JPH046624A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPH046624A JPH046624A JP10756190A JP10756190A JPH046624A JP H046624 A JPH046624 A JP H046624A JP 10756190 A JP10756190 A JP 10756190A JP 10756190 A JP10756190 A JP 10756190A JP H046624 A JPH046624 A JP H046624A
- Authority
- JP
- Japan
- Prior art keywords
- treatment
- ozone
- protective film
- lubricant
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000011282 treatment Methods 0.000 claims abstract description 71
- 230000001681 protective effect Effects 0.000 claims abstract description 45
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 44
- 239000000314 lubricant Substances 0.000 claims abstract description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims abstract description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000011737 fluorine Substances 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 239000003575 carbonaceous material Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 15
- 238000005507 spraying Methods 0.000 abstract description 9
- 239000000696 magnetic material Substances 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract 1
- 238000009832 plasma treatment Methods 0.000 description 11
- -1 polyethylene terephthalate Polymers 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000010702 perfluoropolyether Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- MEOSMFUUJVIIKB-UHFFFAOYSA-N [W].[C] Chemical compound [W].[C] MEOSMFUUJVIIKB-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 1
- ZZWPMWOTDZKVKK-UHFFFAOYSA-N 3,4,5-trifluorothiophene-2-carboxylic acid Chemical compound OC(=O)C=1SC(F)=C(F)C=1F ZZWPMWOTDZKVKK-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229910020598 Co Fe Inorganic materials 0.000 description 1
- 229910002519 Co-Fe Inorganic materials 0.000 description 1
- 229910020515 Co—W Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- BQPIYDUNTQHZBF-UHFFFAOYSA-N n,n-difluorocarbamoyl fluoride Chemical compound FN(F)C(F)=O BQPIYDUNTQHZBF-UHFFFAOYSA-N 0.000 description 1
- 229910001000 nickel titanium Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、電子機器等の情報記録に用いる磁気記録媒体
の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of manufacturing a magnetic recording medium used for recording information in electronic devices and the like.
[従来の技術]
磁気ディスク、磁気テープにおいては、基材上に磁性体
を塗布して記録を可能としている。記録された情報を外
部からの衝撃等から守るためには、磁性体上に保護膜を
設ける必要がある。しかし、記録・再生時に停止、摺動
を繰り返し行なうため、磁気ヘッドと保護膜との闇で摩
擦が生じ、保護膜が摩耗してしまう問題があった。これ
を防止するために、保護膜上に潤滑剤を塗布することが
行なわれているが、保護膜と潤滑剤との付着力が弱いた
めに、繰り返しの動作で潤滑剤が剥がれたり、はじいた
りするという新たな問題が生じた。その解決法として保
護膜に表面処理を施すことにより、表面を極性化するこ
とが行なわれている。例えば、特開昭62−15052
6では、カーボン保護膜にプラズマ処理を施しており、
又、特開昭63−2117では、蒸着層表面にプラズマ
処理、グロー処理、コロナ放電処理のいずれかを施して
いる。[Prior Art] In magnetic disks and magnetic tapes, recording is made possible by coating a magnetic material on a base material. In order to protect recorded information from external shocks, it is necessary to provide a protective film on the magnetic material. However, since stopping and sliding are repeated during recording and reproduction, friction occurs between the magnetic head and the protective film in the dark, resulting in wear of the protective film. To prevent this, lubricant is applied onto the protective film, but because the adhesion between the protective film and the lubricant is weak, the lubricant may peel off or repel due to repeated operations. A new problem arose. As a solution to this problem, the surface of the protective film is polarized by subjecting it to surface treatment. For example, JP-A-62-15052
6, the carbon protective film is subjected to plasma treatment,
Furthermore, in JP-A-63-2117, the surface of the vapor deposited layer is subjected to one of plasma treatment, glow treatment, and corona discharge treatment.
[発明が解決しようとする課題]
これら従来の方法は、真空装置あるいは高電圧を使うた
めV備が大きく作業が′4I維となり、しがも作業時間
が長くなる。又、潤滑剤の付着力も不十分であるという
開運があった。[Problems to be Solved by the Invention] These conventional methods use a vacuum device or a high voltage, so the voltage requirement is large, the work is tedious, and the work time is lengthened. In addition, the adhesion of the lubricant was also unsatisfactory.
