JPH0475231A - Paste for forming fluorescent material - Google Patents
Paste for forming fluorescent materialInfo
- Publication number
- JPH0475231A JPH0475231A JP2188616A JP18861690A JPH0475231A JP H0475231 A JPH0475231 A JP H0475231A JP 2188616 A JP2188616 A JP 2188616A JP 18861690 A JP18861690 A JP 18861690A JP H0475231 A JPH0475231 A JP H0475231A
- Authority
- JP
- Japan
- Prior art keywords
- paste
- phosphor
- vehicle
- fluorescent material
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title abstract description 11
- 239000000843 powder Substances 0.000 claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 48
- 238000001704 evaporation Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 8
- 239000010408 film Substances 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000007639 printing Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 5
- 238000010304 firing Methods 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000005355 lead glass Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 238000013035 low temperature curing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
- 101100129922 Caenorhabditis elegans pig-1 gene Proteins 0.000 description 1
- 101100520057 Drosophila melanogaster Pig1 gene Proteins 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
【発明の詳細な説明】 （産業上の利用分野） この発明は、蛍光体形成用のペーストに関する。[Detailed description of the invention] (Industrial application field) The present invention relates to a paste for forming a phosphor.
（従来の技術）
従来より、カラー表示用のガス放電型表示パネルでは、
ガス放電により発生させた紫外線で蛍光体を励起発光さ
せて、カラー表示に用いる所望の色の光を生成する。こ
の放電型表示パネルの製造では量産に適した厚膜印刷法
を多用しでおり、蛍光体の形成に厚膜印刷法を用いる。(Conventional technology) Conventionally, gas discharge type display panels for color display,
Ultraviolet light generated by gas discharge excites the phosphor and causes it to emit light, producing light of a desired color used for color display. In manufacturing this discharge type display panel, a thick film printing method suitable for mass production is often used, and the thick film printing method is used to form the phosphor.
蛍光体形成用の厚膜ペーストには、例えば蛍光体粉末、
導電性粉末及び粘度調整用ビークルの混合物が用いられ
、蛍光体形成時には厚膜ペーストを所定形状の印刷パタ
ーンで印刷し、この厚膜ペーストを乾燥させたのち焼成
していた。Thick film paste for forming phosphors includes, for example, phosphor powder,
A mixture of a conductive powder and a viscosity adjusting vehicle is used, and when forming a phosphor, a thick film paste is printed in a predetermined print pattern, and the thick film paste is dried and then fired.
（発明が解決しようとする課題）
しかしながら従来用いられている蛍光体形成用の厚膜ペ
ーストの焼成温度は４００〜５００°Ｃ程度の高温度で
ある。しかも厚膜ペーストの焼成を空気中で行なうため
、蛍光体粉末は高温で空気中にさらされる。その結果、
形成された蛍光体の発光効率が低下しガス放電型表示パ
ネルの表示輝度が劣化するという問題点があった。(Problems to be Solved by the Invention) However, the firing temperature of conventionally used thick film pastes for forming phosphors is a high temperature of about 400 to 500°C. Moreover, since the thick film paste is fired in the air, the phosphor powder is exposed to the air at high temperatures. the result,
There was a problem in that the luminous efficiency of the formed phosphor decreased and the display brightness of the gas discharge type display panel deteriorated.
この発明の目的は上述した従来の問題点を解決するため
、低温度で蛍光体を形成できるようにした蛍光体形成用
ペーストを提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a paste for forming a phosphor that can form a phosphor at a low temperature in order to solve the above-mentioned conventional problems.
（課題を解決するための手段）
この目的の達成を図るため、この発明の蛍光体形成用ペ
ーストは、蛍光体粉末及びど−クルを含んで成る蛍光体
形成用ペーストにおいて、ビークルを、ほぼ２５０〜１
５０″Ｃの加熱温度で蒸発する低温蒸発性ビークルとし
たことを特徴とする。(Means for Solving the Problems) In order to achieve this object, the paste for forming a phosphor of the present invention includes a phosphor powder and a particle, in which the vehicle is approximately 250% ~1
It is characterized by being a low-temperature evaporative vehicle that evaporates at a heating temperature of 50''C.
