JPH0459605B2 - - Google Patents

Info

Publication number
JPH0459605B2
JPH0459605B2 JP57217770A JP21777082A JPH0459605B2 JP H0459605 B2 JPH0459605 B2 JP H0459605B2 JP 57217770 A JP57217770 A JP 57217770A JP 21777082 A JP21777082 A JP 21777082A JP H0459605 B2 JPH0459605 B2 JP H0459605B2
Authority
JP
Japan
Prior art keywords
protective substrate
polarizing plate
solvent
organic solvent
metal roll
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57217770A
Other languages
Japanese (ja)
Other versions
JPS59109004A (en
Inventor
Shigeyoshi Sugibuchi
Juji Sasaki
Michio Sato
Mitsuo Hiramatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanritsu Electric
Original Assignee
Sanritsu Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanritsu Electric filed Critical Sanritsu Electric
Priority to JP57217770A priority Critical patent/JPS59109004A/en
Publication of JPS59109004A publication Critical patent/JPS59109004A/en
Publication of JPH0459605B2 publication Critical patent/JPH0459605B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Description

【発明の詳細な説明】 この発明は表示体の鮮明度が優れた無反射偏光
板及びその製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a non-reflective polarizing plate with excellent display clarity and a method for manufacturing the same.

一般に、偏光板はポリビニルアルコール
(PVA)にヨウ素又染料を吸着させてなる偏光素
子(偏光膜)をトリアセチルセルロース、ジアセ
チルセチルイセルロース、アセテートブチレーセ
ルロース等のセルロース系プラスチツクを主とす
る保護基板に貼着して構成される。
Generally, a polarizing plate is a polarizing element (polarizing film) made by adsorbing iodine or dye to polyvinyl alcohol (PVA) and a protective substrate mainly made of cellulose plastic such as triacetylcellulose, diacetylcetylycellulose, acetate butyrate cellulose, etc. It is configured by pasting it on.

この偏光板を液晶表示装置に装着して種々の産
業分野において数値、文字、記号、模様その他の
表示用としては広く使用されている。すなわち、
液晶偏光板は液晶セルを中心にその上面および下
面に装着される。一般に、透過型では、上面は表
面凹凸のない光透過性のよいもの、又は光による
表面反射光を緩和させるために無反射加工を施し
た偏光板が用いられる。下面の偏光板は透過型に
おいて、上記同様に透明性のよいもの、又は表面
に微細粒子を蒸着等により光透過性を極端に低く
した半透過反射板付偏光板が、反射型では完全に
光透過しないアルミ箔又はアルミ等の蒸着反射板
と組み合わせた偏光板が用いられている。
This polarizing plate is mounted on a liquid crystal display device and is widely used in various industrial fields to display numerical values, characters, symbols, patterns, and the like. That is,
The liquid crystal polarizing plate is attached to the upper and lower surfaces of the liquid crystal cell. In general, in the transmission type, the top surface is a surface with good light transmission without unevenness, or a polarizing plate that has been subjected to anti-reflection processing to reduce surface reflection light. The lower polarizing plate is a transmissive type with good transparency like the above, or a polarizing plate with a semi-transparent reflector whose surface has extremely low light transmittance by vapor deposition of fine particles on the surface, whereas a reflective type has a polarizing plate with a semi-transparent reflector that completely transmits light. A polarizing plate is used in combination with a vapor-deposited reflective plate made of aluminum foil or aluminum, etc.

しかし、現在使用されている偏光板外層のセル
ロース系プラスチツク保護基板は殆ど表面が平滑
であるため、表面における拡散反射が少なく、外
光が鏡面反射して表示体の読み取りに困難を来し
ているのが現状である。
However, most of the cellulose plastic protective substrates currently used for the outer layer of polarizing plates have smooth surfaces, so there is little diffuse reflection on the surface, and external light is specularly reflected, making it difficult to read the display. is the current situation.