本発明の目的は、設備が簡単であり0作業が短時間で行
なえ、尚かつ潤滑剤の付着性に優おる磁気記録媒体を得
ることにある。An object of the present invention is to obtain a magnetic recording medium that has simple equipment, can perform zero operation in a short time, and has excellent lubricant adhesion.
[課題を解決するための手段]
本発明は、磁性体を有する基材上に、炭素系、炭化水素
系あるいは、金属の炭化物、窒化物および酸化物を主成
分とする保護膜を形成し、その保護膜表面をUV、UV
+オゾン、UV+オゾン十水のいずれかで処理すること
により、表面を極性化し、フッ素系の潤滑剤との付着性
を向上させた磁気記録媒体の製造方法である。[Means for Solving the Problems] The present invention forms a protective film mainly composed of carbon-based, hydrocarbon-based, or metal carbides, nitrides, and oxides on a base material having a magnetic material, The surface of the protective film is exposed to UV light.
This is a method for manufacturing a magnetic recording medium in which the surface is polarized by treatment with either +ozone or UV+ozone to improve adhesion with a fluorine-based lubricant.
ここでUVlA11とは、波長150nm−400nm
のUV光を照射することであり、光源には低圧水銀ラン
プ、高圧水銀ランプ、超高圧水銀ランプ等を用い、照度
は30aw/cd以上、好ましくは10C)+W/aJ
以上とする。又、UVl−オゾン処理とは、上記の処理
と同時に、オゾンを吹き付ける方法である。オゾンは、
オゾナイザ−により発生させ、流量は1−10 Q /
win、濃度は10 g / rn’以上、好まし、く
け100g/m’以上とする。UV+オゾン+水処理と
は、UV+オゾン処理に加九て水蒸気を吹き付けること
である。水蒸気は、例えば。Here, UVlA11 means a wavelength of 150 nm to 400 nm.
A low-pressure mercury lamp, high-pressure mercury lamp, ultra-high-pressure mercury lamp, etc. is used as the light source, and the illumination intensity is 30 aw/cd or more, preferably 10 C) + W/aJ.
The above shall apply. Moreover, UVl-ozone treatment is a method of spraying ozone at the same time as the above treatment. Ozone is
Generated by an ozonizer, the flow rate is 1-10 Q/
win, the concentration is 10 g/rn' or more, preferably 100 g/m' or more. UV + ozone + water treatment means spraying water vapor in addition to UV + ozone treatment. For example, water vapor.
オゾンガスを水の入ったバブラーを経由させ、オゾンと
共に吹き付ける方法や、直接吹き付ける方法がある。処
理効果は、UV処理において従来のプラズマ処理に比し
て著しく能率良く発揮される。There are two methods: passing ozone gas through a bubbler filled with water and spraying it together with ozone, and spraying it directly. The treatment effect is significantly more efficient in UV treatment than in conventional plasma treatment.
UV処理よりも能率良く処理するためには、tJV+オ
ゾン処理が良く、さらに−層能率良く処理するためには
、UV+オゾン+水処理が有効である。For more efficient treatment than UV treatment, tJV+ozone treatment is better, and for more efficient treatment than UV treatment, UV+ozone+water treatment is effective.
上記の処理は、片面を行なう方法の他、磁気ディスク等
では基板の両面に同時に行なうこともできる。In addition to the method of performing the above-mentioned processing on one side, it is also possible to perform the above processing on both sides of the substrate at the same time in the case of a magnetic disk or the like.
本発明において、基材にはポリエチレンテレフタレート
、ポリエチレンナフタレート、ポリフェニレンサルファ
イド、ポリアミドイミド、ポリエステルイミド、ポリイ
ミド等の高分子フィルムや。In the present invention, the base material includes a polymer film such as polyethylene terephthalate, polyethylene naphthalate, polyphenylene sulfide, polyamideimide, polyesterimide, polyimide, etc.
