JPH0464800A - Fluid supply and feed pipe body - Google Patents

Fluid supply and feed pipe body

Info

Publication number
JPH0464800A
JPH0464800A JP17274590A JP17274590A JPH0464800A JP H0464800 A JPH0464800 A JP H0464800A JP 17274590 A JP17274590 A JP 17274590A JP 17274590 A JP17274590 A JP 17274590A JP H0464800 A JPH0464800 A JP H0464800A
Authority
JP
Japan
Prior art keywords
gas
pipe
fluid
passage
outflow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17274590A
Other languages
Japanese (ja)
Other versions
JP2516830B2 (en
Inventor
Chikakuni Yabumoto
籔本 周邦
Yukio Komine
行雄 小峰
Naoki Kawamura
川村 直毅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP2172745A priority Critical patent/JP2516830B2/en
Publication of JPH0464800A publication Critical patent/JPH0464800A/en
Application granted granted Critical
Publication of JP2516830B2 publication Critical patent/JP2516830B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To prevent fluid from staying and keep a predetermined quantity of flow constantly by connecting the forward end of an inner pipe on the downstream side of fluid supply and feed with a fluid outflow passage, and providing a fluid outflow side aperture part in part of the upstream side in the fluid supply and feed direction. CONSTITUTION:A pipe body 10 is composed of a small diameter inner pipe 11 forming a gas introducing passage 11a and an outer pipe 12 forming a gas outflow passage 12a. The passages 11a, 12a formed by the inner and outer pipe 11, 12 are connected with each other at a forward end part 11b on the downstream side of the inner pipe 11 in the gas supply and feed direction, gas introduced into the inner pipe 11 flows into the gas outflow passage 12a on the outer pipe 12 side thorough the forward end part 11b to flow in it to the upstream side inversely to the gas supply and feed direction, and it flows out through an outflow passage 16a in an outflow pipe 16 connected with a gas outflow side aperture part 15 to be extended from the part facing a passage end part. Fluid can thus be sent keeping a predetermined flow constantly without staying.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ガス給送用の配管系などにおいてガス溜まり
等を生じ易い流路部分等に配設し該流路内でガスを常に
流れ状態に保つことによりガスの純度を維持することが
可能となる流体給送用管体に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a method for disposing a gas in a piping system for gas supply, etc., in a flow path where gas accumulation is likely to occur, so that gas constantly flows within the flow path. The present invention relates to a fluid feeding pipe that can maintain the purity of gas by maintaining the same condition.

〔従来の技術〕[Conventional technology]

たとえばガス給送用の配管系において配管中を給送する
ガスの純度を維持するためには、該配管による流路内で
のデッドスペースをなくすとよいことが周知である。し
かし、種々のガス給送用配管系においてこれを構造上か
ら見ると、上述したようなデッドスペースとなる部分を
生じることを避けられない場合が多い。
For example, it is well known that in order to maintain the purity of the gas fed through the piping in a piping system for gas supply, it is better to eliminate dead space in the flow path of the piping. However, when looking at various gas supply piping systems from a structural perspective, it is often unavoidable to create dead spaces as described above.

すなわち、ガス給送用配管系においてガスを給送するた
めの主通路を形成する主配管にあっては、その配管設備
面から将来の配管増設等を配慮して、該主配管1の途中
に、第6図に示されるように、増設配管接続用の分岐管
2を、先端側を閉塞した状態で予め付設しておくことか
望まれている。そして、このような配管構造では、ガス
は主配管1内の主通路中を給送方向に沿って順次流れる
ものの、上述した増設配管接続用分岐管2内で分岐部か
ら閉塞部までの分岐通路内は主通路から見てデッドスペ
ースとなるものであり、この分岐通路内に、ガス溜まり
等が生じることを避けられないものであった。
In other words, when it comes to the main piping that forms the main passage for supplying gas in the gas supply piping system, in consideration of future piping expansion etc. from the perspective of piping equipment, it is necessary to As shown in FIG. 6, it is desired that a branch pipe 2 for connecting an additional pipe be attached in advance with the distal end thereof closed. In such a piping structure, gas flows sequentially in the main passage in the main piping 1 along the feeding direction, but in the branch pipe 2 for connecting the extension piping mentioned above, the gas flows through the branch passage from the branch part to the blockage part. The inside of the branch passage is a dead space when viewed from the main passage, and it is unavoidable for gas to accumulate in this branch passage.

