JPH0474584B2 - - Google Patents
Info
- Publication number
- JPH0474584B2 JPH0474584B2 JP61027773A JP2777386A JPH0474584B2 JP H0474584 B2 JPH0474584 B2 JP H0474584B2 JP 61027773 A JP61027773 A JP 61027773A JP 2777386 A JP2777386 A JP 2777386A JP H0474584 B2 JPH0474584 B2 JP H0474584B2
- Authority
- JP
- Japan
- Prior art keywords
- nitride
- piston ring
- titanium
- chromium
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 20
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 15
- 239000002131 composite material Substances 0.000 claims description 13
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims description 11
- 230000002093 peripheral effect Effects 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 229910001873 dinitrogen Inorganic materials 0.000 description 10
- 238000007733 ion plating Methods 0.000 description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 9
- 239000010936 titanium Substances 0.000 description 9
- 229910052719 titanium Inorganic materials 0.000 description 8
- 239000011651 chromium Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910001069 Ti alloy Inorganic materials 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000013011 mating Effects 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Landscapes
- Pistons, Piston Rings, And Cylinders (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
（発明の属する技術分野）
この発明は、耐摩耗性、耐焼付性に優れた皮膜
を有するピストンリングに関する。DETAILED DESCRIPTION OF THE INVENTION (Technical field to which the invention pertains) This invention relates to a piston ring having a coating with excellent wear resistance and seizure resistance.
（従来技術と問題点）
耐摩耗性に優れ、且つ相手シリンダ材の摩耗の
少ない硬質クロムめつきが、ピストンリングの表
面処理方法として従来から多く使われている。し
かし、近年エンジンの高出力化や高性能化に伴
い、ピストンリングに要求される条件はますます
過酷なものとなり、従来の硬質クロムめつきでは
対応できない場合があり、更に優れた耐摩耗性、
耐焼付性を有するピストンリングが望まれてい
た。(Prior Art and Problems) Hard chrome plating, which has excellent wear resistance and causes less wear on the mating cylinder material, has been widely used as a surface treatment method for piston rings. However, in recent years, as engines have increased in output and performance, the conditions required of piston rings have become increasingly severe, and conventional hard chrome plating may not be able to meet the requirements.
A piston ring with seizure resistance has been desired.
このような要求に対して、イオンプレーテイン
グ法により、摺動面に金属窒化物や金属炭化物な
どの皮膜を形成したピストンリングが提案されて
いる。金属窒化物や金属炭化物は、優れた耐摩耗
性、耐焼付性を示し、特に窒化チタンや窒化クロ
ムなどが注目されはじめている。金属窒化物とし
て窒化チタンを用いた場合、皮膜膜の厚さを
10μm以上にすると表面の粗さがひどくなり、相
手シリンダ材を摩耗させる欠点がある。また、金
属チタンは蒸気圧が低いため皮膜の析出速度が遅
く、長時間かけても厚い皮膜は得にくく、ピスト
ンリングの皮膜として耐久性に問題があつた。一
方、金属窒化物として窒化クロムを用いた場合、
金属クロムの蒸気圧は金属チタンにくらべて高
く、皮膜の析出速度は速いものの、硬度が低く耐
摩耗性、耐焼付性について、窒化チタンよりも劣
るなどの問題点がある。 In response to these demands, piston rings have been proposed in which a coating of metal nitride, metal carbide, or the like is formed on the sliding surface using an ion plating method. Metal nitrides and metal carbides exhibit excellent wear resistance and seizure resistance, and in particular titanium nitride and chromium nitride are beginning to attract attention. When titanium nitride is used as the metal nitride, the thickness of the film is
If the diameter is 10 μm or more, the surface becomes extremely rough, which has the disadvantage of causing wear to the mating cylinder material. In addition, metal titanium has a low vapor pressure, so the rate of film deposition is slow, and it is difficult to obtain a thick film even after a long period of time, resulting in problems in durability as a piston ring film. On the other hand, when chromium nitride is used as the metal nitride,
Although the vapor pressure of metallic chromium is higher than that of metallic titanium and the deposition rate of the film is faster, it has problems such as low hardness and inferior wear resistance and seizure resistance compared to titanium nitride.
