JPH0474580U - - Google Patents
Info
- Publication number
- JPH0474580U JPH0474580U JP11634990U JP11634990U JPH0474580U JP H0474580 U JPH0474580 U JP H0474580U JP 11634990 U JP11634990 U JP 11634990U JP 11634990 U JP11634990 U JP 11634990U JP H0474580 U JPH0474580 U JP H0474580U
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- return
- header
- module
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002904 solvent Substances 0.000 claims description 15
- 238000007872 degassing Methods 0.000 claims description 7
- 238000004140 cleaning Methods 0.000 claims description 4
- 239000012528 membrane Substances 0.000 claims 3
- 238000011144 upstream manufacturing Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
添付図面は本考案の実施例を示し、第1図は全
体構図である。
図面中の符号は、1……溶剤循環系統、2……
溶剤、3……洗浄槽、4……循環ポンプ、5……
フイルタ、6……脱気モジユール、6a……一方
のヘツダー、6b……他方のヘツダー、7……超
音波発振器、8……超音波振動子、10……真空
吸引系統、11……真空ポンプ、12……溶剤戻
入系統、13……三方電磁弁、14……戻入タン
ク、15……電磁弁、16……戻入ポンプ、17
……一方のフロートスイツチ、18……他方のフ
ロートスイツチ、19……ワーク、をそれぞれ示
す。
The accompanying drawings show embodiments of the present invention, and FIG. 1 shows the overall composition. The symbols in the drawings are 1...solvent circulation system, 2...
Solvent, 3...Cleaning tank, 4...Circulation pump, 5...
Filter, 6... Degassing module, 6a... One header, 6b... Other header, 7... Ultrasonic oscillator, 8... Ultrasonic vibrator, 10... Vacuum suction system, 11... Vacuum pump , 12...Solvent return system, 13...Three-way solenoid valve, 14...Return tank, 15...Solenoid valve, 16...Return pump, 17
. . . one float switch, 18 . . . the other float switch, and 19 . . . workpiece.
Claims (1)
る洗浄槽3と、上記洗浄槽3の一方側から他方側
へ連なつている溶剤循環系統1と、上記溶剤循環
系統1に上流から下流に向けて配設されている循
環ポンプ4と、脱気モジユール6とより成り、上
記脱気モジユール6は、一方のヘツダー6aと他
方のヘツダー6b間に脱気膜より構成された中空
パイプ群が配設されていて、上記脱気膜より成る
中空パイプ群の外側に真空吸引系統10が連なつ
ていて、真空ポンプ11を駆動することによつて
、上記脱気モジユール6の一方のヘツダー6aか
ら他方のヘツダー6bへ流動する溶剤2の内、液
体成分は上記脱気モジユール6を流動せしめ、気
体成分を真空吸引系統10に吸引し、上記溶剤循
環系統1を循環する溶剤2の気体成分を脱気する
ようにした洗浄・バリ取り装置に於て; 上記脱気モジユール6と真空ポンプ11とを連
ねている真空吸引系統10の一部から溶剤戻入系
統12を分岐せしめ、上記溶剤戻入系統12の上
流から三方電磁弁13、戻入タンク14、戻入ポ
ンプ16を順次配設せしめ、上記真空ポンプ11
によつて、脱気モジユール6の一方のヘツダー6
aから他方のヘツダー6bへ流動する溶剤2中の
気体成分を吸引除去する時に、上記脱気モジユー
ル6の脱気膜を通過して真空吸引系統10を介し
て通過してくる溶剤2を一度戻入タンク14に貯
蔵せしめ、ある一定のレベルまで貯蔵した時に、
上記三方電磁弁13の通過系統をOFFとし、大
気開放口を開として、上記戻入タンク14内に溜
つた溶剤2中の気体成分を除去せしめると同時に
、他方の電磁弁15を開とし、戻入ポンプ16を
駆動せしめて上記戻入タンク14に溜つた一定量
の溶剤2を元の溶剤循環系統1へ戻入せしめるよ
うにしたことを特徴とする超音波洗浄・バリ取り
装置。[Claims for Utility Model Registration] A cleaning tank 3 from which ultrasonic waves from an ultrasonic vibrator 8 are emitted, a solvent circulation system 1 connected from one side of the cleaning tank 3 to the other side, and the solvent circulation The system 1 is composed of a circulation pump 4 and a deaeration module 6, which are arranged from upstream to downstream, and the deaeration module 6 is composed of a deaeration membrane between one header 6a and the other header 6b. A vacuum suction system 10 is connected to the outside of the hollow pipe group made of the degassing membrane, and by driving the vacuum pump 11, the degassing module 6 Of the solvent 2 flowing from one header 6a to the other header 6b, the liquid component flows through the degassing module 6, the gas component is sucked into the vacuum suction system 10, and the solvent circulates through the solvent circulation system 1. In a cleaning/deburring device designed to degas the gas component of No. 2; a solvent return system 12 is branched off from a part of the vacuum suction system 10 connecting the deaeration module 6 and the vacuum pump 11; A three-way solenoid valve 13, a return tank 14, and a return pump 16 are sequentially arranged from upstream of the solvent return system 12, and the vacuum pump 11
One header 6 of the degassing module 6
When the gas components in the solvent 2 flowing from a to the other header 6b are removed by suction, the solvent 2 that has passed through the degassing membrane of the degassing module 6 and through the vacuum suction system 10 is once returned. When stored in the tank 14 and stored up to a certain level,
The passage system of the three-way solenoid valve 13 is turned OFF and the atmosphere opening is opened to remove the gaseous components in the solvent 2 accumulated in the return tank 14. At the same time, the other solenoid valve 15 is opened and the return pump is opened. 16 is driven to return a certain amount of the solvent 2 accumulated in the return tank 14 to the original solvent circulation system 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11634990U JPH0474580U (en) | 1990-11-06 | 1990-11-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11634990U JPH0474580U (en) | 1990-11-06 | 1990-11-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0474580U true JPH0474580U (en) | 1992-06-30 |
Family
ID=31864168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11634990U Pending JPH0474580U (en) | 1990-11-06 | 1990-11-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0474580U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0772297A (en) * | 1993-09-06 | 1995-03-17 | Toray Eng Co Ltd | Method for treating radioactive supersonic cleaning fluid |
-
1990
- 1990-11-06 JP JP11634990U patent/JPH0474580U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0772297A (en) * | 1993-09-06 | 1995-03-17 | Toray Eng Co Ltd | Method for treating radioactive supersonic cleaning fluid |
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