JPH0490511A - Liquid crystal element - Google Patents

Abstract

PURPOSE:To provide liquid crystal orientability which is uniform and is substantially free from defects by forming underlying thin films on the surface side to be formed with the oriented films of transparent electrodes. CONSTITUTION:The liquid crystal element consisting of one electrode body 2 consisting of a glass substrate 5, the transparent electrode 6 formed on this glass substrate 5 and an LB film formed on the surface of this transparent electrode 6, another electrode body 9 consisting of a glass substrate 5, the transparent electrode 9 formed on this glass substrate 5 and an LB film formed on the surface of the transparent electrode 9 and a liquid crystal 4 disposed between these electrode bodies 2 and 3 is formed with the underlying thin films 7 on the surface sides of the transparent electrodes 6, 9 where the oriented films 9 are formed. The underlying thin films 7 have hydrophilic groups of >=500Angstrom and <=10mum thickness on the surfaces and further, have heat resistance of >=3 hours at 150 deg.C. The underlying thin films 7 are preferably formed by using a high-polymer material having the hydrophilic groups on the surface, for example, the material expressed by formula. In the formula, R<6>, R<8> are respectively quadrivalent and bivalent groups having at least 2 pieces of carbon atoms.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a liquid crystal element having a thin underlayer film between a transparent electrode and an LB film.

[Prior Art] In recent years, flat displays using liquid crystal elements have become widely used as display media for watches, televisions, and the like.

FIG. 2 is a schematic cross-sectional view of such a conventional liquid crystal element 00).

This liquid crystal element (10) has an electrode body (
Ill, (liquid crystal OZ filled between Ill and electrode bodies (II), (ll)).

The electrode body Q11 consists of a glass substrate and a transparent electrode (141) formed on the glass substrate 03).

On the surface of this glass substrate on the color and/or transparent electrode side, an alignment film layer is formed which has been surface-treated by a physical or physicochemical method in order to make the molecular alignment of the liquid crystal uniform.

Examples of physical methods include oblique evaporation methods such as 5i02 and ^U, and rubbing methods; examples of physicochemical methods include a method of applying a polyimide resin and then performing a rubbing treatment.

However, the oblique evaporation method is very advantageous in giving a predetermined pretilt angle to the liquid crystal, and on the other hand, since it is a vacuum evaporation method, a high vacuum of about 10-5 torr is required, and the glass substrate must be tilted. Therefore, it has the disadvantage of poor mass productivity.

Furthermore, the rubbing method has the disadvantage that productivity and quality deteriorate due to dust and static electricity generated during rubbing.

In view of the problems of the prior art, the present applicant proposed that the alignment film be
A liquid crystal element composed of B film has already been proposed (Patent Application No. 1999).
-189137).

[Problems to be Solved by the Invention] However, the LB film takes time to form and is thin. Therefore, amorphous silicon TPT
If this method is applied to a part where the electrode part has a step difference of several thousand to several times less, such as a substrate on which a thin film transistor (thin film transistor) is formed, there is a risk of insulation failure. To avoid this, it is necessary to stack the layers many times. As a result, film formation takes time,
This is unfavorable in terms of process and cost.

The present invention was made in view of the problems of the prior art, and it is an object of the present invention to provide a liquid crystal element that exhibits uniform liquid crystal orientation with almost no defects even if it is an LB film of several layers. do.

In addition, the present invention is applicable to a substrate on which an amorphous silicon TPT (thin film transistor) is formed, in which the electrode portion is made up of several thousand people.
Another object of the present invention is to provide a liquid crystal element that is free from alignment defects at the step portion even if it has a step difference of several I.

A further object of the present invention is to provide a liquid crystal element that is free from insulation defects even when a gap of about two glass substrates is required, such as in a strong electric field liquid crystal element.