（作用）
このような蛍光体形成用ペーストによれば、ビークルは
ほぼ２５０〜１５０℃の加熱温度で蒸発する。従って印
刷したペーストのど一クルをこのような低温で蒸発させ
てペーストを乾燥させれば、蛍光体を形成できる。(Function) According to such a paste for forming a phosphor, the vehicle evaporates at a heating temperature of approximately 250 to 150°C. Therefore, a phosphor can be formed by evaporating every inch of the printed paste at such low temperatures and drying the paste.
（実施例）
以下、図面を参照し、この発明の実施例につき説明する
。尚、図面はこの発明が理解できる程度に概略的に示し
であるにすぎない。(Embodiments) Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the drawings are only schematic representations to the extent that the invention can be understood.
第１図及び第２図（Ａ）〜（Ｅ）はこの実施例の蛍光体
形成用ペーストを用いて製造されるカラー表示用のガス
放電型表示パネルの、製造工程フローを概略的に示す図
及び製造工程を概略的に示す断面図である。Figures 1 and 2 (A) to (E) are diagrams schematically showing the manufacturing process flow of a gas discharge type display panel for color display manufactured using the phosphor forming paste of this example. FIG. 3 is a cross-sectional view schematically showing the manufacturing process.
以下、この発明の理解を深めるために、ガス放電型表示
パネルの製造工程の説明と共にこの実施例の蛍光体形成
用ペーストにつき説明する。Hereinafter, in order to deepen the understanding of the present invention, the phosphor forming paste of this example will be explained together with a description of the manufacturing process of a gas discharge type display panel.
この実施例の蛍光体形成用ペーストを用いてガス放電型
表示パネルを製造するに当り、ます、背面板１０として
ガラス基板を用意する。そして第１図（Ａ）にも示すよ
うに、厚膜印刷法により、この背面板１０に複数のスト
ライブ状の陰極１２を並列させて形成する（ステップ１
）。この形成では、陰極形成用の例えばＮｉ厚膜ペース
トＣＤｕｐｏｎｔ社製 ＃９５３５）を所定形状の印刷
パターンで印刷し、この厚膜ペーストを、乾燥温度１５
０”Ｃで１時間の間乾燥させたのち焼成温度５８０’
Ｃで］０分の間焼成し、Ｎｉ厚膜から成る陰極１２を得
る。In manufacturing a gas discharge type display panel using the phosphor forming paste of this example, a glass substrate is first prepared as the back plate 10. As shown in FIG. 1A, a plurality of striped cathodes 12 are formed in parallel on this back plate 10 by a thick film printing method (step 1).
). In this formation, a Ni thick film paste (for example, CDupont #9535) for cathode formation is printed in a predetermined print pattern, and this thick film paste is dried at a drying temperature of 15
After drying at 0"C for 1 hour, firing temperature 580'
C for 0 minutes to obtain a cathode 12 made of a thick Ni film.
次に第１図（Ｂ）にも示すように、陰極１２土に陰極及
び陽極間のギャップを一定に保つためのバリアリブ１４
を厚膜印刷法により形成する（ステップ２）。この形成
では、バリアリブ形成用の例えばガラス厚膜ペーストＣ
Ｄｕｐｏｎｔ社製＄９７４１）を所定形状の印刷パター
ンで印刷しこの厚膜ペーストを、乾燥温度１５０℃で１
時Ｍの間乾燥させる。これら印刷及び乾燥を繰り返すこ
とによって所定の高ざまでガラス厚膜を積層したら、こ
のガラス厚ｌＩＩを、焼成温度５３０’ Ｃで１０分の
間焼成し、所定の高ざまで積層された ＩＯガラス厚膜
から成るバリアリブ１４を得る。Next, as shown in FIG. 1(B), barrier ribs 14 are provided on the cathode 12 to maintain a constant gap between the cathode and the anode.
is formed by a thick film printing method (step 2). In this formation, for example, glass thick film paste C for barrier rib formation is used.
