JPH0474419U - - Google Patents

Info

Publication number
JPH0474419U
JPH0474419U JP11863590U JP11863590U JPH0474419U JP H0474419 U JPH0474419 U JP H0474419U JP 11863590 U JP11863590 U JP 11863590U JP 11863590 U JP11863590 U JP 11863590U JP H0474419 U JPH0474419 U JP H0474419U
Authority
JP
Japan
Prior art keywords
photoresist
photoresist liquid
viscosity
wafer
resist coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11863590U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11863590U priority Critical patent/JPH0474419U/ja
Publication of JPH0474419U publication Critical patent/JPH0474419U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
JP11863590U 1990-11-13 1990-11-13 Pending JPH0474419U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11863590U JPH0474419U (enrdf_load_stackoverflow) 1990-11-13 1990-11-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11863590U JPH0474419U (enrdf_load_stackoverflow) 1990-11-13 1990-11-13

Publications (1)

Publication Number Publication Date
JPH0474419U true JPH0474419U (enrdf_load_stackoverflow) 1992-06-30

Family

ID=31866582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11863590U Pending JPH0474419U (enrdf_load_stackoverflow) 1990-11-13 1990-11-13

Country Status (1)

Country Link
JP (1) JPH0474419U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200096149A (ko) * 2019-02-01 2020-08-11 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 처리 장치의 제어 방법 및 기억 매체

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200096149A (ko) * 2019-02-01 2020-08-11 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 처리 장치의 제어 방법 및 기억 매체
JP2020126886A (ja) * 2019-02-01 2020-08-20 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体

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