[Means for Solving the Problems] The liquid crystal element of the present invention includes one electrode body consisting of a glass substrate, a transparent electrode formed on the glass substrate, and an LB film formed on the surface of the transparent electrode. , a glass substrate, another electrode body consisting of a transparent electrode formed on the glass substrate and an LB film formed on the surface of the transparent electrode, and a liquid crystal disposed between the two electrode bodies. The liquid crystal element is characterized in that a thin underlayer film is formed on the side of the transparent electrode on which the alignment film is formed.

[Function and Examples] Hereinafter, the present invention will be explained based on the drawings.

FIG. 1 is a schematic cross-sectional view of one embodiment of the liquid crystal element of the present invention.

In FIG. 1, (1) is a liquid crystal element, (2 is one electrode body, (3) is the other electrode body, and (4) is a liquid crystal.

The electrode body (2) includes a glass substrate (5), a transparent electrode (6) formed on the glass substrate, a base layer thin film ('7) formed on this transparent electrode (6), and this base layer. Thin film (7)
It consists of an alignment film (8) formed on top of the alignment film (8).

The electrode body (3) includes a glass substrate (5), a transparent electrode (9) formed on the glass substrate, a thin base layer film (7) formed on the transparent electrode (9), and a thin base layer film (7) formed on the transparent electrode (9). 1 and an alignment film (8) formed on top of the alignment film (8).

ITO, 5n02, etc. are used for the transparent electrodes (6) and (9).

The alignment film (8) is formed of an LB film.

The LB film in the present invention has the general formula (■): (wherein, R1
is a tetravalent group having at least 2 carbon atoms, R2
is a divalent group having at least 2 carbon atoms, R3
, R4, R5 and R6 are aliphatic, cycloaliphatic or aromatic (these may be combined with each other) monovalent groups having 1 to 30 carbon atoms (these groups are halogen atoms, nitro groups, (optionally substituted with an amino group, cyano group, methoxy group, or acetoxy group) or a hydrogen atom. Furthermore, at least one of R3, R4, R5, and R6 is an aliphatic, cycloaliphatic, or aromatic (these may be combined with each other) monovalent group having 12 to 30 carbon atoms. The group may be substituted with a halogen atom, a nitro group, an amino group, a cyano group, a methoxy group, or an acetoxy group. It is formed by laminating one layer of monomolecular film and then subjecting it to appropriate heat treatment. The number of laminations is preferably about 1 to 10 times.

Note that the heat treatment mentioned here is for causing a cyclization reaction in the material represented by the general formula fI), and the alignment film material decomposes at a temperature higher than that applied during the liquid crystal element assembly process after the alignment film is formed. It is a heat treatment at a temperature below temperature, specifically 150 to 450°C, preferably 150 to 250°C.
It is a heat treatment at a temperature of ℃.

The LB film formed in this way has the ability to control the alignment of liquid crystals to the same extent as a treatment layer (alignment film) formed by subjecting a glass substrate to conventional physical or physicochemical treatment. are doing.

The LB film referred to in this specification is a monomolecular film formed on a water surface and laminated on an arbitrary substrate. Methods for laminating monomolecular films include vertical dipping method (LB method), horizontal Examples include the adhesion method and the rotating cylinder method. Among these, the vertical dipping method, which causes fluid orientation of the monomolecular film during lamination, is particularly preferred.

An amphiphilic polymeric substance having a repeating unit represented by general formula (I) 2 can be made into a monomolecular film by being spread on a water surface, and this can be formed into a monomolecular film on the substrate on which at least an electrode is formed. It is a molecular film that can be laminated with one or more layers, preferably about 1 to 10 layers, and the laminated layer can be heat-treated to form a polyimide having a repeating unit represented by the general formula (I): Its number average molecular weight is
2000-3(1(1000, preferably 2000-3
It is 0000.

If the number average molecular weight is out of the range of 2000 to 30 HOO, there will be problems such as the strength of the LB film being too low or the viscosity being too high, making it difficult to produce the LB film.