DuPont ($9741) was printed with a predetermined printing pattern, and this thick film paste was dried at a drying temperature of 150°C.
Allow to dry for hours M. By repeating these printing and drying steps, the thick glass film is laminated to a predetermined height. This glass thickness lII is then fired at a firing temperature of 530'C for 10 minutes to obtain an IO glass thickness laminated to a predetermined height. Barrier ribs 14 made of a membrane are obtained.
ステップ１〜２により背面板１０側に形成すべき各構成
要素の形成が完了する。Steps 1 and 2 complete the formation of each component to be formed on the back plate 10 side.
次に前面板］６としてガラス基板を用意する。Next, a glass substrate is prepared as a front plate]6.
そして第１図（Ｃ）にも示すように、蒸着、スパッタ等
の薄膜形成技術により、陽極形成用の透明導電膜例えば
ＩＴ○（Ｉｎｄｉｕｍ Ｔｉｎ０ｘｉｄｅ）！前面板
１６上に積層し、然る後フォトリソ及びエツチング技術
により透明導電膜を所定形状にバターニングし、複数の
ストライブ状の陽極１８を形成する（ステップ３）。こ
の形成では、並列配置された複数の陽極１８を得る。As shown in FIG. 1(C), a transparent conductive film for forming an anode, such as IT○ (Indium TinOxide)!, is formed using thin film forming techniques such as vapor deposition and sputtering. The transparent conductive film is laminated on the front plate 16, and then the transparent conductive film is patterned into a predetermined shape using photolithography and etching techniques to form a plurality of striped anodes 18 (step 3). In this formation, a plurality of anodes 18 arranged in parallel are obtained.
尚、陽極形成用のＩＴＯ膜のシート抵抗は］Ｏ〜２０Ω
／口程度とする。In addition, the sheet resistance of the ITO film for forming the anode is ]O~20Ω
/ About a mouthful.
次に第１図（Ｄ）にも示すように、厚膜印刷法により、
カラー表示素子形成位置の陽極１８上に蛍光体２０を形
成する（ステップ４）。この形成では、蛍光体形成用ペ
ーストとしで、蛍光体粉末及びほぼ２５０°Ｃ〜１５０
”Ｃの加熱温度で蒸発する低温蒸発性ど−クルを含む厚
膜ペーストを用いる。蛍光体２ｏが導電性を有ざない場
合には陽極１８の、カラー表示素子形成部分全部を被覆
せず一部露出させるようにして蛍光体２０を形成し、蛍
光体２０がガス放電の生成を妨げないようにする。蛍光
体２０が導電性を有する場合には陽極１８の、カラー表
示素子形成部分の全部を被覆するようにしても一部ヲ露
出するようにしてもよい。尚、カラー表示素子について
は後述する。Next, as shown in FIG. 1(D), by thick film printing method,
A phosphor 20 is formed on the anode 18 at the color display element forming position (step 4). In this formation, a paste for forming a phosphor is used, a phosphor powder and a temperature of approximately 250°C to 150°C are used.
A thick film paste containing a low-temperature vaporizable material that evaporates at a heating temperature of C is used. If the phosphor 2o does not have conductivity, the anode 18, where the color display element is formed, is not entirely covered. The phosphor 20 is formed so that a portion of the color display element forming portion of the anode 18 is exposed so that the phosphor 20 does not interfere with the generation of gas discharge. The color display element may be covered or partially exposed.The color display element will be described later.
非導電性の蛍光体２０を形成する場合には蛍光体粉末及
び低温蒸発性ビークルのみからなるへ−ストを、また導
電性の蛍光体２０を形成する場合には、蛍光体粉末、低
温蒸発性ビークル及び導電性粉末からなるペーストを用
いる。低温蒸発性と−’７ Ａ／ （７）粘度は１０ｏ
〜１０００ｏＣｐＳ程度、また蒸発温度は２５０〜１５
０℃程度或は沸点がほぼ３００” Ｃ以下とするのかよ
く、このようなど−クルとして例えばニューポールＰＥ
−７４三洋化成社製及びジプロピレングリコールの混合
物やグリセリン及びジプロピレングリコールの混合物を
用いることができる。When forming a non-conductive phosphor 20, a host consisting only of phosphor powder and a low-temperature evaporable vehicle is used, and when forming a conductive phosphor 20, a phosphor powder and a low-temperature evaporable vehicle are used. A paste consisting of a vehicle and conductive powder is used. Low temperature evaporability and -'7 A/ (7) Viscosity is 10o
~1000oCpS, and the evaporation temperature is 250~15
The boiling point should be about 0°C or about 300"C or less, such as Newport PE.