また、たとえば微量のガスを主配管1側から被利用側機
器3に選択的に給送するガス給送系にあっては、第7図
に示されるように、該主配管1の被利用側機器3への流
入部分に、ガスの給送量を微小制御する可変微小流量調
整バルブ4等を設けることが一般に行われているが、こ
の調整バルブ4の流入側直前の主配管1による主通路部
分には、該バルブ4が閉状態であったり、制御流量が微
小であったりしたときに、ガス溜まりを生じるものであ
り、デッドスペースと路間等の状態となる部分であった
In addition, for example, in a gas supply system that selectively supplies a small amount of gas from the main piping 1 side to the equipment 3 on the usage side, as shown in FIG. It is common practice to provide a variable minute flow rate adjustment valve 4 or the like for minutely controlling the amount of gas supplied at the inflow part to the device 3. When the valve 4 is in a closed state or the controlled flow rate is small, gas accumulates in this part, and the part becomes a dead space and a path.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところで、上述したようなデッドスペース部分を有する
ガス給送系において、前者のように主配管1の途中に、
先端側が閉塞されている分岐管2を有してなるものでは
、該分岐管2内での行き止まり通路の存在によって、た
とえば配管時に該管2内通路に含まれた大気成分や該管
2部分で生じる脱ガス成分等が、主配管1内の主通路中
に流れ込み、たとえ純度の高いガスを供給しても、いつ
までたってもガスが純化されないという欠点を生じてし
まうものであった。
By the way, in a gas supply system having a dead space portion as described above, there is
In a device having a branch pipe 2 whose tip end is closed, the existence of a dead-end passage within the branch pipe 2 may prevent atmospheric components contained in the passage within the pipe 2 during piping or the portion of the pipe 2. The resulting degassed components flow into the main passage within the main pipe 1, resulting in the disadvantage that even if highly purified gas is supplied, the gas will not be purified for any length of time.

また、後者のような可変微小流量調整バルブ4を用いて
なるガス給送系においても、該バルブ4直前部分に、ガ
ス溜まりが生じることから、バルブ4を開けて微小流量
を流す際に、該ガスの純度が損なわれる虞れがあり、実
用上で問題であった。
In addition, even in a gas supply system using a variable minute flow rate adjustment valve 4 like the latter, gas accumulation occurs immediately before the valve 4, so when opening the valve 4 to allow a minute flow rate to flow, There is a possibility that the purity of the gas may be impaired, which is a problem in practical use.

さらに、この後者のガス給送系にあっては、給送すべき
ガスの純化を行なうにために、ガス配管系全体を何度か
真空引きしたり、該バルブ4の直前までのガスの充填を
繰り返すといった作業が一般に行われているが、このよ
うなガスの純化方法では、次のような二つの欠点を生じ
てしまうものであった。
Furthermore, in this latter gas supply system, in order to purify the gas to be supplied, the entire gas piping system is evacuated several times, and the gas is filled up to just before the valve 4. However, this gas purification method has the following two drawbacks.

すなわち、その一つは、超高真空や超高純度ガスを満た
した配管系に、ガスを純化するために、純化させていな
いガスを流さなければならないという相反する行為を必
要とし、クリーンな系を汚染させる原因となってしまう
という欠点を生じることである。
In other words, one of them requires the contradictory act of flowing unpurified gas into a piping system filled with ultra-high vacuum or ultra-high purity gas in order to purify the gas. This has the disadvantage that it may cause contamination.

また、もう一つは、純化直後はクリーンなガスを給送で
きるが、時間の経過と共に、配管部分からの脱ガス現象
によってガスの純度が低下するという欠点を生じること
である。
Another problem is that although clean gas can be supplied immediately after purification, as time passes, the purity of the gas decreases due to degassing from the piping.