AQおよびAQ合金、マイラ、セラミックス、ガラス等
のハード材を使用し、これらの上部に。Hard materials such as AQ and AQ alloy, mylar, ceramics, and glass are used on top of these.
Co−Ni−Zr、 Co−Ni−Ti 、 Co−
Ni−Pt、 Co−Ni−Cr、 Go−Ni
−Mo、 Co−N1−AQl Co−Cr−Ti、
Co−Cr−Pt、 Go−Cr、 Co−Al1
、Co −F e 、 Co −T a 、 Co
−Re 、Co −W、Co−Ru、Go−Mo等を成
分とする磁性体を塗布し磁性膜を形成する。Co-Ni-Zr, Co-Ni-Ti, Co-
Ni-Pt, Co-Ni-Cr, Go-Ni
-Mo, Co-N1-AQl Co-Cr-Ti,
Co-Cr-Pt, Go-Cr, Co-Al1
, Co-Fe, Co-Ta, Co
A magnetic film is formed by applying a magnetic material containing -Re, Co-W, Co-Ru, Go-Mo, etc. as components.
さらに、磁性膜上に保護膜をスパッタ法、真空蒸着法、
イオンブレーティング法、CVD法等により形成する。Furthermore, a protective film is applied on the magnetic film by sputtering, vacuum evaporation, or
It is formed by an ion blasting method, a CVD method, or the like.
保護膜には、炭素系、炭化水素系、金属の炭化物、窒化
物および酸化物があり、炭素系にはグラファイト状C、
ダイヤモンド状C1炭化水素系には水素含有アモルファ
スC1金属の炭化物にはB、C,WC,WNiC1金属
の窒化物には(TiV)N、(TiNb)N、(TiT
a)N、(ZrV)N、(ZrTa)N、(ZrW)N
、(WNb)N、(WCr)N、(NbCr)N、Nb
N、金属の酸化物にはAQ、03+ (ZrAn)O
l(ZrNb)O,ZrY−AQ○等がある。Protective films include carbon-based, hydrocarbon-based, metal carbides, nitrides, and oxides, and carbon-based materials include graphite-like C,
Diamond-like C1 hydrocarbon systems include hydrogen-containing amorphous C1 metal carbides with B, C, WC, WNiC1 metal nitrides with (TiV)N, (TiNb)N, and (TiT).
a) N, (ZrV)N, (ZrTa)N, (ZrW)N
, (WNb)N, (WCr)N, (NbCr)N, Nb
N, AQ for metal oxides, 03+ (ZrAn)O
There are l(ZrNb)O, ZrY-AQ○, etc.
上述の処理を施した保護膜上に、濃度0.1〜1%のフ
ッ素系の潤滑剤をデイツプ、スピンコード、スプレーコ
ート等により塗布する。フッ素系の潤滑剤としては分子
骨格中にフルオロカーボン骨格を有する化合物を用いる
ことができる。例えば、パーフルオロカルボン酸エステ
ル、パーフルオロチオールカルボン酸エステル、パーフ
ルオロジカルボン酸エステル、パーフルオロカルボン酸
パーフルオロアルキルエステル、パーフルオロ安息香酸
エステル、カルボン酸パーフルオロアルキルエステル、
ジカルボン酸パーフルオロアルキルエステル、カルボン
酸パーフルオロアルコキシアルキルエステル、パーフル
オロカルボン酸アミード、パーフルオロポリエーテル、
パーフルオロポリエリエーテルカルボン酸、パーフルオ
ロポリエーテルアルコール、パーフルオロポリエーテル
エステル等がある。A fluorine-based lubricant having a concentration of 0.1 to 1% is applied onto the protective film treated as described above by dip coating, spin cord coating, spray coating, or the like. As the fluorine-based lubricant, a compound having a fluorocarbon skeleton in its molecular skeleton can be used. For example, perfluorocarboxylic acid ester, perfluorothiol carboxylic acid ester, perfluorodicarboxylic acid ester, perfluorocarboxylic acid perfluoroalkyl ester, perfluorobenzoic acid ester, carboxylic acid perfluoroalkyl ester,
dicarboxylic acid perfluoroalkyl ester, carboxylic acid perfluoroalkoxyalkyl ester, perfluorocarboxylic acid amide, perfluoropolyether,
Examples include perfluoropolyether carboxylic acid, perfluoropolyether alcohol, and perfluoropolyether ester.
