JPH0489440A - Chlorination reactor - Google Patents

Chlorination reactor

Info

Publication number
JPH0489440A
JPH0489440A JP2204548A JP20454890A JPH0489440A JP H0489440 A JPH0489440 A JP H0489440A JP 2204548 A JP2204548 A JP 2204548A JP 20454890 A JP20454890 A JP 20454890A JP H0489440 A JPH0489440 A JP H0489440A
Authority
JP
Japan
Prior art keywords
liquid
pipe
board
plate
pipes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2204548A
Other languages
Japanese (ja)
Other versions
JPH085821B2 (en
Inventor
Hiromitsu Nojima
能島 弘充
Yoshihiro Oki
大木 善博
Toshio Mori
敏夫 森
Akishi Kudo
工藤 晃史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2204548A priority Critical patent/JPH085821B2/en
Publication of JPH0489440A publication Critical patent/JPH0489440A/en
Publication of JPH085821B2 publication Critical patent/JPH085821B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/10Process efficiency

Abstract

PURPOSE:To obtain a chlorination reactor of wetted wall type efficiently performing chlorinating reaction by using a multi-piped heat exchanger-like wetted wall, comprising many pieces of heat-conduction pipes having small diameter, flowing down a liquid film by uniformly introducing raw material solution into every pipes and uniformly introducing chlorine gas flow in parallel. CONSTITUTION:The objective compact chlorination reactor 1 having a large area forming a wetted wall is composed of a cylindrical body part 2 having an introducing pipe 3 and a discharging pipe 4 of a cooling medium at upper and lower parts on the outer face and having an upper part of an upper pipe board 5 and a lower part of a lower part board 6 connected together through many vertical heat-conduction pipes 7 fitted between the horizontal upper pipe board 5 and the lower pipe board 6, a lower cover 13 covering the lower pipe board 5 and an upper cover 25 covering the upper pipe board 5 having sealed upper part and divided into two parts comprising a lower liquid storing part 22 and an upper gas storing part 23. Dividing pipes 28 are installed at extended positions of the heat-conduction pipes 7 on the upper face of the upper pipe board 5 and liquid holes 32 are pierced in the vicinities of upper face in said upper pipe board 5. Top ends of the dividing pipes are opposed to current board holes 31 having orifice parts 30. Thus, chlorination reaction generating a large amount of heat is efficiently performed at a relatively low temperature.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、例えばアリルアルコールを塩酸水溶液中で塩
素と反応させ2・3−ジクロルプロパツールを生成させ
るような塩素化反応を効率よく行なう濡壁式の塩素化反
応器に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention efficiently performs a chlorination reaction in which, for example, allyl alcohol is reacted with chlorine in an aqueous hydrochloric acid solution to produce 2,3-dichloropropanol. This invention relates to a wet wall type chlorination reactor.

[従来の技術] 従来、塩素化反応は、攪拌機および冷却器を有する種型
反応器に有機冷媒、或いは塩酸水溶液を入れ、これに被
塩素化有機物を溶解し、攪拌、冷却しながら塩素を吸込
んで反応させている。しかし、一般に塩素化反応は、反
応熱の高い反応であるにも拘わらず、反応温度は比較的
低いことが要求される。そのため、上記方式では、伝熱
面積が充分にとれず、また冷却負荷を工業的に実用範囲
に止めようとすると、必然的に反応時間が長くなる。反
応時間が長くなると生産効率が低下し、また反応の種類
によっては、副生物が多くなる等の不都合を生ずる。
[Prior art] Conventionally, in a chlorination reaction, an organic refrigerant or an aqueous hydrochloric acid solution is placed in a seed reactor equipped with a stirrer and a cooler, the organic substance to be chlorinated is dissolved therein, and chlorine is sucked in while stirring and cooling. I'm making it react. However, although the chlorination reaction is generally a reaction with high reaction heat, it is required that the reaction temperature be relatively low. Therefore, in the above method, a sufficient heat transfer area cannot be obtained, and if the cooling load is to be kept within an industrially practical range, the reaction time will inevitably become longer. As the reaction time becomes longer, the production efficiency decreases, and depending on the type of reaction, there may be other inconveniences such as increased production of by-products.