従来、かかる透明光学部材に対する外光反射を
防止する方法としては、(1)部材表面に微粒子状の
無機物例えば二酸化珪素(SiO2)、ガラス、酸化
ジルコニウム等を真空蒸着して反射防止膜を形成
する方法、(2)シリカ、酸化チタン、酸化アルミニ
ウム等の光拡散性粉末を混合した透明樹脂を溶融
又は溶媒に溶解塗布して部材表面にれらの無機物
の粒子皮膜を形成させる方法、(3)ガラス板表面を
弗化水素により侵蝕して微細な凹凸を形成させた
型ガラスにプラスチツクを注入重合させる所謂注
型法による方法、(4)直接プラスチツク板表面に金
剛砂、シリカ、ガラス等の粉末を吹き付ける所謂
サンドブラスト法によつて微細な凹凸を形成させ
る方法等が知られている。
Conventionally, methods for preventing the reflection of external light on such transparent optical members include (1) forming an antireflection film by vacuum-depositing particulate inorganic materials such as silicon dioxide (SiO 2 ), glass, zirconium oxide, etc. on the surface of the member; (2) A method in which a transparent resin mixed with a light-diffusing powder such as silica, titanium oxide, or aluminum oxide is melted or dissolved in a solvent and coated to form a particle film of these inorganic substances on the surface of the member. (3) ) A method using the so-called casting method in which plastic is injected and polymerized into a molded glass whose glass plate surface has been eroded with hydrogen fluoride to form fine irregularities; (4) Powder of diamond sand, silica, glass, etc. is directly applied to the surface of the plastic plate. A method is known in which fine irregularities are formed by a so-called sandblasting method.

しかし、上記(1)及び(2)の方法は耐久性及び耐湿
熱性に乏しく、基材表面に形成した反射防止膜又
は粒子被膜が経時的に剥離し易いため、使用範囲
も限定され偏光板の保護基板の保護板の処理には
不適である。(3)の注型法はアクリル樹脂等の重合
注型可能なプラスチツクに限定され、偏光板の保
護基板に使用されるセルロース系樹脂には適用し
得ない。
However, methods (1) and (2) above have poor durability and resistance to heat and humidity, and the antireflection film or particle film formed on the surface of the base material tends to peel off over time, so the range of use is limited, and the use of polarizing plates is limited. It is unsuitable for processing the protection plate of the protection board. The casting method (3) is limited to plastics that can be polymerized and cast, such as acrylic resin, and cannot be applied to cellulose resins used for the protective substrate of polarizing plates.

又、(4)の直接プラスチツク面にサンドブラスト
を行う方法では表面に形成される凹凸が粗く光の
拡散が強過ぎて表示板の解像力が低下し望ましい
反射防止皮膜が得られないという問題点がある。
In addition, the method (4) of directly sandblasting the plastic surface has the problem that the unevenness formed on the surface is rough and the light is diffused too strongly, reducing the resolution of the display board and making it impossible to obtain the desired antireflection coating. .

本発明者らは、従来法のかかるプラスチツク保
護板に対する反射防止方法の問題点に鑑み、主と
してセルロース系プラスチツクを保護基板として
使用する偏光板に対して耐久性の優れた反射防止
層を形成する方法について種々検討を行つた。
In view of the problems of conventional antireflection methods for plastic protective plates, the present inventors developed a method for forming a highly durable antireflection layer on polarizing plates that mainly use cellulose plastic as a protective substrate. We conducted various studies on the following.