-74 manufactured by Sanyo Chemical Co., Ltd. and a mixture of dipropylene glycol or a mixture of glycerin and dipropylene glycol can be used.
この実施例では、赤、青及び緑の蛍光体粉末を例えば化
成オブトニクス社製の井ＫＸ５０４Ａ、＃ＫＸ５０１
Ａ及び井ＰＩＧ１とし、蛍光体粉末１０９に対し２９の
ニューポールＰＥ−７４及び３．５９のジプロピレング
リコールを混合し、これら蛍光体粉末及び低温蒸発性ビ
ークルから成る非導電性の蛍光体形成用ペーストを作成
し、この厚膜ペーストを印刷後２００″Ｃで１時間の間
加熱して乾燥させる。ビークルが蒸発すると蛍光体２０
の形成が終了するので、蛍光体２０の形成では焼成を行
なわない。尚、蛍光体粉末１０９に対し、２９の二ニー
ボールＰＥ−７４及び３．５９のジプロピレングリコー
ルと共に３〜５９の導電性粉末（例えば酸化インジウム
粉末）を混合すれば、導電性の蛍光体形成用ペーストを
作成できる。In this example, red, blue and green phosphor powders were used, for example, KX504A, #KX501 manufactured by Kasei Obtonics Co., Ltd.
For forming a non-conductive phosphor consisting of these phosphor powders and a low-temperature evaporable vehicle, 29 parts of Newpol PE-74 and 3.59 parts of dipropylene glycol were mixed with 109 parts of phosphor powder and 3.59 parts of dipropylene glycol were used as A and PIG1. A paste is prepared and the thick film paste is dried by heating at 200"C for 1 hour after printing. When the vehicle evaporates, the phosphor 20
Since the formation of the phosphor 20 has been completed, baking is not performed in the formation of the phosphor 20. Incidentally, if a conductive powder (for example, indium oxide powder) of 3 to 59 is mixed with phosphor powder 109 together with 29 of two-knee ball PE-74 and 3.59 of dipropylene glycol, it is possible to form a conductive phosphor. You can create a paste.
ステップ３及び４により前面板１０側に形成すべき各構
成成分の形成が完了する。Steps 3 and 4 complete the formation of each component to be formed on the front plate 10 side.
次に、平面的にみたときストライブ状の陰極１２及び陽
極１８か直交するようにして、前面板１６及び背面板１
０を電極形成面側を向き合せた状態で、これら前面板１
６、背面板１０の周縁部に鉛ガラスペーストを塗布し、
このペーストを硬化させて前面板１６及び背面板１０Ｖ
封着する（ステップ５）。この封着では、鉛ガラスペー
ストとして例えば２５０９の粉末ガラス（老成ガラス社
製 ＃ＩＷＦ７５７５Ｂ）に対し１９のエチルセルロー
ス及び１９９の酢酸イソアミルを混合してペースト化し
たものを用い、このペーストを塗布後焼成温度４６０°
Ｃて２０分の間焼成し、前面板１６及び背面板１０を封
着する。封着された前面板１６及び背面板１０はバリア
リブ１４を介し一定間隔に保持され、これら１６．１０
の闇にガス封入領域が形成される。Next, the front plate 16 and the back plate 1 are arranged so that the striped cathode 12 and the anode 18 are perpendicular to each other when viewed from above.
0 with the electrode forming side facing the front plate 1.