Moreover, R1 in general formula (I) is at least two,
It is preferably a tetravalent group containing 5 to 20 carbon atoms, and may be an aromatic group or a cycloaliphatic group, and an aromatic group and an aliphatic group may be used. Furthermore, these groups may be an aliphatic group having 1 to 3 a carbon atoms, a cycloaliphatic group, or a group in which an aromatic group and an aliphatic group are bonded. The group is a monovalent group such as a halogen atom, a nitro group, an amino group, a cyano group, a methoxy group, an acetoxy group, or the monovalent group is -0--
COO--NHCO-1-CO-1-S--C8S--
It may also be a group substituted with a bonded group such as NHO2-1-CS- to become a derivative. However, it is preferred that R1 be a group characterized by benzenoid unsaturation having at least 6 carbon atoms from the viewpoint of heat resistance, chemical resistance, mechanical properties, and the like.

Specific examples of R1 as described above include, for example, the four bonds of R1, ie, the repeating unit represented by the general formula [1].

The term "benzenoid unsaturation" as used herein is a term used in contrast to a quinoid structure regarding the structure of a carbocyclic compound, and refers to a structure having the same shape as a carbocyclic ring contained in ordinary aromatic compounds.

There is no limit to the position of the bonding hand of the benzenoid unsaturation in the p-quinoid structure, but if two of each of the four bonding hands are present on two adjacent carbon atoms constituting R1, It is preferable because a 5-membered ring is easily formed when polyimidizing a film formed using an amphoteric polyimide precursor, making it easy to imidize.

R2 in general formula (1) is a divalent group containing at least two carbon atoms, and may be an aromatic group, an aliphatic group, or a cycloaliphatic group. It may be a group in which an aromatic group and an aliphatic group are bonded, and furthermore, these divalent groups may have a carbon number of 1 to 3.
0 aliphatic group, a cycloaliphatic group, or a group in which an aromatic group and an aliphatic group are bonded, and these groups are halogen atoms, nitro groups, amino groups, cyano groups, methoxy groups, acetoxy groups, etc. or these monovalent groups, -0--COO--NIICO-1-CO-1-3-
It may also be a group substituted with a group bonded to -C9S--NHCS-1-C3- or the like.

However, when R2 is a group characterized by benzenoid unsaturation having at least 6 carbon atoms, it is preferable from the viewpoint of heat resistance, chemical resistance, mechanical properties, etc.

Preferred specific examples of R2 as described above include, for example, F3 F3 (RIO and 17+1 both have 1 to 30 carbon atoms)
(alkyl or aryl group).

R3, R4, R5, and R6 in the general formula +1+ are all monovalent aliphatic groups having 1 to 30 carbon atoms, preferably 1 to 22 carbon atoms, monovalent cycloaliphatic groups, aromatic groups, and aliphatic groups. A monovalent group bonded to a group group, a group substituted with a halogen atom, a nitro group, an amino group, a cyano group, a methoxy group, an acetoxy group, etc. to become a derivative of those groups, or a hydrogen atom. . In addition, in general formula [I], R'
, R4, R5 and R6 are all general 2■: CI+3(CH□≠-(CI+3)2 CH(CIlz
←−−n−1・n−3)(
In the formula, R1 and R2 are the same as above) It is a group introduced in order to impart hydrophobicity to the polyamic acid unit and obtain a stable condensed film, and among R', R', R5, and R6, If at least one of the groups is the above-mentioned group having 12 to 30 carbon atoms, preferably 16 to 22 carbon atoms, a stable condensed film is formed on the water surface, which is formed by the Langmian-Prodgett method (hereinafter referred to as the LB method). ) is required to be deposited on a glass substrate with thin film electrodes.