その結果、金属ロールの表面に金剛砂、シリカ
粉末等を噴射する公知のサンドブラスト法その他
の方法でエンボス加工を施し、表面に不規則な微
細凹凸粗面を形成させた金属ロールを平滑弾性ロ
ールと組み合わせ、この両者のロール間に偏光板
のプラスチツク保護基板面を金属ロールに接して
加熱加圧条件下で該偏光板を圧接通過させること
によつて形成された保護基板のエンボス成型面が
耐久性のある偏光板の反射防止層として最も優れ
ていることを見出すに至つた。
As a result, the surface of the metal roll is embossed using a known sandblasting method or other method in which diamond sand, silica powder, etc. are injected to form an irregular, finely uneven surface on the surface.The metal roll is combined with a smooth elastic roll. The embossed surface of the protective substrate formed by contacting the plastic protective substrate surface of the polarizing plate with a metal roll between these two rolls and passing the polarizing plate under pressure under heated and pressurized conditions is durable. We have discovered that this is the most excellent antireflection layer for a certain polarizing plate.

しかし、このエンボス加工による方法の欠点と
して、金属ロールの表面に形成されるエンボスの
メツシユ度合を種々に変化させて可成り微細なエ
ンボス面に形成しても、保護基板面での光の拡散
が強く、且つ、表示体の表示がぼけて不鮮明にな
るという欠点がある。
However, a drawback of this embossing method is that even if the degree of meshing of the embossing formed on the surface of the metal roll is varied and a fairly fine embossed surface is formed, light diffusion on the surface of the protective substrate remains. It is strong and has the disadvantage that the display on the display becomes blurry and unclear.

本発明者らはこの問題を解決すべく更に研究を
進めた結果、凹凸粗面を形成した金属ロールを用
いてエンボス加工した偏光板の保護基板面を溶剤
処理することによつて表示体の表示の鮮明度を顕
著に向上しうることを見出し本発明を完成するに
至つた。
The present inventors conducted further research to solve this problem, and found that the surface of the protective substrate of the polarizing plate, which was embossed using a metal roll with an uneven rough surface, was treated with a solvent to display the display material. The present invention was completed based on the discovery that the sharpness of images can be significantly improved.

即ち、本発明は特に自動車、航空機、農業機械
その他の産業機器耐久性を必要とする用途に使用
するため、通常液晶セルの上面に最も使用される
ことが多い偏光板であつて、耐久性及び耐湿熱性
に優れた外光反射面を有するとともに表示体の鮮
明度の高い偏光板及びその製造方法を提供するこ
とを目的としてなされたものである。
That is, the present invention is a polarizing plate that is most often used on the top surface of a liquid crystal cell, especially for use in automobiles, aircraft, agricultural machinery, and other industrial equipment that require durability. The present invention has been made for the purpose of providing a polarizing plate having an external light reflecting surface with excellent heat and humidity resistance and high display clarity, and a method for manufacturing the same.

本発明の高鮮明度無反射偏光板は、偏光素子の
片面または両面にセルロース系プラスチツクを主
とする保護基板を貼着してなる偏光板において、
該保護基板の表面にエンボス加工による微細凹凸
粗面が形成され、さらに該微細凹凸粗面の表層が
有機溶剤により一部溶解されていることを特徴と
する。
The high-definition non-reflective polarizing plate of the present invention is a polarizing plate formed by pasting a protective substrate mainly made of cellulose plastic on one or both sides of a polarizing element.
The protection substrate is characterized in that a rough surface with fine irregularities is formed by embossing, and further, a portion of the surface layer of the rough fine rough surface is dissolved with an organic solvent.

また、その製造方法は、偏光素子の片面または
両面セルロース系プラスチツクを主とする保護基
板を貼着してなる偏光板であつて、該保護基板を
微細凹凸粗面を形成した金属ロールで加熱押圧し
て該保護基板面に微細凹凸面を転写した後、該保
護基板を溶解する有機溶剤に短時間浸漬し、次い
で該保護基板の不溶解剤を用いて洗浄、乾燥する
こを特徴とする。
In addition, the manufacturing method includes a polarizing plate in which a protective substrate mainly made of cellulose plastic is attached to one or both sides of a polarizing element, and the protective substrate is heated and pressed with a metal roll having a roughened surface. After transferring the finely uneven surface to the surface of the protective substrate, the protective substrate is immersed for a short time in an organic solvent that dissolves the protective substrate, and then washed with an insoluble agent for the protective substrate and dried.