6. Apply lead glass paste to the peripheral edge of the back plate 10,
After hardening this paste, the front plate 16 and the back plate 10V
Seal (step 5). In this sealing, a lead glass paste made by mixing 2509 powdered glass (manufactured by Rousei Glass Co., Ltd. #IWF7575B) with 19 parts ethyl cellulose and 199 parts isoamyl acetate is used, and after applying this paste, the firing temperature is 460°
C. for 20 minutes to seal the front plate 16 and the back plate 10. The sealed front plate 16 and back plate 10 are held at a constant interval through barrier ribs 14, and these 16.10
A gas-filled region is formed in the darkness.
次に、封着した前面板１６及び背面板１０を例えば１０
０°Ｃに加熱しながら、図示しない排気管を介し、ガス
封入領域を１０−５〜１Ｏ−７Ｔｏｒｒに達するまで真
空排気し、そののち第２図（Ｅ）にも示すように、ガス
封入領域内に放電ガス２２を封入しくステップ６）、ガ
ス放電型表示パネルを完成する。Next, the sealed front plate 16 and back plate 10 are
While heating to 0°C, the gas-filled area is evacuated to 10-5 to 1O-7 Torr through an exhaust pipe (not shown), and then, as shown in FIG. 2(E), the gas-filled area is evacuated. In step 6), a discharge gas 22 is sealed inside the display panel, and a gas discharge type display panel is completed.
第１図（Ｅ）にも示すように、この実施例の蛍光体形成
用ペーストを用いて製造されたガス放電型表示パネルは
、複数のカラー表示素子２４を、前面板１６及び背面板
１ｏの間に放電ガス２２と共に封じ込めた構造を有する
。カラー表示素子２４はガス放電を形成する楚め相対向
させた陽極部分１８ａ及び陰極部分１２ａと、外部表示
光として取り出される光を生成する蛍光体２０とから成
り、例えばマトリクス状に配列され、赤、青或は緑色の
光を生成する。As shown in FIG. 1(E), the gas discharge type display panel manufactured using the phosphor forming paste of this example has a plurality of color display elements 24 on the front plate 16 and the rear plate 1o. It has a structure in which the discharge gas 22 is sealed in between. The color display element 24 is composed of an anode part 18a and a cathode part 12a which are arranged to form a gas discharge and are arranged opposite each other, and a phosphor 20 which generates light to be taken out as external display light. , producing blue or green light.
尚、前面板１６及び背面板１０の封着を、鉛ガラスにか
えて低温硬化型樹脂を用いて行なうようにしでもよい。Note that the front plate 16 and the rear plate 10 may be sealed using a low temperature curing resin instead of lead glass.
低温硬化型樹脂として、ほぼ２５０°Ｃ〜１５０℃の加
熱温度で硬化する熱硬化型樹脂例えばエポキシ系樹脂（
三洋化成社製 ＴＡ−１２０４）や、紫外線照射により
硬化する紫外線（ＵＶ）硬化型樹脂を用いることができ
る。Low-temperature curing resins include thermosetting resins that harden at heating temperatures of approximately 250°C to 150°C, such as epoxy resins (
TA-1204 manufactured by Sanyo Chemical Co., Ltd.) or an ultraviolet (UV) curable resin that is cured by ultraviolet irradiation can be used.
この発明は上述した実施例にのみ限定されるものではな
く、従って各構成成分の構成、形状、配設位置、配設個
数、数値的条件、形成材料及びそのほかを任意好適に変
更することができる。This invention is not limited to the above-described embodiments, and therefore, the configuration, shape, location, number of components, numerical conditions, forming materials, and others of each component can be changed as desired. .
（発明の効果）
上述した説明からも明らかなように、この発明の蛍光体
形成用ペーストによれば、ビークルはほぼ２５０〜１５
０°Ｃの加熱温度で蒸発し、印刷したペーストのビーク
ルをこのような低温で蒸発させてペーストを乾燥させれ
ば、蛍光体を形成できる。(Effects of the Invention) As is clear from the above explanation, according to the paste for forming a phosphor of the present invention, the vehicle has approximately 250 to 15
The phosphor can be formed by evaporation at a heating temperature of 0° C. and by evaporating the printed paste vehicle at such low temperatures and drying the paste.
