JPH0484713A - Graduation disk of optical encoder - Google Patents
Graduation disk of optical encoderInfo
- Publication number
- JPH0484713A JPH0484713A JP19782490A JP19782490A JPH0484713A JP H0484713 A JPH0484713 A JP H0484713A JP 19782490 A JP19782490 A JP 19782490A JP 19782490 A JP19782490 A JP 19782490A JP H0484713 A JPH0484713 A JP H0484713A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- film
- constant pitch
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims description 8
- 239000011521 glass Substances 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 239000012790 adhesive layer Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 abstract description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052804 chromium Inorganic materials 0.000 abstract description 7
- 239000011651 chromium Substances 0.000 abstract description 7
- 238000005530 etching Methods 0.000 abstract description 3
- 238000009751 slip forming Methods 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract 3
- 239000007767 bonding agent Substances 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Optical Transform (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、被測定体の移動量を測定するのに用いられる
光学式エンコーダの目盛板に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a scale plate of an optical encoder used to measure the amount of movement of an object to be measured.
(従来の技術)
従来エンコーダの目盛板として、バイナリ振幅格子とバ
イナリ位相格子が用いられている。(Prior Art) Conventionally, a binary amplitude grating and a binary phase grating are used as a scale plate of an encoder.
バイナリ位相格子は振幅が一定で、位相分布が二値のも
のをいい、その振幅透過率分布は、で与えられる。A binary phase grating has a constant amplitude and a binary phase distribution, and its amplitude transmittance distribution is given by:
上式において5in−=1すなわち、θ−πでなければ
ならない。In the above formula, 5in-=1, that is, θ-π must be satisfied.
バイナリ位相格子には、反射型と透過型とがあり、反射
型の方が透過型に比べて分解能が高い。There are two types of binary phase gratings: a reflective type and a transmissive type, with the reflective type having higher resolution than the transmissive type.
反射型位相格子において、四部と凸部の光路長差は、2
Xd (但し、dは格子高さ)、この光路長差に対応す
る光の角度をθとすると、1次回折光において最大回折
効率を得るには、前述のようにθ−πであるから、最大
効率を得λ
、’、 d−一 ・・・(4)(4)式から明
らかなように最大回折効率が得られる格子高さdは、光
の波長λの1/4である。In a reflective phase grating, the optical path length difference between the four parts and the convex part is 2.
Xd (where d is the grating height), and if the angle of light corresponding to this optical path length difference is θ, in order to obtain the maximum diffraction efficiency for the first-order diffracted light, the maximum diffraction efficiency is θ - π as mentioned above. Efficiency λ,', d-1 (4) As is clear from equation (4), the grating height d at which the maximum diffraction efficiency is obtained is 1/4 of the wavelength λ of the light.
したがって半導体レーザ(λ−0.86μ)では、反射
型位相格子の格子高さすなわち、格子形成用金属膜厚さ
を0.215μに選定する。Therefore, in the semiconductor laser (λ-0.86μ), the grating height of the reflective phase grating, that is, the thickness of the metal film for forming the grating, is selected to be 0.215μ.
(発明が解決しようとする課題)
基板上に形成する格子形成用金属膜厚さは、薄いほど密
着性に優れ、剥れ難いが、回折効率をよくするために、
前述のように0.2μ以上にすると、剥れ易いという課
題があった。また反射膜は一般にアルミニウム膜を用い
ており、傷つき易いという課題もあった。(Problems to be Solved by the Invention) The thinner the metal film for grating formation formed on the substrate, the better the adhesion and the less likely it will peel off. However, in order to improve the diffraction efficiency,
As mentioned above, when the thickness is 0.2μ or more, there is a problem that it is easy to peel off. In addition, the reflective film generally uses an aluminum film, which has the problem of being easily damaged.
本発明は、従来のこのような課題を解決することをその
目的とするものである。The present invention aims to solve these conventional problems.
(課題を解決するための手段)
本発明は、上記目的を達成するために、基板上にフォト
レジスト法により位相格子形成用突起が一定ピッチに形
成され、この位相格子形成用突起が形成された領域上に
金属反射膜が蒸着され、この金属反射膜上に屈折率が空
気よりも高い透明な接着剤層を介して透明ガラスが接着
されたことを特徴とする。(Means for Solving the Problems) In order to achieve the above object, the present invention provides a method in which phase grating forming protrusions are formed at a constant pitch on a substrate by a photoresist method, and the phase grating forming protrusions are formed. A metal reflective film is deposited on the region, and transparent glass is bonded onto the metal reflective film via a transparent adhesive layer having a refractive index higher than that of air.
(作 用)
位相格子形成用突起の高さは、凹部は接着剤で満される
ので、その屈折率△n>1の接着剤する。また反射面が
表面ガラスで覆われるので、反射面が保護される。(Function) The height of the phase grating forming protrusion is determined by the adhesive whose refractive index Δn>1, since the concave portion is filled with adhesive. Furthermore, since the reflective surface is covered with surface glass, the reflective surface is protected.