以下に本発明を詳細に説明する。 The present invention will be explained in detail below.

先ず、偏光板のプラスチツク保護基板に対する
エンボス加工は次のようにして行う。
First, the embossing process on the plastic protective substrate of the polarizing plate is carried out as follows.

即ち、予め、難鋼、半硬鋼、硬鋼等の材質から
成る金属ロール面に例えば金剛砂、シリカ粉末等
の硬質微粒無機質粉体を高速で噴射させる所謂サ
ンドプラスト法或いはフオトエツチング法、その
他機械的方法等を使用し、周面に不規則な微細凹
凸粗面を形成させてエンボス加工を施した金属ロ
ール(以下単に金属ロールともいう)を製作す
る。
That is, the so-called sandplast method or photoetching method, in which hard fine inorganic powder such as diamond sand or silica powder is injected at high speed onto the surface of a metal roll made of materials such as difficult steel, semi-hard steel, and hard steel, or other machines. A metal roll (hereinafter also simply referred to as a metal roll) is manufactured by forming an irregular, finely uneven rough surface on the circumferential surface using a conventional method and performing embossing.

この金属ロールを平滑弾性ロール例えばゴムロ
ール、コツトンロール等をと組み合わせたエンボ
ス加工装置を用い、偏光板の保護基板面に加熱加
圧下でエンボス加工処理を施す。この場合、規則
的な凹凸模様の彫刻ロールをもいたエンボス加工
では望ましい反射防止層が形成されない。
Using an embossing device in which this metal roll is combined with a smooth elastic roll such as a rubber roll or a cotton roll, the surface of the protective substrate of the polarizing plate is subjected to embossing treatment under heat and pressure. In this case, the desired antireflection layer cannot be formed by embossing using an engraved roll with a regular uneven pattern.

エンボス加工処理における加熱加圧条件は対象
とする保護基板の種類によつても異なるが、セル
ロースアセテート系プラスチツク製の保護基板を
使用した場合、金属ロールの加熱温度は100〜150
℃、好ましくは125〜135℃、プレス圧は60〜300
Kg/cmに保持して、圧接されたロール間を2〜30
m/分の速度で偏光板の保護基板面を金属ロール
面に対向させて通過させる。
The heating and pressure conditions for embossing processing vary depending on the type of protective substrate, but when using a protective substrate made of cellulose acetate plastic, the heating temperature of the metal roll is 100 to 150°C.
℃, preferably 125-135℃, press pressure 60-300
2 to 30 kg/cm between the press-welded rolls.
The polarizing plate is passed through the protective substrate surface facing the metal roll surface at a speed of m/min.

この場合、金属ロールの加熱は公知の手段、例
えば電熱加熱方式、熱媒循環加熱方式、熱媒密閉
誘導加熱方式等を金属ロール内に具備させること
によつて行い、又加圧は金属ロールと弾性ロール
間の間〓を空気圧式又は油圧式により調整するこ
とができる。
In this case, the metal roll is heated by a known means such as an electric heating method, a heating medium circulation heating method, a heating medium closed induction heating method, etc., and the pressure is applied between the metal roll and the metal roll. The distance between the elastic rolls can be adjusted pneumatically or hydraulically.

このエンボス加工処理によつて偏光板の保護基
板面に金属ロールの微細な凹凸粗面が転写され
る。
Through this embossing process, the finely uneven rough surface of the metal roll is transferred onto the protective substrate surface of the polarizing plate.

これによつて保護基板面には耐久性のある外光
の無反射面が形成されるが、この無反射偏光板を
液晶表示装置に装着して表示体を読み取るに際
し、表示体の鮮明度が悪いという欠点が残る。
This forms a durable surface that does not reflect external light on the protective substrate surface, but when reading the display by attaching this non-reflection polarizing plate to a liquid crystal display device, the clarity of the display may be affected. The drawback remains that it is bad.