そのため、管状の塔の上部から、内壁或いは外壁に原料
液を薄膜状に流下させ、同時に塔の下部または上部より
塩素を導入して向流または並流で接触反応させる濡壁式
の塩素化反応器が使用されるようになった。
Therefore, a wet-wall type chlorination reaction is performed in which the raw material liquid is allowed to flow down in a thin film form from the top of a tubular column onto the inner or outer wall, and at the same time chlorine is introduced from the bottom or top of the column to carry out a contact reaction in countercurrent or cocurrent. utensils are now in use.

[発明が解決しようとする課題] しかしながら、塩素化は非常に速い反応であって、塔上
部での局部反応を抑制することが求められ、又濡壁式反
応器は壁面を流下する液膜の厚さを薄くしなければなら
ないため、反応処理量を増大するには、濡壁塔の径を大
きくして、液の流下面積を拡大しなければならず、−本
当たりの濡壁面積は大きくなるが、設置面積当たりの濡
壁面積は小さくなる不都合を生ずる。
[Problems to be solved by the invention] However, chlorination is a very fast reaction, and it is necessary to suppress local reactions at the top of the column. Since the thickness must be made thinner, in order to increase the reaction throughput, the diameter of the wetted wall column must be increased to expand the area through which the liquid flows, and - the wetted wall area per column is large. However, this results in the disadvantage that the wetted wall area per installation area becomes smaller.

本発明者らは、上記の問題を解決すべく、鋭意検討した
結果、多管式熱交換器状の濡壁を用い、管外部に冷媒を
流して冷却し、管内部に均一に反応液および塩素を分配
導入することができれば、効率よく低い反応温度でかつ
高い冷却能力を持つ装置で塩素化反応が行なわれると考
えた。
In order to solve the above problem, the present inventors conducted extensive research and found that by using wet walls in the form of a multi-tubular heat exchanger and cooling the refrigerant by flowing it outside the tubes, the reaction liquid and the inside of the tubes were uniformly distributed. We believed that if chlorine could be introduced in a distributed manner, the chlorination reaction could be carried out efficiently at a low reaction temperature and in an apparatus with high cooling capacity.

本発明は上記の考えに基づいてなされたもので、コンパ
クトで、効率よく反応生成物が得られる塩素化反応器を
提供することを目的とする。
The present invention was made based on the above idea, and an object of the present invention is to provide a chlorination reactor that is compact and capable of efficiently producing reaction products.

[課題を解決するための手段] 上記の目的を達成するため、本発明の塩素化反応器は 
冷媒の導入管および導出管が外面上下に設けられ、水平
な下管板および下管板か設けられ、これら上管板および
下管板の間には多数の垂直な伝熱管が取付けられ、前記
伝熱管を介して、前記上管板の上部および下管板の下部
が連通されている筒状の胴部と、 導出入管が取付られている、前記胴部の下管板を覆う下
カバーと、 水平な整流板によって、液導入管を有する下部の液貯留
部およびガス導入管を有する上部のガス貯留部に2分割
され、上部が密閉されている前記上管板を覆う上カバー
とを有し、前記上管板上面には、伝熱管の延長上にそれ
ぞれ位置する分配管が取付けられ、これら分配管の前記
上管板の上面近傍には液孔が穿設され、前記分配管の先
端は、前記整流板に近接し、かつ整流板に穿設された、
オリフィス部を有する整流板孔とそれぞれ対向している
[Means for Solving the Problem] In order to achieve the above object, the chlorination reactor of the present invention has the following features:
Refrigerant inlet and outlet pipes are provided above and below the outer surface, a horizontal lower tube plate and a lower tube plate are provided, and a number of vertical heat exchanger tubes are installed between the upper tube plate and the lower tube plate, and the heat exchanger tubes are connected to each other. a cylindrical body part through which the upper part of the upper tube plate and the lower part of the lower tube plate are connected; a lower cover covering the lower tube plate of the body part to which an inlet/outlet pipe is attached; and a horizontal part. an upper cover that covers the upper tube plate, which is divided into two by a rectifying plate into a lower liquid storage part having a liquid introduction pipe and an upper gas storage part having a gas introduction pipe, and the upper part of which is sealed; Distribution pipes located on the extensions of the heat transfer tubes are attached to the upper surface of the upper tube plate, liquid holes are bored in the vicinity of the upper surface of the upper tube plate of these distribution pipes, and the tips of the distribution pipes are close to the current plate and bored in the current plate;
They each face a rectifying plate hole having an orifice portion.