Specific examples of R3, R4, R5, and R6 other than hydrogen atoms include, for example, (all of the above n are 12 to 30, preferably 18 to 2
2) etc. However, in order to achieve the purpose of the present invention, it is most desirable to use a straight chain alkyl group represented by 0113 (C112) in terms of performance and cost. The aforementioned /XX rosin group, nitro group, amino group, cyano group, methoxy group, acetoxy group, etc. are not essential. However, since fluorine atoms dramatically improve hydrophobicity compared to hydrogen atoms, it is preferable to use those containing fluorine atoms.

Although there are no particular limitations on the method for producing the LB film, a method in which flow orientation occurs during accumulation is desirable, and a vertical dipping method is one of the preferred embodiments.

At this time, known Langmuir-Prodgett membrane materials such as long-chain fatty acids and long-chain alcohols, and polymer LB membrane materials previously proposed by the present applicant in JP-A-63-218728 are used. You may.

It is also a desirable embodiment of the present invention to perform surface treatment on the glass substrate on which the electrodes are formed before depositing the LB film.

Further, the underlayer thin film used in the present invention has a thickness of 500 Å.
It has 100,000 or less hydrophobic groups or hydrophilic groups on its surface, preferably hydrophilic groups on its surface, and has heat resistance at 150° C. for 3 hours or more. Examples of hydrophobic groups include alkyl groups and unsaturated hydrocarbon groups,
Both straight-chain and branched ones are suitable. Furthermore, fused polycyclic phenyl groups such as phenyl, naphthyl, anthranyl,
chain-striated polycyclic phenyl groups such as biphenyl and terphenyl;
Various groups containing a fluorine atom can be mentioned. These may be used alone or in combination. Examples of hydrophilic groups include ester, imide, and amide bonds, carbonyl groups, and hydroxyl groups contained in sulfonic acids, phosphoric acids, carboxylic acids, and aldehydes. These may be used alone or in combination. Furthermore, the surface of an oxide film such as silicon oxide is also a good example of a hydrophilic group if hydroxyl groups are present due to moisture in the air.

Specific examples of base layer thin film materials include silicon oxide, polydiacetylene, polyester, polyimide, polyamide,
These include metal oxides and silicon nitride. Furthermore, the more similar the skeletons of the base layer thin film material and the amphiphilic substance forming the LB film are, the easier it is to form an LB film having desirable characteristics as an alignment film. When using an LB film made of an amphiphilic polymer material that can be converted into a polymer material having the same structure as that of the polymer material of the underlayer thin film through heat treatment, the LB film and the underlayer thin film have favorable characteristics as an alignment film. This improves adhesion with the LB film, making it easier to form the LB film.

By using the LB film as an alignment film as described above, it is possible to form an alignment film that is uniform, defect-free, and has good alignment without performing any treatment such as rubbing. Furthermore, even if the number of layers of LB films, which have the ability to orient liquid crystals, is laminated on a substrate, it is possible to stack several thousand to several layers, such as on a glass substrate on which an amorphous St thin film transistor (TPT) is formed. Even if there is a regular step difference, it is possible to prevent alignment defects at the step portion.

Furthermore, it is possible to prevent poor insulation of the liquid crystal element even in cases where a gap between the glass substrates of about 2 mm is required, such as in the case of a ferroelectric liquid crystal element.

The liquid crystal element of the present invention is not particularly different from the liquid crystal element disclosed in Japanese Patent Application No. 1-189137, except that a thin underlayer film is formed on the transparent electrode.

Next, the liquid crystal element of the present invention will be explained in detail with reference to Examples, but the present invention is not limited to these Examples.

Example 1 A silicon oxide film with a thickness of 2,000 yen was formed by CVD on a glass substrate on which an amorphous 5i TFT having a height difference of about I was formed, and on a glass substrate on which ITO and a black matrix were formed. Furthermore, the above 2
A polyimide precursor (molecular fi: about 4,000) having a unit of the following formula obtained by reacting the acid chloride of pyromellitic acid distearyl ester and paraphenylene diamine was placed on a seed glass substrate by the LB method. The layers were stacked and heat treated at 200° C. for 1 hour to produce an electrode body. Through this heat treatment, the polyimide precursor partially became a polyimide having units as shown in the following formula, and the LB film came to have very good chemical resistance and heat resistance.