本発明では、この欠点を除去するために、更に
エンボス加工を施した偏光板について溶剤処理を
行い、保護基板面に形成された微細凹凸粗面の一
部表層を溶解させる。
In the present invention, in order to eliminate this drawback, the embossed polarizing plate is further treated with a solvent to dissolve a part of the surface layer of the finely uneven rough surface formed on the protective substrate surface.

この溶剤処理に使用する有機溶剤としては、保
護基板の溶解性が良好であると共に、後処理工程
として保護基板を侵さない溶剤(不溶解溶剤)を
用いて洗浄処理工程を行う必要から、この不溶解
溶剤との相溶性のある有機溶剤であることが望ま
しい。例えば、N−メチル−2−ピロリドン、
N,N−ジメチルホルムアミド、シクロヘキサノ
ン、蟻酸メチル、酢酸メチル、トリアセチン、ア
セトン、ジオキサン、メチレンクロライド、四塩
化エタン等の有機溶剤が好適に使用しうる。又、
これらの有機溶剤は単体で使用することができ
る。
The organic solvent used for this solvent treatment has good solubility for the protective substrate, and it is necessary to perform a cleaning process using a solvent (insoluble solvent) that does not attack the protective substrate as a post-processing process. It is desirable that the organic solvent be compatible with the dissolving solvent. For example, N-methyl-2-pyrrolidone,
Organic solvents such as N,N-dimethylformamide, cyclohexanone, methyl formate, methyl acetate, triacetin, acetone, dioxane, methylene chloride, and tetrachloroethane can be suitably used. or,
These organic solvents can be used alone.

しかし、保護基板の溶解を緩やかに進行させる
うえで、有機溶剤と前期不溶解溶剤との相溶液と
して使用するのが好ましい。有機溶剤と不溶解溶
剤との配合割合は60〜80:40〜20(Vol%)の範
囲で適宜選定することができる。
However, in order to slowly progress the dissolution of the protective substrate, it is preferable to use a phase solution of an organic solvent and an insoluble solvent. The blending ratio of the organic solvent and the insoluble solvent can be appropriately selected in the range of 60 to 80:40 to 20 (Vol%).

保護基板の不溶解溶剤としては水が一般的であ
るが、その他メチルアルコール、エチルアルコー
ル、イソプロピルアルコール等のアルコール類、
四塩化炭素、四塩化エチレン、二硫化炭素、エチ
レングリコール、フレオン等の有機溶剤を挙げる
ことができる。
Water is generally used as an insoluble solvent for the protective substrate, but other alcohols such as methyl alcohol, ethyl alcohol, and isopropyl alcohol,
Examples include organic solvents such as carbon tetrachloride, ethylene tetrachloride, carbon disulfide, ethylene glycol, and freon.

次に、前述のようにしてエンボス加工を施した
偏光板を上記の有機溶剤と不溶解溶剤との嵌合液
で浸漬処理を行う。この浸漬処理の条件は、保護
基板の種類、有機溶剤又は不溶解剤の種類、配合
比、浸漬温度、浸漬時間等の組み合わせに応じて
種々の設定が可能であり、一概に規定し得ない
が、温度30〜40℃の場合、20秒〜6分程度の短時
間の浸漬で良好な結果が得られる。
Next, the polarizing plate that has been embossed as described above is subjected to a dipping treatment in the above-mentioned solution containing an organic solvent and an insoluble solvent. The conditions for this immersion treatment can be set in various ways depending on the combination of the type of protective substrate, type of organic solvent or insoluble agent, blending ratio, immersion temperature, immersion time, etc., and cannot be unconditionally specified. When the temperature is 30 to 40°C, good results can be obtained with short immersion of about 20 seconds to 6 minutes.

