of cephalosporin derivatives useful as antimicrobial agents.
従来より合成抗菌剤は数多く知られているが、最近にな
ってピリジン−N−オキシド構造を有するセファロスポ
リン誘導体が開発されてきている。Although many synthetic antibacterial agents have been known, recently cephalosporin derivatives having a pyridine-N-oxide structure have been developed.
本発明者らは、セフェム環の7位側鎖に新規な置換基を
導入することによって、ダラム陽性菌及びダラム陰性菌
に対してなかんずく緑膿菌に対して顕著な抗菌活性を示
すセファロスポリン化合物を創製している(特開昭63
−152386号公報)。By introducing a novel substituent into the 7-position side chain of the cephem ring, the present inventors have developed a cephalosporin that exhibits remarkable antibacterial activity against Durum-positive and Durum-negative bacteria, particularly against Pseudomonas aeruginosa. Creating compounds (Japanese Unexamined Patent Publication No. 1983)
-152386).
今般、それらのセファロスポリン化合物の製造に用いる
新規な中間体化合物として有用なピリドン化合物を見出
し本発明を完成した。We have now discovered a pyridone compound useful as a new intermediate compound used in the production of these cephalosporin compounds and completed the present invention.
本発明に従えば、一般式
(式中、Xは低級アルキル基または置換基を有していて
もよいフェニル基を、R□及びR1はそれぞれ独立して
水素原子または水酸基の保護基を意味する。)で表わさ
れるピリドン化合物もしくはその反応性誘導体が提供さ
れる。According to the present invention, the general formula (wherein, ) or a reactive derivative thereof is provided.
Xにおける低級アルキル基としては1例えばメチル基、
エチル基、プロピル基、ブチル基などがあげられ、フェ
ニル基に置換していてもよい基としては低級アルキル基
例えばメチル基、エチル基などがあげられる。R1びR
2における水酸基の保護基としては、例えばトリメチル
シリル基などのトリ低級アルキルシリル基、ホルミル基
、アセチル基、プロピオニル基などのアシル基、ベンジ
ル基、P−メトキシベンジル基、P−ニトロベンジル基
、ベンズヒドリル基、トリチル基などのアラルキル基、
メトキシメチル基、アリル基、ピラニル基などがあげら
れる。The lower alkyl group in X is 1, for example, a methyl group,
Examples include ethyl group, propyl group, butyl group, and examples of groups which may be substituted with phenyl group include lower alkyl groups such as methyl group and ethyl group. R1biR
Examples of the hydroxyl protecting group in 2 include tri-lower alkylsilyl groups such as trimethylsilyl groups, acyl groups such as formyl groups, acetyl groups, and propionyl groups, benzyl groups, P-methoxybenzyl groups, P-nitrobenzyl groups, and benzhydryl groups. , aralkyl groups such as trityl groups,
Examples include methoxymethyl group, allyl group, and pyranyl group.
一般式[I]のピリドン化合物の反応性誘導体としては
、例えば酸ハロゲン化物(例えば、酸クロリド、酸プロ
ミドなど)、活性エステル(例えば、ベンゾトリアゾー
ルエステル、ベンゾチアゾリルチオエステル、シアノメ
チルエステル、ニトロフェニルエステル、N−ヒドロキ
シスクシンイミドとのエステルなど)、混合酸無水物(
例えば、エトキシカルボン酸、イソブトキシカルボン酸
、トリメチル酢酸などとの混合酸無水物)、活性アミド
、活性アジドなどがあげられる。Examples of the reactive derivatives of the pyridone compound of general formula [I] include acid halides (e.g., acid chloride, acid bromide, etc.), active esters (e.g., benzotriazole ester, benzothiazolyl thioester, cyanomethyl ester, nitro phenyl esters, esters with N-hydroxysuccinimide, etc.), mixed acid anhydrides (
Examples include mixed acid anhydrides with ethoxycarboxylic acid, isobutoxycarboxylic acid, trimethylacetic acid, etc.), active amides, and active azides.