[作用]
上記の処理を行なうことにより、保護膜表面にケトン基
(=C=O) 、水酸基(−OH)、酸(−C○○H)
、過酸化物(EC○○H)等の極性基が効率良く形成さ
れる。これによって、潤滑剤の極性基が保護膜表面の極
性基と会合又は化学結合することが可能となり、保護膜
上への潤滑剤の付着性が向上する。[Effect] By performing the above treatment, ketone groups (=C=O), hydroxyl groups (-OH), and acids (-C○○H) are formed on the surface of the protective film.
, peroxide (EC○○H) and other polar groups are efficiently formed. This allows the polar groups of the lubricant to associate or chemically bond with the polar groups on the surface of the protective film, thereby improving the adhesion of the lubricant onto the protective film.
[実施例]
以下、本発明の具体的な実施例について詳細に説明する
。[Examples] Hereinafter, specific examples of the present invention will be described in detail.
実施例1 φ130mのAQ基板上に、N1−P、Cr。Example 1 N1-P, Cr on a φ130m AQ substrate.
Go−Ni−Zrを順次10us、420nm、50n
m形成し真空槽内に設置した。真空槽内を10−@To
rr以上の真空度にした後、アルゴンガス(ガス圧:
10mTo r r)を導入し、ターゲットにはグラフ
ァイトを用いてスパッタ法により、45n−の炭素系の
保護膜を形成した6次に、保護膜を極性化する処理とし
て、波長185nmおよび254n@、照度100mV
/ff1以上であるUV光を所定時間照射した(UV処
理)。又、上記の処理と同時に、基板上部より、流量3
Q/win、濃度100 g / m’以上であるオゾ
ンを吹き付は同様の処理を行なった(UV+オゾン処理
)。オゾンはオゾナイザ−(原料:酸素ガス、fi圧=
150v、電流:5A)により発生させた。UV+オゾ
ン処理において、オゾナイザ−でオゾンを発生後、ガラ
ス容器内に入れた純水中を通したものを。Go-Ni-Zr sequentially 10us, 420nm, 50n
m was formed and placed in a vacuum chamber. Inside the vacuum chamber 10-@To
After creating a vacuum level of rr or higher, argon gas (gas pressure:
A 45n carbon-based protective film was formed by sputtering using graphite as a target.Next, as a process to polarize the protective film, wavelengths of 185nm and 254n@, illumination intensity were 100mV
/ff1 or higher UV light was irradiated for a predetermined period of time (UV treatment). Also, at the same time as the above processing, a flow rate of 3
Q/win, the same treatment was performed for spraying ozone at a concentration of 100 g/m' or more (UV+ozone treatment). Ozone is produced using an ozonizer (raw material: oxygen gas, fi pressure =
150V, current: 5A). In UV + ozone treatment, ozone is generated with an ozonizer and then passed through pure water in a glass container.
保護膜表面に吹き付ける処理も行なった(UV+オゾン
+水処理)。A treatment was also performed by spraying the surface of the protective film (UV + ozone + water treatment).
一方、保護膜を極性化する処理の比較例として10−”
Torr以上の真空度に保った槽内に、保護膜を形成し
た基板を設置し、酸素ガス(ガス圧: 200mTo
r r)を導入し、0.15W/dの電力でプラズマ処
理を行なった。On the other hand, as a comparative example of the process of polarizing the protective film, 10-"
A substrate with a protective film formed thereon is placed in a tank maintained at a vacuum level of Torr or higher, and oxygen gas (gas pressure: 200 mTo
r r) was introduced, and plasma treatment was performed with a power of 0.15 W/d.
以上に述べた処理法について、処理直後の保護膜表面の
接触角を水を用いて測定すると、第1図に示すようにな
る。従来の方法であるプラズマ処理では、接触角が10
度前後までにしか下がらないのに対し、UV処理、UV
+オゾン処理、UV+オゾン+水処理では5度前後まで
下がっている。Regarding the treatment method described above, when the contact angle on the surface of the protective film immediately after treatment is measured using water, it is as shown in FIG. 1. In the conventional method of plasma treatment, the contact angle is 10
UV treatment, UV
With +ozone treatment and UV + ozone + water treatment, the temperature drops to around 5 degrees.