特に、上述したガス給送系にあっては、該主配管1から
の水分の発生をある程度は避けられないもので、水分を
問題とするガス給送系では影響が大きく、このような不
具合を一掃し得る何らかの対策を講じることが望まれて
いる。
In particular, in the gas supply system mentioned above, the generation of moisture from the main pipe 1 is unavoidable to some extent, and in gas supply systems where moisture is a problem, the influence is large, and it is important to avoid such malfunctions. It is hoped that some kind of countermeasure will be taken to eradicate it.

勿論、この種の流体給送系における問題は、ガス以外の
流体にあっても、同様に問題を生じる虞れがあり、この
ような点をも配慮し何らかの対策を講じることが望まれ
る。
Of course, the problems in this type of fluid supply system may also occur with fluids other than gas, and it is desirable to take some kind of countermeasures in consideration of these points.

〔課題を解決するための手段〕[Means to solve the problem]

このような要請に応えるために本発明に係る流体給送用
管体は、流体導入用の内管とその外側に流体流出通路を
形成する流体流出用の外管とからなる二重管構造を有し
、かつ内管の流体給送方向下流側の先端を、外管による
流体流出通路に連通させるとともに、この流体流出通路
の流体給送方向上流側の一部に、流体流出側開口部を設
けるようにしたものである。
In order to meet such demands, the fluid feeding pipe according to the present invention has a double pipe structure consisting of an inner pipe for introducing fluid and an outer pipe for fluid outflow that forms a fluid outflow passage outside the inner pipe. The downstream end of the inner pipe in the fluid feeding direction is communicated with the fluid outflow passage formed by the outer pipe, and a fluid outflow side opening is provided in a part of the fluid outflow passage on the upstream side in the fluid feeding direction. It was designed to be provided.

〔作用〕[Effect]

本発明によれば、流体導入用通路と流体流出通路とが内
、外管による二重管構造によって構成しており、該内管
の流体給送方向下流側での先端部が臨む部分を、この部
分で内管側と連通している外管側の流体流出通路の存在
によって、流体を、滞留させることなく、常に所要の流
通量をもって流通させることが可能で、これにより従来
問題であった流体溜まりによるデッドスペース問題をな
くし、その結果として流体給送系全体にわたっての高純
度な流体の給送を、適切かつ確実に行なえる。
According to the present invention, the fluid introduction passage and the fluid outflow passage are constituted by a double pipe structure including an inner pipe and an outer pipe, and the portion facing the distal end of the inner pipe on the downstream side in the fluid feeding direction is Due to the existence of the fluid outflow passage on the outer tube side that communicates with the inner tube side in this part, it is possible to always circulate the fluid at the required flow rate without stagnation, which has solved the problem of conventional methods. Dead space problems caused by fluid accumulation are eliminated, and as a result, high-purity fluid can be appropriately and reliably fed throughout the fluid delivery system.

〔実施例〕〔Example〕

以下、本発明を図面に示した実施例を用いて詳細に説明
する。
Hereinafter, the present invention will be explained in detail using embodiments shown in the drawings.

第1図は本発明に係る流体給送用管体の一実施例を示す
概念図であって、本実施例では、給送流体としてガスを
用いてなるガス給送系に本発明を適用した場合を説明す
る。
FIG. 1 is a conceptual diagram showing an embodiment of a fluid supply pipe according to the present invention. In this embodiment, the present invention is applied to a gas supply system using gas as the supply fluid. Explain the case.