[作  用] 本発明の塩素化反応器は上記の構成となっているので、
 塩素ガスは、ガス貯留部に一定の圧で保持され、整流
板孔に設けられたオリフィスを通って、伝熱管に供給さ
れるので、それぞれの伝熱管に供給される塩素量は均一
となる。
[Function] Since the chlorination reactor of the present invention has the above configuration,
The chlorine gas is held at a constant pressure in the gas reservoir and is supplied to the heat exchanger tubes through orifices provided in the rectifier plate holes, so the amount of chlorine supplied to each heat exchanger tube becomes uniform.

また、反応液は、一定の液深に保持された液貯留部から
液孔を介して分配管に導入され、かつ、分配管先端と整
流板下面には間隙が設けられているので、内外ヘッド差
は一定となり、液はそれぞれの分配管に均一に導入され
る。しかも、前記オリフィス部を通って分配管に吹込ま
れる塩素は、エジェクタ作用を有するので塩素が間隙よ
り液貯留部に流入することが殆どない。
In addition, the reaction liquid is introduced into the distribution pipe from the liquid storage part maintained at a constant liquid depth through the liquid hole, and there is a gap between the tip of the distribution pipe and the lower surface of the rectifying plate, so that the inner and outer heads The difference remains constant and the liquid is uniformly introduced into each distribution pipe. Furthermore, the chlorine blown into the distribution pipe through the orifice has an ejector action, so that almost no chlorine flows into the liquid reservoir from the gap.

[実施例] 本発明の塩素化反応器は、腐食性の高い原料か使用され
るため、耐腐食性の材料を用いなければならない。その
ため、装置には、合成塩酸等の装置材料として広く使用
されている炭素材(カーベイト)或いは硝子ライニング
材等が用いられる。
[Example] Since highly corrosive raw materials are used in the chlorination reactor of the present invention, corrosion-resistant materials must be used. Therefore, a carbon material (carvate) or a glass lining material, which is widely used as a device material such as synthetic hydrochloric acid, is used in the device.

第1図ないし第2図は、本発明に係る塩素化反応器lの
一実施例を示すもので、第1図は縦断面図である。
1 and 2 show an embodiment of a chlorination reactor l according to the present invention, and FIG. 1 is a longitudinal sectional view.

図中符号2は円筒状の胴部で、この胴部2には、胴部2
内部に冷媒を導入、導出する導入管3、導出管4が設け
られている。また前記胴部2の上下の開口部には、水平
な上管板5および下管板6が取付けられている。これら
上管板5および下管板6間には、第2図に横断面を示す
ように多数の伝熱管7が取付けられている。前記上管板
5、および下管板6には、それぞれ、伝熱管7に、前記
伝熱管7を介して上管板5の上部および下管板6の下部
を連通する上孔8、下孔9が設けられている。
Reference numeral 2 in the figure is a cylindrical body part, and this body part 2 includes a body part 2.
An inlet pipe 3 and an outlet pipe 4 are provided for introducing and leading out the refrigerant inside. Furthermore, a horizontal upper tube plate 5 and a lower tube plate 6 are attached to the upper and lower openings of the body 2. A large number of heat exchanger tubes 7 are installed between the upper tube plate 5 and the lower tube plate 6, as shown in cross section in FIG. The upper tube plate 5 and the lower tube plate 6 are provided with an upper hole 8 and a lower hole, respectively, which communicate the upper part of the upper tube plate 5 and the lower part of the lower tube plate 6 with the heat exchanger tube 7 via the heat exchanger tube 7. 9 is provided.

前記伝熱管7には、これらに直交する邪魔板1Oか邪魔
板ステー11によって支持され、間隔をおいて配置され
ている。また、前記胴部2の外面には反応器を垂直に支
持する支持脚12が取付けられている。
The heat exchanger tubes 7 are supported by baffle plates 1O or baffle plate stays 11 orthogonal thereto, and are arranged at intervals. Furthermore, support legs 12 are attached to the outer surface of the body 2 to vertically support the reactor.