一般式CI)で示される本発明化合物は、例えば次式の
方法で製造することができる。The compound of the present invention represented by the general formula CI) can be produced, for example, by the method of the following formula.
0R2C■〕
X02SOC)t2cOccOOR3
0H
(II)
(式中、R1はカルボキシル基の保護基、例えばt−ブ
チル基、アリル基などのアルキル基、ベンジル基、P−
メトキシベンジル基、ベンズヒドリル基などのアリール
基などがあげられ、Yはハロゲン原子またはメシルオキ
シ基、トシルオキシ基などのスルホネート基を、X、
Rユ、およびR2は前記と同じ)
すなわち、ヒドロキシイミノ化合物[11)とハロメチ
ル化合物(m)とを反応させて、メトキシイミノ化合物
(IV)を得、ついでメトキシイミノ化合物(JV)の
カルボキシル基の保護基R1を常法により除去すること
により、一般式(1)で表されるピリドン化合物が得ら
れる。0R2C■]
Examples include aryl groups such as methoxybenzyl group and benzhydryl group, and Y represents a halogen atom or a sulfonate group such as mesyloxy group and tosyloxy group;
R, and R2 are the same as above) That is, the hydroxyimino compound [11) and the halomethyl compound (m) are reacted to obtain the methoxyimino compound (IV), and then the carboxyl group of the methoxyimino compound (JV) is reacted. By removing the protecting group R1 by a conventional method, a pyridone compound represented by the general formula (1) can be obtained.
なお、一般式[1)で表されるピリドン化合物のうちR
ユ及び/またはR2が水素原子である化合物は、対応す
る水酸基の保護基R1及び/またはR2を除去すること
により製造することができる。具体的には、保護基の特
性に基づいて常法により一般式(IVE中の水酸基の保
護基R0及び/またはR2を、例えば、ギ酸、トリフル
オロ酢酸などの有機酸、ヨウ化水素酸、臭化水素酸、塩
化水素酸などのハロゲン化水素酸、P−トルエンスルホ
ン酸、メタンスルポン酸などのスルホン酸、アニソール
或はチオアニソール存在下或は非存在下での塩化アルミ
ニウム、臭化アルミニウム、三フフ化ホウ素、四塩化チ
タンなどのルイス酸など酸を使用した方法、水酸化ナト
リウム、炭酸ナトリウム、炭酸水素ナトリウム、アンモ
ニア水などのアルカリを使用した方法、ヨウ化トリメチ
ルシランなどのハロゲン化シランを使用した方法、パラ
ジウム、白金などの触媒を使用した接触還元法で保護基
を除去すればよい。In addition, among the pyridone compounds represented by general formula [1], R
A compound in which U and/or R2 are hydrogen atoms can be produced by removing the corresponding hydroxyl protecting group R1 and/or R2. Specifically, the protecting group R0 and/or R2 of the hydroxyl group in the general formula (IVE) is converted into a protective group R0 and/or R2 of the hydroxyl group in the general formula (IVE) by a conventional method based on the characteristics of the protecting group. Hydrohalic acids such as hydrohydric acid and hydrochloric acid, sulfonic acids such as P-toluenesulfonic acid and methanesulfonic acid, aluminum chloride, aluminum bromide, and trifluoride in the presence or absence of anisole or thioanisole. A method using an acid such as a Lewis acid such as boron chloride or titanium tetrachloride, a method using an alkali such as sodium hydroxide, sodium carbonate, sodium bicarbonate, or aqueous ammonia, or a method using a halogenated silane such as trimethylsilane iodide. The protecting group may be removed by a catalytic reduction method using a catalyst such as palladium or platinum.
上記の方法を用いる場合、反応は一般に一20〜60’
C15分〜12時間の範囲内で必要に応じて適当な溶媒
を加えて行われる。When using the above method, the reaction is generally from -20 to 60'
This is carried out within the range of 15 minutes to 12 hours by adding an appropriate solvent as necessary.