図において全体を符号10で示すものは、本発明を特徴
づける二重管構造によるガス給送用管体で、この管体1
0は、ガスを供給源から導入するガス導入用通路11a
を形成する小径な内管11と、その外側に嵌装して配置
され該内管11の外側にガス流出通路12aを形成する
外管12とによって構成されている。ここで、該内管1
1におけるガス給送方向上流側部分は、拡径部13にて
該外管12と同一径をもち主配管側の主通路と連通され
る連通路14aを形成する配管14の内壁部に連設され
、これにより外管12によって形成されるガス流出通路
12aはこの部分が終端部として形成されている。そし
て、これら内、外管11.12によって形成される通路
11a、12aは、内管11のガス給送方向下流側の先
端部分(llb)において連通状態とされ、かつ内管1
1内に導入されたガスは、該先端部分11bを介して外
管12側のガス流出通路12aに流入し、かつ該通路1
2a内を、ガス給送方向とは逆にその上流側に流れ、か
つ前記内管11上流側の拡径部13にて仕切られた通路
終端部分に臨んで該外管12に開口して形成されている
ガス流出側開口部15からこの部分に連設されている流
出側配管16内の流出通路16aを経て流出されるよう
に構成されている。
In the figure, what is designated as a whole by the reference numeral 10 is a gas supply pipe body with a double pipe structure that characterizes the present invention, and this pipe body 1
0 is a gas introduction passage 11a that introduces gas from a supply source.
It is composed of a small-diameter inner tube 11 that forms a small diameter inner tube 11, and an outer tube 12 that is fitted on the outside of the inner tube 11 and forms a gas outflow passage 12a on the outside of the inner tube 11. Here, the inner tube 1
The upstream portion in the gas feeding direction in 1 is connected to the inner wall portion of the pipe 14 that has the same diameter as the outer pipe 12 at the enlarged diameter portion 13 and forms a communication passage 14a that communicates with the main passage on the main pipe side. As a result, this portion of the gas outflow passage 12a formed by the outer tube 12 is formed as a terminal portion. The passages 11a and 12a formed by these inner and outer tubes 11 and 12 are in communication with each other at the downstream end portion (llb) of the inner tube 11 in the gas feeding direction.
The gas introduced into the passage 1 flows into the gas outlet passage 12a on the outer tube 12 side via the tip portion 11b, and flows into the passage 1.
2a, the gas flows toward the upstream side in the opposite direction to the gas feeding direction, and is formed by opening into the outer tube 12 facing the end portion of the passage partitioned by the enlarged diameter portion 13 upstream of the inner tube 11. The gas is configured to flow out from the outflow side opening 15, which is located in the air, through an outflow passage 16a in an outflow side piping 16 connected to this part.

ここで、上述した内、外管11.12の径寸法や長さ寸
法等は、該管体10を付設する部分のガス給送系でのガ
ス流やガス溜まりの条件によって、適宜自由に設定する
とよいものである。
Here, the diameter dimensions, length dimensions, etc. of the inner and outer tubes 11 and 12 described above can be freely set as appropriate depending on the conditions of gas flow and gas accumulation in the gas supply system where the tube body 10 is attached. That's a good thing.

このような本発明に係る二重管構造による管体10を、
主配管1から分岐される増設配管接続用分岐管2部分に
適用した場合を、第2図に示しており、このような管体
10を付設することで、従来問題であった分岐管2内の
行き止まり通路でのガス溜まりを解消し、主配管1に対
してのデッドスペースを解消することが可能となる。す
なわち、上述した管体10を付設することで、分岐管2
内を常に少量のガスを流すことが可能で、その結果とし
て高純度のガスを主配管J、内の主通路を順次給送し、
必要部位へ供給することが可能となる。
The tube body 10 having such a double tube structure according to the present invention,
Fig. 2 shows a case where the application is applied to the branch pipe 2 section for connecting an extension pipe branched from the main pipe 1. By attaching such a pipe body 10, the inside of the branch pipe 2, which has been a problem in the past, can be solved. It becomes possible to eliminate gas accumulation in the dead-end passage and eliminate dead space with respect to the main pipe 1. That is, by attaching the pipe body 10 described above, the branch pipe 2
It is possible to constantly flow a small amount of gas inside the pipe, and as a result, high-purity gas is sequentially fed through the main passage inside the main pipe J.
It becomes possible to supply it to the necessary parts.

ここで、図中17は分岐管2の先端に管体10を接続す
るフランジ部、18は管体10において内管11のガス
給送方向下流側の先端部分を、外管12側の通路12a
と連通した状態で僅かな間隙をおいて閉塞する蓋体、1
9は該ガス流出通路12からのガスを流出する流出側配
管16の途中に設けられた流量計で、上述した管体10
を付設することによるガスの流出量を、該流量計19で
監視し、かつ所要量に調節し得るような構成とされてい
る。この場合、本発明による管体10を付設することに
よるガスの流出量は、内、外管11.12の径寸法等を
調節したり、あるいは前記流I計19を調節したりする
ことで、調節し得るものである。なお、上述した流出配
管16により流出されるガスの取り扱いとしては、その
下流側をドレンに接続して排気してもよいし、主配管1
やガス供給源等に還流させるように接続してもよいこと
は明らがであろう。
Here, in the figure, 17 is a flange portion that connects the tube body 10 to the tip of the branch tube 2, 18 is a flange portion that connects the tube body 10 to the tip of the branch tube 2, and 18 is the tip portion of the tube body 10 on the downstream side in the gas feeding direction of the inner tube 11, and the passage 12a on the outer tube 12 side.
a lid body that is closed with a slight gap in communication with the body, 1
Reference numeral 9 denotes a flow meter installed in the middle of the outflow side pipe 16 through which gas flows out from the gas outflow passage 12, and is connected to the above-mentioned pipe body 10.
The flow meter 19 monitors the amount of gas flowing out by attaching the gas flow meter 19, and is configured to adjust the amount to the required amount. In this case, the amount of gas flowing out by attaching the pipe body 10 according to the present invention can be adjusted by adjusting the diameters of the inner and outer pipes 11, 12, or by adjusting the flow I meter 19. It is adjustable. Note that the gas flowing out through the above-mentioned outflow pipe 16 may be handled by connecting the downstream side to a drain and exhausting it, or by connecting the downstream side of the gas to a drain, or by using the main pipe 1
It goes without saying that it may also be connected to a gas supply source or the like for reflux.

さらに、上述した構成では、この管体10を取り外すこ
とで、分岐管2を利用して新たにラインを増設すること
は自由に行なえるものである。
Furthermore, in the above-described configuration, by removing the pipe body 10, it is possible to freely add a new line using the branch pipe 2.

このような増設配管接続用分岐管2に本発明による二重
管構造の管体10を付設した場合と従来のように行き止
まり通路である場合における窒素ガス中の酸素濃度の時
間変化を、主配管1の下流側で測定した結果を、第3図
に示しており、従来の場合は、図中aで示す特性から明
らかなように、酸素濃度が時間と共に僅かに減少してお
り、しかもそのレベルが100PPbであるのに対して
、本発明の場合には、図中すで示す特性から明らかなよ
うに、1/100ppdのレベルで推移しており、本発
明に係る二重管構造による管体10を用いることで、ガ
ス中での不純物濃度を抑えられることは、容易に理解さ
れよう。
The change in oxygen concentration in nitrogen gas over time in the case where the pipe body 10 of the double pipe structure according to the present invention is attached to the branch pipe 2 for connecting the extension pipe and in the case where the pipe body 10 is a dead-end passage as in the conventional case is compared with the main pipe. Figure 3 shows the results measured downstream of 1. In the conventional case, as is clear from the characteristic indicated by a in the figure, the oxygen concentration decreased slightly over time, and the level is 100PPb, whereas in the case of the present invention, as is clear from the characteristics already shown in the figure, it changes at a level of 1/100 ppd, and the pipe body with the double pipe structure according to the present invention It will be easily understood that by using No. 10, the concentration of impurities in the gas can be suppressed.

第4図は可変微小流量調整バルブ4を設けてなるガス給
送系において、該バルブ4が閉塞されていたり、極めて
微小な流量に制御されている場合に、該バルブ4の直前
にガス溜まりが生じ、配管からの脱ガスによる不純物の
混入を避けることができないという問題を解決するため
に、該バルブ4の直前に、本発明を特徴づける二重管構
造の管体10を介在させて設けた場合を示している。
FIG. 4 shows that in a gas supply system equipped with a variable minute flow rate adjustment valve 4, when the valve 4 is closed or the flow rate is controlled to an extremely minute level, a gas accumulation occurs immediately before the valve 4. In order to solve the problem of unavoidable contamination of impurities due to degassing from the piping, a pipe body 10 with a double pipe structure, which characterizes the present invention, is provided immediately before the valve 4. It shows the case.

ここで、このようなバルブ4でのガス溜まりは、実際、
Eバルブボディ内のバルブシート部に臨む流入側通路部
分に生じることから、本発明による管体10における内
管1】の先端部分11bのみを、図示は省略したが、バ
ルブボディ内でバルブシート部に近接する部分にまで延
設させ、その周囲でボディとの間に形成される通路空間
を、ボディ外側に連設される外管12による通路12a
の一部として利用し、前述した実施例と同様に、ガス流
を生じさせるような構成とするとよいものである。
Here, such gas accumulation at valve 4 is actually
E Since this occurs in the inlet side passage facing the valve seat in the valve body, only the tip portion 11b of the inner tube 1 in the tube body 10 according to the present invention is not shown, but it is located in the valve seat in the valve body. A passage 12a formed by the outer tube 12 connected to the outside of the body
It is preferable to use it as a part of the gas flow and create a gas flow similar to the above-mentioned embodiment.

そして、このような構成によれば、バルブシート部直前
で従来ガス溜まりを生じていた部分に、ガスの流れを常
時生じさせることが可能で、これにより配管からの脱ガ
スをガス流によって運び去って流出させることが可能で
ある。したがって、バルブ4の直前には何時でも高純度
のガスが流入しており、これによりバルブ4を開けて微
小量のガスを供給する際に、利用機器側に常に高純度の
ガスを供給し得るものである。特に、このような可変微
小流量調整バルブ4を有してなるガス給送系において、
該バルブ4のバルブシート部直前まで二重管構造による
管体10の内管11先端部を臨ませておくことで、該シ
ート部に常に新鮮で純度の高いガスを流しておくことが
できるため、たとえ微小量のガスを流通させるための給
送系においても、必要とされる高純度のガスを供給する
ことが、適切かつ確実に行なえる。
According to such a configuration, it is possible to constantly generate a gas flow in the area in front of the valve seat where gas has conventionally accumulated, and this allows degassing from the piping to be carried away by the gas flow. It is possible to drain it out. Therefore, high-purity gas always flows in just before the valve 4, so that when the valve 4 is opened to supply a minute amount of gas, high-purity gas can always be supplied to the equipment being used. It is something. In particular, in a gas supply system having such a variable minute flow rate adjustment valve 4,
By exposing the tip of the inner tube 11 of the tube body 10 having a double tube structure until just before the valve seat of the valve 4, fresh and highly purified gas can always flow through the seat. Even in a feeding system for distributing a minute amount of gas, the required high purity gas can be appropriately and reliably supplied.

ここで、このような二重管構造の管体10を用いた本発
明による場合と従来例の場合とにおいて、超高真空中に
酸素ガスを流したときの特性を、第5図に示している。
Here, FIG. 5 shows the characteristics when oxygen gas is flowed in an ultra-high vacuum in the case of the present invention using the tube body 10 with such a double tube structure and in the case of a conventional example. There is.

これを簡単に説明すると、該特性図において縦軸は分圧
、横軸は時間であり、該特性はガス流の目的としている
酸素(02)と不純物となる水分(H2O)を同時に示
している。なお、図中Cはバルブ4の開弁時間、dは本
発明による管体1oを用いた場合に酸素をI X 10
 ”Torr流したときの水分量を、eは従来例の場合
に同量の酸素を流したときの水分量である。また、該酸
素ガスを流す前には、I X 10 ”Torr程度の
超高真空においても、酸素や水分は図中に示される程度
の極微量は存在する。
To explain this simply, in this characteristic diagram, the vertical axis is partial pressure and the horizontal axis is time, and this characteristic simultaneously shows oxygen (02), which is the target of the gas flow, and moisture (H2O), which is an impurity. . In the figure, C is the opening time of the valve 4, and d is the oxygen I
The amount of water when flowing at a Torr is the amount of water when the same amount of oxygen is flowing in the conventional case.Before flowing the oxygen gas, Even in high vacuum, trace amounts of oxygen and moisture exist as shown in the figure.

そして、従来のものでは、酸素の流れと共に、水分も1
0倍以上に増加してしまうのに対して、本発明を採用し
たものでは、はとんど水分量を増加させずに、酸素ガス
を流せることが容易に理解されよう。
In the conventional method, along with the flow of oxygen, water also flows to 1
It will be easily understood that in contrast to the case where the amount of water increases by more than 0 times, in the case where the present invention is adopted, oxygen gas can be flowed without increasing the amount of water at all.