前記胴部2の下部には下管板6を覆って下カバー13が
取付けられ、この下カバー13にはカス導出管14、液
導出管15および原料液導入管16が設けられている。
A lower cover 13 is attached to the lower part of the body 2 so as to cover the lower tube plate 6, and the lower cover 13 is provided with a waste discharge pipe 14, a liquid discharge pipe 15, and a raw material liquid introduction pipe 16.

また前記胴部2の上部には上管板5を覆って、水平な整
流板21によって下部の液貯留部22、上部のガス貯留
部23に2分割され、このガス貯留部23が、蓋部24
によって密閉されている上カバー25が取付けられてい
る。前記液貯留部22には、反応液の導入管26が取付
けられ、ガス貯留部23の蓋部24には、ガス貯留部2
3内に塩素を導入するガス導入管27が取付けられてい
る。
The upper part of the body part 2 covers the upper tube plate 5 and is divided into two by a horizontal rectifying plate 21 into a lower liquid storage part 22 and an upper gas storage part 23, and this gas storage part 23 is divided into a lid part. 24
An upper cover 25 is attached which is sealed by. A reaction liquid introduction pipe 26 is attached to the liquid storage section 22, and a gas storage section 2 is attached to the lid section 24 of the gas storage section 23.
A gas inlet pipe 27 for introducing chlorine into the interior of the tank 3 is attached.

また、第1図中のAおよびB部分の拡大図を第3図およ
び第4図に示すように、前記上孔8には、伝熱管7の延
長上に分配管28の基部が取付けられ、その先端は前記
整流板21の下面に近接し、間隔29か設けられている
。前記分配管28の先端開口部は、前記整流板21に穿
設された、オリフィス部30を有する整流板孔31と対
向している。また、前記分配管28の前記上管板5の上
面近傍には、第5図に示すように、液孔32か2個穿設
されている。
Further, as shown in FIGS. 3 and 4, which are enlarged views of portions A and B in FIG. The tip thereof is close to the lower surface of the current plate 21, and a gap 29 is provided therebetween. The distal end opening of the distribution pipe 28 faces a rectifying plate hole 31 having an orifice portion 30 formed in the rectifying plate 21 . Further, in the vicinity of the upper surface of the upper tube plate 5 of the distribution pipe 28, as shown in FIG. 5, two or more liquid holes 32 are bored.

なお、41はドレイン抜き、42はそれぞれLA、Ll
、TA、TI、PIA等検出部取付座である。
In addition, 41 is a drain outlet, 42 is LA and Ll, respectively.
, TA, TI, PIA, etc. detection unit mounting seat.

前記のように構成された塩素化反応器を用いて、塩素化
反応を行うには、第6図に示すように原料液を原料導入
管16より下カバー13内に導入しポンプ44によって
、反応液導入管26より液貯留部に導入する。反応液は
分配管28の液孔32より伝熱管7の内面に沿って流下
し、濡壁を形成する。同時にCatガスをガス導入管2
7より導入する。C+、ガスはオリフィス部によって均
一に分布され、流下する反応液と反応する。この際、流
下する反応液は薄膜で、かつ外側からブラインで冷却さ
れているので、効率よく冷却され、所望の温度に保持さ
れる。また塩素化反応は、反応速度が早く各伝熱管7に
導入された塩素は、下カバー13に達するまでに反応消
失する。反応が定常状態に達した後には、液貯留部22
および下カバー13内の液面43を一定に保持しながら
、原料液を導入するともに、生成した塩素化物を抜き出
す。
To carry out a chlorination reaction using the chlorination reactor configured as described above, as shown in FIG. The liquid is introduced into the liquid reservoir through the liquid introduction pipe 26. The reaction liquid flows down from the liquid hole 32 of the distribution pipe 28 along the inner surface of the heat transfer tube 7, forming a wet wall. At the same time, Cat gas is introduced into gas introduction pipe 2.
Introduced from 7. The C+ gas is uniformly distributed by the orifice section and reacts with the flowing reaction liquid. At this time, since the flowing reaction liquid is a thin film and is cooled from the outside with brine, it is efficiently cooled and maintained at a desired temperature. Further, the chlorination reaction has a fast reaction rate, and the chlorine introduced into each heat exchanger tube 7 reacts and disappears by the time it reaches the lower cover 13. After the reaction reaches a steady state, the liquid reservoir 22
Then, while maintaining the liquid level 43 in the lower cover 13 constant, the raw material liquid is introduced and the generated chloride is extracted.