又、保護膜の接触角を10度以下にするのに、従来のプ
ラズマ処理方法では2分程度かかっていたが1本発明の
I;v処理、UV+オゾン処理、UV+オゾン手水処理
では3o秒程度で行なう二とができる。In addition, it took about 2 minutes to reduce the contact angle of the protective film to 10 degrees or less using the conventional plasma treatment method, but it took 30 seconds with the I;v treatment, UV + ozone treatment, and UV + ozone hand washing treatment of the present invention. I can do two things with a certain degree.
実施例2
保護膜表面に実施例1に示した処理と同様の各種処理(
実施例:UV処理、UV+オゾン処理、UV+オゾン+
水処理、比較例:プラズマ処理)を施した基板を、処理
後直ちに濃度0.3%の潤滑剤中に浸した。1分間浸し
た後フロン113中に3分間浸し余分な潤滑剤を取り除
いた。潤滑剤には、
F (CF−CF、−0)、−C2F4CH,−0HC
F、 (分子盆:約6000)を用いた。潤滑
剤を塗布した基板について、FT−IRにより潤滑剤の
膜厚を測定すると第2図に示したようになり、従来のプ
ラズマ処理方法では1.5〜2nmであった潤滑剤の膜
厚を、本発明のUV処理、UV+オゾン処理、UV+オ
ゾン+水処理を施すことによって3〜8nmにすること
ができる。Example 2 Various treatments similar to those shown in Example 1 were applied to the surface of the protective film (
Examples: UV treatment, UV + ozone treatment, UV + ozone +
A substrate subjected to water treatment (comparative example: plasma treatment) was immediately immersed in a lubricant with a concentration of 0.3% after the treatment. After soaking for 1 minute, it was soaked in Freon 113 for 3 minutes to remove excess lubricant. Lubricants include F (CF-CF, -0), -C2F4CH, -0HC
F, (molecular tray: approximately 6000) was used. When the lubricant film thickness was measured using FT-IR on a substrate coated with lubricant, it was as shown in Figure 2.The lubricant film thickness was 1.5 to 2 nm using conventional plasma processing methods, but the lubricant film thickness was measured using FT-IR. The wavelength can be reduced to 3 to 8 nm by applying the UV treatment, UV + ozone treatment, or UV + ozone + water treatment of the present invention.
実施例3
保護膜が炭素系、タングステン−炭素系、チタンーチッ
素系の場合と、潤滑剤が
I F (CF−CF、−〇)。−〇2F4CH2−
○HCF□ (分子量:約6000)II
F (CF−CF、−0)、−02F、C○0HCF
3 (分子量:約6000)III C,F2
O−(C,F、O)、C,F、−C○○C,H。Example 3 In the case where the protective film is carbon-based, tungsten-carbon-based, or titanium-nitrogen-based, and the lubricant is IF (CF-CF, -〇). -〇2F4CH2-
○HCF□ (Molecular weight: approx. 6000) II
F (CF-CF, -0), -02F, C○0HCF
3 (Molecular weight: approx. 6000) III C, F2
O-(C,F,O), C,F, -C○○C,H.
(分子量:約4000)
の場合それぞれの組合せにおいて各処理法での膜厚を測
定した。保護膜の形成法は、炭素系の保護膜については
実施例1と同様の方法で行ない、タングステン−炭素系
2チタンーチツ素系保護膜は。(molecular weight: approximately 4000), the film thickness was measured for each treatment method in each combination. The protective film was formed in the same manner as in Example 1 for the carbon-based protective film, and for the tungsten-carbon-based dititanium-titanium-based protective film.