したがって、以上の構成による二重管構造による管体1
0によれば、ガス導入用通路11aとガス流出通路12
aとが内、外管11.12による二重管構造によって構
成されており、該内管11のガス給送方向下流側での先
端部11bが臨む部分を、この部分で内管11側と連通
している外管12側のガス流出通路12aの存在によっ
て、ガスを、滞留させることなく、常に所要の流通量を
もって流通させることが可能で、これにより従来問題で
あったガス溜まりによるデッドスペース問題をなくし、
その結果としてガス給送系全体にわたっての高純度な流
体の給送を、適切かつ確実に行なえることになる。
Therefore, the pipe body 1 having the double pipe structure with the above configuration
According to 0, the gas introduction passage 11a and the gas outflow passage 12
a has a double pipe structure with inner and outer pipes 11 and 12, and the part facing the tip 11b on the downstream side in the gas supply direction of the inner pipe 11 is called the inner pipe 11 side at this part. Due to the existence of the gas outflow passage 12a on the communicating outer tube 12 side, it is possible to always circulate the gas at the required flow rate without causing it to stagnate, thereby eliminating the dead space caused by gas accumulation, which was a problem in the past. eliminate problems,
As a result, high-purity fluid can be appropriately and reliably fed throughout the gas feeding system.

なお、本発明は上述した実施例構造に限定されず、二重
管構造の管体10各部の形状、構造等を、適宜変形、変
更することは自由で、またその適用個所としても、上述
した実施例に限定されないことも言うまでもない。
Note that the present invention is not limited to the structure of the embodiment described above, and the shape, structure, etc. of each part of the tube body 10 of the double-pipe structure may be modified and changed as appropriate, and the application points may also be the same as those described above. It goes without saying that the invention is not limited to the examples.

たとえば上述した実施例において、微量のガスを流し続
けたい場合は、ガス導入側の内管11の径を細くし、微
量のガスしか流れないように構成しておけばよいもので
あり、このようにすると、第4図に示す実施例において
バルブ4を設けてガス量を絞る必要はなくなる。さらに
、この第4図に示す実施例において、流出側配管16の
下流側に、たとえば各種の純化材を有する純化部を介し
てガス供給側に接続し、ガスを還流させて再使用するよ
うに構成してもよいものである。
For example, in the embodiment described above, if it is desired to keep a small amount of gas flowing, it is sufficient to reduce the diameter of the inner pipe 11 on the gas introduction side so that only a small amount of gas can flow. In this case, there is no need to provide the valve 4 to throttle the gas amount in the embodiment shown in FIG. Furthermore, in the embodiment shown in FIG. 4, the downstream side of the outflow pipe 16 is connected to the gas supply side via a purification section having various purification materials, so that the gas is refluxed and reused. It may be configured.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明に係る流体給送用管体によれ
ば、流体導入用の内管とその外側に流体流出通路を形成
する流体流出用の外管とからなる二重管構造を有し、か
つ内管の流体給送方向下流側の先端を、外管による流体
流出通路に連通させるとともに、この流体流出通路の流
体給送方向上流側の一部に、流体流出側開口部を設ける
ようにしたので、簡単かつ安価な構成にもかかわらず、
流体導入用の内管の流体給送方向下流側での先端部が臨
む部分を、この部分で内管側と連通している外管側の流
体流出通路の存在によって、流体を、滞留させることな
く、常に所要の流通量をもって流通させることが可能で
、これによりガス中に不純物等が混入して純度が損なわ
れるといつな問題を防止でき、常に高純度のガスを給送
し得るという種々優れた効果がある。
As explained above, the fluid feeding pipe according to the present invention has a double pipe structure consisting of an inner pipe for introducing fluid and an outer pipe for fluid outflow that forms a fluid outflow passage outside the inner pipe. The downstream end of the inner tube in the fluid feeding direction is communicated with the fluid outflow passage formed by the outer tube, and a fluid outflow side opening is provided in a part of the fluid outflow passage on the upstream side in the fluid feeding direction. Despite the simple and inexpensive configuration,
The fluid is retained in the part of the inner pipe for fluid introduction facing the downstream end in the fluid feeding direction by the presence of a fluid outflow passage on the outer pipe side that communicates with the inner pipe side at this part. This allows the gas to be distributed at the required flow rate at all times, thereby preventing problems such as impurities entering the gas and impairing its purity, and ensuring that high-purity gas is always supplied. It has excellent effects.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る流体給送用管体の一実施例を示す
概略構成図、第2図は本発明を増設配管接続用分岐管部
分に適用した場合の概略構成図、第3図はその酸素濃度
の時間変化を示す特性図、第4図は本発明を可変微小流
量調整バルブ直前の流路中に設けた場合の概略構成図、
第5図は酸素ガスを流した場合の酸素分圧と水分分圧の
時間変化を示す特性図、第6図および第7図は従来構造
を説明するためのガス給送系の概略図である。 1・・・・主配管、2・・・・分岐管、4・−・・可変
微小流量調整バルブ、10・・・・二重管構造による管
体、11・・・・内管、lla・・・・ガス導入用通路
、12・・・・外管、12a・・・・ガス流出通路、1
5・・・・ガス流出側開口部、16・・・・ガス流出側
配管。 特許出願人 日本電信電話株式会社
FIG. 1 is a schematic configuration diagram showing an embodiment of a fluid supply pipe body according to the present invention, FIG. 2 is a schematic configuration diagram when the present invention is applied to a branch pipe section for connecting an extension pipe, and FIG. 3 is a characteristic diagram showing the time change of the oxygen concentration, and FIG. 4 is a schematic configuration diagram when the present invention is installed in the flow path immediately before the variable minute flow rate adjustment valve.
Fig. 5 is a characteristic diagram showing the temporal changes in oxygen partial pressure and moisture partial pressure when oxygen gas is flowing, and Figs. 6 and 7 are schematic diagrams of a gas supply system to explain the conventional structure. . 1... Main piping, 2... Branch pipe, 4... Variable minute flow rate adjustment valve, 10... Pipe body with double pipe structure, 11... Inner pipe, lla... ...Gas introduction passage, 12...Outer tube, 12a...Gas outflow passage, 1
5...Gas outflow side opening, 16...Gas outflow side piping. Patent applicant Nippon Telegraph and Telephone Corporation