本発明の化合物(1)はピリジン−N−オキシド構造を
有するセファロスポリン誘導体の製造の中間体化合物と
して有用である。Compound (1) of the present invention is useful as an intermediate compound in the production of cephalosporin derivatives having a pyridine-N-oxide structure.
例えば、次式ような製造工程で、ピリジン−N−オキシ
ド構造を有する抗菌剤として有用なセファロスポリン化
合物が製造することができる。For example, a cephalosporin compound useful as an antibacterial agent having a pyridine-N-oxide structure can be produced by the following production process.
い2
(I)
〔■〕 〔■〕
(式中、R4は、カルボキシル基の保護基を、X、 R
工、およびR2は前記と同じ)すなわち、本発明化合物
CI)と7−アミノセファロスポリン化合物〔■〕とを
β−ラクタム剤の分野で使用されている縮合反応を用い
て、7位置換セファロスポリン化合物(VI)を得、つ
いで7位置換セファロスポリン化合物(VI)をチオ尿
素と反応させてアミノチアゾール環を有するセファロス
ポリン化合物〔■〕を得、ついで該セファロスポリン化
合物〔■〕をβ−ラクタム剤の分野で一般的に使用され
ている脱保護基反応に付すことにより、ピリジン−N−
オキシド構造を有するセファロスポリン化合物〔■〕が
製造することができる
以下、実施例及び参考例により本発明を更に詳細に説明
する。2 (I) [■] [■] (wherein, R4 represents a carboxyl group protecting group, X, R
In other words, the compound of the present invention CI) and the 7-aminocephalosporin compound [■] are combined to form a cephalosporin substituted at the 7-position using a condensation reaction used in the field of β-lactam agents. A sporin compound (VI) is obtained, then a cephalosporin compound (VI) substituted at the 7-position is reacted with thiourea to obtain a cephalosporin compound [■] having an aminothiazole ring, and then the cephalosporin compound [■] ] by subjecting it to a deprotecting group reaction commonly used in the field of β-lactam agents to obtain pyridine-N-
EXAMPLES A cephalosporin compound [■] having an oxide structure can be produced.The present invention will be explained in more detail with reference to Examples and Reference Examples.
実施例
1.5−ジベンジルオキシ−2−クロロメチル−4−ピ
リドン25.5gを乾燥アセトン250mQに溶解し、
さらにヨウ化ナトリウム10.7gを加えて1時間撹拌
する。析出物を濾過し、濾液を−30”Cに冷却する。Example 1. 25.5 g of 5-dibenzyloxy-2-chloromethyl-4-pyridone was dissolved in 250 mQ of dry acetone,
Furthermore, 10.7 g of sodium iodide was added and stirred for 1 hour. Filter the precipitate and cool the filtrate to -30"C.
そこへトリエチルアミン13゜Om Q 、ついで4−
メタンスルホニルオキシ−3−オキソ−2−ヒドロキシ
イミノ酪酸 t−ブチルエステル26.2gを一20℃
以下で加える。20’Cで2時間撹拌後、水1.3Q、
酢酸エチル0.50を加え分液する。水層をさらに酢酸
エステル250mQで2回抽出し、先の酢酸エチル層と
合わせ、これを水500mQ、飽和食塩水飽和omの混
液2回洗浄する。無水硫酸マグネシウムで乾燥後、減圧
上溶媒を留去すると油状の4−メタンスルホニルオキシ
−3−オキソ−2−(1,5−ジベンジルオキシ−4−
ピリドン−2−イルメトキシイミノ酪a t−ブチルエ
ステルを得る。Then triethylamine 13゜Om Q, then 4-
Methanesulfonyloxy-3-oxo-2-hydroxyiminobutyric acid t-butyl ester 26.2g - 20℃
Add below. After stirring at 20'C for 2 hours, 1.3Q of water,
Add 0.50 ethyl acetate and separate the layers. The aqueous layer is further extracted twice with 250 mQ of acetic acid ester, combined with the previous ethyl acetate layer, and washed twice with a mixture of 500 mQ of water and saturated brine. After drying over anhydrous magnesium sulfate, the solvent was distilled off under reduced pressure to obtain an oily 4-methanesulfonyloxy-3-oxo-2-(1,5-dibenzyloxy-4-
Pyridon-2-ylmethoxyiminobutyrate t-butyl ester is obtained.
得られた油状物に冷却したトリフロロ酢酸300mnを
加え、室温下90分反応させる。反応液を減圧濃縮し、
これにエチルエーテルを加えて生成した沈殿を濾取後、
沈殿を水IQ、クロロホルム500m12に懸濁させ、
飽和重曹水でpH7,3に調整する。不溶物を濾過した
のち、水層をIN−塩酸でpH2,7とし、生成した析
出物を濾取し水洗後乾燥すると目的とする(Z)−4−
メタンスルホニルオキシ−3−オキソ−2−(1,5−
ジベンジルオキシ−4−ピリドン−2−イルメトキシイ
ミノ)酪酸27.1gを得る。300 mL of cooled trifluoroacetic acid is added to the obtained oil and reacted at room temperature for 90 minutes. Concentrate the reaction solution under reduced pressure,
After adding ethyl ether to this and collecting the resulting precipitate by filtration,
The precipitate was suspended in water IQ, 500 ml of chloroform,
Adjust the pH to 7.3 with saturated sodium bicarbonate solution. After filtering the insoluble matter, the aqueous layer is adjusted to pH 2.7 with IN-hydrochloric acid, and the precipitate formed is collected by filtration, washed with water, and then dried to obtain the desired (Z)-4-
Methanesulfonyloxy-3-oxo-2-(1,5-
27.1 g of dibenzyloxy-4-pyridon-2-ylmethoxyimino)butyric acid are obtained.
1H−NMR(DMSO−d、、δ):3、23 (3
H,s) 、 5.02 (2H,s) 。1H-NMR (DMSO-d, δ): 3, 23 (3
H,s), 5.02 (2H,s).
6、27 (LH,s) 、 8.13 (LH,s)
参考例
(1)実施例で得られた(Z)−4−メタンスルホニル
オキシ−3−オキソ−2−(1,,5−ジベンジルオキ
シ−4−ピリドン−2−イルメトキシイミノ)酪酸10
.5gをジメチルアセトアミド200 m Qに溶解し
、1−ヒドロキシベンゾトリアゾール3.0gを加え、
−5℃に冷却する。これにジシクロへキシルカルボジイ
ミド3.C)gを加え0℃で2時間撹拌する。7−アミ
ノ−3−(1,2,3、−チアジアゾール)−5−イル
メチル−3−セフェム−4−カルボン酸 p−メトキシ
ベンジルエステル7゜8gを加え、5℃で20時間反応
する。不溶物を濾取し、濾液に酢酸エチル800mQを
加え、5%重曹水、水、飽和食塩水の順で洗浄する。6, 27 (LH, s), 8.13 (LH, s)
Reference Example (1) (Z)-4-methanesulfonyloxy-3-oxo-2-(1,,5-dibenzyloxy-4-pyridon-2-ylmethoxyimino)butyric acid 10 obtained in Example
.. Dissolve 5 g in 200 mQ of dimethylacetamide, add 3.0 g of 1-hydroxybenzotriazole,
Cool to -5°C. Add to this 3. dicyclohexylcarbodiimide. Add C)g and stir at 0°C for 2 hours. Add 7.8 g of 7-amino-3-(1,2,3,-thiadiazol)-5-ylmethyl-3-cephem-4-carboxylic acid p-methoxybenzyl ester, and react at 5° C. for 20 hours. Insoluble materials are collected by filtration, 800 mQ of ethyl acetate is added to the filtrate, and the mixture is washed with 5% sodium bicarbonate solution, water, and saturated brine in this order.