実施例1と同様に磁性膜を形成したAQ基板を真空層内
に設置し、10−’Torr以上の真空度に保った槽内
に、混合比1:1のアルゴンガスとチッ素ガスとの混合
ガス(ガス圧:10mTorr)を導入し、32にW/
rrl’の電力をかけスパッタ法により45n+sの保
護膜を形成した。これらの基板それぞれに実施例1で示
した処理と同様のUV処理、Uv+オゾン処理、Uv+
オゾン+水処理、及び、プラズマ処理を5分間施し、実
施例2と同様の方法で潤滑剤1.II、■を塗布し膜厚
を測定した。第1表に示したように、本発明に係るUV
処理、UV+オゾン処理、Uv+オゾン+水処理を施し
た保護膜は、比較例のプラズマ処理を施した保護膜に比
し、潤滑剤の付着膜厚が著しく大きくなる。尚保護膜の
成分の違いあるいは潤滑剤の成分の違いによる変化はほ
とんど見られない。An AQ substrate on which a magnetic film was formed in the same manner as in Example 1 was placed in a vacuum layer, and a mixture of argon gas and nitrogen gas at a mixing ratio of 1:1 was placed in a tank maintained at a vacuum level of 10-' Torr or higher. Introduce mixed gas (gas pressure: 10 mTorr) and turn W/ to 32.
A protective film of 45n+s was formed by sputtering with a power of rrl' applied. Each of these substrates was subjected to UV treatment, UV+ ozone treatment, and Uv+ treatment similar to the treatment shown in Example 1.
Ozone + water treatment and plasma treatment were performed for 5 minutes, and lubricant 1. II and ■ were applied and the film thickness was measured. As shown in Table 1, the UV according to the present invention
The protective film subjected to the treatment, UV + ozone treatment, UV + ozone + water treatment has a significantly larger lubricant adhesion film thickness than the protective film subjected to the plasma treatment of the comparative example. It should be noted that almost no changes were observed due to differences in the components of the protective film or the components of the lubricant.
又、炭素系の保護膜と潤滑剤Iの組合せについて、C8
S (Contact−8tart−8top)試験を
IOK回行なった時のC3S−接線力を求めたところ、
比較例のプラズマ処理では5〜6gfであるのに対し、
本発明のUV処理、UV+オゾン処理、UV+オゾン+
水処理では、2〜4gfとなった。以上の結果からも、
本発明の処理法により保護膜と潤滑剤の付着性が向上し
たことは明らかである。Regarding the combination of carbon-based protective film and lubricant I, C8
When the C3S-tangential force was calculated when the S (Contact-8tart-8top) test was performed IOK times,
In contrast to the plasma treatment of the comparative example, which was 5 to 6 gf,
UV treatment of the present invention, UV + ozone treatment, UV + ozone +
Water treatment resulted in 2-4 gf. From the above results,
It is clear that the treatment method of the present invention improves the adhesion between the protective film and the lubricant.
第1表
[発明の効果]
本発明によれば、
単位:
磁気記録媒体の保護膜にUV
処理、UV+オゾン処理、UV+オゾン+水処理のいず
れかを施すことにより、真空系を使用しない簡易な設備
で、保護膜表面と潤滑剤との付着性を著しく向上するこ
とができる。これにより、磁気記録媒体実働時に、磁気
記録媒体と磁気ヘッドとの潤滑が円滑になり、磁気記録
媒体の信頼性向上、長寿命化を達成できる。Table 1 [Effects of the Invention] According to the present invention, unit: By subjecting the protective film of a magnetic recording medium to UV treatment, UV + ozone treatment, or UV + ozone + water treatment, a simple method that does not use a vacuum system can be achieved. The equipment can significantly improve the adhesion between the protective film surface and the lubricant. This facilitates lubrication between the magnetic recording medium and the magnetic head during actual operation of the magnetic recording medium, thereby achieving improved reliability and longer life of the magnetic recording medium.
第1図は、各処理方法についての処理時間と水の接触角
との関係を示すグラフ、第2図は、各処理方法について
の処理時間と潤滑剤の膜厚との関係を示すグラフである
。
符号の説明
1・・・UV処理、2・・・UV+オゾン処理、3・・
・UV+オゾン+水処理、4川プラズマ処理。
処理時間
(n+in)Figure 1 is a graph showing the relationship between treatment time and water contact angle for each treatment method, and Figure 2 is a graph showing the relationship between treatment time and lubricant film thickness for each treatment method. . Explanation of symbols 1...UV treatment, 2...UV+ozone treatment, 3...