蛍光体の形成はビークルを蒸発させれば完了し、従って
ペーストを２５０” Ｃを越える高温で焼成しなくとも
蛍光体を形成できる。その結果、蛍光体形成工程ｆこお
ける加熱処理が、蛍光体の発光効率を劣化させるのを回
避することができる。Formation of the phosphor is completed by evaporating the vehicle, and therefore the phosphor can be formed without baking the paste at a high temperature exceeding 250"C. As a result, the heat treatment in the phosphor formation step f It is possible to avoid deterioration of the luminous efficiency of.
第１図はこの発明の寅施例の蛍光体形成用ペーストを用
いて製造される、カラー表示用のガス放電型表示パネル
の製造工程フローを示す図、第２図（Ａ）〜（Ｅ）はこ
の発明の寅施例の蛍光体形成用ペーストを用いて製造さ
れる、カラー表示用のガス放電型表示パネルの製造工程
図である。
２０−・・蛍光体。
特許出願人 沖電気工業株式会社
１４：バリアリブ
ガス放電型表示パネルの製造工程
第２図
ガス放電型表示パネルの製造工程フロー策１
ガス放電型表示パネルの製造工程
第２図FIG. 1 is a diagram showing the manufacturing process flow of a gas discharge type display panel for color display manufactured using the phosphor forming paste of the embodiment of the present invention, and FIGS. 2(A) to (E) 1 is a manufacturing process diagram of a gas discharge type display panel for color display manufactured using a paste for forming a phosphor according to an embodiment of the present invention. 20--phosphor. Patent applicant Oki Electric Industry Co., Ltd. 14: Barrier rib gas discharge type display panel manufacturing process Figure 2 Gas discharge type display panel manufacturing process flow plan 1 Gas discharge type display panel manufacturing process Figure 2
Claims (3)
用ペーストにおいて、 前記ビークルを、ほぼ２５０〜１５０℃の加熱温度で蒸
発する低温蒸発性ビークルとしたことを特徴とする蛍光
体形成用ペースト。(1) A paste for forming a phosphor comprising a phosphor powder and a vehicle, characterized in that the vehicle is a low-temperature evaporating vehicle that evaporates at a heating temperature of approximately 250 to 150°C. .
としたことを特徴とする請求項１に記載の蛍光体形成用
ペースト。(2) The viscosity of the vehicle is 100 to 10,000 cps.
The paste for forming a phosphor according to claim 1, characterized in that:
項１に記載の蛍光体形成用ペースト。(3) The paste for forming a phosphor according to claim 1, characterized in that it contains conductive powder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2188616A JPH0475231A (en) | 1990-07-17 | 1990-07-17 | Paste for forming fluorescent material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2188616A JPH0475231A (en) | 1990-07-17 | 1990-07-17 | Paste for forming fluorescent material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0475231A true JPH0475231A (en) | 1992-03-10 |
Family
ID=16226797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2188616A Pending JPH0475231A (en) | 1990-07-17 | 1990-07-17 | Paste for forming fluorescent material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0475231A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6771022B1 (en) | 1999-03-02 | 2004-08-03 | Lg Electronics Inc. | Backplate for a plasma display panel and method for fabricating thereof |
| JP2010282736A (en) * | 2009-06-02 | 2010-12-16 | Panasonic Corp | Method of manufacturing plasma display panel |
| JP2011003487A (en) * | 2009-06-22 | 2011-01-06 | Panasonic Corp | Manufacturing method of plasma display panel |
-
1990
- 1990-07-17 JP JP2188616A patent/JPH0475231A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6771022B1 (en) | 1999-03-02 | 2004-08-03 | Lg Electronics Inc. | Backplate for a plasma display panel and method for fabricating thereof |
| JP2010282736A (en) * | 2009-06-02 | 2010-12-16 | Panasonic Corp | Method of manufacturing plasma display panel |
| JP2011003487A (en) * | 2009-06-22 | 2011-01-06 | Panasonic Corp | Manufacturing method of plasma display panel |
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