この操作によって、多数本の伝熱管7を流下する液は、
温度の上昇が防止され、効率のよい塩素化反応か行なわ
れる。塩素化反応によって生成したHCIはガス導出管
14より抜出回収される。
By this operation, the liquid flowing down the multiple heat transfer tubes 7 is
Temperature rise is prevented and efficient chlorination reaction takes place. HCI produced by the chlorination reaction is extracted and recovered from the gas outlet pipe 14.

上記反応器は、原料液の導入量、塩素の導入量をフント
ロールすることによって、塩素化の進行は調整可能であ
る。
In the above reactor, the progress of chlorination can be adjusted by controlling the amount of raw material liquid introduced and the amount of chlorine introduced.

[発明の効果] 以上説明したように、本発明の塩素化反応器は、小径の
伝熱管を多数本まとめた、多管式熱交換器状の濡壁を用
い、名前に均一に原料液を導入して液膜を流下させると
ともに、並流に塩素ガスを均一に導入して、反応させる
ことができるので、コンパクトで、濡壁を形成する面積
か大きく、発熱量の大きい塩素化反応を比較的低い温度
で効率よく行うことが可能となり、経済的利5点が発揮
される。
[Effects of the Invention] As explained above, the chlorination reactor of the present invention uses a wet wall shaped like a shell-and-tube heat exchanger in which a large number of small-diameter heat exchanger tubes are grouped together to uniformly distribute the raw material liquid. It is possible to react by introducing chlorine gas uniformly in parallel flow and causing a liquid film to flow down, so it is compact, has a large surface area to form a wet wall, and compares chlorination reactions with a large calorific value. This makes it possible to carry out the process efficiently at a relatively low temperature, resulting in five economic advantages.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は、本発明に係る塩素化反応器の一
実施例を示すもので、第1図は縦断面図、第2図は伝熱
管の配置を示す。第1図の■−■線矢視断面相当図、第
3図は第1図のA部分の拡大図、第4図は第1図のB部
分の拡大図、第5図は第3図の液孔の横断面図、第6図
は、第1図の反応器の使用状態の説明図である。 1・塩素化反応器、2・・胴部、3 冷媒導入管、4・
・・冷媒導出管、5・・上管板、6・・下管板、7伝熱
管、8・・上孔、9・下孔、10・邪魔板、11・・邪
魔板ステー 12・・・支持脚、13・・下カバ14・
・・ガス導出管、15 液導出管、16原料導入管、2
1 ・整流板、22・液貯留部、23・ガス貯留部、2
4・・蓋部、25・・上カバー26・・反応液導入管、
27 分配管、29−・間隙、30 整流板孔、32・液孔、 42 ・各検出部の取付座、 ンブ。 ガス導入管、28・・・ オリフィス部、31 41・・ ドレイン抜き、 43 液面、44・ポ
1 and 2 show an embodiment of a chlorination reactor according to the present invention, with FIG. 1 being a longitudinal sectional view and FIG. 2 showing the arrangement of heat exchanger tubes. Fig. 3 is an enlarged view of part A in Fig. 1, Fig. 4 is an enlarged view of part B in Fig. 1, and Fig. 5 is an enlarged view of part B in Fig. 3. A cross-sectional view of the liquid hole, FIG. 6, is an explanatory diagram of the state in which the reactor of FIG. 1 is used. 1. Chlorination reactor, 2. Body, 3 Refrigerant introduction pipe, 4.
...Refrigerant outlet pipe, 5.. Upper tube plate, 6.. Lower tube plate, 7. Heat exchanger tube, 8.. Upper hole, 9. Lower hole, 10. Baffle plate, 11.. Baffle plate stay 12... Support legs, 13...Lower cover 14.
...Gas outlet pipe, 15 Liquid outlet pipe, 16 Raw material introduction pipe, 2
1. Current plate, 22. Liquid storage section, 23. Gas storage section, 2
4...Lid part, 25...Top cover 26...Reaction liquid introduction tube,
27 Distribution piping, 29-・Gap, 30 Rectifier plate hole, 32・Liquid hole, 42・Mounting seat for each detection part, Gas introduction pipe, 28... Orifice section, 31 41... Drain removal, 43 Liquid level, 44.