The two types of electrode bodies described above are prepared, a liquid crystal element is constructed such that the pulling directions of the glass substrates during the formation of the LB film on the two electrode bodies are perpendicular to each other, and the transparent electrode layer of the one electrode body is As a sealing resin on the edge of the formed surface, apply acid anhydride-curing epoxy resin in which 8 plastic beads in diameter are dispersed, leaving a 5 mm length in the center of one side, and 1 width around the entire other circumference. After printing, pressure was applied with the other electrode facing each other, and heating was performed at 140° C. for 3 hours to cure and bond. After adhesion, nematic liquid crystal (manufactured by Merck & Co., trade name: ZL11565) was injected from the opening under reduced pressure. After the injection, the opening was fixed with a commercially available acid anhydride-curing epoxy resin to seal the liquid crystal, completing a TN-type liquid crystal element. By heating the completed liquid crystal device to 100° C. and then gradually cooling it for initial alignment, a uniform, defect-free, and well-aligned liquid crystal device was obtained.

Example 2 A polyester thin film (molecular weight:

(approximately 100,000) was formed with a film thickness of approximately 2 mm.

Furthermore, five layers of the same LB film as in Example 1 were accumulated on these glass substrates by the LB method, and heat treated at 200° C. for 1 hour to produce an electrode body. A liquid crystal device was then completed in the same manner as in Example 1. Once the completed liquid crystal element
By heating to 0° C. and then gradually cooling for initial alignment, a uniform, defect-free, and well-aligned liquid crystal element was obtained.

Example 3 Pyromellitic anhydride and 4,4-diaminodiphenyl ether were reacted on a glass substrate on which an amorphous 5iTFT with a step height of about 1 μm was formed and on a glass substrate on which ITO and a black matrix were formed. An N,N-dimethylformamide solution of a polyimide precursor (molecular weight, approximately 100.000) having a unit of the following formula, which can be obtained, was coated by a spin cord method and heated at 400°C for 1
Heat treated for hours. As a result of this heat treatment, the polymer thin film was formed into a polyimide having units represented by the following formula.The film thickness of the polyimide thin film was 2I on the glass substrate on which ITO and black matrix were formed. Moreover, the film thickness on the other glass substrate was also 2 terms.

Furthermore, a polyimide precursor (molecule M: about 5.000) having a unit of the following formula obtained by reacting the acid chloride of pyromellitic acid distearyl ester and diaminoanthraquinone on the two types of glass substrates was prepared using the LB method. Thus, five layers were accumulated and heat treated at 200° C. for 1 hour to produce an electrode body. Through this heat treatment, the polyimide precursor partially became a polyimide having units as shown in the following formula, and the LB film came to have very good chemical resistance and heat resistance.

The two types of electrode bodies described above are prepared, and a liquid crystal element is constructed such that the pulling directions of the glass substrates during the formation of the LB film on these two glass substrates are perpendicular to each other, and the transparent electrode layer of one electrode body is As a sealing resin, apply an acid anhydride-curing epoxy resin containing plastic beads with a diameter of 8JA to the edge of the formed surface, leaving a 5-square length in the center of one side, and 1 mm width on the entire other circumference. After printing, the other electrode was pressed against the other electrode and heated at 140° C. for 3 hours to cure and bond. After adhesion, nematic liquid crystal (manufactured by Merck & Co., trade name: ZL12701) was injected from the opening under reduced pressure. After injection, the opening was fixed with a commercially available acid anhydride-curable epoxy resin to seal the liquid crystal, completing a TN-type liquid crystal element. By heating the completed liquid crystal element to 100°C and then gradually cooling it to achieve initial alignment,
A uniform, defect-free, and well-aligned liquid crystal element was obtained.

