JPH0470871A - Image exposing method - Google Patents
Image exposing methodInfo
- Publication number
- JPH0470871A JPH0470871A JP18602090A JP18602090A JPH0470871A JP H0470871 A JPH0470871 A JP H0470871A JP 18602090 A JP18602090 A JP 18602090A JP 18602090 A JP18602090 A JP 18602090A JP H0470871 A JPH0470871 A JP H0470871A
- Authority
- JP
- Japan
- Prior art keywords
- potential
- image
- discharging gap
- respect
- discharge gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 10
- 108091008695 photoreceptors Proteins 0.000 claims description 12
- 239000012212 insulator Substances 0.000 claims description 6
- 230000005684 electric field Effects 0.000 claims description 2
- 238000007599 discharging Methods 0.000 abstract 6
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 8
- 230000014759 maintenance of location Effects 0.000 description 7
- 239000011800 void material Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
Landscapes
- Electrophotography Using Other Than Carlson'S Method (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は絶縁体上に静電画像を記録する画像露光方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an image exposure method for recording an electrostatic image on an insulator.
第6図は従来の静電画像記録方法を説明するための図で
ある。FIG. 6 is a diagram for explaining a conventional electrostatic image recording method.
支持体11上に透明電極12、光導電層13を形成した
感光体10と、支持体21上に電極22絶縁層23を形
成した電荷保持媒体20とを対向配置し、電極12.2
2間に電源30により所定極性の電圧を印加して画像露
光を行うと、露光された光導電層部分が導電性を示し、
その部分において感光体10と電荷保持媒体20との間
で放電が生じ、絶縁層23上に露光量に応じて、例えば
(〒)電荷が蓄積される。このとき光導電層13では露
光部分でキャリアが発生し、(−)電荷は透明電極I2
側へ移動し、(+)電荷が光導電層表面まで移動し、こ
の電荷に対応して光導電層表面には空中の電離した(−
)電荷が蓄積される。A photoreceptor 10 having a transparent electrode 12 and a photoconductive layer 13 formed on a support 11 and a charge holding medium 20 having an electrode 22 and an insulating layer 23 formed on a support 21 are arranged facing each other, and electrodes 12.2
When image exposure is performed by applying a voltage of a predetermined polarity between the two from the power source 30, the exposed photoconductive layer portion exhibits conductivity,
A discharge occurs between the photoreceptor 10 and the charge holding medium 20 in that portion, and charges (〒), for example, are accumulated on the insulating layer 23 according to the amount of exposure. At this time, carriers are generated in the exposed portion of the photoconductive layer 13, and (-) charges are transferred to the transparent electrode I2.
The (+) charge moves to the surface of the photoconductive layer, and corresponding to this charge, the ionized (-
) charge is accumulated.
ところで、絶縁体上に形成される静電荷量は放電ギャッ
プが変化すると変化してしまうので、放電ギャップは一
定に維持する必要がある。しかし、数μm〜数十μmの
間隙を常に一定な放電ギャップとすることは困難である
。また、露光部分だけでなく、実際には未露光部分も暗
電流により所定の電位が形成され、この部分の電位も放
電ギヤッブが変わると変化し、バックグラウンドの状態
が変化して画質に影響することになる。By the way, since the amount of static charge formed on the insulator changes when the discharge gap changes, it is necessary to maintain the discharge gap constant. However, it is difficult to maintain a constant discharge gap of several micrometers to several tens of micrometers. In addition, a predetermined potential is formed not only in the exposed area but also in the unexposed area due to dark current, and the potential of this area also changes when the discharge gear changes, changing the background condition and affecting the image quality. It turns out.