（問題点を解決するための手段）
この発明は、ピストンリングの外周摺動面に、
窒化クロムと窒化チタンからなる複合皮膜が形成
されていて、該複合皮膜がピストンリング母材か
ら複合皮膜表面へ向かつて、窒化チタンの比率が
連続的に増大していることを特徴としたピストン
リングを提供することで上記のような問題点を解
決している。(Means for Solving the Problems) This invention provides the following features:
A piston ring characterized in that a composite film consisting of chromium nitride and titanium nitride is formed, and the ratio of titanium nitride increases continuously as the composite film moves from the piston ring base material to the surface of the composite film. The above problems are solved by providing .
（作用）
本発明の複合層は、窒素ガスの存在する減圧雰
囲気中で、クロムとチタンの合金を蒸発材とし
て、反応性イオンプレーテイング法によつて得る
ことができる。窒素ガス雰囲気中でこのようなイ
オンプレーテイングを行うと、チタンとクロムの
ガスは窒素と反応して、それぞれ窒化チタン、窒
化クロムとなる。チタンとクロムの合金を電子ビ
ームで加熱すると、蒸気圧の高いクロムが先にピ
ストンリングに析出し、合金中のクロムの含有量
が減少するにしたがつて、チタンの析出が連続的
に増えてくる。(Function) The composite layer of the present invention can be obtained by a reactive ion plating method using an alloy of chromium and titanium as an evaporator in a reduced pressure atmosphere in the presence of nitrogen gas. When such ion plating is performed in a nitrogen gas atmosphere, titanium and chromium gases react with nitrogen to form titanium nitride and chromium nitride, respectively. When an alloy of titanium and chromium is heated with an electron beam, chromium with a high vapor pressure precipitates on the piston ring first, and as the chromium content in the alloy decreases, the amount of titanium precipitated increases continuously. come.
複合皮膜層の窒化チタンは、前述のとおり優れ
た耐摩耗性、耐焼付性を有しているが、イオンプ
レーテイング法においては析出度が遅く、皮膜の
形成に長時間を要す。 Titanium nitride in the composite film layer has excellent wear resistance and seizure resistance as described above, but in the ion plating method, the degree of precipitation is slow and it takes a long time to form a film.
一方、窒化クロムは、窒化チタンにくらべて硬
度が少し低いため耐摩耗性にはやや劣るが、析出
速度は金属チタンに比べて５〜10倍も速い。しか
も、窒化クロムは、皮膜を厚くしても表面が荒れ
ることもなく、相手シリンダ材の摩耗軽減に効果
がある。 On the other hand, chromium nitride has a slightly lower hardness than titanium nitride, so its wear resistance is slightly inferior, but its precipitation rate is 5 to 10 times faster than that of titanium metal. Moreover, chromium nitride does not roughen the surface even if the film is thickened, and is effective in reducing wear on the mating cylinder material.
窒化クロム、窒化チタンは、それ自体が硬質で
あるために柔軟性に欠け、運転中に剥離を生ずる
恐れがある。真空容器内に窒素ガスを導入する前
に、イオンプレーテイングを行うと、ピストンリ
ング母材に金属クロムと金属チタンの下地層が形
成される。この下地層は、熱膨張率がピストンリ
ング母材に近く、熱応力の影響を受けにくいた
め、密着性は良く、しかも柔軟性にも富む。下地
層が所定の厚さになつたところで徐々に窒素ガス
を導入してイオンプレーテイングを続けると、蒸
発したクロムとチタンの一部はそれぞれ窒化クロ
ムと窒化チタンに転換する。窒素ガスの分圧が低
いときは転換の割合は少なく、窒素ガス分圧が次
第に高くなるにつれて、転換の割合は多くなる。
このように、硬質の複合皮膜層が、密着性、柔軟
性に富む下地層から連続的に形成されると複合皮
膜層の剥離防止に一層効果がある。 Since chromium nitride and titanium nitride are themselves hard, they lack flexibility and may cause peeling during operation. When ion plating is performed before introducing nitrogen gas into the vacuum chamber, a base layer of metallic chromium and metallic titanium is formed on the piston ring base material. This base layer has a coefficient of thermal expansion close to that of the piston ring base material and is less susceptible to thermal stress, so it has good adhesion and is also highly flexible. When the underlayer reaches a predetermined thickness, nitrogen gas is gradually introduced and ion plating is continued, and some of the evaporated chromium and titanium are converted to chromium nitride and titanium nitride, respectively. When the partial pressure of nitrogen gas is low, the conversion rate is small, and as the nitrogen gas partial pressure gradually increases, the conversion rate increases.