次に、上記の溶剤浸漬処理に引き続いて有機溶
剤の洗浄及び乾燥処理を行う。洗浄液としては前
記の不溶解剤が使用しうるが、就中、水を洗浄液
として使用することが経済的であり一般的であ
る。
Next, following the above-mentioned solvent immersion treatment, organic solvent cleaning and drying treatment are performed. As the cleaning liquid, the above-mentioned insoluble agents can be used, but it is especially economical and common to use water as the cleaning liquid.

洗浄方法としては浸漬洗浄、シヤワー洗浄等を
使用しうるが、有機溶剤による保護基板の過度の
溶解を防止する上から該基板に付着した有機溶剤
を迅速に除去する必要がある。この目的にはシヤ
ワー洗浄が適している。洗浄後の乾燥は水洗浄の
場合で約60℃以下、好ましくは約50℃の送風乾燥
機中を約10分間通過させることによつて達成され
る。
As a cleaning method, immersion cleaning, shower cleaning, etc. can be used, but in order to prevent excessive dissolution of the protective substrate by the organic solvent, it is necessary to quickly remove the organic solvent adhering to the substrate. Shower cleaning is suitable for this purpose. Drying after washing is accomplished in the case of water washing by passing through a blow dryer at a temperature below about 60°C, preferably about 50°C, for about 10 minutes.

以上述べた本発明の処理は保護基板に偏光素子
を貼着して形成した偏光板についてのみに限定さ
れず、予め保護基板に上記の処理を行つて無反射
プラスチツク板を形成した後、処理面を外層とし
て偏光素子に貼着して本発明の偏光板を製造して
もよい。
The processing of the present invention described above is not limited to polarizing plates formed by pasting polarizing elements on a protective substrate. The polarizing plate of the present invention may be manufactured by attaching the above to a polarizing element as an outer layer.

以上説明したように、本発明によれば外光の鏡
面反射による表示体の読み取りの困難さがなく、
耐久性及び耐湿熱性の優れた無反射偏光板が得ら
れる。又、無反射偏光板に附随した表示体の不鮮
明性が除去されて高鮮明度の無反射偏光板を提供
することができる。更に、本発明の高鮮明度無反
射偏光板の製造方法は、偏光板の保護基板を微細
凹凸粗面を形成した金属ロールで加熱圧接して、
該保護基板面に微細凹凸粗面を転写させた後、該
保護基板を溶解する有機溶剤中に短時間浸漬し、
次いで該保護基板の不溶解溶剤を用いて洗浄乾燥
する方法であるから、比較的簡単な処理操作で耐
久性のある高鮮明度の無反射偏光板を連続的に大
量生産することができる利点を有する。
As explained above, according to the present invention, there is no difficulty in reading the display due to specular reflection of external light.
A non-reflective polarizing plate with excellent durability and heat-and-moisture resistance can be obtained. Furthermore, the blurring of the display accompanying the non-reflective polarizing plate is removed, and a highly clear non-reflecting polarizing plate can be provided. Furthermore, the method for manufacturing a high-definition non-reflective polarizing plate of the present invention includes heating and press-bonding the protective substrate of the polarizing plate with a metal roll having a rough surface with fine irregularities,
After transferring the finely uneven rough surface to the surface of the protective substrate, immersing the protective substrate in an organic solvent for a short time to dissolve it;
This method is then washed and dried using a solvent that does not dissolve the protective substrate, so it has the advantage of being able to continuously mass-produce durable, high-definition, non-reflective polarizing plates with relatively simple processing operations. have