Claims (1)

【特許請求の範囲】 冷媒の導入管および導出管が外面上下に設けられ、水平
な上管板および下管板が取付けられ、これら上管板およ
び下管板の間には多数の垂直な伝熱管が取付けられ、前
記伝熱管を介して、前記上管板の上部および下管板の下
部が連通されている筒状の胴部と、 導出入管が取付けられている、前記胴部の下管板を覆う
下カバーと、 水平な整流板によって、液導入管を有する下部の液貯留
部、およびガス導入管を有する上部のガス貯留部に2分
割され、上部が密閉されている前記上管板を覆う上カバ
ーとを有し、前記上管板上面には、伝熱管の延長上にそ
れぞれ位置する分配管が取付けられ、これら分配管の前
記上管板の上面近傍には液孔が穿設され、前記分配管の
先端には、前記整流板に近接し、かつ整流板に穿設され
た、オリフィス部を有する整流板孔とそれぞれ対向して
いることを特徴とする塩素化反応器。
[Claims] Refrigerant inlet and outlet pipes are provided above and below the outer surface, horizontal upper and lower tube plates are attached, and a number of vertical heat exchanger tubes are installed between the upper and lower tube plates. a cylindrical body part to which the upper tube plate and the lower part of the lower tube plate are connected through the heat transfer tube; and a lower tube plate of the body to which the inlet/outlet pipe is attached. A lower cover covers the upper tube plate, which is divided into two by a horizontal rectifying plate into a lower liquid storage part having a liquid introduction pipe and an upper gas storage part having a gas introduction pipe, and whose upper part is sealed. an upper cover, distribution pipes located on extensions of the heat transfer tubes are attached to the upper surface of the upper tube plate, and liquid holes are bored in the vicinity of the upper surface of the upper tube plate of these distribution pipes, A chlorination reactor characterized in that the distal end of the distribution pipe is close to the current plate and faces a current plate hole having an orifice portion, which is bored in the current plate.
JP2204548A 1990-08-01 1990-08-01 Chlorination reactor Expired - Lifetime JPH085821B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2204548A JPH085821B2 (en) 1990-08-01 1990-08-01 Chlorination reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2204548A JPH085821B2 (en) 1990-08-01 1990-08-01 Chlorination reactor

Publications (2)

Publication Number Publication Date
JPH0489440A true JPH0489440A (en) 1992-03-23
JPH085821B2 JPH085821B2 (en) 1996-01-24

Family

ID=16492333

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2204548A Expired - Lifetime JPH085821B2 (en) 1990-08-01 1990-08-01 Chlorination reactor

Country Status (1)

Country Link
JP (1) JPH085821B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008545642A (en) * 2005-05-20 2008-12-18 ソルヴェイ(ソシエテ アノニム) Method for preparing chlorohydrin in a corrosion resistant apparatus
US9309209B2 (en) 2010-09-30 2016-04-12 Solvay Sa Derivative of epichlorohydrin of natural origin
US9663427B2 (en) 2003-11-20 2017-05-30 Solvay (Société Anonyme) Process for producing epichlorohydrin

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9663427B2 (en) 2003-11-20 2017-05-30 Solvay (Société Anonyme) Process for producing epichlorohydrin
JP2008545642A (en) * 2005-05-20 2008-12-18 ソルヴェイ(ソシエテ アノニム) Method for preparing chlorohydrin in a corrosion resistant apparatus
US9309209B2 (en) 2010-09-30 2016-04-12 Solvay Sa Derivative of epichlorohydrin of natural origin

Also Published As

Publication number Publication date
JPH085821B2 (en) 1996-01-24

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