Claims (1)

【特許請求の範囲】[Claims]  流体導入用の内管とその外側に流体流出通路を形成す
る流体流出用の外管とからなる二重管構造を有し、かつ
前記内管の流体給送方向下流側の先端を、前記外管によ
る流体流出通路に連通させるとともに、この流体流出通
路の前記流体給送方向上流側の一部に、流体流出側開口
部を設けたことを特徴とする流体給送用管体。
It has a double pipe structure consisting of an inner pipe for introducing fluid and an outer pipe for fluid outflow forming a fluid outflow passage outside the inner pipe, and the downstream end of the inner pipe in the fluid feeding direction is connected to the outer pipe. What is claimed is: 1. A fluid feeding pipe body, characterized in that it communicates with a fluid outflow passage formed by a pipe and is provided with a fluid outflow side opening in a part of the upstream side of the fluid outflow passage in the fluid feeding direction.
JP2172745A 1990-07-02 1990-07-02 Fluid feeding pipe Expired - Fee Related JP2516830B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2172745A JP2516830B2 (en) 1990-07-02 1990-07-02 Fluid feeding pipe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2172745A JP2516830B2 (en) 1990-07-02 1990-07-02 Fluid feeding pipe

Publications (2)

Publication Number Publication Date
JPH0464800A true JPH0464800A (en) 1992-02-28
JP2516830B2 JP2516830B2 (en) 1996-07-24

Family

ID=15947537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2172745A Expired - Fee Related JP2516830B2 (en) 1990-07-02 1990-07-02 Fluid feeding pipe

Country Status (1)

Country Link
JP (1) JP2516830B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088300A (en) * 1983-10-19 1985-05-18 Shinwa Control Kk Piping system in water flowing system and method of preventing stagnation in said piping system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088300A (en) * 1983-10-19 1985-05-18 Shinwa Control Kk Piping system in water flowing system and method of preventing stagnation in said piping system

Also Published As

Publication number Publication date
JP2516830B2 (en) 1996-07-24

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