(実施例) 以下本発明の実施例を図面につき説明する。(Example) Embodiments of the present invention will be described below with reference to the drawings.
第1図は、ロータリエンコーダに使用される本発明の一
実施例の目盛ディスクを示す。FIG. 1 shows a scale disk according to an embodiment of the present invention used in a rotary encoder.
同図において、1はガラス基板で、このガラス基板1の
上にクロムの突起2が平行に且つ同一ピッチで形成され
、この突起2の上面及び突起2間のガラス基板1の上に
反射鏡として、アルミニウム蒸着膜3が被着され、この
アルミニウム蒸着膜3上に屈折率△n−1,5の透明な
例えば紫外線硬化型接着剤層4を介して透明ガラス5が
被覆されている。この反射型回折格子で−0,8674
、d−0,14μとなる。故に、クロムの厚さ(位相格
子の高さ)を0,14μに設定する。In the figure, reference numeral 1 denotes a glass substrate, on which chrome protrusions 2 are formed in parallel and at the same pitch, and on the top surface of the protrusions 2 and between the protrusions 2 on the glass substrate 1 as a reflecting mirror. , an aluminum vapor-deposited film 3 is deposited on the aluminum vapor-deposited film 3, and a transparent glass 5 is coated on the aluminum vapor-deposited film 3 via a transparent, for example, ultraviolet curing adhesive layer 4 having a refractive index of Δn-1.5. -0,8674 with this reflection grating
, d-0,14μ. Therefore, the thickness of chromium (height of the phase grating) is set to 0.14μ.
この目盛ディスクは、次のように製造される。This scale disc is manufactured as follows.
すなわち、第2図(A)に示すように、ガラス基板1上
に先ず0.1−0.2μの膜厚のクロム膜2人を蒸着す
る。次いで第2図(B)に示すように、クロム膜2A上
にポジ型レジスト6を形成し、その上に一定ピッチで光
透過部7と光非透過部8とが連続的に形成されている原
板9を密着させる。そして紫外線を原板9の上から照射
させて、光透過部7に対応したレジスト部分を露光させ
る。それから、原板9を取り外し、これを現像液で処理
して紫外線非露光部(光非透過部8)に対応する部分を
第2図(C)に示すように取り除き、レジスト6を一定
ピッチで残す。次いで、第2図(D)に示すように、レ
ジスト6側をエツチング液で処理し、露呈するクロム膜
2人を取り除き、第2図(E)で示すようにレジスト6
を除去し、アルミニウムを蒸着(3)する。アルミニウ
ム蒸着膜3の上には第2図(F)で示すように、紫外線
硬化型接着剤4(透明)を使って透明ガラス5を接着し
、反射面を覆う。That is, as shown in FIG. 2(A), two chromium films having a thickness of 0.1 to 0.2 .mu.m are first deposited on a glass substrate 1. As shown in FIG. Next, as shown in FIG. 2(B), a positive resist 6 is formed on the chromium film 2A, and light transmitting parts 7 and light non-transmitting parts 8 are continuously formed thereon at a constant pitch. The original plate 9 is brought into close contact. Then, ultraviolet rays are irradiated from above the original plate 9 to expose the resist portions corresponding to the light transmitting portions 7. Then, the original plate 9 is removed and treated with a developer to remove the portion corresponding to the UV non-exposed area (light non-transmissive area 8) as shown in FIG. 2(C), leaving the resist 6 at a constant pitch. . Next, as shown in FIG. 2(D), the resist 6 side is treated with an etching solution to remove the two exposed chromium films, and as shown in FIG. 2(E), the resist 6 side is treated with an etching solution.
is removed and aluminum is deposited (3). As shown in FIG. 2(F), a transparent glass 5 is bonded onto the aluminum vapor-deposited film 3 using an ultraviolet curing adhesive 4 (transparent) to cover the reflective surface.
第3図は、本発明目盛ディスクを用いた光学式ロータリ
ーエンコーダの光路構成を示す。FIG. 3 shows the optical path configuration of an optical rotary encoder using the scale disk of the present invention.
同図において、10は目盛ディスクで、これはレーザ1
1の前方を横切るように移動自在である。In the figure, 10 is a scale disk, which corresponds to the laser 1
It can move freely across the front of 1.
レーザ11の放射するレーザ光はビームスプリッタ12
で2つに分けられミラー131132を介して各々目盛
ディスクIO上に投射される。目盛ディスク10で反射
することにより形成された+1次回折光14 及び−
1次回折光14゜は各々ミラー15 及び152とミ
ラー16及びビームスプリッタ17を介して受光素子1
8で受光するようになって3・・・アルミニウム蒸着膜
5・・・透明ガラス
4・・・接着剤層
おり、受光素子18の出力パルスをカウントすることに
より目盛ディスク10の回転量が測定される。The laser light emitted by the laser 11 passes through the beam splitter 12
The image is divided into two parts and each image is projected onto the scale disk IO via a mirror 131132. +1st-order diffracted light 14 and - formed by reflection on scale disk 10
The 1st-order diffracted light 14° passes through the mirrors 15 and 152, the mirror 16, and the beam splitter 17, respectively, to the light receiving element 1.
At 8, light is received, 3...aluminum vapor deposited film 5...transparent glass 4...adhesive layer, and by counting the output pulses of the light receiving element 18, the amount of rotation of the scale disk 10 is measured. Ru.
(発明の効果)
本発明は、上述の通り構成されているから、目盛ディス
クを構成する反射型回折格子の突起の高さが従来のもの
より低くでき、そのた−め、基板への密着性が増大する
。また反射面が表面ガラスで覆われるので、反射面が保
護される等の効果を有する。(Effects of the Invention) Since the present invention is configured as described above, the height of the protrusions of the reflection type diffraction grating constituting the scale disk can be lower than that of the conventional one, and therefore the adhesion to the substrate can be improved. increases. Furthermore, since the reflective surface is covered with surface glass, it has the effect of protecting the reflective surface.
第1図は、ロータリエンコーダに適用される本発明の一
実施例の要部の断面図、第2図(A)〜(P)は、その
製作過程を示す断面図、第3図は本発明の目盛ディスク
を用いたロータリエンコーダの光路構成図である。
1・・・ガラス基板 2・・・クロムの突起
株式会社
第1
図FIG. 1 is a sectional view of the main part of an embodiment of the present invention applied to a rotary encoder, FIGS. 2(A) to (P) are sectional views showing the manufacturing process, and FIG. FIG. 2 is a diagram illustrating the optical path configuration of a rotary encoder using a scale disk. 1... Glass substrate 2... Chrome Protrusion Co., Ltd. Figure 1
Claims (1)
一定ピッチに形成され、この位相格子形成用突起が形成
された領域上に金属反射膜が蒸着され、この金属反射膜
上に屈折率が空気よりも高い透明な接着剤層を介して透
明ガラスが接着されたことを特徴とする光学式エンコー
ダの目盛ディスク。Projections for forming a phase grating are formed at a constant pitch on the substrate by a photoresist method, a metal reflective film is deposited on the area where the projections for forming a phase grating are formed, and the refractive index is lower than that of air on this metal reflective film. An optical encoder scale disc characterized by transparent glass bonded through a highly transparent adhesive layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19782490A JP2958654B2 (en) | 1990-07-27 | 1990-07-27 | Scale disk of optical encoder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19782490A JP2958654B2 (en) | 1990-07-27 | 1990-07-27 | Scale disk of optical encoder |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0484713A true JPH0484713A (en) | 1992-03-18 |
JP2958654B2 JP2958654B2 (en) | 1999-10-06 |
Family
ID=16380951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19782490A Expired - Fee Related JP2958654B2 (en) | 1990-07-27 | 1990-07-27 | Scale disk of optical encoder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2958654B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006178312A (en) * | 2004-12-24 | 2006-07-06 | Canon Inc | Surface reflection type phase grating |
US20110259422A1 (en) * | 2010-04-29 | 2011-10-27 | Skyline Solar, Inc. | Thin film reflective coating pinning arrangement |
JP2016021057A (en) * | 2014-06-19 | 2016-02-04 | キヤノン株式会社 | Optical element having multiple optical functional surfaces, spectral device, and manufacturing method of the same |
JP2019120499A (en) * | 2017-12-28 | 2019-07-22 | 株式会社ミツトヨ | Scale and method for manufacturing the same |
-
1990
- 1990-07-27 JP JP19782490A patent/JP2958654B2/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006178312A (en) * | 2004-12-24 | 2006-07-06 | Canon Inc | Surface reflection type phase grating |
US20110259422A1 (en) * | 2010-04-29 | 2011-10-27 | Skyline Solar, Inc. | Thin film reflective coating pinning arrangement |
US8083362B2 (en) * | 2010-04-29 | 2011-12-27 | Skyline Solar, Inc. | Thin film reflective coating pinning arrangement |
JP2016021057A (en) * | 2014-06-19 | 2016-02-04 | キヤノン株式会社 | Optical element having multiple optical functional surfaces, spectral device, and manufacturing method of the same |
JP2017207775A (en) * | 2014-06-19 | 2017-11-24 | キヤノン株式会社 | Optical element with a plurality of optical functional surfaces, spectroscopic instrument, and method for manufacturing the same |
US11624862B2 (en) | 2014-06-19 | 2023-04-11 | Canon Kabushiki Kaisha | Optical element, spectroscopic apparatus, and method for manufacturing the same |
JP2019120499A (en) * | 2017-12-28 | 2019-07-22 | 株式会社ミツトヨ | Scale and method for manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JP2958654B2 (en) | 1999-10-06 |
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