In this way, when a hard composite film layer is continuously formed from a base layer that is highly adhesive and flexible, it is more effective in preventing peeling of the composite film layer.
（実施例）
本発明に使用したHCD型イオンプレーテイン
グ装置の概要を第２図に示す。(Example) FIG. 2 shows an outline of the HCD type ion plating apparatus used in the present invention.
母材１を母材保持具２で保持し、ヒーター３で
母材１を所定の温度に加熱する。母材１は図示し
ないモーターにより回転する。母材１の下方に
は、蒸発源の金属５を収容する水冷銅ルツボ６が
設置してある。真空容器４の側壁には、窒素ガス
供給口１０とHCD型電子銃８が取り付けてあり、
電子銃８には、プラズマ用アルゴンガスの導入管
９が設けてある。水冷銅ルツボ６と電子銃８の間
には、集束コイル７があつて、電子銃８から射出
された電子ビームを集束して蒸気源の金属５に照
射する。真空容器４内には、図示しない真空ポン
プにより減圧されるようになつている。 A base material 1 is held by a base material holder 2, and a heater 3 heats the base material 1 to a predetermined temperature. The base material 1 is rotated by a motor (not shown). A water-cooled copper crucible 6 containing metal 5 as an evaporation source is installed below the base material 1. A nitrogen gas supply port 10 and an HCD type electron gun 8 are attached to the side wall of the vacuum container 4.
The electron gun 8 is provided with an introduction tube 9 for plasma argon gas. A focusing coil 7 is placed between the water-cooled copper crucible 6 and the electron gun 8, and the electron beam emitted from the electron gun 8 is focused and irradiated onto the metal 5 of the vapor source. The pressure inside the vacuum container 4 is reduced by a vacuum pump (not shown).
真空容器４内にアルゴンガスを導入し１×
10-2torr程度に減圧してボンバードにより、母材
１の表面のクリーニングを行う。 Introduce argon gas into the vacuum container 4 and
The surface of the base material 1 is cleaned by bombardment under reduced pressure to about 10 -2 torr.
つぎに、真空容器４内に窒素ガスを導入し、３
×10-3torr程度に減圧した後、HCD型電子銃８
により蒸発源の金属５を加熱し、蒸発させる。蒸
発した金属５は容器内の窒素と反応して、母材１
に金属窒化物の皮膜を形成する。 Next, nitrogen gas is introduced into the vacuum container 4, and 3
After reducing the pressure to about ×10 -3 torr, HCD type electron gun 8
The metal 5 serving as the evaporation source is heated and evaporated. The evaporated metal 5 reacts with the nitrogen in the container to form the base material 1.
A metal nitride film is formed on the surface.
呼び径×幅×厚さが、φ86mm×２×３のSKD−
61材のピストンリングを複数本重ねて母材１とし
て、下記の条件で反応性イオンプレーテイングを
実施した。 SKD- with nominal diameter x width x thickness of φ86mm x 2 x 3.
A plurality of piston rings made of 61 material were stacked together as base material 1, and reactive ion plating was performed under the following conditions.
母材温度： 400℃
ビーム出力： 30V−300A
収束電流： 150A
窒素ガス分圧： ３×10-3torr
蒸発源： 50wt％Cr−Ti合金
処理時間： 60分
この処理により、ピストンリングの外周摺動面
に、窒化クロムと窒化チタンからなる厚さが
40μmの複合皮膜が得られた。Base material temperature: 400℃ Beam output: 30V-300A Convergence current: 150A Nitrogen gas partial pressure: 3×10 -3 torr Evaporation source: 50wt% Cr-Ti alloy Treatment time: 60 minutes Through this treatment, the outer circumferential surface of the piston ring The dynamic surface has a thickness made of chromium nitride and titanium nitride.
A composite film of 40 μm was obtained.
（効 果）
比較のため、蒸発源に単体の金属チタンを用い
て実施例と同じ条件でイオンプレーテイングを行
つたが、複合皮膜の厚さは、10μm程度にしかな
らなかつた。(Effect) For comparison, ion plating was carried out under the same conditions as in the example using a single metal titanium as the evaporation source, but the thickness of the composite film was only about 10 μm.