無水硫酸マグネシウムで乾燥後、減圧下濃縮する。残渣
をシリカゲルカラムクロマト(クロロフォルム:メタノ
ール=40:1)に付し、(6R,7R)−7−[(Z
)−4−メタンスルホニルオキシ−3−オキソ−2−(
1,5ジベンジルオキシ−4−ピリドン−2−イルメト
キシイミノ)アセタミドコー3− (1,2゜3−チア
ジアゾール−5−イルチオメチル)3−セフェム−4−
カルボン酸 P−メトキシベンジルエステル11.4g
を得る。After drying over anhydrous magnesium sulfate, it is concentrated under reduced pressure. The residue was subjected to silica gel column chromatography (chloroform:methanol=40:1) to give (6R,7R)-7-[(Z
)-4-methanesulfonyloxy-3-oxo-2-(
1,5dibenzyloxy-4-pyridon-2-ylmethoxyimino)acetamidoco3-(1,2゜3-thiadiazol-5-ylthiomethyl)3-cephem-4-
Carboxylic acid P-methoxybenzyl ester 11.4g
get.
”H−NMR(DMSO−d6.δ):3.16 (3
H,s)、3.82 (3H,s)。"H-NMR (DMSO-d6.δ): 3.16 (3
H,s), 3.82 (3H,s).
6.54 (LH,s)、8.40 (LH,5)(2
)上記(7)(6R,7R)−7−[(Z)−4−メタ
ンスルホニルオキシ−3−オキソ−2−(1,5−ジベ
ンジルオキシ−4−ピリドン2−イルメトキシイミノ)
アセタミド]−3(1,2,3−チアジアゾール−5−
イルチオメチル)−3−セフェム−4−カルボン酸p−
メトキシベンジルエステル1.36gをジメチルアセタ
ミド5.3mQに溶解し、チオ尿素129mgを溶解し
たメタノール溶液8mQを加える。室温で30分間撹拌
後、20時間放置する。反応液にエチルエーテル70m
flを加えるとガム状沈殿物が生成する。上澄液を除き
、さらにエチルエーテル40mQを添加し粉末とする。6.54 (LH, s), 8.40 (LH, 5) (2
) (7) (6R,7R)-7-[(Z)-4-methanesulfonyloxy-3-oxo-2-(1,5-dibenzyloxy-4-pyridon-2-ylmethoxyimino)
acetamide]-3(1,2,3-thiadiazole-5-
ylthiomethyl)-3-cephem-4-carboxylic acid p-
Dissolve 1.36 g of methoxybenzyl ester in 5.3 mQ of dimethylacetamide, and add 8 mQ of a methanol solution containing 129 mg of thiourea. After stirring at room temperature for 30 minutes, leave to stand for 20 hours. Add 70m of ethyl ether to the reaction solution.
A gummy precipitate forms when fl is added. The supernatant liquid is removed, and 40 mQ of ethyl ether is further added to form a powder.
これを濾取しエチルエーテルで洗浄後乾燥すると(6R
,7R)−7−[(Z)−2−(2−アミノチアゾール
−4−イル)−2(1,5−ジベンジルオキシ−4−ピ
リドン−2−イルメトキシイミノ)アセタミドコー3−
(l、2.3−チアジアゾール−5−イルチオメチル)
−3−セフェム−4−カルボン酸p−メトキシベンジル
エステル1.2gを得る。This was collected by filtration, washed with ethyl ether, and dried (6R
,7R)-7-[(Z)-2-(2-aminothiazol-4-yl)-2(1,5-dibenzyloxy-4-pyridon-2-ylmethoxyimino)acetamidoco3-
(l, 2,3-thiadiazol-5-ylthiomethyl)
1.2 g of -3-cephem-4-carboxylic acid p-methoxybenzyl ester are obtained.