Example 4 ITO was vacuum-deposited to a thickness of 200 nm on one side of a glass substrate using a patterned mask. Then,
A silicon oxide film was formed as an insulating film on the ITO electrode to a thickness of 100 nI11 using a vacuum evaporation method. On the other hand, an N,N-dimethylformamide solution of a polyimide precursor (molecular weight: approximately 50,000) having a unit of the following formula obtained by reacting pyromellitic anhydride and para-phenylene diamine was used to determine the thickness of the polyimide thin film. There were two letters.

Furthermore, a polyimide precursor (molecular weight: about 4,
000) was applied onto the above-mentioned ITO-deposited glass substrate by a spin code method, and heat-treated at 400° C. for 1 hour. Through this heat treatment, the polymer thin film became polyimide having units shown in the following formula.

Three layers were accumulated by the LB method and heat treated at 400° C. for 1 hour to produce an electrode body. By this heat treatment, the polyimide precursor completely became a polyimide having units as shown in the following formula, and the LB film came to have very good chemical resistance and heat resistance.

Prepare two electrode bodies produced in the same manner as above,
The liquid crystal element is constructed so that the pulling directions of the glass substrates during the formation of the LB film on these two electrode bodies are antiparallel to each other, and a sealing resin is applied to the edge of the surface on which the transparent electrode layer of one electrode body is formed. As an example, acid anhydride-curing epoxy resin in which plastic beads with a diameter of 2 mm are dispersed is printed with a width of 1 m11 on the entire circumference, leaving a length of 5 cm in the center of one side, and then printing on the other transparent side. Apply pressure with the electrodes facing each other, and
The adhesive was cured by heating at 40° C. for 3 hours. After adhesion, ferroelectric liquid crystal (manufactured by Merck & Co., trade name: ZLI3489) was injected from the opening under reduced pressure. After injection, the opening was fixed with a commercially available acid anhydride-curable epoxy resin to seal the liquid crystal and complete a ferroelectric liquid crystal element. By heating the completed liquid crystal cell to 100° C. and then gradually cooling it for initial alignment, a liquid crystal element that was uniform, defect-free, and in a good alignment state was obtained. Furthermore, no insulation defects occurred, and good bistability was obtained.

Example 5 A silicon nitride film with a thickness of 2000 μm was formed by CVD on a glass substrate on which an amorphous 5i TFT with a step height of about II was formed, and on a glass substrate on which ITO and black matrix were formed. A TN type liquid crystal cell using the LB film as an alignment film was produced in the same manner as in Example 1. The TN type liquid crystal cell obtained in this example also had a uniform, defect-free, and good liquid crystal alignment state without any rubbing treatment.

Example 6 An aluminum oxide film with a thickness of 2,000 yen was formed by sputtering on a glass substrate formed with amorphous S+TPT having a step difference of about 1- and on a glass substrate formed with ITO and a black matrix. Example 1
A TN type liquid crystal cell using the LB film as the alignment film was manufactured in the same manner as described above. The TN type liquid crystal cell obtained in this example also had a uniform, defect-free, and good liquid crystal alignment state without any rubbing treatment.

Example 7 A titanium oxide film with a thickness of 2000 mm was formed by CVD on a glass substrate on which an amorphous 5iTFT with a step of about 1 inch was formed, and on a glass substrate on which ITO and a black matrix were formed. A TN type liquid crystal cell using the LB film as an alignment film was produced in the same manner as in Example 1.

The TN type liquid crystal cell obtained in this example also had a uniform, defect-free, and good liquid crystal alignment state without any rubbing treatment.

Example 8 Tantalum oxide with a thickness of 2,000 mm was formed by sputtering on a glass substrate on which amorphous 5iTPT was formed and on which ITO and black matrix were formed, and the process was carried out. A TN type liquid crystal cell was prepared in the same manner as in Example 1 using the IB film as the alignment film. The TN type liquid crystal cell obtained in this example also had a uniform, defect-free and good liquid crystal alignment state without any rubbing treatment.