本発明は上記課題を解決するた約のもので、放電間隙の
ゆらぎに対し、電荷保持媒体上での電位のゆらぎを可能
な限り小さくてきる放電間隙を用いて画像露光し、放電
間隙のゆらぎによる画質の低下を防止することを目的と
する。The present invention is intended to solve the above-mentioned problems, and the present invention performs image exposure using a discharge gap that minimizes fluctuations in potential on a charge holding medium in response to fluctuations in the discharge gap. The purpose is to prevent deterioration of image quality due to
口課題を解決するだめの手段二
本発明は、感光体と絶縁体を電界中に配置し、画像露光
に伴う放電により絶縁体上に静電潜像を形成するように
した画像露光方法において、放電間隙に対する未露光部
及び/または露光部の像電位変化特性の極大値に対して
、未露光部及び/または露光部の像電位が所定電位差内
に収まる放電間隙を用いて画像露光することを特徴とす
る。Second Means for Solving the Problem The present invention provides an image exposure method in which a photoreceptor and an insulator are placed in an electric field, and an electrostatic latent image is formed on the insulator by discharge accompanying image exposure. Image exposure is performed using a discharge gap in which the image potential of the unexposed area and/or the exposed area falls within a predetermined potential difference with respect to the maximum value of the image potential change characteristic of the unexposed area and/or the exposed area with respect to the discharge gap. Features.
〔作用コ
本発明は電荷保持媒体上での露光部および未露光部の放
電間隙に対する像電位の変化特性が、それぞれすクツ−
くとも1つの極大値を有していることに着目し、未露光
部の極大電位に対して許容できる電位差内の放電間隙、
また露光部の極大電位に対して許容できる電位差内の放
電間隙において、画像露光するようにしたものである。[Function] The present invention is characterized in that the change characteristics of the image potential with respect to the discharge gap in the exposed area and the unexposed area on the charge holding medium are
Focusing on the fact that it has at least one maximum value, the discharge gap is within an allowable potential difference with respect to the maximum potential of the unexposed area,
Further, image exposure is performed in a discharge gap within an allowable potential difference with respect to the maximum potential of the exposed portion.
このような放電間隙を用いることにより、多少放電間隙
が変化しても、像電位は許容範囲内に収まり、放電間隙
の変化による画質の低下を防止することができる。By using such a discharge gap, even if the discharge gap changes somewhat, the image potential remains within an allowable range, and it is possible to prevent image quality from deteriorating due to a change in the discharge gap.
口実施例〕 以下、実施例を図面を参照して説明する。Mouth Example] Examples will be described below with reference to the drawings.
第1図は本発明の画像露光方法を説明するための図、第
2図は画像露光装置の構成を説明するための図、第3図
、第4図、第5図は感光体を変えた時の未露光部の放電
間隙に対する電位変化を示す図である。なお、第6図と
同一番号は同一内容を示している。Fig. 1 is a diagram for explaining the image exposure method of the present invention, Fig. 2 is a diagram for explaining the configuration of the image exposure device, and Figs. 3, 4, and 5 are for explaining the image exposure method of the present invention. FIG. 4 is a diagram illustrating a potential change with respect to a discharge gap in an unexposed area at a time. Note that the same numbers as in FIG. 6 indicate the same contents.
まず、第2図に示すように、感光体10の光導電層13
の膜厚をXp、放電間隙をXg、電荷保持層23の膜厚
をXdとし、感光体と電荷保持媒体への印加電圧をVg
とし、露光部の表面電位をVl、未露光部の表面電位を
Vdとすると、Cρ+Cd cp−
CdXp Xg Xdで
表わされる。ここに、Cρは光導電層容量、口gは空隙
容量、Ctlは電荷保持層容量、ε、は光導電層誘電率
、εは空隙誘電率、ε6は電荷保持層比誘電率、vbは
空隙がXgのときの放電開始電圧である。First, as shown in FIG. 2, the photoconductive layer 13 of the photoreceptor 10
The film thickness of is Xp, the discharge gap is Xg, the film thickness of the charge retention layer 23 is Xd, and the voltage applied to the photoreceptor and charge retention medium is Vg.
If the surface potential of the exposed part is Vl and the surface potential of the unexposed part is Vd, then Cρ+Cd cp-
It is expressed as CdXp Xg Xd. Here, Cρ is the photoconductive layer capacitance, g is the void capacitance, Ctl is the charge retention layer capacitance, ε is the photoconductive layer dielectric constant, ε is the void permittivity, ε6 is the charge retention layer relative permittivity, and vb is the void. is the discharge starting voltage when is Xg.
いま、感光層膜厚、電荷保持層膜厚をそれぞれ10μm
1印加電圧を750Vとした時、有機感光体の場合、感
光層比誘電率および電荷保持層比誘電率が3で、第3図
のような放電間隙に対する像電位の変化が得られる。Now, the photosensitive layer thickness and charge retention layer thickness are each 10 μm.
When the applied voltage is 750 V, in the case of an organic photoreceptor, the relative dielectric constant of the photosensitive layer and the relative dielectric constant of the charge storage layer are 3, and a change in image potential with respect to the discharge gap as shown in FIG. 3 can be obtained.
また、同様の条件でセレン感光体の場合、感光体層比誘
電率が7、電荷保持層比誘電率が3として、第4図のよ
うな放電間隙に対する像電位の変化が得られる。Further, in the case of a selenium photoreceptor under similar conditions, when the relative dielectric constant of the photoreceptor layer is 7 and the relative dielectric constant of the charge holding layer is 3, a change in image potential with respect to the discharge gap as shown in FIG. 4 can be obtained.
また、同じ条件でシリコン感光体の場合には、感光層比
誘電率が12、電荷保持煤層比誘電率が3で、第5図に
示すような像電位の変化が得られる。Further, in the case of a silicon photoreceptor under the same conditions, the photosensitive layer relative dielectric constant is 12, the charge retention soot layer relative dielectric constant is 3, and the image potential changes as shown in FIG. 5 are obtained.
第3図〜第5図から分かるように、未露光部、露光部と
もそれぞれ1つの極大電位(ただし、この例では最大電
位)を有し、その部分では比較的電位変化が緩やかであ
ることが分かる。したがって、極大電位付近では多少放
電間隙が変化しても像電位はそれほど変化しないことが
分かる。なお、この極大電位は印加電圧を変えれば変化
する。未露光部の電位が変化するとバックグラウンドが
変化することになるので、未露光部の電位は放電間隙に
対してt=るべく一定であることが望ましく、また露光
部の極大電位のゆらぎは、階調表現する場合には1階調
に相当する電位差内である必要がある。As can be seen from Figures 3 to 5, both the unexposed area and the exposed area each have one maximum potential (however, in this example, the maximum potential), and the potential change is relatively gradual in that area. I understand. Therefore, it can be seen that near the maximum potential, even if the discharge gap changes somewhat, the image potential does not change much. Note that this maximum potential changes by changing the applied voltage. If the potential of the unexposed area changes, the background will change, so it is desirable that the potential of the unexposed area is as constant as possible with respect to the discharge gap, and the fluctuation of the maximum potential of the exposed area is In the case of gradation expression, it is necessary that the potential difference is within the range corresponding to one gradation.
そこで、第1図に示すように、例えば未露光部の特性已
に対して極大、即ち最大電位に対する許容できる電位の
ゆらぎを61とし、この電位ゆらぎに対する放電ギャッ
プの変化範囲G1内の放電間隙で露光することができれ
ば未露光部の電位変化を許容範囲δ1内に収することが
できる。同様に露光部の特性への極大、即ち最大電位に
対して1階調の電位差に対する電位ゆらぎδ2内に収ま
る放電ギャップG2内の放電間隙で露光することができ
れば、許容範囲δ2内の電位ゆらぎに収めることが可能
である。Therefore, as shown in FIG. 1, for example, the allowable potential fluctuation with respect to the maximum potential, that is, the maximum potential with respect to the characteristic level of the unexposed area, is set to 61, and the discharge gap within the change range G1 of the discharge gap with respect to this potential fluctuation. If exposure is possible, the potential change in the unexposed area can be kept within the allowable range δ1. Similarly, if exposure can be performed at the discharge gap within the discharge gap G2 that falls within the potential fluctuation δ2 for a potential difference of one gradation with respect to the maximum potential, that is, the maximum potential, the potential fluctuation within the tolerance range δ2. It is possible to accommodate.
このように、本発明は放電間隙を01内、あるいはG2
内にするようにしたものである。最も望ましくはG1と
G2の両方を満足する放電間隙において画像露光すれば
未露光部、露光部とも許容範囲の電位ゆらぎに収約るこ
とができる。In this way, the present invention sets the discharge gap within 01 or within G2.
It was designed to be kept internally. Most preferably, if image exposure is performed in a discharge gap that satisfies both G1 and G2, potential fluctuations in both the unexposed and exposed areas can be kept within an acceptable range.
なお、画像露光は第2図の構成を対象に説明したが、光
導電層13上に絶縁層23を積層し、電極22と絶縁層
との間で放電を起ニさせるようにして画像形成するよう
な場合にも全く同様に未露光部、露光部の電位が決定さ
れるので、本発明を適用することが可能である。Although the image exposure has been explained with reference to the configuration shown in FIG. 2, the insulating layer 23 is laminated on the photoconductive layer 13, and the image is formed by causing discharge between the electrode 22 and the insulating layer. Even in such a case, the potentials of the unexposed area and the exposed area are determined in exactly the same way, so the present invention can be applied.
以上のように本発明によれば、放電間隙のゆらぎに対し
、未露光部及び/または露光部の電位変化を許容範囲内
に収めることができるので、高画質を得る画像露光を行
うことか可能となる。As described above, according to the present invention, it is possible to keep the potential change in the unexposed area and/or the exposed area within the permissible range in response to fluctuations in the discharge gap, so it is possible to perform image exposure to obtain high image quality. becomes.
第1図は本発明の画像露光方法を説明するための図、第
2図は画像露光を行うための構成を説明するための図、
第3図、第4図、第5図は感光体を変えた時の未露光部
の放!間隙に対する電位変化を示す図、第6図は従来の
静を画像記録方法を説明するための図である。
IO・・・感光体、13・・・光導電層、2o・・・電
荷保持媒体、23・・・絶縁層。
出 願 人 大日本印刷株式会社代理人 弁理士
蛭 川 昌 信(外7名)第3図
第4図FIG. 1 is a diagram for explaining the image exposure method of the present invention, FIG. 2 is a diagram for explaining the configuration for performing image exposure,
Figures 3, 4, and 5 show the emission of unexposed areas when changing photoreceptors! FIG. 6 is a diagram showing a potential change with respect to a gap, and is a diagram for explaining a conventional static image recording method. IO: Photoreceptor, 13: Photoconductive layer, 2o: Charge retention medium, 23: Insulating layer. Applicant Dai Nippon Printing Co., Ltd. Agent Patent Attorney Masanobu Hirukawa (7 others) Figure 3 Figure 4
Claims (1)
う放電により絶縁体上に静電潜像を形成するようにした
画像露光方法において、放電間隙に対する未露光部及び
/または露光部の像電位変化特性の極大値に対して、未
露光部及び/または露光部の像電位が所定電位差内に収
まる放電間隙を用いて画像露光することを特徴とする画
像露光方法。(1) In an image exposure method in which a photoreceptor and an insulator are placed in an electric field and an electrostatic latent image is formed on the insulator by discharge accompanying image exposure, the unexposed area and/or the exposed area in the discharge gap is 1. An image exposure method characterized by performing image exposure using a discharge gap in which the image potential of an unexposed area and/or an exposed area falls within a predetermined potential difference with respect to a maximum value of an image potential change characteristic of an area.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18602090A JPH0470871A (en) | 1990-07-12 | 1990-07-12 | Image exposing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18602090A JPH0470871A (en) | 1990-07-12 | 1990-07-12 | Image exposing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0470871A true JPH0470871A (en) | 1992-03-05 |
Family
ID=16180990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18602090A Pending JPH0470871A (en) | 1990-07-12 | 1990-07-12 | Image exposing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0470871A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5903296A (en) * | 1993-04-26 | 1999-05-11 | Dai Nippon Printing Co., Ltd. | Photoelectric sensor, information recording system and information recording and reproducing method |
-
1990
- 1990-07-12 JP JP18602090A patent/JPH0470871A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5903296A (en) * | 1993-04-26 | 1999-05-11 | Dai Nippon Printing Co., Ltd. | Photoelectric sensor, information recording system and information recording and reproducing method |
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