”H−NMR(DMSO−d Glδ):3、’72
(3H,s) 、 6.72 (LH,s) 。"H-NMR (DMSO-d Glδ): 3, '72
(3H,s), 6.72 (LH,s).
7、23 (5H,s) 、 7.27 (5H,s)
8.32 (IH,5)
(3)塩化アルミニウム1.4gを氷冷したニトロメタ
ン3.0mQに加える。この溶液に上記で得られた(6
R,7R)−7−[(z)2−(2−アミノチアゾール
−4−イル)2−(1,5−ジベンジルオキシ−4−ピ
リドン−2−イルメトキシイミノ)アセタミド]3−
(1,2,3−チアジアゾール−5−イルチオメチル)
−3−セフェム−4−カルボン酸P−メトキシベンジル
エステル1.2gの塩化メチレン溶液、ついでアニソー
ルO,’7mQを滴下する。水冷下10分、ついで室温
下2時間撹拌する。反応後、反応液を氷冷したn−ブタ
ノール4.8mQ、メタノール1.2mQ、1N塩酸2
.4mQの混液に滴下する。この溶液に飽和食塩水2.
4.mflを少しずつ添加し静静置後分液する。水層n
−ブタノール4.8mQで抽出し、有機層をIN塩酸の
飽和食塩水4゜2mflで3回洗浄する。有機層に水4
.8mQを添加し、5%重曹水でpH3,1に調整する
。7, 23 (5H, s), 7.27 (5H, s)
8.32 (IH, 5) (3) Add 1.4 g of aluminum chloride to 3.0 mQ of ice-cooled nitromethane. This solution contains the above obtained (6
R,7R)-7-[(z)2-(2-aminothiazol-4-yl)2-(1,5-dibenzyloxy-4-pyridon-2-ylmethoxyimino)acetamide]3-
(1,2,3-thiadiazol-5-ylthiomethyl)
A solution of 1.2 g of -3-cephem-4-carboxylic acid P-methoxybenzyl ester in methylene chloride and then anisole O,'7mQ are added dropwise. Stir for 10 minutes under water cooling and then for 2 hours at room temperature. After the reaction, the reaction solution was ice-cooled with 4.8 mQ of n-butanol, 1.2 mQ of methanol, and 2 mQ of 1N hydrochloric acid.
.. Add dropwise to 4mQ of mixed solution. Add 2. saturated saline to this solution.
4. Add mfl little by little, leave to stand still, and then separate the liquids. water layer n
- Extract with 4.8 mQ of butanol and wash the organic layer three times with 4.2 mfl of saturated brine of IN hydrochloric acid. Add 4 liters of water to the organic layer
.. Add 8 mQ and adjust the pH to 3.1 with 5% aqueous sodium bicarbonate.
生成した析出物を濾取し、水ついで酢酸エチルで洗浄後
5%重曹水に溶解する。これをダイヤイオンHP−20
のカラムクロマトグラフィーに付し、20%メタノール
水溶液で溶出後、凍結v7:、燥し標題の化合物のジナ
トリウム塩0.6gを得る。The formed precipitate is collected by filtration, washed with water and then ethyl acetate, and then dissolved in 5% aqueous sodium bicarbonate. This is Diaion HP-20
The product was subjected to column chromatography, eluted with 20% methanol aqueous solution, frozen v7, and dried to obtain 0.6 g of the disodium salt of the title compound.
1H−NMR(DMS○−dGlδ):3、23 (2
H,ABq) 、 4.30 (2H,ABq) 。1H-NMR (DMS○-dGlδ): 3, 23 (2
H, ABq), 4.30 (2H, ABq).
4、、95 (LH,d、J=5Hz) 、 5.05
(2H,ABq) 。4,,95 (LH, d, J=5Hz), 5.05
(2H, ABq).
5、48 (LH,d、 J:5Hz) 、 6.39
(LH,s) 。5, 48 (LH, d, J: 5Hz), 6.39
(LH,s).
6、79 (LH,s) 、 7.36 (LH,s)
。6,79 (LH,s), 7.36 (LH,s)
.