実施例 1 180メツシユの金剛砂を半硬鋼スチール製金属
ロール(径180mmφ×巾675mm)に噴射してその表
面に微細な不規則凹凸粗面を形成したエンボスロ
ールを製作した。のエンボスロールと弾性硬質ゴ
ムロール(径300mmφ×巾650mm)とを組み合わせ
たエンボス加工装置を用いて、該金属ロールの表
面温度を120℃に加熱し、ローラー間のプレス圧
を100Kg/cmに調節した後、巾525mm、厚さ180μ、
保護基板がトリアセチルセルロールからなる偏光
板(三立電機株式会社製)を10m/分の速度で通
過させた。これにより微細な不規則凹凸粗面を有
するエンボスロール面が均一に保護気は面に転写
され、外観、品質の優れた無反射偏光板が得られ
た。
Example 1 An embossed roll was manufactured by spraying 180 mesh of Diamond Sand onto a metal roll made of semi-hard steel (diameter 180 mmφ x width 675 mm) to form a fine irregular roughened surface on its surface. Using an embossing device that combines an embossing roll and an elastic hard rubber roll (diameter 300 mmφ x width 650 mm), the surface temperature of the metal roll was heated to 120°C, and the press pressure between the rollers was adjusted to 100 kg/cm. Back, width 525mm, thickness 180μ,
The sample was passed through a polarizing plate (manufactured by Sanritsu Electric Co., Ltd.) whose protective substrate was made of triacetyl cellulose at a speed of 10 m/min. As a result, the protective air was uniformly transferred to the surface of the embossing roll having fine irregularities and roughness, and a non-reflective polarizing plate with excellent appearance and quality was obtained.

これを液晶表示に装置に装着した場合、外部反
射光の拡散性が極めて良好で偏光板に対する反射
防止効果は充分であつたが、表示の鮮明度を欠き
少しぼけた状態に見えた表示体としては好ましく
ないものであつた。
When this was installed in a liquid crystal display device, the diffusivity of externally reflected light was extremely good and the antireflection effect against the polarizing plate was sufficient, but the display lacked sharpness and appeared a little blurry. was undesirable.

そこで、得られた無反射偏光板を有機溶剤とし
てN−メチル−2−ピロリドン、不溶解溶剤とし
て水をそれぞれ70:30(Vol%)に混合した液温
25℃の溶液中に3分間通過させた後、シヤワー水
洗し水切り後、50℃の送風乾燥機中を10分間通過
させて乾燥した。その結果、保護聞板面に極く微
細な凹凸面を有する美しい無反射偏光板が得られ
た。
Therefore, the obtained non-reflective polarizing plate was mixed with N-methyl-2-pyrrolidone as an organic solvent and water as an insoluble solvent at a temperature of 70:30 (Vol%).
After being passed through a solution at 25°C for 3 minutes, it was washed with water under a shower, drained, and then passed through a blow dryer at 50°C for 10 minutes to dry. As a result, a beautiful non-reflection polarizing plate having a very fine uneven surface on the protective plate surface was obtained.

この無反射偏光板を前記と同様に液晶表示装置
に装着したところ外部は反射光の拡散性及び表示
の鮮明度に優れた無反射偏光板であることが実証
された。
When this non-reflective polarizing plate was attached to a liquid crystal display device in the same manner as described above, it was verified that the non-reflective polarizing plate was excellent in the diffusion of reflected light and the clarity of the display.

実施例 2 実施例1で得られたエンボス加工済みの無反射
偏光板を有機溶剤として、N,N−ジメチルホル
ムアミド、不溶解溶剤として水をそれぞれ60:40
(Vol%)に混合した液温40℃の溶液中に2分間
通過させた後、実施例1と同様の条件で水洗、乾
燥した。これにより、外部反射光の拡散性及び表
示の鮮明度共に優れた無反射偏光板が得られた。
Example 2 The embossed non-reflective polarizing plate obtained in Example 1 was mixed with N,N-dimethylformamide as an organic solvent and water as an insoluble solvent in a ratio of 60:40, respectively.
After passing through a solution at a temperature of 40° C. mixed with (Vol%) for 2 minutes, it was washed with water and dried under the same conditions as in Example 1. As a result, a non-reflective polarizing plate excellent in both the diffusivity of externally reflected light and the clarity of display was obtained.

