JPH047658U - - Google Patents
Info
- Publication number
- JPH047658U JPH047658U JP4958690U JP4958690U JPH047658U JP H047658 U JPH047658 U JP H047658U JP 4958690 U JP4958690 U JP 4958690U JP 4958690 U JP4958690 U JP 4958690U JP H047658 U JPH047658 U JP H047658U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- sample
- processing apparatus
- holding means
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000428 dust Substances 0.000 claims description 4
- 239000012212 insulator Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002245 particle Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4958690U JPH047658U (lt) | 1990-05-10 | 1990-05-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4958690U JPH047658U (lt) | 1990-05-10 | 1990-05-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH047658U true JPH047658U (lt) | 1992-01-23 |
Family
ID=31567405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4958690U Pending JPH047658U (lt) | 1990-05-10 | 1990-05-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH047658U (lt) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000016385A1 (fr) * | 1998-09-14 | 2000-03-23 | Tokyo Electron Limited | Reacteur au plasma |
| JP2015167157A (ja) * | 2014-03-03 | 2015-09-24 | 東京エレクトロン株式会社 | 半導体製造装置、成膜処理方法及び記憶媒体 |
-
1990
- 1990-05-10 JP JP4958690U patent/JPH047658U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000016385A1 (fr) * | 1998-09-14 | 2000-03-23 | Tokyo Electron Limited | Reacteur au plasma |
| JP2015167157A (ja) * | 2014-03-03 | 2015-09-24 | 東京エレクトロン株式会社 | 半導体製造装置、成膜処理方法及び記憶媒体 |
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