8、93 (LH,s)
特許出願人 科研製薬株式会社
手続補正書(自発)
1、事件の表示
平成2年特許願第 205255 号郵便番号 +1
3
4、補正の対象
(1)明細書の「発明の詳細な説明Jの欄5、補正の内
容
(])明細書第7頁IO行の鴫2時間」を「24時(2
)明細書第15頁3行の「水層n−ブタノール」を「水
層をn−ブタノール」と訂正する。8, 93 (LH, s) Patent applicant Kaken Pharmaceutical Co., Ltd. Procedural amendment (voluntary) 1. Case description 1990 Patent Application No. 205255 Postal code +1
3 4. Subject of amendment (1) Change "2 hours of 2 hours in Column 5 of Detailed Description of the Invention J, Contents of Amendment (]) Line IO on page 7 of the specification" to "24 hours (2 hours)" in the specification.
) On page 15, line 3 of the specification, "n-butanol in the aqueous layer" is corrected to "n-butanol in the aqueous layer."
Claims (1)
もよいフェニル基を、R_1及びR_2はそれぞれ独立
して水素原子または水酸基の保護基を意味する。)で表
わされるピリドン化合物もしくはその反応性誘導体。(1) General formula: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [I] (In the formula, X is a lower alkyl group or a phenyl group that may have a substituent, and R_1 and R_2 are each independently A pyridone compound or a reactive derivative thereof, which means a protecting group for a hydrogen atom or a hydroxyl group.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2205255A JPH0491077A (en) | 1990-08-03 | 1990-08-03 | Pyridone compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2205255A JPH0491077A (en) | 1990-08-03 | 1990-08-03 | Pyridone compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0491077A true JPH0491077A (en) | 1992-03-24 |
Family
ID=16503961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2205255A Pending JPH0491077A (en) | 1990-08-03 | 1990-08-03 | Pyridone compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0491077A (en) |
-
1990
- 1990-08-03 JP JP2205255A patent/JPH0491077A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR930007418B1 (en) | Cephalosporin compounds and its process | |
EP0197409B1 (en) | Cephalosporin derivatives | |
CA1213883A (en) | Cephalosporin derivatives | |
GB1599722A (en) | Cephalosporin derivatives | |
JPS63146863A (en) | Carboxylic acids | |
KR870001986B1 (en) | Process for preparing cephalosporin derivatives | |
US5081116A (en) | Cephalosporin derivatives | |
US4866055A (en) | Cephalosporin derivatives and their crystalline derivatives | |
US4880798A (en) | Cephalosporin derivatives | |
US4840945A (en) | Cephalosporin derivatives | |
JPH0491077A (en) | Pyridone compound | |
JPS62167784A (en) | Novel cephalosporin derivative, production thereof and antimicrobial agent containing said derivative as active ingredient | |
JP2000515116A (en) | Novel cephalosporin derivative and method for producing the same | |
JPS61126088A (en) | Cephalosporin compound | |
GB2102423A (en) | Cephalosporin derivatives | |
KR0157589B1 (en) | Novel cephalosporin antibiotics and process for preparation thereof | |
CA1068260A (en) | 7-(alpha-furoylureidoaryl and cyclohexadieny-lacetamido) cephalosporin antibiotics | |
EP0359291A1 (en) | Cephalosporin derivatives | |
KR840002046B1 (en) | Process for preparing cepharosporins | |
JPS61126089A (en) | Cephalosporin derivative, production thereof, and antibacterial agent containing same | |
JPS6277392A (en) | Cephalosporin derivative, production thereof and antibacterial agent containing said derivative as active component | |
JPH0491088A (en) | Pyranone compound | |
JPS638387A (en) | Cephem compound | |
JPS6197288A (en) | Cephalosporin compound | |
JPS62161793A (en) | Novel cephalosporin derivative, production thereof and antibacterial agent containing said derivative as active component |