Comparative Example A glass substrate with a thickness of 1000 μm was formed on a glass substrate on which amorphous 5jTPT with a step height of about 1 uIIl was formed, and on a glass substrate on which ITO and a black matrix were formed.
Made of Japanese synthetic rubber polyimide (Optomer AL-1)
251) A TN type liquid crystal cell was manufactured using a polyimide thin film formed by forming a thin film and subjecting the polyimide thin film to a rubbing treatment.

T obtained in Examples 1 to 8 and Comparative Example
The contrast of an N-type liquid crystal element was measured using static driving. The results are shown in Table 1.

Table 1 [Effects of the Invention] As explained above, according to the present invention, it is possible to produce a liquid crystal element that exhibits uniform liquid crystal orientation with almost no defects even if the surface of the electrode body is not treated by a rubbing method. You can wander around.

Further, according to the present invention, even if the substrate has a step difference of several thousand to several degrees, it is possible to move the liquid crystal element without alignment defects at the step portion of the substrate.

Furthermore, according to the present invention, two
Even if a uniform spacing between glass substrates is required, a liquid crystal element without insulation defects can be obtained.

From Table 1, it can be seen that the TN-type liquid crystal devices in which the number of laminations of the LB film was reduced by using the underlayer thin films of Examples 1 to 8 have the same characteristics as the TN-type liquid crystal devices using the rubbing method (comparative example). I understand that.

[Brief explanation of the drawing]

FIG. 1 is a schematic cross-sectional view of one embodiment of the liquid crystal element of the present invention, and FIG.
The figure is a schematic cross-sectional view of a conventional liquid crystal element. (Main symbols in the drawing) (1): Liquid crystal element (2), (3): Electrode body (4) Liquid crystal (7), Underlayer thin film

Claims (1)

[Claims] 1. One electrode body consisting of a glass substrate, a transparent electrode formed on the glass substrate, and an LB film formed on the surface of the transparent electrode; A liquid crystal element comprising: the other electrode body comprising a formed transparent electrode and an LB film formed on the surface of the transparent electrode; and a liquid crystal disposed between the two electrode bodies, the liquid crystal element comprising: A liquid crystal element characterized in that a thin underlayer film is formed on the side on which an alignment film of an electrode is formed. 2. The liquid crystal element according to claim 1, wherein the underlayer thin film has a hydrophilic group on the surface with a thickness of 500 Å or more and 10 μm or more, and further has heat resistance at 150° C. for 3 hours or more. 3. The liquid crystal element according to claim 1, wherein the underlayer thin film is formed using a polymeric substance having a hydrophilic group on its surface. 4 The underlayer thin film has the general formula (III): ▲There are mathematical formulas, chemical formulas, tables, etc.▼(III) (In the formula, R^7 is 4 having at least 2 carbon atoms.
A valent group, R^8, has at least 2 carbon atoms.
2. The liquid crystal element according to claim 1, comprising a polymeric substance represented by the following formula. 5. A monomolecular film of an amphipathic polymeric material that can be converted into a polymeric material having the same structure as the polymeric material used as the underlying layer thin film by heat treatment is laminated on the underlying layer thin film. The liquid crystal element according to claim 1, comprising: 6. The liquid crystal element according to claim 1, wherein the underlayer thin film is made of SiO_2. 7. Claim 1, wherein the base layer thin film is made of Si_3N_4.
The liquid crystal element described. 8. The liquid crystal element according to claim 1, wherein the underlayer thin film is made of a metal oxide. 9. The liquid crystal device according to claim 8, wherein the metal oxide is Al_2O_3. 10 Claim 8 wherein the metal oxide is Ta_2O_5
The liquid crystal element described. 11. The liquid crystal device according to claim 8, wherein the metal oxide is TiO_2.