Claims (1)

【特許請求の範囲】 1 偏光素子の片面または両面にセルロース系プ
ラスチツクを主とする保護基板を貼着してなる偏
光板において、該保護基板の表面にエンボス加工
による微細凹凸粗面が形成され、さらに該微細凹
凸粗面の表層が有機溶剤により一部溶解されてい
ることを特徴とする高鮮明度無反射偏光板。 2 偏光素子の片面または両面にセルロース系プ
ラスチツクを主とする保護基板を貼着してなる偏
光板であつて、該保護基板を微細凹凸粗面を形成
した金属ロールで加熱押圧してで該保護基板面に
微細凹凸面を転写した後、該保護基板を溶解する
有機溶剤に短時間浸漬し、次いで該保護基板の不
溶解溶剤を用いて洗浄、乾燥することを特徴とす
る高鮮明度無反射偏光板の製造方法。 3 保護基板を溶解する有機溶剤に該保護基板の
不溶解溶剤を配合した相溶液を用いて実施する特
許請求の範囲第2項の製造方法。 4 有機溶剤と不溶解溶剤との配合割合を60〜
80:40〜20(Vol%)とする特許請求の範囲の第
3項の製造方法。
[Scope of Claims] 1. In a polarizing plate formed by pasting a protective substrate mainly made of cellulose plastic on one or both sides of a polarizing element, a finely uneven rough surface is formed on the surface of the protective substrate by embossing, Furthermore, a high definition non-reflective polarizing plate characterized in that the surface layer of the finely uneven rough surface is partially dissolved by an organic solvent. 2 A polarizing plate formed by pasting a protective substrate mainly made of cellulose plastic on one or both sides of a polarizing element, which is protected by heating and pressing the protective substrate with a metal roll having a rough surface with fine irregularities. A high-definition, non-reflective method characterized by transferring a finely uneven surface onto a substrate surface, immersing the protective substrate in an organic solvent for a short period of time, and then cleaning and drying the protective substrate using a solvent that does not dissolve the protective substrate. A method of manufacturing a polarizing plate. 3. The manufacturing method according to claim 2, which is carried out using a phase solution in which a solvent that does not dissolve the protective substrate is mixed with an organic solvent that dissolves the protective substrate. 4. Mixing ratio of organic solvent and insoluble solvent is 60~
80:40-20 (Vol%) manufacturing method according to claim 3.
JP57217770A 1982-12-14 1982-12-14 Nonreflecting polarizing plate with high distinctness and its manufacture Granted JPS59109004A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57217770A JPS59109004A (en) 1982-12-14 1982-12-14 Nonreflecting polarizing plate with high distinctness and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57217770A JPS59109004A (en) 1982-12-14 1982-12-14 Nonreflecting polarizing plate with high distinctness and its manufacture

Publications (2)

Publication Number Publication Date
JPS59109004A JPS59109004A (en) 1984-06-23
JPH0459605B2 true JPH0459605B2 (en) 1992-09-22

Family

ID=16709455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57217770A Granted JPS59109004A (en) 1982-12-14 1982-12-14 Nonreflecting polarizing plate with high distinctness and its manufacture

Country Status (1)

Country Link
JP (1) JPS59109004A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2207050A2 (en) 2009-01-09 2010-07-14 Sony Corporation Optical element and method for making the same, master and method for making the same, and display apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63216001A (en) * 1987-03-05 1988-09-08 Sanritsu Denki Kk Wear-resistant nonreflective polarizing plate
JPS63173220U (en) * 1987-04-30 1988-11-10
JP4678437B2 (en) 2008-12-29 2011-04-27 ソニー株式会社 OPTICAL ELEMENT, ITS MANUFACTURING METHOD, AND DISPLAY DEVICE

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023312U (en) * 1973-06-27 1975-03-15

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56126621U (en) * 1980-02-27 1981-09-26

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023312U (en) * 1973-06-27 1975-03-15

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2207050A2 (en) 2009-01-09 2010-07-14 Sony Corporation Optical element and method for making the same, master and method for making the same, and display apparatus

Also Published As

Publication number Publication date
JPS59109004A (en) 1984-06-23

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