本発明によるピストンリングは、ピストンリン
グの母材に近い部分に窒化クロムを多くして厚い
皮膜を短時間で形成し、摺動面部分には、硬度の
高い窒化チタンを多くして耐摩耗性、耐焼付性を
向上させている。窒化チタンの含有量は、摺動面
に向かつて連続的に増加しているため、窒化クロ
ムとの境界部分で剥離することもない。本発明の
ピストンリングは、耐摩耗性、耐焼付性にすぐれ
たピストンリングとして、エンジンの耐久性を向
上させるうえで顕著な効果を示す。 The piston ring according to the present invention has a large amount of chromium nitride in the part near the base material of the piston ring to quickly form a thick film, and the sliding surface part has a large amount of titanium nitride, which has high hardness, to provide wear resistance. , improving seizure resistance. Since the content of titanium nitride increases continuously toward the sliding surface, it does not peel off at the boundary with chromium nitride. The piston ring of the present invention exhibits a remarkable effect in improving the durability of an engine as a piston ring with excellent wear resistance and seizure resistance.
第１図に、本発明のピストンリングを示す。
図中、１……ピストンリング、２……複合皮膜
層。
第２図に、本発明の実施例のHCD型イオンプ
レーテイング装置の概要を示す。
図中、１……母材（ピストンリング）、２……
母材保持具、３……ヒーター、４……真空容器、
５……蒸発源の金属、６……水冷銅ルツボ、７…
…収束コイル、８……電子銃、９……アルゴンガ
ス導入口、１０……窒素ガス導入口。
FIG. 1 shows a piston ring of the present invention. In the figure, 1...piston ring, 2...composite film layer. FIG. 2 shows an outline of an HCD type ion plating apparatus according to an embodiment of the present invention. In the figure, 1...base material (piston ring), 2...
Base material holder, 3... heater, 4... vacuum container,
5...Evaporation source metal, 6...Water-cooled copper crucible, 7...
...Convergence coil, 8...Electron gun, 9...Argon gas inlet, 10...Nitrogen gas inlet.
Claims (1)
窒化クロムと窒化チタンからなる複合皮膜が形成
されていて、該複合皮膜がピストンリング母材表
面から複合皮膜表面へ向かつて、窒化チタンの比
率が連続的に増大していることを特徴とするピス
トンリング。1 At least on the outer peripheral sliding surface of the piston ring,
A piston characterized in that a composite film consisting of chromium nitride and titanium nitride is formed, and the ratio of titanium nitride increases continuously as the composite film moves from the surface of the piston ring base material to the surface of the composite film. ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2777386A JPS62188857A (en) | 1986-02-13 | 1986-02-13 | Piston ring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2777386A JPS62188857A (en) | 1986-02-13 | 1986-02-13 | Piston ring |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62188857A JPS62188857A (en) | 1987-08-18 |
| JPH0474584B2 true JPH0474584B2 (en) | 1992-11-26 |
Family
ID=12230292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2777386A Granted JPS62188857A (en) | 1986-02-13 | 1986-02-13 | Piston ring |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62188857A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015186790A1 (en) * | 2014-06-06 | 2015-12-10 | 株式会社リケン | Piston ring |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5521429A (en) * | 1993-11-25 | 1996-05-28 | Sanyo Electric Co., Ltd. | Surface-mount flat package semiconductor device |
| JP2005155460A (en) * | 2003-11-26 | 2005-06-16 | Sanyo Electric Co Ltd | Compressor |
| JP2005155459A (en) * | 2003-11-26 | 2005-06-16 | Sanyo Electric Co Ltd | Compressor |
| JP2005155458A (en) * | 2003-11-26 | 2005-06-16 | Sanyo Electric Co Ltd | Compressor |
| JP2005155461A (en) * | 2003-11-26 | 2005-06-16 | Sanyo Electric Co Ltd | Compressor |
| WO2014088096A1 (en) * | 2012-12-07 | 2014-06-12 | 株式会社リケン | Piston ring |
| CN118234948A (en) * | 2021-09-01 | 2024-06-21 | 东芝开利株式会社 | Compressor with a compressor body having a rotor with a rotor shaft |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5757868A (en) * | 1980-09-19 | 1982-04-07 | Toyota Motor Corp | Piston ring |
-
1986
- 1986-02-13 JP JP2777386A patent/JPS62188857A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5757868A (en) * | 1980-09-19 | 1982-04-07 | Toyota Motor Corp | Piston ring |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015186790A1 (en) * | 2014-06-06 | 2015-12-10 | 株式会社リケン | Piston ring |
| JP2015230086A (en) * | 2014-06-06 | 2015-12-21 | 株式会社リケン | Piston ring |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62188857A (en) | 1987-08-18 |
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| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |