JPH0468359B2 - - Google Patents
Info
- Publication number
- JPH0468359B2 JPH0468359B2 JP33503088A JP33503088A JPH0468359B2 JP H0468359 B2 JPH0468359 B2 JP H0468359B2 JP 33503088 A JP33503088 A JP 33503088A JP 33503088 A JP33503088 A JP 33503088A JP H0468359 B2 JPH0468359 B2 JP H0468359B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- freon
- weight
- solvent
- dimethoxymethane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 claims description 28
- 239000002904 solvent Substances 0.000 claims description 17
- OHMHBGPWCHTMQE-UHFFFAOYSA-N 2,2-dichloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)C(Cl)Cl OHMHBGPWCHTMQE-UHFFFAOYSA-N 0.000 claims description 13
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 claims description 9
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 10
- 238000009835 boiling Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000007791 liquid phase Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011086 high cleaning Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000013020 steam cleaning Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5036—Azeotropic mixtures containing halogenated solvents
- C11D7/5068—Mixtures of halogenated and non-halogenated solvents
- C11D7/5077—Mixtures of only oxygen-containing solvents
- C11D7/5086—Mixtures of only oxygen-containing solvents the oxygen-containing solvents being different from alcohols, e.g. mixtures of water and ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/28—Organic compounds containing halogen
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
〔産業上の利用分野〕
本発明は、プリント基板のフラツクスやゴミの
除去および脱脂などに適した洗浄溶剤に関するも
のである。
〔従来の技術〕
従来、プリント基板の洗浄溶剤としては1,
1,2−トリクロロ−1,2,2−トリフルオロ
エタン(フロン113)、エタノールおよびニトロメ
タンから成る共沸混合溶剤(特開昭50−80983
号)、あるいはフロン113、メタノールおよびニト
ロメタンから成る共沸混合溶剤(特開昭51−
44575号)が広く使用されてきた。
しかしながら、上記の3成分系混合溶剤は必ず
しも満足し得る洗浄効果を発揮せず、しばしば白
色残渣やイオン性残渣が生じ、トラブルの原因と
なることがあつた。さらに、近年フロン113に代
る洗浄溶剤が望まれている。
〔発明が解決しようとする課題〕
本発明の目的は、フロン113を使用しないで、
フロン113用の洗浄装置がそのまま使用でき、し
かも高い洗浄力を有し、かつ被洗浄物に白色残渣
やイオン性残渣を生じさせない洗浄溶剤を提供す
ることである。
〔課題を解決するための手段〕
本発明は、1,1−ジクロロ−2,2,2−ト
リフルオロエタンとジメトキシメタンとから成る
ことを特徴とする洗浄溶剤である。
本発明の洗浄溶剤において混合する1,1−ジ
クロロ−2,2,2−トリフルオロエタン(以
下、フロン123という)とジメトキシメタンとの
混合割合は重量比で5:95〜70:30、好ましくは
40:60〜60:40である。フロン123の割合が5重
量部未満では洗浄効果が小さく、一方、70重量部
を越える場合は液相と気相の組成のずれが大きく
なるため、洗浄溶剤を繰返し使用できなくなると
いう問題を生じる。
本発明の洗浄溶剤は、フロン123とジメトキシ
メタンを前記混合割合で混合することにより製造
できるが、必要により他の溶剤、添加剤等を配合
することができる。
このようにして得られた洗浄溶剤は、一般の洗
浄の目的に使用できるが、特にプリント基板のフ
ラツクスやゴミの除去あるいは脱脂等に適してい
る。
本発明の洗浄溶剤は最高共沸点が43.9℃とフロ
ン113の沸点(47.6℃)に近いため、従来のフロ
ン113用洗浄装置をそのまま利用することができ
る。したがつて、本発明の洗浄溶剤による洗浄方
法は、浸漬法、スプレー法のほか、蒸気洗浄法、
あるいはこれらの組合せなど、従来よりこの種の
洗浄溶剤の洗浄方法として採用されている方法が
採用でき、この場合加熱、超音波照射等を行うこ
ともできる。
〔発明の効果〕
本発明により次のような洗浄溶剤を得ることが
できる。
フロン113を使用する必要がない。
フロン113用の洗浄装置がそのまま使用でき
る。
高い洗浄力を有し、かつ被洗浄物に白色残渣
やイオン性残渣を生じさせない。
〔実施例〕
次に、本発明の実施例について説明する。
実施例 1
還流器を備えたフラスコに、フロン123とジメ
トキシメタンとを50:50(重量比)の割合で混合
した混合液200グラムを入れ、ヒーターにより加
熱した。約30分後フラスコ内の液相の温度が安定
したところで、気相および液相の組成を分析し
た。
さらに、フロン123とジメトキシメタンとの混
合割合を、第1図の沸点曲線A上にプロツトした
点の割合となるように変えて上記操作を繰返して
気相と液相の組成を分析し、第1図の気液平衡線
図を作成した。第1図において、Aは沸点曲線、
Bは露点曲線を示す。
第1図から、本発明の洗浄溶剤はフロン123/
ジメトキシメタンとの混合割合が50/50重量%付
近で共沸点を示し、気−液相間の組成のずれがな
くなるという好ましい効果を持ち、さらに、最高
共沸組成物となるため室温付近に沸点があるフロ
ン123に比べ、沸点が約15℃上昇し、その取扱い
が容易になつている。また、フロン123の割合が
5〜70重量%の範囲でも、気−液相間の組成のず
れは少なく擬似共沸組成を示していることがわか
る。
実施例 2
1辺65mmの正方形のプリント基板に表1に示す
フラツクス60μを均一に塗布し、100℃まで予
備加熱した後、260℃のハンダ槽で2フイート/
分の速度でハンダ付けした。
ハンダ付け後のプリント基板を室温で1時間放
置した後、下記の条件で洗浄した。
洗浄液:フロン123(50重量部)/ジメトキシメ
タン(50重量部)混合溶剤
洗浄工程:沸騰浸漬(30秒)→超音波洗浄(60
秒)→蒸気洗浄(30秒)
洗浄後のプリント基板上の白色残渣を目視で、
またイオン性残渣をオメガメータ(ケンコ社製)
で測定した。結果を表1に示す。
比較例 1
フロン113(95.7重量部)/エタノール(3.8重
量部)/ニトロメタン(0.5重量部)の共沸混合
溶剤を用いて実施例2と同様の洗浄テストを行つ
た。結果を表1に示す。
[Industrial Field of Application] The present invention relates to a cleaning solvent suitable for removing flux and dirt from printed circuit boards, degreasing, and the like. [Prior art] Conventionally, as a cleaning solvent for printed circuit boards, 1,
Azeotropic mixed solvent consisting of 1,2-trichloro-1,2,2-trifluoroethane (Freon 113), ethanol and nitromethane (Japanese Patent Application Laid-open No. 50-80983
), or an azeotropic mixed solvent consisting of Freon 113, methanol and nitromethane (JP-A-51-
No. 44575) has been widely used. However, the above-mentioned three-component mixed solvent does not necessarily exhibit a satisfactory cleaning effect, and often produces a white residue or an ionic residue, which may cause trouble. Furthermore, in recent years, cleaning solvents that can replace Freon 113 have been desired. [Problem to be solved by the invention] The purpose of the present invention is to solve the problem without using Freon 113.
To provide a cleaning solvent that can be used as is in a cleaning device for Freon 113, has high cleaning power, and does not produce white residue or ionic residue on objects to be cleaned. [Means for Solving the Problems] The present invention is a cleaning solvent characterized by comprising 1,1-dichloro-2,2,2-trifluoroethane and dimethoxymethane. The mixing ratio of 1,1-dichloro-2,2,2-trifluoroethane (hereinafter referred to as Freon 123) and dimethoxymethane to be mixed in the cleaning solvent of the present invention is preferably 5:95 to 70:30 by weight. teeth
40:60 to 60:40. If the proportion of Freon 123 is less than 5 parts by weight, the cleaning effect will be small, while if it exceeds 70 parts by weight, the difference in composition between the liquid phase and the gas phase will become large, resulting in the problem that the cleaning solvent cannot be used repeatedly. The cleaning solvent of the present invention can be produced by mixing Freon 123 and dimethoxymethane at the above-mentioned mixing ratio, but other solvents, additives, etc. can be added if necessary. The cleaning solvent thus obtained can be used for general cleaning purposes, but is particularly suitable for removing flux and dirt from printed circuit boards, degreasing, and the like. Since the cleaning solvent of the present invention has a maximum azeotropic point of 43.9°C, which is close to the boiling point of Freon 113 (47.6°C), conventional cleaning equipment for Freon 113 can be used as is. Therefore, the cleaning method using the cleaning solvent of the present invention includes not only the immersion method and the spray method, but also the steam cleaning method,
Alternatively, methods conventionally employed as cleaning methods using this type of cleaning solvent, such as a combination of these, can be employed, and in this case, heating, ultrasonic irradiation, etc. can also be performed. [Effects of the Invention] According to the present invention, the following cleaning solvent can be obtained. There is no need to use Freon 113. The cleaning equipment for Freon 113 can be used as is. It has high cleaning power and does not leave white residue or ionic residue on the items being cleaned. [Example] Next, an example of the present invention will be described. Example 1 200 grams of a mixture of Freon 123 and dimethoxymethane at a ratio of 50:50 (weight ratio) was placed in a flask equipped with a reflux device and heated with a heater. After about 30 minutes, when the temperature of the liquid phase in the flask stabilized, the compositions of the gas phase and liquid phase were analyzed. Furthermore, the above operation was repeated by changing the mixing ratio of Freon 123 and dimethoxymethane to the ratio of the points plotted on the boiling point curve A in Figure 1, and the compositions of the gas phase and liquid phase were analyzed. The vapor-liquid equilibrium diagram shown in Figure 1 was created. In Figure 1, A is the boiling point curve;
B shows the dew point curve. From Figure 1, it can be seen that the cleaning solvent of the present invention is Freon 123/
It shows an azeotropic point when the mixing ratio with dimethoxymethane is around 50/50% by weight, which has the favorable effect of eliminating the compositional deviation between the gas and liquid phases.Furthermore, since it becomes the highest azeotropic composition, the boiling point is around room temperature. The boiling point is approximately 15°C higher than that of Freon 123, which is also available, making it easier to handle. Furthermore, it can be seen that even when the percentage of Freon 123 is in the range of 5 to 70% by weight, the compositional deviation between the gas and liquid phases is small and a pseudo-azeotropic composition is exhibited. Example 2 60 μ of the flux shown in Table 1 was evenly applied to a square printed circuit board with sides of 65 mm, and after preheating to 100°C, 2 feet/2 feet were coated in a soldering bath at 260°C.
I soldered it in minutes. After soldering, the printed circuit board was left at room temperature for 1 hour, and then washed under the following conditions. Cleaning liquid: Freon 123 (50 parts by weight)/Dimethoxymethane (50 parts by weight) mixed solvent Cleaning process: Boiling immersion (30 seconds) → Ultrasonic cleaning (60 seconds)
(seconds) → Steam cleaning (30 seconds) Visually check the white residue on the printed circuit board after cleaning.
Also, check the ionic residue using an omega meter (manufactured by Kenko).
It was measured with The results are shown in Table 1. Comparative Example 1 A cleaning test similar to that in Example 2 was conducted using an azeotropic solvent mixture of Freon 113 (95.7 parts by weight)/ethanol (3.8 parts by weight)/nitromethane (0.5 parts by weight). The results are shown in Table 1.
【表】【table】
第1図は実施例1のフロン123−ジメトキシメ
タン系の気液平衡線図であり、Aは沸点曲線、B
は露点曲線を示す。
FIG. 1 is a vapor-liquid equilibrium diagram of the Freon 123-dimethoxymethane system of Example 1, where A is the boiling point curve and B is the boiling point curve.
shows the dew point curve.
Claims (1)
ロエタンとジメトキシメタンとから成ることを特
徴とする洗浄溶剤。 2 1,1−ジクロロ−2,2,2−トリフルオ
ロエタンとジメトキシメタンとの混合割合が重量
比で5:95〜70:30である請求項1記載の洗浄溶
剤。[Claims] 1. A cleaning solvent comprising 1,1-dichloro-2,2,2-trifluoroethane and dimethoxymethane. 2. The cleaning solvent according to claim 1, wherein the mixing ratio of 1,1-dichloro-2,2,2-trifluoroethane and dimethoxymethane is 5:95 to 70:30 by weight.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33503088A JPH02178396A (en) | 1988-12-29 | 1988-12-29 | Cleaning solvent |
US07/454,265 US5068051A (en) | 1988-12-29 | 1989-12-21 | Cleaning solvent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33503088A JPH02178396A (en) | 1988-12-29 | 1988-12-29 | Cleaning solvent |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02178396A JPH02178396A (en) | 1990-07-11 |
JPH0468359B2 true JPH0468359B2 (en) | 1992-11-02 |
Family
ID=18283954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33503088A Granted JPH02178396A (en) | 1988-12-29 | 1988-12-29 | Cleaning solvent |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02178396A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4744848B2 (en) | 2004-11-05 | 2011-08-10 | 株式会社Adeka | Solvent composition |
JP4749040B2 (en) | 2005-06-09 | 2011-08-17 | 株式会社Adeka | Solvent composition |
-
1988
- 1988-12-29 JP JP33503088A patent/JPH02178396A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH02178396A (en) | 1990-07-11 |
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