・UV + ozone + water treatment, 4 river plasma treatment. Processing time (n+in)
Claims (1)
を紫外線(以下、UVと称す。)処理、UV+オゾン処
理、UV+オゾン+水処理のいずれかを施した後、フッ
素系の潤滑剤を塗布した磁気記録媒体の製造方法。 2、前記保護膜が炭素系材料あるいは炭化水素系材料を
主成分としていることを特徴とする請求項1記載の磁気
記録媒体の製造方法。 3、前記保護膜が金属の炭化物、窒化物および酸化物を
主成分としていることを特徴とする請求項1記載の磁気
記録媒体の製造方法。[Claims] 1. A magnetic film and a protective film are provided on a base material, and the surface of the protective film is subjected to one of ultraviolet (hereinafter referred to as UV) treatment, UV + ozone treatment, UV + ozone + water treatment. A method for producing a magnetic recording medium in which a fluorine-based lubricant is applied after applying a fluorine-based lubricant. 2. The method of manufacturing a magnetic recording medium according to claim 1, wherein the protective film is mainly composed of a carbon-based material or a hydrocarbon-based material. 3. The method of manufacturing a magnetic recording medium according to claim 1, wherein the protective film contains a metal carbide, nitride, or oxide as a main component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10756190A JPH046624A (en) | 1990-04-25 | 1990-04-25 | Production of magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10756190A JPH046624A (en) | 1990-04-25 | 1990-04-25 | Production of magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH046624A true JPH046624A (en) | 1992-01-10 |
Family
ID=14462297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10756190A Pending JPH046624A (en) | 1990-04-25 | 1990-04-25 | Production of magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH046624A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6299946B1 (en) | 1999-03-17 | 2001-10-09 | Fujitsu Limited | Method of manufacturing a recording medium |
US6949301B2 (en) | 2000-09-28 | 2005-09-27 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic recording medium, the manufacturing method and magnetic recording apparatus using the same |
-
1990
- 1990-04-25 JP JP10756190A patent/JPH046624A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6299946B1 (en) | 1999-03-17 | 2001-10-09 | Fujitsu Limited | Method of manufacturing a recording medium |
US6949301B2 (en) | 2000-09-28 | 2005-09-27 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic recording medium, the manufacturing method and magnetic recording apparatus using the same |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5409738A (en) | Recording medium | |
JPH046624A (en) | Production of magnetic recording medium | |
JP2006114182A (en) | Magnetic recording medium and its manufacturing method | |
WO2006019176A1 (en) | Magnetic recording medium and production process thereof | |
JPH031322A (en) | Magnetic recording medium and its production | |
JPH0528478A (en) | Production and device for magnetic recording medium | |
JP2006085890A (en) | Magnetic recording medium and production method thereof | |
KR100244059B1 (en) | Magnetic recording medium and method for producing the same | |
JPS6130671A (en) | Hard carbon film | |
JP7292671B2 (en) | Method for manufacturing magnetic recording medium | |
JPH04114317A (en) | Magnetic disk and production thereof | |
WO2006103828A1 (en) | Method of manufacturing magnetic recording medium, magnetic recording medium and surface treatment apparatus | |
JPH08180363A (en) | Magnetic recording medium and its production | |
JPH06215367A (en) | Production of magnetic recording medium | |
JP2003301257A (en) | Method for forming carbonaceous film and method for manufacturing magnetic disc | |
JPS62264423A (en) | Magnetic recording medium | |
JPS61216124A (en) | Production of magnetic recording medium | |
JPH08167139A (en) | Magnetic recording medium | |
JP2548231B2 (en) | Method of manufacturing magnetic recording medium | |
JPH0449522A (en) | Magnetic disk, its production and production device | |
JP3317054B2 (en) | Manufacturing method of magnetic recording medium | |
JP2004055060A (en) | Manufacturing method of magnetic recording medium | |
JPH08124142A (en) | Magnetic recording medium and its production | |
JPH06325357A (en) | Magnetic disk | |
JPS63113924A (en) | Magnetic recording medium |